Abstract: A method of generating a photon with multiple dimensions includes a step of generating a first photon encoded with quantum information in each of two or more frequency bins and at least one time bin. The method further includes performing a frequency dependent time operation to entangle (i.e. make non-separable) the frequency bins and the time bins in the photon.

Abstract: A photonics reservoir computing system is described. The system is configured for propagating at least one optical signal so as to create resulting radiation signals in the output channels. The photonics reservoir computing system further comprises weighting elements for weighting signals from the output channels, and at least one optical detector for optically detecting signals from the output channels. The system is adapted for estimating signals from the output channels through an output of the optical detector.

Abstract: A camera module includes a lens holder accommodating a lens module therein, a housing accommodating the lens module and the lens holder therein, a shake correction unit including first and second magnets, disposed in the lens holder, and first and second coils disposed to face the first and second magnets, a focusing unit including a third magnet, disposed in the lens module, and a third coil disposed on a first substrate disposed on the lens holder, and a plurality of ball members configured to support movement of the lens module in a direction perpendicular to an optical axis. The lens module, the lens holder, the third magnet, and the third coil are moved together in the direction perpendicular to the optical axis, by driving force of the shake correction unit.

Abstract: An optical system is provided. The optical system includes a movable portion used for connecting to an optical element having an optical axis, a fixed portion, and a second driving assembly used for driving the movable portion to move relative to the fixed portion. The movable portion includes a bottom having a window corresponding to the optical axis, a first blade corresponding to the window, and is movable relative to the bottom, a connecting element movable relative to the bottom and is used for bringing the first blade to move, and a first driving assembly used for driving the connecting element to move relative to the bottom. The movable portion is movable relative to the fixed portion. The fixed portion has a polygonal structure when viewed along the optical axis.

Abstract: A webcam, a privacy shutter mechanism, and method of electrically activating the privacy mechanism are described. The privacy shutter is part of a webcam and includes privacy shutter mechanism chassis; an electrically activated coil mechanism mounted on privacy shutter mechanism chassis; a locking mechanism mounted on the electrically activated coil mechanism; a shutter plane with a shutter that locks with the locking mechanism, wherein the electrically activated coil mechanism moves the shutter plane in place to open or close the shutter; a fixture having a shutter opening attached to the privacy shutter mechanism chassis; and a shutter locking mechanism that is electrically activated to lock or unlock when the shutter is close or open.

Abstract: There is disclosed a versatile volumetric camera rig composed of a partially spherical structure formed by the combination of a plurality of substructures. The substructure may be made from a plurality of arm components and joint components which may be further outfitted with cameras and other sensors that capture a scene from within the rig.

Abstract: An apparatus including a camera optical element and a tactile indicator associated with the camera optical element for indicating a property of the camera optical element.

Abstract: Systems and methods to reduce the appearance of a seam in an image reflected onto a mirror array from a screen is provided. The systems and methods may include a light source to emit light into a seam between a pair of mirrors of the mirror array; a camera for taking a picture of the image displayed on the screen and yielding image data from the picture; and a control system in communication with the light source and the camera. The control system may be operable to cause the light source to emit light of a first color into a first portion of the seam and to emit light of a second color into a second portion of the seam based on the image data, thereby providing colored light in the seam to substantially match colors in the image reflected onto pair of mirrors adjacent to the seam.

Abstract: The present invention relates to a projector comprising: a housing; a projection part for projecting an image; a projection lens module for expanding and projecting, on an outside screen, the image projected from the projection part; and a position adjustment part for controlling the positions of a first direction and a second direction of the projection lens module.

Abstract: The disclosed structured light projector may include (1) a light source having a light-emitting side that emits light, (2) a solid optical spacer element having a first side securely coupled to the light-emitting side of the light source, and (3) a diffractive optical element (DOE) stack including one or more DOEs, where the DOE stack includes (a) a light-receiving side securely coupled to a second side of the solid optical spacer element opposite the first side, and (b) a light-emitting side opposite the light-receiving side that emits structured light in response to the light received from the light-emitting side of the light source via the solid optical spacer element. Various other devices and methods are also disclosed.

Abstract: An illuminator includes a light source that outputs first light having a first wavelength band, a wavelength converter that converts the first light into second light having a second wavelength band different from the first, a first optical element that reflects part of the first light to cause the reflected first light to be incident on the wavelength converter and transmits the other part of the first light and the second light, and a second optical element that reflects the other part of the first light having the first wavelength band and passing through the first optical element, the direction of the reflected light being the traveling direction of the second light having the second wavelength band and passing through the first optical element, and transmits the second light having the second wavelength band and emitted from the wavelength converter.

