By Separation Patents (Class 118/603)
  • Patent number: 10538725
    Abstract: A bioprinter print head including a plurality of fluid dispensing segments arranged with respect to one another to form a three-dimensional lattice structure, each of the plurality of fluid dispensing segments having an inner member and an outer member, the outer member being positioned concentrically outward to the inner member, the inner member having a lumen and a fluid outlet port operable to deliver a biomaterial and the outer member operable to open or close the fluid outlet port. A method of bioprinting a three-dimensional biological structure, the method including simultaneously printing a three-dimensional matrix of biomaterial voxels within a support medium using a bioprinter print head assembly, removing the bioprinter head assembly from the support medium, and removing the support medium to form a self-supporting biological structure.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: January 21, 2020
    Assignee: AUTODESK, INC.
    Inventor: Joshua A. Natarajan
  • Patent number: 10252287
    Abstract: An optical fiber re-coating device of the invention includes an optical fiber coater that cures resin and coats a coating-removed portion of an optical fiber therewith. The optical fiber re-coating device includes: a resin reservoir tank that stores the resin which is before subjected to curing; a pump that supplies the resin stored in the resin reservoir tank to an optical fiber coater; and an air bubble separator that separates air bubbles included in the resin from the pump therefrom, sends the resin from which the air bubbles are separated to the optical fiber coater, and returns the resin including the separated air bubbles to the resin reservoir tank.
    Type: Grant
    Filed: October 3, 2014
    Date of Patent: April 9, 2019
    Assignee: FUJIKURA LTD.
    Inventors: Yoshiharu Kanda, Koichi Yokota, Hiroki Yoshida
  • Patent number: 9508542
    Abstract: An arrangement for producing structured substrates is provided, which includes a device for applying layer systems including a device for applying liquid materials to rotating substrates, a housing, a rotating holder for the substrate to be coated, a feeder for liquid materials to be applied, and a collection device having multiple removal contraptions for liquid materials that do not remain on the substrate. The housing of the device is filled with an inert gas, in particular dried, molecular nitrogen, noble gas, or a mixture thereof. The additional receptacles and conduits of the arrangement for producing structured substrates are gas-tight and are designed such that an inert molecular nitrogen or noble gas atmosphere is created above the liquid contents thereof. The collection device has various collection zones in which different liquid materials can be selectively collected and selectively removed via the associated removal contraption.
    Type: Grant
    Filed: May 7, 2013
    Date of Patent: November 29, 2016
    Assignee: Rumailha-Comercio Internacional e Servicos LDA & Comandita
    Inventors: Hans Bohnet, Klaus-Peter Thiel
  • Patent number: 9375665
    Abstract: System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: June 28, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yao-Hwan Kao, Po-Chang Huang
  • Patent number: 8911552
    Abstract: An apparatus and method for qualifying a filter used to filter fluid used in a coating operation associated with photolithography or other semiconductor manufacturing processes, provides a semiconductor manufacturing tool that includes a filter and an acoustic wave generator. The filter may be housed inside a filter housing and the acoustic wave generator may produce ultrasonic, megasonic or other acoustic energy. The acoustic wave generator contacts or is in close proximity with the filter housing and provides acoustic wave energy to the filter through the housing. The acoustic wave energy causes any bubbles in the filter to become disengaged.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: December 16, 2014
    Assignee: Wafertech, LLC
    Inventor: Guy Jacobson
  • Patent number: 8691014
    Abstract: Prepping a surface entails entraining a coating particle into a fluid stream, directing the fluid stream containing the coating particle at the surface to be prepped to thereby prep the surface using the coating particle. The prepped surface can then be coated using the same or substantially similar coating particle. This technique can be used with a continuous airjet, a forced pulsed airjet, a continuous waterjet or a forced pulsed waterjet as the carrier stream. This invention solves the problem of foreign blasting particles becoming embedded in the atomic matrix of the surface to be prepped, which can result in unpredictable behavior of the surface properties and even catastrophic failure.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: April 8, 2014
    Assignee: VLN Advanced Technologies Inc.
    Inventor: Mohan M. Vijay
  • Publication number: 20130302527
    Abstract: One or more aspects of this invention pertain to fabrication of electronic devices. One aspect of the present invention is a system for electroless deposition of metal on a substrate. According to one or more embodiments of the present invention, the system comprises a main subsystem in combination with one or more subsystems for electroless deposition on a substrate. Another aspect of the present invention is a method of making an electronic device. According to one or more embodiments of the present invention, the method comprises one or more processes. Descriptions according to one or more embodiments of the system and the processes are presented.
