Abstract: The present application discloses a metal matrix composite for evaporation mask, comprising matrix and reinforcing phase dispersed in the matrix, wherein the matrix is iron-nickel alloy, the reinforcing phase is non-metallic particles, and the volume ratio of the non-metallic particles in the matrix is in the range from 20 vol % to 50 vol %. The present application also provides an evaporation mask made from the metal matrix composite and a making method thereof. The metal matrix composite according to the present application has a decreased density and an elevated elasticity modulus, and thereby is useful to prevent the evaporation mask from drooping due to gravity. Further, the method for making the evaporation mask according to the present application is beneficial to improve the overall performance of the evaporation mask, save raw materials and reduce the cost.

Abstract: A processing apparatus includes a substrate holding portion, a shield arranged to surround a substrate, and a shield holding portion configured to hold the shield. The shield includes first magnets each having a magnetic pole of a first polarity facing the shield holding portion, and second magnets each having a magnetic pole of a second polarity facing the shield holding portion. The first magnets and the second magnets are arranged at positions symmetrical with respect to the center of the shield. The shield holding portion includes third magnets each having a magnetic pole of the first polarity facing the shield, and fourth magnets each having a magnetic pole of the second polarity facing the shield.

Abstract: A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space (82) between a plurality of limiting plates (81) of a limiting plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate while the substrate is moved relative to the vapor deposition mask in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. It is determined whether or not it is necessary to correct the position of at least one of the plurality of limiting plates in the X axis direction, and in the case where it is necessary to correct the position, the position of at least one of the plurality of limiting plates in the X axis direction is corrected. Accordingly, a coating film whose edge blur is suppressed can be stably formed at a desired position on a large-sized substrate.

Abstract: A masking apparatus is provided for masking a workpiece, for example a turbine blade, to protect portions thereof from the deposition of coating material thereon during selective application of a coating material to other portions of the workpiece. The masking apparatus includes an enclosure formed of a first mask half body defining a first cavity half and a second mask half body defining a second cavity half. The first mask half body and the second mask half body mate in assembly to form a workpiece cavity it which the workpiece may be enclosed.

Abstract: Variable geometry process kits for use in semiconductor process chambers have been provided herein. In some embodiments, a process kit for use in a semiconductor process chamber includes: an annular body configured to rest about a periphery of a substrate support; a first ring positioned coaxially with the annular body and supported by the annular body; a second ring positioned coaxially with the first ring and supported by the first ring; and an annular shield comprising a horizontal leg positioned coaxially with the second ring such that a portion of the horizontal leg is aligned with and below portions of the first ring and second ring.

Abstract: In deposition devices, a precursor is directed at a substrate within a deposition chamber, and a block plate comprising a set of block plate apertures adjusts the direction and volume of the outflowing precursor. However, arrangements of block plate apertures that are suitable for some deposition scenarios (such as one type of precursor) are unsuitable for other deposition scenarios, resulting in precursor deposition that is undesirably thick, thin, or inconsistent. A set of block plate masks positioned over respective zones of the block plate are adjustable to align a set of masking apertures with respect to the block plate apertures, such as by operating a block plate motor to rotate a ring-shaped block plate mask over a cylindrical zone of the block plate. This configuration enables adjustable exposure of the block plate apertures to control the adjusted outflow of precursor through the block plate.

Abstract: A thin film deposition apparatus that may prevent a patterning slit sheet from sagging and increase a tensile force of the patterning slit sheet, and a method of manufacturing an organic light-emitting display device using the same.

Abstract: Disclosed is a mask structure including a body member in which an opening is formed, and a plurality of unit masks disposed in parallel in the opening and separated from each other by a predetermined distance. The mask structure using a plurality of unit masks reduces generation of sagging caused by self-gravitation compared to a mask configured with a conventional single member, thereby preventing generation of a shadow phenomenon caused by a gap between the mask structure and the substrate. Hence, the pixel is formed at an accurate position on the substrate.

Abstract: A cover for a roller having at least one roller (2) for transporting a substrate (1) in a deposition system and at least one cover means (6), wherein the roller is retractable away from the substrate and the cover means is adapted for at least partly covering the retracted roller against contamination by a substance present in the deposition system. The cover for a roller has the advantage that the uptime of the deposition system is increased.

Abstract: The present invention is an optimized DWP for minimizing coating error that has two centering components which center the DWP inside a threaded or non-threaded opening effectively masking the threads and/or opening during the coating process.

Abstract: A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.

Abstract: A mask assembly for a gas turbine engine component includes a second mask that at least partially overlaps a first mask to fit a platform of a gas turbine engine component.

