Abstract: Disclosed is a dishwasher including, a circulating pump for pressing and then supplying wash liquid, an injection arm for permitting the wash liquid pressed and supplied from the circulating pump to be injected by a predetermined passage structure, an underdrain container for collecting the wash liquid injected from the injection arm and supplying the collected wash liquid to the circulating pump, during a washing stage, a soil collecting chamber having a micro filter with a fine mesh for ramifying and finely filtering the wash liquid supplied from the circulating pump and returning the same to the underdrain container, during the washing stage, a drain pump for allowing the wash liquid to be drained through a drain passage which is extended from the underdrain container, and through a connecting passage which is extended from the soil collecting chamber and connected to the drain passage, during a draining stage.

Abstract: A device for preventing errors during semiconductor wafer fabrication can be configured to prevent separation of optical sensor unit components, such as a gas supply pipe and a fixing guide, that could be caused by excess N2 gas pressure. The device can also be configured to prevent excess moisture build-up that can lead to wafer sensing errors. The device includes a bath for receiving pure water or chemicals to remove particles. The bath can be further configured to discharge waste water after removal of the particles. Fixing guides are disposed at the outside of the bath to fix optical fiber sensors thereto. Optical fiber sensors are inserted into gas supply pipes, partially secured within the fixing guides. Purge output holes are formed at predetermined locations along the fixing guides to release N2 gas pressure. A method for releasing excess pressure and a method for discharging excess moisture from an optical sensor unit are also provided.

Abstract: The present invention relates to a device (1) for cleaning a liquid-containing vessel. More particularly, the present invention relates to a device (1), suitable for cleaning liquid-containing vessels (such as bathtubs or swimming pools), equipped with an energy storage means and a self-tracking means and/or a filter, wherein said device (1) is capable of floating and actively moving in said vessel.

Abstract: A dishwasher is provided which uses a combined circulation/drain pump and an improved filtering system to enhance cleaning capability. The circulation section of the pump provides pressurization and supplies wash water to a spray arm of the dishwasher, while the drain section discharges the wash water. This single pump reduces space requirements, as well as manufacturing costs. A two stage filtration system may be used in the water collection area of the dishwasher to filter out unwanted material, and a third filter may further filter wash water prior to recirculation. Self cleansing mechanisms associated with each of the filters may be used to keep the filters free from obstructions and allow for the unobstructed flow and discharge of wash water.

Abstract: A filter assembly having a plurality of concentric filters for use in a dishwasher prevents an undue accumulation of waste particles in the outer filter by periodically spraying water into the filter assembly. The filter assembly includes a water circulator for supplying washing and rinsing water under pressure to the filter assembly; and at least one cleaning nozzle, provided at a predetermined position along an outer circumference of the filter assembly, to communicate with the water circulator. The pressurized water of the water circulator is sprayed into the filter assembly.

Abstract: A method and system for spraying scale conditioning aqueous solutions onto opposite sides of a metal strip for scale conditioning is provided. The system includes a housing which defines a chamber through which the moving strip passes on the strip pass line. A nozzle maintenance station is provided which is disposed off the strip pass line. Sets of spray nozzles are provided and the sets are independently movable between the maintenance station and spraying portion on opposite sides of the strip. Thus, each set can be utilized independently to spray a strip or be worked on in the maintenance station without shutting down the line.

Abstract: An apparatus for the treatment of semi-conductor wafers is provided. The apparatus has a first valve mechanism for introducing different treatment fluids into a treatment tank from different reservoirs. At least one collection device is provided for collecting a treatment fluid after treatment of wafers therewith in the treatment tank. A second valve mechanism is provided for conveying at least a portion of the treatment fluid out of the collection device and to a respective reservoir. A rinsing mechanism is provided for rinsing the collection device.

Abstract: The embodiment of this invention is an apparatus that provides for a cassette-to-cassette batch demounting process wherein the apparatus has two cassettes for holding and separating semiconductor substrates. A first cassette is placed on top of a second cassette, using the first cassette as the top cassette that holds the semiconductor substrate and the support substrate, and the second cassette at the bottom as a bottom cassette that receives the semiconductor substrate after demounting process. The semiconductor substrate is loaded with its support substrate into a slot in the top cassette. The top cassette will let only the semiconductor substrate to descend to the bottom cassette while blocking the support substrate from exiting the top cassette. The two cassettes are then soaked in a hot solvent that can dissolve or melt an adhesive that adheres the semiconductor substrate to the support substrate in order to weaken the cohesive force between the two substrates.

