Abstract: A wafer cleaning method is provided. The wafer cleaning method includes providing a wafer on a stage that is inside of a chamber. The wafer is fixed to the stage by moving a grip pin connected to an edge of the stage. First ultrapure water is supplied onto the wafer while the wafer is rotating at a first rotation speed. The grip pin is released from the wafer by moving the grip pin. A development process is performed by supplying liquid chemical onto the wafer while the wafer is rotating at a second rotation speed that is less than the first rotation speed.

Abstract: A nozzle apparatus may comprise a nozzle body having a nozzle tip with a discharge port for spraying a treatment fluid onto a substrate; a nozzle moving member for moving the nozzle body relative to the substrate; a rotating member for rotating the nozzle body or the nozzle tip so that a treatment fluid is sprayed onto the substrate during rotation; and a control unit configured to control an operation of the nozzle moving member and the rotating member.

Abstract: The present invention provides a cleaning method and equipment thereof for object FOUP, comprising the following steps: firstly separating the object FOUP into a container lid and a container body, then conducting individual processes of wet washing, liquid removing and vacuum drying for the container lid and container body, and in the end combining the container lid and container body to complete the cleaning procedure of the object FOUP; specifically, during the liquid removing process, multiple wind knives are used to carry out liquid removing for the container body, and during the vacuum drying process after liquid removing, multiple thermal components are used to carry out vacuum drying for the container body under a vacuum environment; moreover, the present invention also includes the cleaning equipment to execute the above method, for the purpose of overcoming the problem that the wet cleaning process in the conventional automatic chip FOUP cleaning technique cannot effectively clean object FOUPs with

Abstract: Various embodiments of a spray measurement system having a jig device that allows measuring spray output of one or more spray nozzles and determine spray distribution patterns of the spray nozzles are disclosed.

Abstract: A powered circular stapling device (10) includes a transfer switch assembly (90) for a transmission assembly (40) to selectively direct power between clamping and firing mechanisms of the stapling device (10). The transfer switch assembly (90) includes a carriage (92), a worm gear assembly (94), and first and second biasing mechanisms (96). The worm gear assembly (94) is supported on the carriage (92) and movable in relation to the carriage (92) to allow the worm gear assembly (94) to engage with a first or second gear (44, 46) of the transmission assembly (40). The biasing mechanisms (96) allow the worm gear assembly (94) to move in relation to the carriage (92) when the gear teeth of the worm gear (94) are misaligned with the gear teeth of one of the first and second gears (44, 46) of the transmission assembly (40), to allow the gear teeth of the worm gear (94) to move into alignment with the gear teeth of the other one of the first and second gears (44, 46) of the transmission assembly (40).

Abstract: A method includes performing a first post Chemical Mechanical Polish (CMP) cleaning on a wafer using a first brush. The first brush rotates to clean the wafer. The method further includes performing a second post-CMP cleaning on the wafer using a second brush. The second brush rotates to clean the wafer. The first post-CMP cleaning and the second post-CMP cleaning are performed simultaneously.

Abstract: There is disclosed a system and methods for debriding soft tissue from bone using a high-pressure water debridement system. One embodiment includes a cylindrical sleeve bounded by endcaps and having a drainage port positioned for effluent drainage. A central shaft is configured to receive a bone segment and is disposed along a longitudinal center of the sleeve and rotatively coupled between the endcaps. At least one high-pressure water nozzle is disposed on each side of the sleeve, each of which is positioned to impact the bone segment with a high-pressure water stream. A rotational actuator is configured to rotate the central shaft and the bone segment relative to the sleeve and the water nozzles such that when the high-pressure water nozzles are operational, the high-pressure water streams debride the bone segment. Other embodiments are also disclosed.

Abstract: A system and method for cleaning a sintered filter includes a cleaning fluid source and a cleaning nozzle. The cleaning nozzle includes an inlet end coupled to the cleaning fluid source and at least one outlet port for outputting the cleaning fluid injected through the cleaning nozzle. The outlet port is disposed proximate to an outlet end of the cleaning nozzle. The cleaning nozzle has an external width less than an internal width of the sintered filter to be cleaned. The cleaning nozzle has a nozzle length greater than a full depth of the sintered filter to be cleaned. The outlet port can be disposed in a side of the cleaning nozzle proximate to the outlet end of the cleaning nozzle. The outlet port can include more than one outlet ports.

