Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. According to an embodiment of the inventive concept, the purge operation of the purge nozzle is performed while the nozzle arm is moved from the first substrate support member to the second substrate support member, it hardly influences the operation of treating the substrate while the nozzle arm is moved from the first substrate support member to the second substrate support member. According to an embodiment of the inventive concept, the substrate treating apparatus may perform an operation of purging the photosensitive liquid nozzle while the treatment liquid supply unit performs a process of supplying the photosensitive liquid to the substrate. Accordingly, because the operation of purging the photosensitive liquid nozzle is performed at the same time when the substrate treating apparatus performs a process, productivity may be improved.

Abstract: Disclosed is a control method for synchronized fabric circulation in a conveyer drive fabric dyeing machine. During a dyeing process of fabric, the fabric is driven by a fabric guide to move in a circulating manner and the time period for a cycle of circulation is set in consistency with the time period that a conveyor moving from a rear end to a front end so as to achieve synchronization that makes the circulation smooth. The control method is performed with a computer or a PLC control unit that is supplied with fabric length data or fabric weight data and fabric unit weight data and, based on such data, performs an automatic operation of computation and supply of a signal to speed controllers of the fabric guide motor and the conveyor motor to set the speeds thereof at a predetermined ratio with respect to each other for synchronized operations.

Abstract: A welding assembly for welding a plurality of workpieces includes a positioner assembly including a base assembly and a workpiece holding assembly that is mounted to the base assembly. The workpiece holding assembly includes a beam having a longitudinal axis and a plurality of holding elements that are each mounted to the beam and adapted for holding and positioning a workpiece for welding. The beam is rotatable about a primary axis that is substantially horizontal. The plurality of holding elements are each rotatable about an auxiliary axis that is transverse to the longitudinal axis of the beam.

Abstract: A spin treatment apparatus according to an embodiment performs a treatment while rotating a substrate and includes: at least three clamp pins configured to contact an outer peripheral surface of the substrate and clamp the substrate; rotatable pin rotators provided for the respective clamp pins and each configured to retain the corresponding clamp pin at a position offset from a rotation axis of the pin rotator parallel with a rotation axis of the substrate; magnet gears provided for the respective pin rotators around outer peripheral surfaces thereof and each having a magnetic-pole part formed spirally about the rotation axis of the pin rotator; rotation magnets provided for the respective magnet gears and positioned to attract and be attracted by the magnetic-pole part of the corresponding magnet gear; and a movement mechanism configured to move the rotation magnets along the rotation axes of the pin rotators.

Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.

Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.

Abstract: A system or device for spin coating an implantable medical device, such as a stent, is disclosed. The device includes a coating table to support the stent, the stent being positioned on top of the coating table and supported on the table by a support fixture. The coating table has an axis of rotation. The axis of rotation of the table can intersect a center of the mass of the stent. A driving means can be provided for rotating the stent about the longitudinal axis of the stent and for rotating the coating table about the axis of rotation.

Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.

Abstract: A system is provided for spray coating medical devices, comprising a rotary atomizer with one or more rotary heads and a plurality of holders to hold a plurality of medical devices, such as stents, wherein the holders are positioned around a longitudinal axis of the rotary head. A method of using such a system is also provided. The invention enables the use of rotary atomizers to coat small medical devices with reduced waste of coating material and allows increased production throughput by the coating of multiple devices simultaneously. The rotary atomizer may be an electrostatic rotary atomizer. The holders and/or a holding structure on which the holders are mounted may move relative to the rotary atomizer.

Abstract: A process and relating plant for applying protective coats of paint to containers, especially plastic bottles. The process involves gripping the bottles by means of rotating gripping devices fastened to a conveyor chain, and conveying said bottles to all the different stations involved in the process: coating, drying, and curing. Centrifugation is used to remove any excess coating from the external surface of the bottles, keeping the bottles fastened to the same conveyor chain.

Abstract: A method of applying liquid adhesive to surfaces of components of an electrochemical cell employing a needle valve applicator. The liquid adhesive is applied by dispensing it through a tubular tip connected to a pneumatically actuated needle valve applicator. The method is effective in applying adhesive to narrow width or difficult to reach surfaces of cell components in a precise, consistent and reproducible manner. In a specific application the adhesive can be applied to the narrow recessed step surrounding the terminal portion of the cathode casing of a zinc/air button cell. In such application the cathode casing may typically be rotated at speeds of between about 50 and 1000 revolutions per minute as adhesive is applied thereto from the applicator. The adhesive provides a tight seal between the cathode casing and cathode assembly, thereby preventing leakage of electrolyte from the cell.

