Abstract: An apparatus and associated methods are disclosed for washing a plurality of beverage containers. The apparatus may include an enclosure, a holder positioned in the enclosure, a receptacle for a beverage container in the holder, and an injector coupled to the enclosure. The holder may rotate in the enclosure about an axis of rotation. As the holder rotates, the receptacle may move (e.g., rotate) through a plurality of positions about the axis of rotation. The receptacle may be positioned to receive a beverage container in a first position about the axis of rotation. When rotated to a second position about the axis of rotation, the receptacle may be aligned with the injector and the injector may provide a fluid inside the beverage container in the receptacle. The receptacle may be positioned to drain the fluid from the beverage container in the receptacle in the second position or after being rotated to a third position.

Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.

Abstract: A laser cleaning device, and a laser cleaning method using the same, for removing an electrolyte solution stuck to an electrolyte tab during a process of injecting the electrolyte solution are disclosed. The laser cleaning device for an electrode tab of a battery includes: a cleaning housing, in which a battery case for receiving an electrode group, an electrolyte solution and an electrode tab exposed to the outside are embedded; a laser generator which includes a laser source for generating a laser beam and an output controller for controlling output of the laser beam; a laser transmitter which transmits the laser beam generated by the laser generator; and a laser emitting unit which is installed inside the cleaning housing, and which irradiates the laser beam transmitted by the laser transmitter onto the electrode tab so as to remove liquid pollutants stuck to the electrode tab. The laser cleaning method comprises steps generally corresponding to the latter functions of the laser cleaning device.

Abstract: A washing device that may include a conveyor frame having a carousel shape with a plurality of carrier sections along an outside section of the conveyor frame. The conveyor frame may rotate to transport at least one object through at least one processing station along a circular path. A first processing station may be positioned along the circular path. In certain embodiments, a second processing station may be positioned further along the circular path. The processing stations may include a washing station and a drying station. The object may be a tote container.

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: A container treatment device includes a container-feeding unit, a container removing unit, a feed line for a product, and a cleaning device. The cleaning device includes either a flushing device for cleaning an exterior surface using a cleaning fluid or an additional tool that can be removed from a storage device by the cleaning device and that can be brought to a position of use and returned to the storage device after use by the cleaning device.

Abstract: A vertical dish washing machine is disclosed to include a dish basket for carrying dishes for washing and a vertical loop conveyer system including a first transmission mechanism adapted to carry the dish basket vertically front a front top location to a front bottom location, a second transmission mechanism adapted to carry the dish basket horizontally from the front bottom location to a rear bottom location, a third transmission mechanism adapted to carry the dish basket vertically from the rear bottom location to a rear top location, and a fourth transmission mechanism adapted to carry the dish basket from the rear top location to the front top location.

Abstract: A protruding portion (13), which has a central axis coincident with a rotational axis of a table (10), is formed at a center portion of a surface of the table (10). At the time of the surface processing, the table (10) is rotated under a state in which the processing target surface of the substrate (12) is supported horizontally at each of a plurality of parts on the table (10) spaced apart from a base end of the protruding portion (13) toward an outer peripheral end portion of the table (10) by a predetermined distance and at the same distance from a top end of the protruding portion (13). Then, a processing liquid is supplied toward the top end of the protruding portion (13). The processing liquid that has reached the processing target surface of each substrate (12) is then removed outside the table (10) by centrifugal force.

Abstract: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate held by the processing unit; a processing bath capable of simultaneously accommodating a plurality of substrates, the processing bath storing a process liquid into which a substrate is immersed so as to be processed, the process liquid being circulatingly supplied to the processing bath; and a transfer unit that simultaneously transfers substrates whose number is less than the number of substrate that can be accommodated in the processing bath. The transfer unit transfers, at least, to the processing bath in which the process liquid is stored. A substrate is processed with the use of at least one of the processing unit and the processing bath.

Abstract: A container cleaning machine with a container or bottle cleaning apparatus with a spray pipe and spray station with a spray pipe of this type. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. §1.72(b). As stated in 37 C.F.R. §1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims. Therefore, any statements made relating to the abstract are not intended to limit the claims in any manner and should not be interpreted as limiting the claims in any manner.

