Including Work Heating Or Contact With Combustion Products Patents (Class 134/19)
  • Patent number: 10916454
    Abstract: A method of reducing resist residue on a semiconductor substrate includes introducing ozone gas into a chemical solution effective to dissolve resist residue adhered to the semiconductor substrate. The chemical solution is circulated through a processing tank where the semiconductor substrate is immersed in the chemical solution and through a first circulation path having a first pump and a first filter. After dissolution of the resist in the processing tank, the chemical solution is circulated through a second circulation path having a second pump and a second filter and returned to the processing tank. The first filter is cleaned by circulating the chemical solution through a third circulation path that includes the first pump and the first filter while introducing ozone gas into the chemical solution. The third circulation path is a closed loop path that excludes the processing tank, the second pump and the second filter.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: February 9, 2021
    Inventor: Ichiro Tamaki
  • Patent number: 10886133
    Abstract: A substrate processing method includes a substrate holding step of holding a substrate in which a pattern is defined on one major surface, a charge supply step of supplying a charge of one polarity to the substrate, a first voltage application step of applying, in parallel with the charge supply step, a voltage of the other polarity to a first electrode arranged on the other major surface of the substrate through a dielectric member, a second voltage application step of applying, after the first voltage application step, a voltage of the one polarity to the first electrode while keeping a state where a ground connection of the substrate is released and a drying step of removing, in parallel with the second voltage application step, a liquid from the one major surface of the substrate so as to dry the substrate.
    Type: Grant
    Filed: September 1, 2017
    Date of Patent: January 5, 2021
    Inventors: Daisuke Shimizu, Masayuki Otsuji, Shota Iwahata
  • Patent number: 10870751
    Abstract: A surfactant stabilized vinyl acetate ter-polymer based emulsion is provided comprising surfactant combination based freeze thaw stabilized vinyl acetate ter-polymer emulsion wherein said surfactant combination comprises non-ionic surfactant in combination with at least two polymerizable anionic reactive surfactants. A process of manufacturing the said emulsion is also provided, which process in comprising of selective sequence based steps and upon employing selective amounts of ingredients provides for said freeze thaw stable emulsion that is freeze thaw stable upto at least 5 cycles of freezing and thawing and yet maintains a particle size of 130-150 nm.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: December 22, 2020
    Assignee: ASIAN PAINTS LTD.
    Inventors: Swapan Kumar Ghosh, S Patnaik, E Saravanakumar, Vishal Muralidharan, B. P. Mallik
  • Patent number: 10811247
    Abstract: A cleaning and drying method of a semiconductor substrate capable of suppressing collapse or breakdown of a pattern which occur at the time of drying a cleaning solution after cleaning the substrate and decomposition of a resin at a bottom of the pattern, and capable of removing the cleaning solution with good efficiency without using a specific device.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: October 20, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tsutomu Ogihara, Osamu Watanabe, Takeshi Nagata, Naoki Kobayashi, Daisuke Kori
  • Patent number: 10786837
    Abstract: According to the present invention, a substrate processing apparatus has a chamber (1), a stage (4) for holding a substrate (W) to be processed in the chamber (1), and a nozzle part (13) from which a gas cluster is blasted onto the substrate (W) to be processed, and has a function for processing the substrate (W) to be processed by the gas cluster. Cleaning of the inside of the chamber (1) is performed by: placing a prescribed reflecting member (dW, 60) in the chamber (1), blasting a gas cluster (C) onto the reflecting member (dW, 60), and applying the gas-cluster flow reflected by the reflecting member (dW, 60) onto a wall section of the chamber (1) to remove particles (P) adhered to the wall section of the chamber (1).
