Abstract: Described herein is a technique capable of reducing an amount of moisture in a low temperature region in a substrate processing apparatus provided with a transfer chamber. According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber provided with a heater; a load lock chamber; a transfer chamber provided between the process chamber and the load lock chamber and including a first region provided adjacent to the process chamber and a second region provided more adjacent to the load lock chamber than the first region and whose temperature is lower than a temperature of the first region; a detector capable of detecting an amount of moisture in the transfer chamber; and an inert gas supplier capable of supplying an inert gas toward the second region in the transfer chamber.

Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

Abstract: A mixing apparatus is configured to efficiently input noodles coated with an additive to a receiving tray, with no need to perform weighing again after the noodles are input to the receiving tray. The mixing apparatus includes at least two hoppers that each house falling noodles and that allows the noodles to fall through rotation of the hoppers. A supply device supplies a sauce to the noodles in the hoppers, and the two hoppers are spaced from one another in the falling direction.

Abstract: A side surface unit of a heat treatment space S is formed by a shutter member 250 including an outer shutter 260 and an inner shutter 270. Supply air A is supplied as a horizontal laminar flow toward a wafer W from a lower end side of the shutter member 250, that is, from a gap d1 located on the level with the wafer W placed on a heat plate 211 of a mounting table 210. Supply air B is supplied into the heat treatment space S from an upper end side of the shutter member 250, that is, from a gap d2 positioned higher than the wafer W. A ratio between a flow rate of the supply air A and a flow rate of the supply air B is 4:1.

Abstract: A double-sided coating device includes: a conveying mechanism for a base material that includes a first surface and a second surface; a first die that applies a first coating material onto the first surface; and a second die that applies a second coating material onto the second surface. The conveying mechanism includes: a roll that conveys the base material, in which the position at which the base material separates from the circumferential surface is higher than a target coating height of the base material; and a drawing section that draws the base material such as to bring the base material closer to the target coating height.

Abstract: In substrate processing, by supplying a first processing liquid onto an upper surface 91 of a substrate 9 held in a horizontal state, a liquid film 81 of the first processing liquid which entirely covers the upper surface 91 is formed. Further, by heating the substrate 9, a vapor layer 82 of the first processing liquid is formed between the upper surface 91 and the liquid film 81 of the first processing liquid on the upper surface 91. Then, by supplying a second processing liquid onto the upper surface 91 of the substrate 9, the liquid film 81 of the first processing liquid is removed from the upper surface 91. It is thereby possible to appropriately remove extraneous matters 89 from the upper surface 91 of the substrate 9, which are taken in the liquid film 81 of the first processing liquid as the vapor layer 82 is formed.

Abstract: The present disclosure provides Lazarev reactor that sustains reaction of two dimensional polymerization on the interface of two immiscible solutions A and B carrying components of reaction to the interface where reaction takes place and produces film of two dimensional polymer layers that are pulled out of reactor and rolled up on roll after drying excess of solvent out.

Abstract: A steel part includes a steel sheet substrate and a coating on at least one surface of the steel sheet substrate. The coating includes between 0.2 and 0.7% by weight of Al, with a remainder of the metal coating being Zn and inevitable impurities. The steel sheet substrate and the coating have at least one deformation. An outer surface of the coating has a waviness Wa0.8 of less than or equal to 0.43 ?m.

Abstract: A three-dimensional shaping system includes a first table provided with a first positioning mechanism, a first shaping machine configured to shape a first shaped object on the first table, a first cutting machine provided with a first mounting portion having a second positioning mechanism and configured to cut the first shaped object, a conveying machine configured to convey the first table between the first shaping machine and the first cutting machine, and a control unit configured to control the first shaping machine, the first cutting machine, and the conveying machine. The control unit controls the first shaping machine to shape the first shaped object, controls the conveying machine to convey the first table from the first shaping machine to the first cutting machine so that the first and second positioning mechanisms engage with each other, and controls the first cutting machine to cut the first shaped object.

