Patents Issued in October 14, 2021
  • Publication number: 20210317544
    Abstract: The invention relates to a method for producing an ultra-high-strength hot-rolled structural steel, wherein a steel is produced with a carbon content that is not greater than 0.
    Type: Application
    Filed: September 17, 2019
    Publication date: October 14, 2021
    Inventors: Markus Sonnleitner, Thomas Kurz, Martin Klein, Gerhard Hubmer, Helmut Spindler
  • Publication number: 20210317545
    Abstract: An embodiment of the present invention provides a grain-oriented electrical steel sheet, including: a linear groove formed in a direction crossing a rolling direction on one surface or both surfaces of an electrical steel sheet; and a linear thermal shock portion formed in the direction crossing the rolling direction on one surface or both surfaces of the electrical steel sheet. The groove is formed in plural along the rolling direction, a distance D2 between the groove and the thermal shock portion is 0.2 to 0.5 times a distance D1 between the grooves, and a distance D3 between the thermal shock portions is 0.2 to 3.0 times the distance D1 between the grooves.
    Type: Application
    Filed: May 23, 2019
    Publication date: October 14, 2021
    Inventors: Oh-Yeoul Kwon, Jong-Tae Park, Woo-Sin Kim, Chang-Ho Kim, Hyun-Chul Park, Won-Gul Lee, Oho-Cheal Kwon
  • Publication number: 20210317546
    Abstract: This invention deals with a system using aqueous means for solubilizing chemical components contained in sulphur type ore concentrate which may contain iron, cobalt, niquel, copper, platinum group metals and other metals considered valuable and of commercial interest. Apart from that, a method using aqueous means for solubilizing such components is described.
    Type: Application
    Filed: August 27, 2019
    Publication date: October 14, 2021
    Inventor: Victor ANTONUCCI SALAZAR
  • Publication number: 20210317547
    Abstract: The invention relates to hydrometallurgical method for recovering metals from spent energy storage devices. The method comprises combining aqueous hydrobromic acid leach solution and an electrode material of spent energy storage devices in a reaction vessel, dissolving the metals contained in the electrode material to form soluble metal bromide salts, removing elemental bromine, if formed, from the reaction vessel, separating insoluble material, if present, from the leach solution to obtain a metal-bearing solution and isolating one or more metals from said metal-bearing solution.
    Type: Application
    Filed: August 4, 2019
    Publication date: October 14, 2021
    Inventors: Or PRESS FRIMET, Mohamad MASARWA, Yaniv ENGLERT, Eyal BARNEA
  • Publication number: 20210317548
    Abstract: According to one aspect of the invention, a system to separate salt from uranium. The system has a vessel, a heater, a pump, and a condenser. The vessel is adapted to receive a uranium that has a salt concentration. The heater heats the uranium for a period of time, causing the salt to turn into a salt vapor and the uranium to melt. The melted uranium releases the salt vapor. The pump circulates an inert gas that carries the salt vapor away from the melted uranium. The condenser is adapted to receive the salt vapor.
    Type: Application
    Filed: April 10, 2020
    Publication date: October 14, 2021
    Inventors: Mark A. Williamson, James L. Willit, Stanley G. Wiedmeyer, Terry R. Johnson, Javier Figueroa, Terry Alan Cruise
  • Publication number: 20210317549
    Abstract: An aluminum magnesium alloy with reduced Samson phase at grain boundaries made from the method of providing aluminum in a container, adding boron to the container, providing an inert atmosphere, arc-melting the aluminum and the boron, and mixing the aluminum and the boron in the container to form an alloy mixture. A method of suppressing the Samson phase, Al3Mg2, at grain boundaries in Aluminum, comprising providing aluminum in a container, adding boron to the container, providing an inert atmosphere, arc-melting the aluminum and the boron, and mixing the aluminum and the boron in the container to form an alloy mixture.
    Type: Application
    Filed: May 4, 2021
    Publication date: October 14, 2021
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Ramasis Goswami, Syed B. Qadri
  • Publication number: 20210317550
    Abstract: The present invention provides a corrosion-resistant CuZn alloy, the alloy having a Zn content of from 15 to 55% by mass, the balance being Cu and inevitable impurities, wherein a total content of Zn and Cu is 99.995% by mass or more, and wherein a number of pores is 1/cm2 or less based on optical microscopic observation.
