Heavy Metal Compound Containing Patents (Class 106/287.18)
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Publication number: 20140294720Abstract: A LiCoO2 film-forming precursor solution is a precursor solution used to form a LiCoO2 film which is used as a positive electrode material of a thin film lithium secondary battery. In this LiCoO2 film-forming precursor solution, an organic lithium compound and an organic cobalt compound are dissolved in an organic solvent. In addition, the organic lithium compound is a lithium salt of a carboxylic acid represented by a formula CnH2n+1COOH (wherein, 2?n?8).Type: ApplicationFiled: February 20, 2014Publication date: October 2, 2014Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Takashi Noguchi, Toshiaki Watanabe, Hideaki Sakurai, Nobuyuki Soyama
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Publication number: 20140287136Abstract: This LaNiO3 thin film-forming composition includes: LaNiO3 precursors; and acetic acid, wherein a ratio of an amount of the LaNiO3 precursors to 100 mass % of an amount of the LaNiO3 thin film-forming composition is in a range of 1 mass % to 20 mass % in terms of oxides, and the composition further includes a stabilizer containing N-methyl formamide in an amount of more than 0 mol to 10 mol or less per 1 mol of the total amount of the LaNiO3 precursors in the composition.Type: ApplicationFiled: February 19, 2014Publication date: September 25, 2014Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Jun Fujii, Hideaki Sakurai, Nobuyuki Soyama
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Patent number: 8828562Abstract: The present invention provides hard coating film which excels conventional surface coating layer in wear resistance, has lower frictional coefficient and better slideability, a material coated with the hard coating film, a die for cold plastic working, and a method for forming the hard coating film. The hard coating film according to the present invention is a hard coating film comprising (NbxM1?x)y(BaCbN1?a?b)1?y, where 0.2?x?1.0??Equation (1) 0?a?0.3??Equation (2) 0?1?a?b?0.5??Equation (3) 0.5?b=1??Equation (4) 0.4?1?y?0.9??Equation (5) [however, M denotes at least one species of elements belonging to Groups 4a, 5a, and 6a and Si and Al; x, 1?x, a, b, and 1?a?b represent respectively the atomic ratio of Nb, M, B, C and N; and y and 1?y represent respectively the ratio of (NbxM1?x) and (BaCbN1?a?b).Type: GrantFiled: September 9, 2013Date of Patent: September 9, 2014Assignee: Kobe Steel, Ltd.Inventor: Kenji Yamamoto
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Publication number: 20140238270Abstract: A plastically deformable sealing mass for the use in sealing a leak in a container in which oil, oil-containing or chemical liquid is stored, includes a solvent, and a hydrophobing agent which is received in the solvent. The solvent may be organic solvent, water, oil, or a silicon compound. The hydrophobing agent can be stearate, oleate, silane, siloxane, or silicon.Type: ApplicationFiled: February 27, 2014Publication date: August 28, 2014Inventor: Gerd Hoffmann
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Patent number: 8795774Abstract: Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.Type: GrantFiled: September 23, 2012Date of Patent: August 5, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Deyan Wang, Jibin Sun, Peng-Wei Chuang, Peter Trefonas, III, Cong Liu
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Publication number: 20140212587Abstract: Compositions having a plurality of nanoparticles and nano-sheets are disclosed. Methods of making and using the compositions are also disclosed.Type: ApplicationFiled: February 5, 2014Publication date: July 31, 2014Applicant: NanoMech, Inc.Inventor: Ajay P. Malshe
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Patent number: 8790538Abstract: Disclosed is a composition for ferroelectric thin film formation which is used in the formation of a ferroelectric thin film of one material selected from the group consisting of PLZT, PZT, and PT. The composition for ferroelectric thin film formation is a liquid composition for the formation of a thin film of a mixed composite metal oxide formed of a mixture of a composite metal oxide (A) represented by general formula (1): (PbxLay)(ZrzTi(1?z))O3 [wherein 0.9<x<1.3, 0?y?0.1, and 0?z?0.9 are satisfied] with a composite oxide (B) or a carboxylic acid (B) represented by general formula (2): CnH2n+1COOH [wherein 3?n?7 is satisfied]. The composite oxide (B) contains one or at least two elements selected from the group consisting of P (phosphorus), Si, Ce, and Bi and one or at least two elements selected from the group consisting of Sn, Sm, Nd, and Y (yttrium).Type: GrantFiled: December 27, 2010Date of Patent: July 29, 2014Assignees: Mitsubishi Materials Corporation, STMicroelectronics (Tours) SASInventors: Jun Fujii, Hideaki Sakurai, Takashi Noguchi, Nobuyuki Soyama
