Replenishing Of Precursor During Growth (e.g., Continuous Method, Zone Pulling) Patents (Class 117/33)
  • Patent number: 6402839
    Abstract: A process for dendritic web growth is described. The process includes providing a melt, growing a dendritic web crystal from the melt, replenishing the melt during the step of growing the dendritic web crystal, and applying a magnetic field to the melt during the step of growing the dendritic web crystal. An apparatus for stabilizing dendritic web growth is also described. The apparatus includes a crucible including a feed compartment for receiving pellets to facilitate melt replenishment and a growth compartment designed to hold a melt for dendritic web growth. The apparatus further includes a magnetic field generator configured to provide a magnetic field during dendritic web growth.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: June 11, 2002
    Assignee: Ebara Solar, Inc.
    Inventors: Daniel L. Meier, Gregory T. Neugebauer, Edward V. Macuga, Robert P. Stoehr, Philip J. Simpson, Jalal Salami
  • Patent number: 6402834
    Abstract: In a monocrystal producing device using a pulling-down method, a raw material melt 5m is continuously supplied into a crucible 2 to grow a crystal 18 by supplying a powdery raw material 5p onto a premelt plate 3 inside an electric furnace 10 with a powdery raw material supplying device 20 and melting the powdery raw material 5p on the premelt plate 3 to generate the raw material melt 5m, and causing this raw material melt 5m to drop out inside the crucible 2. A dry air is introduced into the powdery raw material 5p inside the powdery raw material tank 6 to prevent moisture of the raw material powder 5p. A transferring tube 9 for transferring the raw material 5m is cooled to prevent the filling in the transferring tube 9 based on melting of the powdery raw material 5p. This makes it possible to produce a monocrystal having a stable chemical composition, a large diameter, and a long size at a low price.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: June 11, 2002
    Assignees: Toyo Communication Equipment Co., Ltd.
    Inventors: Kunihiko Nagai, Kohei Kodaira, Hiroyuki Tanaka, Hideki Sakamoto
  • Publication number: 20020040675
    Abstract: Reactive gas is released through a crystal source material or melt to react with impurities and carry the impurities away as gaseous products or as precipitates or in light or heavy form. The gaseous products are removed by vacuum and the heavy products fall to the bottom of the melt. Light products rise to the top of the melt. After purifying, dopants are added to the melt. The melt moves away from the heater and the crystal is formed. Subsequent heating zones re-melt and refine the crystal, and a dopant is added in a final heating zone. The crystal is divided, and divided portions of the crystal are re-heated for heat treating and annealing.
    Type: Application
    Filed: December 11, 2001
    Publication date: April 11, 2002
    Inventor: Kiril A. Pandelisev
  • Publication number: 20020029735
    Abstract: A seed crystal is lowered toward a melt, and a contact between the seed crystal and the melt is detected using an image captured by an imaging device. The temperature of the melt is adjusted to keep a meniscus of the melt in contact with the seed crystal. The temperature of the melt is then lowered to create a wingout extending from the seed crystal. The length and symmetry of the wingout is detected with an image captured by the imaging device, and a ribbon of crystal following the wingout starts to be lifted from the melt.
    Type: Application
    Filed: September 6, 2001
    Publication date: March 14, 2002
    Inventors: Kenji Terao, Hideyuki Isozaki, Taro Takahashi, Motohiro Niijima
  • Patent number: 6254674
    Abstract: A time-released dopant delivery system and method are provided in a Czochralski-type crystal-growing furnace to enable continuous doping of the melt over time. The dopant delivery system and method adjusts dopant levels within the melt as a function of time such that a controlled amount of dopant and, more typically, a substantially constant amount of dopant can be incorporated into the ingot over its length. By controlling the doping level in the ingot, the resistivity profile of the ingot can also be controlled over its length. In order to provide controlled dopant delivery, the dopant delivery system generally includes a vessel defining an internal cavity within which the dopant is disposed and an orifice through which the dopant, typically a molten dopant, is released. The dopant delivery system can also include means for submerging the vessel within the melt such that heat from the melt melts and therefore releases the dopant into the melt.