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: September 29, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yukimasa Saito, Toshiki Hinata, Kazuya Dobashi, Kyoko Ikeda, Shuji Moriya
  • Patent number: 10752837
    Abstract: Disclosed herein is an environmentally safe etching composition and method for a concrete or mortar surface. The composition includes, in some embodiments, an aqueous solution of urea, acetic acid, an anticorrosive agent, and a surfactant with no more than about 30% (w/v) urea and at least about 10% (v/v) acetic acid. The method includes, in some embodiments, obtaining the etching composition; applying the etching composition to the concrete or mortar surface at a prescribed ratio of the etching composition to the concrete or mortar surface; allowing the etching composition to stand on the concrete or mortar surface for a prescribed amount of time; and washing the concrete or mortar surface with water to produce an etched surface of the concrete or mortar.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: August 25, 2020
    Inventors: Lee Shaw, Linda S. Shaw
  • Patent number: 10712248
    Abstract: The apparatus for measuring disentrainment rate of air includes a Confined Plunging Liquid Jet Reactor (CPLJR) having a downcomer column surrounding a liquid jet. The end of the downcomer column is partially immersed in a receiving liquid pool contained in a reservoir. A conical ring is placed in the downcomer column below the liquid jet, the ring bearing against the wall of the downcomer column and forming a seal to define a headspace in the column. A gas supply and first bubble meter are connected to the column above the conical ring to supply gas and measure total entrainment. A second bubble meter connected to the headspace between the ring and the receiving pool measures disentrainment, and a third bubble meter connected to headspace above the receiving pool outside the column measures net entrainment.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: July 14, 2020
    Assignee: Kuwait University
    Inventor: Bader Al-Anzi
  • Patent number: 10679830
    Abstract: Embodiments of the invention generally relate to methods for removing a boron-carbon layer from a surface of a processing chamber using water vapor plasma treatment. In one embodiment, a method for cleaning a surface of a processing chamber includes positioning the pedestal at a first distance from the showerhead, and exposing a deposited boron-carbon layer to a first plasma process where the first plasma process comprises generating a plasma that comprises water vapor and a first carrier gas by biasing a showerhead that is disposed over a pedestal, and positioning the pedestal at a second distance from the showerhead and exposing the deposited boron-carbon layer to a second plasma process where the second plasma process comprises generating a plasma that comprises water vapor and a second carrier gas by biasing the showerhead and biasing a side electrode relative to the showerhead.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: June 9, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Feng Bi, Prashant Kumar Kulshreshtha, Kwangduk Douglas Lee, Paul Connors
  • Patent number: 10663356
    Abstract: Provided is a method for measuring the temperature at each location of a pipe in a hot water supply system comprising a water heater, a pipe, and outlets, the method comprising checking for a temperature of a first point (TP1), which is upstream of the outlet, a temperature of a second point (TP2), which is downstream of the outlet and an outdoor temperature (TA), and confirming a length (L) of the pipe from the first point to the second point, then measuring a temperature of the pipe located at a distance of x away from the first point.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: May 26, 2020
    Assignee: KYUNGDONG NAVIEN CO., LTD.
    Inventors: Seung Kil Son, Si Hwan Kim, Chang Heo Heo, Jung Keom Kim, You Bin Lee
  • Patent number: 10618089
    Abstract: A solids heat exchanger (10) is in the form of a shell and tube arrangement having a shell section (11) through which heated oil (12) passes and a tube section (13). A screw conveyor (14) extends along its length and has a drive motor (15). Drill cuttings or other hydrocarbon contaminated materials are fed in through an inlet (16) and then conveyed along the tube (13) where heat transfer takes place. On exiting the tube (13) oil and water vapour rises and escapes through a first outlet (17) while the now cleaned drill cuttings or other materials fall through a second outlet (18) forming a discharge zone. The apparatus aims to reduce the oil content of the solids to less than 0.5%. The solids can then simply be disposed of. The base oil can be reclaimed and reused.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: April 14, 2020
    Assignee: William Curle Developments Limited
    Inventor: William Curle
  • Patent number: 10615034
    Abstract: The present disclosure generally relates to methods for removing contaminants and native oxides from substrate surfaces. The method includes exposing a surface of the substrate to first hydrogen radical species, wherein the substrate is silicon germanium having a concentration of germanium above about 30%, then exposing the surface of the substrate to a plasma formed from a fluorine-containing precursor and a hydrogen-containing precursor, and then exposing the surface of the substrate to second hydrogen radical species.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: April 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bo Zheng, Avgerinos V. Gelatos, Anshul Vyas, Raymond Hoiman Hung
  • Patent number: 10553459
    Abstract: A substrate processing method includes a liquid film forming step of supplying a low surface tension liquid onto the upper surface of the substrate while rotating the substrate at a first rotational speed, in order to form a liquid film of the low surface tension liquid on the upper surface of the substrate, a rotation decelerating step of decelerating rotation of the substrate to a second rotational speed while continuing the liquid film forming step, after a processing liquid on the substrate has been replaced with the low surface tension liquid, an opening forming step of forming an opening in the center region of the liquid film on the substrate that rotates at the second rotational speed after completion of the liquid film forming step, and a liquid film removing step of removing the liquid film from the upper surface of the substrate by widening the opening.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: February 4, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Taiki Hinode, Sadamu Fujii, Rei Takeaki
  • Patent number: 10502464
    Abstract: Provided is an apparatus for removing residual water in a hot water mat using a circulating pump, in which residual water that remains in a boiler and a mat of the hot water mat and a mat can be conveniently and rapidly removed, the configuration of the apparatus for removing residual water in the hot water mat can be simplified and the leakage at a connector of the boiler and the mat is prevented from occurring so that the risk of suffering a low-temperature burn can be eliminated during the removal of residual water.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: December 10, 2019
    Assignee: KYUNGDONG NAVIEN CO., LTD.