Abstract: A method and apparatus for transferring a wet object, such as a contact lens comprising a probe having a passage for at least one vacuum source, and a tip at one end of the probe for receiving the wet object, the tip comprising at least one aperature, the aperature being in communication with the passage; and the passage having at least one relief hole to provide for gas flow into the passage when the wet object is present over the aperature on said tip. A cleaning apparatus and method for a transfer apparatus for a wet object, comprising means for directing at least one source of fluid at said transfer apparatus at a location on said transfer apparatus above the expected location of a wet object on the transfer apparatus. A transfer apparatus for a wet object comprising a probe, means for receiving on said probe said wet object from a first station, and means for aligning said transfer apparatus with said first station to prevent damage to said wet object.

Abstract: In order to provide a cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without risk of reverse contamination of the cleaned object after the drying process, a cleaning apparatus comprises a supporting device for supporting an object to be cleaned, and a cleaning cup surrounding said supporting device to prevent splashing of a cleaning liquid, said cleaning apparatus comprising: a cleaning device for cleaning an inner wall of said cleaning cup with a cleaning liquid.

Abstract: In a cleaning controller for a recording head of a recorder connected to an external device, a timer acquires a first time value indicating a current time from the external device, and performs cyclic clocking in which a first predetermined time period is repetitively clocked from a predetermined time point. A nonvolatile storage medium stores a second time value indicating a time at which a cleaning operation is lastly performed. A determinant compares the first and the second time values to obtain a third time value, and determines whether a cleaning operation is necessary to be performed based on the third time value. A cleaner performs a cleaning operation of the recording head based on the result determined by the determinant.

Abstract: A process and system for conditioning a bulk container for ultra-high purity liquefied gas. Vapor is generated in the container from a conditioning quantity of the ultra-high purity liquefied gas by imposing a temperature difference on the container so that the vapor condenses when a temperature difference is achieved. The resulting liquid reflux, e.g., the condensed liquid drips or flows back to the conditioning quantity of the liquified gas, washes or removes contaminants, e.g., particles, metal and moisture, from the interior surface of the container. A portion of the vapor is vented from the container for reclamation. The used conditioning liquid may also be reclaimed.

Abstract: At least one part of a road surface is covered by a photocatalyst layer containing a photocatalyst such as titanium dioxide, etc. to purify pollutants in exhaust gases emitted from vehicles by photocatalytic reaction of the photocatalyst. Pollutant-originating matters as retained on the photocatalyst layer are washed away by rain water or sprinkled water. In one embodiment of the invention, road 12 is a road provided with a dewaterable pavement and rain water passes through surface layer 18 during raining, flows over and along base layer 16 and is discharged. In surface layer 18, numerous aggregates of small particle sizes 1802 are projected from the entire surface of concrete layer 1804. Titanium dioxide layer 20 is formed by injecting or spraying a mixture comprising titanium dioxide, cement, a filler and water onto the entire surface of surface layer 18 thinly and is water-permeable.

Abstract: Apparatus for washing the wheels and tires of heavy duty vehicles includes a wash trough in which the wheels and tires are washed, and a refuse trough in which refuse from the vehicles is deposited for facile removal. The troughs are separated by a wall having a space therein through which debris from the wash trough is impelled by a stream of water into the refuse trough.

Abstract: A dishwasher functions to chop all fluid entrained soil prior to directing fluid to at least upper and lower wash arms and directs a percentage of the fluid flow into a filter chamber having one or more fine mesh filter screens that open into the dishwasher tub basin. When the fine mesh filter becomes clogged, fluid is forced to flow up an overflow tube and be exposed to another filter. The draining of portions of the system are sequenced to enhance soil removal.

Abstract: A substrate handling end effector is provided. The substrate handling end effector has a vacuum chuck to support a semiconductor substrate thereon. A vacuum passage and a liquid passage are located in the vacuum chuck. The vacuum passage is adapted to be connected to a vacuum source and the liquid passage is adapted to be connected to a liquid source. The liquid passage is connected to the vacuum passage.

Abstract: A to-be-cleaned substrate is cleaned by use of an acid liquid agent in a cleaning cup, the remaining acid liquid agent is washed out by use of pure water, then an alkaline liquid agent is emitted to the surface of the to-be-cleaned substrate in the same cleaning cup to remove the acid liquid agent remaining on the to-be-cleaned substrate. A neutralization reaction between the acid and alkali is caused by emitting the alkaline liquid agent to the surface of the to-be-cleaned substrate so as to efficiently remove the acid liquid agent remaining on the surface of the to-be-cleaned substrate.