    Type: Application
    Filed: September 25, 2018
    Publication date: October 14, 2021
    Applicant: JX Nippon Mining & Metals Corporation
    Inventor: Masahiro TAKAHATA
  • Publication number: 20210317551
    Abstract: Provided is an aluminum alloy member for forming a fluoride film thereon, the fluoride film being excellent in smoothness without occurrence of a black dot-shaped bulged portion and excellent in corrosion resistance against corrosive gas and plasma, etc. The aluminum alloy member for forming a fluoride film thereon 1 for use in a semiconductor producing apparatus consists of Si: 0.3 mass % to 0.8 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0 mass % or more and 0.5 mass % or less; Mn: 0 mass % or more and 0.30 mass % or less; Cr: 0 mass % or more and 0.30 mass % or less 0.5 mass % or less; and the balance being Al and inevitable impurities. When an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (?m), and an average crystalline particle diameter in the aluminum alloy member is Y (?m), a relation expression of log10 Y?0.320D+4.60 is satisfied.
    Type: Application
    Filed: April 19, 2019
    Publication date: October 14, 2021
    Applicant: SHOWA DENKO K.K.
    Inventor: Isao MURASE
  • Publication number: 20210317552
    Abstract: Disclosed are a composition for an Fe-based alloy and an Fe-based amorphous alloy powder, whereby a high-purity amorphous structure is maintained even after coating by thermal spraying or the like, but also various physical properties are improved. The composition for the Fe-based alloy includes iron, chromium, and molybdenum, wherein per 100 parts by weight of the iron, the chromium is contained in an amount of 25.4 to 55.3 parts by weight, the molybdenum is contained in an amount of 35.6 to 84.2 parts by weight, and at least one of carbon and boron is further contained.
    Type: Application
    Filed: July 11, 2019
    Publication date: October 14, 2021
    Inventor: Choongnyun Paul Kim
  • Publication number: 20210317553
    Abstract: The seamless steel pipe according to the present disclosure has a chemical composition consisting of, in mass %, C: 0.15 to 0.45%, Si: 0.05 to 1.00%, Mn: 0.01 to 1.00%, P: 0.030% or less, S: 0.0050% or less, Al: 0.005 to 0.070%, Cr: 0.30 to 1.50%, Mo: 0.25 to 2.00%, Ti: 0.002 to 0.020%, Nb: 0.002 to 0.100%, B: 0.0005 to 0.0040%, rare earth metal: 0.0001 to 0.0015%, Ca: 0.0001 to 0.0100%, N: 0.0100% or less and O: 0.0020% or less, with the balance being Fe and impurities, and satisfying Formula (1) described in the description. A predicted maximum major axis of inclusions is 150 ?m or less, the predicted maximum major axis being predicted by means of extreme value statistical processing. The yield strength is within a range of 758 to 862 MPa.
    Type: Application
    Filed: September 26, 2019
    Publication date: October 14, 2021
    Inventors: Hiroki KAMITANI, Nobuaki KOMATSUBARA, Seiya OKADA, Atsushi SOMA, Yuji ARAI, Shinji YOSHIDA
  • Publication number: 20210317554
    Abstract: An ultra high strength and high ductility steel sheet having an excellent yield ratio contains, in weight %, 0.1-0.3% of carbon (C), 2% or less of silicon (Si), 6-10% of manganese (Mn), 0.05% or less of phosphorus (P), 0.02% or less of sulfur (S), 0.02% or less of nitrogen (N), 0.5% or less (excluding 0%) of aluminum (Al), and the balance Fe and inevitable impurities, and further contains at least one selected from the group consisting of 0.1% or less of titanium (Ti), 0.1% or less of niobium (Nb), 0.2% or less of vanadium (V), and 0.5% or less of molybdenum (Mo), wherein the ultrahigh-strength and high-ductility steel sheet comprises 20 area % or more of residual austenite as a microstructure, the average aspect ratio of the residual austenite being 2.0 or higher.
    Type: Application
    Filed: September 3, 2019
    Publication date: October 14, 2021
    Inventors: Joo-Hyun RYU, Kyoo-Young LEE, Sea-Woong LEE
  • Publication number: 20210317555
    Abstract: Alloy compositions, structures, and production methods for an appropriate slit cut surface shape improve productivity by increasing welding speed and stabilizing quality during high speed welding in Ti-containing Fe—Ni—Cr alloy production. The Ti-containing Fe—Ni—Cr alloy contains, hereinafter in weight %, C: 0.001 to 0.03%, Si: 0.05 to 1.25%, Mn: 0.10 to 2.00%, P: 0.001 to 0.030%, S: 0.0001 to 0.0030%, Ni: 15 to 50%, Cr: 17 to 25%, Al: 0.10 to 0.80%, Ti: 0.10 to 1.5%, N: 0.003 to 0.025%, 0: 0.0002 to 0.007%, Fe as a remainder, and inevitable impurities, and when the number and size of titanium nitrides contained in material are evaluated in a freely selected field of view of 5 mm2, the titanium nitrides having sizes of not more than 15 ?m are not less than 99.3% of total of the titanium nitrides.
