Carbohydrate Or Derivative Containing Patents (Class 106/5)
  • Patent number: 8685158
    Abstract: A water retention agent for a cementitious composition, characterized in that it takes the form of a liquid aqueous suspension of at least one polysaccharide at a mass concentration of between 15 and 30% in an aqueous solution of a strong base salt, excluding ammonium salts, with an anionic strength of between 1.25 mol/L and 15 mol/L, having a pH greater than 9 and containing an attapulgite in micronized form and at least one non-phyllitic mineral powder, referred to hereafter as filler, which is chemically inert in the aqueous suspension and which has a grain size of between 0.1 and 100 micrometers, the aqueous suspension being stable at least in a temperature range of between 5° C. and 30° C. The water retention agent is suitable for increasing both the viscosity and the water retention capacity of cementitious compositions without affecting the spreading ability thereof.
    Type: Grant
    Filed: November 26, 2012
    Date of Patent: April 1, 2014
    Assignee: Ciments Francais
    Inventors: Faber Fabbris, Bénigne Bollotte
  • Patent number: 8536253
    Abstract: Catalytic partial oxidation using a metal oxide catalyst surface treats crumb rubber that is recovered from waste rubber tires. Advantages of using catalytically oxidized crumb rubber relative to using non-catalytically oxidized crumb rubber in making the rubberized concrete, includes superior mechanical strength and water-repealing capability, lower oxidation temperature and shorter oxidation time, and accelerated hydration times. Rubber oil (a gas condensate) co-produced from the crumb rubber partial oxidation process is equal to or better than the commercial superplasticizers. Industrial scale partial oxidation employs a continuous flow tubular reactor where a crumb rubber/catalyst mixture is fed into the reactor co-currently with an air/nitrogen mixture.
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: September 17, 2013
    Assignee: Chun Well Industry Co. Ltd.
    Inventors: Kuo-Ji Yen, Maw-Tien Lee, Shou-Ming Lee, Jen-Ray Chang, Liang-Hsign Chou
  • Publication number: 20130032573
    Abstract: Disclosed is a method for polishing a silicon wafer, wherein a surface to be polished of a silicon wafer is rough polished, while supplying a polishing liquid, which is obtained by adding a water-soluble polymer to an aqueous alkaline solution that contains no free abrasive grains, to a polishing cloth. Consequently, the surface to be polished can be polished at high polishing rate and the flatness of the edge portion including roll-off and roll-up can be controlled.
    Type: Application
    Filed: March 23, 2011
    Publication date: February 7, 2013
    Inventors: Shinichi Ogata, Ryuichi Tanimoto, Ichiro Yamasaki, Shunsuke Mikuriya
  • Publication number: 20120152148
    Abstract: Disclosed herein is a composition comprising a formula emulsion wherein the formula emulsion comprises a cationic or amphoteric surfactant, a wax emulsion, a thickener, and at least two silicone oils having different viscosities, wherein the composition is free of abrasives and organic solvents. The weighted average viscosity of the silicone oils is 2200 to 2400 centistokes (cSt).
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Inventors: Colin Dilley, Joseph K. Mathews
  • Publication number: 20100272819
    Abstract: The present invention relates to novel nanoparticles based on cellulose and a process for producing them and their use.
    Type: Application
    Filed: November 29, 2007
    Publication date: October 28, 2010
    Inventors: Jurgen Engelhardt, Birgit Kosan, Christa Maria Kruger, Frank Meister, Klaus Nachtkamp, Jens Schaller
  • Patent number: 7736405
    Abstract: A CMP composition containing a rheology agent, e.g., in combination with oxidizing agent, chelating agent, inhibiting agent, abrasive and solvent. Such CMP composition advantageously increases the materials selectivity in the CMP process and is useful for polishing surfaces of copper elements on semiconductor substrates, without the occurrence of dishing or other adverse planarization deficiencies in the polished copper.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: June 15, 2010
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Michael Darsillo, Peter Wrschka, Karl Boggs
  • Publication number: 20100055331
    Abstract: A method and apparatus for making and applying an organic wax for protecting surfaces. The method includes steps for creating the invention as well as using the invention. Application of the invention to the surface includes applying the wax to the hands allowing the wax to melt before applying the wax to the surface. The wax is applied in a horizontal motion and then leveled with a foam and or cotton cloth. The wax is then allowed to dry and after 15 minutes the coated surface is buffed with a clean cloth to a lustrous shine. After a curing period the treated surface is wiped with a clean cloth.
