Abstract: In one embodiment, a chromatic device includes an active layer and an electrolyte layer in contact with the active layer, the electrolyte comprising an oxidant and a salt, wherein the active layer has a color that blocks light when metal is not in electrical contact with the active layer but changes to a translucent color that transmits light when metal is placed in electrical contact with the active layer, wherein the active layer changes color without applying electrical energy to the active layer.

Abstract: Optical modulators with semiconductor based optical waveguides interacting with an RF waveguide in a traveling wave structure. The semiconductor optical waveguide generally comprise a p-n junction along the waveguide. To reduce the phase walk-off between the optical signal and the RF signal, the traveling wave structure can comprise one or more compensation sections where the phase walk-off is reversed. The compensation sections can comprise a change in dopant concentrations, extra length for the optical waveguide and/or extra length for the RF waveguide. Corresponding methods are described.

Abstract: An object of the invention is to provide an optical waveguide device which is able to efficiently absorb or remove leaked light propagating in a substrate. An optical waveguide device in which an optical waveguide is formed on a substrate, in which the optical waveguide includes a main waveguide through which signal light propagates, and a metal layer (a bonding layer or an electrode) is formed, through a high refractive index layer having a refractive index higher than the refractive index of the substrate, in at least a part of a region on which the main waveguide is not formed.

Abstract: An optical modulator includes an optical modulation element that is accommodated in a housing. A plurality of lead pins, which are electrically connected to the optical modulation element through wire bonding, are fixed to a lateral wall of the housing. Each of the plurality of lead pins includes a portion that protrudes into an inner space (inner surface side) of the housing. A resonance suppressing structure (for example, a concave portion), which is configured to suppress resonance between the lead pins, is provided in a lateral wall portion to which the plurality of lead pins are fixed.

Abstract: A sensor line, a measuring arrangement and a method detect a change in an ambient variable. The sensor line serves for detecting a change in an ambient variable, in particular the temperature. The sensor line has a first optical waveguide, a second optical waveguide and also a material that changes its transparency depending on the value of the ambient variable. The material is positioned between the first optical waveguide and the second optical waveguide in such a way that light from the first optical waveguide is able to be coupled into the second optical waveguide in an event of a change in the transparency.

Abstract: In various embodiments, a beam-parameter adjustment system and focusing system alters a spatial power distribution of a radiation beam, via thermo-optic effects, before the beam is coupled into an optical fiber or delivered to a workpiece.

Abstract: Optical apparatus includes an acousto-optic medium and an array of multiple piezoelectric transducers attached to the acousto-optic medium. A drive circuit is coupled to apply to the piezoelectric transducers respective drive signals including at least first and second frequency components at different, respective first and second frequencies and with different, respective phase offsets for the first and second frequency components at each of the multiple piezoelectric transducers.

Abstract: Systems and methods for shifting a position of one or more optical elements are disclosed. In an embodiment, a system may include a housing having a chamber formed therein, at least one non-linear crystal disposed in the chamber, the non-linear crystal configured to receive at least one incident signal and to convert a wavelength of at least a portion of the incident signal, and at least one shape memory alloy element disposed such that thermal or electrical energy applied to the shape memory alloy causes movement of the non-linear crystal.

Abstract: A camera module is provided, including a holder, a base, a bottom, an image sensor, and a first biasing element. The holder holds an optical lens and is disposed on the base. The bottom supports the image sensor and connects to the base via the first biasing element. The bottom and the image sensor can be moved with respect to the base by the first biasing element.

Abstract: A lens driving mechanism is provided for moving a lens unit along a light axis, including a frame, a base, a lens holder, and a driving assembly. The frame has plastic material and forms an opening. The base is in contact with and fixed to the frame, wherein a space is formed between the base and the frame. The lens holder is movably disposed in the space for holding the lens unit, wherein an external light enters the space through the opening to the lens unit. The driving assembly is disposed in the space and is connected to the lens holder and the frame, to impel the lens unit to move along the light axis.

Abstract: A method for the acquisition of images by a spacer airborne optical instrument, comprises the following steps: a) acquisition, by the instrument, of a first image having a first field of view including the projection on the ground of the optical axis of the instrument and delimited by a first field edge, the first image being sampled spatially with a first sampling step; b) acquisition, by the same instrument, of a second image having a second field of view not including the projection on the ground of the optical axis of the instrument and extending beyond the first field edge, the second image being sampled spatially with a second sampling step greater than the first sampling step. Space or airborne optical instruments and an image acquisition system for implementing the method are provided.

