Patents Issued in January 14, 2020
  • Patent number: 10534241
    Abstract: Miniaturization by simplification of a structure is achieved while suppressing a bound of an opening/closing blade and securing improvement of functionality. A blade opening/closing apparatus includes: a base body that includes an aperture; a driving body that is movably supported by the base body and is operated by a driving force of a drive source; an opening/closing blade that is moved by an operation of the driving body and opens/closes the aperture; and a braking body that controls a movement speed of the opening/closing blade via the driving body, the driving body including, on one surface thereof, an engagement portion that is to be engaged with the opening/closing blade and transmits the driving force to the opening/closing blade, the driving body including, on another surface thereof, a braked portion to which a braking force of the braking body is to be applied.
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: January 14, 2020
    Assignee: SONY CORPORATION
    Inventors: Takuya Nishijima, Hideo Ohkuma
  • Patent number: 10534242
    Abstract: An electronic apparatus includes a housing provided with an opening, a Micro Electro Mechanical System (MEMS) microphone disposed at a position directly under the opening and configured to collect sound through the opening, a light blocking member disposed at a position corresponding to a sound collection unit of the MEMS microphone between the opening and the MEMS microphone to prevent light from entering the MEMS microphone through the opening, and a waterproof member disposed in contact with the light blocking member and configured to close the opening to prevent water from entering the housing through the opening.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Akira Tagaya
  • Patent number: 10534243
    Abstract: A camera mounting system includes a mount and a mounting bracket removably coupled to the mount. The mount includes a plate and a screw extending rearward of the plate. The mounting bracket includes a tab and a base pivotably coupled to the tab. A camera may be mounted to the mounting bracket. In addition, a tool having a bit and configured to to interfit with a head of the screw to secure may be used to secure the mount to a tree-like object. The tool is further configured to interfit with an orifice formed in the mounting bracket and allow a user to lift the mounting bracket and removably couple the mounting bracket to the mount.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: January 14, 2020
    Inventor: Richard Henry Jeske
  • Patent number: 10534244
    Abstract: An external instrument that wirelessly communicates with a projector is allowed to communicate with a communication counterpart other than the projector. A projector includes a projection section, a communication section, which wirelessly communicates with a first apparatus and communicates with a second apparatus, an evaluation section, which determines the destination of communication data received via the communication section, and a control section. In a case where the evaluation section determines that the destination of the communication data is the projector, the control section causes the projection section to project an image based on image data included in the communication data. In a case where the evaluation section determines that the destination of the communication data received from the first apparatus is not the projector, the control section causes the communication section to transmit the communication data to the second apparatus.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: January 14, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Kenichiro Tomita
  • Patent number: 10534246
    Abstract: A mercury lamp cooling system includes a tilt sensor, a controller, a first and second blowers and a flow guiding structure. The flow guiding structure includes a first and second flow channel and two flow switch devices. The controller is electrically connected to the tilt sensor, the first and second blower and two flow switch devices. The first flow channel includes a first opening facing the first blower and a second and third opening facing the mercury lamp. The second flow channel includes a fourth opening facing the second blower and a fifth and sixth openings facing the mercury lamp. The controller controls the flow switch devices based on a tilt angle of a projector such that the air flow passes through at least one of the second and third opening and at least one of the fifth and sixth opening.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: January 14, 2020
    Assignee: DELTA ELECTRONICS, INC.