    Type: Application
    Filed: August 29, 2008
    Publication date: March 4, 2010
    Inventor: Arthur Marin
  • Patent number: 7628848
    Abstract: A water-based, non-oily, scented, liquid composition, with an ultraviolet filter, to be applied manually by brush or sponge, or by using an air gun, to surfaces of a synthetic nature. When impregnated, such surfaces recover their shine to an extent according to the number of layers applied, and are renewed in appearance.
    Type: Grant
    Filed: April 17, 2007
    Date of Patent: December 8, 2009
    Assignee: Janus Enterprises, LLC
    Inventor: Rodrigo F. Saldarriaga
  • Publication number: 20090274757
    Abstract: Polish compositions for coating pharmaceutical solid dosage forms such as tablets are disclosed. The polish composition comprises water, coating agent, and a film forming agent. Polished pharmaceutical solid dosage forms such as tablets comprising a polished exterior surface are also disclosed. Processes of polishing pharmaceutical solid dosage forms such as tablets are disclosed.
    Type: Application
    Filed: April 30, 2009
    Publication date: November 5, 2009
    Applicant: WYETH
    Inventor: John C. CLARK
  • Patent number: 7597729
    Abstract: A polishing composition contains an abrasive such as colloidal silica, at least one kind of compound selected from imidazole and an imidazole derivative, and water. The polishing composition preferably further contains an alkali compound, a water-soluble polymer, or a chelating agent. The polishing composition is suitable for use in polishing an edge of an object such as a semiconductor substrate.
    Type: Grant
    Filed: June 28, 2007
    Date of Patent: October 6, 2009
    Assignee: Fujimi Incorporated
    Inventor: Shinichiro Takami
  • Patent number: 7534277
    Abstract: Disclosed is a slurry composition for secondary polishing of silicon wafers comprising: 2˜10 weight % of colloidal silica having an average particle size of 30˜80 nm; 0.5˜1.5 % by weight of ammonia; 0.2˜1 weight % of a hydroxyalkycellulose-based polymer for modifying rheology of the composition; 0.03˜0.5 weight % of a polyoxyethylenealkylamine ether-based nonionic surfactant; 0.01˜1 weight % of a quaternary ammonium base and the balance of deionized water.
    Type: Grant
    Filed: July 30, 2003
    Date of Patent: May 19, 2009
    Assignee: Cheil Industries, Inc.
    Inventors: Hyun Soo Roh, Tae Won Park, Kill Sung Lee, In Kyung Lee
  • Patent number: 7419718
    Abstract: A coating film forming liquid containing a saccharide, and titanium oxide fine particles having peroxy groups or titanium oxide fine particles not having peroxy groups is applied onto a surface of a substrate such as glass, metal or a tile, and then heating is carried out at a high temperature, thus forming on the substrate a super-hydrophilic photocatalytic coating film that contains titanium oxide fine particles and has a water contact angle in a state in which the photocatalyst is not excited of less than 10°.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: September 2, 2008
    Assignee: Sustainable Titania Technology Incorporated
    Inventors: Shiro Ogata, Yoshimitsu Matsui
  • Patent number: 7384871
    Abstract: The present invention provides an aqueous composition useful for polishing nonferrous metal interconnects on a semiconductor wafer comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.01 to 5% by weight copolymer of acrylic acid and methacrylic acid, and balance water, wherein the copolymer of acrylic acid and methacrylic acid has a monomer ratio (acrylic acid/methacrylic acid) in the range of 1:30 to 30:1 and the copolymer has a molecular weight in the range of 1K to 1000K.
    Type: Grant
    Filed: July 1, 2004
    Date of Patent: June 10, 2008
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Francis J. Kelley, John Quanci, Joseph K. So, Hongyu Wang
  • Patent number: 7303993
    Abstract: The present invention provides an aqueous composition useful for CMP of a semiconductor wafer containing a metal comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.001 to 10% by weight copolymer blends of a first copolymer and a second copolymer and balance water.