Abstract: A retrofittable float with an underwater camera attachment for unmanned aerial vehicles allows an unmanned aerial vehicle (UAV) to traverse over a body of water while recording images and/or video of the underwater environment. The retrofittable float with an underwater camera attachment includes a flotation device, a plurality of mounting brackets, an underwater scope, and at least one underwater illumination light. The flotation device attaches to the UAV via the plurality of mounting brackets. The plurality of mounting brackets is configured to align the center of gravity of the UAV with the center of buoyancy of the flotation device, thereby reducing the risk of capsizing. Once securely mounted, the camera of the UAV is positioned pointing into the underwater scope. The underwater scope allows the camera to record images and/or videos of the underwater environment. Finally, the at least one underwater illumination light is used to increase visibility.

Abstract: A telescopic limiting structure includes a first retractable member and a second retractable member. The first retractable member includes a first inclined face and is configured to move along a first direction. The second retractable member includes a second inclined face bearing against the first inclined face. The first inclined face and the second inclined face are configured to drive the second retractable member to move along a second direction in response to the first retractable member moving along the first direction. The second direction is different from the first direction. The second retractable member includes a limiting boss and an elastic element. The elastic element is arranged along the second direction and is connected to the limiting boss.

Abstract: This application is directed to a camera that includes a housing, a lens assembly and a plurality of electronic components. The lens assembly is arranged at a front portion of the housing and configured for focusing light received from outside of the camera. The plurality of electronic components is arranged at the front portion of the housing, and further includes an image sensor coupled to receive light through the lens assembly, a memory for storing information, a processor for processing information from the image sensor, and a wireless communication module for wirelessly communicating with an electronic device. The camera further includes a heat dissipation element arranged at a rear portion of the housing and located between the plurality of electronic components and a rear surface of the housing. The heat dissipation element is configured to transfer heat from the plurality of electronic components to the rear portion of the housing.

Abstract: A camera mounting system has an upper mount component, a lower mount component, and a base mount component. The upper mount component secures the camera and has a ball protrusion that reciprocally couples with a socket of the lower mount component. The upper mount component can rotate 360 degrees relative to the lower mount, and can pivot 90 degrees or more relative to the lower mount component. The lower mount component couples with the base mount component in a plurality of orientations. This camera mounting system allows for a large range of motion for the camera relative to the mounting system.

Abstract: A novel spatial light modulator (SLM) includes a cover glass, and modulation layer, and a plurality of pixel mirrors, and separates unwanted, reflected light from desired, modulated light. In one embodiment, a geometrical relationship exists between the cover glass and the pixel mirrors, such that light that reflects from the cover glass is separated from light that reflects from the pixel mirrors and is transmitted from the SLM. In one example, one of the cover glass or the pixel mirrors is angled with respect to the modulation layer. In another example embodiment, the cover glass has a particular thickness, which introduces destructive interference between light that reflects from the top and bottom surfaces of the cover glass. In another embodiment antireflective coatings are disposed between optical interfaces of the SLM. In another embodiment, light from the SLM is directed through an optical filter to remove unwanted light.

Abstract: A display control apparatus comprises a setting unit that sets a target overlap width with respect to an overlap region, in which at least two of adjacent projection images of a plurality of projection images projected by a plurality of projection devices overlap each other, an image obtaining unit that obtains a captured image obtained by capturing the plurality of projected projection images, a calculation unit that calculates the overlap width of the overlap region of the at least two adjacent projection images on the basis of the captured image, and an indicator generation unit that generates, on the basis of the overlap width, an adjustment indicator that guides a positional adjustment of the projection image such that the at least two adjacent projection images overlap each other by the target overlap width.

Abstract: The present invention provides an imaging system of a photo-curing 3D printing device. The imaging system comprises a light source, a liquid crystal panel, a first polarized light filter, a second polarized light filter, a focusing lens array, a projection lens, and a controller. The imaging system is characterized in that the focusing lens array is disposed on a light incoming side of the liquid crystal panel; each focusing lens of the focusing lens array is corresponding to each pixel of the liquid crystal panel; each focusing lens can gather light beams irradiating to the corresponding pixels, so that the light beams penetrate a light transmission region of the pixels as much as possible. A deflection lens is arranged on a light outgoing side of the liquid crystal panel; the deflection lens can deflect around at least one rotation axis perpendicular to an optical axis of the imaging system, so as to finely tune positions of images of the light beams projected to the surface of a light-sensitive material.