    Type: Grant
    Filed: May 3, 2000
    Date of Patent: July 3, 2001
    Assignee: SEH America, Inc.
    Inventor: Richard M. Aydelott
  • Patent number: 6110272
    Abstract: A method of loading a crucible, comprises loading at least one polycrystalline silicon rod into the crucible. Lump and/or granular polycrystalline silicon may also be loaded into the crucible. Especially when loaded into the crucible in a close-packed pyramidal configuration, a high loading density is achieved.
    Type: Grant
    Filed: September 29, 1998
    Date of Patent: August 29, 2000
    Assignee: Sumitomo Sitix Corporation
    Inventors: Katsunori Aikawa, Kuniharu Inoue
  • Patent number: 6106617
    Abstract: A method of an apparatus for automatically and rapidly feeding raw material into a quartz crucible in manufacture of single-crystal silicon by CZ method. After a draining hose 203 is disposed in a quartz crucible 201, pure water is supplied from a water supply hose 204, and the quartz crucible 201 is conveyed onto a turn table 213 installed under a container 210. At this time, the quartz crucible 201 is rotated, and lump raw material 209 is fed into the quartz crucible 201. Since buoyancy of the pure water is applied to the lump material 209, impacts caused by the falling lump material can be moderated, and therefore, damages to the quartz crucible 201 can be prevented. After feeding raw material is finished, the pure water is discharged through a draining hose 203, and then the draining hose 203 is retracted from the quartz crucible 201. Thereafter, the quartz crucible 201 is conveyed into a microwave oven 211 for drying.
    Type: Grant
    Filed: February 2, 1998
    Date of Patent: August 22, 2000
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventor: Yoshifumi Yatsurugi
  • Patent number: 6027563
    Abstract: For the oriented solidification of molten silicon to form an ingot in a bottomless crystallization chamber (9, 41) with a cooling body (11), which can be lowered relative to the chamber, the flat bottom surface of a seed body (25) of solid silicon is laid on the surface of the cooling body. The top surface of the seed body (25) is melted, and the ingot is grown on top of it as the cooling body is lowered by relative motion with respect to the crystallization chamber (9, 41) at a rate which is dependent on the supply of additional silicon and the solidification rate. For the purpose of producing large ingots with a coarsely crystalline to monocrystalline structure, a seed body (25) with a crystalline structure selected from the group ranging from coarsely crystalline to monocrystalline is used. Either lump silicon is placed on top of the seed body (25) and melted by induction, or molten silicon is produced in a forehearth (37) and poured onto the seed body (25). The seed body (25) has a thickness of 0.
    Type: Grant
    Filed: February 13, 1997
    Date of Patent: February 22, 2000
    Assignee: Ald Vacuum Technologies GmbH
    Inventors: Alok Choudhury, Matthias Blum, Harald Scholz, Georg Jarczyk
  • Patent number: 6019838
    Abstract: A crystal growing apparatus is able to provide dopant to a melt in the apparatus. A hopper is carrying dopant is integrated into a pull shaft of the apparatus so that dopant can be added to the melt without providing additional orifices in the apparatus or by opening the interior of the apparatus to the atmosphere.
    Type: Grant
    Filed: January 5, 1998
    Date of Patent: February 1, 2000
    Assignee: MEMC Electronic Materials, Inc.
    Inventor: Marcello Canella
  • Patent number: 6007621
    Abstract: The invention is to provide a method for automatically and rapidly feeding raw material into a quartz crucible in manufacture of single-crystal silicon by CZ method. For example, after a draining hose 203 is disposed in a quartz crucible 201, pure water is supplied from a water supply hose 204, and the quartz crucible 201 is conveyed onto a turn table 213 installed under a container 210. At this time, the quartz crucible 201 is rotated, and lump raw material 209 is fed into the quartz crucible 201. Since buoyancy of the pure water is applied to the lump material 209, impacts caused by the falling lump material can be moderated, and therefore, damages to the quartz crucible 201 can be prevented. After feeding raw material is finished, the pure water is discharged through a draining hose 203, and then the draining hose 203 is retracted from the quartz crucible 201. Thereafter, the quartz crucible 201 is conveyed into a microwave oven 211 for drying.
