Abstract: The polarization acquisition apparatus is configured to allow an image capturing system including an interchangeable lens and an image capturing apparatus to perform image capturing using polarized light. The polarization acquisition apparatus includes a variable polarization axis element in which a direction of its polarization transmission axis is variable, a driver configured to operate the variable polarization axis element so as to change the direction of the polarization transmission axis, a first mount to which the image capturing apparatus is detachably attachable, and a second mount to which the interchangeable lens is detachably attachable. The driver is configured to operate the variable polarization axis element so as to change the direction of the polarization transmission axis to at least three directions when the image capturing is performed multiple times.

Abstract: An accessory mount can be inserted through the camera body mount without any of the first through third tabs being hindered by any of three camera body-side tabs at the camera body mount, as long as the accessory mount is inserted into the camera body mount at a correct interlock phase. The first, second, and third tabs extend over varying lengths along the circumferential direction. The first tab extends over a greatest length and the third tab extends over a smallest length, along the circumferential direction. The accessory mount includes a restricting member, a fitting portion, and a lock pin hole. The restricting member is disposed at a position assumed on a side substantially opposite from the lock pin hole across the fitting portion.

Abstract: A clamp assembly for securing a shoe plate of a camera accessory includes a bracket, a lever ring disposed around the bracket between the first end and the second end, and a base plate. The base plate is configured to move when the lever ring is rotated so as to secure the shoe plate between the base plate and the bracket. The clamp assembly is coupleable to a device that includes a housing and a mount configured to attach to a boom. The housing is rotatable relative to the mount about a rotation axis. The device also includes an actuator assembly and a latch coupled thereto. The actuator assembly is configured to move the latch between an engaged position with the mount, which prevents rotation of the housing relative to the mount, and a disengaged position with the mount, which enables rotation of the housing relative to the mount.

Abstract: A method of image projection including selecting a set of desired chromaticity coordinates of a projection system, the projection system including a plurality of laser sources; determining a set of parameters of an expected operational environment; and configuring each laser source to have a power ratio and a power spectrum density function generating a normalized power spectrum density function of the projection system having the set of desired chromaticity coordinates and a wavelength diversity factor of at least 2 in the expected operational environment. A projection system including an input device configured to receive a set of desired chromaticity coordinates and a set of operational parameters; a plurality of laser sources each having a power ratio and a power spectrum density function configured to generate a normalized power spectrum density function producing the set of desired chromaticity coordinates and a wavelength diversity factor of at least 2.

Abstract: A projection apparatus includes a light source, a light reflective member, a light valve, and a light beam adjusting member. The light source is configured to provide an illumination beam. The light reflective member is configured to reflect the illumination beam. The light valve is configured to convert the illumination beam reflected by the light reflective member into an image beam. The light beam adjusting member is optically coupled between the light source and the light reflective member and includes a collimating lens module. The collimating lens module has a light entering surface and a light leaving surface respectively at opposite sides thereof. The light entering surface and the light leaving surface respectively have a first optical axis and a second optical axis extending along different directions.

Abstract: An optical projection module with improved heat dissipation includes a circuit board having a first surface and a second surface opposite the first surface. A semiconductor substrate is mounted on the first surface. The semiconductor substrate has a third surface facing the first surface and a fourth surface opposite to the third surface. A light source and an optical member are mounted on the fourth surface. The optical member includes a lens holder. The lens holder defines a receiving space for receiving the light source. The lens holder further defines at least one escaping hole. A heat dissipation block is received in each escaping hole.

Abstract: A projector includes a light source device configured to emit light, a light modulator configured to modulate the light emitted from the light source device in accordance with an image signal, a projection optical device configured to project the light modulated by the light modulator, and a cooler configured to cool a cooling target based on transformation of a refrigerant into a gas. The cooler includes a refrigerant generator configured to generate the refrigerant and a refrigerant sender configured to send the generated refrigerant toward the cooling target.

