Abstract: A dishwasher and method for treating dishes according to a cycle of operation, the dishwasher comprising a tub at least partially defining a treating chamber and a dish rack movably received within the treating chamber. The dishwasher configured for receiving dishes for treatment during the cycle of operation, and moveable relative to the tub. A sprayer located within the treating chamber, configured to emit spray into the dish rack. A deflector coupled to the sprayer.

Abstract: A compact dishwasher for cleaning a few eating utensils includes a wash container disposed on a base. A clean water tank is disposed on the base and in fluid communication with the wash container for supplying clean water to the wash container. A wastewater tank is disposed on the base and in fluid communication with the wash container for receiving wastewater from the wash container. A housing body encompasses the wash container, the clean water tank, and the wastewater tank. The dishwasher can further comprise a first pump for facilitating pressurized discharge of clean water in the wash container and a second pump disposed for facilitating drainage of wastewater from the wash container into the wastewater tank. A heating coil can be employed to provide hot water to the wash container. The dishwasher can further include a cleaning basket insertable through the top of the dishwasher.

Abstract: A washing liquid distribution device may be provided that includes a holder and an impeller. The holder may hold the impeller within a washing chamber of a dishwasher. The impeller may include a disc-shaped body provided with a plurality of impeller blades extending from a surface of the disc-shaped body. The impeller blades may include driving blades being angled in a first direction to cause rotation of the impeller when washing liquid is directed onto the driving blades. The impeller blades may include at least one backflow blade being angled in a second direction, where the second direction is opposite to the first direction. The present disclosure may also relate to a dishwasher including a washing liquid distribution device.

Abstract: An air cleaner may include a filter case configured to introduce, by a suction force of an internal space, ambient air being discharged through a filter provided in the internal space as intake air from which foreign substances are removed; and a built-in valve built in the internal space of the filter case and configured to form an ambient air introduction path for introducing the ambient air and an additional ambient air introduction path separated from the ambient air introduction path and to open the additional ambient air introduction path so that the ambient air flows into through the additional ambient air introduction path when the suction force is increased.

Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.

Abstract: A spray arm for a dishwasher includes an outlet nozzle which is provided on a bottom side of the spray arm for emptying washing liquor from the spray arm. The outlet nozzle is selectively closed and opened by a valve which is movable from an open position into a closed position in response to a pressure of the washing liquor. The valve is pretensioned in a direction to seek the open position so that the valve automatically opens when the pressure of the washing liquor drops below a predetermined value.

Abstract: Disclosed is a dishwasher having a structure improved to enhance the efficiency of washing. The dishwasher includes a main body, a washing tub provided in the main body, a door configured to close or open an open side of the washing tub, a fixed nozzle fixed on another side of the washing tub and configured to spray washing water, a vane configured to reflect the washing water sprayed via the fixed nozzle toward dishes while being moved within the washing tub, and a rail assembly configured to guide the movement of the vane. The vane is rotationally coupled to the rail assembly to change a direction of movement of the washing water sprayed via the fixed nozzle.

Abstract: A dishwasher including a washing compartment, and at least one cutlery basket arranged in the washing compartment, wherein the at least one cutlery basket holds items of cutlery horizontally, wherein at least some sections of the cutlery basket have different clearance heights.

Abstract: Disclosed herein is a dishwasher including a spray unit fixed to one sidewall of a wash tub and a reflecting plate assembly to reflect wash water sprayed from the spray unit onto dishes and to linearly reciprocate in a spray direction of the wash water sprayed from the spray unit. The dishwasher further includes a drive unit to drive the reflecting plate assembly, and a cam unit to transmit driving force of the drive unit to the reflecting plate assembly. The drive unit includes a motor to generate rotational force, and a belt forming a closed loop and caused to make cyclic movement by the motor. The cam unit is engaged with the belt to transmit power of the belt to the reflecting plate assembly. The cam is alternately engaged with first and second portions of the belt to cause the reflecting plate assembly to reciprocate.

Abstract: Dishwasher appliances are provided. A dishwasher appliance includes a tub that defines a wash chamber for receipt of articles for washing, and a rack assembly arranged within the tub. The dishwasher appliance further includes a fluid ejection assembly, the fluid ejection assembly including an ejection head disposed within the wash chamber, the ejection head operable to eject fluid into the wash chamber. In one embodiment, the dishwasher appliance further includes a passive deflection assembly, the passive deflection assembly including a deflection unit disposed within the wash chamber for deflecting fluid from the ejection head towards the rack assembly. In another embodiment, the dishwasher appliance further includes a deflection assembly, the deflection assembly including a deflection unit disposed within the wash chamber for deflecting fluid from the ejection head towards the rack assembly, the deflection assembly further including a magnet operable to move the deflection unit.

Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.

Abstract: A fluid screen for a washing machine, and a washing machine including a fluid screen, is provided. The fluid screen includes a generally planar member including a first end and a second end extending from the first end. The first end is mounted within the wash tank of the washing machine at a location generally in proximity to an operating fluid level within the wash tank. During operation of the washing machine, fluid circulates within the wash tank to create a rolling wash action and the second end of the fluid screen extends from the first end generally in the direction of fluid flow across the surface of the wash tank.

Abstract: A dish washing machine including a cabinet forming an external appearance of the dish washing machine; a washing tub arranged in the cabinet and allowing dishes to be washed therein; a dish basket arranged in the washing tub to accommodate the dishes; at least one liquid ejection unit arranged in the washing tub, the at least one liquid ejection unit to eject water; a deflection unit arranged facing the liquid ejection unit to deflect the water ejected from the liquid ejection unit toward the dish basket; and a drive unit to drive the deflection unit to be moved within the washing tub.

Abstract: Disclosed herein is a dishwasher including a spray unit fixed to one sidewall of a wash tub and a reflecting plate assembly to reflect wash water sprayed from the spray unit onto dishes and to linearly reciprocate in a spray direction of the wash water sprayed from the spray unit. The dishwasher further includes a drive unit to drive the reflecting plate assembly, and a cam unit to transmit driving force of the drive unit to the reflecting plate assembly. The drive unit includes a motor to generate rotational force, and a belt forming a closed loop and caused to make cyclic movement by the motor. The cam unit is engaged with the belt to transmit power of the belt to the reflecting plate assembly. The cam is alternately engaged with first and second portions of the belt to cause the reflecting plate assembly to reciprocate.

Abstract: A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.

Abstract: A dishwashing machine is provided. The dishwashing machine may include a rack disposed in a tub to provide a washing space to receive objects to be washed, a water supply pump to supply wash water, a nozzle body disposed at an upper side of the rack to receive the wash water from the water supply pump, a discharge hole provided at the nozzle body to discharge the wash water supplied to the nozzle body to the rack, and an asymmetric impeller rotatably provided at the nozzle body to supply the wash water discharged from the discharge hole to at least two divided areas of the rack.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A dish washing machine having a structure allowing water to be evenly ejected onto the interior of a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub, at least one liquid ejection unit arranged in the washing tub to eject water, a defection unit arranged facing the liquid ejection unit to deflect the water ejected from the liquid ejection unit toward the dish basket, and a drive unit to drive the defection unit to be moved within the washing tub. Since the dish washing machine includes a defection unit in addition to a liquid ejection unit, a dead zone which water does not reach may be eliminated and divided and intensive washing may be possible in the washing tub.

Abstract: An aqua comb used with a hose for thoroughly and quickly cleaning, rinsing and combing the hair of both humans and animals. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed to attach the aqua comb to various hose endings, 2) an on/off valve for controlling fluid flow through the aqua comb, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member positioned above the discharge openings to lift hair and allow fluid spray to reach scalp and skin thereunder. The core design element of the aqua comb is the presentation angle and comb member structure which work in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning and combing action.

Abstract: An aqua comb typically used with a garden hose for thoroughly and quickly cleaning reusable pleated pool water filters and like filter cartridges having a pleated configuration. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed for leak-resistant attachment of the aqua comb to various hose endings, 2) an on/off valve for fluid flow control, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member with long fingers. The core design element of the aqua comb is the combined presentation angle and physical design shape of its comb member which works in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning action even in the valleys between filter pleats.

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: A dishwasher machine with a compact device for spraying items to be rinsed is provided whereby the rinsing liquid is regularly sprayed in the rinsing container and the spray jets created by the spray device can be varied. To this end, the rinsing device comprises at least one spray channel which guides a rinsing liquid and comprises, on a side thereof facing the inside of the rinsing container, openings for the rinsing liquid and two open ends via which rinsing liquid can be supplied in a pressurized manner. At least one distributor is provided for regulating the supply of rinsing liquid to the spray channel in lieu of conventional mobile components such as spray arms, and various spray patterns can be produced by means of the distributor, improving the cleaning action of the dishwasher machine.

Abstract: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and a plurality of outlets extending through the body and in fluid communication with the liquid passage.

Abstract: The present invention relates to a drawer dishwasher (1), comprising an extractable washing tub (2) for receiving objects that are to be washed, and a lid (9), for sealing engagement with the washing tub (2). The lid (9) is movable between an engagement position (A), wherein it is in sealing engagement (10) with an upper edge (6) of the washing tub (2), and an opening position (B), wherein it is spaced from the upper edge (6) of the washing tub (2). The drawer dishwasher (1) has a sealing device (10) arranged to press the lid (9), when it is in the engagement position (A), towards the upper edge (6) of the washing tub (2).