Abstract: Provided is a cathode deposition mask. The cathode deposition mask includes a plurality of first columns and a plurality of second columns arranged alternately, the plurality of first columns and the plurality of second columns being parallel to each other and defining a column dimension along the length of each column, the first columns and the second columns each comprising a plurality of openings, the plurality of openings included in each first column being arranged alternately along the column dimension with respect to the openings in each adjacent first column, and the plurality of openings included in each second column being arranged alternately along the column dimension with respect to the openings in each adjacent second column.

Abstract: A shutter disk having a tuned coefficient of thermal expansion is provided herein. In some embodiments, a shutter disk having a tuned coefficient of thermal expansion may include a body formed from a first material comprising at least two components, wherein a ratio of each of the at least two components to one another is selected to provide a coefficient of thermal expansion of the body that is substantially similar to a coefficient of thermal expansion of a second material to be deposited atop the body.

Abstract: A thin-film deposition mask includes a mask body, the mask body having a first surface and a second surface that is an opposite surface of the first surface, the mask body having a plurality of deposition holes therein, and a spacer near the deposition holes, the spacer protruding from the first surface of the mask body in a vertical direction.

Abstract: An arrangement for automated painting of an object includes a paint robot, a cover and a cover blocking member. The paint robot defines an axis joint about which a first portion rotates relative to a second portion. The cover covers at least a portion of the paint robot. The cover blocking member is in the form of a band carried by the paint robot and is positioned between the paint robot and the cover.

Abstract: A painting protector which can be easily held with one hand and placed snugly against an area in which paint is not to be applied, such an outlet or switch. The other hand can then be used to apply paint to the areas around the painting protector which are desired to have paint applied. The painting protector can then be removed and the painter can proceed to the next location upon which paint is to be applied.

Abstract: A shield device helps prevent selected surface areas from being painted by a paint material. The shield device includes a sheet member; and a handle member pivotable in a plane defined by the sheet member. The shield device is arranged between a folded configuration where the handle member is positioned generally parallel to an attachment edge of the sheet member, and an unfolded configuration, and an unfolded position.

Abstract: A mask unit for depositing a thin layer in a display device. The mask unit includes: a bead mask support which includes a plate; and a bead mask which is placed on the bead mask support.

Abstract: Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.

Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.

Abstract: A deposition mask and mask assembly having the same capable of improving deposition efficiency is discussed. Both ends of the deposition mask have a pointed cross section such that at least a part of the neighboring deposition masks overlap each other at a boundary therebetween when deposition masks are consecutively arranged in parallel.

Abstract: An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, a shield member disposed in the processing chamber below the substrate support, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor coupled to a power source, and an electrode separated from the conductive gas distributor and the chamber body by electrical insulators. The electrode is also coupled to a source of electric power. The substrate support is formed with a stiffness that permits very little departure from parallelism. The shield member thermally shields a substrate transfer opening in the lower portion of the chamber body. A pumping plenum is located below the substrate support processing position, and is spaced apart therefrom.

Abstract: A method for applying a protective coating to selected portions of a substrate is disclosed. The method includes applying a mask to or forming a mask on at least one portion of the substrate that is not to be covered with the protective coating. The mask may be selectively formed by applying a flowable material to the substrate. Alternatively, the mask may be formed from a preformed film. With the mask in place, the protective coating may be applied to the substrate and the mask. A portion of the protective coating that overlies the mask may be delineated from other portions of the protective coating; for example, by cutting, weakening or removing material from the protective coating at locations at or adjacent to the perimeter of the mask. The portion of the protective coating that overlies the mask, and the mask, may then be removed from the substrate.

Abstract: Systems and methods for painting, which might be used to paint the soil in a golf hole are provided. A spraying device can comprise a first masking apparatus, a second masking apparatus coupled to the first and a paint dispersing device, between the first and second masking apparatus. The paint may disperse from a single nozzle that can include multiple individual exit points for the spray. In another embodiment, the single nozzle includes an exit point and a flat or curved plate to direct the spray. Alternatively, the paint dispersing apparatus may comprise multiple nozzles. The nozzles may be provided with paint using tubes connecting from a paint source, such as an aerosol paint can, to each nozzle. The first masking apparatus can be a golf cup mask and the second masking apparatus can be a putting green mask.

Abstract: A mask frame assembly includes a frame, a mask having a deposition pattern and being installable on the frame in a state of being pulled by a first tension force in a first direction, and a tension force applying portion in the mask and configured to apply a second tension force in a second direction that is perpendicular or substantially perpendicular to the first direction.

Abstract: A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.

Abstract: An ion implant apparatus configured to measure the temperature or monitor the degradation of components in the apparatus is provided. The ion implant apparatus may include a platen configured to move in a first direction, a mask frame to hold one or more masks disposed on the platen, a first optical sensor configured to project an optical beam to a second optical sensor, and a measurement bar disposed on the mask frame, the measurement bar raised above the surface of the mask frame to interrupt the optical beam when the platen moves in the first direction.

