Abstract: Solar system cleaning apparatuses and methods of cleaning solar systems are described. A solar system cleaning apparatus includes a vehicle. A first basin is mounted on the vehicle, the first basin to supply a cleaning medium to a solar module. A second basin is mounted on the vehicle, the second basin to collect the cleaning medium from the solar module. A filter is coupled to the first basin and the second basin, the filter to transfer the cleaning medium from the second basin to the first basin.

Abstract: A device for processing wafer-shaped articles includes a spin chuck for holding and rotating a wafer-shaped article about a rotation axis and at least one dispenser for dispensing liquid onto at least one surface of a wafer-shaped article. A liquid collector surrounds the spin chuck for collecting liquid spun off the substrate during rotation, with at least two collector levels for separately collecting liquids in different collector levels. At least one lifting device moves the spin chuck relative to the liquid collector. At least two exhaust levels are provided for separately collecting gas from an interior of the liquid collector. Each of the exhaust levels includes at least one opening communicating with an ambient exterior of the liquid collector and a door that closes and opens the opening. Each door on one of the exhaust levels can be opened and closed separately from each door on another exhaust level.

Abstract: A cleaning system which includes an enclosure and having a door with a transparent window. The door is opened and closed to load and unload products to be cleaned. An operator puck on the outside of the enclosure couples magnetically to another actuator puck on the inside of the enclosure. This coupling allows an operator to move and direct the inside puck to actuate spray or air blast functions, without opening the enclosure. The outside operator puck includes one or more switches which turn on the various electronic components such as the liquid pump, light, or air blast valve. The cleaning system enables a user to efficiently direct cleaning action to parts inside to minimize the cleaning time, and to prevent exposure of chemicals. The cleaning fluid is cycled out of the enclosure continuously, and into a “trap” box, through a pump and back into the cleaner box in a closed loop cycle.

Abstract: A system and method for washing a jet engine of an aircraft are disclosed. The method comprises creating a collecting bowl under the jet engine by coupling a suit to the jet engine to the aircraft and coupling an apron of the suit to the jet engine. After the suit is coupled to the jet engine, a cleaning cycle is performed, which includes injecting cleaning fluid into the jet engine, turning over the jet engine, and collecting resultant effluent in the bowl. Further, the effluent remains in the bowl until actively removed by a user. The suit may be coupled to the aircraft by wrapping a strap around a pylon that couples the jet engine to the aircraft.

Abstract: A sump assembly for a dishwasher and associated method are provided. The sump assembly comprises an integrally-formed sump member defining a circulation pump volute receptacle and a drain pump volute receptacle. The circulation pump volute receptacle and the drain pump volute receptacle are adapted to receive respective pump and motor assemblies. Each of the volute receptacles is configured to receive the respective pump and motor assembly along a respective horizontal axis defined thereby. The drain pump volute receptacle includes a washing fluid input in direct communication with the circulation pump volute receptacle for receiving the washing fluid therefrom.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: A plating apparatus includes a vessel for holding a bath of plating liquid. A head is adapted to hold a work piece, such as a silicon wafer, in the vessel, with a seal on the head sealing against the work piece. A component cleaner assembly may be used to automatically clean a component of the plating apparatus, such as a seal or a contact ring. The cleaner assembly has a component contactor, such as a brush, on an arm. An arm actuator is linked to the arm for moving the arm from a retracted position, to a deployed position, where the contactor is in physical contact with the component. A method for cleaning a component of a plating apparatus includes moving a scrubber or contactor into contact with the component and applying a cleaning liquid onto the component adjacent to the contactor.

Abstract: An apparatus is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the apparatus includes a removing station for lifting from the base a strip of the artificial turf extending in a longitudinal direction, a separating station for separating filling material from the strip and a winding station for winding the strip onto a shaft. A method is disclosed for handling an artificial turf arranged on a base. In at least one embodiment, the method includes lifting a strip of the artificial turf extending in a longitudinal direction from the base, separating infill material from the strip and winding the strip onto a shaft.

