Abstract: An information handling system may comprise a liquid crystal display having a plurality of pixels, an electrochromic material layer having a plurality of electrodes disposed between an interior surface of a chassis and a transistor-array layer, and a high reflection layer reflecting light emitted from an LED disposed between the electrochromic material layer and the transistor-array layer away from the interior surface of the chassis. A processor may execute code instructions of an electrochromic material regional backlight unit dimming control system to identify a low-intensity pixel region including a subset of the plurality of pixels associated within high dynamic ratio image data with a low intensity value, identify an electrode of the electrochromic material layer associated with the low-intensity pixel region; and pass a current through the electrode such that a portion of the electrochromic material becomes opaque to the light reflected from the high reflection layer.

Abstract: Provided is an electrochromic display device including a pair of supporting substrates facing each other, a pair of electrodes each disposed on the supporting substrate and facing each other, an electrochromic display layer disposed in contact with at least one of the pair of the electrodes, and an electrolyte layer disposed between the pair of the electrode, wherein the electrochromic display layer includes a plurality of electrochromic layers exhibiting mutually different coloring colors, and the plurality of the electrochromic layers are laminated on the electrode at least in a partial area of the electrode.

Abstract: A temperature regulation system includes a laminate material that has a first light transmissive electrode layer, a rear electrode layer, and a bistable electrophoretic medium disposed between the first and second electrode layer. The electrophoretic medium includes two types of particles that have different charges and color. The amount of incident radiation (visible light, infrared, etc.) that is absorbed by the laminate can be modified by providing a voltage between the electrode layers.

Abstract: An electro-optic fiber including a conductive fiber, a layer of electro-optic medium on the conductive fiber, and a conductor on the layer of electro-optic medium. A method of making the electro-optic fiber including the steps of coating a conductive fiber with an electro-optic medium and applying a conductor to the electro-optic medium. The resulting fibers can be woven to create a color-changing material, such as a fabric.

Abstract: Provided is an optical device including a first wavelength variable interference filter in which a first reflective film and a second reflective film face each other with a first gap in between; a second wavelength variable interference filter in which a third reflective film and a fourth reflective film face each other with a second gap in between; and a first substrate having a transmissive property, which has a first surface and a second surface which is opposite in direction to the first surface, in which the second reflective film is provided on the first surface of the first substrate, and in which the third reflective film is provided on the second surface of the first substrate.

Abstract: Provided are a beam steering device and a system including the same. The beam steering device includes a conversion layer having a refractive index which is variable via electrical control and a plurality of nanoantenna pattern layers stacked on the conversion layer. The refractive index of the conversion layer is electrically changed by a driver.

Abstract: The present invention provides a projecting apparatus for a 3D sensing system. The projecting apparatus comprises: at least a light source and a patterning unit. The at least a light source is utilized for emitting beams with different wavelengths. The patterning unit is utilized for receiving the beams and imposing at least a pattern on the beams to generate a structure light with higher resolution.

Abstract: An optical switching device includes a drive substrate, a transparent substrate, a liquid crystal layer, and a reflection enhancing film. The drive substrate includes a pixel region including a plurality of pixel electrodes, an outer circumferential region arranged at an outer circumference of the pixel region, and a seal region. The transparent substrate includes a counter electrode. The liquid crystal layer is interposed between the drive substrate and the transparent substrate. The reflection enhancing film is arranged on the pixel region, the outer circumferential region, and the seal region. The reflection enhancing film includes at least one assembly of dielectric films to be stacked, each assembly being a set of two dielectric films having different refractive indexes. The dielectric film as the first layer included in the reflection enhancing film has a different thickness from other dielectric films.

Abstract: A photonically-sampled electronically-quantized analog-to-digital converter generates an optical signal comprising a series of optical pulses. The optical signal is split into a first and a second optical path. The split optical signal is detected in the first path and then the detected optical signal is converted to a reference digital signal. The split optical signal in the second path is modulated with an input RF signal and a plurality of demultiplexed RF-modulated optically-sampled signals is generated from the modulated optical signal. The plurality of demultiplexed RF-modulated optically-sampled signals is then pulse broadened, detected, and converted to a plurality of sampled-RF digital signals. The reference digital signal and the plurality of sampled-RF digital signals are digital signal processed to generate a digital representation of the input RF signal.