Abstract: A mask assembly includes a frame for forming an opening, and a mask fixed to the frame while a tensile force is applied thereto and forming a plurality of pattern openings. The frame includes a frame main body for forming an opening, and a plurality of moving members installed to be movable in at least one direction on the frame main body. The mask is fixed to the moving members while a tensile force is applied thereto.

Abstract: A mask frame assembly for thin film deposition includes a frame having an opening and at least two unit masks having end parts in a longitudinal direction fixed to the frame, each of the unit masks comprising first regions and second regions, the first regions having unit masking patterns, each of the unit masking patterns having a plurality of openings for thin film deposition, the unit masking pattern being spaced apart from each other, each of the second regions being interposed between a pair of adjacent ones of the first regions, the first regions having a first thickness from a first surface of the unit masks, and at least a portion of the second regions having a second thickness from a second surface of the unit masks opposite to the first surface of the unit masks, such that the first regions and the at least the portion of the second regions are offset from each other in a direction normal to the first and second surfaces.

Abstract: A mask frame assembly for thin film deposition includes a mask frame having an opening, and a mask configured to be coupled to the mask frame and including a first surface for facing a deposition substrate, a second surface opposite the first surface, and a deformation prevention part having varying thicknesses.

Abstract: Methods and apparatuses relate to implanting a surface of a semiconductor substrate with dopants, making undoped semiconductor material directly on the surface implanted with the dopants, and making a transistor with a transistor channel in the undoped semiconductor material, such that the transistor channel of the transistor remains undoped throughout manufacture of the integrated circuit.

Abstract: A substrate and mask attachment clamp device comprising a push assembly, an upper clamp mechanism and a lower clamp mechanism is disclosed. The upper clamp mechanism comprises a first inclined surface, a swing element, a second inclined surface and a sliding surface. The lower clamp mechanism comprises a lower clamp retainer and a clamp movably. During the push assembly moving along a first direction, the push assembly moves with respect to the first inclined surface to drive the upper clamp mechanism to move along a second direction. The push assembly further drives the second inclined surface to move with respect to the swing element, so that the swing element drives the clamp to move along a third direction opposite to the first direction, and drives the sliding surface to move with respect to the lower clamp mechanism to drive the clamp to move along a fourth direction.

Abstract: The present invention provides a shadow mask, an evaporation device and a related method for manufacturing OLED display panel. The shadow mask has an array of multiple openings. Each opening contains a rectangular first section and a number of second sections at the first section's four corners; and each second section is connected to the first section. By varying the design of the shadow mask, the present invention is able to reduce the ineffective area sizes of the openings, thereby enhancing the aperture ratio of the OLED display panel.

Abstract: A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement protrusion 38 extending in an angle of approximately 90° from the free end of the arm portion 37. A mask assembly 40 comprises a laminar mask 41, e.g. manufactured from a thin metal foil, and connecting elements 42. The connecting elements 42 include an engagement portion 43 for engagement with the engagement protrusion 38 of the elastic element 30. The mask 41 may be attached/stretched to the mask support 10 as well as to detached from the mask support 10 comfortably.

Abstract: A unit mask is extended in a direction and is supported by a frame including an opening. The unit mask includes a first fixed part located in the opening and fixed to one surface of the frame disposed in the direction, a second fixed part spaced apart from the first fixed part and fixed to another surface of the frame disposed in the direction, and a mask part held by the first fixed part and the second fixed part between the first fixed part and the second fixed part.

Abstract: A mask assembly includes a frame with an opening, at least one support stick in the frame and extending in a first direction to traverse the opening of the frame, the support stick including a communication pattern above the opening of the frame, and a mask positioned on the frame and the at least one support stick, the mask extending in a second direction perpendicular to the first direction to traverse the opening of the frame, and the mask being exposed to the opening of the frame through the communication pattern.

Abstract: A deposition device for depositing an organic material includes a supporting roll having a surface, the surface being configured to receive a flexible substrate thereon, the supporting roll being configured to rotate, a deposition source spaced apart from the supporting roll, the deposition source being configured to deposit the organic material on the flexible substrate on the supporting roll, and a mask positioned between the supporting roll and the deposition source, the mask including an opening configured to allow the organic material to pass from the deposition source to the supporting roll.

Abstract: A patterning slit sheet frame assembly includes a patterning slit sheet having a pattern, a patterning slit sheet frame supporting the patterning slit sheet, and a tensile force application unit that applies a tensile force to the patterning slit sheet after the patterning slit sheet is disposed on the patterning slit sheet frame.

Abstract: A mask assembly for a thin film deposition includes: a frame main body forming an opening; a plurality of unit masks having both ends fixed to the frame main body in a state that a tension force is applied in a first direction; and an end tension unit installed to the frame main body. The end tension unit moves according to a second direction crossing the first direction between two neighboring unit masks among a plurality of unit masks for tensioning of the unit mask in the second direction.