    Type: Application
    Filed: May 11, 2012
    Publication date: November 14, 2013
    Inventor: Shijan LI
  • Patent number: 8574365
    Abstract: Apparatus for application of primer with the aid of vacuum, includes a reservoir (26) for liquid primer, an applicator nozzle (14) having an applicator chamber (16) and a suction chamber (18), a supply system (24, 26) for supplying primer from the reservoir (28) to the applicator chamber (16), a suction system (30, 32) for withdrawing air and primer from the suction chamber (18) and a separator (34) for separating primer from the withdrawn air and recirculating the separated primer into the reservoir (28), wherein the separator (34) is a cyclone.
    Type: Grant
    Filed: January 18, 2011
    Date of Patent: November 5, 2013
    Assignee: düspohl Maschinenbau GmbH
    Inventor: Uwe Wagner
  • Patent number: 8475594
    Abstract: A continuous galvanizing line uses a coating pot containing a molten zinc bath having bottom dross and further comprises a pump. The pump agitates the bottom dross so the bottom dross interacts with aluminum and converts to top dross, which can be removed without needing to stop the galvanizing line. A reaction vessel may also be used to provide a higher concentration of aluminum to react with the bottom dross.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: July 2, 2013
    Assignee: Pyrotek, Inc.
    Inventors: Mark A. Bright, Gregory C. Becherer, Robert L. Grodeck
  • Patent number: 8435348
    Abstract: A paint booth is provided with a purifier. The purifier includes a water tank, pump, water cord formation mechanism, sludge removal mechanism, exhaust mechanism, and barrier member. The water cord formation mechanism includes a water case located in an upper part of a spray chamber. A large number of nozzles are formed in a bottom wall of the water case. Each nozzle includes a tubular portion, the inside diameter of which is reduced downward from an inlet, and a circular outlet. Water falling in straight lines from the outlet forms a large number of parallel water cords. Paint mist is collected as air containing the paint mist contacts the water cords. An exhaust chamber is formed on the back side of the barrier member.
    Type: Grant
    Filed: November 8, 2011
    Date of Patent: May 7, 2013
    Assignee: Bunri Incorporation
    Inventor: Minoru Tashiro
  • Publication number: 20130074768
    Abstract: A moistening system that significantly reduces the problems caused by contaminants in the moistening fluid is provided. The catch basin of a moistening system is provided with a filter that reduces the amount of contaminants contained in the recycled moistening fluid. Additionally, the moistening fluid is buffered with an acid that acts to dissolve the paper filler and other soluble debris that may be introduced into the moistening fluid, thereby significantly decreasing any blinding of components of the moistening system that would otherwise reduce the flow rate of the moistening fluid through the system. These ensure that sufficient moistening fluid is applied to the envelope flaps, which results in consistent and complete sealing of the envelope flaps.
    Type: Application
    Filed: September 23, 2011
    Publication date: March 28, 2013
    Applicant: Pitney Bowes Inc.
    Inventor: Michael S. Ryan
  • Publication number: 20120272896
    Abstract: Apparatus to capture aerosols, fluid jetting apparatus, and aerosol diverters are disclosed. An example aerosol capture apparatus includes a corona wire to generate ions, and a reference plate positioned below the corona wire and above a substrate on which a fluid is to be deposited, the reference plate to provide a reference potential to direct the ions toward the reference plate to force aerosol particles associated with the fluid toward the reference plate.
    Type: Application
    Filed: April 29, 2011
    Publication date: November 1, 2012
    Inventors: Omer Gila, Napoleon J. Leoni, Jeffrey Nielsen
  • Patent number: 8171876
    Abstract: The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: May 8, 2012
    Assignee: Ulvac, Inc.
    Inventors: Takumi Namekawa, Kei Baba, Yuya Inoue, Masao Murata, Koji Hane, Robert D. Taff, Robert R. McKay, Ralph D. Fox
  • Publication number: 20110189402
    Abstract: Apparatus for application of primer with the aid of vacuum, includes a reservoir (26) for liquid primer, an applicator nozzle (14) having an applicator chamber (16) and a suction chamber (18), a supply system (24, 26) for supplying primer from the reservoir (28) to the applicator chamber (16), a suction system (30, 32) for withdrawing air and primer from the suction chamber (18) and a separator (34) for separating primer from the withdrawn air and recirculating the separated primer into the reservoir (28), wherein the separator (34) is a cyclone.