Abstract: Embodiments of the present disclosure generally relate to apparatuses for reducing particle contamination on substrates in a plasma processing chamber. In one or more embodiments, an edge ring is provided and includes a top surface, a bottom surface opposite the top surface and extending radially outward, an outer vertical wall extending between and connected to the top surface and the bottom surface, an inner vertical wall opposite the outer vertical wall, an inner lip extending radially inward from the inner vertical wall, and an inner step disposed between and connected to the inner wall and the bottom surface. During processing, the edge ring shifts the high plasma density zone away from the edge area of the substrate to avoid depositing particles on the substrate when the plasma is de-energized.

Abstract: Disclosed is a method for processing a substrate, comprising a liquid processing step of performing liquid processing on the substrate by supplying a processing liquid onto the substrate in a liquid processing chamber, a transfer step of transferring the substrate from the liquid processing chamber to a drying chamber, and a drying step of drying the substrate in the drying chamber. In the drying step, the substrate is dried while an edge region of the substrate other than a central region of the substrate is supported by a support unit, and in the liquid processing step, the liquid processing is performed on the substrate such that a height of the processing liquid remaining on the edge region of the substrate is greater than a height of the processing liquid remaining on the central region of the substrate when the liquid processing is completed in the liquid processing chamber.

Abstract: To provide a preparative thin layer chromatography method capable of acquiring a target spot efficiently using a simple and convenient method without the possibility of decomposition of a component in a spot. The preparative thin layer chromatography method is a preparative method for dispensing a spot from a thin layer chromatography plate and includes a process 1 that forms a groove by removing the carrier at the circumferential edge of a spot to be dispensed, a process 2 that inserts a nozzle having a packing part at the tip thereof into the groove formed in the process 1, a process 3 that discharges a solvent through the nozzle, and a process 4 that sucks the solvent in which a spot component has been dissolved.

Abstract: The coating device has a rotatable spindle which has fastening mechanisms for fastening a rotation axle to the spindle. Protrusions are radially protruding from the spindle for spreading the coating substance on the inner surface of a pipe. The protrusions have limiters that limit the coating substance to be spread to the desired layer thickness. The method comprises the steps of bringing, to the pipe to be treated, the coating device fastened to a rotation axle with the pipe, a feeding hose of the coating substance and a camera. The coating substance is fed along the feeding hose to a vicinity of the coating device. The coating substance is spread to an inner surface of the pipe by rotating the coating device and by moving the coating device in a longitudinal direction of the pipe.

Abstract: A paint removal apparatus for cleaning paint from masking devices includes a support base having a plurality of engagement features that are each configured to securely engage at least one paint masking device. A spray nozzle is aimed in a fixed direction toward the support base and configured for spraying a pressurized stream of water at a desired velocity that removes paint from an exterior surface of at least one of the masking devices engaged at the support base. The support base is configured to successively move the masking devices engaged at the engagement features into the pressurized stream of water, such as to provide a generally continuous cleaning operation of masking devices. During movement or rotation of the support base, an exposed portion of the support base may extend from a spray enclosure for removing cleaned plugs from and loading painted plugs onto such an exposed portion.

Abstract: A drying apparatus includes a heating mechanism configured to heat an inside of a drying oven in which paint applied to a workpiece is dried. The inside of the drying oven is partitioned into an upper region and a lower region by a partition plate. The drying oven has an air passage that enables air to flow between the upper region and the lower region. A metal member to which paint is applied is conveyed into the upper region, and a resin member to which paint is applied is conveyed into the lower region.