    Type: Grant
    Filed: September 22, 1998
    Date of Patent: December 28, 1999
    Assignee: Komatsu Elctronic Metals Co., Ltd.
    Inventor: Yoshifumi Yatsurugi
  • Patent number: 5919303
    Abstract: A process for preparing a silicon melt from a polysilicon charge, for use in the production of single crystal silicon ingots by the Czochralski method, in a crucible which has a bottom, a sidewall formation, a centerline which is substantially parallel to the sidewall formation and which intersects a geometric centerpoint of the bottom, and a radius extending from the centerline to the sidewall formation. In the process, the crucible is loaded with chunk polysilicon to form a charge having a bowl-like shape, wherein initially the load generally slopes radially upwardly and outwardly from the centerline toward the sidewall formation to an apex and then slopes generally downwardly and outwardly from the apex to the sidewall formation. The bowl-shaped chunk polysilicon charge is heated to form a partially melted charge, and granular polysilicon is fed onto the partially melted charge to form a mixed charge of chunk and granular polysilicon.
    Type: Grant
    Filed: October 16, 1997
    Date of Patent: July 6, 1999
    Assignee: MEMC Electronic Materials, Inc.
    Inventor: John Davis Holder
  • Patent number: 5919304
    Abstract: When producing an oxide-series single crystal by continuously pulling downwardly by .mu. pulling down method, the composition of the single crystal can properly and quickly controlled to continuously produce the single crystal of a constant composition by changing the pulling rate of the single crystal. Preferably, the pulling rate is 20-300 mm/hr, and the pulling rate is decreased with the proceeding of growing of the single crystal.
    Type: Grant
    Filed: August 23, 1996
    Date of Patent: July 6, 1999
    Assignee: NGK Insulators, Ltd.
    Inventors: Minoru Imaeda, Katsuhiro Imai, Tsuguo Fukuda
  • Patent number: 5902395
    Abstract: In a pulling apparatus operated according to the multi-pulling method or CCZ method, granular silicon material is first fed to a feed pipe from a feeder so as to form stagnation of the granular silicon material in the feed pipe. The feeding of the granular silicon material from the feeder to the feed pipe is repeatedly commenced and stopped so as to maintain the stagnation of the granular silicon material. The feed rate of the granular silicon material from the feeder to the feed pipe is increased with time until the feed of the silicon material is completed. This prevents abrasion of a coating or lining provided on the inner surface of the feeder and also prevents damage of the feeder.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: May 11, 1999
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Naoki Nagai, Isamu Harada, Chihiro Tashiro, Michiaki Oda
  • Patent number: 5900055
    Abstract: A silicon monocrystal is manufactured according to the continuously charged Czochralski method in which a double crucible is used which includes an outer crucible and an inner crucible which communicate with each other through pores. A dopant is charged to the silicon melt stored in the double crucible before commencing pulling of a silicon monocrystal such that the ratio of the dopant concentration of the silicon melt stored in the outer crucible to the dopant concentration of the silicon melt stored in the inner crucible becomes greater than an effective segregation coefficient of the dopant. The silicon monocrystal is then pulled while silicon material is charged to the silicon melt within the outer crucible, during which the dopant concentration ratio becomes equal to the effective segregation coefficient and then becomes smaller than the effective segregation coefficient.