    Inventor: Kuo-Tung Wu
  • Patent number: 10534247
    Abstract: The disclosure provides a projector, an image generation device, and an image generation method thereof. The projector includes an image generator, a light combiner, and a projection lens. The image generator includes light valves and generates an image beam. The light combiner includes a diffusing and filtering component, which generates a combined beam, and the image generator receives the combined beam from the diffusing and filtering component. In a first time period, the light combiner converts a first input beam into partial beams. The partial beams are transmitted to the light valves respectively. In a second time period, the light combiner receives a second input beam. The diffusing and filtering component filters out one of the partial beams, and the other of the partial beams are transmitted with the second input beam respectively to the light valves.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: January 14, 2020
    Assignee: Coretronic Corportion
    Inventors: Haw-Woei Pan, Chi-Tang Hsieh, Hsin-Yueh Chang
  • Patent number: 10534248
    Abstract: A light source device includes a light source, a homogenizer optical system provided with a first multi-lens array having a plurality of first lenses which light emitted from the light source enters, and a second multi-lens array having a plurality of second lenses each of which the light having been transmitted through corresponding one of the first lenses enters, and adapted to homogenize the light emitted from the light source, a light intensity control element adapted to control light intensity of the light emitted from the homogenizer optical system, a light collection optical system adapted to converge the light having been transmitted through the light intensity control element, and a diffusion element which the light converged by the light collection optical system enters.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: January 14, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Wataru Yasumatsu
  • Patent number: 10534249
    Abstract: A control apparatus includes a calculator that calculates a target dimming rate of a projection display apparatus based on a feature quantity of image data, a diaphragm controller that controls a diaphragm position of a diaphragm based on a target diaphragm position corresponding to the target dimming rate, and a light source controller that controls a light quantity of a light source based on the target dimming rate and a dimming rate of the diaphragm at least until the diaphragm position of the diaphragm matches the target diaphragm position.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takahiro Okamura
  • Patent number: 10534250
    Abstract: An illumination device includes a light source device, a first collimate optical system on which a light beam emitted from the light source device is made incident, a condensing optical system provided at a post-stage of the first collimate optical system, a rod provided at a post-stage of the condensing optical system, a second collimate optical system provided at a post-stage of the rod, a lens integrator provided at a post-stage of the second collimate optical system, and a superimposing lens provided at a post-stage of the lens integrator. The lens integrator includes a first lens array and a second lens array provided at a post-stage of the first lens array. A light-emitting end face of the rod and a lens surface of the second lens array are substantially conjugate with each other.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: January 14, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Koichi Akiyama
  • Patent number: 10534251
    Abstract: Prism assemblies for projector display systems disclosed receive inputs from discrete color channels (e.g., red, green and blue channels. In one embodiment, “off state” light from the red, green, and blue DLP modulation may be reflected away from on-state light paths within the prism, tending to avoid uncontrolled scatter. In other embodiments, by keeping the colors separate for much of the prism path length, power levels may be significantly reduced at typical failure points. Light efficiency may be increased significantly when using discrete light sources like LEDs and lasers by removal of the additional red, green, and blue separation and re-combination losses.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: January 14, 2020
    Assignee: Dolby Laboratories Licensing Corporation
    Inventors: Duane Scott Dewald, Nathan Wainwright, Douglas J. Gorny, Martin J. Richards
  • Patent number: 10534252
    Abstract: A projection optical system and that includes a relatively small number of lenses and are able to cover a wide zooming range and a projector. A 1-2 lens group which is a focus lens group is constituted with a lens which includes a single positive lens having a convex surface to the reduction side, a lens which includes a single negative meniscus lens having a convex surface to an enlargement side, and a lens which includes a single negative lens, and the 1-2 lens group is moved at the time of focusing accompanying magnification change.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: January 14, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Nobutaka Minefuji
  • Patent number: 10534253
    Abstract: A camera module, which is mounted on an inside of a front windshield of a vehicle and configured to image an external environment of the vehicle, includes multiple lens units on which an optical image of the external environment is incident, individually, and an imaging system to generate an outside image of the external environment by imaging through each of the lens units, individually.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: January 14, 2020
    Assignee: DENSO CORPORATION
    Inventors: Sho Okuda, Takeshi Kazama, Yasuki Furutake, Nobuhisa Shimizu
  • Patent number: 10534254
    Abstract: The production of photocatalytic color switching of redox imaging nanomaterials for rewritable media is disclosed. The new color switching system is based on photocatalytic redox reaction enabling reversible and considerably fast color switching in response to light irradiation. In accordance with an exemplary embodiment, the color switching system can include a photocatalyst and an imaging media. With the assistance of photocatalyst, UV light irradiation can rapidly reduce the redox imaging nanomaterials accompany with obvious color changing, while the resulting reduced system can be switched back to original color state through visible light irradiation or heating in air condition. The excellent performance of the new color switching system promises their potential use as an attractive rewritable media to meet increasing needs for sustainability and environmental protection.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: January 14, 2020
    Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Yadong Yin, Wenshou Wang
  • Patent number: 10534255