    Type: Application
    Filed: January 18, 2011
    Publication date: August 4, 2011
    Inventor: Uwe Wagner
  • Patent number: 7942967
    Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: May 17, 2011
    Assignee: ASML Holding N.V.
    Inventor: Andrew Nguyen
  • Patent number: 7887872
    Abstract: Method and arrangement for separating impurities from the machine circulation of a processing agent of a processing station used in processing paper or board, in which method the processing agent is led from a reservoir (1) to the processing station (2), where it is spread on the surface of the web being processed, and the excess processing agent led to the processing station (2) agent is led back to the reservoir (1). The flow of processing agent coming from the processing station (2) is led to at least one pressure sieve (6), which is located below the level of the processing station (2), in such a way that the feed pressure of the processing agent is created on the basis of the difference in height between the station (2) and the pressure sieve (6).
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: February 15, 2011
    Assignee: Metso Paper, Inc.
    Inventors: Markku Viitanen, Ilkka Roitto
  • Patent number: 7878144
    Abstract: An electroless plating apparatus can form a protective film on exposed surfaces of embedded interconnects stably with good selectivity for thereby protecting the interconnects. The electroless plating apparatus includes a magnetic removal portion for magnetically removing small magnetic suspended solids in an electroless plating solution which have not been removed by a filter.
    Type: Grant
    Filed: October 25, 2006
    Date of Patent: February 1, 2011
    Assignee: Ebara Corporation
    Inventors: Akira Owatari, Yasuhiko Saijo, Junichiro Tsujino
  • Patent number: 7867559
    Abstract: This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner. The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus.
    Type: Grant
    Filed: November 25, 2005
    Date of Patent: January 11, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Katsuto Taniguchi, Kazuhiro Kojima, Atsuko Noya
  • Publication number: 20100192806
    Abstract: The present invention relates to a method and a system for recycling of remaining powder from an equipment for generatively manufacturing three-dimensional objects (3), wherein, in addition to sieving of remaining powder (3a) or mixing the remaining powder (3a) with fresh powder, a further preparing step for modifying a characteristic of the resulting powder is performed.
    Type: Application
    Filed: January 20, 2010
    Publication date: August 5, 2010
    Applicant: EOS GmbH Electro Optical Systems
    Inventors: Martin Heugel, Michael Shellabear, Sven Pawliczek, Horst Maier
  • Patent number: 7749571
    Abstract: The invention relates to a coating device (10) comprising a coating tank (21) with an opening (22) and a coating roll (31), in which the roll (31) faces the opening (22). A further subject of the invention is a method for coating a substrate with a fluid comprising the steps of (i) supply of a substrate (40) and of a fluid, (ii) application of the fluid to the substrate (40) and (iii) shearing of the fluid by the substrate (40) set in motion in relation to the fluid.
    Type: Grant
    Filed: July 1, 2004
    Date of Patent: July 6, 2010
    Assignee: Bostik Findley S.A.
    Inventor: Jean-Francois Chartrel
  • Patent number: 7673581
    Abstract: A device for the application of at least two liquid to pasty application media to one or both sides of a moving surface, having a curtain applicator for applying the application media. The curtain applicator discharges the application media onto the moving surface as curtains moving substantially under the force of gravity, and the moving surface being one of a surface of a material web and a surface of a transfer element, which transfers the application media to the surface of the material web. The device includes a collecting device for the separate collection of each application medium. The collecting device being positionable between the curtain applicator and the material web. The curtain applicator and the collecting device being movable relative to each other.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: March 9, 2010
    Assignee: Voith Patent GmbH
    Inventor: Manfred Ueberschär
  • Publication number: 20090181176
    Abstract: Method and arrangement for separating impurities from the machine circulation of a processing agent of a processing station used in processing paper or board, in which method the processing agent is led from a reservoir (1) to the processing station (2), where it is spread on the surface of the web being processed, and the excess processing agent led to the processing station (2) agent is led back to the reservoir (1). The flow of processing agent coming from the processing station (2) is led to at least one pressure sieve (6), which is located below the level of the processing station (2), in such a way that the feed pressure of the processing agent is created on the basis of the difference in height between the station (2) and the pressure sieve (6).
    Type: Application
    Filed: September 20, 2005
    Publication date: July 16, 2009
    Applicant: METSO PAPER, INC.