    Type: Application
    Filed: September 17, 2019
    Publication date: October 14, 2021
    Applicant: Nippon Yakin Kogyo Co., Ltd.
    Inventors: Toshio MIURA, Kazuhito TAKIMOTO, Fumiaki KIRIHARA, Shigeru HIRATA
  • Publication number: 20210317556
    Abstract: The seamless steel pipe according to the present disclosure includes a chemical composition consisting of, in mass %, C: 0.030% or less, Si: 1.00% or less, Mn: 1.00% or less, P: 0.030% or less, S: 0.0050% or less, Al: 0.001 to 0.100%, N: 0.0500% or less, O: 0.050% or less, Ni: 5.00 to 6.50%, Cr: more than 10.00 to 13.40%, Cu: more than 1.50 to 3.50%, Mo: 1.00 to 4.00%, V: 0.01 to 1.00%, Ti: 0.050 to 0.300%, and Co: 0.010 to 0.300%, with the balance being Fe and impurities, and satisfying Formula (1), wherein a depassivation pH of an inner surface is 3.00 or less. Cr+2.0Mo+0.5Ni+2.0Cu+0.5Co?20.
    Type: Application
    Filed: October 1, 2019
    Publication date: October 14, 2021
    Inventors: Kyohei KANKI, Masayuki SAGARA, Yusaku TOMIO, Daisuke MATSUO
  • Publication number: 20210317557
    Abstract: The present invention provides a highly fracture resistant, fatigue resistant copper-based alloy material and the like for which, for example, even when the material is subjected to repeated deformation consisting of loading of stress for applying a shape-memory alloy-specific strain and unloading of same followed return to the original shape, the alloy material is not susceptible to persistence of such strain. This copper-based alloy material has a multiphase structure in which a B2-type crystal structure precipitated phase is dispersed in a ?-phase-comprising matrix.
    Type: Application
    Filed: August 30, 2019
    Publication date: October 14, 2021
    Applicants: FURUKAWA TECHNO MATERIAL CO., LTD., TOHOKU UNIVERSITY, FURUKAWA ELECTRIC CO., LTD.
    Inventors: Sumio KISE, Fumiyoshi YAMASHITA, Misato FUJII, Koji ISHIKAWA, Ryosuke KAINUMA, Toshihiro OMORI, Nobuyasu MATSUMOTO
  • Publication number: 20210317558
    Abstract: A surface to be coated of a component is roughened by a laser. The roughened surface is coated by cold spraying. A component may be produced according to the method, which is coated with a layer.
    Type: Application
    Filed: August 19, 2019
    Publication date: October 14, 2021
    Inventors: Tobias Kalfhaus, Caren S. Gatzen, Daniel E. Mack, Robert Edward Vaßen
  • Publication number: 20210317559
    Abstract: A method of forming an oxide layer in an in-situ steam generation (ISSG) process, including providing a silicon substrate in a rapid thermal process (RTP) chamber and injecting a gas mixture into the RTP chamber. The method further includes heating a surface of the silicon substrate to a reaction temperature, so that the gas mixture reacts close to the surface to form steam and thereby oxidize the silicon substrate to form the oxide layer on the surface, and wherein the gas mixture comprises hydrogen (H2), oxygen (O2) and nitrous oxide (N2O).
    Type: Application
    Filed: April 12, 2021
    Publication date: October 14, 2021
    Applicant: X-FAB France SAS
    Inventors: Sotirios ATHANASIOU, Laurence VALLIER
  • Publication number: 20210317560
    Abstract: The present disclosure provides systems and methods that employ slurries to form layers adjacent to substrates. Such layers can include, for example, one or more of iron, chromium, nickel, silicon, vanadium, titanium, boron, tungsten, aluminum, molybdenum, cobalt, manganese, zirconium, and niobium, oxides thereof, nitrides thereof, sulfides thereof, or combinations thereof. In some examples, such layers are stainless steel layers.
