Abstract: The present invention is directed to a plate settler cover that prevents algae growth, prevents contamination from organic material, and provides structural support for a user who is standing or walking on the plate settler system. The plate settler covers can either float directly on standing water present in the system or may be structurally supported such that the plate cover is positioned above the surface of the water.

Abstract: Improved steamblow commissioning of a steam plant with steam discharged to the condenser and increased use of permanent piping instead of temporary piping with quenching/desuperheating and providing a low back pressure environment to enable aggressive steam blow cleaning.

Abstract: An assembly for delivering a fluid includes a fluid dispenser connected to a fluid supply conduit. The fluid dispenser includes a fluid outlet positioned along a length of the fluid dispenser. The fluid outlet is configured to deliver the fluid from the fluid supply conduit at a flow rate that varies along the length of the fluid dispenser.

Abstract: A razor cleaning device for use in a sink, bathtub, and/or shower allows a user to quickly and efficiently dislodge and displace hair cutting debris which accumulates between the blades of a razor while shaving. The razor cleaning device has a base assembly which provides a flow of water therethrough and into a spray head assembly. The spray head assembly is positionable along the base assembly into and out of an operative configuration, and has a plurality of spray nozzles arranged in a spray nozzle array thereon. A water supply line is connected between an inlet port of the base assembly and a water supply. The spray head assembly also includes a valve operable by the user to selectively permit water to flow to each of the plurality of spray nozzles, wherein the plurality of spray nozzles discharge jets of water in a predetermined spray pattern.

Abstract: A substrate liquid processing apparatus includes an inner tub 34A having a top opening and storing a processing liquid therein; an outer tub 34B provided outside the inner tub; a first cover body 71 configured to move between a closing position where a first region of the top opening is closed and an opening position where the first region is opened; and a second cover body 72 configured to move between a closing position where a second region of the top opening is closed and an opening position where the second region is opened. The first cover body has a bottom wall 711R and a sidewall 712R extended upwards therefrom, and the second cover body has a bottom wall 721R and a sidewall 722R extended upwards therefrom. Further, when being placed at the closing positions, the sidewalls closely face each other with a gap G having a height H.

Abstract: A substrate cleaning apparatus, includes a vaporizer configured to generate water vapor, a first heating part configured to heat a nitrogen gas to a first temperature, a second heating part configured to heat the nitrogen gas to a second temperature, wherein the second temperature is higher than the first temperature, and at least one cleaning chamber connected to the vaporizer, the first heating part, and the second heating part, wherein the at least one cleaning chamber is configured so that at least one substrate is exposed to the water vapor, the nitrogen gas having the first temperature, or the nitrogen gas having the second temperature under an atmospheric pressure.

Abstract: A substrate processing method includes a liquid discharging step of discharging liquid through a nozzle toward a predetermined supply region on the main surface of a substrate held on a substrate holding unit within a chamber, a humidified gas supplying step of supplying humidified gas with a humidity higher than the humidity within the chamber onto the main surface of the substrate to remove electrical charges carried on the substrate, and a spin-drying step of rotating the substrate about a predetermined rotational axis after the liquid discharging step to spin off the liquid component from the main surface of the substrate. The humidified gas supplying step is started before the start of the liquid discharging step and ended at a predetermined termination timing after the start of the liquid discharging step and before the spin-drying step.

Abstract: An apparatus and method for uniformly holding a substrate without flexure or bending of the substrate, thereby enabling accurate shape measurements of the substrate such as wafer curvature, z-height values and other surface characteristics. Techniques include using a liquid as a supporting surface for a substrate thereby providing uniform support. Liquid used has a same specific gravity of a substrate being supported so that the substrate can float on the liquid without sinking. Uniform support of the substrate enables precision metrology.

Abstract: Embodiments of the present disclosure generally include apparatus and methods for removing adhesive residues from a surface of a lithography mask. In particular, the processing systems described herein provide for the delivery of a solvent to a discrete plurality of locations on the surface of the lithography mask to facilitate the removal of adhesive residue therefrom. In one embodiment, a method of processing a substrate includes positioning the substrate on a substrate support of a processing system, sealing individual ones of a plurality of cleaning units to a surface of the substrate at a corresponding plurality of locations, heating a cleaning fluid to a temperature between about 50° C. and about 150° C., flowing the cleaning fluid to, and thereafter, from, the plurality of cleaning units, and exposing the surface of the substrate to the cleaning fluid at the plurality of locations.