Abstract: The present invention improves recover percentage at which a mixed chemical solution discharged from a protective film removing device.

Abstract: A machine for cleaning a head-disk assembly (HDA) of a hard disk drive (HDD) includes a nest that seals the HDA between an upper and lower portion during cleaning. An inlet port receives a gas and an exhaust port exhausts the gas and entrained particles. A shock drive delivers mechanical shocks to the nest and the HDA while the gas is flowing through the HDA. A blower may circulate the gas from the exhaust port to the inlet port. A filter may be coupled to the inlet port. The HDA nest may be movable along an axis of the mechanical shocks delivered by the shock drive. A blow tube may deliver gas to a screw hole and a coaxial vacuum tube may rest against a surface around the screw hole to encapsulate the blow tube during cleaning and remove the gas and particles from the screw hole.

Abstract: A method includes generating a solvent-containing vapor that contains a solvent. The solvent-containing vapor is conducted to a package assembly to clean the package assembly. The solvent-containing vapor condenses to form a liquid on a surface of the package assembly, and flows off from the surface of the package assembly.

Abstract: A substrate treating apparatus for immersing substrates in a treating liquid. An inner tank stores the treating liquid, an outer tank collects the treating liquid overflowing the inner tank, and a lifter moves the substrates between a standby position above the inner tank and a treating position inside the inner tank. Circulation piping connects the inner tank and the outer tank. The treating liquid overflows the inner tank into the outer tank in a treating state with the lifter and the substrates located in the treating position. The treating liquid remains in the inner tank without overflowing in a non-treating state with the lifter and the substrates located in the standby position. The treating liquid flows from the inner tank to the outer tank through the circulating piping in a non-treating circulation state before the lifter moves the substrates to the treating position.

Abstract: A cleaning apparatus for cleaning a hair-cutting portion of an electric hair-cutting device includes a cleaning-liquid basin for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid. The electric hair-cutting device is cleaned by generating a cleaning-liquid flow revolving within the basin around the central area of the basin, the hair-cutting portion being at least partially immersed in the cleaning liquid. The liquid flow effectively entrains debris away from the hair-cutting portion.

Abstract: A substrate processing apparatus comprises a substrate holding mechanism, a process liquid supplying mechanism supplying a process liquid, a first guide portion around the substrate holding mechanism having an upper edge portion extending toward the rotation axis for guiding scattered process to flow down, a second guide portion provided around the substrate holding mechanism outside the first guide portion and having an upper edge portion extending toward the rotation axis as vertically overlapping with the upper edge portion of the first guide portion for further guiding the scattered process liquid to flow down, a recovery channel provided outside and integrally with the first guide portion for recovering the process liquid guided by the second guide portion, and a driving mechanism for moving up and down the first guide portion and the second guide portion independently of each other.

Abstract: A dish washer which includes a steam generator. The dish washer, for example, may comprise a tub to provide a room for dishes for washing, a sump to hold water for supplying to the tub for the washing; a steam generator to generate steam, a first tube (or a steam tube) to provide a passage for the steam from the steam generator to the tub, and a valve to release the steam or water from the steam generator according to a pressure.

Abstract: Provided is a dishwasher door. The door may include a door panel member having a liquid dispenser unit mounted thereto and extending therethrough from an interior-facing side to an exterior-facing side of the door panel member. A fluid-directing member can operably engage with the door panel member about the exterior-facing side. The fluid-directing member may define a containment portion that at least partially surrounds the liquid dispenser unit. The fluid-directing member may also include a conduit in communication with the containment portion. The conduit can be configured to channel liquid leaking from the liquid dispenser unit from the containment portion and through the door panel member, away from the exterior-facing side of said door panel member.

Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete holes connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.

Abstract: Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.