Abstract: A substrate processing apparatus for processing a substrate With a processing fluid is provided. The apparatus includes holding members 60 for holding the substrate W, a chuck member 61 for supporting the holding members 60 and a top-face member 62 approaching the substrate W to cover its surface. In arrangement, since the top-face member 62 is supported by the chuck member 61, the holding members 60 can rotate together with the top-face member 62 in one body. With this structure, it is possible to reduce the influence of particles on the substrate W and also possible to provided a low-cost substrate processing apparatus occupied as little installation space as possible.

Abstract: A reactor including a rotatable disc (3) having a trough (13) in an upper surface (5) thereof. Reactant (15) is supplied to the trough (13) by way or a feed (4), the disc (3) is rotated at high speed, and the reactant (15) spills out of the trough (13) so as to form a film (17) on the surface (5). As the reactant (15) traverses the surface (5) of the disc (3), it undergoes chemical or physical process before being thrown from the periphery of the disc (3) into collector means (7).

Abstract: A glass substrate manufacturing method and a color cathode ray tube manufacturing method manufactures a front substrate on which a phosphor layer is formed. In an application process a phosphor slurry of one color is applied onto an inner surface of a glass substrate on which a phosphor pattern in at least one color has already been formed. Then, in a spreading process, the glass substrate is rotated about an axis located at the approximate center of the inner surface to make the phosphor slurry spread out over its inner surface. Following this, in a draining process the glass substrate is tilted to a first tilt angle of more than 90° to drain excess slurry off the inner surface of the glass substrate, a tilt angle being formed between a vertical axis and an axis orthogonal to an outer surface of the glass substrate. In a spinning process the glass substrate is returned to a second tilt angle smaller than the first tilt angle, and rotated.

Abstract: A rotatable cover plate assembly 10 has a cavity 13 and a rotatable base plate assembly 12 has a cavity 42 with a semiconductor wafer 14 mounted therein. The cover plate assembly 10 comes down onto the base plate assembly 12 enclosing the semiconductor wafer 14 and a dispenser 28 in a chamber formed by the cavities 13 and 42. The cover and base plates 16 and 40 are rotated as a single assembly, and coating material dispensed by the dispenser 28 onto the semiconductor wafer 14. A flow regulator 25 coupled via an exhaust manifold 20 controls the rate of evaporate of solvent from the dispensed coating material.

Abstract: A resist coating and developing processing apparatus comprises an airflow forming mechanism for forming airflows from the tops of a cassette station, a processing station, and an interface section toward the bottoms and a controller for controlling the airflow forming mechanism, in which the processing station includes draft openings communicating with the cassette station and the interface section respectively. The controller controls the airflow forming mechanism so that the pressure in the processing station becomes higher than the pressures in the cassette station and the interface section to form flows of air from the processing station into the cassette station and the interface section. Thereby, influence of impurity components such as particles, alkaline components, and the like and changes in atmosphere such as temperature, humidity, and the like exerted on processing can be effectively precluded.

Abstract: The present invention relates to a modular, rotisserie type coating fixture for use in electronic beam physical vapor deposition (EB-PVD) coating processes. The fixture includes a support structure which rotates about a first axis during coating and a plurality of cassettes mounted within the support structure. The cassettes each hold a plurality of workpieces to be coated and are mounted in the support structure so that they rotate about axes parallel to the first axis. This allows each workpiece being coated to rotate about its longitudinal axis and to achieve an evenly distributed, substantially uniform coating on surfaces of the workpiece to be coated.

Abstract: An apparatus for coating a lens and curing the coating on the lens including a lens carrier for griping and holding the lens, a housing having a first set of walls defining a coating chamber with an opening in one of the first walls, the housing also having a second set of walls defining a curing chamber with an opening in one of the second walls. An arrangement for applying a coating to the lens within the coating chamber, an arrangement for projecting ultraviolet radiation within the curing chamber for curing the coating on the lens, and an arrangement for selectively blocking the ultraviolet radiation from passing into the coating chamber are provided.

Abstract: An apparatus for forming phosphor layers in cathode-ray tubes includes a table having a plurality of operating positions for processing panels for cathode-ray tubes to coat phosphor layers thereon. A plurality of angularly spaced clamp heads for holding the panels, respectively, are supported on the table for rotation about a first axis and angular movement about a second axis in each of the operating positions. A cam, which is operatively connected to the clamp heads, has a first cam groove for angularly moving the clamp heads through different angles about the second axis in the operating positions and a second cam groove for keeping the clamp heads in a fixed angular position with respect to the second axis in the operating positions. Joint cam groove mechanisms are combined with the cam for selectively switching between the first and second cam grooves.

