Abstract: Methods and systems for a monitoring system for data collection in an industrial environment including a data collector communicatively coupled to a plurality of input channels connected to data collection points related to machine components, wherein at least one of the plurality of input channels is connected to a data collection point on a rotating machine component; a data acquisition circuit structured to interpret a plurality of detection values from the collected data, each of the plurality of detection values corresponding to at least one of the plurality of input channels; and an expert system analysis circuit structured to analyze the collected data, wherein the expert system analysis circuit determines a failure state for the rotating machine component based on analysis of the plurality of detection values, wherein upon determining the failure state the expert system analysis circuit provides the failure state to a data storage.

Abstract: Methods and systems for a monitoring system for data collection in an industrial environment including a data collector communicatively coupled to a plurality of input channels connected to data collection points related to machine components, wherein at least one of the plurality of input channels is connected to a data collection point on a rotating machine component; a data acquisition circuit structured to interpret a plurality of detection values from the collected data, each of the plurality of detection values corresponding to at least one of the plurality of input channels; and an expert system analysis circuit structured to analyze the collected data, wherein the expert system analysis circuit determines a failure state for the rotating machine component based on analysis of the plurality of detection values, wherein upon determining the failure state the expert system analysis circuit provides the failure state to a data storage.

Abstract: A flow management system includes an adjustable compactor configured for attachment to a wall surface of a conduit and being adjustable between an extended configuration and a reference configuration, an electric actuator in fluid communication with the adjustable compactor, and a control module. The control module is configured to control the electric actuator to flow a current to the adjustable compactor to generate an electric field that causes extension of the adjustable compactor for compacting a flow blockage within the conduit to create a channel adjacent the flow blockage and to terminate a flow of the current to remove the electric field at the adjustable compactor to cause the adjustable compactor to return to the reference configuration for opening the channel to a fluid flow within the conduit.

Abstract: Provided is a method for operating a device for shaping plastic preforms to form plastic containers, wherein the device has a movable support on which a plurality of shaping stations for shaping plastic preforms to form plastic containers are arranged, and these shaping stations each have blow molds that are suitable for and intended for molding the plastic preforms and are arranged at least indirectly on blow mold supports. The blow molds are kept at least temporarily in a magazine device, wherein this magazine device is suitable for and intended for receiving several sets of blow molds.

Abstract: A dishwasher (100) is disclosed. The dishwasher (100) includes a washing tub (130) for defining a washing space, a rack (200) provided in the washing tub (130) so as to be withdrawn from the washing tub (130) for receiving dishes, and a plurality of spraying units (132, 133, 134) for spraying wash water to the rack (200). The rack (200) includes an outer edge rib (210) for defining a space in which dishes are loaded, a variable space loading unit (240) upwardly and downwardly movably provided at the inside of the outer edge rib (210), and a lifting unit (250) provided at the outer edge rib (210) for upwardly and downwardly moving the variable space loading unit (240) to decrease and increase the loading space of the variable space loading unit (240).

Abstract: An automated contact lens cleansing device configurable for performing a plurality of cleansing cycles having different characteristics. The device includes a storage unit configured for storing a cleansing solution. The cleansing device also include a first solution transfer line that, during operation of the device, transfers the cleansing solution from the solution storage unit to a reservoir, as well as a second solution transfer line that, during operation of the device, transfers the cleansing solution from a reservoir to a drain. During operation, the reservoir houses the contact lens for at least one cleansing cycle. The device also includes one or more memories storing instructions to perform at least one of the plurality of cleansing cycles and a processor that, when executing the stored instructions, controls at least one of the first solution transfer line, the second solution transfer line, and the housing for the at least one cleansing cycle.