Abstract: A method and apparatus for cleaning semiconductor wafer, combining batch cleaning and single wafer cleaning together. The method includes: taking at least two wafers from a cassette in a load port and putting said wafers into a first tank filled with chemical solution; after processing said wafers in the first tank, taking said wafers out of the first tank and keeping said wafers wet; putting said wafers into a second tank filled with liquid; after processing said wafers in the second tank, taking said wafers out of the second tank and keeping said wafers wet; putting one of said wafers on a chuck inside a single wafer cleaning module; rotating the chuck while applying chemical solution on said wafer; applying deionized water on said wafer; drying said wafer; taking said wafer out of the single wafer cleaning module and putting said wafer back to the cassette in the load port.

Abstract: A smoking pipe cleaning assembly for cleaning a smoking pipe includes a cylinder that is hollow to contain a fluid cleaning solution. A smoking pipe is insertable into the cylinder to submerge the smoking pipe in the fluid cleaning solution for cleaning the smoking pipe. A first cap is removably attachable to the cylinder and the first cap engages the smoking pipe to inhibit the smoking pipe from striking the cylinder. A second cap is removably attachable to the cylinder and the second cap receives the smoking pipe to inhibit the smoking pipe from striking the second cap. A base for is provided that insertably receives the cylinder when the smoking pipe is positioned in the cylinder.

Abstract: An endoscope tip attachment includes: a cylindrical casing that is arranged to surround a distal end portion of an endoscope that includes a raising base to raise a treatment tool; and a fluid controller that is positioned at an opening of a treatment-tool insertion channel of the endoscope inside the casing in a state in which the casing is attached to the distal end portion of the endoscope, the fluid controller being configured to control a flow of solution that has flowed from the treatment-tool insertion channel of the endoscope toward the distal end portion of the endoscope to flow equally along an entire surface of the raising base provided at the distal end portion of the endoscope, and being movable by pressure received from the solution.

Abstract: A washing machine and/or a fluid flow structure for a washing machine wash tank is provided. The wash tank is generally rectangular and includes a bottom wall, two side walls and two end walls extending upwardly from said bottom wall. The wash tank further includes at least one flow directional opening in at least one of the walls. In a preferred embodiment, the wash tank includes a plurality of flow directional openings positioned along one of the side walls of the wash tank. A fluid flow structure is located within said wash tank, which includes a fluid flow guide surface, and a support for said guide surface. The guide surface includes an expansion structure that is designed to counteract expansion of the guide surface that occurs during operation of the washing machine. In one embodiment the expansion structure is an expansion slot that engages a portion of the guide surface.

Abstract: A food washing assembly includes a container for containing a fluid and food items. The container has an outer wall and the outer wall has a plurality of deformable sections that is each squeezable inwardly on the outer wall. A strainer is positionable in the container to support the food items. Each of the deformable sections is squeezed to frictionally engage the strainer thereby retaining the strainer at a selected point in the container. Moreover, the container is agitated when the when the strainer is positioned in the container for washing the food items with the fluid. A lid is removably coupled to the container for retaining the food items and the fluid in the container for washing the food items with the fluid.

Abstract: A storage unit of an embodiment includes a container, a rectifying plate, and an exhaust duct. The container provides a first space for storing a plurality of substrates therein, and a second space behind the first space. The rectifying plate is provided between the first and second spaces. The exhaust duct communicates with the second space. The rectifying plate has an effective region facing the first space. The effective region includes a first region and a second region. The first region faces a center of the first space. The second region extends on one side or both sides of the first region. In the first region, a plurality of through holes are formed to be distributed over the first region. The second region has a conductance lower than a conductance of the first region.

Abstract: A dishwasher includes a main body, a washing tub provided inside the main body, and configured to wash dishes therein, a fixed nozzle assembly fixed to one side of the washing tub, and configured to spray washing water; and a vane installed inside the washing tub in such a way to be movable along a first direction, and configured to reflect washing water sprayed from the fixed nozzle assembly toward the dishes.

Abstract: A spray arm assembly for a dishwasher having a spray arm having a spray arm inlet, a bearing assembly having a bearing body defining a through passage with a bearing inlet and a bearing outlet fluidly coupled to the spray arm inlet; and a liquid supply conduit having a supply outlet fluidly coupled to the bearing inlet.

Abstract: A substrate processing device (10) for processing a plurality of substrates disposed at predetermined intervals includes a processing bath (12) that is configured to store processing liquid, and has a side surface (13) extending along a thickness direction of the plurality of substrates, and a discharge unit (14) that is disposed in a bottom portion of the processing bath (12), and is configured to discharge processing liquid in an upward direction toward the side surface (13).