Abstract: An apparatus and method for removing debris from ophthalmic lens transfer tips during the manufacturing or the ophthalmic lenses.

Abstract: A dishwasher basket for use with baby bottle nipples includes a specially designed rack that maintains baby bottle nipples in an upright position during the washing and drying. The base of the nipple is also prevented from resting upon the surface of the rack. Feeding straw and valve holders are also provided that can be attached to the dishwasher basket. The dishwasher basket is able to be opened using only one hand.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer, such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer, is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: An washing machine for washing trays. The machine includes a housing, a frame, a water system, and an air system. The frame is rigidly mounted in the housing and holds the trays to be washed at a tilted angle so that fluids completely drain there from and accordingly facilitate the washing and drying processes. The water system is contained in the housing and supplies water to wash the trays. The air system is contained in the housing and supplies air to dry the trays.

Abstract: A wafer processing system has a moveable drain assembly having multiple drain rings. The drain rings may be spaced apart sufficiently to allow a process fluid applicator to move between them. Each drain ring provides a separate drain path, optionally in a separate recirculation loop carrying a single process fluid. The drain rings may be sequentially moved into position to collect process fluid moving off of the workpiece. As a result, process fluids may be more uniformly applied and used process fluids can be separately removed, collected, and either recycled or processed for disposal. Mixing of used process fluids is largely avoided. A lower process fluid outlet allows for processing the back side of the wafer as well, without flipping the wafer.

Abstract: A chucking member configured to chuck the edge of a substrate includes a chucking pin which is eccentric from the rotation center. The chucking pin has a streamline shape and includes a first front-end portion disposed at the front end relative to the flow of an air current generated by the rotation of the substrate and a first back-end portion disposed at the back end relative to the flow of the air current. The first front-end portion includes a first tip, and the first front-end portion has a round shape.

Abstract: A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting assembly may include wafer holding mechanisms with pivotable confining members that are configured to hold the substrate using centrifugal force when the wafer supporting assembly is rotated. In an embodiment, the cleaning system may include a positioning system operatively connected to an acoustic transducer to provide meaningful control of the acoustic energy applied to a surface of the substrate by selectively changing the distance between the acoustic transducer and the substrate surface so that the substrate can be cleaned more effectively.

Abstract: A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to hold the wafer during a second portion of the cleaning period. Residues left between the tips and the wafer edge areas during the first portion of the cleaning period are removed during the second portion. The change from the first group of tips to the second group of tips occurs while the wafer is rotating.

Abstract: A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to hold the wafer during a second portion of the cleaning period. Residues left between the tips and the wafer edge areas during the first portion of the cleaning period are removed during the second portion. The change from the first group of tips to the second group of tips occurs while the wafer is rotating.

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract: A Ferris wheel-like stripping or cleaning mechanism that can be used in semiconductor fabrication, such as in photoresist or other stripping, or wafer or other cleaning, is disclosed. A stripping mechanism can include a container to hold a chemical, such as a photoresist stripping chemical, a wafer cleaning chemical, or another type of chemical. The mechanism can also include a component to move semiconductor wafers through the chemical in the container in a Ferris wheel-like motion. The component may include wafer holders for the wafers that are swivably mounted about an axis of rotation. As the one or more wafer holders rotate about the axis of rotation through the chemical in the container, the wafer holders remain in a substantially constant vertical and horizontal orientation.

Abstract: A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substrate by a first clamping member set; performing a second substrate rotation process after the first substrate rotation step for rotating the substrate while clamping the substrate by the first clamping member set and a second clamping member set provided separately from the first clamping member set; and performing a third substrate rotation process after the second substrate rotation step by unclamping the substrate from the first clamping member set for rotating the substrate while clamping the substrate by the second clamping member set.