Abstract: The present invention relates to a laundry treating apparatus having a washable filter provided on an air circulation conduit for drying laundry. Disclosed is the laundry treating apparatus that is capable of automatically or manually washing the filter. The laundry treating apparatus, according to the present invention, comprises: a cabinet (1); an outer tub (2) disposed within the cabinet (1); an inner tub (3) rotatably disposed within the outer tub (2); a circulation conduit (10) that serves as a guide to allow at least a part of air within the outer tub (2) to be discharged from the outer tub (2) and supplied back to the outer tub (2); a fan (17) disposed on the circulation conduit (10) to move air; a filter net (22) disposed on the circulation conduit (10) to filter foreign substances included in the moving air; a filter frame (24) that supports the filter net (22); and a nozzle (32) that sprays water to remove the foreign substances filtered by the filter net (22).

Abstract: Provided is a substrate liquid processing apparatus includes a processing liquid flow path through which a processing liquid flows; a cleaning fluid supply unit that supplies a cleaning fluid into the processing liquid flow path to thereby clean at least a part of the processing liquid flow path; a heater that heats the processing liquid; and a controller that controls the cleaning fluid supply unit and the heater. The controller controls the heater to heat the processing liquid to a temperature higher than a temperature at which crystallization is caused by a reaction between the processing liquid and the cleaning fluid, such that the heated processing liquid is supplied into the processing liquid flow path which retains the processing liquid of the temperature at which crystallization is caused by the reaction, and then controls the cleaning fluid supply unit to supply the cleaning fluid into the processing liquid flow path.

Abstract: A device for processing wafer-shaped articles comprises a closed process chamber that provides a gas-tight enclosure. A rotary chuck is located within the closed process chamber. A heater is positioned relative to the chuck so as to heat a wafer shaped article held on the chuck from one side only and without contacting the wafer shaped article. The heater emits radiation having a maximum intensity in a wavelength range from 390 nm to 550 nm. At least one first liquid dispenser is positioned relative to the chuck so as to dispense a process liquid onto a side of a wafer shaped article that is opposite the side of the wafer-shaped article facing the heater.

Abstract: A small automatic polishing liquid cleaning device for rigid gas permeable contact lens includes a container; a containing chamber is provided inside the container; an exhaust pipe, and a liquid suction pipe, which communicates with the containing chamber disposed on the container; an outlet end of the exhaust pipe communicates with a vacuum orifice of a vacuum generator via a connector, a gas inlet of the vacuum generator communicates with a pipeline for a compressed gas, and a liquid inlet of the liquid suction pipe is disposed at the bottom of a waste liquid trough.

Abstract: A substrate processing apparatus includes a washing liquid supply unit which supplies a washing liquid to a washing liquid discharge port which is open in the outer circumferential surface of a body, a rotation unit which relatively rotates the opposing member and the body around a rotational axis passing through the central portion of the upper surface of the substrate and a washing control unit which controls the washing liquid supply unit and the rotation unit so as to wash the cylindrical gap, where the washing control unit performs a rotation step of controlling the rotation unit so as to relatively rotate the opposing member and the body and a washing liquid discharging step of controlling the washing liquid supply unit so as to discharge a washing liquid from the washing liquid discharge port simultaneously with the rotation step.

Abstract: An ultrasonic cleaning apparatus and an ultrasonic cleaning method for an edge face of a substrate help prevent re-contamination caused by splashing or the like of ultrasonic wave propagating water sprayed onto an edge face of an object to be cleaned. An ultrasonic wave transmitting tube provided to continue from the spot shower and configured to transmit and spray the ultrasonic wave propagating water to the substrate is provided, the ultrasonic wave transmitting tube is installed so as not to be positioned on the substrate, the substrate is retained so that the surface of the substrate assumes a horizontal state, and ultrasonic wave propagating water is sprayed to the edge face, which constitutes an outer periphery of the substrate arranged in a space from the ultrasonic wave transmitting tube in a direction of tangent line of the edge face while rotating the substrate by a rotatable rotation retaining portion.

Abstract: A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.