    Inventors: Markku Viitanen, Ilkka Roitto
  • Patent number: 7556693
    Abstract: This invention relates to a curtain applicator on which a two-layer curtain is formed by dispensing two types of coating medium, for example color, from a medium feeder positioned to the upper side of a moving web in order to apply two layers of coating medium onto the web surface. The medium feeder has a middle lip, which is arranged in the flow channels for the two types of medium and has a pointed part projecting toward the web side from the pointed parts of the two side lips which are arranged on the outer side of the flow channels for the two types of medium on the outer side in the width direction of the web. The curtain applicator also includes a convexly formed medium separation device, which adjoins the pointed part of the middle lip and individually separates the two types of surplus medium, for example, color, which are dispensed from the medium feeder.
    Type: Grant
    Filed: August 23, 2007
    Date of Patent: July 7, 2009
    Assignee: Voith Patent GmbH
    Inventors: Hirofumi Morita, Akio Hirano, Hiroyuki Kohno
  • Patent number: 7531040
    Abstract: A method is disclosed for one embodiment. An amount of photoresist is deposited upon a substrate, the amount of photoresist more than necessary to coat the substrate. The substrate is spun within a bowl such that an excess amount of photoresist is propelled off of the substrate to an interior surface of the bowl. A portion of the excess amount of photoresist is recovered and treated such that the recovered portion of the excess amount of photoresist is rendered usable.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: May 12, 2009
    Assignee: ASML Holdings N.V.
    Inventors: Joseph Consolini, Keith Best, Cheng Gui, Alexander Friz
  • Patent number: 7390364
    Abstract: A system and method of coating articles with the method comprising directing a plurality of articles into an enclosure; applying a vehicle carrying a first agent onto the plurality of articles; converted the vehicle into a gaseous state to leave the first agent on each the plurality of articles; collecting the vehicle in the gaseous state; converting the vehicle in the gaseous state back into a reclaimed state to enable one to add a further agent to the reclaimed vehicle so that one can apply the reclaimed vehicle and a further agent onto a further set of articles.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: June 24, 2008
    Assignee: Water Gremlin Company
    Inventors: Robert W. Ratte, David P. Zinschlag
  • Patent number: 7358186
    Abstract: Broadly speaking, a method and an apparatus are provided for depositing a material on a semiconductor wafer (“wafer”). More specifically, the method and apparatus provide for selective heating of a surface of the wafer exposed to an electroless plating solution. The selective heating is provided by applying radiant energy to the wafer surface. The selective heating of the wafer surface causes a temperature increase at an interface between the wafer surface and the electroless plating solution. The temperature increase at the interface in turn causes a plating reaction to occur at the wafer surface. Thus, material is deposited on the wafer surface through an electroless plating reaction that is initiated and controlled by varying the temperature of the wafer surface using an appropriately defined radiant energy source.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: April 15, 2008
    Assignee: Lam Research Corporation
    Inventors: Yezdi Dordi, John Boyd, William Thie, Bob Maraschin, Fred C. Redeker, Joel M. Cook
  • Patent number: 7338604
    Abstract: A process for removing solids from a water-based flush solution, The process includes: providing dirty flush solution; directing the dirty flush solution to a treatment vessel; adding one or more chemicals to the treatment vessel to form a treated flush solution; separating aggregated paint compounds from the treated flush solution to form a filtered flush solution; and directing the filtered flush solution to spray application equipment. The flush system of the invention includes a treatment vessel, wherein the dirty flush solution is mixed with one or more chemicals to form a treated flush solution; a primary separation unit to remove particles including aggregated paint compounds from the treated flush solution to form a filtered flush solution; and transfer lines to direct the filtered flush solution to spray application equipment. The filtered flush solution contains: 1% to 5% by weight of a water soluble organic solvent; 0.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: March 4, 2008
    Assignee: Henkel Kommanditgesellschaft auf Aktien
    Inventor: Neil R. Wilson
  • Patent number: 7211151
    Abstract: A coating liquid application apparatus is provided which can apply a coating liquid, such as a coating agent for improving a weatherability of a printed surface, to the printed surface of a print medium automatically and at high speed. For this purpose, this invention uses application mechanisms to apply the coating liquid to the print medium that was ink-printed with an image. Each application mechanism has a pair of rollers supplied with the coating liquid. Multiple stages of such application mechanisms are provided. The print medium is passed between the paired rollers successively from one application mechanism to another to apply the coating liquid to the print medium in a plurality of stages.