Abstract: In an example embodiment, a top proximity head for depositing fluids on a semiconductor wafer includes a delivery bore which receives fluid. The top proximity head includes a plenum that is connected to the delivery bore by numerous input channels into which fluid flows from the delivery bore. Each input channel has an inverted V-shaped opening which urges the upward flow of any air bubbles. From the plenum, the fluid flows through output channels out of the top proximity head to form a meniscus. The fluid is suctioned from the meniscus back into the top proximity head through return channels that lead to a return bore. A passage connects the delivery bore with the return bore, allowing air bubbles to escape from the delivery bore into the return bore. The passage allows a negligible amount of fluid to flow directly between the two bores rather than through the plenum.

Abstract: The invention relates to a machine for scraping away sediment or the like deposited on the bottom of a gallery. The machine comprises: a first movable body suitable for moving over the bottom portion of the wall of the gallery; first movement means for moving said first movable body; scraper means for detaching sediment from the bottom; first buffer storage means mounted on said first movable body; first transfer means for transferring detached sediment into said first storage means; second transfer means for transferring sediment stored in said first buffer storage means to the outside of said first movable body; a second movable body; second movement means; and second storage means mounted on said second movable body to collect the transferred sediment.

Abstract: A cleaning vessel (10) comprising a main chamber (12) into which can be inserted a part (34) for cleaning and one or more secondary chambers (14). An opening (30) is provided in the main chamber (12) associated with each secondary chamber (14) such that the main chamber (12) is in fluid communication with each secondary chamber (14). Rotation of the part (34) causes rotational flow of fluid in the main chamber (12) and each opening (30) is oriented such that material entrained in the rotating fluid passes from the main chamber (12) into the associated secondary chamber (14).

Abstract: An effluent collection unit for engine washing is formed by a portable trailer having a plurality of sides forming an internal compartment and an effluent collection system positioned within the internal compartment, which effluent collection device captures engine wash water effluent when the trailer is placed in an operational configuration.

Abstract: A garbage collecting apparatus of a dishwasher, mounted in a dishwasher such that washing water is pumped by a washing pump to wash garbage on targets to be washed, and then such used washing water is drained by a drain pump, the apparatus including a first garbage collecting net, and a second garbage collecting net having a mesh size relatively greater than that of the first garbage collecting net, whereby various sizes of garbage can be filtered by the garbage collecting apparatus, so as to automatically be discharged to the exterior, and also a decomposition, a displeasure, an inconvenience due to washing of the collecting nets and the like which may be caused when such garbage remains in the garbage collecting apparatus can be solved.

Abstract: A wash fluid containment system includes an elevated, fluid impervious surface upon which items to be washed are placed for washing. The surface is configured to cause wash fluid to flow to an edge of the surface and off of the surface to prevent buildup of wash fluid on the surface. A collecting trough is positioned in fluid flow communication with the edges of the surface to which the fluid flows to catch and collect the fluid as it flows from the surface. Used wash fluid is taken from the collecting trough for disposal or recycling and solids and debris can be easily removed from the trough.

Abstract: A self-contained, mobile system for cleaning trash receptacles. The system comprises a water system and a lift system that work in conjunction with each other to provide an automated method for cleaning trash receptacles. The water system acts as a water purification system minimizing waste of the cleaning solution and maximizing efficiency. The system may be adapted to clean multiple trash receptacles sequentially or simultaneously.

Abstract: Low profile wash pads, usable alone or with other like pads in a module array, are disclosed whereby one or more motor driven or motorless vehicles may be wheeled onto or across (or other object placed upon) a full drainage impervious washing platform such that substantially all spent wash liquid and removed debris are caused to flow off from the washing platform to an edge collector or gutter. Debris accumulation at the washing platform is avoided and processing of gutter-contained spent wash liquid and removed debris can occur in offset relation to and without interfering with ongoing washing on the washing platform. Several modes for processing the drainage comprising spent wash liquid and removed debris contained in the gutter are disclosed, one mode comprising automated processing using a screw conveyor.