Abstract: In one embodiment, a substrate handling robot includes a robot body, a robot arm mounted to the robot body, and an end effector mounted to the robot arm. The end effector includes first and second fingers each having one or more pins protruding therefrom, and a first motor for axially rotating the first finger. At least one pin of the first finger and one pin of the second finger are configured to mate with corresponding holes in the substrate. Rotation of the first finger imparts a tensional force to the substrate, suitable for reducing sag in ultra-thin substrates on the order of 20 to 800 microns. In certain embodiments, both fingers are rotatable, synchronously or independently. In certain embodiments, rotation is replaced by translational or pivoting planar motions, also imparting tensional force to the substrate.

Abstract: An apparatus and method for loading a plurality of substrates into a substrate holder in a loading chamber of a deposition reactor to form a vertical stack of horizontally oriented substrates within said substrate holder, for turning the substrate holder to form a horizontal stack of vertically oriented substrates, and for lowering the substrate holder into a reaction chamber of the deposition reactor for deposition. The technical effects achieved are: a top loading system for a vertical flow deposition reactor in which the substrates can be loaded with horizontal orientation, eliminating the need for flipping each substrate separately by flipping the whole substrate holder and minimizing a loading distance in a reactor cluster.

Abstract: A dishwasher rack includes a frame and a support rail disposed along sides of the frame. A plurality of cutlery baskets are coupled to the rail. Each cutlery basket is movable from a respective first location on the rail to a respective second location on the rail. The cutlery baskets may be removable to enable a user to adjust a ratio of cutlery storage area to crockery storage area as desired. Also, the cutlery baskets may be arranged to revolve along a perimeter of the rack so that a user can load empty baskets at the same location.

Abstract: A system for automated collection of cutting samples produced during the drilling of a well includes an automated valve system for periodically collecting samples including fluid and cuttings from a flow line from a drilling rig and a packaging system for packaging each sample collected from the flow line. The packaging system deposits each sample received from the valve system at a corresponding point along a moving elongated strip of base material, covers the elongated strip of base material and samples deposited on the base material with a strip of cover material, and advances the covered elongated strip of base material and covered samples onto a reel.

Abstract: An automatic analysis device in which a probe is washed in a short period of time and the amount of washing water which may be mixed in at the time of suctioning of a succeeding liquid can be decreased. Washing water is supplied to a throttle portion of a washing tank from a washing nozzle. A reagent probe is inserted into the washing tank. Washing of the outside of the reagent probe, washing of the throttle portion, and a washing operation for the inside of the reagent probe are performed while a lowering operation of the reagent probe is performed. The automatic analysis device is configured to perform a drying operation by using vacuum nozzles even when the reagent probe is lifted, and thus, washing and drying operations of the reagent probe can be sped up and can be performed in a short period of time.

Abstract: A salad spinner includes a lid with openings to allow water to pass through the lid and into the bowl, or from the bowl out through the lid. The bowl includes openings on a bottom portion of the bowl to allow water to pass through the bottom of the bowl. A removable cover allows the bottom portion of the bowl to be selectively sealed.

Abstract: A mounting system includes retaining bars which are structurally independent of one another, which can be optionally directly disconnected and directly connected relative to a support device through coupling devices that are activatable and deactivatable without tools. Using the mounting system, a method for charging a treatment device can also be carried out, with which the retaining bars are directly connected to a first support device, and following this, the retaining bars are directly connected to a second support device, in particular a rotor that is arranged in the treatment device. Following that, the mechanical connection between the first support device and the retaining bars is directly disconnected.