Abstract: Digital camera comprising an upright Wide camera configured to provide a Wide image with a Wide image resolution and a folded Tele camera configured to provide a Tele image with a Tele image resolution higher than the Wide image resolution, the Wide and Tele cameras having respective Wide and Tele fields of view FOVW and FOVT and respective Wide and Tele image sensors, the digital camera further comprising a rotating OPFE operative to provide a folded optical path between an object or scene and the Tele image sensor, wherein rotation of the OPFE moves FOVT relative to FOVW. In some embodiments, a rectangular FOVT is orthogonal to a rectangular FOVW. When included in a host device having a user interface that displays FOVT within FOVW, the user interface may be used to position FOVT relative to FOVW, scan FOVT across FOVW and acquire, store and display separate Wide and Tele images, composite Wide plus Tele images and stitched Tele images.

Abstract: A shutter device includes a movable shading module and a movement control module configured to control movement of the movable shading module. The movable shading module includes a shading unit, a driving unit and a signal measuring unit. The shading unit includes two blades, and the movement control module is configured to generate a control signal. The driving unit is configured to receive the control signal and drive the two blades. The signal measuring unit is configured to measure an operating status of the blades feed it back to the movement control module in real time. The movement control module is configured to update the control signal based on the fed back operating status. This shutter device can overcome the problems of low exposure dose accuracy and light leaks arising from the use of existing shutters and provide various accurately-controlled exposure doses suitable for different applications.

Abstract: A system and a method for the system, wherein the system includes a camera and a control unit for controlling the camera, which is formed by an associated image sensor for optically capturing a capturing region, wherein the control unit may switch between a first mode and a second mode as a function of a scene change in the recording space.

Abstract: A gripping device that enables a user to operate operation members like switches favorably. The gripping device is attached to an electronic apparatus and is used for gripping the electronic apparatus. The gripping device includes a gripping member of which a side surface is approximately circular, and an operation member that has an operation panel arranged along a circumference of the gripping member and that is operated for causing a predetermined action of the electronic apparatus. The operation member allows at least a first operation that presses the operation panel in a radial direction of the gripping member and a second operation that slides the operation panel in a circumferential direction of the gripping member from a position moved by the first operation.

Abstract: The present invention provides a projector including a light-emitting device, a diffraction optical element (DOE) and a switchable diffuser. The light-emitting device is arranged for generating a laser beam. The switchable diffuser is controlled by a control signal to diffuse or scatter received lights or not diffuse or scatter the received lights, wherein the laser beam passes through the DOE and the switchable diffuser to generate an output image of the projector.

Abstract: A fly-eye lens includes: an incident lens assemblage comprising a plurality of incident lenses that are aligned in a vertical direction, wherein each of the incident lenses has a quadrangular shape, wherein horizontal lens widths of the incident lens are the same, and wherein vertical lens widths of at least some of the incident lens are different from one another; and an emission lens assemblage comprising a plurality of emission lenses that are aligned in the vertical direction so as to be optically opposed to the incident lenses, wherein each of the emission lenses has a quadrangular shape, and wherein horizontal lens widths of the emission lenses lens are the same.

Abstract: An optical element adjustment module includes a mount comprising at least one first mount hole, at least one first fixing member, and at least one adjustment structure disposed on the mount and comprising an optical element, a supporting member, and a base. The optical element comprises a first surface and is held on the supporting member. The supporting member is fixed on the base, and the base includes a first base hole. The central axis of the first base hole is parallel to the first surface of the optical element. Each of the adjustment structures is rotated relative to the mount with respect to the first fixing member, so as to adjust the relative positions of the adjustment structure and the mount slightly as required.

Abstract: A projection-type display apparatus includes a plurality of light modulating elements configured to modulate lights having wavelengths different from one another, a plurality of pipes corresponding respectively to the plurality of light modulating elements and configured to allow a refrigerant to be circulated, and a heat-dissipating member connected to the plurality of pipes and configured to dissipate heat from the plurality of light modulating elements through the refrigerant, the heat-dissipating member including a plurality of heat-dissipating regions corresponding respectively to the plurality of light modulating elements.

