Abstract: An apparatus (10, 300, 400) for cleaning spray guns (18, 418) has a closed vessel (14) having an inlet (24, 424), a drain (22, 422) and a port (29) for receiving a nozzle (30) of a spray gun. A spray impeller (36, 136, 236, 336, 436) is rotatably mounted within the vessel (14) and in fluid communication with the inlet (24, 424). The spray impeller (36, 136, 236, 336, 436) has an offset cleaning nozzle (42, 44, 144, 141, 142, 242, 244, 442, 444) for projecting a cleaning spray towards the port (29) and a rotational nozzle (46, 48, 148, 246, 248, 446, 448) for projecting a rotational spray to effect rotation of the spray impeller (36, 136, 236, 336, 436). The port (29) has a seal (76, 78, 80) for sealingly receiving the spray gun (18, 418) and positioning the nozzle (30) of the spray gun in the cleaning spray.

Abstract: A robot main unit comprises a linear movement arm (3) on a column (2) fixed onto an installation surface 1, first and second rotating arms (4, 5), a tool attachment section (6a) and an arm-to-arm coupling member (13), and the like. The coupling member (13) is designed to have a sufficient interval (13a) between the arms, thereby preventing accumulation of foreign matter and making washing easier. Piping and wiring members (7) for the working tool (6b) are passed through the interior of the robot main unit, thereby increasing ease of washing in the region from the third axis onwards, where fragments of foodstuffs, and the like, are liable to become attached to the robot.

Abstract: An apparatus (10, 300, 400) for cleaning spray guns (18, 418) has a closed vessel (14) having an inlet (24, 424), a drain (22, 422) and a port (29) for receiving a nozzle (30) of a spray gun. A spray impeller (36, 136, 236, 336, 436) is rotatably mounted within the vessel (14) and in fluid communication with the inlet (24, 424). The spray impeller (36, 136, 236, 336, 436) has an offset cleaning nozzle (42, 44, 144, 141, 142, 242, 244, 442, 444) for projecting a cleaning spray towards the port (29) and a rotational nozzle (46, 48, 148, 246, 248, 446, 448) for projecting a rotational spray to effect rotation of the spray impeller (36, 136, 236, 336, 436). The port (29) has a seal (76, 78, 80) for sealingly receiving the spray gun (18, 418) and positioning the nozzle (30) of the spray gun in the cleaning spray.

Abstract: It is an object of the present invention to provide a cleaning method of and a cleaning apparatus for removing organic matters such as phthalates that have deposited on the surface of a semiconductor substrate while restraining the growth of a natural oxide film. The present invention provides a method of cleaning a semiconductor substrate, which comprises irradiating a semiconductor substrate contaminated by organic matters such as phthalic acid, phthalate and derivatives thereof with vacuum ultraviolet light having a wavelength within a range from 165 to 179 nm in an atmosphere of oxygen or air that is introduced from an O2 or air intake port, thereby decomposing and removing the contaminant.

Abstract: Disclosed is a dishwasher including, a circulating pump for pressing and then supplying wash liquid, an injection arm for permitting the wash liquid pressed and supplied from the circulating pump to be injected by a predetermined passage structure, an underdrain container for collecting the wash liquid injected from the injection arm and supplying the collected wash liquid to the circulating pump, during a washing stage, a soil collecting chamber having a micro filter with a fine mesh for ramifying and finely filtering the wash liquid supplied from the circulating pump and returning the same to the underdrain container, during the washing stage, a drain pump for allowing the wash liquid to be drained through a drain passage which is extended from the underdrain container, and through a connecting passage which is extended from the soil collecting chamber and connected to the drain passage, during a draining stage.

Abstract: A supply tube isolation system for use with a chemical delivery system includes a feedback tube connected between the manifold and each of the supply tubes connected between the chemical supply containers and the chemical pumps of the chemical delivery system. A controllable valve means is provided at or near the junction of the feedback tube and the supply tube so as to effectively segment the supply tube into first and second portions, where the first supply tube portion is that which is connected between the valve means and the manifold, and the second tube portion is that which is connected between the valve means and the chemical supply container. During delivery of the chemical to one or more destinations within the delivery system, the valve means is positioned so as to close the feedback tube and connect the first and second portions of the supply tube.

Abstract: An electro-kinetic electrostatic air conditioner includes a mechanism to clean the wire-like electrodes in the first electrode array. A length of flexible Mylar type sheet material projects from the base of the second electrode array towards and beyond the first electrode array. The distal end of each sheet includes a slit that engages a corresponding wire-like electrode. As a user moves the second electrode array up or down within the conditioner housing, friction between slit edges and the wire-like electrode cleans the electrode surface. The sheet material may be biasedly pivotably attached to the base of the second electrode array, and may be urged away from and parallel to the wire-like electrodes when the conditioner is in use. Another embodiment includes a bead-like member having a through opening or channel, through which the wire-like electrode passes.