Abstract: Systems and methods are described for salvaging red blood cells from patients during a surgical procedure. In one general aspect, a system is described for extracting blood from blood-soaked absorbent surgical materials such as surgical sponges, gauze, tape, and the like. The collected blood and fluids from these materials can be transferred to a cell salvage machine for harvesting viable red blood cells for autotransfusion.

Abstract: A fluid dynamic model having at least 5,000,000 cells of the portion of a gas phase reactor from the exit of the condenser to a half a reactor diameter above the bed plate is useful in determining the design of the bottom surface or support structure for a bed plate to minimize liquid pooling below and above the bed plate when operating in condensing mode.

Abstract: Tubs for dishwasher appliances, as well as associated dishwasher appliances, are provided. A tub includes a plurality of walls defining a wash chamber. At least one of the plurality of walls includes a non-porous outer barrier, a non-porous inner barrier, and a porous media disposed between the outer barrier and the inner barrier. The porous media includes a matrix and one or more voids defined in the matrix.

Abstract: Generation of adhered materials in a space over a gas guide of a shower head is inhibited. A substrate processing apparatus includes a process chamber; a buffer chamber including a dispersion unit; a process gas supply hole installed in a ceiling portion of the buffer chamber; an inert gas supply hole installed in the ceiling portion; a gas guide disposed in a gap between the dispersion unit and the ceiling portion, the gas guide including a base end portion disposed at a side of the process gas supply hole, a leading end portion disposed closer to the inert gas supply hole than to the process gas supply hole, and a plate portion connecting the base end portion and the leading end portion; a process chamber exhaust unit; and a control unit.

Abstract: A device (5), arranged for fluid communication with a washing chamber (2) of a dishwasher (1), the device further being arranged to allow a passage of air (9) between the washing chamber and the device, the device comprising a drying material (10) arranged in a bed (11), the drying material being able to withdraw moisture from the air passing through the bed during a withdrawal step, and release moisture to the air during a regeneration step, a heating element (13) arranged in the bed arranged to heat the drying material during the regeneration step such that moisture is released from the drying material, and a fan (14), arranged to circulate the air between the device and the washing chamber such that the air flow rate during the withdrawal step is higher than the air flow rate during the regeneration step by altering the fan speed.

Abstract: The present invention provides a chemical-liquid mixing method and a chemical-liquid mixing apparatus capable of sufficiently generating a peroxornonosulfuric acid that is effective in removing a resist from a substrate, when a sulfuric acid and a hydrogen peroxide solution are mixed with each other. At first, an inner tank 10 is filled up with a sulfuric acid and the sulfuric acid overflowing from the inner tank 10 is allowed to flow into an outer tank 12. Then, a hydrogen peroxide solution is supplied into the inner tank 10 and the hydrogen peroxide solution is allowed to flow into the outer tank 12 whereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank 12. Simultaneously when the hydrogen peroxide solution flows into the outer tank 12, a return pump 16 is activated.

Abstract: Rinsing methodologies and components to accomplish rinsing of tool surfaces in tools that are used to process one or more microelectronic workpieces. The invention can be used to rinse structures that overlie a workpiece being treated in such a manner to function in part as a lid over the process chamber while also defining a tapering flow channel over the workpiece. Rather than spray rinsing liquid onto the surface in a manner that generates undue splashing, droplet, or mist generation, a swirling flow of rinse liquid is generated on a surface of at least one fluid passage upstream from the surface to be rinsed. The swirling flow then provides smooth, uniform wetting and sheeting action to accomplish rinsing with a significantly reduced risk of generating particle contamination.

Abstract: A method and an installation for high-pressure liquid jet deburring are proposed, in which a machined workpiece (44) is deburred by means of a high-pressure/high-speed liquid jet from a high-pressure jet nozzle (30) that is connected to a high-pressure liquid circuit (32). According to the invention, the deburring receptacle (16) has a flooding inlet (48) connected to a liquid supply circuit for flooding the deburring receptacle (16) with cleaning liquid and is configured to contain a bath (46) of cleaning liquid during operation. Prior to deburring, the deburring receptacle (16) is flooded with cleaning liquid via a flooding inlet (48) of the deburring receptacle. Further according to the invention, the machined portion (44) is deburred after flooding and by means of a liquid jet without gas sheath such that the high-pressure/high-speed liquid jet and at least the machined portion are immersed in a bath of cleaning liquid during deburring.