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Publication number: 20140206136Abstract: Precursors for use in depositing antimony-containing films on substrates such as wafers or other microelectronic device substrates, as well as associated processes of making and using such precursors, and source packages of such precursors. The precursors are useful for deposition of Ge2Sb2Te5 chalcogenide thin films in the manufacture of nonvolatile Phase Change Memory (PCM) or for the manufacturing of thermoelectric devices, by deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).Type: ApplicationFiled: March 18, 2014Publication date: July 24, 2014Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Tianniu Chen, William Hunks, Philip S.H. Chen, Chongying Xu, Leah Maylott
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Patent number: 8784979Abstract: In a thermally sprayed, gastight protective layer for metal substrates, such as Fe, Ni, Al, Mg and/or Ti, the spray powder for the purpose includes at least two components. The first is a silicate mineral or rock and the second is a metal powder and/or a further silicate mineral or rock. The silicate mineral or rock component in the spray powder has an alkali content of less than 6 percent by weight.Type: GrantFiled: May 30, 2008Date of Patent: July 22, 2014Assignee: Märkisches Werk GmbHInventor: Vadim Verlotski
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Publication number: 20140190368Abstract: The present invention relates to methods and compositions for coating aluminum substrates. In an embodiment, the invention includes a method of applying a coating on an aluminum substrate including contacting the aluminum substrate with a first solution. The first solution can include a zinc metal salt, a sugar acid or alkali metal salt thereof, and an alkali metal hydroxide. The method can also include contacting the aluminum substrate with a second solution. The second solution can include a molybdate salt, an alkanolamine, and a fluorine acid. Other embodiments are also included herein.Type: ApplicationFiled: February 28, 2014Publication date: July 10, 2014Applicant: BIRCHWOOD LABORATORIES, INC.Inventors: William V. Block, David J. Halverson, John T. Nguyen
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Publication number: 20140174322Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.Type: ApplicationFiled: December 20, 2012Publication date: June 26, 2014Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Qin TANG, Kit Ho TONG, Chit Yiu CHAN, Martin W. BAYES
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Publication number: 20140174323Abstract: An alkoxide compound represented by the following formula (I), and a raw material for thin film formation containing the alkoxide compound. In the formula, R1 represents a linear or branched alkyl group having 2 to 4 carbon atoms, and R2 and R3 each represent a linear or branched alkyl group having 1 to 4 carbon atoms. In the formula (I), R1 is preferably an ethyl group. It is also preferred that one or both of R2 and R3 be an ethyl group. The raw material for thin film formation including an alkoxide compound represented by general formula (I) is preferably used as a raw material for chemical vapor deposition.Type: ApplicationFiled: May 15, 2012Publication date: June 26, 2014Applicant: ADEKA CORPORATIONInventors: Senji Wada, Akio Saito, Tomoharu Yoshino
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Publication number: 20140150692Abstract: An object is to overcome the drawbacks of conventional blue phthalocyanine pigments upon the formation of images, and to develop a blue pigment that can satisfactorily exhibit a greenish blue color high in chroma and excellent in colorfulness, brightness, dispersibility, hue, tinting power and the like and that is applicable to various image recording methods. The object can be achieved by a greenish blue pigment, which exhibits a greenish blue hue of high chroma and contains a pigment represented by the following formula (I): wherein the number, m, of substituent phthalimidomethyl group(s) is in a range of 1.0?m?5.0, and the number, n, of a substituent sulfonic group R1 is in a range of 0.05?n?1.0.Type: ApplicationFiled: July 19, 2012Publication date: June 5, 2014Applicant: DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD.Inventors: Koji Tsuchiya, Masahiko Aoba, Kenjiro Matsumoto, Takeshi Tamaki