Abstract: A wash tank has a conveyor belt traversing through a sterilizing wash bath. Fruit is loaded into the wash tank by way of an inclined ramp having a swinging barrier at the end thereof. The conveyor belt has rows of chevron shaped fingers extending generally transversely therefrom. The fingers extend through slots in the ramp to push the fruit through the swinging barrier and into a cage. The conveyor belt and fingers pass through the cage, which cage has a top and sides. The conveyor fingers push the fruit through the cage and the wash bath. The fruit, which tends to float, is kept wholly submerged in the wash bath by the cage. This ensures that the entire skin of the fruit is washed and sterilized. A grate along the sides of the conveyor captures large debris. Hold down plates guide the upper portion of the conveyor belt from a descending portion to a horizontal portion and then to an ascending portion relative to the water bath. There is also a second conveyor located at the outfeed end of the wash tank.

Abstract: Side extension members and a front extension member, which extend inwardly horizontally to be bent downward at right angle are provided on side walls and a front wall in a washing tank to be positioned at a level lower by a predetermined distance than a top end of the washing tank. A rack rail is pivotally supported on the side extension members through shaft portions to be made turnable. The rack rail is formed with positioning portions. Restriction members are provided on the front extension member to extend inward corresponding to the positioning portions of the rack rail, and the positioning portions are adapted to be placed on the restriction members.

Abstract: A cleaning system for cleaning carriers or containers used to carry semiconductor wafers has a door cleaner adjacent to a centrifugal box cleaner. Box holder assemblies are attached to a rotor within the box cleaner. Upper and lower hooks on the box holder assemblies hold boxes as the rotor spins. The door cleaner has a base which holds doors in a vertical and upright position. An elevator lowers the base into an ultrasonic cleaning tank. The tank lid seals the tank during use. Ultrasonic cleaning fluid is filtered and cycled into and out of the tank. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.

Abstract: A developer nozzle used to apply developer and other chemicals to a wafer in the processing of semiconductors is kept free of hardened developer or other chemicals by placing a comb-like device in a position that will let the comb be inserted into the spray holes of the nozzle when the nozzle is not in use. The teeth of the comb are tapered for easy insertion by the robot or other programmed device that controls motion of the nozzle. Although hardened developer is the principal concern in such processing, an appropriate comb can be used to maintain the cleanliness of other nozzles used in semiconductor processing.

Abstract: A method for the treatment of objects, preferably wafers, in a corresponding apparatus. The apparatus having at least two or more process chambers for receiving and treating the objects as well as a handling apparatus, for example a robot arm, for loading and unloading the process chambers. To date, all the process chambers have been loaded with the objects directly in succession. Accordingly, the actual treatment begins virtually simultaneously in all the process chambers. Furthermore, the necessary cleaning processes in the process chambers are also carried out virtually simultaneously.

Abstract: A pod for storing and carrying substrates consists of a pod body and a cover. An inlet and an outlet are formed on one of the pod body and cover. The cover is tightly fitted to the pod body to close the inside of the pod body. A washing liquid is introduced into the pod through the inlet and is discharged from the pod through the outlet, thereby easily washing the inside of the pod with the pod itself serving as a washing tank. A washing cover has an inlet, an outlet, and a heater. The washing cover is attached to the pod body when washing the inside of the pod body. Further provided is a cleaning apparatus having pipes and a pump that are connected to the washing cover. The cleaning apparatus may have a table serving as the washing cover. The table is connected to pipes and a pump.

Abstract: A washing machine for lamellar blinds includes a moveable wash container operationally connected to a transportable shower head, which is also operationally connected to a catch basin. For easy handling and transport, the outside dimensions of the catch basin (2) are matched to the inside dimensions of the wash container (1). The catch basin (2) is constructed such that it can be inserted into the wash container (1).

Abstract: A pod for storing and carrying substrates consists of a pod body and a cover. An inlet and an outlet are formed on one of the pod body and cover. The cover is tightly fitted to the pod body to close the inside of the pod body. A washing liquid is introduced into the pod through the inlet and is discharged from the pod through the outlet, thereby easily washing the inside of the pod with the pod itself serving as a washing tank. A washing cover has an inlet, an outlet, and a heater. The washing cover is attached to the pod body when washing the inside of the pod body. Further provided is a cleaning apparatus having pipes and a pump that are connected to the washing cover. The cleaning apparatus may have a table serving as the washing cover. The table is connected to pipes and a pump.

Abstract: A pump for the drain outlet of washing machines having a synchronous electric motor with a permanent-magnet rotor which is associated, by a flange, with a dome which forms a chamber for the impeller, further having an impeller with radial vanes which protrude from a perforated disk provided with a plurality of pressure-compensating vanes on a motor side of the disk, a dome which forms the chamber of the impeller, an intake duct which has an elliptical cross-section with a median axis which is parallel to an axis of the impeller but is axially offset on an opposite side with respect to a discharge duct, which also has an elliptical cross-section, with a radiused inlet which has the local internal configuration of the dome.

