Abstract: A device for processing images are provided. The device a support bar, a mounting housing mounted with a camera lens, and a connector configured to connect the support bar to the mounting housing. The mounting housing is integrally rotatable with the connector with respect to the support bar. The mounting housing may further be mounted with an ultrasonic probe and a lightening device. The ultrasonic probe is configured to monitor a predefined change, such as a change in an occupation state of a parking space, and the camera lens and the lightening device is controlled at least by the monitored change. When the ultrasonic probe monitors that a car is leaving or entering a parking space, the camera lens and the lightening may be switched on.

Abstract: A versatile camera device to be mounted to a pole, includes a cylindrical portion, a leg portion, and a light-transmitting portion provided in a axial middle portion of the cylindrical portion toward the other end and forming a part of the cylindrical portion. Further included are a reflector which receives light entering from the light-transmitting portion and an image pickup camera which receives light reflected from the reflector at an image pickup unit. The device further includes a control substrate including a transmitter which generates radio waves including an image signal from the image pickup camera and a controller, a battery and a lid.

Abstract: Various implementations include a bimini mountable camera device. The device includes a camera and first and second shell portions. The first shell portion has a first end and a second end. The first end of the first shell portion defines a central opening extending along a central axis to the second end of the first shell portion. The second end of the first shell portion defines a first groove extending along a first groove axis that extends perpendicular to the central axis. The second shell portion has a first end and a second end. The first end of the second shell portion is couplable to the second end of the first shell portion. The first end of the second shell portion defines a second groove extending along a second groove axis that extends parallel to the first groove axis. The camera is at least partially disposed within the central opening.

Abstract: In contrast to the traditional transitions used in systems that switch over a camera with a handheld top mount to a low mode mount, a quick swap top mountable camera mount system includes a quick swap handheld top mount, a quick swap mounting plate, and a quick swap low mode mount. Unlike traditional methods and components, fewer pieces are required to be removed and replaced due, in part, to the use of quick swap coupling elements, which allow various types of mounts to quickly and easily decouple from the quick swap mounting plate.

Abstract: A projector includes a main body and a projection lens. The main body includes a light source, liquid crystal panels that modulate light outputted from the light source, and a lens holder to and from which the projection lens is attachable and detachable. The projection lens projects the light modulated, and the lens holder includes a first lens holding mechanism and a second lens holding mechanism that hold the projection lens.

Abstract: A light source is provided that includes a laser operable to emit laser light at a wavelength in a range from 460 nanometers to 470 nanometers and a converter assembly arranged so as to absorb the laser light emitted by the laser and to emit photoluminescent light produced by the laser light and having a longer wavelength than the laser light. The converter assembly has a converter element with a ceramic doped with Eu3+ such that under irradiation of the laser light the converter assembly emits photoluminescent light in the red spectral range.

Abstract: A light source apparatus includes a light source configured to emit first light, a wavelength converter configured to convert the first light into second light, an optical element disposed in an optical path of the first light to be incident on the wavelength converter, a light collector configured to collect the first light emitted from the optical element toward the wavelength converter, and a driver configured to rotate the optical element and the light collector around a rotation axis parallel to a first optical axis of the first light. The optical element has a first surface on which the first light is incident and a second surface via which the first light exits. The first light emitted from the light collector is incident on the wavelength converter along the second optical axis. The first optical axis and the second optical axis are shifted from each other.

Abstract: A wavelength conversion apparatus according to an aspect of the present disclosure includes a wavelength conversion layer that converts excitation light in terms of wavelength and an optical array layer formed of a plurality of cells each having a first surface on which light as a result of the wavelength conversion performed by the wavelength conversion layer is incident and a second surface via which the light exits. The optical array layer has a reflection surface that extends from the first surface to the second surface, is located at an interface between the cells adjacent to each other, and reflects the light.