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Patent number: 8742153Abstract: For forming a thin ruthenium film of good quality by CVD method, it is necessary to form the thin film at low temperature. There hence is a desire for a ruthenium compound having a high reactivity to heat. This invention relates to a method of producing a ruthenium-containing film by CVD or the like using, as a raw material, a ruthenium complex mixture containing (2,4-dimethylpentadienyl)(ethyl-cyclopentadienyl)ruthenium and bis(2,4-dimethylpentadienyl)ruthenium, the amount of the latter compound being 0.1 to 100% by weight based on the weight of (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium, and the like.Type: GrantFiled: November 29, 2010Date of Patent: June 3, 2014Assignee: Tosoh CorporationInventors: Atsushi Maniwa, Noriaki Oshima, Kazuhisa Kawano, Taishi Furukawa, Hirokazu Chiba, Toshiki Yamamoto
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Publication number: 20140120263Abstract: A process of pretreatment for selective application of electroless metallization to a surface of a non-conductive material and a solution useful for the pretreatment are provided. The process achieves good coverage in areas to be plated on the surface of non-conductive materials without skip plating or over plating.Type: ApplicationFiled: October 26, 2012Publication date: May 1, 2014Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Dennis Kwok-Wai YEE, Michael Chi-Yung TANG, Martin W. BAYES, Ka-Ming YIP, Chun-Man CHAN, Hung-Tat CHAN, Tsui-Kiu LI, Lok-Lok LIU
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Publication number: 20140113109Abstract: A bonding material using silver nanoparticles considerably changes in coating-material property in response to a slight change in composition, and the stability thereof has been insufficient for large-amount application. A bonding material which uses silver nanoparticles, meets the requirements for mass printing, attains dimensional stability, and gives a smooth printed surface is provided. The bonding material includes silver nanoparticles which have at least an average primary particle diameter of 1 nm to 200 nm and have been coated with an organic substance having 8 or less carbon atoms, a dispersion medium, and a viscosity modifier composed of an organic substance, and has a viscosity (measured at a shear rate of 15.7 [1/s]) of 100 Pa·s or lower and a thixotropic ratio (measured at a shear rate of 3.1 [1/s]/measured at a shear rate of 15.7 [1/s]) of 4 or lower.Type: ApplicationFiled: June 10, 2011Publication date: April 24, 2014Applicant: DOWA ELECTRONICS MATERIALS CO., LTD.Inventors: Satoru Kurita, Takashi Hinotsu, Shinya Sasaki
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Publication number: 20140102809Abstract: A coating that includes a polyisocyanate compound and at least one metal inclusion selected from the group consisting of tungsten and tungsten carbide. The metal inclusions range between about five percent by weight to about fifty percent by weight. A downhole tool that includes a body, a shank positioned at one end of the body, at least one cutter coupled to the body, and a coating coupled to at least a portion of one or more of the body or the shank. The coating includes a polyisocyanate compound and at least one metal inclusion selected from the group consisting of tungsten, tungsten carbide, and aluminum. The metal inclusions range between about five percent by weight to about fifty percent by weight. An intermediate coating is optionally disposed between at least a portion of the coating and at least one of the body or the shank.Type: ApplicationFiled: October 15, 2012Publication date: April 17, 2014Inventors: William W. King, Vamsee Chintamaneni
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Publication number: 20140087512Abstract: Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.Type: ApplicationFiled: September 13, 2013Publication date: March 27, 2014Applicant: Alliance for Sustainable Energy, LLCInventors: Calvin J. CURTIS, Alexander MIEDANER, Marinus FRANCISCUS ANTONIUS MARIA VAN HEST, David S. GINLEY, Peter A. HERSH, Louay ELDADA, Billy J. STANBERY
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Publication number: 20140087211Abstract: The magnetic recording medium coating composition includes carbon black; iron oxide; at least one organic solvent selected from the group consisting of methyl ethyl ketone, cyclohexanone, and isophorone; an organic tertiary amine selected from the group consisting of an aliphatic tertiary monoamine and an alicyclic tertiary amine; and an organic acid.Type: ApplicationFiled: September 26, 2013Publication date: March 27, 2014Applicant: FUJIFILM CORPORATIONInventor: Kazufumi OMURA
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Patent number: 8668772Abstract: A stable non-settling slurry of water and manganomanganic oxide particles having a particle size below 10 ?m. The slurry comprises water and up to 92 wt % manganomanganic oxide particles bade on the weight of the slurry. The slurry has a pH between 9 and 11 and contains 0.05 to 0.5 wt % of a dispersant based on the weight of dry manganomanganic oxide particles. The dispersant can be an ethoxylated polycarboxylate or a polyacrylic acid salt and has a molecular weight between 500 and 50 000 g/mol.Type: GrantFiled: September 14, 2011Date of Patent: March 11, 2014Assignee: Elkem ASInventors: Mohamed Al-Bagoury, Frank Vidar Rostol