    Abstract: A method of geometry corrections to properly transfer semiconductor designs on a wafer or a mask in nanometer scale processes is provided. In contrast with some prior art techniques, geometry corrections and possibly dose corrections are applied before fracturing. Unlike edge based corrections, where the edges are displaced in parallel, the displacements applied to generated geometry corrections do not preserve parallelism of the edges, which is specifically well suited for free form designs. A seed design is generated from the target design. Vertices connecting segments are placed along the seed design contour. Correction sites are placed on the segments. Displacement vectors are applied to the vertices. A simulated contour is generated and compared to the contour of the target design. The process is iterated until a match criteria between simulated and target design (or another stop criteria) is reached.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: January 14, 2020
    Assignee: ASELTA NANOGRAPHICS
    Inventors: Thomas Quaglio, Mathieu Millequant, Charles Tiphine
  • Patent number: 10534256
    Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: January 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin, Jeng-Horng Chen
  • Patent number: 10534257
    Abstract: Disclosed are methods of generating a proximity-corrected design layout for photoresist to be used in an etch operation. The methods may include identifying a feature in an initial design layout, and estimating one or more quantities characteristic of an in-feature plasma flux (IFPF) within the feature during the etch operation. The methods may further include estimating a quantity characteristic of an edge placement error (EPE) of the feature by comparing the one or more quantities characteristic of the IFPF to those in a look-up table (LUT, and/or through application of a multivariate model trained on the LUT, e.g., constructed through machine learning methods (MLM)) which associates values of the quantity characteristic of EPE with values of the one or more quantities characteristics of the IFPF. Thereafter, the initial design layout may be modified based on at the determined quantity characteristic of EPE.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: January 14, 2020
    Assignee: Lam Research Corporation
    Inventors: Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Richard Wise
  • Patent number: 10534258
    Abstract: A method for semiconductor structure design includes performing, by a processor, error processing of an initial design file layout. The processor further detects a tip-to-tip (T2T) structure design violation at a design cell boundary for a metal layer above (Ma) a via (Vx) at a tip of the Ma for the initial design file layout for a semiconductor structure based on a library of pattern rules. Upon detection of the T2T structure design violation, the processor retargets the Vx for generating a resulting design file layout of the semiconductor structure.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: January 14, 2020
    Assignee: International Business Machines Corporation
    Inventors: Geng Han, Dongbing Shao
  • Patent number: 10534259
    Abstract: Methods, systems, and apparatus for applying an imprinting force to an imprint lithography template, including providing, by a controller using a first control loop, a first control signal to a first actuator associated with the first control loop; providing, by the controller using a second control loop, a second control signal to a second actuator associated with the second control loop, wherein the second control loop and the first control loop are different; and applying, to the imprint lithography template, at least one of: a first force by the first actuator in response to the first control signal, and a second force by the second actuator in response to the second control signal.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Byung-Jin Choi, Mario Johannes Meissl
  • Patent number: 10534260
    Abstract: According to one embodiment, a pattern formation method can include performing a first processing of causing a surface of a first member of a processing body to be hydrophobic. The processing body includes the first member and a second member. The second member is provided at a portion of the first member. The method can include performing a second processing of causing the processing body to contact an atmosphere including a metal compound. The second processing is after the first processing. The method can include performing a third processing of processing the processing body in an atmosphere including at least one selected from the group consisting of water, oxygen, and ozone. The third processing is after the second processing. In addition, the method can include removing, after the third processing, at least a portion of another portion of the first member by using the second member as a mask.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: January 14, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Tomoaki Sawabe, Shinobu Sugimura, Koji Asakawa
  • Patent number: 10534261
    Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface at the time of its formation, and a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: January 14, 2020
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Hyung-Tak Jeon, Ji Ung Kim, Kyung-Jae Park, Jong-Ho Na, Hyung Gu Kim, Seok-Bong Park
  • Patent number: 10534262
    Abstract: A chemically amplified positive resist composition is provided comprising a specific alkali-soluble polymer adapted to turn soluble in alkaline aqueous solution under the action of acid as base resin, an alkali-soluble polymer, and a photoacid generator in an organic solvent. The composition forms a resist film which can be briefly developed to form a pattern at a high sensitivity without generating dimples in pattern sidewalls.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: January 14, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshinori Hirano, Hideyoshi Yanagisawa
  • Patent number: 10534263
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: January 14, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
  • Patent number: 10534264
    Abstract: A resist composition which generates an acid through exposure and whose solubility in a developer changes by the action of an acid. The resist composition contains a polymer compound having at least two kinds of specific constituent units. A resist pattern forming method, including forming a resist film on a support using the resist composition, subjecting the resist film to exposure, and forming a resist pattern through patterning by developing the resist film having undergone exposure by using a developer.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: January 14, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
  • Patent number: 10534265
    Abstract: The present disclosure relates to an apparatus for treating a substrate. The apparatus for treating a substrate includes a cup having an inner space whose top is open, a supporting unit for supporting a substrate in the inner space, a guide plate provided to surround the supporting unit, a treatment solution supplying unit for supplying a treatment solution to an upper surface of the substrate supported by the supporting unit, and a cleaning solution supplying unit for supplying a cleaning solution to an upper surface of the guide plate.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: January 14, 2020
    Assignee: SEMES CO., LTD.