    Inventors: Tae Won Yun, Hyung Geol Im, Yong Seok Lee
  • Patent number: 10286427
    Abstract: An apparatus for cleaning an instrument with a cleaning fluid includes a vessel defining a chamber and a port for at least partially filling the chamber with the fluid. The apparatus further includes an ultrasonic transducer for delivering ultrasonic energy to the fluid, and a vacuum pump for depressurizing the chamber. The apparatus further includes a rotatable device removably disposable in the chamber and having a rack defining a cavity for supporting the instrument. The rotatable device also has a fluid delivery member extending toward the cavity and having a fluid channel between an inlet and an outlet. The apparatus further includes a fluid transmission system in fluid communication with the chamber and the fluid channel of the fluid delivery member for circulating the fluid from the chamber through the fluid channel of the fluid delivery member. A method of cleaning an instrument is also provided.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: May 14, 2019
    Assignee: STRYKER SUSTAINABILITY SOLUTIONS, INC.
    Inventors: Jose Vasquez, Luis Diaz, Dan Peterson, Ed Cantey, Jody Berkey, Dan Fowler, Brian Thomas, Miguel J. Gonzalez
  • Patent number: 10238994
    Abstract: A process and apparatus for removing hydrocarbons from hydrocarbon containing drilling waste. The process includes introducing hydrocarbon contaminated drill cuttings into one or more centripetal cuttings separators to create two distinct phases, thereafter discarding the bulk solids containing less hydrocarbons and treating the concentrated liquids phase in a solvent wash apparatus, resulting in improved efficiency of the facility throughput, while not substantially impacting the capital cost or operating cost of a solvent wash process facility. Apparatus for performing the process is also described.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: March 26, 2019
    Assignee: RECOVER ENERGY SERVICES INC.
    Inventors: Stan Ross, Wendell Palmer
  • Patent number: 10221068
    Abstract: In an ozone generating system which performs intermittent operation, that is, an operation in an ozone generating operation period in which ozone is generated by discharging gas including oxygen at a discharge electrode part and an operation in an ozone generating operation standby period in which ozone is not generated by stopping discharge are alternately repeated, a gas circulating device which circulates gas in the ozone generating apparatus and removes at least nitric acid from the gas which is circulated is connected to the ozone generating apparatus.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: March 5, 2019
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Noboru Wada, Yasutaka Inanaga
  • Patent number: 10163630
    Abstract: The present disclosure generally relates to methods for removing contaminants and native oxides from substrate surfaces. The method includes exposing a surface of the substrate to first hydrogen radical species, wherein the substrate is silicon germanium having a concentration of germanium above about 30%, then exposing the surface of the substrate to a plasma formed from a fluorine-containing precursor and a hydrogen-containing precursor, and then exposing the surface of the substrate to second hydrogen radical species.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: December 25, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bo Zheng, Avgerinos V. Gelatos, Anshul Vyas, Raymond Hoiman Hung
  • Patent number: 10106442
    Abstract: Corrosion Resistant Ozone Generators, including ozone generating chips, for various purposes including spas, pools and jetted tubs as well as methods for making and using such Corrosion Resistant Ozone Generators.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: October 23, 2018
    Assignee: Custom Molded Products, LLC
    Inventors: Frank G. Martin, Joseph A. Cannavino
  • Patent number: 10099242
    Abstract: A melter includes a heater unit for melting adhesive, a reservoir for receiving melted adhesive from the heater unit, and a pump in fluid communication with the reservoir and located within a heated housing. The heated housing heats the pump during startup and regular operation of the adhesive melter, thereby reducing delays in operation caused by slow warming of adhesive within the pump. The heated housing may be a manifold in fluid communication with the reservoir and with fluid outlets in some embodiments, but the heated housing may also be a separate heat block. In either type of embodiment, the pump is configured to be inserted cartridge-style into the heated housing and held in position using a single locking fastener. Additional elements such as insulating external housings and mounting hooks may also be used to further encourage conductive heat transfer into the structure surrounding the pump.