Abstract: A jar fillable with cleaning fluid has a lid with a suspension system for roller bearings hanging from the inside of the lid. On each of two or more suspension systems, bearings are interwoven between two sides of an overlapping plastic tie looped through a securing loop in the lid. Any desired number of bearings of various sizes and shapes are secured, with a synching of the tie at the bottom, in an alternating array with all bearings parallel, no bearings touching, and each bearing positioned to receive a flow of cleaning fluid through it. The container is shaken in a direction perpendicular to each bearing for maximum cleaning. The bearings are installed by screwing on the lid and removed by removal of the lid.

Abstract: A system and method for cleaning boxes used for handling flat media includes a rotor rotatably mounted within an enclosure, with spray nozzles in the enclosure for spraying fluid toward the rotor. The rotor has at least one box holder assembly for holding a box. At least one retainer bar is located on the rotor for engaging a front section of the box to retain the box in the box holder assembly during rotation of the rotor. The retainer bar is preferably moveable from a first position where the retainer bar restrains the box on the box holder assembly, to a second position where the retainer bar is moved away from the box. The box holder assembly may alternatively include a base with a plurality of grooved elements thereon that are adapted to engage a flange on the box for securing the box to the box holder assembly.

Abstract: Arrangement for improving the drying performance of an automatic dish washer

Abstract: A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch (half pitch), a wafer transporting device 11 for transporting the wafer E between the foup F and the rotor 34, wafer posture changing devices 20a, 20b, a wafer elevating mechanism 40, a motor 31 for rotating the rotor 34, an outer chamber 71a and an inner chamber 71b both accommodating the rotor 34, and cleaning liquid nozzles 53, 55 for supplying a cleaning liquid to the wafers W. The rotor 34 holds the wafers W at intervals of an optional pitch (every one holding pitch or every plural holding pitches) to carry out a cleaning operation. Consequently, it is possible to process substrates accommodated in two containers at one batch processing.

Abstract: An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The rotors are rotated by a spin motor. A processing fluid is introduced onto the top or bottom surface of the wafer, or onto both surfaces, at a central location. The fluid flows outwardly uniformly and in all directions. A wafer support automatically lifts the wafer, so that it can be removed from the reactor by a robot, when the rotors separate from each other after processing.

Abstract: Drive mechanism suitable for a parts treating machine comprises a housing defining a chamber containing a rotatable carriage wheel with a fixture journalled for rotation thereon. A carriage wheel drive is provided for indexing the carriage wheel and a fixture drive for rotating fixtures carried by the carriage wheel at a predetermined position. The carriage wheel drive includes a motor and a gear reducer operatively connected to the carriage wheel. The fixture drive includes a motor and a gear reducer operatively connected to a gear on a shaft extending upwardly from the fixture by an endless belt. The carriage wheel may be moved from a load station to a treating station, where spray nozzles or the like may spray treating material onto the parts to be treated as they are rotated together with the fixture at the treating station.

Abstract: A parts cleaning machine comprises a housing having a wheel with a fixture journalled for rotation thereon. The wheel comprises one or more pockets within which the fixtures may rotate. Drive mechanism comprising a wheel drive for indexing the wheel and a fixture drive for rotating the fixture at a predetermined location or locations during indexing of the wheel is provided in the housing. The wheel drive is actuated by a motor and a gear reducer operatively connected to the pocketed wheel. The fixture drive is actuated by a motor and an endless belt, or the like, is operatively connected to a drive gear on a shaft extending upwardly from the fixture. The wheel may be moved from a load station to a wash station, where spray nozzles may spray wash liquid onto the parts to be cleaned as they are rotated in the fixture at the wash station.

Abstract: An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically movable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

Abstract: An industrial parts cleaning system including immersion and spraying which provides epicycloidic parts movement (a plurality of revolutions per rotation, wherein the revolution is supersposed the rotation), rotating spray which synchronously follows the parts rotation, and a purge system for evacuating from the common plumbing the respective wash or rinse solution of a current cycle before commencement of the next cycle.