Abstract: A closed loop pressure washing system including a pressure washer device for pressure washing an object having a contaminant, and for recovering the the contaminant. The pressure washing system includes a supporting mechanism arranged to support the object while a washing fluid is flowed over the object to remove the contaminant. A collection arrangement is included at least partially located below the supporting mechanism. The collection arrangement is further arranged to receive raw run-off fluid from the support mechanism. A flush assembly is arranged to at least periodically impinge rinsing fluid onto the supporting mechanism to hydro-dynamically sweep the contaminants collecting on the support mechanism into the collection system.

Abstract: A scrubbing assembly for a wafer-cleaning device is provided. The wafer-cleaning device is provided with a base. The scrubbing assembly comprises a scrubber, a cup and an oscillator. The scrubber is disposed on the base in a manner such that it can move between a first position and a second position. The scrubber scrubs a wafer when it locates in the first position. The cup, for receiving DI water, is disposed on the base. The scrubber locates inside the cup and contacts the DI water when it locates in the second position. The oscillator is disposed at the cup, and it vibrates the DI water when the scrubber locates inside the cup and is contact with the DI water.

Abstract: A processing apparatus and a processing method are capable of properly and easily obtaining accurate data on the contact pressure applied by an end effector to a workpiece while a process is being carried out. A processing apparatus (7) processes a surface of a wafer (W) held by a spin chuck (22) (holding means) by bringing an end effector (40) into contact with the surface of the wafer (W). The end effector (40) can be retracted from the surface of the wafer (W) to a waiting position (25). A measuring and cleaning device (28) comprises, in combination, a measuring device (26) for measuring contact pressure to be applied to the wafer (W) by the end effector (40), and a cleaning device (27) for cleaning the end effector (40). The measuring device (26) has a table (60) for supporting the end effector (40), and a pressure sensor (62) for measuring a pressure applied to the table (60) to estimate a contact pressure actually applied by the end effector (40) to the wafer (W).

Abstract: An apparatus and method for providing a contact surface which is continuously sanitized with a sanitizing fluid. A reservoir contains the sanitizing fluid. A contact material has a porous contact surface in fluid communication with the reservoir. A moisture control and fluid distribution system determines the moisture level of the porous surface and, upon determining that the moisture level thereof has reached a predetermined level, causes a flow of the sanitizing fluid from the reservoir to the contact material. The contact material comprises a durable, porous outer layer configured for evenly distributing the sanitizing fluid to the contact surface and a backing layer bonded to the outer layer to provide a seal there between.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. A basket with a sprayer is disposed within the wash chamber. A self-aligning coupling fluidly connects a liquid conduit to the sprayer when the basket is seated.

Abstract: An assembly for rotating and axially directing a high pressure spray hose and spray head to clean residue from the bores of thermal transfer tubes. The assembly includes a number of subassemblies that are concentrically aligned and mounted to rotate in synchrony and direct a high-pressure hose and spray head. A hose cleaning subassembly washes and/or brushes the hose exterior with a low-pressure spray. A hose drive assembly controls axial hose movement via driven gears and chains and four polyurethane pinch wheels that abut the hose. Spring tensioners control the wheel-to-hose pressure. A layering arm extends from a driven reel axle and stacks the hose in uniform layer onto an adjustable hub at a driven reel. The diameter of the reel hub can adjusted relative to an outer cage. The hose reel, axial hose drive and hose cleaner assemblies can be operated at speeds rotational speeds of 60 rpm to 650 rpm and whereby tubes from ½ to 6-inch diameters can be cleaned at rates of 1 to 80 feet per minute.

Abstract: The invention relates to a method and arrangement for cleaning filters in different types of liquid containers. The arrangement includes a pump (4) provided with a suction conduit (5) and which pump is connected to a filter (7) and an outlet conduit (3), whereby the components are placed in a sealed liquid container (1), and that the pump (4) can be reversed when a predetermined condition is fulfilled, whereby pollutants from said filter (7) is pumped to a collection unit (17) connected to said suction conduit (5).

Abstract: A storage vessel (1) for liquid substances which are supplied to a consumer is provided with a device for cleaning the connecting pieces (7, 8, 13, 18) when the storage vessel (1) is changed, the storage vessel (1) having a connecting piece (13) provided with a shut-off device (15) and a coupling (16) for connection to a connecting piece (7) provided with a coupling (10) to a pressure gas line (3) with a shut-off device (5). The storage vessel (1) has a connecting piece (18) provided with a shut-off device (19) and a coupling (21) for connecting a discharge line (17) in the storage vessel (1) to a connecting piece (8) provided with a coupling (11) and a shut-off device (6) for supplying the substance subjected to the pressure gas in the vessel (1) to the consumer.