    Type: Grant
    Filed: April 15, 2014
    Date of Patent: October 16, 2018
    Assignee: Nordson Corporation
    Inventors: Steven Clark, David R. Jeter
  • Patent number: 10000863
    Abstract: A method for cleaning a single crystal pulling apparatus according to the present invention includes preparing a dummy crucible that simulates a crucible and includes a dummy liquid surface simulating a liquid surface of material melt in the crucible and a first dummy ingot simulating a single crystal ingot in process of being pulled up from the liquid surface of the material melt, and supplying gas in a state in which the dummy crucible is installed in a decompressed chamber of the single crystal pulling apparatus to generate a flow of the gas affected by the dummy crucible and detach foreign substances adhering to a wall surface of the chamber or parts in the chamber.
    Type: Grant
    Filed: January 22, 2016
    Date of Patent: June 19, 2018
    Assignee: SUMCO CORPORATION
    Inventor: Kenji Okita
  • Patent number: 9970138
    Abstract: In order to recycle glass fiber/fiber fabric production waste material, such as a material used in the manufacturing of rotor blades for wind turbines, and preferably where the material is bendable or flexible and reinforced in a plurality of layers in one or more directions in planes that are parallel with the surface of the material and stitch bonded together, the material is mechanically processed involving a size reduction of the material into shorter fiber length, in order to convert the material into one or more substantial pure glass fiber products. In this way it is possible inter alia to further process the material and create materials such as acoustic insulation wool, and chopped glass fiber strands.
    Type: Grant
    Filed: April 4, 2013
    Date of Patent: May 15, 2018
    Assignee: UCOMPOSITES A/S
    Inventors: Anders Kristian Linnet, Jakob Grymer Tholstrup
  • Patent number: 9924482
    Abstract: A communications terminal receives a data communications signal via a random access channel. A processor searches for data bursts in a first time-slot that include one of a first set of signature sequences assigned to the first time-slot. When a data burst A in the first time-slot includes one of the first set of signature sequences, the data burst A in the first time-slot is an initial burst of a message from a first communications terminal. The processor determines whether a second time-slot includes a data burst B that includes the one signature sequence. When the second time-slot includes the data burst B, the message is a multi-burst message and that the data burst B is a second burst of the multi-burst message. When the second time-slot does not include the data burst B the message is a single-burst message that has been completed via the first time-slot.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: March 20, 2018
    Assignee: Hughes Network Systems, LLC
    Inventors: Lin-Nan Lee, Liping Chen, Victor Liau
  • Patent number: 9909806
    Abstract: The invention relates to a dryer for a lacquering facility: a) having a dryer housing, in which heated air is circulated, b) having an exhaust air line for a exhausting exhaust air from the dryer housing; c) having a combustion unit, which is connected to the exhaust air line, and which is used for thermal post-treatment of the exhaust air from the dryer housing and for providing hot air to a heat exchanger; d) wherein said heat exchanger is set up to supply said dryer housing with heated fresh air; and wherein e) at least one heating unit for heating the air circulated in said dryer housing is associated with said dryer housing. It is provided according to the invention that a combustion air supply of the heating unit is connected so it communicates with the dryer housing.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: March 6, 2018
    Assignee: EISENMANN SE
    Inventors: Peter Schwerer, Peter Obstfelder
  • Patent number: 9788698