Abstract: An apparatus for immersing lightweight articles such as computer discs in a violently agitating electroplating bath comprises an immersible carousel driven for rotation from both ends of the carousel by a single drive means. The carousel is supported on easily replaceable bushings and comprises a pair of spaced wheels and a plurality of article support dowels which are individually rotated about their own axes during rotation of the carousel, the roratable dowels extending between the carousel end wheels, and the dowels being readily removable from the wheels for replacement of the articles to be electroplated. A positive locking means is provided for holding the dowels in position on the spaced carousel wheels without the necessity of spacer rods on the support carousel and the attendant interference with rapid removal of dowels and articles supported on the dowels which is caused when spacer rods are present.

Abstract: Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.

Abstract: A wheel cleaning assembly which has a rotatable carousel which supports a number of wheel raising and lowering arms. The carousel turns in time sectors and has a delay period after the carousel has turned one sector. For instance, at one station a wheel is lowered into a tank and retained in a lowered position for a time period after which it is raised and the carousel turns one sector. Each position of delay is a wheel cleaning station and wheel-cleaning stations, including a hot water soak, a spinning and spraying station, a cold water spray and a spinning and air drying station are included.

Abstract: In a multi-station machine (10) each station (23,24,25,26) is configured to receive through a gate (90) of a drum encircling holder (50) a sealed 55 gallon drum (200) full of hot cooked food which is supported about its periphery at its midpoint (203) between its two central ribs (201,204) on a plurality of vertical padded (58) stanchions (55,71,84,91) affixed to the drum encircling holder. The holder is rotatably supported (52,81) at its sides in a support frame (40). A variety of pulley drives (110,130,150,160) connect to a central drive (100,105) to rotate each holder (and drum) independently of all others, or in linked fashion, as desired. Cold water (306,307) is sprayed (300) on each rotating drum from individual overhead sprayers (302,303,304) for each station.

Abstract: A debris cleaning apparatus leaning for toxic waste sites is mounted on a trailer. The apparatus includes a chamber and a crane that lowers a basket drum, filled with contaminated debris, into the chamber. The drum is cylindrical and has journal shafts at either end which drop into bearings in the chamber. The drum can be coupled to a drive motor to rotate the drum during a washing operation in which the chamber is filled with heated detergent solution and agitated. The drum surface is perforated. The agitation is increased by pumping the detergent into eductors inside the chamber, each eductor including a nozzle and a venturi concentric with the nozzle; the jet entrains large amounts of detergent to create a high-volume turbulent flow inside the chamber. The chamber is then drained into a holding tank and the debris is sprayed with detergent from orifices drilled through the drum walls.

Abstract: A ball cleaning device adapted for use in causing a plurality of billiard balls to be cleaned under a supply of cleaning fluid comprises a housing having a generally cylindrical side wall, a top access opening and a closed bottom; a spindle rotatably fitted through the bottom of the housing to extend upwards along an axis of the housing; a turntable coaxially mounted on the spindle for rotational movement therewith, the turntable supporting the game balls; an idle wheel concentrically mounted on the turntable for rotation relative to the turntable, the idle wheel having a plurality of compartments arranged along its circumference, each of the compartments receiving the game balls in a spaced apart relationship with one another; and an electric motor for rotatably driving the spindle and the turntable in unison to subject the game balls to a random rolling movement and a planetary movement around the spindle so that the idle wheel is pushed by the game balls into rotation about the spindle.

Abstract: A method of disinfecting a hydrogen peroxide stable contact lens is provided wherein a contact lens is contacted with a hydrogen peroxide solution in a container and a hydrogen peroxide decomposition means is provided in said container, which means is adapted to permit the contact lens to have a cumulative (% peroxide) (min) exposure from the time said decomposition means contacts said peroxide containing solution, time zero, over a period of no greater than 12 hours of at least 20% peroxide.multidot.minute. An apparatus capable of carrying out such method is also provided herein. The hydrogen peroxide decomposition means may be, for example, a prepoisoned catalyst, a catalyst partially enclosed in a tube, a dual catalyst control system or a distributed catalyst control system.