Abstract: The present invention relates to a cost saving liquid-treatment unit (100). According to the invention, a control unit (152), which is connected to an input port of a control valve (118, 120, 122), is adapted to set, in dependence on the evaporation rate of a treatment liquid on the substrate at the given or desired temperature of the substrate and/or at the given or desired pressure of a gaseous ambient atmosphere at the substrate, a number of dispense pulses to be applied to the substrate for the liquid treatment, a respective pulse duration of individual dispense pulses, and respective dispense-interruption time spans between the individual dispense pulses. This way, the use of treatment liquid is reduced to a minimum amount, thus reducing costs for providing and cleaning treatment liquid.

Abstract: Method and device for drying circuit substrates (13), in particular semiconductor substrates, in which a circuit surface (30) of the circuit substrate is flushed using a flushing liquid (10) in a flushing step and the circuit surface is dried in a subsequent drying step, the circuit substrate being moved in the flushing step in the direction of its planar extension transversely and in relation to a liquid level (28) of the flushing liquid in such a way that a liquid meniscus forms at a transition area between the circuit surface and the liquid level, which changes because of the relative movement, and thermal radiation (36) is applied to the transition area wetted by the liquid meniscus in the drying step.

Abstract: An exemplary system for removing soil from seed comprises an auger portion, a centrifuge portion and/or a dryer portion. The auger portion comprises an inclined enclosure and an auger positioned within the enclosure and is configured to mix seed with a liquid, remove soil from the seed, and separate washed seed from the liquid and the removed soil. The centrifuge portion comprises at least one centrifuge having an outer drum and a rotatable inner basket positioned within the outer drum. The inner basket comprises a side wall having a plurality of apertures. The inner basket is configured to receive washed seed from the auger portion within the inner basket and to centrifugally separate additional liquid from the washed seed, the separated liquid passing through the plurality of apertures into the outer drum. The dryer portion further reduces moisture content of the seed using heat.

Abstract: Disclosed is a method for cleaning solar panels by means of a washing apparatus (1) which can be displaced on the solar panel (2) and applies rinsing water to the surface of the solar panel (2) and washes the surface with the help of washing nozzles and/or brushes. The washing apparatus (1) embraces the solar panel (2) in the edge region in such a way that the washing apparatus (1) is guided in a longitudinally movable way directly on the solar panel (2).

Abstract: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials are to pass. Each said location being provided for receipt of a predetermined used material. A descending path (25) extends from each said location and provides for the transfer of used material from the respective location successively through the chambers. The chambers include a sensing chamber (30) downstream of said locations and having sensing means (35) operable to sense the composition of used material located within said sensing chamber. The sensing means being operable to activate an alarm if the used material has been placed by a user in an opening for receipt of a different material.

Abstract: A foreign matter removal device 10 preliminary cleans the work 50 in a bucket 12 housed in an input tank 15, then further cleans the work 50 in buckets 13, 14 housed in cleaning tanks 16, 17 by agitating cleaning liquid while inverting the buckets to transfer the work to a subsequent bucket. Particularly, the bottom of the cleaning tank is formed such that the nearer to a center of the bottom, the deeper the bottom becomes. The cleaning liquid overflowing from the cleaning tanks are stored in auxiliary tanks 22, 23. First and second ejection units 29a, 29b are arranged at different heights in the cleaning tank to generate a circulating flow in the cleaning liquid.

Abstract: An apparatus includes a wafer stage configured to secure a wafer; and a cleaning module including a tank adjacent to the wafer stage, and is positioned outside the region occupied by the wafer. The cleaning module is configured to receive de-ionized (DI) water into the tank and extract the DI water out of the tank. The tank is configured to hold DI water with a top surface of the DI water substantially level with a top surface of the wafer.

Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

Abstract: The invention relates to a dishwasher comprising a tub in which utensils and the like are received for cleaning by the spraying of liquid, such as a wash liquid, within the tub, with a sequester located within the tub to sequester the particles removed from the utensils by the liquid and that remain in the tub near a drain outlet.