    Type: Grant
    Filed: May 13, 2005
    Date of Patent: May 1, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuhiko Takekoshi, Tetsuo Kikuchi
  • Patent number: 6997134
    Abstract: A drum breader and coating recirculation system that includes a spreader positioned at an end of the drum, the spreader having a plurality of angled surfaces to distribute coatings evenly; a screening platform positioned downstream of the spreader having a drive device for imparting straight-line angular displacement to the screening platform; and a drum feed conveyor positioned downstream of the screening platform, the drum feed conveyor having a belt extending at least partially along an upward angle.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: February 14, 2006
    Assignee: FMC Technologies Inc.
    Inventors: Robert Phillip Bayus, David Alan Bailey, Ramesh M. Gunawardena, Michael Miller, Harold Eugene Patterson
  • Patent number: 6923865
    Abstract: Techniques for precisely controlling the size of particles in a coating solution delivered to a coating apparatus involve continuous classification of coating particle size using a tangential flow filter assembly. The techniques may be particularly useful in the preparation of coating dispersions for manufacture of magnetic recording media. A classification technique makes use of a tangential flow filter assembly that permits delivery of coating particles below a maximum size threshold to a coating path. The filter assembly may be disposed in a circulation path that includes one or more processing devices to reduce the size of coating particles carried by a coating solution. The filter assembly enables coating particles above the maximum size threshold to be recirculated through the circulation path and subjected to repeated processing to reduce particle size to a desired size range.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: August 2, 2005
    Assignee: Imation Corp.
    Inventors: Mark Serafin, Stanley R. Ellis, Leroy C. Erickson, Scott A. Walker, Daniel W. Brandt
  • Patent number: 6881436
    Abstract: Material balance is maintained in a recycling system for aqueous paint by controlling a liquid amount within the recycling system while spray-coating an article. A recycling method includes: coating an article with aqueous paint in a water-curtain-type coating booth; collecting an over-spray paint, that does not adhere to the article, by virtue of a water curtain; sending a collected solution of paint and water to a condensation bath through a booth circulation water bath; separating this solution by an ultra-filtration apparatus into condensed paint and filtrate, with the condensed paint being transferred to a paint tank; and removing condensed paint from the paint tank, if necessary for adjustment of aqueous paint, followed by coating this aqueous paint onto an article, wherein a total amount of liquid present within the recycling system is controlled to be constant during spray-coating of an article.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: April 19, 2005
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Tsuyoshi Yamane, Junichi Sueyoshi, Takahito Ohtsu
  • Patent number: 6740163
    Abstract: A method of performing dip coating of a layer of a resist material on a surface of a substrate, comprising steps of: (a) providing a dip coating vessel having an interior space containing a dip coating liquid comprising a solution of the resist material in a solvent, the dip coating vessel being open at the top thereof; (b) providing a substrate having a surface, immersing the substrate in the dip coating liquid in the vessel via the open top, and withdrawing the substrate from the vessel via the open top thereof, thereby forming a layer of resist material on the surface; and (c) monitoring and maintaining the viscosity of the dip coating liquid supplied to the dip coating vessel at a predetermined value. Also disclosed is an apparatus for performing the method.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: May 25, 2004
    Assignee: Seagate Technology LLC
    Inventors: Donald Everett Curtiss, Joseph Leigh, Frank Quan
  • Patent number: 6713122
    Abstract: Methods and apparatus for reducing heat load and air exposure when using an electroless plating fluid during a plating process, are presented. An electroless plating apparatus, including an electroless plating vessel and recirculation systems, is presented. The electroless plating vessel minimizes air exposure (and thus evaporative cooling and degradation) of the electroless plating fluid while the recirculation systems minimize heat load of the electroless plating fluid.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: March 30, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Steven T. Mayer, John B. Alexy, Jingbin Feng
  • Patent number: 6694914
    Abstract: An air unit for the removal of excess particulate coating material that is present on products which are in a coating machine comprises, for blowing surplus particulate material off the products, at least one suction member for drawing off air, with particulate material present therein, from the coating machine, separating means for removing particulate material from the air drawn off, and circulating means for feeding at least a portion of the air drawn off to the blowing member.
    Type: Grant
    Filed: April 9, 2002
    Date of Patent: February 24, 2004
    Assignee: CFS Bakel B.V.