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Publication number: 20140060385Abstract: The composition for forming an n-type diffusion layer in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.Type: ApplicationFiled: November 5, 2013Publication date: March 6, 2014Applicant: Hitachi Chemical Company, Ltd.Inventors: Youichi MACHII, Masato YOSHIDA, Takeshi NOJIRI, Kaoru OKANIWA, Mitsunori IWAMURO, Shuuichirou ADACHI, Takuya Aoyagi
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Publication number: 20140045106Abstract: A colored curable composition is provided which includes (A) at least one colorant selected from the group consisting of a compound represented by the following formula (I) and a compound represented by the following formula (II); (B) a colorant having a hue different from that of the (A) colorant; and (C) a polymerizable compound. In the formulae, each of R1 to R8 independently represents a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonylamino group, a carbonylamino group, a cyano group, an aryl group, or a heteroaryl group.Type: ApplicationFiled: October 22, 2013Publication date: February 13, 2014Applicant: FUJIFILM CORPORATIONInventors: Akinori FUJITA, Kazumasa MOROZUMI, Youhei ISHIJI, Tomohiro KODAMA
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Publication number: 20140030660Abstract: A multilayer resist process pattern-forming method includes providing an inorganic film over a substrate. A protective film is provided on the inorganic film. A resist pattern is provided on the protective film. A pattern is provided on the substrate by etching that utilizes the resist pattern as a mask. A multilayer resist process inorganic film-forming composition includes a compound, an organic solvent, and a crosslinking accelerator. The compound includes a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof. The compound includes at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements.Type: ApplicationFiled: September 27, 2013Publication date: January 30, 2014Applicant: JSR CORPORATIONInventors: Kazunori TAKANASHI, Yoshio TAKIMOTO, Takashi MORI, Kazuo NAKAHARA, Masayuki MOTONARI
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Publication number: 20140016253Abstract: A sealing material includes a metallic glassType: ApplicationFiled: July 15, 2013Publication date: January 16, 2014Inventors: Eun Sung LEE, Se Yun KIM, Jin Man Park, Young Hwan KIM, Suk Jun KIM, Sang Soo JEE, Sang Mock LEE, In Taek HAN
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Publication number: 20140011052Abstract: A curable composition includes a 3-aryl benzoxazine, polyamine, and superacid. Articles including the curable composition, methods of curing the curable composition, and a tack-free reaction product preparable from the curable composition are also disclosed.Type: ApplicationFiled: March 6, 2012Publication date: January 9, 2014Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventor: Ilya Gorodisher
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Publication number: 20140000480Abstract: A method of fabricating a liquid for an oxide thin film is provided, which includes mixing at least two kinds of dispersoids selected from the group consisting of a Zinc compound, an Indium compound, a Gallium compound, a Tin compound and a Thallium compound, with dispersion media corresponding to the selected dispersoids to form a dispersion system, and stirring and aging the dispersion system at a predetermined temperature for a predetermined time, wherein a molar ratio of the Zinc compound to each of the Indium compound, Gallium compound, Tin compound and Thallium compound is 1:0.1 to 1:2. According to the present invention, the liquid for the oxide thin film may be fabricated by a sol-gel method making it capable of being implemented in mass production in a simple and low-cost manner as opposed to the conventional vacuum deposition method.Type: ApplicationFiled: August 30, 2013Publication date: January 2, 2014Applicant: Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Hyun Jae Kim, Kyung Ho Kim, Gun Hee Kim, Tae Hoon Jeong, Hyun Soo Shin, Won Jun Park, Yun Jung Choi, Ka Young Lee
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Patent number: 8617305Abstract: Novel families of tri-valent metal complexes including scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, lutetium, aluminum, gallium, indium, manganese, antimony, bismuth; and of divalent metal complexes including magnesium, calcium, strontium, barium, manganese, cobalt, iron, nickel, ruthenium, copper, zinc, cadium are disclosed. These metal complexes can be used as precursors to deposit metal or metal oxide films in semi-conductor industries.Type: GrantFiled: January 11, 2012Date of Patent: December 31, 2013Assignee: Air Products and Chemicals, Inc.Inventors: Xinjian Lei, Daniel P. Spence