    Type: Application
    Filed: November 20, 2020
    Publication date: October 14, 2021
    Inventors: Joseph E. McDermott, Adam G. Thomas, Zachary M. Detweiler
  • Publication number: 20210317561
    Abstract: Techniques are provided for making a coated article including an antibacterial and/or antifungal coating. In certain example embodiments, the method includes providing a first sputtering target including Zr; providing a second sputtering target including Zn; and co-sputtering from at least the first and second sputtering targets in the presence of nitrogen to form a layer including ZnxZryNz on a glass substrate. These layers may be heat-treated or thermally tempered to form a single layer including ZnxZryOz. In other examples, two discrete layers of Zn and Zr may be formed. The coating may be heated or tempered to form a single layer including ZnxZryOz. Coated articles made using these methods may have antibacterial and/or antifungal properties.
    Type: Application
    Filed: April 16, 2021
    Publication date: October 14, 2021
    Applicant: GUARDIAN GLASS, LLC
    Inventors: Rudolph Hugo Petrmichl, Jiangping Wang, Jason Barber
  • Publication number: 20210317562
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Application
    Filed: June 25, 2021
    Publication date: October 14, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo AOKI, Chikao IKENAGA, Isao INOUE
  • Publication number: 20210317563
    Abstract: A chamber component for a process chamber comprises a ceramic body and one or more protective layer on at least one surface of the ceramic body, wherein the one or more protective layer comprises Y3Al5O12 having a dielectric constant of 9.76+/?up to 30% and a hermiticity of 4.4E-10 cm3/s+/?up to 30%.
    Type: Application
    Filed: June 4, 2021
    Publication date: October 14, 2021
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Tom Cho
  • Publication number: 20210317564
    Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.
    Type: Application
    Filed: April 10, 2020
    Publication date: October 14, 2021
    Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
  • Publication number: 20210317565
    Abstract: Sputter depositing a metallic layer on a substrate in the fabrication of a resonator device includes providing a magnetron sputtering apparatus comprising a chamber, a substrate support disposed within the chamber, a target made from a metallic material, and a plasma generating device, wherein the substrate support and the target are separated by a distance of 10 cm or less; supporting the substrate on the substrate support; performing a DC magnetron sputtering step that comprises sputtering the metallic material from the target onto the substrate so as to form a metallic layer on the substrate, wherein during the DC magnetron sputtering step the chamber has a pressure of at least 6 mTorr of a noble gas, the target is supplied with a power having a power density of at least 6 W/cm2, and the substrate has a temperature in the range of 200-600° C.
    Type: Application
    Filed: March 9, 2021
    Publication date: October 14, 2021
    Inventors: Scott Haymore, Adrian Thomas, Steve Burgess
  • Publication number: 20210317566
    Abstract: A composite coating layer for coating a NdFeB rare earth magnet includes a first coating layer and a second coating layer formed over a surface of the first coating layer. The first coating layer includes a Nd coating layer, a Pr coating layer, or an alloy coating layer including two or more of Nd, Pr, and Cu. The second coating layer includes a Tb coating layer.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 14, 2021
    Inventors: Guoan CHEN, Bin FANG, Haojie WANG, Yugang ZHAO
  • Publication number: 20210317567
    Abstract: An arc ignition device for cathodic arc deposition of a target material onto a substrate, comprising a trigger finger arranged moveable between a contacting position and a resting position, wherein in the contacting position a side surface of an adjacent target can be physically contacted by the trigger finger, and in the resting position the adjacent target cannot be contacted by the trigger finger, wherein during cathodic arc deposition of a target material, the trigger finger is arranged movable between the contacting position and the resting position in such a way that the contamination of the trigger finger with deposited target material during the cathodic arc deposition of the target material can be minimized.
    Type: Application
    Filed: June 15, 2021
    Publication date: October 14, 2021
    Inventors: Siegfried Krassnitzer, Juerg Hagmann, Andreas Peter Treuholz, Dominik Erwin Widmer
  • Publication number: 20210317568
    Abstract: Methods and apparatus for passivating a target are provided herein. For example, a method includes a) supplying an oxidizing gas into an inner volume of the process chamber; b) igniting the oxidizing gas to form a plasma and oxidize at least one of a target or target material deposited on a process kit disposed in the inner volume of the process chamber; and c) performing a cycle purge comprising: c1) providing air into the process chamber to react with the at least one of the target or target material deposited on the process kit; c2) maintaining a predetermined pressure for a predetermined time within the process chamber to generate a toxic by-product caused by the air reacting with the at least one of the target or target material deposited on the process kit; and c3) exhausting the process chamber to remove the toxic by-product.