Abstract: An apparatus and method is provided for liquid treating, particularly with coating materials such as paint, of an article, especially an article having a plurality of internal passages. The article is simultaneously rotated on an axis of rotation of the article and about a circular travel path into, back and forth in, and out of the liquid bath. The coated article is moved out of the bath, naturally drained under gravity, and then subjected first to low speed, then high speed rotation to clear the article of excess coating liquid and partially to dry the coating.

Abstract: A semiconductor wafer 11 is mounted on an elongated member 18, one end of which is rotatable about a transverse axis (14), thereby to distribute a liquid on the upper surface of the wafer more evenly. In order to stabilize the rotation of the elongated member, a second elongated member is preferably attached end-to-end to the elongated member (18) and rotates with it. A counterweight (26) in the second elongated member moves during the rotation such that the distance between the wafer and the central axis and the distance between the center of the counterweight and the axis are substantially equal. The weight distribution is approximately symmetrical about the axis and the structure is dynamically stabilized. The counterweight and the wafer assembly may be moved during rotation by applying air pressure from a source (23) to pistons (13,26) in the two elongated member.

Abstract: A spin coating method includes the steps of applying a coating material on the surface of a substrate, rotating the substrate about a first axis, and revolving the substrate about a second axis while tilting the substrate towards the second axis. The rotating step spreads the coating material over the surface of the substrate, and the step of revolving while tilting the substrate smoothens the surface of the coating material. At least the rotating step may be performed in an atmosphere containing a solvent vapor. A spin coating apparatus includes a nozzle for applying a coating material to the surface of a substrate, a chuck for rotating the substrate about a first axis, a support arm for revolving the substrate about a second axis, and a tilting mechanism for tilting the surface of the substrate towards the center of the second axis while the substrate is revolving.

Abstract: A coated work rotating apparatus is disclosed which dries paint on a coated work while rotating the coated work after completion of coating. The coated work rotating apparatus comprises a carrier frame transported in one direction by a transport mechanism, a rotary frame mounted for rotation around a first axis on the carrier frame, and a coated work holding member mounted for rotation around a second axis perpendicular to the first axis on the rotary frame. A rotational driving mechanism rotates the rotary frame with respect to the carrier frame and also rotates the coated work holding member with respect to the rotary frame. By mounting a coated work on the rotating apparatus, smooth coated faces having a good appearance can be obtained for all faces of the coated work.

Abstract: A method and an apparatus for applying molten wax to one face of a wafer is disclosed. A container having an upwardly facing opening contains the molten wax. The wafer is held substantially horizontally above the opening of the container, with one face of the wafer facing downwardly toward the opening of the container. At least one of the container and the wafer is moved toward the other to bring the opening of the container and underside of the wafer into contact with each other to thereby apply a predetermined amount of molten wax within the container to the underside of the wafer. Preferably, the container is filled with the molten wax such that the molten wax stands up, under surface tension, above a peripheral edge of the opening of the container. Preferably, the wafer is spinned around its central axis in a high speed so that the molten wax applied at the central portion thereof is spread on the entire surface of the wafer and that the extra wax is scattered out of the wafer.

Abstract: The present invention provides a semiconductor device manufacturing apparatus which, in processing wafers with processing liquid, prevents dust contamination of a wafer surface to be processed, enables fine control of processing liquid temperature, enables the wafer surface to be processed uniformly, permits use of only a small amount of processing liquid, and can be adapted for mixed solvents. The apparatus according to the present invention comprises a cup containing the processing liquid, vacuum chuck means holding the wafer by suction on the upper surface of the wafer, and means by which the wafer surface is brought into dynamic contact with the processing liquid.

Abstract: An improved method for coating a semiconductor wafer with a uniform layer of photoresist or other liquid film is provided. The liquid is first semi-uniformly deposited on the wafer by spraying or otherwise. Thereafter, the wafer is rotated about an axis perpendicular to the plane of the wafer and removed from the wafer. In the preferred embodiment, a number of wafers are placed about the perimeter of a large, flat disc which is rotated about its center. The liquid is spread over the surface of each wafer by the centrifugal force generated by such rotation. By placing the wafers at a distance from the axis of rotation, the centrifugal force on all points of each wafer is approximately the same, thereby providing for a uniform spreading of the film over the wafer.