Abstract: An apparatus for safely retaining an eye implant lens for transport and access for inspection and use in which a holding apparatus has a chamber for holding a lens. In one embodiment the chamber has aligned transparent portions and a lens can be placed in alignment with the transparent portions to enable inspection. Also, a system including the apparatus and a bottle assembly that will hold the apparatus in the bottle. A method for holding an eye implant lens in which a lens is placed in the apparatus which can then be placed in a bottle assembly.

Abstract: An eye-mountable device, having an anterior convex side and a posterior concave side, is packaged in a container having a base and a wall. The wall extends from the base and defines an opening of the container. Disposed within the container is a pedestal, which has a first end attached to the base of the container and a second end opposite the first end. The eye-mountable device is mounted on the pedestal such that the posterior concave side contacts the second end of the pedestal and the eye-mountable device is elevated from the base of the container. The opening of the container can be sealed by a lidstock.

Abstract: Example systems and methods for treating workpieces are disclosed. In some examples, the system includes a treatment station positioned in a process chamber for treating the workpiece with fluid. The example system includes a handling device positioned in the process chamber. The example handling device includes a base positioned in the process chamber, a supporting arm coupled to the base and pivotable relative to the base about a first pivot axis, a pivoting arm coupled to the supporting arm and pivotable relative to the supporting arm about a second pivot axis, and a receptacle coupled to the pivoting arm and including a workpiece holder capable of picking up the workpiece from a workpiece feeder positioned outside of the process chamber. The example handling device is capable of moving the workpiece through an opening of the process chamber and into a treatment position at the treatment station.

Abstract: A method includes receiving a wafer stack having at least two wafers bonded together. At least one blade is inserted between a first wafer of the at least two wafers and a second wafer of the at least two wafers. The blade has a channel configured to inject air or fluid. The first wafer is debonded from the second wafer using the at least one blade. In another embodiment, a detacher having a convex bottom surface is attached to the wafer stack. The first wafer is debonded from the second wafer using the detacher.

Abstract: A washing treatment apparatus and a washing treatment method are provided. A washing treatment apparatus washes in a washing container an object to be washed including a tubular portion, and a main body portion to which one end portion of the tubular portion is connected. The washing treatment apparatus includes a washing solution supply unit which pressurizes and supplies a washing solution to the washing container, a penetration hole portion which is provided on the washing container and includes a penetration hole into which the tubular portion can be inserted, an outlet hole portion which is provided on the washing container and includes an outlet hole through which the washing solution supplied into the washing container flows out to adjust pressure of the washing solution in the washing container to predetermined pressure.

Abstract: A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer and is structurally configured to place the component retaining fixture in sonic communication with the sound field transducer within the sonic bath. The component retaining fixture comprises a first end plate, a second end plate, a first component securing member, a second component securing member, and a plurality of compression studs. The first component securing member projects from the first end plate and is structurally configured for repeatable transition between a retracted position and an extended position. The second component securing member projects from the second end plate. The compression studs of the component retaining fixture span from the first end plate to the second end plate and are spaced to form a plurality of sonic transmission windows between the compression studs.

Abstract: The present invention relates to a device (1) for cleaning plastic chips, comprising a container (2) for the reception of the plastic chips and a stirring device (4) which is rotatably arranged about a rotational axis (400) in the container for stirring the plastic chips, wherein the stirring device (4) has a rotational body (5) which extends along the rotational axis (400), wherein the rotational body (5) has a cross section having a varying distance (a) from the rotational axis (400).

Abstract: An apparatus for cleaning items includes a container having a bottom wall, an open top, and an item-supporting screen formed in the bottom wall. A cleaning station has an open top and slideably receives the container. The container and cleaning station are in fluid communication with a remote vacuum source. A jet nozzle positioned inside the container is in fluid communication with a remote source of clean water and sprays clean water on the item upon activation of a pump. Ambient air for drying the item after cleaning is drawn into the container through an opening formed in a container lid and follows a path of travel that envelopes the item and dries the item when the remote source of vacuum is activated. The rate of flow of ambient air as well as the breadth of the flow is controlled by the size of the opening in the container lid.