    Type: Grant
    Filed: March 25, 1997
    Date of Patent: May 4, 1999
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Naoki Nagai, Koji Mizuishi, Michiaki Oda
  • Patent number: 5888293
    Abstract: A low-cost and high productivity charging material is provided for use in the recharge or additional charge fabrication of single-crystal semiconductor by means of the CZ method. Common polysilicon rods utilized in recharge or additional charge fabrication have their end portions formed into ring grooves. A joint element is made of silicon. When the end portions of the rods contact, the joint element engages the grooves to connect the rods together along their longitudinal direction. The rods can have arbitrary length, whereas the total weight, including the joint element, must be adjusted by the length to be greater than those of the melted polysilicon and the suspending portions.
    Type: Grant
    Filed: December 26, 1996
    Date of Patent: March 30, 1999
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Tatsuhiro Fujiyama, Hiroshi Inagaki, Hidetoshi Kurogi
  • Patent number: 5876496
    Abstract: A feeding reservoir 11 for intermittently or continuously feeding granular raw material into a pulling apparatus 1, a chamber 13 connected to the feeding reservoir 11 through a gate valve 12, a granular raw material supply section 15 by which the granular raw material is supplied to the chamber 13 through a gate valve 14 and a pressure adjustment means 20 which adjusts the inner pressure of the chamber 13 is provided, and the granular raw material is fed to the feeding reservoir 11 while maintaining the inner pressure of the feeding reservoir 11 as the same as the inner pressure of the single crystal pulling apparatus 1. This feeding method and structure makes it possible to feed an additional amount of granular raw material even during the continuous charging process and or the recharging process without interrupting the process and also to pull a heavy single crystal rod with a large diameter without increasing the capacity of the feeding reservoir.
    Type: Grant
    Filed: March 17, 1997
    Date of Patent: March 2, 1999
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Naoki Nagai, Chihiro Tashiro, Atsushi Ozaki, Michiaki Oda
  • Patent number: 5840115
    Abstract: A method of growing a single crystal of semiconductor using a CZ growth technique, having a step (0<t<t1) wherein a single crystal of semiconductor is pulled while a source material is supplied continuously to maintain a constant amount of semiconductor melt, and a step (t2<t<t3) wherein the supply of source material is halted, and the single crystal of semiconductor is pulled using residual melt from the first step.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: November 24, 1998
    Assignee: Zag Ltd.
    Inventors: Hiroaki Taguchi, Takashi Atami, Hisashi Furuya, Michio Kida
  • Patent number: 5820649
    Abstract: A liquid material such as molten silicon is stored in a crucible. A liquid material, which is identical to and held in the same conditions as the liquid material in the crucible, is continuously supplied from an auxiliary crucible to the crucible to keep constant the surface level of the liquid material in the crucible. The liquid material is continuously pulled up from the crucible at a predetermined speed while the liquid material is being solidified into a solid material such as a ribbon-like thin web of single-crystal silicon.
    Type: Grant
    Filed: April 14, 1997
    Date of Patent: October 13, 1998
    Assignee: Ebara Corporation
    Inventors: Naoaki Ogure, Kazuyoshi Terashima
  • Patent number: 5788764
    Abstract: Disclosed are a process for the production of solid solution single crystals of KTiOPO.sub.4 wherein a part or all of at least one of the elements, K, Ti and P is substituted with one or more other elements, which comprises moving a grown part(s) of crystal(s) to outside of a melt for the crystal growth while maintaining contact of a growing part(s) of the crystal(s) with said melt to obtain the above solid solution single crystals, wherein the moving is carried out while maintaining the temperature of the melt substantially constant and maintaining said melt at a substantially constant composition at which the solid solution single crystal(s) with the desired composition is precipitated at the above maintained temperature and a solid solution single crystal of KTiOPO4 wherein a part or all of at least one of the elements, K, Ti and P is substituted with one or more other elements and its composition is substantially homogeneous within its cubic portions of a side length of 1 cm.
    Type: Grant
    Filed: January 17, 1996
    Date of Patent: August 4, 1998
    Assignee: Hoya Corporation
    Inventor: Koji Sato
  • Patent number: 5762896
    Abstract: Synthetic gemstones having extraordinary brilliance and hardness are formed from large single crystals of relatively low impurity, translucent silicon carbide of a single polytype that are grown in a furnace sublimation system. The crystals are cut into rough gemstones that are thereafter fashioned into finished gemstones. A wide range of colors and shades is available by selective doping of the crystal during growth. A colorless gemstone is produced by growing the crystal undoped in a system substantially free of unwanted impurity atoms.