Abstract: Apparatus for coating a pipe. The apparatus includes a first frame to be mounted on a pipe and a second frame rotatably mounted on the first frame. An induction heating coil comprised of electrical conductors is mounted on the apparatus. A coating applicator is mounted on the second frame and is arranged to apply coating onto a surface of the pipe on which the apparatus is mounted. The first frame, second frame and coating applicator are arranged such that when the apparatus is mounted on the pipe, the applicator is disposed to one side of the induction heating coil and able to apply coating to a surface of the pipe alongside the surface of the pipe underlying the induction heating coil. The first frame may be operable between an open state in which the frame may be placed over and removed from a pipe and a closed state in which the frame may capture a pipe thereby to mount the apparatus on the pipe.

Abstract: A field testing device is provided for quantitating psychoactive components of marijuana such as THC in biological fluids such as saliva. Such a device may include an HPTLC plate for separating interferents from THC and may also include fluorometric components for quantitating THC. The device may include a microprocessor adapted to relate fluorescent intensity to analyte concentration through one or more calibration curves. Devices may optionally include microfluidics for carrying out HPTLC on biological samples including sample reservoirs, reagent reservoirs, micro-pumps, mixers, and the like.

Abstract: A paint baking oven is for a vehicle body that includes a body exterior part and a narrow portion. The paint baking oven bakes a wet coating film applied to a coated surface of the narrow portion. The paint baking oven includes a heat source, such as an infrared heater, a halogen heater, an induction heater, or a hot air generator, configured to give heat energy primarily to the coated surface of the narrow portion and a heat source mover configured to move the heat source toward and away from the narrow portion.

Abstract: A paint baking oven bakes a wet coating film applied to a vehicle body while conveying the vehicle body. The vehicle body has a main shell body to which side doors are attached via hinges. The topcoat paint baking oven includes a oven body and a hot air supplier that supplies hot air into the oven body. The oven body is configured to include a first oven body and a second oven body. The first oven body has a side-to-side width corresponding to a body width of the vehicle body in a state of closing the side doors. The second oven body has a width wider than the side-to-side width of the first oven body. The width of the second oven body corresponds to a body width of the vehicle body in a state of opening the side doors.

Abstract: A systems and method for reducing coating defects on a stent may involve a support apparatus comprising wire cage for carrying a stent. The support apparatus may have no structure that extends inside the stent. A support apparatus may include a plurality of wires that pass through the stent but do not pass through the midplane of the stent. A support apparatus may contact only the proximal ends of the stent. The method may involve keeping the stent in motion during a spray coating process to prevent the stent from having a point remain in continuous contact with a support apparatus.

Abstract: An automated process is provided for debundling carbon fiber tow that includes feeding a carbon fiber tow into a chopper. The carbon fiber tow is cut to form lengths of chopped tow portions. The lengths of chopped tow portions are distributed on a moving conveyor. The lengths of chopped tow portions are exposed to a first plasma discharge from a first plasma source on the moving conveyor to create debundled carbon fibers. Alternatively, the carbon fiber tow is exposed to the first plasma discharge prior to being cut into lengths. A system for applying chopped fibers to a sheet of molding compound includes a chopper for cutting a carbon fiber tow into lengths of chopped tow portions. A conveyor belt receives the lengths of chopped tow portions. At least one plasma generating source is arrayed across of the conveyor.

Abstract: A chamber includes a sidewall, a cooling pipe, and an external pipe. The cooling pipe includes a first segment extending along the sidewall of the chamber, and includes multiple purge nozzles. The external pipe extends to inside the chamber and is connected to the first segment of the cooling pipe. A semiconductor processing station includes a central transfer chamber, a load lock chamber, and a cooling stage. The load lock chamber and the cooling stage are disposed adjacent to the central transfer chamber. The load lock chamber is adapted to contain a wafer carrier having multiple wafers. The central transfer chamber communicates between the cooling stage and the load lock chamber to transfer a wafer between the cooling stage and the load lock chamber. A semiconductor process using the semiconductor processing station is also provided.

Abstract: A drying device for drying coated, elongated work pieces in a continuous process including a transport device for transporting the work piece. For drying an edge or surface of the work piece, heat sources are arranged in a drying chamber. In a drying zone, drying vapor is generated during drying. The vapor is removed by an airflow. The airflow is supplied via a supply channel and fans. A controller is provided to control the fans.

