Abstract: The invention provides a method and apparatus for coating a metal product wherein a molten coating is applied to a surface of said metal product and wherein part of said molten coating is wiped off said metal product by an air flow and a nitrogen gas flow.

Abstract: A substrate preparation system includes a proximity head configured to be positioned near a surface of the substrate to deliver a solution to the surface of the substrate. The proximity head includes a plurality of inlets for delivering the solution and a plurality of outlets for removing a portion of the solution from the surface of the substrate. The surface of the substrate maintains a remaining portion of the solution as a coherent film after the proximity head is scanned over the surface of the substrate. The coherent film is configured to be cured. The remaining portion of the solution acts on the surface of the substrate and binds particulates present on the surface of the substrate as the coherent film cures.

Abstract: A layered-object forming apparatus (1) includes a holding mechanism (10) that holds a base (12), a liquid applying device (20) that applies a liquid to a predetermined position from above the base, a powder applying device (30) that allows a powder to fall from above the base, and a powder removing device that removes an unconsolidated powder on the base. Then, a process of applying the liquid by the liquid applying device, subsequently applying the powder by the powder applying device, subsequently consolidating the liquid and the powder applied onto the liquid and then removing the powder that has not been consolidated with the liquid by the powder removing device is repeated, thereby forming a three-dimensional structure on the base. Thus, it is possible to produce a three-dimensional structure that at least partially has a smooth surface, thus allowing omission or simplification of a surface smoothing treatment.

Abstract: A method of producing an accurate critical dimension measurement comprises navigating to a critical dimension structure, performing a scanning electron microscope focusing, performing a final location alignment, acquiring waveform data, analyzing the data to determine an approximate critical dimension, analyzing the data to determine a stepper focus parameter, combining the stepper focus parameter with the critical dimension to generate an accurate critical dimension value, and reporting the same.

Abstract: A coating apparatus and coating method include a device for conveying an object to be coated; a coating device which is disposed in a vicinity of a conveyed surface of the object, and which discharges a coating liquid, and which forms a bridge of the liquid between the device and the object which is conveyed by the device for conveying an object to be coated, and which coats the liquid on at least one surface of the object; and a gas stream blowing device which, immediately after starting of coating, blows out a gas from a direction substantially opposite to a object conveying direction, toward a portion of the object where coating starts.

Abstract: To provide an apparatus and method of curtain coating for applying onto a running web a coating solution from a lip top in the form of curtain to form a coating thereon, wherein a fluid is blown to remove excessive deposits of the coating solution that are formed at the edges in the width direction of the coating, and the deposits blown away by the fluid are ejected.

Abstract: A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

Abstract: Disclosed herein is a coating system for pre-coating a vehicle chassis, comprising a coating station and a curing oven, the coating station being upstream from said curing oven along a travel path, the coating station to deliver a layer of coating material thereon, the chassis having a number of sites, each of which is known to be source for accumulating excess coating to cause unwanted drips thereof during curing, further comprising a plurality of nozzles, each being in a nozzle group of one or more, where each group is arranged to deliver a flow of air sufficient to remove the excess coating.

Abstract: A substrate processing system which sprays exposure process gas onto a substrate disposed within a chamber. The substrate processing system is used, for example, for performing an exposure process of an organic film formed on a substrate in a gas atmosphere obtained by vaporizing an organic solvent solution for dissolving and reflowing an organic film. The substrate processing system comprises: the chamber having at least one gas inlet and at least one gas outlets; a gas introducing means which introduces the exposure process gas into the chamber via the gas inlet; and a gas distributing means. The gas distributing means separates an inner space of the chamber into a first space into which the exposure process gas is introduced via the gas inlet and a second space in which the substrate is disposed.

Abstract: A coating apparatus is provided in which entrained air flow of an applicator roll and a web is removed and occurrences of misting and coating irregularity are suppressed to thereby realize a uniform coating liquid film and a uniform coating state. A coating apparatus includes an applicator roll arranged to abut on another roll so as to form a nip portion therebetween and to transfer a coating liquid to be coated on a surface of a web passing through the nip portion. The coating apparatus further includes a coater head provided on an upstream side of the nip portion in a rotational direction of the applicator roll so as to supply the coating liquid onto a surface of the applicator roll and a boundary air remover provided between the nip portion and the coater head on the upstream side of the nip portion so as to prevent air from entering the nip portion.