Abstract: A paint roller with an end-surface blocking piece, wherein the end-surface blocking piece is formed with a blocking groove to prevent paint from overflowing to the surface of a wall that doesn't need to be painted. Besides, the user doesn't have to turn the end-surface blocking piece when painting different surfaces of a wall in different directions since the end-surface blocking piece is round-shaped.

Abstract: The present invention relates to the application of surface coatings to treated aluminum articles utilized on aircraft, and more particularly to a system for masking portions of aluminum aircraft wheel and brake components for application of surface coatings to reduce or prevent wear and/or corrosion to the aluminum article. The system may be utilized for new aluminum aircraft components as well as aircraft components that have been subjected to non-destructive testing. The masking components are constructed and arranged to cooperate with portions of the aluminum component in a sequential manner to allow for application of multiple layers of primer and/or topcoat without removal of prior masking components so that a coated component complies with the manufacturer's written requirements for that component.

Abstract: A mask frame assembly for thin film deposition, the mask frame assembly including a frame having an opening; a plurality of masks having deposition patterns, the masks being fixed to the frame such that the deposition patterns extend over the opening; and a balance stick being fixed to the frame such that the balance stick is between two of the plurality of masks, the balance stick made from an elastically tensile material.

Abstract: A mask frame includes a frame and a mask installed on the frame while being stretched in a first direction. The mask includes a deposition area including a plurality of deposition pattern portions, an edge unit formed to have a thickness greater than a thickness of the deposition area and including a first edge and a second edge that extend in the first direction on two sides of the deposition area, and two or more ribs formed to have a thickness greater than the thickness of the deposition area between deposition pattern portions adjacent to each other in a second direction perpendicular to the first direction.

Abstract: Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.

Abstract: A deposition mask 601 is used to form a thin film 3 in a prescribed pattern on a substrate 10 by deposition. Each of a plurality of improved openings 62A of the deposition mask 601 has a protruding opening portion 64, and is formed so that the opening amount at an end in a lateral direction is larger than that in a central portion in the lateral direction. In a deposition apparatus 50, the deposition mask 601 is held in a fixed relative positional relation with a deposition source 53 by a mask unit 55. In the case of forming the thin film 3 in a stripe pattern on the substrate 10 by the deposition apparatus 50, deposition particles are sequentially deposited on the substrate 10 while relatively moving the substrate 10 along a scanning direction with a gap H being provided between the substrate 10 and the deposition mask 601.

Abstract: Absorbent nappy/diaper pads composed of a first absorbent base material, and a second absorbent material consisting of superabsorbent polymer powders, are made by a unit (3) that comprises a conveyor (11) carrying the first absorbent material along a predetermined feed path (P), and a feed system (24) by which the superabsorbent polymer powders are released onto the feed path (P); the feed system (24) comprises a fixed duct (27) with an outlet (45) directed at the feed path (P), and a valve (34), positioned along an intermediate segment of the duct (27), by which the superabsorbent polymer powders are dispensed intermittently and controllably.

Abstract: The present invention relates to a printing stencil, for example, for applying a contacting (contact finger, busbar(s)) to a substrate of a solar cell and to a method for producing such a printing stencil. The printing stencil can include a carrier layer and a structure layer located below the carrier layer, the structure layer having at least one printed image opening which corresponds to at least a portion of the printed image of the contacting (contact finger, busbar(s)), the carrier layer having one or more carrier layer openings and the one or more carrier layer openings overlapping when the printing stencil is viewed from above, with respect to the printed image opening in such a manner that the printing stencil has an opening which is formed from the at least one printed image opening and the one or more carrier layer openings, and is suitable for applying contacting material to the substrate through the opening.

Abstract: A paint shield for releasable attachment to the head of a paint gun sprayer is disclosed for preventing overspray from contacting other exposed surfaces or components outside of the intended surface. The paint shield is comprised of a single planar sheet of flexible, sturdy, impermeable material, such as aluminum. The shield includes a base panel through which the nozzle of the spray gun is secured. A pair of contoured members extend away from the base member to make contact with the adjoining pavement, ground, or wall to establish the distance and the angle in which the nozzle is maintained from the surface. This construction assures that the width and angular velocity of the spray evenly covers the surface without undue waste. The paint shield may be preformed for specific cross sections of objects such as curbing or gutters.

Abstract: Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a cover ring, a shield, and an isolator for use in a physical deposition chamber. The components of the process kit work alone and in combination to significantly reduce particle generation and stray plasmas. In comparison with existing multiple part shields, which provide an extended RF return path contributing to RF harmonics causing stray plasma outside the process cavity, the components of the process kit reduce the RF return path thus providing improved plasma containment in the interior processing region.