Abstract: Provided is a projection device including a laser light source, a wavelength conversion element having wavelength and non-wavelength conversion regions, a diffuser element having first and second regions, a filter element, a beam splitting element, a first light valve, a second light valve, and a projection lens. During simultaneous rotation of the diffuser element and the wavelength conversion element, the first and second regions correspond respectively to the wavelength and non-wavelength conversion regions. The filter element is disposed in the first region, filtering out a laser beam emitted by the laser light source. The beam splitting element guides first and second sub-beams in a first beam passing through the first region of the diffuser element and the filter element respectively to the first and second light valves, and guides a second beam passing through the second region of the diffuser element to one of the first and second light valves.

Abstract: Embodiments of the present disclosure provide a projector and a projection system. In the projector, a projection light source, a polarizing beam splitting prism, and a projection lens are disposed in a first direction, and the polarizing beam splitting prism is disposed between the projection light source and the projection lens; a polarized light converting component, the polarizing beam splitting prism, and an LCOS imaging chip are disposed in a second direction, and the polarizing beam splitting prism is disposed between the polarized light converting component and the LCOS imaging chip, wherein the second direction is perpendicular to the first direction.

Abstract: Provided include a beam modulation apparatus for modulating an input light field and a projection system containing the apparatus. The input light field has a first light field and a second light field, having a difference of 90° in their polarization states. The apparatus includes a PBS prism, a first LCOS panel and a second LCOS panel. The first and the second LCOS panel are respectively over a side surface of the PBS prism opposing to an optical incident surface and an optical exit surface. Each LCOS panel comprises a plurality of pixels over a reflective surface thereof, with each pixel controllably switched on or off such that a polarity state of a light beam reflected by a portion of the reflective surface corresponding thereto is changed or remains unchanged. This beam modulation apparatus can be applied in a projection system, such as a laser TV projection system.

Abstract: An illumination system including an excitation light source array, a multi-region dichroic device, a color sequence generator, and a wavelength converter is provided. The excitation light source array emits excitation light beams. The multi-region dichroic device has first dichroic regions and non-dichroic regions that are alternately arranged in stripe shapes. The first dichroic regions are respectively disposed on transmission paths of the excitation light beams. The excitation light beams from the excitation light source array are transmitted to the color sequence generator through the first dichroic regions of the multi-region dichroic device, and at least one second dichroic region of the color sequence generator respectively reflects the excitation light beams to the non-dichroic regions of the multi-region dichroic device. The excitation light beams from the color sequence generator are transmitted to the wavelength converter through the non-dichroic regions of the multi-region dichroic device.

Abstract: Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers are positioned around the single central transfer chamber.

Abstract: A substrate with a multilayer reflection film for an EUV mask blank including a substrate, and a multilayer reflection film formed on the substrate is provided. The multilayer reflection film includes a Si/Mo laminated portion and a protection layer containing Ru and including a lower layer composed of Ru, and an upper layer composed of a material containing Ru and at least one selected from the group consisting of metals other than Ru, and metalloids.

Abstract: A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

Abstract: In certain embodiments, a method includes the following steps. A layout used in a lithographic mask development process is accessed. For example, the layout may be the layout of the mask itself, or it may be the layout of the resulting printed pattern on the wafer. The layout includes a number of disjoint shapes. Skeleton representations for at least some of the disjoint shapes in the layout are determined. The skeleton representation of an individual shape has elements of two or more nodes connected by edges. It also includes size parameters for at least some of the elements. The skeleton representations of the shapes are used in the mask development process.

Abstract: A method of making a semiconductor device includes defining a pattern including a plurality of sub-patterns on the photomask in the pattern region based on the identifying information. The defining of the pattern includes defining a first sub-pattern of the plurality of sub-patterns having a first spacing from a second sub-pattern of the plurality of sub-patterns, wherein the first spacing is different from a second spacing between the second sub-pattern and a third sub-pattern of the plurality of sub-patterns, or rotating the first sub-pattern about an axis perpendicular to a top surface of the photomask relative to the second sub-pattern.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate, a multilayer stack of reflective layers on the substrate, a capping layer on the multilayer stack of reflecting layers, and an absorber on the capping layer. The absorber comprises a first layer selected from the group consisting of Mo, Nb, V, alloys of Mo, Nb and V, oxides of Mo, oxides of Nb, oxides of V, nitrides of Mo, nitrides of Nb and nitrides of V and a second layer selected from the group consisting of TaSb, CSb, SbN, TaNi, TaCu and TaRu.