Abstract: An improved Wurster coater in which conditioned fluidizing gas, drawn through a coating chamber bowl from a plenum by a vacuum fan, is directed through a perforated gas distribution plate through one or more Wurster tubes. The perforated gas distribution plate defines three concentric gas flow zones: a central high-flow up-bed zone beneath the Wurster tube, a surrounding annular lower-flow down-bed zone, and an outer peripheral bypass zone defining a bypass cavity underlying the outer lower wall of the bowl. A controlled bypass flow of conditioned fluidizing gas is directed into the bypass zone, either around the edge of the distribution plate or through relatively larger holes in its plate's outer periphery, which causes that portion of the fluidizing gas to flow radially inward across the distribution plate, thereby sweeping particles away which would otherwise stagnate at the inner corners of the bowl due to low gas velocity in that region.

Abstract: An apparatus for fabricating a liquid crystal display panel includes a slit nozzle for applying a photo-resist liquid on a substrate, a nozzle driver for driving the slit nozzle, an air intake for inhaling air and/or impurities on the substrate through the slit nozzle before photo-resist is deposited on the substrate, and a gas supplier for supplying a gas through one or more channels in the slit nozzle to the substrate after the photo-resist is deposited on the substrate.

Abstract: Techniques for a cover layer with uniform thickness are disclosed. The cover layer is formed with a type of material, such as glue, in hardened form. In one embodiment, a certain amount of the material in liquid form is dispensed onto a dispensing structure. After the dispensing structure is engaged to hold a disc, the dispensing structure and the disc as a whole unit to be rotated at a predefined speed. The dispensed material on the dispensing structure is dispersed evenly onto the surface of the disc as result of the centrifugal force. A curing process (e.g., using UV lighting) is then engaged to harden the material near the edge of the disc to prevent the dispersed material from shrinking.

Abstract: A coating apparatus and coating method include a device for conveying an object to be coated; a coating device which is disposed in a vicinity of a conveyed surface of the object, and which discharges a coating liquid, and which forms a bridge of the liquid between the device and the object which is conveyed by the device for conveying an object to be coated, and which coats the liquid on at least one surface of the object; and a gas stream blowing device which, immediately after starting of coating, blows out a gas from a direction substantially opposite to a object conveying direction, toward a portion of the object where coating starts.

Abstract: A microcavity-forming system for making microcavities in a wire (especially a tungsten filament wire). The system has a coating station receiving the wire and applying a polymer coating to the wire. A mask-forming station receives the polymer-coated wire and blows moist air over it to form air bubbles which result in holes in the polymer coating, thereby creating a mask. An etching station receives the wire, as coated with the polymer mask, from the mask-forming station and etches the wire through the holes in the polymer mask to form microcavities in the wire. A stripping station receives the wire from the etching station and removes the polymer mask from the wire, leaving the wire with microcavities. Processes of forming microcavities in a wire and, more generally, of making an etching mask having arrays of holes and conforming to substantially any surface, including an arbitrary curved surface, are provided.

Abstract: In a method and apparatus for predicting process results of objects being processed in a processing chamber of a processing apparatus, operation data and process result data obtained at the time of processing each of the objects are collected and a multivariate analysis is performed on the basis of the collected operation data and process result data to obtain a first correlation therebetween. Process results are predicted on the basis of the first correlation. Weighting coefficients for the respective operation data are set on the basis of the predicted process results. A second correlation between the weighted operation data and the process result data is obtained by a multivariate analysis. Process results are predicted by using operation data, obtained when objects other than the objects used to obtain the second correlation are processed, on the basis of the second correlation.

Abstract: An apparatus and method for forming a microfiber coating includes directing a liquid solution toward a deposition surface. The apparatus includes a tube defining a volume through which the liquid solution travels. An electric field is applied between the origin of the liquid solution and the surface. A gas is injected into the tube to create a vortex flow within the tube. This vortex flow protects the deposition surface from entrainment of ambient air from the surrounding atmosphere.

Abstract: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.

Abstract: The present invention is a coating unit for coating a substrate with a coating solution, comprising a coating solution discharge member for discharging the coating solution to the substrate which is positioned in a downward part. A lower surface of the coating solution discharge member is in a shape having a length longer, at least, than the radius of the substrate and having a narrow width. A coating solution discharge port is disposed in a portion of the coating solution discharge member, facing the center of the substrate, while a solvent mist discharge port for discharging a solvent mist of the coating solution is disposed in a portion facing a peripheral portion including an outer edge potion of the substrate, when the coating solution discharge member is positioned above the radius of the substrate.