Abstract: A high pressure nozzle manipulator includes a wheeled chassis, a pair of parallel manipulator elevator rails supported by an elevator rail rotator fastened to the chassis, a horizontal extensible arm rail disposed between and carried by the manipulator elevator rails, a rotary actuator fastened to a distal end of the horizontal extensible arm rail, and a linear actuator fastened between the first rotary actuator and a hinged nozzle support bracket. This bracket holds a high pressure cleaning nozzle. The linear actuator is configured to rotate the nozzle and the bracket through an arc. The elevator rail rotator is configured to rotate the elevator rails through an arc of about 180 degrees about a horizontal axis. The rotary wrist actuator is configured to rotate the hinged nozzle support bracket about a horizontal axis through the extensible arm rail.

Abstract: The present disclosure relates to a dishwasher, including a washing tub configured to provide a space for washing dishes; a supply tube configured to supply water into the washing tub; a motor configured to rotate the supply tube; a detachable rotating member in, on, attached to, or at an end of the supply tube, that rotates and interfaces with the supply tube; and a spin-dry tub on the rotating member, that rotates with the rotating member and spin-dries an object inside the spin-dry tub. Accordingly, a separate spin-dry function is added to the dishwasher, thereby maximizing spatial efficiency and hygienically and conveniently performing a spin-dry cycle or operation.

Abstract: A multiple stage processing device having a plurality of radial stages, each individual radial stage is positioned between adjacent dividing walls and indexable though a plurality of processing stations. A plurality of fixture mount assemblies are positioned on an actuation surface of the rotatable indexing assembly, each individual fixture mount assembly is associated with and mechanically coupled to an individual radial stage. One or more slotted drive hubs communicatively coupled to independently operable drive motors are positioned adjacent to the actuation surface of the rotatable indexing assembly and are engageable with the plurality of fixture mount assemblies.

Abstract: Machine (10) and method for treating containers (12) of liquids comprising in succession at least a loading station (15), into which the containers (12) to be treated are loaded, and all disposed according to a determinate first orientation, and a washing station (17), in which the containers (12) are subjected at least to washing and are disposed in a second orientation able to promote the fall due to gravity of the dirt and/or washing liquid present in the containers (12). The machine (10) comprises, downstream of the washing station (17) and outside it, a manipulator device (41) which automatically rotates the containers (12) exiting form the washing station (17) so as to reposition the containers (12) according to the first determinate orientation.

Abstract: A cleaning apparatus for a power driven buffing pad includes a wash plate mounted in a cleaning solution reservoir that provides agitating and cleaning contact with the pad mounted on an operating driver. The wash plate can be reciprocated vertically by the operator against a biasing arrangement to operate a pump to deliver cleaning solution from the reservoir to the face of the pad in contact with the wash plate.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be an mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be a mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: An exemplary cleaning apparatus includes a cleaning member, a connecting member, a drying member, and a workpiece holder. The connecting member includes a main housing defining two opposite surfaces and two blocks received in the main housing. The main housing defines a first chamber and two second chambers communicating with the first chamber, each of the second chambers extending through to one of the two opposite surfaces and near to the other opposite surface. The cleaning member and the drying member are connected to the two opposite surfaces and communicate with each other via the first chamber. The two blocks are movable between the first chamber the second chambers, respectively. Each block defines an engaging surface, facing the other engaging surface. When the blocks move into the first chamber and the engaging surfaces engage with each other, the blocks shut off communication between the cleaning member and the drying member.

Abstract: A dishwasher (100) for pot washing, comprising a detector (160) for automatically detecting what type of washing basket (140) has been placed in the dishwasher (100). This enables automatic selection of water pressure and granule control, such that more sensitive crockery and plates are not damaged. The detector can be an inductive sensor (160) that detects an indicating member (141) of the washing basket. The washing basket can comprise one or several indicating members, for enabling a more reliable detection. A method of operating such a dishwasher (100) comprises the steps of automatically detecting what type of washing basket (140) is placed in the dishwasher, and then controlling the water pressure and granule addition according to what washing basket was detected. A system comprises an above dishwasher and an above washing basket.