Abstract: A cleaning machine for containers, containing a housing in which various treatment stations, including a feed station and a discharge station, are accommodated, whereby the housing has two side walls located opposite each other. In order to simplify the installation of the cleaning machine, a modular construction is used, whereby at least the discharge station is formed as a module.

Abstract: A dishwasher includes a washing compartment, at least one dishware container, and a guide assembly to allow the dishware container to be moved out of the washing compartment and into the washing compartment. The movement of the dishware container in relation to the washing compartment is cushioned by at least one damping device which is arranged inside the washing compartment.

Abstract: A device and method for holding a substrate, e.g., a semiconductor wafer, during a process, e.g., a liquid meniscus process, the substrate having a first side and a second side. The device includes one or more holding components, e.g., fingers, configured to contact a second side of the substrate without significantly contacting the first side of the substrate. At least one of the holding components may be configured to be moved during the process so as to prevent the at least one holding components from effecting the process, e.g., contacting the liquid meniscus. Such an arrangement may be employed when the substrate includes a top side having at least one structure or feature thereon, it being desirable that the holding components avoid contact with the structures or features during the process.

Abstract: An apparatus and method for removing waste from a soiled container that houses laboratory animals and has an opening is disclosed. The apparatus includes a conveyor having a receiving end for receiving containers from a stack of containers. The stack is disposed such that the openings are upwardly oriented. The apparatus also includes a manipulator that aligns with and engages an uppermost container of the stack and causes the uppermost container to be separated from the stack and to be flipped over onto the receiving end of the conveyor such that the opening is downwardly disposed. Waste discarded from the container falls through openings in the conveyor, and a waste receptacle disposed below the conveyor collects the discarded waste. The conveyor advances to transport the container away from the receiving end toward a discharge end of the conveyor.

Abstract: A dishwasher including a cutlery basket that has an adjustable compartment. The adjustable compartment receives a cutlery item that is adjustable between a loading position for loading and/or unloading the adjustable compartment and an angled position for carrying out cleaning and/or drying the cutlery item. In the angled position, a first clearance height of the cutlery item is reduced in relation to a second clearance height of the cutlery item in the loading position.

Abstract: A cleaning station that includes a container designed to hold a solvent and having a floor and two pairs of side walls connected to form an enclosure, with a first shelf disposed at a location elevated in relation to the container floor and a second shelf disposed above the first shelf, the second shelf being slidable and being removably provided, there being brushes located in an opening in the first shelf that may be used for cleaning tools and a plurality of additional openings in the first shelf to allow the passage of solvent.

Abstract: A paint roller cleaner has a base for resting in a sink and a knob for receiving on its outside surface the inside surface of a paint-laden paint roller. The knob is adjustable relative to the base, and/or the roller is adjustable relative to the knob, so that the roller is vertical and water filing the roller will evenly and uniformly overflow and clean the roller outer surface. The knob may be an upstanding, tapered, hollow cylinder that rotates about a horizontal axis at its base to adjust its angle relative to the base, wherein the tapered cylindrical surface allows the cleaner to cooperate with variously-sized rollers. In another version, the knob is a hollow sphere, with its top end truncated, and with several spaced-apart vertical slits in its side, like a collet, for flexing/bending to various diameters to cooperate with variously-sized rollers. In another version, the knob is a sphere.

Abstract: An apparatus for processing a substrate, comprising: a process chamber having a track; a carrier connected to the track; upper and lower proximity heads in the chamber and positioned along the path, the proximity heads having opposing faces that define a gap in which a meniscus of fluid is formed, the path being defined along the gap between the opposing faces; a first pre-wet dispenser and a second pre-wet dispenser disposed along side of the upper proximity head and directed toward the path; a drive for moving each of the pre-wet dispensers between a center position along the length of the upper proximity head and opposite outer positions near outer ends of the upper proximity head; and a pre-wet controller for causing the drive to move each of the first and second pre-wet dispensers based on a position of the carrier when moved under the first and second pre-wet dispensers.