Abstract: An edge bead removal system and method is provided that employs a nozzle for applying edge bead removal solvent to an edge bead of a photoresist material layer disposed on a wafer. The nozzle includes a liquid chamber that can be connected to a supply of edge bead removal and an air supply chamber that can be connected to a supply of air. The supply of air is isolated from the liquid supply chamber during application of the edge bead removal solvent and communicates via the air supply chamber to the liquid supply chamber after application of the edge bead removal solvent thus removing any droplets of edge bead removal solvent remaining in the nozzle tip. A system is also provided that includes an absorbent material that moves from a rest position, during application of the edge bead removal solvent, to an absorbing position that removes or catches any droplets of edge bead removal solvent remaining on the nozzle tip after application of the edge bead removal solvent is completed.

Abstract: The present invention is a method and apparatus for shielding the lens and the field of view of an optical device, such as a camera or an image projector, from obstruction by unwanted contaminants such as dust, dirt, rain, and the like. The invention employs a transparent shield positioned to protect the lens from such contaminants. A wiper is positioned to be in contact with the shield but the wiper is also positioned to not obstruct the field of view. A rotation mechanism is used to cause rotation of the shield. Contaminants that may be deposited upon the shield may be wiped from the shield by the wiper yet the wiper does not obstruct the field of view. Rotation of the shield allows a portion of the shield that is obstructed by a contaminant to be rotated away from the field of view. Rotation of the shield allows a portion of the shield that has been wiped to be rotated into the field of view.

Abstract: A cleaning apparatus includes cleaning vessels 2a and 2b for storing cleaning water “W1” used for cleaning an article to be cleaned 14; concentrating vessels 3a and 3b for storing sewage “W2” discharged from the cleaning vessels; an ultrafiltration membrane 11 for receiving the sewage “W2” discharged from the concentrating vessels to separate the received sewage into filtered water “W3” and concentrated sewage “W5”; and waterway lines “L4” and “L12” for returning the concentrated sewage “W5” discharged from the ultrafiltration membrane 11 to the concentrating vessels 3a and 3b. The filth is removed from the article to be cleaned 14 by dipping the article to be cleaned 14 into the cleaning water “W1”. The ultrafiltration membrane 11 is provided with a backwash filtration system “L9”, “B4”, and “P3” for removing filthy refuse.

Abstract: A washing device for washing an interior of a process device is provided. The washing device moveably connected to the process device by a fastening means, and a washing medium of the washing device is led at least partly inside the body of the washing device in order to spray the washing medium to a target via a plurality of nozzles disposed in the body. The washing device has cleaning means including additional nozzles for cleaning parts of the washing device. One or more parts of the washing device have inclined outer surfaces such that the parts are totally visible when viewed from the spraying directions of the additional nozzles.

Abstract: Whenever a dishwasher is operated a given number of times or whenever a given number of days transpire, an apparatus performs a process that removes minerals deposits that have built-up inside the dishwasher. The process commences by rinsing the dishwasher interior with water and draining the rinse water. A mixture of water and a chemical that dissolves the minerals is introduced into the dishwasher and a pump circulates the mixture inside the dishwasher for a period of time. Next the mixture is drained out and the dishwasher interior is rinsed again with fresh water.

Abstract: A scrubbing assembly for a wafer-cleaning device is provided. The wafer-cleaning device is provided with a base. The scrubbing assembly comprises a scrubber, a cup and an oscillator. The scrubber is disposed on the base in a manner such that it can move between a first position and a second position. The scrubber scrubs a wafer when it locates in the first position. The cup, for receiving DI water, is disposed on the base. The scrubber locates inside the cup and contacts the DI water when it locates in the second position. The oscillator is disposed at the cup, and it vibrates the DI water when the scrubber locates inside the cup and is contact with the DI water.

Abstract: The present invention is directed to a device and method for removing build-up on such measurement gauges. The inventive device and method involve a movable scraper that fits around a cylindrical shield of a measurement gauge and continuously removes the build-up on the shield. Movement of the scraper is accomplished by a magnetic coupling between a magnetic core attached to the scraper, which is inside a pipe or other piece of equipment, and solenoids that are installed on the outside of the pipe. The device and method of the invention ensure instantaneously correct readings from the measurement gauge and improve control and operation strategies of heat exchanges, with significant economic advantages.