Abstract: A washing device that may include a conveyor frame having a carousel shape with a plurality of carrier sections along an outside section of the conveyor frame. The conveyor frame may rotate to transport at least one object through at least one processing station along a circular path. A first processing station may be positioned along the circular path. In certain embodiments, a second processing station may be positioned further along the circular path. The processing stations may include a washing station and a drying station. The object may be a tote container.

Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: The invention relates to a method for cleaning filters (22) which are designed as solid bodies having pores and/or having channels which are open towards the surface, by blasting using a blasting medium, characterised in that the blasting medium is gaseous and contains solid or liquid blasting agents, if appropriate in the form of substances having a boiling point of no more than 140° C., the blasting medium is accelerated in a jet nozzle (16, 18) so that it strikes the filter (22) at least at almost the speed of sound, and during blasting the filter (22) is disposed in front of an intake opening (34, 34?) which draws in the blasting medium as well as ambient air.

Abstract: A device and system for thin wafer cleaning is disclosed. A preferred embodiment comprises a spin chuck having at least three holding clamps. A thin wafer with a wafer frame is mounted on the spin chuck through a tape layer. When the holding clamps are unlocked, there is no interference with the removal and placement of the wafer frame. On the other hand, when the holding clamps are locked, the holding clamps are brought into contact with the outer edge of the wafer frame so as to prevent the wafer frame from moving laterally. Furthermore, the shape of the holding clamps in a locked position is capable of preventing the wafer frame from moving vertically.

Abstract: A bottle cleaner that inverts the bottles to spray solutions into them. The bottles invert and receive, for example, a spray of a cleaning solution. The cleaner then returns the bottles to the upright orientation. Each pass of the bottles utilizes two sets of linked grippers arranged as a chain. One chain contacts the bottles on one side while the second chain contacts them on the other side. The two chains squeeze the bottles between them to firmly hold them. A single adjustment sets a uniform distance between the two chains of each path through the cleaner at four different locations, and the same adjustment equalizes the distances between the two chains of the two paths so that they will effectively retain the same bottles through two passes through the machine. Four motors running at the same speed keep the chains moving together.

Abstract: A semiconductor wafer treating apparatus comprising a housing, holding means rotatably disposed within the housing, rotating means for rotating the holding means, and cleaning means for cleaning a semiconductor wafer held on the holding means. Irradiation means for irradiating the semiconductor wafer held on the holding means with short wavelength ultraviolet radiation is further disposed in the semiconductor wafer treating apparatus.

Abstract: A vibrating and ultrasonic washer which is composed of a case externally provided with a cover and a switch button, and interiorly provided with control circuits, a UV sterilizing light and a vibration device; wherein the vibration device includes pluralities of support mats, a vibration motor and/or at least an ultrasound generator and a washing tank; the vibration motor and/or at least one ultrasound generator is/are provided on a base board and controlled by the control circuits; the base board is connected into the case via the pluralities of support mats; the washing tank is stacked on the base board; thereby the articles to be washed can be put in the washing tank to accomplish cleaning and sterilizing purposes via the vibration waves and/or ultrasound.

Abstract: A pad washing system is provided. This system includes a filter device that further includes: a filter component having a textured top surface and at least one baffle formed on the underside thereof; a filter support apparatus adapted to receive the filter device, wherein the filter support apparatus further includes: a base, a plurality of vertical support columns formed integrally with the base, a plurality of caps mounted on top of the vertical columns, and a plurality of biasing members disposed between the caps and the tops of the vertical columns; a bucket for receiving both the filter device and the filter support apparatus; a threaded rim attached to or formed integrally with the top edge the bucket; and a splash guard mountable within the threaded rim.

Abstract: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.

Abstract: An apparatus and method, as shown in FIG. 1, for cleaning barrels (3) by blasting with cryogenic abrasive media through a nozzle (2). The nozzle (2) translates along rail (4) while barrel (3) rotates to completely clean barrel (3). The apparatus provides automated means for blasting barrels (3).

Abstract: A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and around this edge onto the second surface, the liquid wetting a defined section near the edge on the second surface and thereupon being removed from the wafer-shaped article.