Abstract: The present invention relates to a method and apparatus for producing a liner of elastomeric material insitu in a pneumatic tire casing.

Abstract: Uniform and repeatable formation of a resistance element on a substrate is achieved by spinning the coated objects which are still in a wet state while rotating them about an orthogonal axis to subject the wet indicator formulation to centrifugal forces which forces the indicator formulation into contact with the substrate.

Abstract: Coating apparatus having a vacuum chamber and a rotary motion assembly rotatably mounted in the vacuum chamber. Drive means is carried by the vacuum chamber for rotating the rotary motion assembly on an axis. At least one coating source is disposed within the chamber and is generally coincident with the axis of rotation for the rotary motion assembly. A mask structure is mounted in the chamber for rotational movement about an axis which is generally coincident with the axis of rotation of the rotary motion assembly. Additional drive means is provided for rotating the mask structure as the rotary motion assembly is rotated.

Abstract: A plurality of articles such as sheets or lenses are simultaneously and uniformly coated by first placing them in vertical spaced relationship with respect to each other within a tank having a quantity of fluid coating material therein. The coating material flows across the surfaces to be coated. Thereafter, the sheets are lifted out of the tank into an elongated chamber above the tank in which they are spun about their vertical axes. Excess coating material is thus driven off the surfaces to be coated. Means to recover, clean, replenish and remove bubbles from the coating material are disclosed.

Abstract: An equipment for treating textiles in the form of hanks or webs comprising at least one drive member coupled to the said hank or web, at least one applicator device which contains the liquid or paste to be applied to the hank or web, guide members which guide the hank or web through the said liquid or paste, and at least two centrifuging elements located in the path of the hank or web and mounted for rotation, wherein the wrap-around angle of the hank or web on each centrifuging element is at least 90.degree., the arrangement being uniformly to distribute the liquid or paste, applied to the hank or web, over the hank or web cross-section, in the wrap-around zone of the centrifuging elements, under the influence of the pressure on the centrifuging elements and the centrifugal force, generated by these, and and to centrifuge off the excess liquid or paste.

Abstract: An arrangement for surface treating workpieces has a pair of rotary conveyors each rotatable about a respective vertical rotation axis and provided with a plurality of angularly spaced holders each of which can grip a respective workpiece and advance it angularly stepwise through a plurality of respective working stations. In addition each of these holders can be rotated about an axis generally radial of the respective rotation axis for the rotary conveyor for treatment on all sides of each workpiece as it is stepped through the various surface treatment stations. A line conveyor extends tangentially passed the two conveyors and is of the walking-beam type. This line conveyor feeds workpieces to the upstream conveyor so that they then move around the working stations of this upstream rotary conveyor, then takes them off the upstream rotary conveyor and feeds them to the downstream rotary conveyor where they are stepped through the respective working stations of this conveyor.

Abstract: Machine for sequentially rotating and tilting a container having materials therein for wetting or impregnating a tape to be used for forming an orthopedic cast, the machine having a turntable rotatable about a horizontal axis, a platform on the turntable for receiving the container base and rotatable about an axis transverse to the turntable axis and a clamp on the turntable for clamping the container on the platform. The turntable is rotatable by a first motor and the platform is rotatable by a second motor mounted on the turntable. The first and second motors are sequentially energized by a motor driven timing means to (a) tilt the container from its upright position to a position 45.degree. from the vertical, (b) intermittently spin the container, (c) invert the container, (d) spin the container, (e) return the container to its upright position and (f) spin the container.

Abstract: In a method of an apparatus for forming a conductive layer on a substrate wafer by evaporative, sputtering or other similar processes performed under a controlled environment, there are provided means for holding the wafer at the edge portions thereof with minimal holding contact, means orbiting rotating the wafer about a first axis which forms an acute angle relative to the major surfaces of the wafer while the processes for forming the layer is in progress so that the layer is formed uniformly, and means orbiting the wafer about a second axis which is substantially orthogonal to said first axis.

Abstract: A planetary evaporator having at least one source of material for coating, by evaporation, workpieces such as semiconductor wafers. The apparatus includes a pallet mounted for rotation about its own axis, and substrate or workpiece holders mounted on the pallet which orbit said axis. Guides support the pallets and a cam follower on the pallet follows a cam to effect reciprocation of the pallet as it rotates, the guides being adapted for rotation about another axis which is substantially perpendicular to the axis of rotation of the pallet. In another embodiment the substrate holders are also rotated so as to give four degrees of freedom of the workpiece or substrate relative to the material source.