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Patent number: 8613796Abstract: A palladium precursor composition includes at least one palladium salt and at least one fluorinated component, wherein if the fluorinated component is not a fluorinated organoamine, the composition further includes an organoamine, and if the fluorinated component is a fluorinated organoamine, the composition may optionally further include one or more additional fluorinated components. Further disclosed is a substantially pinhole-free palladium layer formed from the precursor composition.Type: GrantFiled: September 17, 2012Date of Patent: December 24, 2013Assignee: Xerox CorporationInventors: Yiliang Wu, Nan-Xing Hu
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Publication number: 20130302593Abstract: The invention provides a process for exfoliating a 3-dimensional layered material to produce a 2-dimensional material, said process comprising the steps of mixing the layered material in a water-surfactant solution to provide a mixture wherein the material and atomic structural properties of the layered material in the mixture are not altered; applying energy, for example ultrasound, to said mixture; and applying a force, for example centrifugal force, to said mixture. The invention provides a fast, simple and high yielding process for separating 3-dimensional layered materials into individual 2-dimensional layers or flakes, which do not re-aggregate, without utilising hazardous solvents.Type: ApplicationFiled: September 2, 2011Publication date: November 14, 2013Applicant: The Provost, Fellows, Foudation Scholars, and the Other Members of Board of the College of the HolyInventors: Jonathan Coleman, Ronan Smith, Mustafa Lotya
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Publication number: 20130302524Abstract: A deacidification composition for use in for treating printed cellulosic materials is provided. A method of making the composition and a method of preparing components of the composition also are provided. The composition includes a single metal alkoxide and a double metal alkoxide.Type: ApplicationFiled: March 15, 2013Publication date: November 14, 2013Inventor: Richard Daniel Smith
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Patent number: 8568525Abstract: Disclosed herein are a hard coating film, a material coated with the hard coating film, and a die for cold plastic working, the coating film excelling conventional surface coating layers in wear resistance as well as slidability with a low frictional coefficient. The hard coating film is characterized by a chemical composition of (VxM1-x)(BaCbN1-a-b), where 0.4?x?0.95 ??(1A) 0?a?0.2 ??(2A) 0?1-a-b?0.35 ??(3A) 0.6?b?1 ??(4A) M denotes at least one species of elements belonging to Groups 4a, 5a, and 6a and Si and Al; and x, 1-x, a, b, and 1-a-b represent respectively the atomic ratio of V, M, B, C, and N.Type: GrantFiled: November 10, 2011Date of Patent: October 29, 2013Assignee: Kobe Steel, Ltd.Inventor: Kenji Yamamoto
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Publication number: 20130266509Abstract: The present invention relates to a method for coating nanoparticles to achieve stable dispersions of said particles in a liquid medium and the surface functionalization thereof with groups that have physical activity such as luminescence, chemical activity such as catalytic capacity and/or biological activity such as a capacity for selectively binding with a biological entity.Type: ApplicationFiled: September 27, 2011Publication date: October 10, 2013Inventors: Rafael Piñol Lacambra, Ángel Millán Escolando, Fernando Palacio Parada, Lierni Gabilondo Ugarte
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Publication number: 20130237011Abstract: A method of manufacturing a thin-film transistor substrate includes: applying a composition on a substrate to form a thin-film on the substrate, heating the thin-film, and patterning the thin-film to form an oxide semiconductor pattern. The composition includes a metal nitrate and water. The potential of hydrogen (pH) of the composition is about 1 to about 4.Type: ApplicationFiled: November 16, 2012Publication date: September 12, 2013Applicants: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SAMSUNG DISPLAY CO., LTD.Inventors: Yeon-Taek JEONG, Bo-Sung KIM, Doo-Hyoung LEE, Seung-Ho JUNG, Tae-Young CHOI, Doo-Na KIM, Byeong-Soo BAE, Chan-Woo YANG, Byung-Ju LEE, Kang-Moon JO, Young-Hwan HWANG, Jun-Hyuck JEON