    Abstract: A robot floor cleaning system features a mobile floor cleaning robot and an evacuation station. The robot includes: a chassis with at least one drive wheel operable to propel the robot across a floor surface; a cleaning bin disposed within the robot and arranged to receive debris ingested by the robot during cleaning; and a robot vacuum configured to pull debris into the cleaning bin from an opening on an underside of the robot. The evacuation station is configured to evacuate debris from the cleaning bin of the robot, and includes: a housing defining a platform arranged to receive the cleaning robot in a position in which the opening on the underside of the robot aligns with a suction opening defined in the platform; and an evacuation vacuum in fluid communication with the suction opening and operable to draw air into the evacuation station housing through the suction opening.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: October 17, 2017
    Assignee: iRobot Corporation
    Inventors: Russell Walter Morin, Harold Boeschenstein, Faruk Bursal, Chris Grace
  • Patent number: 9708726
    Abstract: A silicon wafer heat treatment method includes: placing a silicon wafer on a SiC jig and into a heat treatment furnace; performing heat treatment on the silicon wafer in the heat treatment furnace in a first non-oxidizing atmosphere; reducing the temperature; and carrying the silicon wafer out of the heat treatment furnace. In the heat reduction step, after the temperature is reduced to the temperature at which the silicon wafer can be carried out of the heat treatment furnace, the first non-oxidizing atmosphere is switched to an atmosphere containing oxygen, an oxide film having a thickness of 1 to 10 nm is formed on the surface of the SiC jig in the atmosphere containing oxygen, and the atmosphere containing oxygen is then switched to a second non-oxidizing atmosphere. A silicon wafer heat treatment method can prevent carbon contamination from a jig and an environment during a heat treatment process.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: July 18, 2017
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Wei Feng Qu, Fumio Tahara
  • Patent number: 9665000
    Abstract: The present disclosure provides a method of repairing a mask. The method includes inspecting a mask to identify a defect on the mask; performing a cleaning process to the mask using a non-thermal chemical solution to the mask; and repairing the mask to remove the defect from the mask. The non-thermal chemical solution is cooled by a cooling module to a working temperature below room temperature.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: May 30, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ching-Wei Shen, Chi-Lun Lu, Kuan-Wen Lin
  • Patent number: 9604261
    Abstract: An apparatus for removing a coating from a lengthwise section of an optical fiber includes a heater at least partially defining an elongate heating region configured for receiving the lengthwise section of the optical fiber, wherein the heater is configured for heating the heating region to a temperature above a thermal decomposition temperature of the at least one coating; a sensor configured for providing a signal indicative of explosive removal of the at least one coating from the lengthwise section of the optical fiber; and at least one device operatively associated with the sensor and the heater for receiving and processing the at least one signal from the sensor, and deactivating the heater. The at least one device may be configured for determining how much time passes between occurrence of the heater being deactivated and the at least one coating being removed from the lengthwise section of the optical fiber.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: March 28, 2017
    Assignee: Corning Optical Communications LLC
    Inventor: Qi Wu
  • Patent number: 9586242
    Abstract: A washing plant (10) comprises a battery (12) of washing and heat-disinfection machines (14, 16, 18) disposed along an alignment axis (X), able to operate in parallel with respect to each other in order to effect the washing and heat-disinfection, at least a translator slider (20) mobile in an automatic manner parallel to the alignment axis (X) in a front position to said battery (12), which receives the objects to be washed and both transports them in correspondence to the entrance of one of the machines (14, 16, 18) selected on each occasion depending on the washing program set or depending on availability, and moves them inside the desired machine (14, 16, 18) in a direction of feed (F) substantially perpendicular to said alignment axis (X), transport means (24) being provided to direct the objects to be washed toward the translator slider (20) operating in a direction of transport (Y) substantially parallel to said alignment axis (X).