Abstract: A light source device including a light emitting device that emits a first light and a second light; a first light separation element that separates the first light into a first light beam flux and a second light beam flux; a second light separation element that separates the second light into a third light beam flux and a fourth light beam flux; at least one fluorescent body layer that includes a first fluorescence emitting section on which the first light beam flux is incident and a second fluorescence emitting section on which the third light beam flux is incident; and at least one diffusion section that includes a first diffusion light emitting section on which the second light beam flux is incident and a second diffusion light emitting section on which the fourth light beam flux is incident.

Abstract: In a projection-type image display apparatus configured to project images formed on a display element by using light from a plurality of light sources, the apparatus includes light-source coolers provided to the light sources and configured to cool the light sources, and the light-source coolers are arranged so that light-source heat dissipating directions of all the light-source coolers are substantially the same among the light-source coolers the light-source heat dissipating directions being directed toward heat dissipating parts dissipating the heat of the light sources with reference to heat absorbing parts absorbing the heat of the light sources.

Abstract: A laser array including at least one line of lasers. The at least one line of lasers includes a first laser and a second laser which are adjacent to each other. A first laser beam emitted by the first laser and a second laser beam emitted by the second laser are both in a first color, and the first laser beam has a wavelength less than that of the second laser beam.

Abstract: A laser projector includes a light-mixing module and a light-splitting module. The light-mixing module provides a laser beam which includes first polarized light and second polarized light. The light-splitting module includes a dichroic mirror, a half-wave plate, a phosphor wheel module, and a light-guiding rod. The dichroic mirror allows the first polarized light to pass and reflects the second polarized light. The half-wave plate receives the first polarized light which passes the dichroic mirror and converts the first polarized light into third polarized light. The phosphor wheel module receives the second polarized light reflected by the dichroic mirror, and provides a stimulated light which passes the dichroic mirror. The light-guiding rod receives the stimulated light and the third polarized light, thereby providing an illumination beam.

Abstract: Interactive light fixture (1) comprising a plurality of light sources and a projector unit for illuminating a defined surface area and at least one sensor for sensing objects within the surface area, and comprising a controller unit cooperating with the light sources, projector and sensor, wherein the controller unit in a first operational mode is configured to drive the light sources and/or projector unit in dependency of at least one characteristic object feature of at least one sensed object in order to generate an object-specific illumination design pattern or design figure on the surface area.

Abstract: In described examples, one or more devices include: a light source to generate a beam of light; and optics to generate a spot of light in response to the beam of light. A color wheel revolves in a direction of rotation about an axis, so the spot of light illuminates an area of the color wheel. The spot of light has: a first width; and a second width wider than the first width and orthogonal to the first width. The first width is aligned tangential to the direction of rotation.

Abstract: A general purpose image and visual effects display apparatus, with associated methods, which is comprised of an array of independently angled reflective or refractive elements wherein the varying angle pattern of each element across said array is designed to reflect or refract specifically designed light and color sources as well as fortuitously located existing colors, in precisely determined patterns, to make apparent to designated viewing or receiving locations a wide range of complex visual effects.

Abstract: A glass board projection system includes a support board having a front surface with a defined area extending a length and a width; an anti-glare projector board composed of a glass material and that is removably secured to the support board, the projector board having a thickness extending from a front surface to a back surface; an attachment device rigidly attached to and protruding from the back surface of the anti-glare projector board and configured to removably attach to the front surface of the support board; and a gap formed between the support board and the anti-glare projector board, the gap being formed by the attachment device.

Abstract: Embodiments disclosed herein relate to an exposure pattern alteration software application which manipulates exposure polygons having lines with angles substantially close to angles of symmetry of a hex close pack arrangement, which suffer from long jogs. Long jogs present themselves as high edge placement error regions. As such, the exposure pattern alteration software application provides for line wave reduction by serrating polygon edges at affected angles to reduce edge placement errors during maskless lithography patterning in a manufacturing process.

Abstract: An image pickup apparatus includes a receiver that receives, from an external apparatus, an instruction for changing a zoom position of a lens, a controller that performs control processing to change a zoom position of the lens based on a received instruction, and a determination unit that determines whether the external apparatus includes a function regarding zooming of the lens. While determining the external apparatus including the function, the controller controls a zoom adapter, which performs a zoom setting of the lens and is attached to the lens, to change a zoom position of the lens based on a zoom setting notified by the external apparatus. While determining the external apparatus not including the function, the controller controls the zoom adapter to change a zoom position of the lens based on a zoom setting performed in the zoom adapter.