Abstract: The present invention generally provides an apparatus and method for processing and transferring substrates in a multi-chamber processing system that has the capability of receiving and performing single substrate processing steps performed in parallel, while using the many favorable aspects of batch processing. Embodiments of the invention described herein are adapted to maximize system throughput, reduce system cost, reduce cost per substrate during processing, increase system reliability, improve the device yield on the processed substrates, and reduce system footprint. In one embodiment, the cluster tool is adapted to perform a wet/clean process sequence in which various substrate cleaning processes are performed on a substrate in the cluster tool.

Abstract: Embodiments of the present invention generally relate to an apparatus and a method for cleaning a semiconductor substrate after a polishing process. Particularly, embodiments of the present invention relates to an apparatus and method for cleaning a substrate using pressurized fluid. One embodiment of the present invention comprises two rollers to support and rotate a substrate in a substantially vertical orientation, a pressure wheel to apply a force to engage the substrate with the two rollers, and a swinging nozzle configured to dispense a pressurized fluid towards the substrate.

Abstract: A cleaning device for cleaning a drive chain has a shaft, a motor for rotatably mounting the shaft, and a mounting element for mounting the motor such that the shaft is generally horizontal. A sprocket is mounted on the shaft with a wing nut such that the sprocket rotates with the shaft. The sprocket has teeth for engaging the drive chain. The cleaning device is adapted to be mounted over a container of a cleaning fluid for cleaning the drive chain.

Abstract: A warewash machine includes a housing defining at least one area for spraying liquid on wares. A conveyance mechanism is provided for moving wares through the housing from an input end to an output end of the housing. A drive system drives the conveyance mechanism. The drive system includes a drive motor (200) having an output shaft and a slip clutch assembly (202) connected between the output shaft and the conveyance mechanism. The slip clutch assembly (202) includes a torque input side, a torque output side, and an adjustment member (250) positionable in either a first orientation that sets a first pre-i selected slip clutch torque limit or a second configuration that sets a second pre-selected slip clutch torque limit that is different than the first pre-selected slip clutch torque limit.

Abstract: A washing device of a substrate for a magnetic recording medium of the present invention includes an immersion tank; a plurality of screw conveyors that are provided in the immersion tank and that hold the substrates for a magnetic recording medium; and a rotation mechanism that causes synchronous rotation of and supports the plurality of screw conveyors, wherein both ends of main shafts of the screw conveyors are provided outside of the immersion tank, the main shafts of these screw conveyors penetrate the tank walls of the immersion tank in a non-contact manner, and the plurality of substrates for a magnetic recording medium that are held by the plurality of screw conveyors are washed by a wet process using a washing liquid that is contained in the immersion tank.

Abstract: An apparatus for covering and cleaning a cylindrical paint roller pad includes a painting shield having a semi-cylindrical side wall; mounting means for rotatably mounting the pad so that the painting shield side wall is spaced from a first segment of the pad side wall with the longitudinal axis of the pad is coincident with the axis of curvature of the painting shield side wall; a rinse shield rotatable between a closed position substantially beneath the painting shield side wall and an extended position spaced from a second segment of the roller outer surface, the shields being spaced to form a water discharge gap when the rinse shield is in its extended position; and a water manifold to direct water against the pad. The mounting means may be a spindle with a secured handle, or a separate handle attachable to the painting shield.

Abstract: A paint brush cleaning apparatus having a rod with a first end portion spaced apart from a second end portion and a paint brush holder having a securement member for releasably securing a paint brush thereto. The rod having a longitudinal axis about which the rod and paint brush holder may rotate. An electric drill may be used in connection with the paint brush cleaning apparatus, with the first end portion typically sized and shaped to engage a drill bit receiving chamber of the electric drill. A protective sheet adapted to protect users from flying paint during the cleaning process may also be employed.

Abstract: A cooking apparatus including a cooking appliance mounted over a sink basin so that the cooking appliance can be rinsed into the sink. The cooking appliance can preferably be raised vertically, from a lowered position where the base of the cooktop is seated into the sink basin to a raised position where the sides and bottom of the cooking appliance are easily accessible for cleaning or service. A hot water connection is preferably mounted so as to be able to provide water to both the sink basin and the exterior surfaces of the cooking appliance.