Abstract: A light source unit of the present invention includes a first light source and a second light source that are configure to emit light in a first wavelength range, a luminescent plate configured to be excited by the light in a first wavelength range to emit light in a second wavelength range, and a dichroic filter provided on one surface side of the luminescent plate and configured to transmit the light in a second wavelength, and the light in a first wavelength range emitted from the first light source is incident on the dichroic filter at an angle within a first incident angle range, and the light in a first wavelength range emitted from the second light source is incident on the dichroic filter at an angle within a second incident angle range that is greater than the first incident angle range.

Abstract: A light source unit includes a blue light source configured to output light in a blue wavelength range, an excitation light source configured to emit excitation light having a shorter wavelength than a wavelength of the light in the blue wavelength range outputted from the blue light source, and a luminescent wheel including a luminescent light emitting area on to which the excitation light is shined to thereby emit luminescent light and a light guiding area configured to transmit or reflect the light in the blue wavelength range, and the excitation light is shined on to the luminescent light emitting area from a first surface side of the luminescent wheel, and the light in the blue wavelength range is shined on to the light guiding area from a second surface side of the luminescent wheel that is opposite to the first surface side.

Abstract: An optical wheel according to the present invention includes a luminescent material light emitting area on which light in a first wavelength range is incident from one side to thereby emit luminescent light excited by the light in the first wavelength range from another side, and a controlling and diffusing optical area including a controlling section on which the light in the first wavelength range is incident from the one side and configured to cause a diffusing characteristic of the light in the first wavelength range to differ between in a radial direction and in a circumferential direction.

Abstract: A light source apparatus includes a first light source configured to generate first light, a phosphor to be excited by the first light to generate second light, a second light source configured to generate third light, and a spectroscopic optical element configured to reflect the first light to the phosphor and to combine the first light reflected without being absorbed by the phosphor, the second light, and the third light with one another. The spectroscopic optical element has a first area and a second area. The first area has a spectral characteristic of reflecting the first light, of transmitting the second light, and of reflecting the third light. The second area has a spectral characteristic of transmitting the first light and the second light, and of reflecting the third light.

Abstract: A projection system includes a light source, a projection lens, and a light-adjusting diaphragm element. The light source emits a first light having a first dominant wavelength range and a second dominant wavelength range. The projection lens is disposed on the path of the first light. The light-adjusting diaphragm element, disposed between the light source and the projection lens, has an opening and a light shielding area outside the opening, a filter is disposed in the opening, wherein a part of the first light is blocked by the light shielding area, a wavelength band corresponding to the first dominant wavelength range of other part of the first light passes through the opening, and a wavelength band corresponding to the second dominant wavelength range of the other part of the first light is blocked by the filter to become a second light having a narrow wavelength range.

Abstract: A light combining module includes a first light source, a second light source, a first dichroic mirror, and an alignment structure. The first light source is used to output a first light. The second light source is used to output a second light. The first dichroic mirror is disposed on a transmission path of the first light and the second light, wherein the first light is incident on the second light source via the first dichroic mirror. The alignment structure adjusts the position of the second light source.

Abstract: The reflection surface of a DMD is divided into a first area and a second area, causing the first area to display images while appropriately controlling the on and off states of the micromirrors within the second area on the basis of a prescribed control logic according to the on and off states of the micromirrors within the first area. Further, the DMD off-state light created in the first and second areas is caused to recurse to the DMD via a prescribed recycle optical system for the DMD off-state light, and only the second area in the reflection surface is intensively irradiated along a prescribed irradiation direction, thereby efficiently converting the DMD off-state light to the effective projection light.

Abstract: A display device comprises a display panel having a plurality of pixels and configured to be wound or unwound, and a back cover attached to one surface of the display panel and having a plurality of grooves. The grooves include a plurality of first grooves placed on the one surface of the back cover and a plurality of second grooves placed on the other surface of the back cover opposite to the one surface of the back cover. A depth of each of at least one of the first grooves and at least one of the second grooves is smaller than a maximum thickness of the back cover.

Abstract: In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.

Abstract: A photo mask for extreme ultra violet (EUV) lithography includes a substrate having a front surface and a back surface opposite to the front surface, a multilayer Mo/Si stack disposed on the front surface of the substrate, a capping layer disposed on the multilayer Mo/Si stack, an absorber layer disposed on the capping layer, and a backside conductive layer disposed on the back surface of the substrate. The backside conductive layer is made of tantalum boride.