    Inventor: Daesung Kim
  • Patent number: 10534266
    Abstract: The disclosure herein describes methods for Photosensitized Chemically Amplified Resist Chemicals (PS-CAR) to pattern light sensitive films on a semiconductor substrate. In one embodiment, a two-step exposure process may generate higher acid concentration regions within a photoresist layer. The PS-CAR chemicals may include photoacid generators (PAGs) and photosensitizer elements that enhance the decomposition of the PAGs into acid. The first exposure may be a patterned EUV exposure that generates an initial amount of acid and photosensitizer. The second exposure may be a non-EUV flood exposure that excites the photosensitizer which increases the acid generation rate where the photosensitizer is located on the substrate. The distribution of energy during the exposures may be optimized by using certain characteristics (e.g., thickness, index of refraction, doping) of the photoresist layer, an underlying layer, and/or an overlying layer.
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: January 14, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Michael A. Carcasi, Joshua S. Hooge, Benjamen M. Rathsack, Seiji Nagahara
  • Patent number: 10534267
    Abstract: A system for lithography patterning includes a first supply pipe for supplying a first solution; a second supply pipe for supplying a second solution; a third supply pipe coupled to the first and second supply pipes for receiving the first and second solutions respectively and mixing the first and second solutions into a mixture; a substrate stage for holding a substrate; a supply nozzle coupled to the third supply pipe for dispensing the mixture to the substrate; a first control unit coupled to the first supply pipe and configured to control a flow rate of the first solution going to the third supply pipe; and a second control unit coupled to the second supply pipe and configured to control a flow rate of the second solution going to the third supply pipe.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: January 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventor: Chung-Cheng Wang
  • Patent number: 10534269
    Abstract: The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: January 14, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Bauer, Ulrich Bingel, Willi Anderl
  • Patent number: 10534270
    Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: January 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van den Nieuwelaar, Victor Manuel Blanco Carballo, Casper Roderik De Groot, Rolf Hendrikus Jacobus Custers, David Merritt Phillips, Frederik Antonius Van der Zanden, Pieter Lein Joseph Gunter, Erik Henricus Egidius Catharina Eummelen, Yuri Johannes Gabriël Van de Vijver, Bert Dirk Scholten, Marijn Wouters, Ronald Frank Kox, Jorge Alberto Vieyra Salas
  • Patent number: 10534271
    Abstract: A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: January 14, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Jeroen Johan Emanuel Hoefnagels, Ronald Frank Kox, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Ruud Hendrikus Martinus Johannes Bloks, Patricius Jacobus Neefs
  • Patent number: 10534272
    Abstract: A method for exposing a wafer substrate includes forming a reticle having a device pattern. A relative orientation between the device pattern and a mask field of an exposure tool is determined based on mask field utilization. The reticle is loaded on the exposure tool. The wafer substrate is rotated based on an orientation of the device pattern. Radiation is projected through the reticle onto the rotated wafer substrate by the exposure tool, thereby imaging the device pattern onto the rotated wafer substrate.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: January 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu, Jui-Ping Chuang, Tzong-Sheng Chang, Kuei-Shun Chen, Meng-Wei Chen
  • Patent number: 10534273
    Abstract: Photolithography overlay errors are a source of patterning defects, which contribute to low wafer yield. An interconnect formation process that employs a patterning photolithography/etch process with self-aligned interconnects is disclosed herein. The interconnection formation process, among other things, improves a photolithography overlay (OVL) margin since alignment is accomplished on a wider pattern. In addition, the patterning photolithography/etch process supports multi-metal gap fill and low-k dielectric formation with voids.