Abstract: A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transferring substrates one-by-one between the index unit and the processing unit. The transfer device includes a transfer block, and an index arm and a transfer arm unit supported by the transfer block. The transfer block is movable in the transfer space to position the index arm or the transfer arm unit in front of a cassette or a spin scrubber. The index arm loads/unloads substrates into/from a cassette mounted to the index unit. The transfer arm loads/unloads substrates into/from the processing unit. All of the movement takes place in the transfer space. Thus, the apparatus is compact, and it takes relatively little time to clean the substrates.

Abstract: The invention provides a cleaning apparatus which can remove an organic material for an organic EL element attaching to a mask made of a thin metal film. The cleaning apparatus of the invention includes first and second cleaning tanks cleaning a mask with a predetermined cleaning solution at room temperature, first and second rinse tanks rinsing the mask with a predetermined rinse solution at room temperature, and a carrying device holding the mask at a predetermined angle other than horizontally and carrying the mask held at the predetermined angle to the first and second cleaning tanks and the first and second rinse tanks without damage occurring to the thin metal film of the mask by stress caused by gravity. The carrying device holds the mask horizontally at first, stands up in a vertical direction while holding the mask to hold the mask at the predetermined angle.

Abstract: A substrate processing apparatus includes a photosensor for detecting the presence/absence of a substrate in each place within a carrier cassette, a pair of processing tanks for performing the same process at the same time, and a supply mechanism for supplying a processing solution to the processing tanks independently. The number of substrates is detected in accordance with the result of the detection of the photosensor. If the number of substrates detected is not greater than an allowable number for one of the processing tanks, the processing solution is supplied to only the one processing tank to perform the process. This reduces the consumption of the processing solution in a batch process.

Abstract: A device for cleaning contact lenses comprising a solution chamber and a motor (4) adapted to impart a reciprocating and vibrational motion to a contact lens holder (3). The contact lens holder (3) is adapted to receive one or more contact lenses, which holder, in use, is for insertion in the solution chamber (2), the holder (3) being adapted to permit fluid flow to the contact lens or lenses. The holder has first and second baskets (34,36) each adapted to receive a contact lens, which lens has an inner and an outer surface, the first and second baskets being oriented such that, in use, the respective inner surfaces of the contact lenses are remote from one another. In use, the reciprocating and vibrational motion imparted to the contact lens holder (3) generates bubbles in a solution in the solution chamber (2), which bubbles contribute to fluid turbulence at a surface of the contact lens, thereby assisting in the cleaning of the lens.

Abstract: A cluster tool includes a transfer chamber connected to a plurality of vacuum chambers. An additional process chamber connected to the transfer chamber includes a high pressure chamber assembly seated on a housing. The high pressure chamber assembly, which is adjustable between an open position and a closed position, includes an upper chamber portion and a lower chamber portion. Hydraulic cylinders mounted on the upper chamber portion and having chamber rods that attach to the lower chamber portion are configured to move the lower chamber relative to the upper chamber portion between the two positions. When the two portions are brought together into the closed, the high pressure chamber assembly forms a high pressure chamber suitable for processing wafers with supercritical CO2. Once the high pressure chamber is formed, a region between lower chamber portion and a housing may be evacuated to form a vacuum chamber outside a portion of the high pressure chamber.

Abstract: The apparatus includes a housing having a centrally disposed longitudinal axis situated along a horizontal plane during operating conditions. The housing further has a monolithically formed flange portion extending orthogonally therefrom. The flange portion has a plurality of slots formed therein. A plurality of coextensive and independently pivotal leg members directly conjoined to the housing and the flange portion in such a manner that the apparatus can conveniently be supported at an elevated position above a ground surface during operating conditions. A rectilinear bracket has opposed end portions pivotally and directly connected to the flange portion and one of the leg members respectively. A mechanism is included for agitating a tissue valve in a saline solution.