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: March 7, 2017
    Assignee: STEELCO SPA
    Inventor: Fabio Zardini
  • Patent number: 9580672
    Abstract: Provided is a cleaning composition and its applications. The cleaning composition comprises a mixture of a halogen-containing compound and an organic solvent. In some embodiments, the halogen-containing compound is TetraButylAmmonium Fluoride (TBAF) and the organic solvent is either propylene glycol monomethylether acetate (PGMEA) or a mixture of PGMEA and propylene glycol monomethylether (PGME). The cleaning composition is effective in removing silicon-containing material off of a surface of an apparatus. In some embodiments, the apparatus comprises a pipeline for delivering the silicon-containing material in semiconductor spin-coating processes. In some embodiments, the apparatus comprises a drain for collecting waste fluid in semiconductor spin-coating processes. In some embodiments, the apparatus comprises a patterned substrate.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: February 28, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Yu Liu, Ching-Yu Chang
  • Patent number: 9545649
    Abstract: Processes for shutting down a hydroprocessing reactor and for removing catalyst from the reactor may comprise shutting off hydrocarbon feed to the reactor, stripping hydrocarbons from the catalyst, cooling the reactor to a first threshold reactor temperature, purging the reactor with N2 gas, introducing water into the reactor, and dumping the catalyst from the reactor, wherein the first threshold reactor temperature may be substantially greater than 200° F. In an embodiment, the water may be introduced into the reactor via a quench gas distribution system when the reactor is at a second threshold reactor temperature not greater than 200° F. to cool the reactor to a third threshold reactor temperature not greater than 120° F.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: January 17, 2017
    Assignee: Chevron U.S.A. Inc.
    Inventors: Jeff William Johns, Steven Alden Souers, Douglas Gayle McDaniel, David Lawrence Cooke, David Michael Bosi
  • Patent number: 9487741
    Abstract: The present invention relates to an acidic aqueous solution suitable for the pickling of stainless steel grades that comprises accelerators based on water soluble inorganic compounds comprising at least one nitrogen atom in an oxidation state in the range of ?2 to ??. The present invention further encompasses a process for the pickling of stainless steel that makes use of a pickling solution comprising the above-mentioned accelerators.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: November 8, 2016
    Inventors: Ioannis Demertzis, Mauro Rigamonti, Paolo Giordani, Paolo Gamboggi
  • Patent number: 9428684
    Abstract: An aqueous fluid composition useful for the recovery of hydrocarbons from a subterranean formation, including a mixture of water, a water soluble polymer, an inorganic salt and at least one zwitterionic surfactant and methods of using same.
    Type: Grant
    Filed: October 17, 2008
    Date of Patent: August 30, 2016
    Assignee: RHODIA OPERATION
    Inventors: Lawrence Alan Hough, Gilda Maria Lizarraga, Herve Adam, Jean-Christophe Castaing, Subramanian Kesavan
  • Patent number: 9309488
    Abstract: Cured or uncured silicones are effectively removed from substrates with minimized substrate corrosion by the use of a silicone dissolver containing a tetralkylammonium fluoride and an inorganic base, dissolved in a solvent.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: April 12, 2016
    Assignee: WACKER CHEMIE AG
    Inventor: Andreas Koellnberger
  • Patent number: 9224956
    Abstract: A method for reducing an internal pressure of a vacuum chamber while preventing impurity contamination within the vacuum chamber as much as possible is provided. The method includes: rough pumping reducing an internal pressure of a vacuum chamber by using a roughing pump, the roughing pump being a mechanical pump that is capable of reducing the internal pressure of the vacuum chamber to be less than 15 Pa; main pumping reducing the internal pressure of the vacuum chamber by using a main pump after the rough pumping, the main pump being a non-mechanical pump. Transition from the rough pumping to the main pumping is performed when the internal pressure of the vacuum chamber is no less than 15 Pa.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: December 29, 2015
    Assignee: JOLED INC.