Abstract: A coating device for coating an inside of a hollow body with an atomized fluid has at least one atomizing tube enclosing an atomizing channel. A pressurized propellant gas for atomizing an unatomized fluid can be introduced into the atomizing tube. The atomizing tube has at least one outlet opening and further has at least one hollow needle having a discharge opening for the unatomized fluid. The at least one hollow needle interacts with the atomizing channel and is arranged essentially coaxially thereto. The atomizing tube and the hollow needle form a Venturi arrangement.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

Abstract: Apparatus and method for applying a water-based emulsion of silicone fluid to a printed web required to be cooled, such that evaporative cooling of the web is promoted in addition to coating of said web with a silicone material. Water evaporated following the application of the silicone fluid to the web is recovered by condensation on the applicator(s) and reapplied to the web, thus economizing the amount of silicone fluid mixture necessary to provide both cooling and enhanced slip characteristics necessary for further handling and processing of the web. The condensation step is effected by containing the evaporated water from the web within a compact enclosure enveloping both the applicator(s) and the web, and optionally chilling said applicator(s) with a cooling medium, preferably water, by means of said cooling medium flowing through at least one of the applicators.

Abstract: An apparatus and method for treating subject materials with compositions includes a material treatment section for treating a subject material with a composition of a silane-containing material and a hydrocarbon solvent to form a treated material, and a neutralizing section for neutralizing the treated material such that the treated material has a pH in a range of approximately 7 to approximately 8.

Abstract: An apparatus for a plating process includes: an outer chamber; an inner chamber covered by the outer chamber; a rotatable holding mechanism configured to hold a substrate horizontally and installed in the inner chamber; a fluid supply unit configured to supply a plating solution to a preset position on the substrate; a gas supply device configured to generate a nonreactive gas and control a temperature of the nonreactive gas; a gas supply hole configured to supply the nonreactive gas into the outer chamber and provided in a top surface of the outer chamber; a plurality of gas inlet openings provided at a sidewall of the inner chamber and spaced apart at equal distances; and a rectifying plate disposed above the substrate and below the plurality of gas inlet openings inside the inner chamber, the rectifying plate having a plurality of rectifying holes uniformly disposed in the rectifying plate.

Abstract: A cap metal forming method capable of obtaining a uniform film thickness on the entire surface of a substrate is provided. A method for forming a cap metal on a processing surface of a substrate provided with two or more regions having different water-repellent properties, includes: holding the substrate horizontally by a rotatable holding mechanism installed in an inner chamber; supplying a gas between the inner chamber and an outer chamber covering the inner chamber via a gas supply hole provided in a top surface of the outer chamber; forming a pressure gradient between the inner chamber and the outer chamber; and supplying a plating solution to a preset position on the processing surface of the substrate after a pressure of the gas inside the inner chamber reaches a preset value so as to form the cap metal on at least one of the regions.

Abstract: To obtain a circulation-type blasting device which enables stable processing for a long period of time even in a case that an elastic abrasive of which abrasive grains are attached to a surface of an elastic core are used. A circulation-type blasting device is provided with a device for recycling an elastic abrasive for recycling all or a part of elastic abrasive used in a cyclic way, and the device for recycling the elastic abrasive is provided with a mixing unit for mixing recovered abrasives recovered from an abrasive recovery unit and abrasive grains introduced from an abrasive grain supplying unit in a gas flow by introducing the abrasive grains and the recovered abrasive in the gas flow to generate a solid-gas biphase flow, and a combining unit composed of at least one bent space to which the solid-gas biphase flow is introduced.

Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

Abstract: Methods of pressure coating a target surface of an article comprising one or more grooves formed in an outer surface of an article include fluidly connecting a pressure masker comprising a pressurized masking fluid to one or more coolant supply holes on a first side of the article. The one or more coolant supply holes in fluidic communication with the one or more grooves. Passing the pressurized masking fluid through the one or more grooves from the first side to a second side comprising the target surface at a pressure less than the coating pressure of the coating material, and, coating the target surface with the coating material to allow the coating material to bridge over the one or more grooves and form one or more micro-channels. The pressurized masking fluid passing through the one or more grooves prevents the coating material from permanently altering a cross sectional area of the one or more grooves along its length.

Abstract: The invention relates to a device for manufacturing hot-mix coated materials, e.g. materials coated with bitumen, the device comprising: an oven (1) comprising an enclosure (2) provided towards its two opposite ends with a main inlet (3) designed to receive granular materials and with a main outlet; and heater means (10) defining a combustion section (5) inside the enclosure (2), said enclosure (2) starting with said combustion section (5) and continuing with a drying section (6), and then with a mixing section (7); the device being characterized in that it is provided with a bypass outlet (11) and with an external mixer (12) that is connected to said bypass outlet (11), which outlet is fitted with a blocking system (15) allowing granular materials to pass towards the inlet (13) of the external mixer (12) and a closed position allowing granular materials to pass towards the mixing section (7).

Abstract: A relief print master is created by a printhead that moves in a slow scan direction. The nozzles of the printhead jet droplets of a polymerisable liquid on a rotating drum. The different nozzles jet droplets simultaneously on different layers that have different diameters. As a result, the droplets jetted by different nozzles travel over different distances before landing. The effect of this is that the droplets undergo different position lag as they land on the different layers. By rotating the printhead in a plane that is orthogonal to the jetting direction this effect can be compensated for.

Abstract: The invention relates to a process for producing a rolling bearing cage, in particular for large rolling bearings, wherein a steel strip with openings for in each case one rolling body is provided and bent to form a ring, wherein, for thermal coating with a thermoplastic powder, the ring is then heated to a temperature above a minimum coating temperature, wherein the ring is then dipped into a fluidized bed comprising the thermoplastic powder, wherein, during the residence time of the ring in the fluidized bed, plastic powder adheres to the ring, melts and forms a continuous coating, and wherein the ring is removed from the fluidized bed after the coating. The invention also relates to an apparatus for carrying out the process.

Abstract: An apparatus and method for the application of an aqueous treatment solution onto the surface of a steel strip that is moved, at a prespecified strip speed, in a direction of movement of the strip, with the following steps: drying of the moving steel strip with a gas flow; application of the aqueous solution on at least one surface of the steel strip with a rotary sprayer with several spray rotors that are situated next to one another, transverse to the direction of movement of the strip, to which the aqueous treatment solution is supplied and which are rotated by a drive, so as to spray the treatment solution, as a result of centrifugal force, in the form of a spray jet, onto the surface of the steel strip and, there, to form a wet film of the aqueous treatment solution; equalization of the applied wet film of the aqueous treatment solution by driven smoothing rollers; and drying of the applied wet film of the aqueous treatment solution.

Abstract: This disclosure relates to a thermal spray coating system including a table that is configured to support a component. A spray torch is configured to direct a thermal spray at a component surface. A cooling device is arranged adjacent to spray torch and configured to be in close proximity to the component surface. The cooling device includes a manifold that is connected to an air supply. The manifold has a face with multiple impingement holes less than one-eighth inch (3.1 mm) in diameter that are configured to direct cooling air on the component surface. In one example, the diameter of the impingement holes is approximately 0.059 inch (1.5 mm) and provide cooling air at a velocity of at least 400 ft per second (122 meters per second). The face is arranged within one inch (25 mm) of the component surface, in one example. Accordingly, the above cooling device uses less air and yields more consistent results in thermal coating of the component.

Abstract: A method includes holding bonded wafers by a wafer holding module. A gap between the bonded wafers along an edge is filled with a protection material.