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Publication number: 20130231428Abstract: The invention relates to a composition which, when mixed with a polymer composition, allows for the formation of a continuous and cohesive film. The film is characterized in that it provides water, grease and oil resistance, provides a water vapour barrier and can used as wax replacement treatment and a top coat for flexible packaging, but also on other substrates. This film is formed at a very fast set speed without the need of thermal energy. The composition contains i) a salt of one or more of myristic, palmitic and stearic acid; and preferably also ii) a C9-C18 fatty acid complex of a metal ion, said metal ion having an oxidation state of at least 3. The invention also provides processes and coated substrates.Type: ApplicationFiled: April 10, 2013Publication date: September 5, 2013Applicant: Retec F3 Technologies, Sec.Inventors: Francois DANDENAULT, Djamel BAGHDAD DAIDJ, Serge BERUBE
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Patent number: 8524786Abstract: A process for producing a fine silver particle colloidal dispersion which can simply form conductive silver layers and antimicrobial coatings by screen printing or the like. The process is characterized by having a reaction step of allowing an aqueous silver nitrate solution to react with a mixed solution of an aqueous iron(II) sulfate solution and an aqueous sodium citrate solution to form an agglomerate of fine silver particles, a filtration step of filtering the resultant agglomerate of fine silver particles to obtain a cake of the agglomerate of fine silver particles, a dispersion step of adding pure water to the cake to obtain a first fine silver particle colloidal dispersion of a water system in which dispersion the fine silver particles have been dispersed in the pure water, and a concentration and washing step of concentrating and washing the first fine silver particle colloidal dispersion of a water system.Type: GrantFiled: July 15, 2010Date of Patent: September 3, 2013Assignee: Sumitomo Metal Mining Co., Ltd.Inventors: Kenji Kato, Masaya Yukinobu
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Patent number: 8523996Abstract: A method of fabricating a liquid for an oxide thin film is provided, which includes mixing at least two kinds of dispersoids selected from the group consisting of a Zinc compound, an Indium compound, a Gallium compound, a Tin compound and a Thallium compound, with dispersion media corresponding to the selected dispersoids to form a dispersion system, and stirring and aging the dispersion system at a predetermined temperature for a predetermined time, wherein a molar ratio of the Zinc compound to each of the Indium compound, Gallium compound, Tin compound and Thallium compound is 1:0.1 to 1:2. According to the present invention, the liquid for the oxide thin film may be fabricated by a sol-gel method making it capable of being implemented in mass production in a simple and low-cost manner as opposed to the conventional vacuum deposition method.Type: GrantFiled: February 14, 2008Date of Patent: September 3, 2013Assignee: Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Hyun Jae Kim, Kyung Ho Kim, Gun Hee Kim, Tae Hoon Jeong, Hyun Soo Shin, Won Jun Park, Yun Jung Choi, Ka Young Lee
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Publication number: 20130220178Abstract: The current invention relates to a method of making metal oxide nanoparticles comprising the reaction of—at least one metal oxide precursor (P) containing at least one metal (M) with—at least one monofunctional alcohol (A) wherein the hydroxy group is bound to a secondary, tertiary or alpha-unsaturated carbon atom—in the presence of at least one aliphatic compound (F) according to the formula Y1—R1—X—R2—Y2, wherein—R1 and R2 each are the same or different and independently selected from aliphatic groups with from 1 to 20 carbon atoms, —Y1 and Y2 each are the same or different and independently selected from OH, NH2 and SH, and —X is selected from the group consisting of chemical bond, —O—, —S—, —NR3—, and CR4R5, wherein R3, R4 and R5 each are the same or different and represent a hydrogen atom or an aliphatic group with from 1 to 20 carbon atoms which optionally carries functional groups selected from OH, NH2 and SH.Type: ApplicationFiled: October 7, 2010Publication date: August 29, 2013Applicant: Justus-Liebig-Universitat GiessenInventors: Roman Zieba, Alexander Traut, Cornelia Röger-Göpfert, Torsten Brezesinski, Bernadette Landschreiber, Claudia Grote, Georg Garnweitner, Alexandra Seeber, Bernd Smarsly, Christoph Wiedmann, Till von Graberg, Jan Haetge
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Publication number: 20130213265Abstract: A method of forming a monolayer film of nanoparticles includes forming a fluid mixture by combining nanoparticles dispersed in water with a water-miscible organic solvent and a molecular ligand comprising a head group with affinity for the nanoparticle, and introducing the fluid mixture to a substrate in the presence of an air/fluid interface, thereby causing a monolayer film of nanoparticles to form on the substrate. Such monolayers films can include metallic nanoparticles such as gold, and possess substantially uniform spacing over at least a one centimeter length scale.Type: ApplicationFiled: February 20, 2013Publication date: August 22, 2013Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Jake Fontana, Jawad Naciri, Banahalli R. Ratna