Abstract: A mask includes a substrate, a light-reflecting structure, a patterned layer, and a plurality of bumps. The substrate has a first surface and a second surface. The light-reflecting structure is located on the first surface of the substrate. The patterned layer is located on the light-reflecting structure. The bumps are located on the second surface of the substrate. The bumps define a plurality of voids therebetween and protrude in a direction away from the second surface of the substrate.

Abstract: A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.

Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.

Abstract: An integrated circuit (IC) method is provided. The method includes building a mask model to simulate an aerial mask image of a mask, and a compound lithography computational (CLC) model to simulate a wafer pattern; calibrating the mask model using a measured aerial mask image of the mask; calibrating the CLC model using measured wafer data and the calibrated mask model; performing an optical proximity correction (OPC) process to a mask pattern using the calibrated CLC model, thereby generating a corrected mask pattern for mask fabrication. Alternatively, the method includes measuring a mask image of a mask optically projected on a wafer with an instrument; calibrating a mask model using the measured mask image; calibrating a CLC model using measured wafer data and the calibrated mask model; and performing an OPC process to a mask pattern using the calibrated CLC model, thereby generating a corrected mask pattern for mask fabrication.

Abstract: The present application discloses a photomask and an exposure system, the photomask comprising a completely transparent region and a completely shading region disposed around the periphery of the completely transparent region, and a shading region is disposed in the completely transparent region, and a light transmittance of the shading region is defined as T, 0?T<100%.

Abstract: The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S01: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S02: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.

Abstract: A mask is provided. The mask includes a plurality of light blocking strips configured to block light and bounding spaces through which light is allowed to pass. The plurality of light blocking strips are arranged in a mesh shape, and include first light blocking strips located in at least one side edge of the mask, and second light blocking strips, and each of the first light blocking strips has a greater width than each of the second light blocking strips. An exposure method using the mask, and a touch display panel manufactured by the exposure method are also provided.

Abstract: The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.

Abstract: A positive photosensitive resin composition, a photosensitive resin layer, and an electronic device, the composition including an alkali soluble resin; a photosensitive diazoquinone compound; a dissolution controlling agent represented by Chemical Formula 1; a cross-linking agent represented by Chemical Formula 2; and a solvent, wherein the dissolution controlling agent and the cross-linking agent are included in a weight ratio of about 1:1 to about 1:2:

Abstract: A photosensitive resin composition and a photosensitive resin printing plate precursor which allow development that uses a solution containing a lower alcohol and which are excellent in abrasion resistance and excellent in the ink wiping characteristics of a plate surface exhibited when the plate surface is squeegeed with a blade of a pad printer are provided. The photosensitive resin composition is characterized by containing (A) an inorganic fine particle whose average particle diameter is greater than or equal to 0.5 ?m and less than or equal to 4 ?m and whose sphericity is greater than or equal to 0.9, (B) a polyamide having in its molecular main chain an aliphatic ring and/or a skeleton represented by general formula (1), (C) a compound having an ethylenic double bond, and (D) a photopolymerization initiating agent.

Abstract: A photoresist is disclosed. The photoresist includes a polymer with one repeating unit and an absorbing unit.

Abstract: A method of processing a substrate includes: providing structures on a surface of a substrate; depositing a self-assembled monolayer (SAM) over the structures and the substrate, the SAM being reactive to a predetermined wavelength of radiation; determining a first pattern of radiation exposure, the first pattern of radiation exposure having a spatially variable radiation intensity across the surface of the substrate and the structures; exposing the SAM to radiation according to the first pattern of radiation exposure, the SAM being configured to react with the radiation; developing the SAM with a predetermined removal fluid to remove portions of the SAM that are not protected from the predetermined fluid; and depositing a spacer material on the substrate and the structures, the spacer material being deposited at varying thicknesses based on an amount of the SAM remaining on the surface of the substrate and the structures.

Abstract: Embodiments of the present disclosure describe a chemical replacement system and a method to automatically replace PR bottles. The chemical replacement system includes a computer system and a transfer module. The computer system can receive a request signal to replace one or more chemical containers and transmit a command to the transfer module. The transfer module, being controlled by the computer system, can include a holder configured to hold the one or more chemical containers (e.g., PR bottles); a door unit configured to open in response to the command; and a transfer unit configured to eject the holder in response to the command for replacement. The chemical replacement system can further include an automated vehicle configured to replace the one or more chemical containers in the ejected holder.