Abstract: A method of coating a photoconductive element for an electrophotographic image forming-apparatus and an apparatus therefore are disclosed. A plurality of cylindrical bodies are immersed in a bath, which stores a coating liquid, at the same time and then lifted out of the bath. As a result, a photoconductive film is formed on each cylindrical body.

Abstract: Device for cleaning a powder coating booth and powder coating booth with cleaning device. The device for cleaning a powder coating booth is provided with a first air distribution batten arranged on the floor of the powder coating booth. Also provided is a second air distribution batten arranged on a side of the powder coating booth and a suction channel with a suction slot for sucking excess powder out of the booth. The first and the second air distribution batten are provided in order to blow excess powder in the direction of the suction slot.

Abstract: The subject of the invention is a plant for the continuous dip-coating of a metal strip (1), of the type comprising a tank (11) containing a liquid metal bath (12), a duct (13) through which the metal strip (1) runs and the lower end (13a) of which duct (13) is extended by at least two internal walls (20; 22) each located on one side of the strip (1) and directed towards the surface of the metal bath (12) in order to form at least one compartment (21; 23) for recovering the metal oxide particles and intermetallic compound particles. The duct (13) has a fixed upper part (30) and a movable lower part (31) joined together by a deformable element (32) and means (35) for positioning the movable lower part (31) with respect to the metal strip (1).

Abstract: An aging unit (DAC) for processing a wafer W having a coated film formed thereon includes a disposing plate, a temperature control circulating device for controlling the temperature of the disposing plate, a chamber, a gas supply mechanism for supplying an ammonia gas containing a water vapor into the chamber, an input section for inputting the processing time of the wafer W, and a control device for controlling the temperature of the disposing plate, the supply rate of the ammonia gas, and the amount of the water vapor contained in the ammonia gas so as to permit the processing of the wafer W to be finished in the processing time inputted into the input section.

Abstract: A process tool, preferably a spin coater, includes a set of at least three arms and an adjustable rinse nozzle. The arms lift a substrate, e.g. a semiconductor wafer, from a chuck inside the process chamber after having performed the corresponding manufacturing step, e.g. coating. The contact area between the arms and the substrate is as small as possible. The rinse nozzle dispenses a solvent liquid onto the backside of the substrate, thereby removing contaminating particles located at the area of contact between the vacuum channels of the chuck and the substrate. The set of arms rotates for a homogeneous cleaning. A gas flowing out of vacuum ports of the chuck prevents the vacuum ports from being obstructed with particles. While the substrate is being lifted, the chuck can also be cleaned by dispensing the solvent liquid onto the chuck.

Abstract: A method and apparatus is disclosed for gravure coating a liquid reactive with the atmosphere onto a web. The gravure apparatus comprises an engraved gravure cylinder, an impression roller backing the web and pressing it onto the gravure cylinder to form a nip, a curtain or jet formation means to wet the surface of the gravure cylinder, and a doctor blade means for wiping excess coating liquid from the surface of the gravure cylinder prior to the nip. A shroud encompassing the gravure cylinder and the curtain or jet formation means creates a first zone between the nip and a partitioning baffle extending from the shroud, a second zone between the partitioning baffle and the doctor blade means, and a third zone between the doctor blade means and the nip. A gas non-reactive with the coating liquid is supplied to each zone by a gas distribution means such that the reaction rate of the coating liquid with the atmosphere is greatly reduced and the curtain or jet is not disrupted.

Abstract: A method of coating a photoconductive element for an electrophotographic image forming apparatus and an apparatus therefore are disclosed. A plurality of cylindrical bodies are immersed in a bath, which stores a coating liquid, at the same time and then lifted out of the bath. As a result, a photoconductive film is formed on each cylindrical body.

Abstract: A gas wiping nozzle for a wire coating apparatus includes an inlet portion defining a converging inlet passage for a coated wire that is axially drawn through the gas wiping nozzle. A wiping portion is further included and defines a wiping passage for the coated wire, downstream and in an axial extension of the inlet passage. The wiping portion has a gas outlet surrounding the wiping passage for blowing wiping gas onto the coated wire. A protruding annular lip is arranged between the converging inlet passage and the wiping passage, and the annular lip defining a passage for the coated wire that is narrower than the wiping passage so that the gas outlet means in the wiping passage is protected by the protruding annular lip against direct contact with the coated wire which is axially drawn through the passages of the wiping gas.