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Patent number: 8507090Abstract: Molybdenum disulfide powders include substantially spherically-shaped particles of molybdenum disulfide that are formed from agglomerations of generally flake-like sub-particles. The molybdenum disulfide powders are flowable and exhibit uniform densities. Methods for producing a molybdenum disulfide powder may include the steps of: Providing a supply of molybdenum disulfide precursor material; providing a supply of a liquid; providing a supply of a binder; combining the molybdenum disulfide precursor material with the liquid and the binder to form a slurry; feeding the slurry into a stream of hot gas; and recovering the molybdenum disulfide powder, the molybdenum disulfide powder including substantially spherically-shaped particles of molybdenum disulfide formed from agglomerations of generally flake-like sub-particles.Type: GrantFiled: April 27, 2011Date of Patent: August 13, 2013Assignee: Climax Engineered Materials, LLCInventors: Matthew C. Shaw, Carl V. Cox, Yakov Epshteyn
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Publication number: 20130196167Abstract: A hydrophilic film is formed on the surface of a metal material, inhibits the growth of condensation water, and provides mold resistance, and a hydrophilization treatment agent is used for forming the hydrophilic film. The hydrophilization treatment agent has one or more compounds selected from poorly water-soluble cerium compounds; and a hydrophilic film prepared from the hydrophilization treatment agent. The poorly water-soluble cerium compounds are one or more compounds selected from cerium carbonate, cerium fluoride, cerium fluoride, and cerium oxide. By forming the hydrophilic film on the surface of a metal material, the growth of condensation water can be inhibited, and the mold resistance can be provided.Type: ApplicationFiled: October 18, 2011Publication date: August 1, 2013Applicant: NIHON PARKERIZING CO., LTD.Inventor: Toshihisa Kataoka
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Patent number: 8491716Abstract: Disclosed herein is a method of manufacturing inorganic hollow yarns, such as cermets, oxide-non oxide composites, poorly sinterable non-oxides, and the like, at low costs. The method includes preparing a composition comprising a self-propagating high temperature reactant, a polymer and a dispersant, wet-spinning the composition through a spinneret to form wet-spun yarns, washing and drying the wet-spun yarns to form polymer-self propagating high temperature reactant hollow yarns, and heat-treating the polymer-self propagating high temperature reactant hollow yarns to remove a polymeric component from the polymer-self propagating high temperature reactant hollow yarns while inducing self-propagating high temperature reaction of the self-propagating high temperature reactant to form inorganic hollow yarns. The composition comprises 45˜60 wt % of the self-propagating high temperature reactant, 6˜17 wt % of the polymer, 0.1˜4 wt % of the dispersant, and the balance of an organic solvent.Type: GrantFiled: September 9, 2010Date of Patent: July 23, 2013Assignee: Korea Institute of Energy ResearchInventors: Churl-Hee Cho, Do-Kyung Kim, Jeong-Gu Yeo, Young-Soo Ahn, Dong-Kook Kim, Hong-Soo Kim
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Publication number: 20130171779Abstract: According to a method of manufacturing a thin film transistor substrate, a composition including a metal oxalate and a solvent for manufacturing an oxide semiconductor is coated to form a thin film, the thin film is annealed, and the thin film is patterned to form a semiconductor pattern.Type: ApplicationFiled: November 6, 2012Publication date: July 4, 2013Applicants: Industry-Academic Cooperation Foundation, Yonsei University, Samsung Display Co., Ltd.Inventors: Yeon-Taek JEONG, Bo-Sung KIM, Doo-Hyoung LEE, Doo-Na KIM, Eun-Hye PARK, Dong-Lim KIM, Hyun-Jae KIM, You-Seung RIM, Hyun-Soo LIM
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Patent number: 8475941Abstract: There is provided a hard film excellent in wear resistance. The hard film in accordance with the present invention includes (TiaCrbAlcLd)(BxCyNz) in terms of composition, in which the L is at least one of Si and Y, and the a, b, c, d, x, y, and z each denote the atomic ratio, and satisfy: 0.1?a<0.3; 0.3<b<0.6; 0.2?c<0.35; 0.01?d<0.1; a+b+c+d=1; x?0.1; y?0.1; 0.8?z?1; and x+y+z=1.Type: GrantFiled: September 15, 2010Date of Patent: July 2, 2013Assignee: Kobe Steel, Ltd.Inventor: Kenji Yamamoto