Abstract: The application discloses an auxiliary device for a tank of an ultrasound apparatus which comprises a rack and at least one adapter for a medical instrument. Thereby, the adapter comprises a housing and at least one coupling element which is movable with respect to the housing by way of a drive and which can be coupled to the medical instrument, so that a movement of the coupling element effects an active movement of at least one region of the medical instrument.

Abstract: Provided is a filter cleaning apparatus for cleaning a roll-type filter including a cleaning tank with a cavity for accommodating a cleaning solution, and a frame that is separable from the cleaning tank and is provided with a fixed portion for fixing a roll-type filter and a supporting portion for supporting weight of the roll-type filter, wherein the supporting portion includes a plurality of through holes through which the cleaning solution passes, and a plurality of supporting members for partially supporting a lower portion of the roll-type filter.

Abstract: Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a cup. The liquid processing apparatus includes: a processing chamber in which a substrate holding unit holding a substrate and a cup placed around the substrate holding unit are installed; a nozzle for supplying a processing liquid to the substrate held by the substrate holding unit; and a cup cleaning unit cleaning the cup by supplying a cleaning liquid to the upper part of the cup. A concave portion is formed in the upper part of the cup and the cup cleaning units supply the cleaning liquid to the concave portion in the upper part of the cup.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: A dishwasher includes a tub having a retractable upper dish rack secured to the tub by a slide assembly. The slide assembly includes a pair of telescoping cylinder assemblies, each of which includes a number of hollow, cylindrical, metal rods.

Abstract: Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contaminants attached to a nozzle supporting arm. The liquid processing apparatus includes a processing chamber in which a substrate holder holding a substrate and a cup disposed around the substrate holder are provided; a nozzle configured to supply a fluid to the substrate held by the substrate holder; and a nozzle supporting arm configured to support the nozzle. A gas ejection mechanism is installed at the nozzle supporting arm to eject a gas toward a front end surface of the nozzle supporting arm.

Abstract: A device for processing wafer-shaped articles, comprises a chuck adapted to receive a wafer shaped article, and a collector surrounding the chuck. The collector comprises a base and a plurality of divider walls, as well as a plurality of nested partitions surrounding the chuck. Each of the plurality of nested partitions is positioned on a corresponding one of the plurality of divider walls, and each of the plurality of nested partitions is vertically movable so as to define a plurality of separate process regions within the collector depending on the vertical position of each of the plurality of nested partitions. At least one of the divider walls comprises an internal exhaust conduit communicating with an exhaust duct underlying the divider wall.

Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.

Abstract: A device for washing an array plate having an array of liquid droplets adhered thereto is described. The array of liquid droplets is covered with a hydrophobic medium immiscible with the array of liquid droplets. The device includes a mechanism for draining the hydrophobic medium from the array plate; a mechanism for providing an aqueous wash liquid over the array plate; a mechanism for shaking the array plate in a presence of the aqueous wash liquid; and a mechanism for removing the aqueous wash liquid from the array plate. A method for washing an array plate is also described.

Abstract: A device to capture the relative position of a component (14) of which the position can change relative to a reference component (12) of a washing handling device (10), in particular a washing machine or drier, includes at least one light source (34, 38, 42), at least one light receiver (36, 40, 44), a light-reflecting surface (50, 52), which reflects light which the light source (34, 38, 42) emits to the light receiver (36, 40, 44). The device is designed to capture the present relative position of the changeable-position component (14) relative to the reference component (12), according to the reflected light which the light receiver (36, 40, 44) captures.