Abstract: A high-speed bottle washing machine provides concurrent rotational motion to a workpiece as it is conveyed through a washing treatment zone for internal and external spray treatments. The machine comprises a plurality of moving bottle receiving stations for sequentially receiving and rotating inverted bottles received from a bottle infeed conveyor, a plurality of reciprocating spray nozzles, with at least one spray nozzle moving with each bottle receiving station, wherein each of the spray nozzles reciprocates from a first position below the inverted bottles, to a second position within the bottles, and a manifold assembly for sequentially supplying a caustic wash fluid under pressure to each of the plurality of spray nozzles to clean the bottles by impingement of the wash fluid in a predetermined pattern within the bottles as the bottles are rotated. The washed bottles are finally discharged at a bottle outfeed conveyor.

Abstract: A control system for a high-speed rotary washer spraying system designed particularly for plastic returnable bottles automatically regulates each process of the wash spraying system, namely, sequentially feeding bottles from an infeed conveyor means, inverting them by a worm/inverter means, receiving and simultaneously rotating each bottle in an inverted position through a plurality of washing, neutralizing and sanitizing treatment zones, and inverting each bottle to its original neck-up orientation for further processing. During the entire process, a programmable logic controller maintains, manages, and controls all pumps, valves, solenoids, and drive motor speeds as required by the process, and also provides for monitoring and adjusting fluid levels, alkalinity/acidity concentrations, and temperatures of the wash and neutralizing solutions.

Abstract: A workpiece holding apparatus provides concurrent rotational motion to a workpiece as it is held. The apparatus comprises a support bracket for mounting on a fixed or movable support structure. A pair of spaced apart, axially rotatable engaging rollers, each having a circumferential surface profile complementary to a profile of a workpiece, are located on the first support bracket for partially engaging a circumferential surface of the workpiece. A support arm having a third axially rotatable engaging roller with a circumferential surface profile complementary to a profile of a workpiece for partially engaging the circumferential surface of the workpiece is pivotably mounted on the support structure. The support arm is biased toward the support bracket to enable engagement of each axially rotatable engaging roller with an appropriately positioned workpiece, or is pivoted away from the support bracket to release the workpiece from the engaging rollers.

Abstract: A combustion cleaning machine for removing coatings on the interior of combustion chambers for jet engines is provided and includes a rotatable turntable for carrying a plurality of the generally cylindrical combustors to and from at least one work station where a fluid, liquid or mixture is projected at a combustor under high pressure to remove the interior coating.The machine includes a revolvable main turntable or wheel having a plurality of individual minor turntables for supporting the combustor cylinders and rotating them. A computer or microprocessing control means is provided for monitoring and controlling various machine functions including the means for indexing the main turntable, the means for rotating the individual turntables and the combustors mounted thereunder, and the means for directing or spraying the material at the cylinders.

Abstract: Apparatus is disclosed for cooling large sealed drums (typically fifty-five gallon drums) of cooked food products. The size of such large drums makes them difficult to handle, since they typically weigh in excess of five hundred pounds when full. The cooling apparatus comprises a main frame structure which has a support shaft rotatably attached to it and elevated above the base of the frame a distance sufficient to provide clearance for a vertically oriented drum to pass underneath it. The support shaft has a support frame on it with six, equally spaced, radially arranged, drum support platforms and clamp members attached to it. A drum is rolled onto one of these platforms from an adjacent fixed platform. Once it is in place, it is clamped onto the support frame, and the next support platform is rotated into place. Once drums are located in all six of the positions, the device is continuously rotated in a cooling water spray to rapidly cool the contents of the drums.

Abstract: An apparatus having a casing and a rotating cover with baskets to hold the contact lenses which are to be cleaned. The rotating cover is set on the casing with a guide rod. The contact lenses are first lowered into a tub in the casing containing a cleaning and disinfecting solution. After an adjustable amount of time, the rotating cover is pushed up by a push rod. The tip of the push rod is guided down a helical groove, thus rotating the cover 180.degree.. At the end of its path, the push rod ends in a hole of the casing and the contact lenses are thus lowered into the tube containing the neutralization solution.