    Type: Grant
    Filed: July 1, 2004
    Date of Patent: December 4, 2007
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Francis J. Kelley, John Quanci, Joseph K. So, Hongyu Wang
  • Patent number: 7300478
    Abstract: The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that retards hard settling. The agent that retards hard settling is preferably a polysaccharide such as xanthan gum, microcrystalline cellulose and/or sodium alginate, the latter of which may be treated with a divalent metal salt such as calcium carbonate. The slurry composition according to the invention can be used to polish glass and glass ceramics at a high removal rate, but does not hard settle upon extended static conditions and can be easily resuspended. The present invention also provides a method of polishing a glass or glass ceramic substrate using the slurry composition.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: November 27, 2007
    Assignee: Ferro Corporation
    Inventors: Steven A. Ferranti, Dana L. Zagari, LeVern G. Burm, Jr., Karla Marie Goff
  • Patent number: 7211121
    Abstract: The present invention relates to a polishing composition more suitable for use in polishing synthetic resin products or metal products. The polishing composition includes a reaction product produced by a reaction between a polyalkylene oxide and a compound having a functional group having reactivity with a hydroxyl group, aluminum oxide, a polishing accelerator including at least one salt selected from the group consisting of a metal salt of an inorganic acid or organic acid and an ammonium salt of an inorganic acid or organic acid, and water.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: May 1, 2007
    Assignee: Fujimi Incorporated
    Inventors: Tatsuhito Mutoh, Hirohito Kitano
  • Patent number: 7211122
    Abstract: A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: May 1, 2007
    Assignee: Fujimi Incorporated
    Inventor: Shoji Iwasa
  • Patent number: 7204865
    Abstract: The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO—(EO)a—(PO)b—(EO)c—H, wherein EO represents an oxyethylene group, PO represents an oxypropylene group, each of a and c represents the polymerization degree of ethylene oxide, b represents the polymerization degree of propylene oxide, and each of a, b, and c is an integer of 1 or greater; silicon dioxide; a basic compound; at least either one of hydroxyethyl cellulose and polyvinyl alcohol; and water.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: April 17, 2007
    Assignee: Fujimi Incorporated
    Inventor: Shuhei Yamada
  • Patent number: 7052522
    Abstract: A polishing composition of the present invention, which is used in polishing the edge of a wafer for semiconductor devices, effectively suppresses remaining amounts of abrasives on the wafer. The polishing composition includes silicon dioxide, an alkaline compound, a water-soluble polymer, and water. The average primary particle diameter DSA of the silicon dioxide is at least 40 nm. The ratio D95/D5 of the silicon dioxide is no more than 3.8. The value D95/D5/DSA of the silicon dioxide is no more than 0.07.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: May 30, 2006
    Assignee: Fujimi Incorporated
    Inventor: Shinichiro Takami
  • Patent number: 6824578
    Abstract: A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the same time high efficiency of polishing can be achieved stably. According to the present invention, in a polishing material having, as the major component, rare earth oxides including cerium oxide, any one of crystalline cellulose, calcium secondary phosphate, a condensate of sodium &bgr;-naphthalenesulphonate and formalin, and synthetic silica is contained as an anti-solidification agent capable of softening abrasive grain precipitates of the polishing material when the abrasive grains of the polishing material are dispersed into a dispersion medium, and sodium hexametaphosphate or pyrophosphate is contained as a dispersant capable of dispersing the abrasive grains of the polishing material into the dispersion medium.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: November 30, 2004
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Yoshitsugu Uchino, Hidehiko Yamasaki, Shigeru Kuwabara
  • Publication number: 20040177786
    Abstract: A wax or polish also known as a surface protectant where ones primary reason for applying it is to impart a long lasting and specific scent or fragrance to a surface, such as that of an automobile, or any other surface of choice. As a secondary consideration the product will also offer surface protection from the elements.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 16, 2004
    Inventors: Leo Roy Durocher, Joseph Thomas Hesseling
  • Patent number: 6736997
    Abstract: A composition for application to a substrate to form a an electrically conductive coating thereon. The composition includes a sol-gel solution filled with a conductive powder. The coating may be conductive or resistive depending on the application. A process is provided for applying such a coating by mixing a sol-gel solution with up to about 90% by weight of the solution of a conductive powder selected from the group consisting of ceramics, inter-ceramics, semi-conductors and metals so as to provide a uniform stable dispersion. The stable dispersion is applied to a substrate and the coated substrate is fired at a temperature sufficient to remove organic constituents and to produce at least a partially conductive film on the substrate. A heating device is also provided which is a product of the above process.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: May 18, 2004
    Assignee: Datec Coating Corporation
    Inventors: Tim Olding, Mark Barrow, David Barrow
  • Patent number: 6607571
    Abstract: To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amount of dub-off is considerably reduced as compared with that of a conventional level, a polishing composition containing water, a polishing material (particularly alumina), a polishing accelerator, and at least one of hydroxypropyl cellulose and hydroxyalkyl alkyl cellulose is provided.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: August 19, 2003
    Assignees: Showa Denko K.K., Yamaguchi Seiken Kogyo K.K.