Abstract: A treatment machine for pharmaceutical products formed as a filling and closing machine has an insulator which surrounds a sterile treatment region, a substantially plate-shaped partition which separates the sterile treatment region from an unsterile drive region, at least one movable drive member for driving treatment functions, the drive member is drivable from the unsterile region for its movement, extends through the partition into the sterile treatment region and is surrounded over at least one longitudinal portion by a passage through which a medium is supplied, the passage in an end region which extends in the sterile treatment region is open by at least one opening toward the sterile treatment region, so that a sterilization medium is aspirated from the sterile treatment region through the at least one opening into the passage and is aspirated through the passage in direction toward the unsterile drive region.

Abstract: A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed within the outer shell and having a holding member for holding a substrate, and a dispenser unit for feeding at least one of gas and liquid into the inner shell. Within the sealed space formed by the outer shell, a highly gas-tight space is formed by the inner shell to permit cleaning of the substrate within the highly gas-tight space. Also disclosed are a dispenser, a substrate holding mechanism and a substrate cleaning chamber, which are suitable for use with the substrate cleaning apparatus, and substrate cleaning processes making use of these dispenser, substrate holding mechanism and substrate cleaning chamber, respectively.

Abstract: A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation of the substrate by supplying a cleaning liquid thereto. The apparatus further comprises a cleaning vessel including a side wall encircling the substrate rotated by the holder to intercept the cleaning liquid supplied to and scattered from the rotating substrate and then finally drain the cleaning liquid. There is provided a vent duct for carrying gas from the inside of the cleaning vessel to the outside of the same. The vent duct includes an inlet provided at substantially the same level as that of the substrate for introducing the gas into the vent duct.

Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.

Abstract: An apparatus and method for reducing the production of white powder in a process chamber used for depositing silicon nitride. Steps of the method include heating at least a portion of a wall of the process chamber; providing a liner covering a substantial portion of a wall of the process chamber; providing a remote chamber connected to the interior of the process chamber; causing a plasma of cleaning gas in the remote chamber; and flowing a portion of the plasma of cleaning gas into the process chamber.

Abstract: A semiconductor wafer processing system with a multi-tasking sequencer control that performs an automatic cleaning process for the process chamber or chambers of the system.

Abstract: The present invention provides a dishwasher having a wash chamber including a sump. A pump having a rotating element is supported within a pump housing wherein the pump is adapted to draw liquid from the sump through an inlet area and then pump liquid to the wash chamber. A particle chopping assembly is supported in the inlet area upstream of the rotating element, the particle sizing assembly including a particle screen rotatably supporting drive shaft which drivingly supports a chopping blade adjacent the particle screen. The drive shaft has a coupling end which detachably couples to the rotating element. The coupling between the chopping blade and the rotating element is capable of accommodating axial tolerance with regard to the axial position of the rotating element.

Abstract: A closed-loop pressure washing system including a pressure washer device for pressure washing an object having a contaminant, and for recovering the contaminant. The pressure washing system includes a supporting mechanism arranged to support the object while a washing fluid is flowed over the object to remove the contaminant. A collection arrangement is included at least partially located below the supporting mechanism. The collection arrangement is further arranged to receive raw run-off fluid from the support mechanism. A flush assembly is arranged to at least periodically impinge rinsing fluid onto the supporting mechanism to hydro-dynamically sweep contaminants collecting on the support mechanism into the collection arrangement.

Abstract: An apparatus for processing a substrate by supplying a process liquid to a substrate to be processed in a photolithographic process, comprises a cup, a washing control plate for washing an inner surface of the cup, a spin chuck for rotating the washing control plate or the substrate while holding the washing control plate or the substrate substantially horizontally in the cup, a solvent supply mechanism for supplying a solvent capable of dissolving the process liquid, onto the washing control plate or the substrate held by the spin chuck, a process liquid supply mechanism for supplying the process liquid onto the substrate held by the spin chuck, and a control section for selecting either a solvent to be supplied to the substrate or a solvent to be supplied to the washing control plate and controlling the solvent supply mechanism in accordance with the solvent selected.