Abstract: A light source apparatus according to the present disclosure includes a first light source including a plurality of first light emitters arranged in a single row along a first direction, a second light source including a plurality of second light emitters arranged in a single row along a second direction, and a polarization combiner. The polarization combiner transmits the first luminous flux from the first light source and reflects the second luminous flux from the second light source. In an imaginary plane perpendicular to the center axis of the combined luminous flux, the direction in which the plurality of first beams are arranged in the single row and the direction in which the plurality of second beams are arranged in the single row intersect with each other, and the first luminous flux and the second luminous flux partially overlap with each other.

Abstract: An optical element according to the present disclosure includes a main body part including an optical part having an optical surface, and a support part which is provided to the optical part, and which is to be supported by a support body, and a functional layer which is provided as a film to the main body part, wherein the functional layer is disposed so as to cover the optical surface of the optical part, and so as not to cover at least a part of the support part.

Abstract: Techniques for EUV resist pattern transfer using a graded hardmask are provided. In one aspect, a method of patterning is provided. The method includes: forming a graded hardmask on a device stack; depositing a resist onto the graded hardmask; patterning the resist to form a pattern in the resist having at least one feature; modifying at least one surface region to increase an etch rate of the graded hardmask; transferring the pattern from the resist to the graded hardmask; and transferring the pattern from the graded hardmask to at least one underlying layer of the device stack. A device structure formed by the patterning method is also provided.

Abstract: A substrate with a multilayer reflective film, a reflective mask blank, a reflective mask and a method of manufacturing a semiconductor device that can prevent contamination of the surface of the multilayer reflective film even in the case of having formed reference marks on the multilayer reflective film. A substrate with a multilayer reflective film contains a substrate and a multilayer reflective film that reflects EUV light formed on the substrate. Reference marks are formed to a concave shape on the surface of the substrate with the multilayer reflective film. The reference marks have grooves or protrusions roughly in the center. The shape of the grooves or protrusions when viewed from overhead is similar or roughly similar to the shape of the reference marks.

Abstract: A method for forming a photomask includes receiving a mask substrate including a protecting layer and a shielding layer formed thereon, removing portions of the shielding layer to form a patterned shielding layer, and providing a BSE detector to monitor the removing of the portions of the shielding layer. When a difference in BSE intensities obtained from the BSE detector is greater than approximately 30%, the removing of the portions of the shielding layer is stopped. The BSE intensity in following etching loops becomes stable.

Abstract: An apparatus forms a pattern of an imprint material by curing the imprint material in a state in which the imprint material on a pattern formation region of a member, where a pattern is to be formed, is in contact with a pattern region of a mold. The apparatus includes a dispenser for placing the imprint material on the pattern formation region of the member and a non-pattern formation region of the member, outside the pattern formation region, a detector for detecting the non-pattern formation region in a state in which the imprint material has been placed on the pattern formation region and the non-pattern formation region by the dispenser, and a controller for performing processing for determining an abnormality in the dispenser based on a detection result of the non-pattern formation region by the detector.

Abstract: A photosensitive resin composition, a photosensitive resin layer, and a color filter, the composition including a colorant including a first green dye having a core-shell structure and a second green dye in a weight ratio of about 1:9 to about 7:3; a binder resin; a photopolymerizable compound; a photopolymerization initiator; and a solvent.

Abstract: The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.

Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,

Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: wherein, in formula (I), R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.

Abstract: A photoresist includes a core group that contains metal, and one or more first ligands or one or more second ligands attached to the core group. The first ligands each have a following structure: The second ligands each have a following structure: represents the core group. L? represents a chemical that includes 0˜2 carbon atoms saturated by Hydrogen (H) or Fluorine (F). L represents a chemical that includes 1˜6 carbon atoms saturated by H or F. L? represents a chemical that includes 1˜6 carbon atoms saturated by H. L?? represents a chemical that includes 1˜6 carbon atoms saturated by H or F. Linker represents a chemical that links L? and L?? together.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or sulfur-containing structure, a hydrocarbon structure, and a solvent. A compound which contains at least one photodegradable structure in one molecule. A compound which contains the photodegradable structures, and the hydrocarbon structure in one molecule, or a combination of compounds which contain the structures in separate molecules. The hydrocarbon structure is a saturated or unsaturated, linear, branched or cyclic hydrocarbon group having a carbon atom number of 1 to 40.

Abstract: Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:

Abstract: A method for forming a semiconductor structure is provided. The method includes depositing a hard mask layer over a substrate. The method further includes depositing a silver precursor layer over the hard mask layer. The method further includes exposing portions of the silver precursor layer to a radiation, the radiation causing a reduction of silver ions in the irradiated portions of the silver precursor layer. The method further includes removing non-irradiated portions of the silver precursor layer, resulting in a plurality of silver seed structures.