    Inventors: Ken Ishitobi, Masahiro Nozaki, Tadanori Nagao, Yoshiki Hayashi
  • Patent number: 6544307
    Abstract: A polishing compound containing cocoon-shaped silica particles and crystal silica particles, and water-soluble polymers including; at least one type selected from the groups including ammonium nitrate and ammonium acetate, and at least one type selected from methylcellulose, carboxymethylcellulose, hydroxyethylcellulose, and the group including carboxymethylcellulose.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: April 8, 2003
    Assignee: Rodel Holdings, Inc.
    Inventors: Hajime Shimamoto, Shoji Ichikawa, Katsumi Kondo, Susumu Abe, Kenji Takenouchi
  • Patent number: 6530968
    Abstract: This invention provides a chemical mechanical polishing slurry for polishing a metal film formed on an insulating film with a concave on a substrate wherein the slurry contains a thickener without an ionic group with an opposite sign to a charge on a polishing material surface to 0.001 wt % or more and less than 0.05 wt % to the total amount of the slurry and has a slurry viscosity of 1 mPa·s to 5 mPa·s both inclusive. The polishing slurry may be used in CMP to form a reliable damascene electric connection with excellent electric properties at a higher polishing rate, i.e., a higher throughput while preventing dishing or erosion.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: March 11, 2003
    Assignees: NEC Electronics Corporation, Tokyo Magnetic Printing Co., Ltd.
    Inventors: Yasuaki Tsuchiya, Tomoko Wake, Tetsuyuki Itakura, Shin Sakurai, Kenichi Aoyagi
  • Patent number: 6494928
    Abstract: There is provided a polishing compound for sheet metal coating comprising an polishing material and a surfactant in which a RB ceramics and/or CRB ceramics powder is used at least as a part of the polishing material, thereby shortening a stain removing process of a coated surface in reparative sheet metal coating work of cars, etc. without conducting a washing process thereafter.
    Type: Grant
    Filed: May 24, 2002
    Date of Patent: December 17, 2002
    Assignee: Minebea Co., Ltd.
    Inventors: Kazuo Hokkirigawa, Motoharu Akiyama, Noriyuki Yoshimura
  • Patent number: 6491745
    Abstract: The object is to provide a water/oil repellent composition which can simultaneously perform a water/oil treatment and a polishing treatment to leather products such as leather shoes, etc., by using one water/oil repellent composition, and can also exert excellent water/oil repellent effect and excellent polishing effect. It is constituted so that microcapsules, in which a polishing agent is encapsulated, are dispersed in a water/oil repellent agent.
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: December 10, 2002
    Assignee: 3M Innovative Properties Company
    Inventor: Masahiro Ashizawa
  • Patent number: 6488729
    Abstract: To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amount of dub-off is considerably reduced as compared with that of a conventional level, a polishing composition containing water, a polishing material (particularly alumina), a polishing accelerator, and at least one of hydroxypropyl cellulose and hydroxyalkyl alkyl cellulose is provided.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: December 3, 2002
    Assignees: Showa Denko K.K., Yamaguchi Seiken Kogyo K.K.
    Inventors: Ken Ishitobi, Masahiro Nozaki, Tadanori Nagao, Yoshiki Hayashi
  • Patent number: 6162268
    Abstract: The invention provides a mixture for polishing surfaces. The mixture includes polishing particles having an average size of less than 10 .mu.m and water. It also includes an accelerator for chemically attacking a surface and a starch for reducing vibration of polishing machines.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: December 19, 2000
    Assignee: Praxair S. T. Technology, Inc.