    Type: Grant
    Filed: August 31, 1995
    Date of Patent: June 9, 1998
    Assignee: C3, Inc.
    Inventors: Charles Eric Hunter, Dirk Verbiest
  • Patent number: 5733368
    Abstract: In a method of manufacturing a silicon monocrystal using a continuous Czochralski method, a silicon monocrystal is pulled from a silicon melt in a crucible while a silicon material is fed to the crucible. Supply of the silicon material is suspended until the temperature distribution of the silicon melt becomes stable after initiation of a straight body forming process, and the supply of the silicon material is commenced when the temperature distribution of the silicon melt has become stable. The feed rate of the silicon material is gradually increased until the feed rate becomes equal to a solidification rate of the silicon melt after the supply of the silicon material has been commenced. This method prevents the silicon monocrystal from becoming a polycrystal during the manufacture thereof.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: March 31, 1998
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Naoki Nagai, Isamu Harada, Michiaki Oda
  • Patent number: 5690733
    Abstract: A recharger system including a feeder and a feed conduit recharge polycrystalline silicon granules into a crucible after a run or operation of growing a single crystal silicon rod by the Czochralski method, thereby to prepare for a next run of crystal growing. The amount of holdup or backed-up supply of the silicon granules in the feed conduit is detected by a sensor provided on the feed conduit. A smooth and high-rate feed of the silicon granules is ensured by controlling the feed rate of the silicon granules from the feeder to the feed conduit and/or a descending velocity of the crucible by signals generated in the sensor as a function of the amount of the holdup or backed-up supply in the feed conduit.
    Type: Grant
    Filed: November 9, 1995
    Date of Patent: November 25, 1997
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Naoki Nagai, Michiaki Oda, Seiichiro Ohtsuka, Isamu Harada
  • Patent number: 5690734
    Abstract: A process is disclosed for continuously producing a single crystal by drawing downwardly a melt of a single crystal raw material, wherein a single crystal body grown from the melt is continuously pulled downwardly, and a plurality of single crystal products are continuously formed by intermittently cutting the single crystal body being downwardly moved.
    Type: Grant
    Filed: March 19, 1996
    Date of Patent: November 25, 1997
    Assignee: NGK Insulators, Ltd.
    Inventors: Minoru Imaeda, Akihiko Honda, Katsuhiro Imai, Yuichiro Imanishi, Nobuyuki Kokune, Shoji Sogo, Kazuaki Yamaguchi, Tetsuo Taniuchi
  • Patent number: 5627142
    Abstract: A composite material is disclosed which includes a substrate, an oriented film provided on a surface of the substrate and formed of a crystal of a Y123 metal oxide of the formula LnBa.sub.2 Cu.sub.3 O.sub.y wherein Ln stands for Y or an element belonging to the lanthanoid and y is a number of 6-7, and a layer of a Y123 metal oxide of the formula LnBa.sub.2 Cu.sub.3 O.sub.y wherein Ln stands for Y or an element belonging to the lanthanoid and y is a number of 6-7 formed on the oriented film.
    Type: Grant
    Filed: July 25, 1994
    Date of Patent: May 6, 1997
    Assignees: International Superconductivity Technology Center, Hitachi Cable, Ltd., Hokkaido Electric Power Co., Inc., Kyushu Electric Power Co., Inc., Kansai Electric Power Co., Inc., Fujikura, Ltd.