Abstract: A pellicle for an EUV photo mask includes a first layer; a second layer; and a main layer disposed between the first layer and second layer and including a plurality of nanotubes. At least one of the first layer or the second layer includes a two-dimensional material in which one or more two-dimensional layers are stacked. In one or more of the foregoing and following embodiments, the first layer includes a first two-dimensional material and the second layer includes a second two-dimensional material.

Abstract: Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Abstract: The inventive concept relates to a three-dimensional crosslinker composition and a method of manufacturing an electronic device using the same. According to the inventive concept, the three-dimensional crosslinker composition may be represented by Formula 1 below.

Abstract: [Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a >N—C(?O)— or >N—C(?S)— structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.

Abstract: Provided are a photosensitive resin composition in which the progress of cyclization reaction is fast and storage stability over time is excellent, a heterocyclic ring-containing polymer precursor, a cured film, a laminate, a method for producing a cured film, and a semiconductor device, using the photosensitive resin composition. The photosensitive resin composition includes a heterocyclic ring-containing polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor, and a solvent, in which a solid content of the photosensitive resin composition has an amine value of 0.0002 to 0.0200 mmol/g.

Abstract: The present invention discloses a photosensitive composition, comprising polyvinyl acetate (0% saponified) having a styryl type nitrogen-containing heterocyclic groups such as a styrylpyridinium or/and styrylquinolinium that possesses high UV light energy sensitivity with a small photosensitive group content, high solid content, high water resistance, and very sharp imaging characteristics and produced therefrom photosensitive compositions such as a photo-resist, photolithographic plates, screen printing stencil emulsion and film, and abrasion resistant photosensitive emulsion and film, and other photosensitive compositions being used for commercial and industrial applications.

Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a sulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and improved CDU, and forms a pattern of good profile after exposure and development.

Abstract: The present disclosure discloses a silicon-based nanowire, a preparation method thereof, and a thin film transistor. By using a eutectic point of catalyst particles and silicon, and a driving factor that the Gibbs free energy of amorphous silicon is greater than that of crystalline silicon, and due to absorption of the amorphous silicon by the molten catalyst particles to form a supersaturated silicon eutectoid, the silicon nucleates and grows into silicon-based nanowires. Moreover, during the growth of the silicon-based nanowire, the amorphous silicon film grows linearly along guide slots under the action of the catalyst particles, and reverse growth of the silicon-based nanowire is restricted by the retaining walls, thus obtaining silicon-based nanowires with a high density and high uniformity. Furthermore, by controlling the size of the catalyst particles and the thickness of the amorphous silicon film, the width of the silicon-based nanowire may also be controlled.

Abstract: A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.

Abstract: A plate handling system (500, 600) for transporting printing plates between workstations in a process workflow. A plurality of vacuum gripper end effectors (512) configured to grip the printing plates are mounted to a computer-controlled transporter (514) configured to translate in at least three orthogonal directions and to rotate about at least one rotational axis. At least one sensor (560) detects orientation of the plate relative to a staging location and a controller (630) causes the transporter to move based upon programmed instructions in accordance with information provided by the sensor. A mobile preparation table (1000) may be provided in the staging location. A thickness measurement system (1090) may be included in some embodiments.

Abstract: A method of controlling an extreme ultraviolet (EUV) lithography system is disclosed. The method includes irradiating a target droplet with EUV radiation, detecting EUV radiation reflected by the target droplet, determining aberration of the detected EUV radiation, determining a Zernike polynomial corresponding to the aberration, and performing a corrective action to reduce a shift in Zernike coefficients of the Zernike polynomial.