Abstract: A painting implement cleaning and storage apparatus 10 is provided. The apparatus facilitates the cleaning and storage of painting implements such as a roller 12, a brush 14 and a roller pan 16. The apparatus includes a base 18 and a bracket 32 coupled to the base. The roller 12 is supported on the bracket 32 in an upwardly extending diagonal position between shields 45 and 54 for containing paint spreads from the roller. The brush 14 is supported on bracket 32 in a upwardly projecting position. A roller pan 16 is coupable to shield 45 and supported thereon in a descending position. Once the painting implements 12, 14 and 16 are supported on the apparatus 10, cleaning can be accomplished by the application of a stream of water thereto after which the implements can be left until they are needed.

Abstract: A washing machine and/or a fluid flow structure for a washing machine wash tank is provided. The wash tank is generally rectangular and includes a bottom wall, two side walls and two end walls extending upward from said bottom wall. The wash tank further includes at least one flow directional opening in at least one of the walls. In a preferred embodiment, the wash tank includes plurality of flow directional openings positioned along one of the side walls of the wash tank. A fluid flow structure is located within said wash tank, which includes a fluid flow guide surface, and a support for said guide surface. The guide surface includes an expansion structure that is designed to counteract expansion of the guide surface that occurs during operation of the washing machine. In one embodiment the expansion structure is an expansion slot that engages a portion of the guide surface.

Abstract: A substrate processing apparatus includes a first gas supply system provided with a source gas supply control unit; a second gas supply system provided with a reactive gas supply control unit; a third gas supply system provided with a cleaning gas supply control unit; a shower head unit including a buffer chamber connected to the gas supply systems and a dispersion plate installed at a downstream side of the buffer chamber; a substrate support installed at a downstream side of the dispersion plate and electrically grounded; a process chamber accommodating the substrate support; a plasma generation unit including a power supply and a switch configured to switch plasma generation between the buffer chamber and the process chamber; and a control unit configured to control the source gas supply control unit, the reactive gas supply control unit and the plasma generation unit.

Abstract: A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.

Abstract: A dish washing machine having a structure allowing wash water to be evenly sprayed into a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub to accommodate the dishes, a spray unit to spray wash water into the washing tub, a diversion unit arranged inside a flow passage of wash water to divert the wash water sprayed from the spray unit, and a guide member coupled to one side of the diversion unit to allow the diversion unit to move within the washing tub. As the spray unit and the diversion unit are provided, a dead zone which wash water does not reach may be eliminated, and divided and intensive washing may be implemented in the washing tub.

Abstract: Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

Abstract: An open-bottomed reactor cell for wet processing of substrates can be configured to confine a process liquid to an area under the cell (processing the “internal site”), or alternatively to exclude the process liquid from most of the area under the cell (processing the “external site”) without physical contact between the cell and substrate. A slight underpressure or overpressure maintained inside the main cavity of the cell causes the liquid to form a meniscus in the narrow gap between the cell and substrate rather than flowing outside the desired process area. An area under a peripheral channel outside the main cavity of the cell is shared by both the internal site and the external side, allowing the entire substrate to be processed.

Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.

Abstract: The present invention discloses a washer for washing produce such as potatoes. In one aspect, a debris removal section removes debris, such as rocks, and a sloped serpentine flume is used to gravity feed the produce through a serpentine flow path to remove the surface dirt and loosen any embedded dirt. The produce can be optionally routed to a spray washer to remove embedded dirt.

Abstract: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

Abstract: A dish washing machine having a structure allowing water to be evenly ejected onto the interior of a washing tub. The dish washing machine includes a cabinet forming an external appearance of the dish washing machine, a washing tub arranged in the cabinet and allowing dishes to be washed therein, a dish basket arranged in the washing tub, at least one liquid ejection unit arranged in the washing tub to eject water, a defection unit arranged facing the liquid ejection unit to deflect the water ejected from the liquid ejection unit toward the dish basket, and a drive unit to drive the defection unit to be moved within the washing tub. Since the dish washing machine includes a defection unit in addition to a liquid ejection unit, a dead zone which water does not reach may be eliminated and divided and intensive washing may be possible in the washing tub.

Abstract: A cleaning tank apparatus and methods for cleaning workpieces are described. The cleaning tank may include an outlet plate having a top edge and a bottom edge, with the outlet plate having a plurality of rows of outlet openings. The plurality of rows of outlet openings including a first row of outlet openings being closest to the top edge of the outlet plate, and a second row of outlet openings below the first row of outlet openings, wherein at least one of the outlet openings of the first row is larger than the outlet openings of the second row.