Abstract: A method and an apparatus for coating metal strip, particularly cold-rolled steel strip, with a coating metal which is in the molten state. The metal strip is heated and annealed in a heating furnace and subsequently the required strip temperature and surface properties are adjusted in a cooling zone. The strip is conducted through a coating container and, following the coating container in strip pulling direction, the coating metal thickness and the solidification process are controlled by a gas-operated stripping device. The operating gas for the stripping device is preheated in a partial area of the cooling zone of the heating furnace.

Abstract: The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.

Abstract: A printing device for digital printing on a print medium is comprised of a wheel rotatable by a motor, a liquid dispenser for depositing a quantity of liquid on the wheel along the outer edge, and an air jet positioned adjacent the outer edge for removing the liquid from the outer edge and directing the liquid toward the print medium as the wheel rotates through the air jet. The outer edge includes a plurality of teeth transport the paint from the dispenser to the air jet. An electronically controlled motor is used to selectively rotate the wheel through the air jet thereby removing a desired amount of liquid from the wheel. The liquid is transported by the air jet toward the print medium. By employing a plurality of such printing devices, a full color digital image can be reproduced on any print medium.

Abstract: Gas wiping apparatus and method can reliably prevent edge overcoat and splash, and has face gas wiping nozzles extending widthwise of a strip material, a pair of baffle plates spaced from an edge of the strip material, an edge wiping nozzle disposed between baffle plates at its inner edge and adjacent the strip material edge, all with critical spacing relative to each other.

Abstract: A curtain coater and a curtain-coating method for coating a moving web of paper or board are described. The curtain coater has an applicator nozzle for applying a coating mix to the surface of the web in the form of a continuous curtain extending uniformly over the cross-machine width of the web. In one aspect, a doctoring means located upstream (in terms of the direction of travel of the web) from the applicator nozzle substantially removes the air boundary layer traveling on the surface of the web. In another aspect, the doctoring means comprises a suction nozzle for removing the air boundary layer. In yet another aspect, a gas nozzle located downstream from the applicator nozzle sprays gas on the coating curtain in order to help apply the coating mix to the surface of the web.

Abstract: A multi-nozzle gas spray arm for a spin coating apparatus. In a typical embodiment, the invention comprises a primary spray arm and a secondary spray arm which is confluently connected to the primary spray arm. The primary spray arm ejects a narrow, relatively high-velocity nitrogen stream against a substrate while the secondary spray arm ejects a diffuse, relatively low-velocity nitrogen stream against the substrate as the gas spray arm is typically swept across the surface of the wafer. The diffuse nitrogen flow characteristic of the nitrogen ejected from the secondary spray arm is effective in eliminating water and chemical droplets which otherwise would tend to remain and form dry spots on the wafer surface.

Abstract: An air unit for the removal of excess particulate coating material that is present on products which are in a coating machine comprises, for blowing surplus particulate material off the products, at least one suction member for drawing off air, with particulate material present therein, from the coating machine, separating means for removing particulate material from the air drawn off, and circulating means for feeding at least a portion of the air drawn off to the blowing member.

Abstract: An apparatus for processing a workpiece in a micro-environment includes a workpiece housing connected to a motor for rotation. The workpiece housing forms a processing chamber where one or more processing fluids are distributed across at least one face of the workpiece by centrifugal force generated during rotation of the housing. An array of workpiece housings are contained within an enclosure. A robot moves workpieces into and out of the workpiece housings.

Abstract: A spin chuck for holding a wafer to the front face of which a resist solution is supplied, a cup for housing the spin chuck and forcibly exhausting an atmosphere around the wafer by exhaust from the bottom thereof, and an air flow control plate, provided in the cup to surround the outer periphery of the wafer, for controlling an air flow in the vicinity of the wafer are provided. Accordingly, a state of special air flow at an outer edge portion of a substrate to be processed can be eliminated, thereby preventing an increase in film thickness at the outer edge portion.

Abstract: A blast unit for sending air from the top of a processing chamber to the bottom thereof and an exhaust pipe for exhausting gas from the bottom of the processing chamber are provided. Concomitantly with a change in pressure in the processing chamber, intervals of a slit damper and/or the degree of opening of a damper is controlled by a controller and thus a blast amount or an exhaust amount is controlled, thereby maintaining the pressure in the processing chamber almost constant.

Abstract: A closed container composed of a lid body and a lower container are provided in a cover body, and a supply pipe for nitrogen gas is connected to the cover body. A light source unit including UV lamps in the lid body is provided to face a mounting table in the closed container, and a gas supply path for HMDS gas is provided on the outer side from the light source unit. The inside of the cover body is first brought to a nitrogen atmosphere, a wafer is irradiated with ultraviolet rays with the lid body of the closed container opened to perform cleaning. Subsequently, the lid body is closed and the HMDS gas is introduced into the closed container to perform hydrophobic processing for the wafer. This removes deposits such as organic substances adhering to the wafer W through the irradiation with the ultraviolet rays, thereby improving coating properties of a resist solution.