    Type: Application
    Filed: April 13, 2020
    Publication date: October 14, 2021
    Inventors: Chao DU, Xing CHEN, Keith A. MILLER, Jothilingam RAMALINGAM, Jianxin LEI
  • Publication number: 20210317569
    Abstract: A method of sputtering a layer on a substrate using a high-energy density plasma (HEDP) magnetron includes positioning the magnetron in a vacuum with an anode, cathode target, magnet assembly, substrate, and feed gas; applying unipolar negative direct current (DC) voltage pulses from a pulse power supply with a pulse forming network (PFN) to a pulse converting network (PCN); and adjusting an amplitude and frequency associated with the plurality of unipolar negative DC voltage pulses causing a resonance mode associated with the PCN. The PCN converts the unipolar negative DC voltage pulses to an asymmetric alternating current (AC) signal that generates a high-density plasma discharge on the HEDP magnetron.
    Type: Application
    Filed: June 18, 2021
    Publication date: October 14, 2021
    Applicant: IonQuest Corp.
    Inventor: Bassam Hanna Abraham
  • Publication number: 20210317570
    Abstract: Methods for selectively depositing on surfaces are disclosed. Some embodiments of the disclosure utilize an organometallic precursor that is substantially free of halogen and substantially free of oxygen. Deposition is performed to selectively deposit a metal film on a non-metallic surface over a metallic surface. Some embodiments of the disclosure relate to methods of gap filling.
    Type: Application
    Filed: April 14, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Byunghoon Yoon, Wei Lei, Sang Ho Yu
  • Publication number: 20210317571
    Abstract: The present invention is an artificial diamond production device. A reaction chamber has a window. The diamond holder has a focus area facing toward the window. The microwave transmitting module is disposed outside the reaction chamber and has a microwave generator, a focusing-lens assembly, and a focusing mechanism. The microwave generator emits the microwave into the diamond holder via the window. The focusing-lens assembly is disposed between the diamond holder and the microwave generator. The focusing mechanism is connected to the focusing-lens assembly and a distance between the focusing-lens assembly and the microwave generator is changed by the focusing mechanism to focus the microwave on the focus area to improve the efficiency of producing artificial diamonds.
    Type: Application
    Filed: April 13, 2020
    Publication date: October 14, 2021
    Applicant: WAVE POWER TECHNOLOGY INC.
    Inventors: Ming-Hsiung TSAO, Hsuan-Hao TENG, Han-Ying CHEN
  • Publication number: 20210317572
    Abstract: Described are yttrium fluoride compositions, including deposited films, e.g., coatings, that contain yttrium fluoride; methods of preparing yttrium fluoride compositions and deposited film coatings that contain yttrium fluoride; as well as substrates that have a deposited film coating that contains yttrium fluoride at a surface and methods and equipment that include the substrates.
    Type: Application
    Filed: April 14, 2021
    Publication date: October 14, 2021
    Inventors: Carlo WALDFRIED, Stephen LONGO, Parul TYAGI
  • Publication number: 20210317573
    Abstract: Embodiments described and discussed herein provide methods for selectively depositing a metal oxides on a substrate. In one or more embodiments, methods for forming a metal oxide material includes positioning a substrate within a processing chamber, where the substrate has passivated and non-passivated surfaces, exposing the substrate to a first metal alkoxide precursor to selectively deposit a first metal oxide layer on or over the non-passivated surface, and exposing the substrate to a second metal alkoxide precursor to selectively deposit a second metal oxide layer on the first metal oxide layer. The method also includes sequentially repeating exposing the substrate to the first and second metal alkoxide precursors to produce a laminate film containing alternating layers of the first and second metal oxide layers. Each of the first and second metal alkoxide precursors contain different types of metals which are selected from titanium, zirconium, hafnium, aluminum, or lanthanum.
    Type: Application
    Filed: June 16, 2020
    Publication date: October 14, 2021
    Inventors: Keith Tatseun WONG, Srinivas D. NEMANI, Andrew C. KUMMEL, James HUANG, Yunil CHO
  • Publication number: 20210317574
    Abstract: The present invention relates to a substrate processing apparatus, and more particularly, the substrate processing apparatus includes a gas utility exhausting each of the reaction space and the protective space so that a pressure change process including a high-pressure process, which is in a state of a pressure higher than atmospheric pressure, and a low-pressure process that is in a state of a pressure lower than the atmospheric pressure, is performed on a plurality of substrates introduced into the reaction space.
    Type: Application
    Filed: September 9, 2020
    Publication date: October 14, 2021
    Applicant: WONIK IPS CO., LTD.