Abstract: A cleaning or care device for medical instruments has a cleaning or care space, at least one connecting device arranged in the cleaning or care space, to which an instrument to be cleaned can be connected, a delivery device for delivery of at least one cleaning or care medium, wherein the delivery device has a frame, on which at least one nozzle for dispensing a cleaning or care medium is provided on the outside of the instrument to be cleaned, the frame being movable relative to the at least one connecting device, to follow essentially a longitudinal axis of an instrument connected to the at least one connecting device, and a magnetic coupling device, which transfers a driving movement generated outside of the cleaning or care space to the frame to move the frame relative to the at least one connecting device. A method for producing a cleaning or care device is also described.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be an mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be a mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: A device for treating a disc-like article with a fluid, including elements for dispensing a fluid onto the article and a chuck for holding and rotating the article around an axis perpendicular thereto, the chuck including a base body, a drive ring, and gripping members for contacting the article at its edge. The gripping members are eccentrically movable with respect to the center of the article and driven by a drive ring rotatably mounted to the base body so that the drive ring is rotatable against the base body around the axis. The relative rotational movement of the drive ring against the base body is carried out by either holding the base body and rotating the drive ring or by holding the drive ring and rotating the base body, whereby the to-be-held-part (drive ring or base body) is held without touching the respective to-be-held-part by magnetic force.

Abstract: A dish rack is supported for both selective movement into and out of a washing chamber of a dishwasher tub and vertically relative to the tub, with the vertical adjustment being made by manually grasping and shifting at least one frontal cross bar extending along a front wall of the dish rack to cause pivoting of first and second lever members extending along sides of the dish rack. The side lever members cooperate with latching mechanisms to lift and retain the dish rack in a select raised position.

Abstract: The present invention is a shakable cleaning bag to clean a plurality of objects that includes a base cleaning bag, a cleaning pouch disposed in the base cleaning bag that receives the objects to be cleaned and a perforated cut line disposed on the top portion of the base cleaning bag that is cut when the base cleaning bag is ready to be used. A fastener disposed below the perforated cut line that runs across the base cleaning bag allowing access to the cleaning pouch and an abrasive or non-abrasive alcohol cleaning solution that is contained in the base cleaning bag that has direct contact with the objects that are placed in the base cleaning bag to be cleaned by the alcohol cleaning solution. There is also a two pouch base cleaning bag with a rinsing pouch and rinse solution and a method of use.

Abstract: A dishwasher includes a shiftable rack provided with multiple, distinct washing fluid spray arms connected to a common, rack supported manifold. When the rack is shifted to a retracted position within a tub of the dishwasher, the manifold mates with a coupling of a fluid distribution system including a multi-tube feed arrangement configured to selectively distribute washing fluid from a pump assembly to the multiple spray arms.

Abstract: A vertical closed loop link chain vacuum conveyor is provided. A conveying frame extends along a lane-like longitudinal conveying path. The frame has a vertical and longitudinally offset closed loop section. The closed loop section has a change in elevation including a decline and an incline, change in direction, and a central vacuum plenum. A multi-flex link chain is in guided support and travel in the conveying frame while running in trained contact about a link chain drive assembly. The multi-flex link chain is in evacuated communication with a suction generator is in ducted communication with the vacuum plenum.

Abstract: A protective chuck is disposed on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region against a fluid layer covering the substrate surface. In some embodiments, the pressure fluctuation at the gas layers is monitored, and through the dynamic feedback, the gas flow rate can be adjusted to achieve a desired operation regime. The dynamic control of operation regime setting can also be applied to high productivity combinatorial systems having an array of protective chucks.

Abstract: A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of the system. The cleaning station includes a force applicator and a gate. The force applicator has an applicator length and is operatively coupled to the cleaning station. The force applicator is rotatable and is adjusted to a first height off the surface of the carrier as the substrate is being cleaned. The force applicator has a hollow structure with internal channels and openings dispersed throughout the applicator length to dispense cleaning solution to substrate surface. The gate is affixed to a trailing edge of the force applicator and is set to a second height off the surface of the carrier. The gate includes a gate length that at least spans the applicator length.

Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.