Abstract: A liquid processing apparatus and method capable of separately collecting first and second processing liquids from each other, and preventing a formation of a defect (such as watermarks and particles) on a target substrate are disclosed. In one embodiment, the liquid processing apparatus includes a substrate holding device, a processing liquid supply device to supply a first processing liquid and a second processing liquid, a rotating cup, an outer discharge portion and an inner discharge portion to respectively discharge the first processing liquid and the second processing liquid received from the first receiving surface of the rotating cup, and a discharge portion switch device to open/close the outer discharge portion. The lower end of the first receiving surface of the rotating cup extends to a lower position than the position of the substrate held by the substrate holding device.

Abstract: A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.

Abstract: A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.

Abstract: A wash cylinder or chamber for an automated cleaning station to clean an object or a person's body part includes nozzles on the interior of the cylinder, the nozzles of one embodiment comprising an increasing roll angle providing a novel spray pattern. Additionally, embodiments of the invention include fluid guidance and conveyance structures, angled nozzles, sealing structures, finger guards, wash chamber seating mechanisms and drains, and nozzle ribs that prevent the nozzle from being dislodged during the operation of the cleaning station Also disclosed are methods of washing an object or body part using a wash cylinder or chamber and methods of assembling a wash cylinder or chamber.

Abstract: Method and apparatus for precisely removing dusts from a side edge of a wafer, improving a production yield of wafers, and reducing a manufacturing cost for semiconductor devices. The apparatus includes: a retaining table having a circular top plan view, capable of retaining the wafer disposed on the top surface, and being rotated in the wafer cleaning; a feeding unit for supplying a cleaning solution to a top surface of the wafer; a cup member for recovering the cleaning solution supplied to the wafer, the cup member surrounding a radially outer circumference and a bottom of the retaining table; and a guard member disposed inside the cup member so as to be spaced apart from the retaining table, which surrounds the radially outer circumference of the retaining table.

Abstract: An apparatus for removing particles from a shaft includes a housing having a bore that receives the shaft. The housing includes an inlet port coupled to a pressurized fluid supply, a manifold chamber in communication with the inlet port, and a plurality of bores in communication with the manifold chamber and adjacent the shaft such that the fluid flowing through the bores impinges on the shaft. The bores are angled to produce a spiraling flow pattern about the shaft. A method of removing particles from a shaft includes directing a flow of a fluid onto the surface of the shaft in a generally spiraling pattern, and removing particles from the shaft using the spiraling flow.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: An apparatus for covering and cleaning a cylindrical paint roller pad includes a painting shield having a semi-cylindrical side wall; mounting means for rotatably mounting the pad so that the painting shield side wall is spaced from a first segment of the pad side wall with the longitudinal axis of the pad is coincident with the axis of curvature of the painting shield side wall; a rinse shield rotatable between a closed position substantially beneath the painting shield side wall and an extended position spaced from a second segment of the roller outer surface, the shields being spaced to form a water discharge gap when the rinse shield is in its extended position; and a water manifold to direct water against the pad. The mounting means may be a spindle with a secured handle, or a separate handle attachable to the painting shield.

Abstract: In the vicinity of a rim portion of a spin base 5, a plurality of supports 7 which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base 5. The substrate W is supported horizontally by the plurality of supports 7, with a predetermined distance ensured from the spin base 5 which opposes the bottom surface of the substrate W. Into the space which is created between the top surface of the substrate W and an opposing surface 9a of an atmosphere blocker plate 9, inert gas is ejected from a plurality of gas ejection outlets 9b which are formed in the opposing surface 9a. The inert gas thus supplied to the top surface of the substrate W presses the substrate W against the supports 7 and the substrate W is held at the spin base 5.

Abstract: Disclosed is a device for wet treatment of plate-like articles including: a first plate holding elements for holding a single plate-like article substantially parallel to the first plate, first dispensing elements for introducing liquid into a first gap between said first plate and a plate-like article when being treated, wherein the first plate is a silicon plate, which consists at least 99 wt % of silicon, the silicon plate being in contact with the treatment liquid, when the plate-like article is treated. Further disclosed is a method associated therewith.

Abstract: A modular exhaust vent for use in venting a wash chamber of a dishwasher, such as during a dry cycle, comprises a housing that forms an exhaust flow path from the wash chamber to the exterior of the dishwasher and a valve operable for pivotal movement about a pivot axis between an opened and closed position for selectively closing the exhaust flow path. An actuator for moving the valve is connected to the valve by a link such that activation of the actuator effects movement of the link to pivot the valve to either the opened or closed position. Further, the valve selectively closes the exhaust flow path at an inlet to impede introduction of sound into the exhaust flow path.