    Inventors: Seung Seob LEE, Jeong Lim SON, Joo Ho KIM, Kyung PARK, Joo Suop KIM, Young Jun KIM, Byung Jo KIM
  • Publication number: 20210317575
    Abstract: The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which a substrate is processed at a high pressure and a low pressure. The substrate processing apparatus includes an outer tube which defines a protective space therein and has a lower portion in which a first inlet is provided and an inner tube which defines a reaction space therein and has a lower portion in which a second inlet is provided, wherein a portion of the inner tube is accommodated in the outer tube, and the portion, in which the second inlet is provided, protrudes downward from the outer tube.
    Type: Application
    Filed: September 9, 2020
    Publication date: October 14, 2021
    Applicant: WONIK IPS CO., LTD.
    Inventors: Seung Seob LEE, Jeong Lim SON, Joo Ho KIM, Kyung PARK, Joo Suop KIM
  • Publication number: 20210317576
    Abstract: A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system tor forming the material are also disclosed.
    Type: Application
    Filed: June 21, 2019
    Publication date: October 14, 2021
    Inventors: Katja Väyrynen, Timo Hatanpää, Anton Vihervaara, Mikko Ritala, Markku Leskelä
  • Publication number: 20210317577
    Abstract: Gas distribution assemblies and process chamber comprising gas distribution assemblies are described. The gas distribution assembly includes a gas distribution plate, a lid and a primary O-ring. The primary O-ring is positioned between a purge channel of a first contact surface of the gas distribution plate and a second contact surface. Methods of sealing a process chamber using the disclosed gas distribution assemblies are described.
    Type: Application
    Filed: April 9, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Muhannad Mustafa, Muhammad M. Rasheed
  • Publication number: 20210317578
    Abstract: Exemplary semiconductor processing chambers may include a substrate support positioned within a processing region of the semiconductor processing chamber. The chamber may include a lid plate. The chamber may include a gasbox positioned between the lid plate and the substrate support. The gasbox may be characterized by a first surface and a second surface opposite the first surface. The gasbox may define a central aperture. The gasbox may define an annular channel in the first surface of the gasbox extending about the central aperture through the gasbox. The gasbox may include an annular cover extending across the annular channel defined in the first surface of the gasbox. The chamber may include a blocker plate positioned between the gasbox and the substrate support. The chamber may include a ferrite block positioned between the lid plate and the blocker plate.
    Type: Application
    Filed: April 9, 2020
    Publication date: October 14, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Shuran Sheng, Lin Zhang, Joseph C. Werner
  • Publication number: 20210317579
    Abstract: A method includes: supporting a rear surface of a substrate with a front surface thereof oriented upward to form a gap between the rear surface and a guide surface facing the rear surface; exhausting the gas outward of the substrate; and forming a thin film on the rear surface through vapor deposition by supplying a raw material gas from a side of the guide surface into the gap via a gas ejection port and heating the gas. The method has at least one of conditions including (a) the forming includes changing, during film formation, a height of the gap from one of a first value and a second value smaller than the first value to the other, and (b) the forming includes changing, during film formation, a ratio of flow rates of the gas ejected from first and second gas ejection ports formed at different radial positions on the substrate.
    Type: Application
    Filed: August 9, 2019
    Publication date: October 14, 2021
    Inventor: Koichi MATSUNAGA
  • Publication number: 20210317580
    Abstract: Embodiments herein provide for oxygen based treatment of low-k dielectric layers deposited using a flowable chemical vapor deposition (FCVD) process. Oxygen based treatment of the FCVD deposited low-k dielectric layers desirably increases the Ebd to capacitance and reliability of the devices while removing voids.
    Type: Application
    Filed: April 14, 2020
    Publication date: October 14, 2021
    Inventors: Shi YOU, He REN, Naomi YOSHIDA, Nikolaos BEKIARIS, Mehul NAIK, Martin Jay SEAMONS, Jingmei LIANG, Mei-Yee SHEK
  • Publication number: 20210317581
    Abstract: A substrate liquid processing apparatus includes a substrate holder 52 configured to attract, hold and rotate a substrate W; a heating device configured to heat the substrate holder 52 from an outside thereof; a plating liquid supply 53 configured to supply a plating liquid L1 onto the substrate W being rotated while being held by the substrate holder 52; and a controller 3 configured to control operations of the substrate holder 52, the heating device and the plating liquid supply 53. The controller 3 controls the heating device to heat the substrate holder 52 to equal to or higher than 50° C. before the substrate W is held by the substrate holder 52.