Abstract: Mutually different plural kinds of processing liquid are sequentially supplied to a gap space in which a substrate is arranged to perform a wet processing to the substrate with respect to each processing liquid. Further, the processing liquid used in the wet processing is sequentially released from the communicating portion upon execution of each wet processing. The liquid retrieval tanks are selectively positioned at a retrieval position corresponding to the kind of processing liquid released from the communicating portion by relatively moving the processing unit and the liquid retrieval unit. The liquid retrieval unit is separated from the processing unit and is arranged below the processing unit. The processing liquid is released from the communicating portion of the processing unit to below the gap space downwards vertically.

Abstract: Disclosed is a liquid treatment apparatus capable of effectively exhausting processing liquid atmosphere around a target object. The liquid treatment apparatus includes a container, a support part located within the container that supports the target object, a rotation driving mechanism to rotate the target object supported by the support part, a processing liquid supply mechanism to supply a processing liquid to the target object, and a rotation cup, which is located outside of the outer circumference of the target object and is rotatable together with the support part. A rotation exhaust cup is arranged above the rotation cup and is rotatable together with the rotation cup. A discharge mechanism discharges processing liquid atmosphere guided by the rotation cup and the rotation exhaust cup.

Abstract: A processing assembly for a semiconductor workpiece generally includes a rotor assembly capable of spinning a workpiece, a chemistry delivery assembly for delivering chemistry to the workpiece, and a chemistry collection assembly for collecting spent chemistry from the workpiece. The chemistry collection assembly may include a weir that is configured to spin with the rotor assembly. A method of processing a semiconductor workpiece is also provided.

Abstract: A self-contained, mobile system for cleaning trash receptacles. The system comprises a water system and a lift system that work in conjunction with each other to provide an automated method for cleaning trash receptacles.

Abstract: The invention comprises an apparatus for washing, storing and transporting concrete wastewater washed from concrete conveying chutes associated with a concrete mixing truck. The apparatus comprises a fluid container having a first opening and a pair of arms extending upwardly above the container. Each end of the arms distal from the container is adapted to mate with a first end of a first concrete chute member and to removably retain the first concrete chute member such that a second end of the first concrete chute member is higher than the first end and the first end is disposed above the first opening in the fluid container. The container is attachable to a concrete mixing truck such that a second concrete chute member attached to the concrete mixing truck can be positioned above the first concrete chute member while the first concrete chute member is mated with the arms. A method of using the apparatus is also disclosed.

Abstract: Embodiments of an appliance for washing objects are described in which the appliance utilizes line pressure of a fluid supply to fill the appliance with a washing fluid, wherein the washing fluid is dispersed onto objects in the appliance before the washing fluid is captured in the enclosure. In one embodiment, the appliance comprises a fill element, which receives the washing fluid directly from a fluid inlet. The fill element comprises an array of spray jets, which are arranged to disperse the washing fluid into the enclosure.

Abstract: A warewash machine sump collects hot cleaning water that is recirculated in the chamber during cleaning. A drain line is for draining cleaning water from the sump. A fresh water input system includes at least a hot water input and a cold water input. The fresh water input system has a common input line in communication with the hot water input and the cold water input. A cold water input valve and hot water input valve are provided. The drain line and the common input line are arranged in a heat exchange relationship. A temperature sensor arrangement is associated with the drain line for determining temperature of the cleaning water traveling through the drain line. A controller controls the hot water input valve and cold water input valve based upon the temperature sensor arrangement output.

Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete hole connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.

Abstract: A system for cleaning a container may include: a fluid source; an arm that moves a nozzle in at least two directions; a fluid retrieval device; a separator; and a fluid mover. One method for cleaning includes securing an arm to a support positioned at least partially outside of the container; spraying a fluid onto an inner surface of the container using the nozzle; drawing the fluid and an entrained material out of the container using the fluid retrieval device; removing at least some of the entrained material from the fluid using the separator; and conveying the fluid from the separator to the nozzle using the fluid mover. The arm and/or the fluid retrieval device may be remotely installed.