Abstract: [Object] To provide an image projection apparatus that is able to efficiently cool an inside of a housing. [Solution] There is provided an image projection apparatus that is a short focus projector including a short focus lens as a projection lens that projects an image on a projection face, the image projection apparatus including: an optical system unit including an optical system component including the projection lens; an air intake port that is provided on a rear face of a housing containing the optical system unit and through which air is caused to flow into an inside of the housing; an air discharge port that is provided on a front face of the housing and through which air inside the housing is discharged; and one or more cooling fans that are provided to be closer to a rear face side than a heat generation component that generates heat among the optical system components, in the inside of the housing.

Abstract: A projection apparatus and an illumination system are provided. The illumination system includes a light source emitting a light beam, at least one light-diffusion element disposed on a transmission path of the light beam from the light source and inclined to the transmission path of the light beam from the light source, a wavelength conversion module disposed on a transmission path of the light beam from the at least one light-diffusion element. A long axis direction of a light spot projected on the wavelength conversion module is perpendicular to an extending direction of a boundary between the reference plane and the at least one light-diffusion element. The wavelength conversion module is adapted to convert a first portion of the light beam from the light-diffusion element to a converted light beam. The converted light beam and a second portion of the light beam from the light-diffusion element form a illumination light.

Abstract: A phosphor wheel of a first exemplary embodiment in the present disclosure includes a base plate, an annular phosphor provided on the base plate, and a reflective coating provided on a partial area of the annular phosphor. Further, a phosphor wheel of a second exemplary embodiment includes a base plate, an annular phosphor layer that is provided on the base plate and constituted by a plurality of phosphor segments, and a reflective coating provided on a partial area of the annular phosphor layer.

Abstract: An illumination apparatus includes a first condenser lens configured to collect illumination light including light from the wavelength conversion element, a first lens array including a plurality of lens cells and configured to divide the illumination light from the first condenser lens into a plurality of light fluxes, a second lens array including a plurality of corresponding lens cells configured to receive the light flux from each of the plurality of lens cells in the first lens array. The first condenser lens has a spherical aberration that collects the illumination light at a position on a light source side of the first lens array, and/or a surface apex of a first lens cell disposed on an optical axis side in the first lens array is more eccentric from a contour center of the first lens cell.

Abstract: A wavelength-converting wheel has a light incident side. The wavelength-converting wheel includes a disc, a heat conductive glue, a reflective layer, a plurality of protrusions, a heat conductive glue, and a wavelength-converting layer. The disc has an inner ring portion and an annular portion. The annular portion is connected to an outer edge of the inner ring portion. The annular portion includes a protrusion structure region. The protrusions are disposed in the protrusion structure region and protrude toward the light incident side. The heat conductive glue is disposed on the protrusion structure region. The reflective layer is disposed on the heat conductive glue. The wavelength-converting layer is disposed on the reflective layer and has a light receiving surface facing the light incident side.

Abstract: A light source apparatus according to an aspect of the invention includes an excitation light source that emits excitation light, a wavelength conversion layer on which the excitation light is incident and which converts the wavelength of the excitation light to emit fluorescence, a plurality of traveling direction changers that are formed in the wavelength conversion layer and change the traveling direction of the fluorescence, and a substrate on which the wavelength conversion layer is provided. The substrate is rotated around an axis of rotation to change the position on which the excitation light is incident on the wavelength conversion layer over time, and the interval between the plurality of traveling direction changers is smaller than the size of the region on which the excitation light is incident.

Abstract: A screen that diffuses and reflects image light projected by a projector, includes an uneven half mirror structure body which includes a first transparent substrate and a semitransparent reflective layer, and a second transparent substrate bonded to the uneven half mirror structure body on the surface of the uneven shape with a transparent material. The first transparent substrate has an uneven shape on one surface of the first transparent substrate. The semitransparent reflective layer is provided on the surface of the uneven shape and configured to reflect a part of light and transmit the remaining light. One of the first transparent substrate and the second transparent substrate disposed closer to a projection side than the semitransparent reflective layer is made of a material exhibiting birefringence of less than or equal to 500 nm.

Abstract: A reticle used for collecting information for image-error compensation is provided. The reticle includes a first black border structure and a second black border structure formed over a substrate. The first and second black borders are concentric with a center of the substrate. The reticle further includes a first image structure and a second image structure formed over the substrate. The first and second image structures each has patterns representing features to be patterned on a semiconductor wafer. In a direction away from the center of the substrate, the second image structure, the second black border structure, the first image structure and the first black border structure are arranged in order.