    Type: Application
    Filed: July 18, 2019
    Publication date: October 14, 2021
    Inventors: Takafumi Niwa, Yuichiro Inatomi
  • Publication number: 20210317582
    Abstract: Described herein is a composition for filling submicrometer sized features having an aperture size of 30 nanometers or less including a source of copper ions, and at least one suppressing agent selected from compounds of formula I where the R1 radicals are each independently selected from a copolymer of ethylene oxide and at least one further C3 to C4 alkylene oxide, said copolymer being a random copolymer, the R2 radicals are each independently selected from R1 or alkyl, X and Y are spacer groups independently, and X for each repeating unit independently, selected from C1 to C6 alkylene and Z—(O—Z)m where the Z radicals are each independently selected from C2 to C6 alkylene, n is an integer equal to or greater than 0, and m is an integer equal to or greater than 1.
    Type: Application
    Filed: May 25, 2021
    Publication date: October 14, 2021
    Inventors: Cornelia Röger-Göpfert, Roman Benedikt Raether, Charlotte Emnet, Alexandra Haag, Dieter Mayer
  • Publication number: 20210317583
    Abstract: A conversion coating composition for treating a metal surface contains one or more Group IV metal ions, such as titanium, zirconium and/or hafnium metal ions, and one or more phenalkamine compounds, such as a Mannich addition product of cardanol, formaldehyde and a polyamine. The conversion coating composition is an aqueous acidic solution or dispersion. Metal surfaces contacted with the conversion coating composition have enhanced corrosion resistance and paint adhesion characteristics.
    Type: Application
    Filed: June 11, 2021
    Publication date: October 14, 2021
    Inventor: Donald R. Vonk
  • Publication number: 20210317584
    Abstract: A process for manufacturing an abradable layer, includes compressing a powder composition including at least micrometric ceramic particles having a number-average form factor greater than or equal to 3, a mass content of said micrometric ceramic particles in the powder composition being greater than or equal to 85%, the form factor of a particle being defined as the ratio [largest dimension of the particle]/[largest cross-sectional dimension of the particle], and sintering the powder composition thus compressed to obtain the abradable layer, wherein a temperature imposed during sintering, the sintering time and the compression pressure applied are selected so as to obtain a volume porosity rate of the abradable layer greater than or equal to 20%.
    Type: Application
    Filed: June 20, 2019
    Publication date: October 14, 2021
    Inventors: Serge Georges Vladimir SELEZNEFF, Philippe Charles Alain LE BIEZ, Arnaud Louis Gabriel FREGEAC, Florence ANSART, Claude Gilbert Jean-Pierre ESTOURNES
  • Publication number: 20210317585
    Abstract: The invention concerns a method for the surface treatment of a component, for example a turbomachine component, the component comprising a surface to be treated, the method comprising the following steps: loading a first dispenser with a chemical etching solution and a second dispenser with a rinsing solution, positioning the first dispenser and the second dispenser opposite the surface to be treated, moving the first dispenser and the second dispenser along the surface to be treated, such that the surface to be treated successively receives the chemical etching solution followed by the rinsing solution.
    Type: Application
    Filed: July 31, 2019
    Publication date: October 14, 2021
    Applicant: SAFRAN AIRCRAFT ENGINES
    Inventors: Jean-Marie Romaric PIETTE, Françoise BERTRAND
  • Publication number: 20210317586
    Abstract: An ink formulation and electrode that enhances hydrogen production, oxygen production, carbon dioxide reduction and other electrocatalytic reactions. Embodiments include an ink formulation with polymer binders having different catalytical precursors and a 3D electrode produced by additive manufacturing from the inventor's ink formulation. Various embodiments of the inventor's apparatus, systems, and methods provide inks that that are 3D-printed into patterns that optimize surface area and flow. The catalytic materials are imbedded into the ink matrix which is then printed into a 3D structure that has architecture that optimizes surface area and flow properties.
    Type: Application
    Filed: April 10, 2020
    Publication date: October 14, 2021
    Inventors: Siwei Liang, Sarah E. Baker, Theodore F. Baumann, Eric B. Duoss, Christopher M. Spadaccini, Cheng Zhu
  • Publication number: 20210317587
    Abstract: A flow-through electrolysis cell includes a hierarchical nanoporous metal cathode. A method of reducing CO2 includes flowing the CO2 through the hierarchical nanoporous metal cathode of the flow-through electrolysis cell.