    Inventors: Yuko Kawanami, Ryuuta Yamada
  • Patent number: 9027573
    Abstract: A substrate processing apparatus that includes a process tank having a pair of opposed sidewalls for storing a chemical liquid, and processing a plurality of substrates by the chemical liquid; a substrate holding mechanism including a holding part for holding the plurality of substrates, and a back part connected to the holding part and interposed between the substrates held by the holding part and one sidewall of the pair of opposed sidewalls when the substrate holding mechanism is loaded into the process tank. A heating device is disposed on the process tank for heating the stored chemical liquid. The heating device includes at least a first heater disposed on the one sidewall, and a second heater disposed on the other sidewall of the pair of opposed sidewalls. Energy outputs of the first heater and the second heater are independently controlled.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: May 12, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hironobu Hyakutake, Shinichiro Shimomura
  • Patent number: 9028616
    Abstract: Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: May 12, 2015
    Assignee: Kobe Steel, Ltd.
    Inventors: Ryusuke Kitamura, Ryo Shimoike, Hisamitsu Shimoyama, Nakaba Tsutsui, Yoshitaka Yamane
  • Publication number: 20150114432
    Abstract: A substrate processing method that is a method for removing a resist, the surface layer of which has been cured, from a substrate having a pattern disposed inside the resist and includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.
    Type: Application
    Filed: October 21, 2014
    Publication date: April 30, 2015
    Inventors: Keiji IWATA, Sei NEGORO, Tomohiro UEMURA, Yuji SUGAHARA
  • Patent number: 9011608
    Abstract: The present invention concerns a method for measuring the thickness of any deposit of material on the inner wall of a structure conducting a fluid stream of hydrocarbons, the method comprising the steps of: applying a first heat pulse or continuous heating to at least one first section of the structure removing deposits on the inner wall of the first section of the structure; applying a second heat pulse to both the first section of the structure and at least one second section of the structure, the first and second sections being spaced apart, which heat pulse does not loosen any deposit of material in the second section; measuring the temperature of the wall of the structure or the fluid during the second heat pulse at both the first and second sections; and determining the thickness of any deposit of material on the inner wall of the structure at the second section based on the measured temperatures. The present invention also relates to a corresponding device and arrangement.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: April 21, 2015
    Assignee: Statoil Petroleum AS
    Inventors: Lene Amundsen, Rainer Hoffmann, Reidar Schüller
  • Publication number: 20150101640
    Abstract: The invention relates to an arrangement for de-icing railway trucks and ore concentrate in railway trucks. The arrangement comprises a tunnel (2) having a number of discharge openings (3) for heated air which is used for de-icing and at least one exhaust opening (4) for used air. An air heater (5) is in communication with the discharge openings (3) through a supply air duct (6). The arrangement further comprises a water supply device arranged to supply water to the air heater (5) and/or the supply air duct (6). The capacity of the air heater (5) is high enough to heat the air to a temperature sufficient for vaporizing at least a portion of the water. The invention also relates to a corresponding method for de-icing.
    Type: Application
    Filed: April 3, 2013
    Publication date: April 16, 2015
    Applicant: EPN SOLUTIONS AB
    Inventors: Staffan Granström, Owe Johansson
  • Publication number: 20150096268
    Abstract: A method of preparing a sealing surface of a container for application of a seal. A lip of the container may be heated, rinsed, and dried to establish the sealing surface. Then the seal may be applied to the sealing surface.
    Type: Application
    Filed: October 3, 2013
    Publication date: April 9, 2015
    Applicant: Owens-Brockway Glass Container Inc.
    Inventors: Brian J Brozell, Brian J Chisholm, Joseph E Olsavsky
  • Patent number: 8999072
    Abstract: Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing metallic oxides from a heat exchanger under chemically reducing conditions or metallic species such as copper under chemically oxidizing conditions. In order to further enhance the heat transfer efficiency of heating cleaning solvents by direct steam injection, mixing on the secondary side of the heat exchanger can be enhanced by gas sparging or by transferring liquid between heat exchangers when more than one heat exchanger is being cleaned at the same time.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: April 7, 2015
    Assignee: Westinghouse Electric Company LLC
    Inventors: Robert D. Varrin, Jr., Michael J. Little
  • Publication number: 20150090297
    Abstract: A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.
    Type: Application
    Filed: September 24, 2014
    Publication date: April 2, 2015
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Jun MATSUSHITA, Yuji NAGASHIMA, Konosuke HAYASHI, Kunihiro MIYAZAKI
  • Publication number: 20150090298
    Abstract: In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent.