Abstract: A mask blank having a resist layer, which enables charge-up to be suppressed during electron beam irradiation. The mask blank having a resist layer includes a substrate having a thin film, a resist layer formed on a surface of the thin film, and a conductive layer formed on the resist layer. The conductive layer includes a first metal layer containing aluminum as a main component thereof and a second metal layer made of a metal other than aluminum. The first metal layer is formed on the resist layer side of the second metal layer.

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which method includes: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.

Abstract: A photomask blank has on a transparent substrate, an optional first film, a second film, a third film, and a fourth film. The first and third films are formed of silicon-containing materials which are resistant to chlorine base dry etching and removable by fluorine base dry etching. The second and fourth films are formed of chromium-containing materials which are resistant to fluorine base dry etching and removable by chlorine base dry etching. An etching clear time of the fourth film is longer than an etching clear time of the second film, on chlorine base dry etching.

Abstract: This mask blank is provided with a light blocking film on a light transmitting substrate. The light blocking film has an optical density of 2.5 or more with respect to ArF excimer laser exposure light, and has a structure that comprises three or more multilayer structures, each of which is composed of a high nitride layer and a low nitride layer. The high nitride layer and the low nitride layer are formed from a material that is composed of silicon and nitrogen or a material that contains one or more elements selected from among semimetal elements and non-metal elements in addition to silicon and nitrogen. The high nitride layer has a nitrogen content of 50 atom % or more, and has a thickness of 10 nm or more. The low nitride layer has a nitrogen content of less than 50 atom %, and has a thickness that is not less than twice the thickness of the high nitride layer.

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.

Abstract: There is provided a method for procuring an agglutinant structure or in particular an agglutinant layer, from an agglutinant material, which is laid on an end face of a pellicle frame for gluing the pellicle to a photomask, wherein the agglutinant material is processed into the agglutinant layer passing through one more stages wherein the material is under a helium gas atmosphere; the invention is also about a manufacturing method of a pellicle wherein the agglutinant layer is procured in the above described manner.

Abstract: The present disclosure relates to a method for forming a carbon nanotube pellicle membrane for an extreme ultraviolet lithography reticle, the method comprising: bonding together overlapping carbon nanotubes of at least one carbon nanotube film by pressing the at least one carbon nanotube film between a first pressing surface and a second pressing surface, thereby forming a free-standing carbon nanotube pellicle membrane. The present disclosure also relates to a method for forming a pellicle for extreme ultraviolet lithography and for forming a reticle system for extreme ultraviolet lithography respectively.

Abstract: A template for imprint lithography can include a body. The body can include a base surface and a recession extending from the base surface. The recession can have steps and a feature. The steps can include a distal step that is farther from the base surface as compared to any other step, each step having a corresponding height. The feature can include the distal step includes a rounded or tapered sidewall; a surface along a deepest part of the recession is non-planar; or the height corresponding to the distal step is different from an average height corresponding to remaining steps. The template can be used in an imprint lithography apparatus. The template can be used in manufacturing articles when patterning different layers at the same time. The template is well suited for forming 3D memory arrays.

Abstract: Various compositions encompassing polymers containing acidic pendent groups in combination with one or more reactive olefinic compounds and a photoacid generators form self-imagable negative tone films. Examples of such polymers include polymers and copolymers containing norbornene-type repeating units having acidic pendent groups, ring opened maleic anhydride polymers, polyacrylic acid, polyhydroxystyrene polymers, and the like. The films formed from such compositions provide self imagable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices, among other applications.

Abstract: A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.

Abstract: Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A modular hydraulic unit houses the elongate bladder and hydraulic fluid in contact with an exterior surface of the bladder. When pressurized process fluid is in the elongate bladder, hydraulic controls can selectively reduce pressure on the bladder to cause expansion, and then selectively increase hydraulic pressure to assist with a dispense action.