Abstract: A blasting apparatus for spraying a flowable cleaning or treating material onto a part comprises a cabinet having a treating chamber formed with an opening within which a door and base support are rotatably mounted. A part support platform is mounted to the base support on opposite sides of the door so that while one platform is located within the treating chamber for spraying a part it supports, the other platform is located outside of the treating chamber to permit loading and unloading of parts thereon. An inflatable seal is mounted on the periphery of the door or cabinet opening to prevent escape of material from the treating chamber. Independently controlled drive trains are provided to rotate the door between an open and closed position, and to effect rotation of the platforms relative to the door when they are positioned within the treating chamber.

Abstract: An article cleaning machine for removing surface contaminants from the articles includes a tub adapted to receive a cleaning liquid therein. A frame assembly is pivotably mounted within the tub and is oscillated in an arcuate path by means of a motor-driven crank. A tumbler is carried by the frame assembly for conjoint oscillation therewith, and articles to be cleaned are placed within the tumbler. The tumbler has an internal ridge extending laterally across the bottom of the tumbler, thereby providing for a tumbling of the articles as the tumbler is oscillated. A wire mesh basket, submerged in cleaning liquid in the tub, is carried by the oscillating frame assembly, so that additional (and larger) articles to be cleaned may be placed in the basket and oscillated in the liquid. A pump circulates the cleaning liquid through conduit means to the tub and to the tumbler. The liquid reservoir in the tub is pumped into a filter to remove particulates.

Abstract: The invention refers to a process and a device for the fully automatic cleaning of spray guns foulded with paint or varnish, wherein the spray guns are immersed with their paint or varnish reservoir open into a cleaning fluid free of solvents or thinners, during a first cleaning phase the fluid is circulated and a fluid jet is introduced into the open paint or varnish reservoir or into the paint or varnish inlet, during a second phase ultrasonic waves are introduced into the cleaning fluid while the spray guns are moved oscillating up and down in the fluid, the two cleaning phases are repeated at least once and the spray guns are subsequently repeatedly immersed in a rinsing fluid and, if applicable, are moved therein, while the rinsing fluid is circulated and a rinsing fluid stream is introduced into the open paint or varnish reservoir or into the paint or varnish inlet.

Abstract: A holding apparatus for holding dual pin type electronic parts such as DIP type IC etc. when the electronic parts are cleaned or dried. The holding apparatus is used, for example, for cleaning or drying the dual pin type electronic parts automatically in line after the lead pins of the electronic parts are dipped by solder. The holding apparatus has at least one holding rod which holds the electronic parts on a mounting table in order to prevent the electronic parts from dropping off while the mounting table is rotated around a shaft, and the holding rod releases the electronic parts after the cleaning or drying thereof are completed.

Abstract: The apparatus is capable of being immersed in a liquid bath and supports at least two dowels or rods on which are mounted apertured discs in spaced apart relationship. Each rod has a gear fixed near one end and has a plurality of axially spaced circumferential grooves in each of which respective apertured discs are disposed. A pair of spaced wheels are provided to rotate in unison about a fixed axle. Each wheel has a plurality of radially disposed slots into which respective rods are disposed so that each dowel is capable of rotating about its own axis. The axle supports a fixed sun gear disposed near one wheel and each rod has at one end a planet gear that meshes with the sun gear whenever the respective rod is nested within a respective pair of slots on the wheels. Means are provided to rotate said pair of wheels about said axle. To prevent the rods from falling out of their respective slots as the wheels rotate, a C-shaped keeper device is disposed around each wheel and in a fixed position.

Abstract: Flatware apparatus comprises a support platform, mechanical arrangements for mounting the platform, and respective washing and rinsing sprays. The platform is adapted to receive a cylindrical cup or holder for grouping a plurality of flatware pieces in a shock; and a drive arrangement is provided for causing rotation of the platform, or the cup or holder, so that the flatware pieces experience agitated movement. The wash spray is positioned to direct jets of washing and sanitizing fluid into the path of the churning flatware pieces. Mechanical arrangements are also provided for selectively lifting the flatware pieces in the cup in order to fully expose the food-contact surfaces thereof to the washing action.