    Type: Application
    Filed: September 24, 2014
    Publication date: April 2, 2015
    Applicant: SHIBAURA MECHANTRONICS CORPORATION
    Inventors: Yuji NAGASHIMA, Jun MATSUSHITA, Yuki SAITO, Konosuke HAYASHI, Kunihiro MIYAZAKI
  • Publication number: 20150090296
    Abstract: A substrate processing device 100 includes a solvent replacing unit (organic solvent supply unit 15 and solvent supply unit 34) replacing a cleaning liquid with a volatile solvent of a low concentration, and thereafter further performing replacement with a volatile solvent of a high concentration.
    Type: Application
    Filed: September 24, 2014
    Publication date: April 2, 2015
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Yuji NAGASHIMA, Jun MATSUSHITA, Konosuke HAYASHI, Kunihiro MIYAZAKI, Masaaki FURUYA, Hidehito AZUMANO, Toyoyasu TAUCHI
  • Publication number: 20150086722
    Abstract: Embodiments described herein relate to a thermal chlorine gas cleaning process. In one embodiment, a method for cleaning N-Metal film deposition in a processing chamber includes positioning a dummy substrate on a substrate support. The processing chamber is heated to at least about 50 degrees Celsius. The method further includes flowing chlorine gas into the processing chamber and evacuating chlorine gas from the processing chamber. In another embodiment, a method for cleaning titanium aluminide film deposition in a processing chamber includes heating the processing chamber to a temperature between about 70 about degrees Celsius and about 100 degrees Celsius, wherein the processing chamber and the substrate support include one or more fluid channels configured to heat or cool the processing chamber and the substrate support.
    Type: Application
    Filed: September 12, 2014
    Publication date: March 26, 2015
    Applicant: Applied Materials, Inc.
    Inventors: Srinivas GANDIKOTA, Xinliang LU, Kyoung-Ho BU, Jing ZHOU, Seshadri GANGULI, David THOMPSON
  • Patent number: 8980009
    Abstract: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: March 17, 2015
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Arnold Storm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Thomas Stein, Edwin te Sligte
  • Publication number: 20150068557
    Abstract: A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step.
    Type: Application
    Filed: August 11, 2014
    Publication date: March 12, 2015
    Inventors: Sei NEGORO, Yasuhiko NAGAI, Keiji IWATA
  • Patent number: 8961696
    Abstract: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: February 24, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Tomita, Minako Inukai, Hiaashi Okuchi, Linan Ji
  • Publication number: 20150047677
    Abstract: A substrate processing apparatus includes a heater having an infrared lamp and a housing for heating an upper surface of a substrate held by a substrate holding mechanism with the heater in opposed relation to the upper surface. A heater cleaning method includes locating the heater at a position above a lower nozzle in opposed relation to a first spout of the lower nozzle, the lower nozzle being in opposed relation to a lower surface of the substrate held by the substrate holding mechanism, and a lower cleaning liquid spouting step of supplying a cleaning liquid to the lower nozzle to spout the cleaning liquid upward from the first spout with no substrate being held by the substrate holding mechanism to thereby supply the cleaning liquid to an outer surface of the housing of the heater located at the heater cleaning position.
    Type: Application
    Filed: February 25, 2013
    Publication date: February 19, 2015
    Inventor: Ryo Muramoto
  • Patent number: RE46896
    Abstract: A method for recycling glass mat waste, wound rovings, and other products includes providing a source of glass mat, or a plurality of rovings, for example on a roll, and routing the glass mat or rovings into a submerged combustion melter. An unwind system and a pair of powered nip rolls, powered conveyors, or other arrangement may work in combination to provide a substantially consistent rate of material into the melter. The melter may operate under less than atmospheric pressure to avoid fumes escaping the melter. A slot in the melter allows ingress of the glass mat or rovings into the melter, and a glass mat former such as a folder may be used to ensure that the mat fits through the slot. Alternatively, the glass mat may be cut by a slitter prior to entering the slot.
    Type: Grant
    Filed: July 28, 2015
    Date of Patent: June 19, 2018
    Assignee: JOHNS MANVILLE
    Inventor: Johns Manville