Abstract: A substrate processing apparatus 10 includes a holding table 20 for rotatably holding a wafer W, a nozzle 40 for supplying chemical solutions L1 and L2 to the wafer W, at least one light irradiation units G1 and G2, and a pot 30 placed in the outer radius of the holding table 20for collecting the processing solutions L1 and L2 that are scattered from the wafer W. The pot 30 also includes a cover 70 that can be moved in the direction of the axis of the holding table 20so that a plurality of chemical solution collecting chambers M1 and M2 are formed in the pot by changing the position of the cover 70.

Abstract: A cleaning device for an electrical hair removing apparatus is capable of being stored in a compact profile. The apparatus has an operator head at its top, and is formed on its bottom with an electric terminal for receiving an external signal that controls the apparatus. The cleaning device includes a basin for receiving the operator head of the apparatus and also includes a control circuit providing the external signal. The device has a tank storing a volume of a cleaning liquid, and a circulator configured to supply the cleaning liquid into the basin from the tank for cleaning the operator head. A stand is provided on the device to hold the apparatus upside down with the operator head disposed within the basin. The stand is formed at its top end with a header carrying contacts which are connected to the terminal on the bottom of the apparatus. The stand is composed of a fixed support and a movable arm which extends from the support and is formed at its top with the header.

Abstract: A fire fighting tool includes an elongated hollow cylindrical nozzle having a plurality of openings surrounding the nozzle, a tubular member and a coupling for connecting the tubular member to a hose. The tool also includes a mounting member for positioning the nozzle within an interior of a structure. The mounting member includes a base, an upper member and a pair of rotatable clamping members adjustably mounted on the mounting member for engaging inner and outer surfaces of a wall. The mounting member and nozzle extend through an opening in the wall for spraying water or other fire suppressant onto the fire. The tool also includes a rotatable heat shield for protecting a fireman from heat and smoke and a handle for carrying the tool.

Abstract: An improved water distribution system is provided for a dishwasher. The system includes one or more disks mounted in the dishwasher for rotation about a vertical axis, and one or more water nozzles in the dishwasher for directing a water jet onto the disks. The water jets are directed transverse to the axis of rotation of the disks so as to impart rotation to the disks, and thereby redirect the water jet to a radial direction for distribution in the washing chamber of the dishwasher. Thus, the linear kinetic energy of the water jet is transferred to radial kinetic energy by the rotating disk.

Abstract: A dishwasher includes a washing container provided with a washing tub and a housing cover which is connected to the washing tub. The washing tub is provided with an inner tub and a plastic support in order to reduce the noise occurring when the washing liquid comes into contact with the washing tub.

Abstract: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid (11), with an outlet port (14) equally provided on the housing (20) to discharge the cleaning fluid (11), and with a filter element (F), said filter element (F) being provided with filter pores for filtering out solid particles, particularly hair particles, and being arranged in a flow area between the inlet port (15) and the outlet port (14), in a manner enabling the pump capacity to be significantly reduced or the service life of a cartridge (K) to be substantially increased. This is accomplished in that the filter element (F) has pores of a size causing part of the particles to penetrate the filter element (F) according to their size.

Abstract: Counterbalance devices are provided for a closure mounted with respect to a container. The devices can include a stationary friction member, an elongated flexible member, and a biasing member. The stationary friction member can be comprised of a mounting portion and a friction portion. An intermediate portion of the elongated flexible member can also slidingly engage the friction surface of the stationary friction member.

Abstract: A method for cleaning tubes and heat exchangers provides a cavitation enhancement unit between a source of pressurized fluid an a lance. The pressurized fluid flows through jets, which impart a high speed rotation to a set of propellers, preferably square in profile canted at a 15° angle. Generation of cavitation develops a cleaning vibration in the fluid discharged from the lance.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A shaving apparatus cleaning device includes a reservoir for holding a supply of a cleaning fluid and a cleaning receptacle for receiving the shaving apparatus. The reservoir has a discharge orifice through which the cleaning fluid is allowed to flow from the reservoir to the cleaning receptacle. The reservoir and the cleaning receptacle are designed so that the level of the cleaning fluid in the reservoir is higher than a pre-determined minimum level of the cleaning fluid in the cleaning receptacle, and a flow of fluid generated by the difference between levels and flowing from the reservoir to the cleaning receptacle is controllable in dependence upon the actual fluid level in the cleaning receptacle.