Abstract: Correction information is acquired for compensating for a measurement error of a second encoder system that occurs due to a displacement between four sections of a scale member of the second encoder system, based on measurement information of the second encoder system obtained in a fifth area in which four heads of the second encoder system that are provided on a second stage, which holds a substrate, respectively face the four sections of the scale member.

Abstract: A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.

Abstract: An exposure method for stepwise moving a rectangular mask and a relative position of a substrate includes first shot exposure in which the mask is located on a first region of the substrate, coordinates of two points on one side of the mask are detected, the mask is aligned using the coordinates, and then a first shot is exposed, second shot exposure in which the mask is located on a second region of the substrate, coordinates of two points on one side of the mask are detected, the mask is aligned using the coordinates, and then a second shot is exposed, and third shot exposure in which the mask is located on a third region of the substrate, coordinates of two points on one side of the mask are detected, the mask is aligned using the coordinates, and then a third shot is exposed.

Abstract: The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

Abstract: A method and associated computer program for predicting an electrical characteristic of a substrate subject to a process. The method includes determining a sensitivity of the electrical characteristic to a process characteristic, based on analysis of electrical metrology data including electrical characteristic measurements from previously processed substrates and of process metrology data including measurements of at least one parameter related to the process characteristic measured from the previously processed substrates; obtaining process metrology data related to the substrate describing the at least one parameter; and predicting the electrical characteristic of the substrate based on the sensitivity and the process metrology data.

Abstract: A method including determining a type of structural asymmetry of the target from measured values of the target, and performing a simulation of optical measurement of the target to determine a value of an asymmetry parameter associated with the asymmetry type. A method including performing a simulation of optical measurement of a target to determine a value of an asymmetry parameter associated with a type of structural asymmetry of the target determined from measured values of the target, and analyzing a sensitivity of the asymmetry parameter to change in a target formation parameter associated with the target. A method including determining a structural asymmetry parameter of a target using a measured parameter of radiation diffracted by the target, and determining a property of a measurement beam of the target based on the structural asymmetry parameter that is least sensitive to change in a target formation parameter associated with the target.

Abstract: An apparatus includes an overlay mark. The overlay mark includes a first portion including a first pattern and a second portion including a second pattern. The first pattern includes a plurality of first features and a first center feature each separated by a gap along a first direction. At least two gaps are the same but are different from the other gaps, and the first centers are symmetric with respect to the first center feature. The second pattern includes a plurality of second features and a second center feature each separated by a gap along the first direction. At least two gaps are the same but are different from the other gaps, and the second features are symmetric with respect to the second center feature. The first center feature of the first pattern is aligned with the second center feature of the second pattern along a second direction.

Abstract: In a method of optimizing a lithography model in a lithography simulation, a mask is formed in accordance with a given layout, a wafer is printed using the mask, a pattern formed on the printed wafer is measured, a wafer pattern is simulated using a wafer edge bias table and the given mask layout, a difference between the simulated wafer pattern and the measured pattern is obtained, and the wafer edge table is adjusted according to the difference.

Abstract: A method of lithography includes obtaining a profile of a single field of a substrate that having a photoresist layer thereon, in which the profile includes a first feature and a second feature having different heights. A depth of focus distribution map is generated according to the profile. A project lens is tuned based on the generated depth of focus distribution map, such that the project lens provides a first focus length in a first project pixel of the project lens and a second focus length in a second project pixel of the project lens, wherein the first focus length and the second focus lengths. The single field of the substrate is exposed by using the tuned project lens.

Abstract: A method of performing a lithography process includes providing a test pattern. The test pattern includes a first set of lines arranged at a first pitch, a second set of lines arranged at the first pitch, and further includes at least one reference line between the first set of lines and the second set of lines. The test pattern is exposed with a radiation source providing an asymmetric, monopole illumination profile to form a test pattern structure on a substrate. The test pattern structure is then measured and a measured distance correlated to an offset of a lithography parameter. A lithography process is adjusted based on the offset of the lithography parameter.