    Inventor: Hendrikus Antonius Jacobus Kuenen
  • Patent number: 6656280
    Abstract: A resist recycling apparatus includes a viscosity control tank supplied with wasted resist liquid; a solvent tank that supplies a solvent to the viscosity control tank; a viscometer that measures viscosity of the resist according to the viscosity measured by the viscometer and the temperature of the resist, and that determines an amount of solvent to supply to the viscosity control tank according to the difference between the calculated resin density and a predetermined resin density; and a filter that removes dust from the resist.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: December 2, 2003
    Assignee: Oki Electric Industry Co., Ltd.
    Inventors: Yasuharu Oota, Yoshizumi Ito
  • Publication number: 20030177902
    Abstract: A system and process for industrial painting operations is disclosed. The disclosed system and process includes entraining paint particles from a paint booth operation in a stream of air; directing the stream of air to an aqueous bath covered with a layer of small silica particles; encapsulating the paint particles present in the stream of air with the small silica particles; further cleansing the stream of air by removing residual paint particles and other unwanted compounds as the stream of air is directed through an exhaust system; and recycling the encapsulated paint particles remaining in the paint booth.
    Type: Application
    Filed: March 25, 2002
    Publication date: September 25, 2003
    Inventor: John M. Spangler
  • Publication number: 20030150381
    Abstract: Proposed is an apparatus for the spray treatment of printed circuit boards. It has conveyor means for conveying the printed circuit boards (2) with a horizontally oriented PCB surface plane. Provided above the plane of conveyance (7) is a nozzle device (16) for spraying the top surface (13) of the printed circuit boards (2) with a liquid treatment medium. The apparatus is equipped with a suction device (26) that permits the sprayed-on treatment medium to be suctioned off from the top surface (13) of the printed circuit boards (2) during the spray process. In this manner the treatment medium is prevented from backing up, and a high-quality treatment process is ensured.
    Type: Application
    Filed: February 11, 2002
    Publication date: August 14, 2003
    Applicant: Pill e.K
    Inventor: Dietmar Seifert
  • Patent number: 6592666
    Abstract: A process and apparatus are provided for applying a sizing composition to glass fibers with improved size application efficiency, while also providing for the collection and reuse of sizing composition, as well as for providing sizing composition to the applicator device, The apparatus includes a rotatable, but otherwise stationary, sizing applicator device which can be replaced without substantial interruption of the sizing application process while also providing a sizing reservoir for the collection and reuse of sizing composition, as well as for providing sizing composition to the applicator device.
    Type: Grant
    Filed: December 29, 1999
    Date of Patent: July 15, 2003
    Assignee: Owens Corning Fiberglas Technology, Inc.
    Inventors: Hong Peng, Christopher M. Hawkins
  • Patent number: 6589338
    Abstract: This substrate processing device is identical to a wafer cleaning device 5 for cleaning a wafer W, which includes a supply nozzle 34 for supplying APM and the pure water, a spin chuck 31 for carrying the wafer W and a container 31 for accommodating the spin chuck 31. The container 30 includes an inner processing chamber 42 and an outer processing chamber 43 and is constructed so as to be movable up and down to the spin chuck 31. A first drainage line 50 is connected to the inner processing chamber 42 to discharge APM and the interior atmosphere, while a second drainage line 51 is connected to the outer processing chamber 43 to discharge pure water and the interior atmosphere. With the connection of the first drainage line 50, the wafer cleaning device 5 is adapted so that the supply nozzle 34 supplies APM to a surface of the wafer W again. Therefore, it is possible to reuse this processing liquid advantageously and additionally, an exhaust displacement can be reduced.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: July 8, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Mitsunori Nakamori, Hiroki Taniyama, Takanori Miyazaki
  • Patent number: 6579370
    Abstract: An apparatus for the coating treatment comprises a coating section for coating a substrate with a process solution, a heating section for heating the substrate coated with the process solution, and a recovery section for recovering at least a part of the solvent vapor contained in the hot exhaust gas discharged from the heating section. The recovery section includes a cooling apparatus, and the hot exhaust gas containing a solvent vapor generated from the substrate when the substrate is subjected to a heating treatment is passed through the cooling apparatus so as to cool and condense at least a part of the solvent vapor contained in the hot exhaust gas so as to recover the solvent in the form of a liquid.