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Publication number: 20130143035Abstract: There is provided a hydrophobic-organic-solvent dispersion containing colloidal particles of anhydrous zinc antimonate having high transparency which has not been attained hitherto, a coating composition containing the hydrophobic-organic-solvent dispersion and a member coated with the coating composition. A hydrophobic-organic-solvent dispersion comprising colloidal particles of anhydrous zinc antimonate having a primary particle diameter of 5 to 500 nm, which are surface-modified with azi alkylamine and a surfactant having an acid group is used. The surfactant has a carboxylic acid group, a sulfonic acid group, or a phosphoric acid group.Type: ApplicationFiled: August 25, 2011Publication date: June 6, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Osamu Fujimoto, Tomonari Shinji, Yoshinari Koyama
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Publication number: 20130136716Abstract: A binder for an antifouling composition comprising a mixture of: (i) at least one organic monofunctional acid or a salt thereof; (ii) at least one organic polyfunctional acid having a molecular weight of 300 to less than 1000 or a salt thereof, e.g. a dimerised, trimerised or oligomerised fatty acid or resin acid; and (iii) at least one metal compound.Type: ApplicationFiled: June 3, 2011Publication date: May 30, 2013Applicant: JOTUN A/SInventors: Alexander Enström, Henning Johnsen, Cecilia Winander, Morten Eikenes
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Patent number: 8445578Abstract: The present invention relates to compositions for forming reflecting layer having organic silver complexes, and method for preparing reflecting layer using the same. More specifically, it relates to compositions for forming reflecting layer including silver complexes that have distinct structures and the method for preparing reflecting layer, where primary coating is applied to promote the adhesive force to materials such as plastic, ceramic, metal, etc. and then a high-reflecting layer is formed by using the silver coating fluid, followed by transparent coating for protection.Type: GrantFiled: April 27, 2007Date of Patent: May 21, 2013Assignee: Inktec Co., Ltd.Inventors: Kwang-Choon Chung, Hyun-Nam Cho, Seong-Yong Uhm, Young-Kwan Seo
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Publication number: 20130112110Abstract: Room temperature electrochemical methods to deposit thin films of chalcogenide glasses.Type: ApplicationFiled: September 19, 2012Publication date: May 9, 2013Inventors: Keith J. Stevenson, Sankaran Murugesan, Patrick Keams, Arunkumar Akkineni
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Publication number: 20130112109Abstract: A high emissive paint comprises organic materials with different functional groups, one or more inorganic materials, and optionally other paint property adjusting agents. The infrared absorption range of the paint derives from organic functional groups, such as C—C, C—H, N—H, C—N, C—O and C—X groups, and the one or more inorganic materials. One or more inorganic materials may also be present as micro- or nano-sized particles.Type: ApplicationFiled: October 18, 2012Publication date: May 9, 2013Inventors: Sihai Chen, Ning-Cheng Lee
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Publication number: 20130104931Abstract: Disclosed is a liquid chemical for forming a water repellent protective film at least on surfaces of recessed portions of a metal-based wafer, the liquid chemical for forming a water repellent protective film being characterized by comprising a surfactant which has an HLB value of 0.001-10 according to Griffin's method and includes a hydrophobic moiety having a C6-C18 hydrocarbon group and water, and characterized in that the concentration of the surfactant in the liquid chemical is not smaller than 0.00001 mass % and not larger than the saturated concentration relative to 100 mass % of the total amount of the liquid chemical. This liquid chemical can improve a cleaning step which tends to induce a metal-based wafer to cause a pattern collapse.Type: ApplicationFiled: June 15, 2011Publication date: May 2, 2013Applicant: Central Glass Company, LimitedInventors: Shinobu Arata, Masanori Saito, Takashi Saio, Soichi Kumon, Hidehisa Nanai
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Publication number: 20130104773Abstract: The present invention relates to halogenated indium oxo alkoxides of the generic formula In7O2(OH)(OR)12X4(ROH)x where R=C1-C15-alkyl, C1-C15-alkenyl, C1-C15-alkynyl, C1-C15-alkoxyalkyl, C6-C15-aryl- or C7-C15-alkoxyaryl, X=F, Cl, Br, I and x=0 to 10, to processes for preparation thereof and to use thereof.Type: ApplicationFiled: July 12, 2011Publication date: May 2, 2013Applicant: Evonik Degussa GmbHInventors: Juergen Steiger, Duy Vu Pham, Heiko Thiem, Alexey Merkulov, Arne Hoppe