Abstract: A photoresist layer is coated over a wafer. The photoresist layer includes a metal-containing material. An extreme ultraviolet (EUV) lithography process is performed to the photoresist layer to form a patterned photoresist. The wafer is cleaned with a cleaning fluid to remove the metal-containing material. The cleaning fluid includes a solvent having Hansen solubility parameters of delta D in a range between 13 and 25, delta P in a range between 3 and 25, and delta H in a range between 4 and 30. The solvent contains an acid with an acid dissociation constant less than 4 or a base with an acid dissociation constant greater than 9.

Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.

Abstract: A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.

Abstract: A process of selecting a measurement location, the process including: obtaining pattern data describing a pattern to be applied to substrates in a patterning process; obtaining a process characteristic measured during or following processing of a substrate, the process characteristic characterizing the processing of the substrate; determining a simulated result of the patterning process based on the pattern data and the process characteristic; and selecting a measurement location for the substrate based on the simulated result.

Abstract: A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

Abstract: A method includes transporting a cleaning mask and a photomask into an enclosure of a lithography exposure apparatus, wherein the photomask includes a multilayered mirror structure, and the cleaning mask is free of the multilayered mirror structure; placing the cleaning mask on a reticle stage of the lithography exposure apparatus; and charging the cleaning mask to attract charged particles in the enclosure.

Abstract: An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.

Abstract: In situ dynamic protection of an optical element surface against degradation includes disposing the optical element in an interior of an optical assembly for the FUV/VUV wavelength range and supplying at least one volatile fluorine-containing compound (A, B) to the interior for dynamic deposition of a fluorine-containing protective layer on the surface. The protective layer (7) is deposited on the surface layer by layer via a molecular layer deposition process. The compound includes a fluorine-containing reactant (A) supplied to the interior in a pulsed manner. A further reactant (B) is supplied to the interior also in a pulsed manner. An associated optical assembly includes an interior in which a surface is disposed, and at least one metering apparatus (123) that supplies a reactant to the interior. The metering apparatus provides a pulsed supply of the compound as a reactant (A, B) for layer by layer molecular layer deposition.

Abstract: The present invention provides a lithography apparatus for performing a process of transferring a pattern of an original to each of shot regions two-dimensionally arrayed on a substrate, including a stage that moves while holding one of the substrate and the original, a measurement unit configured to measure, when performing the process, a positional shift amount between a mark provided on the original and a mark provided in each of the shot regions, and a control unit configured to control the process for the shot region so that after the process is performed successively for a plurality of first shot regions included in a first row, the process is performed successively for a plurality of second shot regions included in a second row adjacent to the first row.

Abstract: An image forming method includes forming, fixing, and applying. The forming forms a toner image on a recording medium by an image forming device. The fixing fixes the toner image on the recording medium with heat by a fixing device. The applying applies an electric charge by a charge applying device to the recording medium on which the toner image has been fixed by the fixing device, in a state in which an output-adjustable power source for the charge applying device has an electric current that is controlled to be constant.

Abstract: An optical member that refracts a light beam to diverge or focus the light beam, includes: at least three pairs of opposing surfaces. Each of the three pairs of opposing surfaces include a lens. Curvatures of the lenses at one side surfaces of the respective three pairs of surfaces are all the same, or curvatures of the lenses at one side surfaces of respective pairs of at least two pairs of the three pairs of surfaces are different from each other, and respective shortest distances between optical axes of the lenses at the one side surfaces of respective pairs of the at least two pairs of surfaces, and reference sides which are each any one of respective sides surrounding surfaces including the lenses are different from each other.

Abstract: An apparatus includes a photoconductor, an exposure device, a developing device, a toner concentration sensor, a supply motor, and a processor. The exposure device exposes the photoconductor based on image data. The developing device forms a toner image on the photoconductor with toner supplied from a toner cartridge. The toner concentration sensor detects a toner concentration in the developing device. The supply motor supplies the toner from the toner cartridge to the developing device based on the toner concentration. The processor detects a toner container supply abnormality based on a toner supply rate and a print rate of the image data, the toner supply rate being calculated based on a pixel count value that is an integrated value of pixel values of the image data and a supply motor count value that is an integrated value of drive times of the supply motor.

Abstract: A processing apparatus including an apparatus housing, powder processing unit for processing powder, a powder recovery unit for recovering discharged powder, a powder discharge unit for transporting and discharging the powder to a discharge portion to be recovered, and a powder receiver. The powder recovery unit is attached to the apparatus housing and the power receiver is positioned below the powder recovery unit on the same side of the apparatus housing that the powder recovery unit is attached to the apparatus housing. When the powder recovery unit is detached from the apparatus housing, the powder receiving unit receives powder discharge falling from the discharge portion.

Abstract: A developing device includes: a first transport member and a second transport member that are disposed in a first transport path and a second transport path provided at an upper side and a lower side in a gravitational direction and that transport a developer. The developing device also includes an ejecting path that is provided in the first transport path disposed at the upper side in the gravitational direction and that ejects an excess developer. The developing device includes a reverse helical section that is disposed in front of a support that supports the second transport member. The reverse helical section helically extends in a reverse direction relative to a helical section provided for circulating the developer, the developer being transported to the ejecting path by the reverse helical section.