Abstract: The present invention provides a process and a structure of forming conductive vias using a light guide. In an exemplary embodiment, the process includes providing a via in a base material in a direction perpendicular to a plane of the base material, applying a photoresist layer to an interior surface of the via, inserting a light guide into the via, exposing, by the light guide, a portion of the photoresist layer to light, thereby resulting in an exposed portion of the photoresist layer and an unexposed portion of the photoresist layer, removing a portion of the photoresist layer, and plating an area of the via, where the photoresist has been removed, with a metal, thereby resulting in a portion of the via plated with metal and a portion of the via not plated with metal.

Abstract: The present disclosure provides a method for manufacturing an array substrate and a method for manufacturing a liquid crystal antenna, and relates to the technical field of liquid crystal antennas and array substrates. The method for manufacturing an array substrate includes: sequentially depositing a metal material layer and a photoresist material layer on a substrate to form a plurality of metal patterns and a plurality of photoresist patterns on the plurality of metal patterns; and forming a light-shielding material between at least two adjacent metal patterns such that the light-shielding material and the plurality of photoresist patterns have opposite hydrophobicity-hydrophilicity; curing the light-shielding material to form at least one light-shielding pattern such that a thickness of the at least one light-shielding pattern is the same as a thickness of the plurality of metal patterns; and removing the plurality of photoresist patterns.

Abstract: An extreme ultraviolet light generation device includes: a target supply unit outputting a plurality of targets along a trajectory toward a plasma generation region; a laser device emitting laser light toward the plasma generation region; an image capturing unit having an image capturing direction non-orthogonal and non-parallel to the trajectory, capturing an image of a region including the plasma generation region, and outputting image data; an illumination unit outputting illumination light to the region including the plasma generation region; an image capturing position change unit changing an image capturing position of the image capturing unit along the image capturing direction; a movement amount determination unit determining an movement amount of the image capturing position based on the image data; and a control unit controlling the image capturing position change unit based on the movement amount determined by the movement amount determination unit.

Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.

Abstract: A shutter device for use in exposure by a photolithography machine and a method of using the shutter device are disclosed. The device includes a shutter blade (1); a rotating motor (2) for driving the shutter blade (1) to rotate; a controller in electric connection with the rotating motor (2); and a supporter (3) for supporting the rotating motor (2). The shutter blade (1) includes a rotation center (11) and, disposed in correspondence with the rotation center (11), at least one open portion (12) and at least one shielding portion (13). The rotation center (11) is coupled to the rotating motor (2) which drives the shutter blade (1) to rotate so that the shutter device opening and closure are accomplished to enable and disable exposure. The shielding portion (13) includes a hollow portion (131) which significantly reduces the mass of the shutter blade (1), thereby facilitating the control over the rotation of the shutter blade (1).

Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.

Abstract: A method comprises disposing a photosensitive film layer on a surface of a substrate layer and placing a variable neutral density (ND) filter such that a surface of the variable ND filter faces an exposure region of the photosensitive film layer. The variable ND filter is a thin film that has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region to cancel out an uneven power distribution in an intermediate interference exposure pattern at the exposure region of the photosensitive film layer. The method further comprises arranging one or more laser generators such that at least two generated beams of light from the one or more laser generators intersect with each other and form the intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region.

Abstract: An extreme ultraviolet lithography system (10) that creates a new pattern (330) having a plurality of densely packed parallel lines (332) on a workpiece (22), the system (10) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13B) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22) to create a first stripe (364) of generally parallel lines (332) during a first scan (365); and a control system (24). The workpiece (22) includes an existing pattern (233) that is distorted. The control system (24) selectively adjusts a control parameter during the first scan (365) so that the first stripe (364) is distorted to more accurately overlay the portion of existing pattern (233) positioned under the first stripe (364).

Abstract: A method including determining a first color pattern and a second color pattern associated with a hot spot of a design layout pattern, the design layout pattern configured for transfer to a substrate, and predicting, by a hardware computer system, whether there would be a defect at the hot spot on the substrate caused by overlay error, based at least in part on a measurement of an overlay error between the first color pattern and the second color pattern.

Abstract: An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.