Abstract: The invention relates to a device for applying preferably liquid flavorings (15), in particular menthol, to a medium (16), wherein flavoring (15) is supplyable from a (storage or processing) container (10) to an applicator unit (14) via at least one conduit (11, 13). The invention is characterized in that the applicator unit (14) has a controllable valve for the application of flavoring (15) to the medium (16).

Abstract: The present invention is a method for manufacturing a solid oxide fuel cell apparatus for generating electricity by supplying fuel and oxidant gas to fuel cells housed in a fuel cell module, comprising: an adhesive application step for applying ceramic adhesive to the joint portions of constituent members so that the flow path carrying fuel or oxidant gas inside the fuel cell module are formed in an airtight manner; a workable hardening step for hardening the applied ceramic adhesive to a state capable of implementing the next manufacturing process; and a solvent elimination and hardening step wherein, after multiple repetitions of the adhesive application step and the workable hardening step, ceramic adhesive hardened in the workable hardening steps is dried to a state capable of withstanding temperatures during electrical generation.

Abstract: A system or apparatus for forming a conductive pattern on a substrate (208) includes a thermal imaging head (220) that forms an image pattern on the substrate. A functional material (240) spraying element (224) applies a functional material on the substrate which bonds with the image pattern. The spraying element is integrated in the thermal imaging head. An electro-less deposition element is applied using the electro-less deposition element on the substrate to enhance the functionality of the final product.

Abstract: A method and apparatus for coating catheters or balloon catheters is disclosed in which the catheter or balloon catheter is radially surrounded completely or almost completely at a constant distance by a device that applies a coating solution so that the coating solution completely fills the space between the catheter or balloon catheter and the device and thus completely surrounds the catheter or balloon catheter, relative motion is effected between the device and the catheter or balloon catheter in the axial direction across the surface of the catheter or balloon catheter multiple times, and partial drying of the applied coating solution occurs between the individual coating stages.

Abstract: A plating apparatus 20 includes a substrate holding device 110 configured to hold a substrate W; a discharging device 21 configured to discharge a plating liquid 35 toward the substrate W held by the substrate holding device 110; and a plating liquid supplying device 30 connected to the discharging device 21 and configured to supply the plating liquid 35 to the discharging device 21. A gas supplying device 170 is configured to heat a heating gas G having a higher specific heat capacity than air and supply the heated heating gas G toward the substrate W held by the substrate holding device 110. Further, a controller 160 is configured to control at least the discharging device 21, the plating liquid supplying device 30, and the gas supplying device 170.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.

Abstract: A coating device for coating a medical device with a drug-eluting material uses an in-process drying station between coats to improve a drug release profile. The drying station includes a heat nozzle configured for applying a uniform drying gas.

Abstract: A fluid bed granulation process of a predetermined substance comprises the steps of: forming, through a fluidification, air flow of predetermined flow rate, a fluid bed of granules of said substance to be granulated fed to it in the form of seeds,—feeding said fluid bed with a continuous flow of a growth substance (or liquid).

Abstract: Described herein are methods and systems for the manufacture of composite articles, wherein a composite article is manufactured using a filamentary material and a liner, comprising: providing a material in heat transfer relation with the inner surface of said liner; applying uncured filamentary material to the outer surface of said liner; and heating a portion of said material in heat transfer relation with the inner surface of said liner, wherein heating said portion of said material effects cure of said composite article. Also in the methods and systems herein, a composite article is manufactured using a filamentary material wound on a liner, comprising, a material in heat transfer relation with the inner surface of said liner; heating means operable to heat a portion of said material in heat transfer relation with the inner surface of said liner, wherein heating said portion of said material effects cure of said composite vessel.

Abstract: A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.

Abstract: Disclosed is a method for producing a coated substrate using a compact, easy to handle and automated coating apparatus that can prepare coated composite in a single batch process, with sufficient control over each portion of the coating apparatus. The coating apparatus may include a coating unit, a drying unit and a pressing unit sequentially arranged in a single line to produce the coated substrate.