Abstract: An exposure device includes a laser source, a first spatial light modulator, a second spatial light modulator and a controller. The laser source is provided for emitting a laser. The first spatial light modulator is irradiated by the laser and used for modulating the phase of the laser irradiated on the first spatial light modulator before reflecting the laser. The second spatial light modulator is irradiated by the laser reflected from the first spatial light modulator and used for modulating the amplitude of the laser irradiated on the second spatial light modulator before reflecting the laser. The laser reflected by the second spatial light modulator is irradiated on a photoresist layer to form an exposure pattern.

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Abstract: In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

Abstract: A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region including a plurality of sub-regions. The method includes obtaining measurement data relating to a process parameter of the manufacturing process for the region; and determining a correction for the manufacturing apparatus based on the measurement data. The correction is configured to maintain the process parameter within a specified range across a boundary between two of the sub-regions and/or to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the region.

Abstract: Photolithography overlay errors are a source of patterning defects, which contribute to low wafer yield. An interconnect formation process that employs a patterning photolithography/etch process with self-aligned interconnects is disclosed herein. The interconnection formation process, among other things, improves a photolithography overlay (OVL) margin since alignment is accomplished on a wider pattern. In addition, the patterning photolithography/etch process supports multi-metal gap fill and low-k dielectric formation with voids.

Abstract: A method for detecting a rare stochastic defect, the method may include searching for a rare stochastic defect in a dense pattern of a substrate, wherein the rare stochastic defect is (a) of nanometric scale, (b) appears in a functional pattern of the substrate with a defect density that is below 10?9, and (c) appears in the dense pattern with a defect density that is above 10?7; wherein the dense pattern is a dense representation of the functional pattern that differs from the functional pattern by at least one out of (a) a distance between features of the dense pattern, and (b) a width of the features of the dense pattern; and estimating the occurrence of the rare stochastic defect within the functional pattern based on an outcome of the searching.

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

Abstract: The invention provides an assembly having a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat has two insulation coverings. The coil layer is arranged between the two coverings. The coverings each have an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering has a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.

Abstract: An alignment mark count acquiring method includes: acquiring a first time at which an exposure machine performs exposure of a first wafer, and acquiring a second time at which the exposure machine performs alignment of a second wafer; acquiring a first buffer time between the second time and the first time when the first time is less than the second time; determining a target alignment mark count of the second wafer according to the exposure parameters of the first wafer and the corresponding relationship when the first buffer time is greater than a preset value, wherein the corresponding relationship is the relationship between the exposure parameters and the alignment mark counts, and the corresponding relationship is used to make the first buffer time to be less than or equal to the preset value; and outputting the target alignment mark count.

Abstract: An image forming apparatus includes an apparatus body, an image bearing member, and a process unit attached to the apparatus body. The process unit includes a frame including a storage portion configured to store developer, a developer bearing member configured to supply developer to the image bearing member to develop an electrostatic latent image. and a circuit board attached to the frame. The circuit board includes a light emitting portion configured to emit light, and a light receiving portion configured to receive the light emitted from the light emitting portion and having passed through an interior of the storage portion.

Abstract: In an example, a print apparatus comprises an intermediate transfer member to receive thermoplastic print agent from a photoconductive surface, a rotatably mounted endless cleaning surface to receive a layer of thermoplastic print agent from the intermediate transfer member and a heater, to heat the endless cleaning surface. The endless cleaning surface may be to engage with the intermediate transfer member when heated to transfer residue from the intermediate transfer member to the layer of thermoplastic print agent on the endless cleaning surface.

Abstract: An image forming apparatus is configured to execute image forming processing of forming an image on a sheet. The apparatus includes a photosensitive drum, a fixing device including a heater and a roller, a main motor configured to generate a driving force, a driving mechanism having a connected state in which the driving force is transmittable to both the roller and the photosensitive drum, and a disconnected state in which the driving force is transmittable to the roller but is not transmitted to the photosensitive drum, a temperature sensor configured to detect a temperature of the fixing device, and a controller. In a case where the image forming processing is started, the controller sets the driving mechanism into the disconnected state, rotates the main motor at a preheating speed, and executes preheating processing in which the fixing device is heated by the heater.