    Type: Grant
    Filed: May 4, 2017
    Date of Patent: January 14, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tai-I Yang, Wei-Chen Chu, Hsiang-Wei Liu, Shau-Lin Shue, Li-Lin Su, Yung-Hsu Wu
  • Patent number: 10534274
    Abstract: Metrology apparatus and methods for inspecting a substrate are disclosed. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target on the substrate is illuminated with the measurement beam. A second target separated from the substrate is illuminated with the reference beam. First scattered radiation collected from the first target and second scattered radiation collected from the second target are delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.
    Type: Grant
    Filed: October 3, 2017
    Date of Patent: January 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Teunis Willem Tukker, Amandev Singh, Gerbrand Van Der Zouw
  • Patent number: 10534275
    Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1?m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k?n.
    Type: Grant
    Filed: June 22, 2016
    Date of Patent: January 14, 2020
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Cornel Bozdog, Aron Cepler, Paul Isbester
  • Patent number: 10534276
    Abstract: Techniques are provided for fabricating and utilizing optically opaque non-planar alignment structures in non-die areas (e.g., kerf areas) of a wafer to align photomasks to die areas on the wafer. For example, an insulating layer is formed over non-die and die areas of the wafer. A non-planar alignment feature is formed in the insulating layer in the non-die area. An optically opaque layer stack is formed in the die and non-die areas of the wafer, which conformally covers the non-planar alignment feature to form an optically opaque non-planar alignment structure in the non-die area. A lithographic patterning process is performed to pattern the optically opaque layer stack in the die area, wherein the optically opaque non-planar alignment structure in the non-die area is utilized to align a photomask to the die area. The optically opaque non-planar alignment structure can include any type of non-planar structure having a stepped sidewall surface.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: January 14, 2020
    Assignee: International Business Machines Corporation
    Inventors: Chih-Chao Yang, Hao Tang, Dominik Metzler, Cornelius Brown Peethala
  • Patent number: 10534277
    Abstract: A substrate stage apparatus includes: a fine movement stage movable along the XY plane; an XY two-dimensional stage apparatus (an X beam and an X carriage) which guides the fine movement stage in a direction parallel to the XY plane; a plurality of weight-canceling devices movable in the direction parallel to the XY plane synchronously with the fine movement stage and also working together to support the weight of the fine movement stage; a first Y step guide provided at the +Y side of the X beam in a direction parallel to the Y-axis, that guides a part of the plurality of weight-canceling devices moving in a direction parallel to the X-axis; and a second Y step guide provided at the other side of the X beam in the direction parallel to the Y-axis, that guides the other part of the plurality of weight-canceling devices moving parallel to the X-axis.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: January 14, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10534278
    Abstract: The present invention provides an exposure apparatus that exposes a substrate via a projection optical system, the apparatus including a supply unit including a first channel to which a first gas containing air is supplied, a second channel to which a second gas higher in oxygen concentration than the first gas is supplied, and a third channel to which a third gas lower in oxygen concentration than the first gas is supplied, and configured to generate a mixture gas by using at least two of the first gas, the second gas, and the third gas, and supply the mixture gas to a space between the substrate and the projection optical system.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Ryo Sasaki
  • Patent number: 10534279
    Abstract: Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period while the performance drifting is still above the drift tolerance. After a cleaning process described herein, the lithography tool can resume production without recalibration.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: January 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih
  • Patent number: 10534280
    Abstract: Herein is disclosed a liquid electrostatic ink composition. The composition may comprise a liquid carrier having dispersed therein: chargeable particles comprising a thermoplastic resin having acidic side groups; and globular particles comprising a hydrocarbon having a drop point, measured according to ASTM D3954-15, of at least 120° C., the globular particles having a D50 of from 2 ?m to 7 ?m and a D90 of 10 ?m or less, the D50 and D90 being measured in the liquid carrier using laser diffraction and volume distribution, in accordance with ISO13220.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: January 14, 2020
    Assignee: HP Indigo B.V.