Abstract: A sealing assembly according to one example embodiment includes a housing and an imaging component positioned on the housing. A seal has opposed first and second edges extending along a longitudinal dimension of the seal. A lateral dimension of the seal is perpendicular to the longitudinal dimension and extends in a direction from the first edge to the second edge. The seal is attached to the housing along the first edge and contacts the imaging component along the second edge. Upon attachment to the housing, the seal is elastically deformed from an unassembled state in which the second edge has a first profile that varies in the lateral dimension along the longitudinal dimension to an assembled state in which the second edge is deformed relative to the first profile to a second profile having less variation in the lateral dimension along the longitudinal dimension than the first profile.

Abstract: An image forming apparatus includes a chassis having an opening, a cover, photosensitive members, an intermediate transfer belt, a primary-transfer member, a secondary-transfer roller, a cleaner device, an external-sheet inlet, a waste toner container, a connector, and a conveying roller, which is arranged within the feeding path to feed the recording sheet inserted through the external-sheet inlet in the feeding path. The conveying roller is mounted on the waste toner container and removable from the chassis along with the waste toner container.

Abstract: A movable-member supporter includes: a first support member that includes a first support plate, a first guide unit provided at the first support plate, and a first connection section, the first guide unit guiding movement of a movable member and having one end that extends to one side surface of the first support plate, the first connection section being provided at the one side surface of the first support plate; and a second support member that includes a second support plate, a second guide unit provided at the second support plate, and a second connection section, the second guide unit guiding movement of the movable member and having one end that extends to one side surface of the second support plate, the second connection section being provided at the one side surface of the second support plate and being connected with the first connection section of the first support member.

Abstract: An image forming apparatus includes: an annular transfer belt to which an image is transferred; a transfer roller that transfers an image to a recording medium when the recording medium passes through a transfer area formed between the transfer roller and the transfer belt; a drive mechanism that causes the transfer roller to rotate; and a speed adjustment mechanism that adjusts a rotational speed of the transfer roller achieved by the drive mechanism in units of a cycle of the transfer roller, and switches between a first adjustment pattern and a second adjustment pattern to execute switched adjustment pattern in a cycle including a state in which the transfer roller transports the recording medium, the first adjustment pattern for adjusting the rotational speed of the transfer roller, the second adjustment pattern for adjusting the rotational speed of the transfer roller with a pattern different from the first adjustment pattern.

Abstract: An image forming apparatus that includes an image bearing member which can bear a toner image, a transfer member used to transfer a toner image onto a recording material from the image bearing member, and a reading device which reads density information of images on recording material disposed on a platen. The image forming apparatus forms a first chart on a first recording material and a second chart on a second recording material by sequentially transferring a plurality of test images while applying a plurality of test voltages to the transfer member. The two charts are read by the reading device and the transfer voltage is adjusted based on the reading result.

Abstract: An image forming apparatus includes a conveyance portion, a fixing portion including a heating portion, a guide portion, and first and second extending portions. The guide portion guides the sheet, faces a conveyance path through which the sheet passes, and is disposed at a downstream side of the fixing portion in a sheet conveyance direction. The first extending portion extends in a direction crossing a vertical direction, is disposed upstream of the guide portion, and is disposed at the fixing portion downstream side. The second extending portion extends from the first extending portion to a downstream side of the first extending portion in the conveyance direction. In a direction crossing the conveyance direction, the guide portion is disposed at one side of the conveyance path and the second extending portion is disposed to project more than the guide portion from the one side to another side of the conveyance path.

Abstract: According to one embodiment, a heating device includes a belt and a contact member. The belt has a tubular shape. The contact member is provided inside the belt. The contact member is formed in an arc shape along the inner peripheral surface of the belt. The contact member is slidably in contact with the inner peripheral surface of the belt. When the amount of deflection of the belt is D, the radius of curvature of the inner peripheral surface of the belt is A, and the radius of curvature of the outer peripheral surface of the contact member is B, the following equations (1) and (2) are satisfied: D?10 mm??(1) 0.4 mm?A?B?0 mm??(2).

Abstract: A nip former that forms a nip between an endless belt and a pressure rotator includes a base that is made of aluminum and has a nip forming face disposed opposite the nip. An anodic oxidation coating is treated with sealing and coats at least the nip forming face. The anodic oxidation coating has a thickness that is not smaller than 22 ?m and is not greater than 45 ?m and a variation in thickness that is not greater than 20 percent. The base and the anodic oxidation coating define a nip forming portion that is disposed opposite the nip. The nip forming portion has a thickness that is not smaller than 0.40 mm and is not greater than 1.20 mm.