Abstract: There are provided a temperature sensor that has following capability to a temperature measurement object and has excellent responsiveness, and a temperature detection device and an image forming apparatus each including the temperature sensor. A temperature sensor used in contact with a temperature measurement object, includes: a thermosensitive element configured to detect a temperature of the temperature measurement object; a heat collection member including an abutting portion configured to abut on the temperature measurement object, and configured to be thermally joined with the thermosensitive element; and a holding member including a housing portion configured to house the heat collection member. The heat collection member is swingably held by the holding member, to maintain a state where the abutting portion abuts on the temperature measurement object.

Abstract: An image forming apparatus includes an image forming device, a first transfer device including a first mover, a second transfer device including a second mover, a transfer-pressure changer, a detector, and circuitry. The detector detects a toner image and outputs a detection value indicating an amount of toner of the toner image adhering to the second mover. The circuitry calculates a variable value for the amount of toner varying with a change in a transfer pressure, based on the detection value and a target value of the amount of toner of the toner image to be transferred and adhere to the second mover, reflects the calculated variable value in the detection value to correct the detection value, adjusts an image-forming condition based on the corrected detection value, and sets the image-forming condition of the toner image in the image forming device based on the corrected detection value.

Abstract: An image reading device includes an image reader and circuitry. The image reader is configured to read an image on a recording medium. The circuitry is configured to obtain defective image information and defect type information based on the image on the recording medium read by the image reader, and determine an abnormality of the image on the recording medium based on the defective image information and the defect type information.

Abstract: An image forming apparatus includes an image forming target to be transported along one direction, three or more image formers arranged away from each other along the one direction and configured to form images on the image forming target, and an image forming target winding motion correcting roller rotatably in contact with an inner peripheral surface of the image forming target and positioned on a downstream side of the image former at an upstream end in a transport direction of the image forming target so that plural image formers are positioned on a downstream side of the image forming target winding motion correcting roller. A distance between the plural image formers positioned on the downstream side of the image forming target winding motion correcting roller is an integral multiple of an outer peripheral length of the image forming target winding motion correcting roller.

Abstract: An image forming apparatus includes: a motor; a temperature detector; a conveyor; a sheet detector; and a controller configured to perform: (a) controlling a conveying speed of the sheet; (b) determining whether a paper jam has occurred; and (c) determining, when the paper jam has occurred, whether a torque shortage has occurred. The torque shortage is shortage of a torque occurring during conveyance of the sheet. When the torque shortage has occurred, and the paper jam is resolved and conveyance of the sheet is resumed, the controller performs in the (a) controlling: controlling, when an ambient temperature detected by the temperature detector is higher than a predetermined temperature, the conveying speed to become a first conveying speed; and controlling, when the ambient temperature is lower than or equal to the predetermined temperature, the conveying speed to become a second conveying speed slower than the first conveying speed.

Abstract: A drive transmitter includes a first member and a second member. The first member includes an opening through which a rotary shaft passes, a wall orthogonal to an axial direction of the first member, and a drive transmitting portion by which a driving force is transmitted. The second member has a rigidity greater than the first member and is configured to be fastened to the first member. A space is between the second member and the first member, with the first member and the second member being overlaid in a fastening direction of the second member, prior to fastening of the first member and the second member. At least a part of the wall of the first member defining the space with the second member is configured to shift toward the second member to reduce a diameter of at least a part of the opening at the fastening.

Abstract: A restricting member includes a blade portion and a supporting portion. A contact portion is provided at the blade portion, and, in a cross section orthogonal to a longitudinal direction, the contact portion includes a first portion extending in a first direction and a second portion extending toward a free end from an end of the first portion and extending in a second direction. When a region demarcated by connecting an intersection point, the end of the first portion, and an end of the second portion by a straight line is defined as a first region, the intersection point being where an imaginary line intersects an extension line of the first portion in the first direction, an area of the first region is smaller on a longitudinal end portion than on a longitudinal central portion of the blade portion.