Abstract: A method and system are provided for controlling and/or monitoring a semiconductor processing apparatus while predicting its processing results.

Abstract: The present invention includes a filtered mask enclosure having an exterior portion and interior regions within the exterior portion such that the interior regions have a filtering region and a purging region connected to the filtering region. The present invention further includes a method of removing a first contaminant in a gas phase, a second contaminant in a solid phase, and a third contaminant having an electrical charge from a purge gas and flowing the purge gas through a vicinity of a mask while exposing a wafer with light through the mask.

Abstract: The present invention includes a current plate which is arranged above a substrate in a chamber. A pressure inside the chamber is reduced by exhaust means and drying processing is performed on, for example, a coating solution on the substrate. On a peripheral portion of an underneath surface of the current plate, formed is a ring-shaped protrusion corresponding to a peripheral portion of the substrate. A protruding portion of a coating solution at the peripheral portion of the substrate is made flat by air current generated when the pressure is reduced, and consequently a coating film with a uniform film thickness as a whole is formed on the substrate.

Abstract: A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.

Abstract: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing a substrate, a spin chuck for rotating the substrate in the rotating cup, a lid body having an opening and attached to the rotating cup, a resist solution discharge nozzle for discharging a resist solution onto the substrate through the opening of the lid body, a small lid for blocking up the opening of the lid body, and a protrusion member provided on the underneath surface of the small lid to be positioned inside the rotating cup when the small lid is attached into the opening of the lid body. Thus, adjustment of a film thickness of a coating film after a coating solution is coated can be effectively performed.

Abstract: An apparatus for coating paperboard comprising a flame treater, a heater, a coater for applying a thin coating of a water-dispersible polymer, a dryer, and a cooler with an air curtain to keep the heat confined to the hot end of the apparatus.

Abstract: Disclosed herein is a coating system for pre-coating a vehicle chassis, comprising a coating station and a curing oven, the coating station being upstream from said curing oven along a travel path, the coating station to deliver a layer of coating material thereon, the chassis having a number of sites, each of which is known to be source for accumulating excess coating to cause unwanted drips thereof during curing, further comprising a plurality of nozzles, each being in a nozzle group of one or more, where each group is arranged to deliver a flow of air sufficient to remove the excess coating.

Abstract: A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.

Abstract: A spin chuck for holding a wafer to the front face of which a resist solution is supplied, a cup for housing the spin chuck and forcibly exhausting an atmosphere around the wafer by exhaust from the bottom thereof, and an air flow control plate, provided in the cup to surround the outer periphery of the wafer, for controlling an air flow in the vicinity of the wafer are provided. Accordingly, a state of a special air flow at an outer edge portion of a substrate to be processed can be eliminated, thereby preventing an increase in film thickness at the outer edge portion.

Abstract: A gumming applicator (1) rotatable about a central axis (A) is cleaned by a device (4) comprising a nozzle (13) connected to a source (11) of pressurized fluid (50) and calibrated so as to deliver an atomized jet (14) which is directed at the gumming applicator (1) to the end of removing residues (60) of the gumming adhesive (2) from the applicator (1); the nozzle (13) is also capable of movement in a direction (D) parallel with the axis (A) of rotation of the applicator (1).

Abstract: A device for application of coating powder in a process including a conveyor with an air permeable conveyor surface for conveying a base sheet in a direction of travel, wherein the base sheet is coated with at least one layer upstream of the conveyor, and a powder-applying device, arranged to apply coating powder onto the base sheet. A device for directing a jet of air towards the base sheet is also arranged downstream of the powder applying device such that the jet of air effectively removes any excess coating powder from the base sheet. A suction device is also arranged to create an under-pressure beneath the conveyor surface, causing the base sheet to be pulled towards the conveyor surface, and forcing the excess coating powder to pass through the conveyor surface.

Abstract: A flow diversion device is provided for use in a gas jet stripping apparatus and includes a baffle having a first portion which, in use, extends longitudinally of the moving strip which is being subjected to the stripping action of the jet stripping nozzles of gas jet stripping apparatus. The baffle further includes a second portion which diverges away from the moving strip and a gas outlet for providing gas to the strip side of the baffle. The baffle also has gas collection vanes for redirecting gas from the stripping nozzles to the gas outlet.