Abstract: An imprinting method is capable of strictly interpolating application distribution of uncured resin material being applied to a substrate for each shot and interpolating application distribution of uncured resin material for each shot while reducing workload in a generation step. The imprinting apparatus includes a mold; a mold driving unit; a dispenser that applies uncured resin material to the substrate; a light source that cures uncured resin material as a pattern; a dispenser control unit that controls the dispenser by generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unit that interpolates application distribution of uncured resin material, which has been generated by the dispenser control unit, using shot layout information of relative position among positions of a plurality of shots, the dispenser, and the light source with respect to the substrate, as variables.

Abstract: An imprint method includes: before contacting a mold with an imprint material on a target shot region, obtaining relative position of the target shot region with respect to the mold, and performing first alignment between the target shot region and the mold by driving a correction unit configured to correct the relative position of the target shot region; after contacting the mold with the imprint material on the target shot region, performing second alignment between the target shot region and the mold by driving the correction unit; and performing the imprint process on the target shot region after the second alignment. The first alignment includes alignment performed based on a driving amount of the correction unit in the second alignment for another shot region where the imprint process has been performed earlier than in the target shot region.

Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.

Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovsikte material.

Abstract: A photosensitive resin composition for flexographic printing, comprising at least (A) a hydrophilic copolymer, (B) an elastomer, (C) a polymerizable unsaturated monomer, and (D) a photopolymerization initiator, wherein, in a cross-section of a cured product of the resin composition, a phase area of a phase comprising the hydrophilic copolymer (A), SA, is 15% or more and 60% or less, and a proportion of the phase having a phase area of 3 ?m2 or more and less than 100 ?m2 is 20 (% by area) or more of the phase comprising the hydrophilic copolymer (A).

Abstract: A method for manufacturing a semiconductor apparatus, including preparing a first substrate provided with a pad optionally having a plug and a second substrate or device provided with a plug, forming a solder ball on at least one of the pad or plug of first substrate and the plug of second substrate or device, covering at least one of a pad-forming surface of first substrate and a plug-forming surface of second substrate or device with a photosensitive insulating layer, forming an opening on the pad or plug of the substrate or device that has been covered with photosensitive insulating layer by lithography, pressure-bonding the second substrate or device's plug to the pad or plug of first substrate with the solder ball through the opening, electrically connecting pad or plug of first substrate to second substrate or device's plug by baking, and curing photosensitive insulating layer by baking.

Abstract: A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.

Abstract: A film material includes a support film having a transmittance of at least 60% with respect to light of wavelength 300-450 nm, and a resin layer containing 0.001-10 wt % of a basic compound with a molecular weight of up to 10,000, and having a thickness of 1-100 ?m. A pattern is formed by attaching the resin layer in the film material to a chemically amplified negative resist layer on a wafer, exposing, baking, and developing the resist layer. The profile of openings in the pattern is improved.

Abstract: A coloring agent dispersion which contains a satisfactorily dispersed pigment, and results in a photosensitive resin composition capable of forming a cured film when mixed in the photosensitive resin composition; a photosensitive resin composition containing the coloring agent dispersion; a cured product of the composition; an organic EL element provided with the cured product; a method for forming a pattern using the composition; and a method for producing a photosensitive resin composition using the dispersion. In a coloring agent dispersion including a coloring agent which contains a pigment and a dispersant, a dispersant containing a silsesquioxane compound of a specific structure is used.

Abstract: A coating composition which contains a fluorinated polymer having a unit (1) represented by —[CX1X2—CY1(Rf1—COOM1)]— and a fluorinated compound represented by CX3X4?CY2(Rf2—COOM2), wherein the content of the fluorinated compound is from 0.1 to 8.0 parts by mass per 100 parts by mass of the fluorinated polymer. X1, X2, X3 and X4 are H, F or Cl, Y1 and Y2 are H, F, Cl, a methyl group or a trifluoromethyl group, Rf1 and Rf2 are a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, —COOM1 is —COOH or —COOZ1, and —COOM2 is —COOH or —COOZ2 (wherein Z1 and Z2 are an ammonium ion in which the hydrogen atom may be substituted). The coating composition is suitable for forming a thin antireflection coating layer without increasing its refractive index.