    Type: Application
    Filed: June 22, 2021
    Publication date: October 14, 2021
    Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
    Inventors: Monika M. Biener, Juergen Biener, Siwei Liang, Zhen Qi, Michael Stadermann, Vedasri Vedharathinam
  • Publication number: 20210317588
    Abstract: A method for operating an electrolysis device, having a converter which is connected on an AC voltage side to an AC voltage grid via a decoupling inductance and draws an AC active power from the AC voltage grid, and an electrolyzer, which is connected to the converter on the DC voltage side, is provided. The method includes operating the electrolysis device, when a grid frequency corresponds to a nominal frequency of the ACT voltage grid and is substantially constant over a time period, with an electrical power which is between 50% and 100% of a nominal power of the electrolyzer, and operating the converter in a voltage-impressing manner, such that an AC active power drawn from the AC voltage grid is changed on the basis of a change and/or a rate of change of the grid frequency in the AC voltage grid.
    Type: Application
    Filed: June 23, 2021
    Publication date: October 14, 2021
    Inventors: Andreas Falk, Christian Hardt
  • Publication number: 20210317589
    Abstract: A trivalent chromium plating solution containing a trivalent chromium compound, a complexing agent, a conductive salt, and a pH-buffering agent, and further containing an organic compound having 2-4 carbon atoms and three or more chloro groups, and a trivalent chromium plating method using the same provide a practical trivalent chromium plating with enhanced corrosion resistance as compared to the ordinary trivalent chromium plating.
    Type: Application
    Filed: July 2, 2019
    Publication date: October 14, 2021
    Applicant: JCU CORPORATION
    Inventors: Madoka NAKAGAMI, Masao HORI, Yuto MORIKAWA
  • Publication number: 20210317590
    Abstract: The present invention relates to a method for producing an electrolytic copper foil, the method enabling providing an electrolytic copper foil such that the electrical conductivity is 99% or more, the thickness is 10 ?m or less, a problem of a bend is suppressed, the front side and the rear side are flat, the tensile strength is 500 MPa or more, and the elongation percentage is 5.5% or more. The method for producing an electrolytic copper foil includes forming an electrolytic copper foil by using, as an electrolytic solution, a sulfuric acid-copper sulfate aqueous solution not containing a heavy metal other than a copper metal, using an insoluble anode and a cathode drum facing the insoluble anode, and passing a direct current between these electrodes, wherein, in the electrolytic solution, particular additives (A) to (E) are contained each in a particular amount, and the additive (D) and the additive (A) are each added in a ratio such that (D)/(A) is 0.2 to 0.7.
    Type: Application
    Filed: June 3, 2020
    Publication date: October 14, 2021
    Inventor: Ryoichi OGURO
  • Publication number: 20210317591
    Abstract: A tin alloy electroplating bath, wherein the tin alloy electroplating bath includes (A) a soluble tin salt, (B) a soluble nickel salt and/or a soluble cobalt salt, (C) an oxycarboxylic acid or a salt thereof, (D) a nitrogen-containing heterocyclic unsaturated compound, and (E) a surfactant, and the pH of the tin alloy electroplating bath is 3 to 7.
    Type: Application
    Filed: July 12, 2019
    Publication date: October 14, 2021
    Inventors: Yutaka MORII, Go NAGATA, Satoshi YUASA
  • Publication number: 20210317592
    Abstract: A method of processing a semiconductor wafer is provided. The method includes introducing the wafer to a main chamber via a loading port, using a transfer mechanism to transfer the wafer to a first wafer processing module in a stack so that the wafer is disposed substantially horizontally in the first wafer processing module with a front face facing upwards, and performing a processing step on the front face of the wafer in the first wafer processing module.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 14, 2021
    Inventors: JOHN MACNEIL, MARTIN AYRES, TREVOR THOMAS
  • Publication number: 20210317593
    Abstract: A silicon carbide ingot producing method is provided. The method produces a silicon carbide ingot in which an internal space of a reactor is depressurized and heated to create a predetermined difference in temperature between upper and lower portions of the internal space. The method produces a silicon carbide ingot in which a plane of a seed crystal corresponding to the rear surface of the silicon carbide ingot is lost minimally. Additionally, the method produces a silicon carbide ingot with few defects and good crystal quality.
    Type: Application
    Filed: November 3, 2020
    Publication date: October 14, 2021
    Applicant: SKC Co., Ltd.
    Inventors: Jong Hwi PARK, Eun Su YANG, Byung Kyu JANG, Jung Woo CHOI, Sang Ki KO, Kap-Ryeol KU, Jung-Gyu KIM