    Inventors: Yasuji Yamada, Masaru Nakamura, Noriyuki Tatsumi, Jiro Tsujino, Kanshi Ohtsu, Yasuo Kanamori, Minoru Tagami, Atsushi Kume, Yuh Shiohara, Shoji Tanaka
  • Patent number: 5607506
    Abstract: An improved system and process for growing crystal fibers comprising a means for creating a laser beam having a substantially constant intensity profile through its cross sectional area, means for directing the laser beam at a portion of solid feed material located within a fiber growth chamber to form molten feed material, means to support a seed fiber above the molten feed material, means to translate the seed fiber towards and away from the molten feed material so that the seed fiber can make contact with the molten feed material, fuse to the molten feed material and then be withdrawn away from the molten feed material whereby the molten feed material is drawn off in the form of a crystal fiber.
    Type: Grant
    Filed: October 21, 1994
    Date of Patent: March 4, 1997
    Assignee: University of South Florida
    Inventors: Vongvilay Phomsakha, Robert S. F. Chang, Nicholas I. Djeu
  • Patent number: 5602081
    Abstract: A method of preparing a crystal of a Y-series 123 metal oxide is disclosed, in which a substrate is immersed in a liquid phase which comprises components constituting the metal oxide. The liquid phase contains a solid phase located at a position different from the position at which the substrate contacts the liquid phase. The solid phase provides the liquid phase with solutes which constitute the Y-series 123 metal oxide so that the solutes are transported to the position at which the substrate and the liquid phase contact, thereby permitting the Y-series 123 metal oxide to grow on the substrate as primary crystals.
    Type: Grant
    Filed: May 9, 1994
    Date of Patent: February 11, 1997
    Assignees: International Superconductivity Technology Center, Mitsubishi Cable Industries
    Inventors: Masaru Nakamura, Yasuji Yamada, Minoru Tagami, Yuh Shiohara, Shoji Tanaka
  • Patent number: 5588993
    Abstract: A process for preparing a molten silicon melt from polycrystalline silicon for use in producing single crystal silicon by the Czochralski method is disclosed. Polycrystalline silicon is initially loaded into a Czochralski crucible, and melted to form a partially melted charge which includes both molten silicon and unmelted polycrystalline silicon. The molten silicon has an upper surface above which the unmelted polycrystalline silicon is partially exposed. Granular-polycrystalline silicon is fed onto the exposed unmelted polycrystalline silicon in a manner sufficient to allow the granular-polycrystalline silicon to dehydrogenate while it is resident on the surface of the unmelted polycrystalline silicon and before it becomes immersed in the molten silicon. The granular-polycrystalline silicon and the unmelted polycrystalline silicon are then fully melted to form a molten silicon melt.
    Type: Grant
    Filed: July 25, 1995
    Date of Patent: December 31, 1996
    Assignee: MEMC Electronic Materials, Inc.
    Inventor: John D. Holder
  • Patent number: 5569325
    Abstract: A process for growing crystals at an enhanced rate comprising providing a dispersion of a fluid medium and seed crystals of a metal oxide, introducing feed material comprising a metal oxide into the dispersion and maintaining a uniform mixture of the seed crystals, the feed material and the fluid medium, the feed material having an average crystal size less than the average crystal size of the seed crystals, the feed material being added in an amount and at a rate whereby the seed crystals grow, the feed material providing a soluble nutrient species for deposition of the said crystal to effect crystal growth, the mixture of seed crystals and feed material being treated under conditions which stimulate crystal growth for a period of time sufficient to obtain a desired quantity of a product comprising at least one grown crystal having an average crystal size greater than the average crystal size of the seed crystal.
    Type: Grant
    Filed: April 22, 1991
    Date of Patent: October 29, 1996
    Assignee: Condea Vista Company
    Inventors: David A. Barclay, Duane J. Lewis, Lewis B. Decker, Jr., William R. Carradine
  • Patent number: 5524571
    Abstract: Herein disclosed are apparatuses for manufacturing compound semiconductor polycrystals comprising a pressure vessel, an upper shaft, a container for a first component fixed to the upper shaft, a heater around the container, a lower shaft, a susceptor and a crucible for charging a second component, a heater for the crucible and a communicating pipe for spatially connecting the container and the crucible optionally provided with a porous member at the lower extremity and/or a cylindrical member for confining a space over a part of the melt surface contained in the crucible from the remaining inner space of the vessel, the apparatuses permitting the substantial reduction of the reaction time and an improvement of the yield of the polycrystals due to the presence of the porous member and/or the cylindrical member separating the inner space of the vessel into two portions.