Abstract: An aqua comb typically used with a garden hose for thoroughly and quickly cleaning reusable pleated pool water filters and like filter cartridges having a pleated configuration. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed for leak-resistant attachment of the aqua comb to various hose endings, 2) an on/off valve for fluid flow control, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member with long fingers. The core design element of the aqua comb is the combined presentation angle and physical design shape of its comb member which works in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning action even in the valleys between filter pleats.

Abstract: An aqua comb used with a hose for thoroughly and quickly cleaning, rinsing and combing the hair of both humans and animals. The aqua comb comprises four design elements: 1) a rotating hose nut with internal seal that is employed to attach the aqua comb to various hose endings, 2) an on/off valve for controlling fluid flow through the aqua comb, 3) an elongated and rigid fluid spray body with fluid discharge openings, and 4) a semi-rigid comb member positioned above the discharge openings to lift hair and allow fluid spray to reach scalp and skin thereunder. The core design element of the aqua comb is the presentation angle and comb member structure which work in concert with the fluid spray discharged from the fluid spray openings in its elongated spray body to multiply and leverage mechanical cleaning and combing action.

Abstract: Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.

Abstract: A cleaning system comprising a tank having a wash area arranged to receive an article for cleaning; an inlet assembly mounted to a first end of the tank, through which a cleaning medium flows into the wash area; an outlet assembly having a flow control plate mounted to a second end of the tank; said flow control plate having a plurality of apertures and arranged such that the cleaning medium flows from the wash area through said apertures; said flow control plate arranged such that a total outlet area of said tank is equal to a sum of areas of the apertures; wherein the proportion of the total outlet area about the flow control plate is inversely proportional to a depth of said tank.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: The present subject matter provides a dishwashing appliance having a flow of air through an air passageway defined between an inner panel and an outer panel of the dishwasher appliance. The inner panel has a condensation surface for assisting in drying dishes in the dishwasher appliance. A dampening baffle causes at least one change of direction in the flow of air through the air flow passageway.

Abstract: A painting implement cleaning and storage apparatus 10 is provided. The painting implement cleaning and storage apparatus of this invention facilitates the cleaning and storage of painting implements such as a roller 12, a brush 14 and a roller pan 16. The apparatus of this invention is provided with a base support member 18. The roller 12 is supported on the base support member 18 in an upwardly extending diagonal position adjacent a shield 70 for containing paint spreads from the roller in a predetermined confined area. The brush 14 is supported on the base support member in a predetermined upwardly projecting position. A roller pan 16 is coupable to the base support member 18 and supported thereon in a diagonally descending position.

Abstract: Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.

Abstract: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

Abstract: A fluid inlet housing for controlled filling of a dishwasher is provided. For example, a dishwasher comprising a tub for receiving dishware therein, a water conduit, and a fluid inlet housing is provided. The fluid inlet housing is in fluid communication with the tub and the water conduit. Additionally, the fluid inlet housing is configured to direct water from the water conduit into the tub. The fluid inlet housing comprises an inlet for receiving water from the water conduit and an outlet for directing water into the tub. The fluid inlet housing also comprises a first baffle positioned between the inlet and the outlet and configured to divide water flow from the inlet into divergent paths. Moreover, the fluid inlet housing further comprises a second baffle positioned between the first baffle and the outlet and configured to combine the divergent paths of water flow prior to flowing through the outlet.

Abstract: Provided is a dish washer. The dish washer includes a tub configured to accommodate dishes, a sump configured to supply water to the tub, and a water supply device configured to supply water received from an outer source to the sump or the tub. The water supply device includes a body and a plurality of discharge parts. The body includes a water supply passage along which water supplied from an outer source flows and a water chamber in which water supplied through the water supply passage is stored. Water is discharged from the water supply passage to the water chamber through the discharge parts.

Abstract: A parts washer comprises a cabinet, a platform, a liquid distributor, a coupling, and a drive system. The platform is disposed inside the cabinet and supports articles that are required to be cleaned. The distributor is disposed inside the cabinet to one side of the platform and has one or more outlets that direct the liquid in a generally radial direction toward the platform. The coupling couples the distributor to an inside of the cabinet in a manner allowing at least 2°of freedom of motion of the distributor. More particularly, the coupling allows the distributor to move in a complex motion comprising a combination of tilting, rotation and up and down motion.