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: June 17, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Yoshio Kimura, Seiki Ishida
  • Patent number: 6464879
    Abstract: A process for treating phosphatising bath overflow and/or wash water after phosphatising, phosphatising being performed using an acid, aqueous phosphatising solution which contains from 3 to 50 g/l of phosphate ions, calculated as PO43−, from 0.2 to 3 g/l of zinc ions, optionally further metal ions and accelerator, characterised in that the accelerator is an organic molecule or molecular ion having a molecular weight of at least 80 g/mol, and that the phosphatising bath overflow and/or the wash water is subjected to ultrafiltration. The permeate from ultrafiltration is preferably separated further by means of nanofiltration or reverse osmosis. The permeate from the second separation may be recycled as wash water; the retentate may be recycled to the phosphatising bath.
    Type: Grant
    Filed: August 3, 2000
    Date of Patent: October 15, 2002
    Assignee: Henkel Kommanditgesellschaft auf Aktien
    Inventors: Jan-Willem Brouwer, Peter Kuhm, Jens Vier
  • Patent number: 6357386
    Abstract: A plasma spraying assembly comprising a treatment chamber and a plasma spraying device located in the interior thereof is disclosed that further comprises an assembly for controlling the gas flow in the interior of the treatment chamber. In order to prevent a gas flow in the interior of the treatment chamber that whirls deposits to be created, a deflection device is provided that is located at least partially in the interior of the treatment chamber. Vertically below the treatment chamber, a collecting shaft is located. In the region between the treatment chamber and the collecting shaft, there is provided a basic element comprising baffle members, but leaving open a passage between the treatment chamber and the collecting shaft. In the interior of the collecting shaft, a deflection element is located having essentially conical shape and towering into the passage of the basic element. The collecting shaft is in operative connection with the suction side of a blower and with a vacuum pump.
    Type: Grant
    Filed: November 24, 1999
    Date of Patent: March 19, 2002
    Assignee: Sulzer Metco AG
    Inventor: Silvano Keller
  • Publication number: 20010009748
    Abstract: An inventive apparatus for producing electrophotographic photoreceptor includes a guide portion permitting passage of a cylindrical coated member; a coating-solution feed portion disposed around an outer periphery of the guide portion and allowing a coating solution to flow over an upper end of the guide portion thereby applying the solution to an outer periphery of the coated member; a coating-solution feeding assembly for feeding the coating solution to the coating-solution feed portion; a coating-solution recovery portion disposed around an outer periphery of the coating-solution feed portion via a partitioning wall for recovery of the coating solution flowing from the coating-solution feed portion over the partitioning wall; and an openable communicating portion for communication between the coating-solution feed portion and the coating-solution recovery portion.
    Type: Application
    Filed: January 25, 2001
    Publication date: July 26, 2001
    Inventor: Keiichi Inagaki
  • Patent number: 6248398
    Abstract: A coater having a controllable pressurized process chamber for applying photoresist to a wafer is provided. The controllable pressurized process chamber reduces the evaporation of solvent in the photoresist during a spin-on process step. Reducing premature curing of the photoresist results in improved uniform planarization of the photoresist layer. Contaminants in the photoresist are also reduced by having an environmentally controllable process chamber. A housing having a upper and lower section forms a process chamber surrounding a wafer chuck. The upper housing section includes a solvent vapor opening for introducing pressurized solvent vapor into the process chamber and the lower housing section includes an exhaust opening. The upper housing section also includes an opening for introducing photoresist onto a wafer. A control device is coupled to the exhaust opening and a vacuum device for controlling the pressure in the process chamber.