Abstract: A wafer-processing apparatus is provided which includes an container, a gas-supplying pipe, a pressure-leveling sensor, a controller, and an auto-cleaning device. The container is used for containing an processing solution. The gas-supplying pipe is used for supplying a gas into the container, wherein a pressure of the gas contained in the gas-supplying pipe is relative to a level of the processing solution. The pressure-leveling sensor connected to the gas-supplying pipe is used for detecting a pressure change of the gas contained in the gas-supplying pipe and correspondingly outputting a level signal. The controller electrically connected to the container and the pressure-leveling sensor is used for outputting a discharge signal to control the container to discharge the processing solution after a predetermined amount of wafers has been etched by the processing solution, and controlling an charge valve to charge the container with the processing solution in response to the level signal.

Abstract: A secondary filter of the present invention is adapted to provide for secondary filtering of wash water that has already been filtered by a primary filter to further remove very fine particles and therefore reduce the deposit of particles on the dishes being washed. The secondary filter is comprised of an annular chamber having an input port in communication with the pump and an output port in communication with the drain. The top of the annular chamber includes a plurality of openings covered by a fine mesh to allow wash water to pass but not fine particles. While the dishwasher is draining, any wash water and particles in the annular chamber will be flushed out through the output port.

Abstract: The invention relates to a method for disposing of the washing liquid in a machine for washing items and the washing machine that implements the method. The machine comprises a chamber for washing the items, means for supporting at least one item in the washing chamber, means for storing the washing liquid, means for bringing the washing liquid into contact with the item to be washed, and means for eliminating the washing liquid from the machine. According to the method, to eliminate the washing liquid from the machine, the washing liquid is evaporated, thus reducing the volume of liquid to be eliminated.

Abstract: A system and method for containment and recovery of vapors in a general parts washer apparatus, wherein a solvent is delivered to a wash area for washing articles therein; the system including a unit supported in air flow communication with the wash area and having a fan for drawing solvent vapors in a flow of air from within the wash area and through the unit. Activated carbon filters within the unit separate moisture from the air flow to trap solvent within a separation chamber. During a distillation cycle, a vacuum activated valve assembly closes the separation chamber and a heater raises the temperature within the separation chamber, under negative pressure, causing liquid solvent in the chamber to vaporize. The solvent vapors are removed from the separation chamber and converted to pure liquid solvent in a condenser. The pure liquid solvent is thereafter directed to a clean solvent holding tank in the parts washer apparatus.

Abstract: CVD reactors can be cleaned at surprisingly high rates using Non-Green House gases by employing the Non-Green House gases at high temperatures and with relatively high fluorine free radical concentrations so long as high concentrations of oxygen are also used to compensate for the detrimental effects of the high temperatures and free fluorine radical concentrations. Net oxide residue etch rates approximately 2,800 times greater than etch rates achieved with controlled Green House gases can be achieved. This is done by employing a pre-ionization module upstream of the reactor to be cleaned to generate the requisite high density plasma.

Abstract: An apparatus of cleaning a nozzle comprising a mounting table for mounting a substrate to be processed, a process liquid nozzle having a liquid output portion for outputting a process liquid toward the substrate mounted on the table, a nozzle cleaning mechanism having a fluid spray portion for spraying a cleaning fluid onto the liquid output portion of the process liquid nozzle to remove an attached material from the liquid output portion by the cleaning fluid sprayed from the fluid spray portion, and a nozzle moving mechanism for moving the process liquid nozzle between the mounting table and the nozzle cleaning mechanism.

Abstract: A dishwasher is provided having a wash pump and soil collection system. The wash pump may be a volute type pump having a horizontal axis and includes a casing surrounding a wash impeller. The casing has a main outlet and a secondary outlet. The wash impeller draws wash liquid from the dishwasher sump region and pumps the wash liquid through the main outlet and the secondary outlet. The wash liquid pumped through the main outlet is provided to a wash arm device such that wash liquid is recirculated throughout the dishwasher interior wash chamber. The wash liquid pumped through the secondary outlet is directed to flow into a soil collector. The soil collector includes a soil separation channel which receives the flow from the secondary outlet and includes at least one filter screen panel for returning filtered wash liquid back into the sump such that soils are retained in the soil separation channel and accumulate within a soil accumulator region.

Abstract: A semiconductor wafer processing system with a multi-tasking sequencer control that performs an automatic cleaning process for the process chamber or chambers of the system.

Abstract: The present invention provides a grinding apparatus for semiconductor wafers for preventing the silicon powder generated from the wafer grinding process and mixed with cooling water from contaminating height gauges of the grinding apparatus because the silicon powder is scattered toward them, and for preventing wear-down of the contact heads of the height gauges due to the abrasion with a wafer to be fixed on a spin-chuck and the spin-chuck.