    Type: Grant
    Filed: February 9, 1990
    Date of Patent: June 11, 1996
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Akihisa Kawasaki, Toshihiro Kotani
  • Patent number: 5493985
    Abstract: The present invention is a process and apparatus for the synthesis and growth of single crystals of phosphorus compounds starting with the elemental materials in a single furnace without external exposure. The apparatus of the present invention is a crystal growth furnace heated by RF coils. Inside the furnace is a susceptor for holding a crucible. Above the crucible is selectively positioned a phosphorus improved injector. The non-phosphorus materials are placed in the crucible and melted to a desired temperature. The phosphorus material previously placed within the injector is heated by the radiant heat from the crucible to drive the phosphorus vapor into the melt through a tube. This is closely controlled by noting the temperature within the injector and adjusting the height of the injector above the melt to control the temperature within the phosphorus material. After the formation of the stoichiometric melt, the seed is inserted into the melt for crystal growth if so desired.
    Type: Grant
    Filed: February 26, 1993
    Date of Patent: February 27, 1996
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: David Bliss, Robert M. Hilton, Joseph A. Adamski
  • Patent number: 5492078
    Abstract: In a process and a device for the controlled feeding of a melting crucible (13) with doped particles (2, 2a) during the drawing of a crystal (16) by the Czochralski method by the control of a flow of particles (2, 2a) from a source (1) to the melting crucible (13), the source (1) is equipped with a conveying device (4) for discharging the particles (2, 2a) at adjustable rates per unit time. A crystal (16), formed from the particles, is withdrawn from the melting crucible (13) at a predetermined rate per unit time. So that the control process can be conducted smoothly over prolonged periods of time with precise doping, the particles (2, 2a) are separated into individuals on their way to the melting crucible (13) and counted by at least one sensor (21, 22). The sequence of count pulses is sent to a counter (25) and compared there with a corresponding sequence of reference input pulses.
    Type: Grant
    Filed: August 19, 1994
    Date of Patent: February 20, 1996
    Assignee: Leybold Aktiengesellschaft
    Inventors: Burkhard Alterkruger, Joachim Aufreiter, Dieter Bruss, Klaus Kalkowski
  • Patent number: 5492079
    Abstract: The process includes processing a molten phase of semiconductor material ering a solid phase of the material and having a free surface opposite this solid phase, into which, during the crystallization procedure, energy is radiated and material is fed in in granular form, which material floats and is melted. As a result, at the opposite solid/liquid interface, material grows on the solid phase which is drawn downwards in accordance with the growth rate. The process allows mono- or polycrystalline rods or blocks to be obtained. The main advantages of the process are that it can be carried out without melting vessels, it is possible to use granular material, and the energy balance is favorable because of the small amounts of melt.