    Inventors: James Kent Knapp, Doris Kwok
  • Patent number: 5945474
    Abstract: A composition for removing a substance from a surface is prepared by: forming a gelatinous base material comprising water and a rheology agent; forming a solvent; forming a neutralizing agent; combining the gelatinous base material and the solvent with microscopic crystalline particles and an agent which reduces the effective rubbing coefficient of the microscopic crystalline particles to form a non-neutralized composition; and combining the non-neutralized composition with the neutralizing agent to form the composition. Foreign substances can be removed from a finished surface and the visibility of superficial scratches in the finished surface can be reduced by gently rubbing the composition on the finished surface and then removing the composition. The composition includes microscopic (approximately 1 micron) crystalline particles which contact, dislodge and remove the foreign substance or minute portions of the finish.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: August 31, 1999
    Inventor: Serge Gaultier
  • Patent number: 5882713
    Abstract: A stable and non-separable composition comprised of starch and a water-immiscible material can be prepared in the absence of external emulsifying or dispersing agents by thoroughly solubilizing an aqueous dispersion of the starch at elevated temperatures and incorporating the water-immiscible material into the non-retrograded starch under conditions of high turbulence. The resulting dispersions form soft gels that can be easily converted to pourable fluids by the application of heat. Upon drying, these dispersions yield solid compositions that are easily redispersed in water to form smooth, stable dispersions. These compositions are useful as thickening agents, suspending agents, waterproof coating materials, adhesives, fat substitutes, and seed coatings. They are receptive to the addition of a variety of other water-immiscible materials, such as volatile and essential oils, food flavorants, medicinals, waxes, agricultural chemicals, and the like.
    Type: Grant
    Filed: February 25, 1997
    Date of Patent: March 16, 1999
    Assignee: The United States of America as represented by the Secretary of Agriculture
    Inventors: Kenneth Eskins, George F. Fanta
  • Patent number: 5431840
    Abstract: In the new process, cleaning and care preparations for floors, shoes, leather and furniture are produced by mixing a wax emulsion containing alkyl glycoside as emulsifier with the other constituents of the preparation. The alkyl glycosides correspond to the following general formulaR--O(--G).sub.n Iin which R is a long-chain C.sub.8-22 alkyl radical, G is a glycoside-bonded residue of a monosaccharide and n has a value of 1 to 10. The wax emulsions are distinguished by particular particle fineness and extremely good compatibility with the other constituents of the preparations.
    Type: Grant
    Filed: June 21, 1993
    Date of Patent: July 11, 1995
    Assignee: Henkel Kommanditgesellschaft auf Aktien
    Inventors: Heinz-Dieter Soldanski, Bernd-Dieter Holdt, Juergen Noglich
  • Patent number: 5397384
    Abstract: A composition which comprises approximately by weight 1 to 8 percent of a hydrocarbon solvent; 1 to 4 percent of a silicone; 1 to 5.5 percent of at least one nonionic surfactant; 0.5 to 3 percent of an alkali metal neutralized tall oil fatty acid and 0.25 to 2.5 percent of an unneutralized tall oil fatty acid.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: March 14, 1995
    Assignee: Colgate Palmolive Co.
    Inventor: Karen Wisniewski
  • Patent number: 5352277
    Abstract: A final polishing composition for polishing a silicon wafer used as a substrate crystal in electrical integrated circuits comprises water, colloidal silica, a water-soluble polymeric compound, and a water-soluble salt.
    Type: Grant
    Filed: July 26, 1993
    Date of Patent: October 4, 1994
    Assignee: E. I. Du Pont de Nemours & Company
    Inventor: Shigeo Sasaki
  • Patent number: 5273824
    Abstract: A cored multi-shell emulsion particle consisting of a core particle, a void layer existing in the exterior of the core particle and a shell layer, each of which has a diameter of .phi., d and D, respectively, and the ratio of .phi., d and D is in the following range..phi./D=0.1-0.6d/D=0.2-0.8 (d>.phi.)The particle exhibits excellent hiding power, brightness, gloss and thermal insulation property as an organic pigment without impairing drying ability and strength of coated layer.
    Type: Grant
    Filed: February 1, 1991
    Date of Patent: December 28, 1993
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Futoshi Hoshino, Makoto Nakano, Kousuke Someya, Junko Morita, Takeshi Yanagihara, Akihiro Yamazaki
  • Patent number: 5085694
    Abstract: An improved polish having improved rub-out characteristics results when a silylated polyether film former is incorporated into a conventional polish formulation. The silylated polyether contains at least one polyoxyalkylene block selected from the group consisting of polyoxyethylene and polyoxypropylene in its molecule wherein the polyoxyalkylene block is attached through an organic connecting group to a silicon atom bearing at least one hydrolyzable group. A preferred water-in-oil emulsion embodiment of the polish is particularly suitable for automotive or marine applications.