    Type: Grant
    Filed: May 22, 1996
    Date of Patent: June 19, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Homayoun Talieh, Alex Lurye
  • Patent number: 6197376
    Abstract: Process for covering a surface (1a) of a substrate (1) with a layer (2) of a fluid material, characterized in that: (a) with a confining wall (3) closed up on itself, arranged some distance from and above the surface to be covered (1a), and whose lower edge (3a) forms together with the latter a peripheral void (4), is defined a treatment chamber (5) delimiting an area (6) to be treated on the said surface to be covered; (b) a controlled vacuum is established inside the treatment chamber (5) by admitting an incoming gas stream (7) via the peripheral void (4), and by extracting an outgoing gas stream (8) from the treatment chamber, so as to obtain an internal pressure in the said chamber which is lower than the external pressure; (c) a controlled fluid stream (10) is introduced into the treatment chamber (5) under vacuum, this stream comprising the fluid covering material, which forms at the level of the peripheral void, together with the incoming gas stream (7), a turbulent mixed flow, which is aspirated into
    Type: Grant
    Filed: July 19, 1999
    Date of Patent: March 6, 2001
    Assignee: Bio Merieux
    Inventor: Bruno Colin
  • Patent number: 6187099
    Abstract: An installation for the treatment of objects in a defined gas atmosphere whose oxygen content is smaller than that of air and with which environmentally damaging treatment gases are produced with a housing with an entry opening and with an exit opening for the objects passing through, conveyed through the housing, with a first treatment zone in the housing, which comprises the entry opening and which produces the treatment gas for the production of a process gas atmosphere, with a second treatment zone which is connected to the exit opening and which is connected to the first treatment zone via a passage opening for the objects and in which the atmosphere is lean of treatment gas and oxygen, with a circulation for the process gas with which a ventilator suctions process gas from the first treatment zone and sends it via a filter device which holds back the treatment gas, with a first sluice which is allocated to the entry opening and which is flowed upon by the purified process gas coming from the filter
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: February 13, 2001
    Assignee: Knaack & Jahn GmbH
    Inventor: Bernd Blaudszun
  • Patent number: 6132509
    Abstract: A self-contained, trailer-mounted, portable wash and paint facility particularly useful to retrieve a grease disposal container having a removable lid, wash dirt and grease from the container, repaint the container, and return it to service. The facility contains an extendable boom and winch to handle the container and bring it into the facility. A vat agitated with compressed air is provided containing a heated caustic solution wherein lids are soaked as part of the cleaning process. A trolley mounted winch is provided which assists in removing the container lid and moving it to and from the soaking vat. A circulating high pressure wash system is provided for high pressure spraying of heated soapy cleaning solution. The cleaning system has a high-pressure washer and tank with a delivery hose and nozzle for the operator to employ when washing the grease container. The floor of the facility contains a grate where used cleaning solution is collected in a catch tank.
    Type: Grant
    Filed: August 12, 1998
    Date of Patent: October 17, 2000
    Inventor: Gene L. Kuschnereit
  • Patent number: 6074700
    Abstract: A method and apparatus for separating foreign material from coating mix flow circulating in the machine circulation of a coating station (7) in coaters used for coating a web of paper or board. Coating mix is conveyed from a tank (1) to a coating station, where it is applied to the surface of the web to be coated, and the excess of the coating mix conveyed to the coating station (7) is returned to the tank (1). The coating mix flow incoming from said tank (1) to the coating station is screened by at least one pressure screen (5) and the rejects fraction of the coating mix flow is discharged from the pressure screen (5). A portion of the coating mix flow circulating in the machine circulation is passed through a vibrating screen (13) and the accepts fraction of the vibrating screen is returned back to the machine circulation. The invention offers high efficiency in the removal of elongated foreign matter particles from the machine circulation of coating mix.
    Type: Grant
    Filed: November 12, 1998
    Date of Patent: June 13, 2000
    Assignee: Valmet-Raisio OY
    Inventor: Ilkka Roitto
  • Patent number: 6071345
    Abstract: An apparatus for coating a strip of liquid material such as a polymer adhesive onto the surface of a traveling web at adjustable cross-directional locations which includes a transfer roll secured to a drive shaft coupled hub by an asymmetric rim plate. A carrier sleeve is secured to the hub by anti-friction bearings for independent rotation about the axis of the drive shaft. A fountain housing is secured to the carrier sleeve. The fountain housing supports a fountain nozzle for pressurized discharge of a fluid onto the perimeter surface of the transfer roll within an evacuated cavity. The cavity perimeter around the fountain nozzle has a close, sealing proximity with the transfer roll surface. An adjustable doctor blade screeds excess liquid on the transfer roll surface into the evacuated cavity for removal by a vacuum system. The apparatus significantly reduces the emissions of volatile fluids to the atmosphere during the coating process.
    Type: Grant
    Filed: June 22, 1998
    Date of Patent: June 6, 2000
    Assignee: Bryce Corporation
    Inventor: Warner Hugh Stuart
  • Patent number: 6063439
    Abstract: A processing apparatus using solution comprises a rotary table which rotates while holding a substrate thereon, in the processing chamber provided in the casing, a supply mechanism for supplying a processing solution to a surface of the substrate held on the rotary table, and an impurity remover unit, provided outside the casing, wherein the impurity remover unit includes a cleaning unit for cleaning an object gas introduced from the inlet opening by brining it into contact with an impurity remover solution, and the gas-liquid separation mechanism for separating liquid from gas in an exhaust is provided in the exhaust system for exhausting the casing.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: May 16, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Norio Semba, Junichi Kitano, Takayuki Katano