    Type: Grant
    Filed: July 5, 1994
    Date of Patent: February 20, 1996
    Assignee: Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
    Inventors: Joachim Geissler, Ulrich Angres
  • Patent number: 5488923
    Abstract: The present invention employs the construction wherein a resistor heater is disposed inside a protective cylinder whose tip is open to a molten liquid packing zone of a crucible inside a pulling apparatus so that the resistor heater is above the tip of a lower portion and temperature setting can be made so as to be capable of fusing a starting material. Since the tip of the protective cylinder is positioned inside the molten liquid at the time of pulling of a single crystal, the gaseous phase portion inside the protective cylinder and the gaseous phase portion inside the pulling apparatus are separated apart by the molten liquid and are independent of each other and a starting material polycrystal rod loaded into the protective cylinder can be supplied to the molten liquid surface inside the crucible while being molten at the lower part of the protective cylinder by the resistor heater.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: February 6, 1996
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Masato Imai, Hiroyuki Noda, Yutaka Shiraishi, Keishi Niikura, Shoei Kurosaka
  • Patent number: 5462010
    Abstract: An apparatus for continuously supplying granular polycrystal silicon to a crucible of a semiconductor single crystal pulling apparatus, comprising a funnel-shaped tank having a relatively large capacity, a main hopper having a relatively small capacity and weight, a subhopper having an intermediate capacity and weight and providing a passage from said tank to said main hopper, and a weight sensor for detecting the weight of the main hopper, wherein the overall weight of the main hopper is measured to obtain the flow rate (supply rate) of the granular polycrystal silicon.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: October 31, 1995
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Kiyotaka Takano, Izumi Fusegawa, Hirotoshi Yamagishi, Koji Mizuishi, Katsuhiko Ogino
  • Patent number: 5407907
    Abstract: A method of pulling a crystal of a metal oxide is disclosed, in which the growth of the crystal is performed in a liquid phase having a composition which is different from the metal oxide and which contains components constituting the metal oxide. The liquid phase is in contact with a solid phase located at a position separated from the position at which the crystal of the metal oxide grows. The solid phase has a composition different from that of the metal oxide and supplies components constituting the metal oxide to the liquid phase.
    Type: Grant
    Filed: May 21, 1993
    Date of Patent: April 18, 1995
    Assignees: International Superconductivity Technology Center, Asahi Glass Co., Ltd., Ishikawajimaharima Jukogyo Kabushiki Kaisha, Sumitomo Metal Industries, Ltd., Kyushu Electric Power Co., Railway Technical Research Institute
    Inventors: Yasuji Yamada, Teruo Izumi, Kanshi Ohtsu, Yuichi Nakamura, Kengo Ishige, Yuh Shiohara, Minoru Tagami, Shoji Tanaka
  • Patent number: 5398640
    Abstract: A single crystal dome is formed from a surface of revolution and grown from a liquid material on a linear die surface wettable by the molten material. A seed crystal is supported in a position spaced from an axis of revolution which lies in the plane of the wettable surface, and the seed crystal is rotated around the axis of revolution to generate a curved surface having a predetermined radius of curvature. The seed crystal is supported in a predetermined orientation of one of its axes with respect to the wetted surface of commencement of growth.
    Type: Grant
    Filed: March 1, 1993
    Date of Patent: March 21, 1995
    Assignee: Saphikon, Inc.
    Inventors: John W. Locher, Joseph E. Madsen
  • Patent number: 5340434
    Abstract: A process for producing a silicon single crystal is disclosed which comprises the steps of providing a silicon melt in a crucible, feeding grains of silicon polycrystal to the silicon melt and pulling up a silicon single crystal from the silicon melt. The concentration of residual hydrogen in the grains of silicon polycrystal is more than 10 ppmwt and less than 100 ppmwt. The process prevents the silicon single crystal from being polycrystalline.
    Type: Grant
    Filed: February 1, 1993
    Date of Patent: August 23, 1994
    Assignee: Shin-Etsu Handotai Co., Ltd.
    Inventors: Kiyotaka Takano, Izumi Fusegawa, Hirotoshi Yamagishi
  • Patent number: RE35242
    Abstract: A method for growing silicon single crystal uses as materials, silicon granules prepared by the silane process and having a residual hydrogen concentration of 7.5 wtppm or less, silicon granules prepared by the trichlorosilane process and having a residual chlorine concentration of 15 wtppm or less. In the case where such silicon granules are used, a bursting phenomenon does not occur when the silicon granules are melted. As a result, there is no scattered matter due to the bursting phenomenon, whereby the growth condition of the single crystal is not disturbed.
    Type: Grant
    Filed: September 30, 1992
    Date of Patent: May 21, 1996
    Assignee: Sumitomo Sitix Corporation
    Inventors: Tsutomu Kajimoto, Daizou Horie, Shin-ichi Sakurada