Abstract: Non-linear metallic thermal resist structure having more than two layers of different metals and effective eutectic temperature that is lower than eutectic temperature of a reference non-linear metallic thermal resist having only two layer of same different metals. Optionally, at least one the layers of such resist structure is doped with material different from host metals and/or deposited under conditions resulting in strain or stress in a layer at hand. Method of multi-exposure-based patterning of a substrate carrying such structure with laser pulses characterized by irradiance at levels equal to or below 10 mJ/cm2. The sequence of steps producing the required pattern on the substrate may be explicitly lacking a step of removal of a portion of the resist structure between two consecutive exposures.

Abstract: A resist underlayer film composition is excellent in resistance to a basic hydrogen peroxide aqueous solution in gap-filling and planarization characteristics having a dry etching characteristic; a patterning process and method for forming a resist underlayer film, wherein the resist underlayer film composition is used for a multilayer resist method, the composition comprising: (a1) one, or two or more, of a compound represented by following general formula (x); and (b) an organic solvent, wherein n01 represents an integer of 1 to 10; when n01 is 2, w represents a sulfinyl group, a sulfonyl group, an ether group, or a divalent organic group having 2 to 50 carbon atoms; when n01 is an integer other than 2, w represents an n01-valent organic group having 2 to 50 carbon atoms; and y represents a single bond or divalent connecting group having 1 to 10 carbon atoms and optionally having an oxygen atom.

Abstract: A fragmentation pattern is formed on a surface of a warhead using an etchant process. An etchant resistance material is coated on an interior surface of the warhead casing. A portion of the etchant resistant material is selectively removed by a directed energy process and an etchant is applied to the exposed portion of the warhead casing surface thereby etching the fragmentation pattern. Alternatively, a protective coating is applied over the entire surface thereby creating the fragmentation pattern.

Abstract: Embodiments related to emissive display device structures having an emissive display element and a metamaterial lens having a plurality of nanoparticles over an emissive surface of the emissive display element to control the angular distribution of light emitted from the emissive display element, displays having such controlled emissive display device structures, systems incorporating such controlled emissive display device structures, and methods for fabricating them are discussed.

Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

Abstract: A light intensity modulation method implemented by using a mask (101) includes the steps of: 1) based on a circle of confusion (CoC) function of an illumination system (102), an initial light intensity distribution of an illumination field of view (FOV) and a target light intensity distribution of the illumination FOV, calculating a transmittance distribution of the mask (101) used to modulate the initial light intensity distribution into the target light intensity distribution; 2) meshing the mask (101) according to a desired accuracy of the target light intensity distribution and determining a distribution of opaque dots in each of cells resulting from the meshing based on the transmittance distribution of the mask (101) and a desired accuracy of the transmittance distribution; and 3) fabricating the mask (101) based on the determined distribution of the opaque dots and then deploying the mask (101) in the illumination system.

Abstract: An attenuation filter is configured to define attenuation of the intensity of ultraviolet radiation with a specified working wavelength from a wavelength range of 150-370 nm according to a specifiable local distribution in a projection lens of a microlithographic projection exposure apparatus. The attenuation filter has a substrate and an absorption layer on the substrate. The substrate is sufficiently transparent at the working wavelength. The absorption absorbs incident ultraviolet radiation of the working wavelength according to the specifiable local distribution at different locations of a used area to varying degrees. The attenuation filter reduces or avoids a thermally induced wavefront variation error in the ultraviolet radiation which has passed through the attenuation filter owing to locally varying heating of the substrate, which is caused by the absorption of the ultraviolet radiation that varies locally over the substrate. A thickness of the substrate is less than 100 ?m.

Abstract: An optical imaging arrangement includes an optical element unit, and an actuator device connected to the optical element unit and is configured to be connected to a support structure for supporting the optical unit. The actuator device is configured to: actively adjust, in an adjustment state, a position and/or an orientation of the optical unit with respect to the support structure in N degrees of freedom; and support the optical element unit in a statically overdetermined manner in at least one of the N degrees of freedom via a plurality of active first and second actuator components such that, in a holding state following the adjustment state, the first and second actuator components cause a parasitic residual load introduced into the optical element unit in the at least one of the N degrees of freedom.

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Abstract: A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

Abstract: A holding apparatus includes a holding portion that includes a first member which contacts a portion of an object, a second member which at least a portion thereof is fixed to a base, and a connection member which is configured to connect the first and second members, and a driving unit which drives the holding portion to change at least a posture of the first member, wherein a relative positional relationship between the first member and the second member is changed via the connection member.