Abstract: A dishwasher includes a tub and a bottom assembly disposed below the tub and including at least one fluid collection apparatus having a main reservoir with a fluid overflow safety unit and at least one additional intermediate reservoir for collecting leakage and/or overflow fluid from the tub and/or at least one fluid-conducting component. The additional intermediate reservoir is disposed and configured such that solid particles contained in the leakage and/or overflow fluid can largely be deposited and/or retained in the at least one additional intermediate reservoir. The additional intermediate reservoir is connected to the main reservoir by at least one run-off to conduct fluid out of the additional intermediate reservoir into the main reservoir when a predetermined fill level top limit in the additional intermediate reservoir is exceeded, with the run-off having a gradient from the intermediate reservoir to the main reservoir.

Abstract: The invention can firmly and easily remove a finely divided weft piece without leaving the weft piece by constituting a method and an apparatus of removing weft from a cord fabric for a topping sheet in a calender line for topping rubber on a number of pieces of aligned cords by a calender roll. In the midst of transferring a cord fabric (F) transferred to a calender apparatus, weft is finely divided by passing the cord fabric (F) through weft dividing means, thereafter, a plurality of blades (45) arranged movably in a width direction on an upper face side of the cord fabric (F) are reciprocally moved in the width direction over an entire width thereof to be brought into contact with the cord fabric (F), and the divided weft piece (W1) is wiped off to remove by respectively striking respective cords (C) of the cord fabric (F) by the respective blades (45).

Abstract: There is here disclosed a resin pellet store device including a silo (1) in which resin pellets are stored; an discharge route for ON-SPEC products (2) through which resin pellets having a low content of foreign substances stored above the vicinity of the lowermost part in the silo (1) are discharged as ON-SPEC products from the silo (1); and another discharge route for OFF-SPEC products (3) through which resin pellets having a high content of foreign substances accumulated in the vicinity of the lowermost part in the silo (1) are discharged as OFF-SPEC products from the silo (1). In consequence, the resin pellets having a high content of foreign substances to be treated as the OFF-SPEC products are clearly sorted out in the silo and discharged therefrom to reduce the content of the foreign substances in the ON-SPEC products. Moreover, the OFF-SPEC products are discharged through another route to avoid the contamination of a downstream facility.

Abstract: A substrate treatment device including a cleaning chamber that is capable of decreasing a thick waste solution from the chamber, and improving use efficiency of a diluted waste solution from the chamber. The chamber supplies a cleaning solution onto a front surface of a chemical-treated substrate being transferred tilted toward its back surface side at some degrees to the upright by a cleaning-solution discharge unit. The chamber is partitioned into rough and fine cleaning chambers (103) (104) at upstream and downstream sides, each having vents on bottom walls, with a partition standing on the bottom wall, the rough chamber including a gutter (112) collecting the solution discharged from the discharge unit and falling down without being supplied onto the front surface, the gutter inclined down toward the fine chamber and having a vent draining the solution flowing therethrough, the gutter's vent approaching the fine chamber across the partition.

Abstract: A compact robotic wash system is provided for cleaning a work piece. The robotic wash system includes an enclosed wash chamber. A robot is fully disposed inside the wash chamber. The robot has a maximum horizontal reach that is at least 40% of the maximum horizontal linear dimension of the wash chamber. The robot may hold a work piece and move the work piece around a plurality of spray devices. Alternately, the robot may hold one or more spray devices, while a work piece is supported on a movable table.

Abstract: The present disclosure provides a system for in-situ spectrometry. The system includes a wafer-cleaning machine that cleans a surface of a semiconductor wafer using a cleaning solution. The system also includes a spectrometry machine that is coupled to the wafer-cleaning machine. The spectrometry machine receives a portion of the cleaning solution from the wafer-cleaning machine. The portion of the cleaning solution collects particles from the wafer during the cleaning. The spectrometry machine is operable to analyze a particle composition of a portion of the wafer based on the portion of the cleaning solution, while the wafer remains in the wafer-cleaning machine during the particle composition analysis.