    Inventors: Haim Cohen, Igor Shutyi, Reut Avigdor
  • Patent number: 10534281
    Abstract: An image forming apparatus has an image carrier, an electrifying member, and a charge eliminating device, and eliminates remaining charge on the surface of the image carrier by the charge eliminating device. The charge eliminating device includes a discharge member. The discharge member includes an electro conductive knit fabric knitted in a cylindrical shape using twisted yarn made of twisted metal fibers and a support member having a cylindrical shape and inserted in the electro conductive knit fabric, and is disposed to face the image carrier in a noncontact manner. A magnet member is disposed inside the image carrier within a charge elimination nip width between two tangential lines of an outer circumference surface of the discharge member, the two tangential lines being parallel to a straight line passing through a rotation center of the image carrier and a center axis of the discharge member.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: January 14, 2020
    Assignee: KYOCERA Document Solutions, Inc.
    Inventors: Tamotsu Shimizu, Hiroka Itani, Kenichi Tamaki
  • Patent number: 10534282
    Abstract: The present disclosure discloses a charge roller (1) particularly but not exclusively for charging a photoconductor in a liquid electro-photograph (LEP) image-forming apparatus. The charge roller includes a cured composition of an epichlorohydrin/ethylene oxide/allyl glycidyl ether terpolymer, a lithium salt and carbon black.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: January 14, 2020
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Yi Feng, Stanley J. Kozmiski, Shao-Wei Li
  • Patent number: 10534283
    Abstract: An image forming apparatus includes: an image carrier; a charging roller that charges the image carrier; a power supply part that applies a charging voltage to the charging roller; a current measurement part that measures a value of a DC component of a current flowing between the image carrier and the charging roller at at least two timings having mutually different elapsed times; and a hardware processor that measures an elapsed time from a start of application of the charging voltage by the power supply part, calculates a coefficient of an approximate expression indicating a relationship between the value of the DC component of the current flowing between the image carrier and the charging roller, and the elapsed time, and performs judgment related to life of the charging roller on the basis of the coefficient and a predetermined threshold.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: January 14, 2020
    Assignee: KONICA MINOLTA, INC.
    Inventors: Tsugihito Yoshiyama, Hokuto Hatano
  • Patent number: 10534284
    Abstract: An electrophotographic imager includes a photoconductive element, a charger, and a light source to expose areas of a charged surface of the photoconductive element to form a latent image. A development element is coupled relative to the photoconductive element to develop, via charged marking agent, the latent image on the photoconductive element. An exposure adjustment factor is selectively applied, prior to the exposing, to a first printable area of the latent image.
    Type: Grant
    Filed: July 30, 2015
    Date of Patent: January 14, 2020
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Mark Hirst, Brad Larson, Mark Shaw
  • Patent number: 10534285
    Abstract: An information processing apparatus includes: a second reception unit configured to receive a predetermined signal outputted via a first signal line from the image forming unit; a third reception unit configured to receive a surface information outputted via a second signal line from the image forming unit; a storage unit configured to store, in association with the surface information, a plurality of pieces of correction data respectively corresponding to a plurality of reflecting surfaces; a correction unit configured to correct the image data to correspond to a reflecting surface onto which a light for scanning a photosensitive member is to be deflected, based on correction data; and a third output unit configured to, in response to receiving the predetermined signal, output the corrected image data.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yuichi Utsumi
  • Patent number: 10534286
    Abstract: A system and method for passively cooling electrostatic process units includes a thermally conductive housing and a doctor bar. The thermally conductive housing is disposed over the developer roller of the electrostatic process unit and conducts heat from inside the electrostatic process unit to a plurality of ribs disposed on along the length of the electrostatic process unit. Heat transferred to the plurality of ribs is dissipated through convection with surrounding air. Heat from the thermally conductive housing is also transferred through conduction to a printer chassis through contact of the thermally conductive housing with the printer chassis. The doctor bar conducts heat from the junction of the doctor blade and the developer roller to a plurality of ribs disposed on the doctor bar where the heat is dissipated through convection with the surrounding air.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: January 14, 2020
    Assignee: Toshiba TEC Kabushiki Kaisha
    Inventors: Don W. Stafford, Donn D. Bryant
  • Patent number: 10534287
    Abstract: An image forming apparatus includes an image carrier that carries a latent image, a developer holder that holds developer for developing the latent image carried by the image carrier, and a layer-thickness restriction member that restricts the layer thickness of the developer held by the developer holder. When the developer holder approaches the layer-thickness restriction member, the layer-thickness restriction member moves away from the developer holder and then toward the developer holder.