Abstract: A soil sensing system is provided for a dishwasher having an interior wash chamber receiving soiled dishes wherein during a wash cycle wash liquid is sprayed throughout the wash chamber through an upper wash arm and a lower wash arm and soils are collected in a soil collector. The soil collector includes a filter screen which is backwashed by the wash arm. A pressure sensor measures the pressure within the soil collector to provide an input which corresponds to the presence of soils. In order to improve the sensitivity of the pressure based soil sensing, the lower wash arm is deactivated. Deactivating the lower wash arm ceases the backflushing of the collection chamber's filter screen and allows pressure to build within the soil collector in the presence of only light or oily soils. A response is activated if the actual pressure within the collection chamber is greater than a predetermined limit pressure.

Abstract: A device for preventing errors during semiconductor wafer fabrication can be configured to prevent separation of optical sensor unit components, such as a gas supply pipe and a fixing guide, that could be caused by excess N2 gas pressure. The device can also be configured to prevent excess moisture build-up that can lead to wafer sensing errors. The device includes a bath for receiving pure water or chemicals to remove particles. The bath can be further configured to discharge waste water after removal of the particles. Fixing guides are disposed at the outside of the bath to fix optical fiber sensors thereto. Optical fiber sensors are inserted into gas supply pipes, partially secured within the fixing guides. Purge output holes are formed at predetermined locations along the fixing guides to release N2 gas pressure. A method for releasing excess pressure and a method for discharging excess moisture from an optical sensor unit are also provided.

Abstract: Whenever a dishwasher is operated a given number of times or whenever a given number of days transpire, an apparatus performs a process that removes minerals deposits that have built-up inside the dishwasher. The process commences by rinsing the dishwasher interior with water and draining the rinse water. A mixture of water and a chemical that dissolves the minerals is introduced into the dishwasher and a pump circulates the mixture inside the dishwasher for a period of time. Next the mixture is drained out and the dishwasher interior is rinsed again with fresh water.

Abstract: A wash liquid recirculation system for a dishwasher is provided including a unique soil separating system. The recirculation system includes a wash pump which is provided with an internal filter plate to concentrate soils. The wash pump includes an impeller disposed within a pump housing or casing. When energized, the wash pump draws wash liquid from a sump area and pumps wash liquid through the impeller into the pump housing or casing. The filter plate is disposed within the casing for dividing the casing into a first and second region and for concentrating soils in the second region. Concentrated soils are delivered from the second region to a soil collection system. The filter plate is disposed radially outwardly from the impeller, substantially perpendicular to the rotational axis of the impeller.

Abstract: An apparatus (10, 300, 400) for cleaning spray guns (18, 418) has a closed vessel (14) having an inlet (24, 424), a drain (22, 422) and a port (29) for receiving a nozzle (30) of a spray gun. A spray impeller (36, 136, 236, 336, 436) is rotatably mounted within the vessel (14) and in fluid communication with the inlet (24, 424). The spray impeller (36, 136, 236, 336, 436) has an offset cleaning nozzle (42, 44, 144, 141, 142, 282, 244, 442, 444) for projecting a cleaning spray towards the port (29) and a rotational nozzle (46, 48, 148, 246, 248, 446, 448) for projecting a rotational spray to effect rotation of the spray impeller (36, 136, 236, 336, 436). The port (29) has a seal (76, 78, 80) for sealing receiving the spray gun (18, 418) and positioning the nozzle (30) of the spray gun in the cleaning spray.

Abstract: A cleaning system for cleaning boxes or containers used to carry semiconductor wafers has box holder assemblies and a box door holder assembly attached to a rotor within an enclosure. Upper and lower hooks on the box holder and box door holder assemblies hold boxes and doors as the rotor spins. Boxes and their doors, such as front opening unified pods (FOUP) are both efficiently cleaned and handled.

Abstract: The present invention relates to a dishwasher.

Abstract: A method for drying wafers after a wet bench process is disclosed. In the method, a wafer is first immersed in a volume of DI water held in a container. A mixture of alcohol vapor/inert gas is then flown into the upper portion of the container that is not filled with the volume of DI water at a flow rate of less than 20 l/min. The wafer is then withdrawn from the DI water into the upper portion of the container filled with the alcohol vapor/inert gas mixture and thereby driving DI water molecules off the surface of the wafer without leaving organic residue on the wafer surface.

Abstract: A soil separator for a dishwasher includes a centrifugal soil collection wall surrounded by a spill over guide channel, surrounded by a shallow annular soil accumulator channel. The soil accumulator channel is open to the dishwasher chamber but covered by a filter screen. The accumulator channel is shallow beneath the screen and empties downwardly into an accumulator sump where accumulated soil is periodically drained. The shallow accumulator channel allows water to flush an inside of the screen to carry soil to the accumulator sump.