Abstract: This document describes a method of determining an overlay error during manufacturing of a multilayer semiconductor device. Manufacturing of the semiconductor device comprises forming a stack of material layers comprising depositing of at least two subsequent patterned layers of semiconductor material, the patterned layers comprising a first patterned layer having a first marker element and a second patterned layer having a second marker element. The determining of the overlay error comprises determining relative positions of the first and second marker element in relation to each other, such as to determine the overlay error between the first patterned layer and the second patterned layer. In addition an imaging step is performed on at least one of said first and second patterned layer, for determining relative positions of the respective first or second marker element and a pattern feature of a device pattern comprised by said respective first and second patterned layer.

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, a target droplet generator, an exhaust module, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to the chamber. The exhaust module is configured to extract debris corresponding to the target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The controller is configured to adjust the first gas flow rate according to the measured concentration of the debris.

Abstract: A projection exposure apparatus (400) for semiconductor lithography contains at least one partial volume (4) that is closed off from the surroundings. The partial volume (4) contains a gas, from which a plasma can be produced. Conditioning elements (20, 21, 22, 23, 24, 25) for conditioning the plasma, in particular for neutralizing the plasma, are present in the partial volume. An associated method for operating a projection exposure apparatus is also disclosed.

Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

Abstract: An electrophotographic photoreceptor includes a conductive substrate; an undercoat layer on the conductive substrate, the undercoat layer containing at least one perinone compound selected from the group consisting of a compound represented by general formula (1) and a compound represented by general formula (2) below, metal oxide particles of at least one type selected from the group consisting of aluminum oxide particles, iron oxide particles, copper oxide particles, magnesium oxide particles, calcium oxide particles, and silicon dioxide particles, and a binder resin, the undercoat layer having a thickness of 1 ?m or more and 10 ?m or less; and a photosensitive layer on the undercoat layer.

Abstract: A white toner for electrostatic image development includes toner particles containing a binder resin, which contains at least a crystalline polyester resin and an amorphous polyester resin, and a white pigment. The loss tangent tan ? at 30° C. determined by dynamic viscoelasticity measurement is 0.2 or more and 1.0 or less.

Abstract: A toner is provided that contains a crystalline polyester resin comprising a polycondensed resin of a dicarboxylic acid represented by the following formula (1) with a diol represented by the following formula (2). A content of a cyclic ester represented by the following formula (3) in the toner, measured by a thermal extraction gas chromatographic mass spectrometry at a thermal extraction temperature of 160° C., is from 1 to 200 ppm in terms of toluene: where n represents an integer of from 2 to 12; where m represents an integer of from 2 to 12; and where n represents an integer of from 2 to 12, m represents an integer of from 2 to 12, and m+n?6 is satisfied.

Abstract: A toner includes toner particles, wherein the toner particles contain a polymer containing a structural unit derived from an azobenzene derivative having a polymerizable group.

Abstract: An image forming apparatus includes an image holding body that holds an image to be transferred to a recording material; a developing unit that causes a mixture, in which plural kinds of developers are mixed, to adhere to the image holding body and that forms an image on the image holding body; a transfer unit that transfers an image formed on the image holding body to a recording material; and a change portion that changes a transfer condition that is a condition under which the transfer unit performs transfer so that a ratio of the plural kinds of developers in the image to be transferred to a recording material becomes close to a predetermined ratio.

Abstract: To provide a developing roller having improved toner conveying force in a high-temperature and high-humidity environment. The developing roller has a substrate and an electro-conductive layer on the substrate. The outer surface of the developing roller has an electrical insulating first region and an electro-conductive second region adjacent to the first region and at the same time has at least one groove in the first region.

Abstract: There are provided a developing roller having no risks of the image density of formed images rapidly decreasing and the occurrence of an uneven density since a toner transportation amount does not decrease greatly even if image formation is repeated, and a method of producing the same. In a developing roller, a plurality of recesses are disposed on an outer circumferential surface of a roller main body so that a ratio PA/PC of a pitch PA in an axial direction on the outer circumferential surface to a pitch PC in a circumferential direction is set to a range exceeding 1.1. The production method includes a process of forming the recesses on the outer circumferential surface by laser processing.

Abstract: A toner cartridge for use with an image forming apparatus includes a memory storing identification data of the toner cartridge and parameter information including image formation process parameters dependent on toner characteristic or ambient conditions. A transceiver unit communicates with the image forming apparatus to send the process parameter information stored in the memory to the image forming apparatus when the identification data is authentic.