    Type: Grant
    Filed: November 13, 2017
    Date of Patent: January 14, 2020
    Assignee: FUJI XEROX CO., LTD.
    Inventor: Mutsumi Kikuchi
  • Patent number: 10534288
    Abstract: A developing device includes developer, a developer bearing member, and a supply member that is in contact with the developer bearing member and supplies the developer. The developing device further includes a developing chamber in which the developer bearing member and the supply member are disposed, a developer containing chamber that contains the developer, a partition wall that partitions the developing chamber and the developer containing chamber from each other and is provided with an opening that communicates the developing chamber and the developer containing chamber with each other, and a conveyance member that conveys the developer from the developer containing chamber to the developing chamber. The conveyance member is provided with a hole through which the developer can pass or has a protrusion that generates a gap between the conveyance member and the partition wall.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kodai Hayashi, Shinichi Agata
  • Patent number: 10534289
    Abstract: A toner container attachable to and detachable from a main body of an image forming device and including: a first chamber containing toner; a second chamber adjacent to the first chamber through a partition wall and downstream of the first chamber in a toner supply direction; and a switching member in the second chamber that is movable or rotatable and has a shell structure. The partition wall has a first aperture. A bottom wall of the second chamber opposing the partition wall has a second aperture and sits on the main body. The shell has third and fourth apertures. The fourth aperture coincides with the second aperture when the third aperture coincides with the first aperture, and the first aperture is closed by the shell when the third aperture faces an inner wall surface of the second chamber.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: January 14, 2020
    Assignee: KONICA MINOLTA, INC.
    Inventors: Shuan Yang, Naoki Nonoyama, Shigeru Sawano
  • Patent number: 10534290
    Abstract: A powder container contains powder and is attached to an image forming apparatus including: a conveying nozzle to convey the powder; a powder receiving hole of the conveying nozzle to receive the powder from the powder container; an apparatus main-body gear to transmit a driving force to the powder container; and a container receiving section including the conveying nozzle and receiving the powder container. The powder container includes: an opening at one end of the powder container in a longitudinal direction; a nozzle receiver at the opening to receive the conveying nozzle; a conveyor to convey the powder; and a container gear to drive the conveyor by meshing with the apparatus main-body gear. The container gear is to mesh with the apparatus main-body gear at a position closer to the opening than the powder receiving hole in the longitudinal direction. The opening is to mate with the container receiving section.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: January 14, 2020
    Assignee: RICOH COMPANY, LTD.
    Inventors: Kenji Kikuchi, Shinji Tamaki, Hiroshi Hosokawa, Shunji Katoh, Michiharu Suzuki, Hideo Yoshizawa, Shingo Kuboki
  • Patent number: 10534291
    Abstract: An image forming system includes an image carrier to rotate, a developer carrier to rotate, a container to contain the developer carrier, and a developer retainer separated from the rotatable developer carrier by a first gap of closest proximity, separated from the rotatable image carrier by a second gap of closest proximity, and separated from the container by a third gap of closest proximity. The first gap is less than the second gap and the third gap.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: January 14, 2020
    Assignee: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
    Inventors: Naoya Iwata, Satoshi Muramatsu, Tadao Mori
  • Patent number: 10534292
    Abstract: An example method of performing a null cycle in a liquid electrographic printer is described. The method involves collecting, at a photo imaging plate cleaning station, imaging oil deposited on a photo imaging plate during a print cycle. During a null cycle, the photo imaging plate cleaning station is controlled to apply the collected imaging oil to the photo imaging plate.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: January 14, 2020
    Assignee: HP Indigo B.V.
    Inventors: Shmuel Borenstain, Shahar Stein, Asaf Anufa