    Type: Grant
    Filed: March 4, 1991
    Date of Patent: February 4, 1992
    Assignee: Dow Corning Corporation
    Inventor: Martin E. Cifuentes
  • Patent number: 4822423
    Abstract: A nail cosmetic composition comprising 3% to 15% by weight of nitrocellulose, 3% to 15% by weight of a resin, 2% to 8% by weight of a plasticizer, 60% to 85% by weight of a solvent, 1% to 10% by weight of a matting agent, and 0.1% to 2.5% by weight of mica in the form of a leaf. This nail cosmetic composition advantageously provides an excellent mat finish without impairing the other desired characteristics, especially the peeling resistance, of the nail cosmetic composition.
    Type: Grant
    Filed: July 30, 1987
    Date of Patent: April 18, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Yoshikazu Soyama, Kazunori Yamazaki, Chigusa Kitamura
  • Patent number: 4801331
    Abstract: A nail lacquer remover of the transparent gel type, consisting essentially of: (1) 30-65% by weight of a carbonate selected from the group consisting of ethylene carbonate, propylene carbonate, butylene carbonate and glycerine carbonate; (2) 10-50% by weight of 1,3-dimethyl-2-imidazolidinone; (3) 0.2-20% by weight of hydroxypropyl cellulose; and (4) 13-40% by weight of water. The nail lacquer remover has low flammability, and does not cause drying and cracking of nails.
    Type: Grant
    Filed: February 18, 1988
    Date of Patent: January 31, 1989
    Assignee: Suhama Chemical Co., Ltd.
    Inventor: Akira Murase
  • Patent number: 4712571
    Abstract: A novel nail polish composition having a low viscosity, i.e. not greater than about 200 cps comprising from about 3.0% to about 24.0% a shade paste, suitable film former and thinner and a pen-like means for applying said nail polish having a substantially non-bristle nib.
    Type: Grant
    Filed: January 8, 1985
    Date of Patent: December 15, 1987
    Assignee: Chesebrough-Pond's, Inc.
    Inventors: Harvey M. Remz, Philip J. Gordon, John D. Cunningham, Joseph D. Melnik
  • Patent number: 4699807
    Abstract: A composition containing ethanolamine, a silicate and a protective colloid is useful to restore broken, crazed, or alligatored finishes without removing the intact finish beneath.
    Type: Grant
    Filed: October 7, 1986
    Date of Patent: October 13, 1987
    Assignee: Golden Age Furniture Finishing Products Co.
    Inventor: John S. Howell
  • Patent number: 4260396
    Abstract: A composition for polishing silicon and germanium comprises a synthetic amorphous silica polishing agent and a suspending agent selected from the group consisting of water-soluble carboxypolymethylene gums and xanthum gums. The composition may be used for polishing in the form of an aqueous alkaline slurry.
    Type: Grant
    Filed: January 16, 1978
    Date of Patent: April 7, 1981
    Assignee: W. R. Grace & Co.
    Inventor: Rimantas Glemza
  • Patent number: 4233075
    Abstract: A food base preservative for material surfaces such as finished furniture surfaces, painted surfaces, glass surfaces, vinyl plastic surfaces, and the like. The preservative solution is made from okra, water and a food preservative agent, and it is used by impregnating soft cloths, such as towels, with the solution and shining material surfaces with the impregnated cloths.
    Type: Grant
    Filed: July 13, 1979
    Date of Patent: November 11, 1980
    Inventor: Stephano Picone
  • Patent number: 4222747
    Abstract: The invention relates to a polishing material of the type containing powdered cerium oxide suspended in water.According to the invention, this polishing material also contains, in combination, a substance for use as a thickener and a substance for reducing the surface tension.The polishing material is particularly useful for polishing ophthalmic lenses made from organic materials.
    Type: Grant
    Filed: December 27, 1978
    Date of Patent: September 16, 1980
    Assignee: Essilor International, Cie Generale d'Optique
    Inventors: Jean-Claude Dauguet, Jean-Pierre Mazzone, Pierre Moreau
  • Patent number: 4162920
    Abstract: A composition for finishing lithographic printing plates having an oil phase which preferentially adheres to the image areas and an aqueous phase which desensitizes the metal carrier and aids in maintaining its hydrophilic character upon storage.
    Type: Grant
    Filed: September 16, 1977
    Date of Patent: July 31, 1979
    Assignee: American Hoechst Corporation
    Inventor: Thomas N. Gillich
  • Patent number: 4161394
    Abstract: A solution for use in suspending 0.05 to 15 micron ceria or alumina particles to produce a slurry for polishing lenses and semiconductor wafers is disclosed. The solution consists of water containing from 0.06 to 0.75 percent by weight of xanthan gum and from 0.5 to 5.0 percent by weight of a dispersing agent selected from the group consisting of the condensate of formaldehyde with naphthalene monosulfonic acid, polymethacrylic acid and their ammonium and alkali metal salts. The slurry is prepared by mixing one volume of the solution with about two volumes of water and then dispersing alumina, ceria, or zirconia particles in the resultant mixture. The quantity of ceria or alumina dispersed is in the range 10 to 20 percent by weight based on the combined weight of solution and added water.
    Type: Grant
    Filed: June 19, 1978
    Date of Patent: July 17, 1979
    Inventor: Glen B. Regan
  • Patent number: 4035163
    Abstract: An alkaline cleaning and conditioning composition for ceramic surfaces is provided in the form of an abrasive powder mixture including a surfactant, and a silicone oil absorbed in a water soluble absorbent powder.
    Type: Grant
    Filed: January 13, 1975
    Date of Patent: July 12, 1977
    Assignee: DeSoto, Inc.
    Inventors: Robert L. McLaughlin, Donald C. Wood, Wesley A. Kraszewski
  • Patent number: 3992335
    Abstract: A composition capable of rendering the surface of a substrate such as a wooden parquet floor shiny, without prior stripping and without subsequent polishing, by simply applying and drying the same on such surface, and which composition is a true, anhydrous solution, comprising at least six and preferably seven constituents which consist, in critical proportions, of a solid, film-forming macromolecular compound, a hard resin, a liquid plasticizer, a solid plasticizer and a solvent mixture consisting of at least one lower alkanol and a liquid co-solvent, as well as, as an optional seventh component, of a silicone oil, all of which constituents must fulfill certain physical and/or physico-chemical requirements in order to obtain a fully satisfactory anhydrous floor care agent.
    Type: Grant
    Filed: October 19, 1973
    Date of Patent: November 16, 1976
    Assignee: Airwick Industries, Inc.
    Inventors: Serge Denissenko, Joachim Dazzi
  • Patent number: 3960832
    Abstract: A process for producing a novel heteropolysaccharide by a bacterial fermentation in which a new bacteria is incubated in a final fermentation medium containing a suitable carbohydrate source, a source of magnesium ions, a source of phosphorus and nitrogen, and water, the incubation taking place at a temperature of about 25 to for about 35 to 60 hours. The heteropolysaccharide produced by the above process are used to thicken aqueous media. Compositions containing the above polysaccharide in combination with certain salts containing di- and trivalent metal ions are useful for example, in drilling fluids, paint compositions, polishes and as additives for foods.
    Type: Grant
    Filed: January 30, 1975
    Date of Patent: June 1, 1976
    Inventors: Kenneth Suk Kang, William H. McNeely
  • Patent number: 3959530
    Abstract: A waxing and protective coating composition embodying the invention comprises a mixture of wax residue such as paraffin and microcrystalline wax, chlorinated solvent, petroleum distillate, and a nonionic surfactant such as nonylphenoxypoly-(ethyleneoxy)ethanol and a small amount of [N,N,N',N'-tetrakis (2-hydroxypropyl)ethylenediamine].
    Type: Grant
    Filed: September 20, 1974
    Date of Patent: May 25, 1976
    Inventor: Nicolas Kaliardos
  • Patent number: 3949104
    Abstract: The invention encompasses intermediate, starch-containing products in which the starch thickening capacity is inhibited by an aqueous dispersant system. These intermediate products can be readily converted into a starch thickened end-product by combining the intermediate product with additives which dissipate the inhibitory effect of the aqueous dispersant. The intermediate products may be provided as a concentrate which contains cold-water swelling starch granules suspended in an aqueous media adapted to effectively maintain the starch granules in an unswollen form. The intermediate products may be suitably formulated with all the desired recipe ingredients except the amount of water needed to convert it into a starch thickened end-product.
    Type: Grant
    Filed: January 20, 1975
    Date of Patent: April 6, 1976
    Assignee: A. E. Staley Manufacturing Company
    Inventors: Hsiung Cheng, Carl O. Moore