Abstract: Floor treatment cleaning system (3) for a floor cleaning machine (1), comprising at lest two treatment elements (7a, 7b) wherein each treatment element is equipped with cleaning means (11) and is eccentrically driven by driving means (15A) via at least two synchronized eccentric pivots (8), characterized in that the respective pivots revolve around their main rotation axes (13) in such a way that the at least two treatment elements perform opposite movements thereby transporting residues on the floor in a desired direction and balancing engine masses and friction. The treatment elements (7a, 7b) can be positioned in different ways: transversally relative to the moving direction of the machine (1) and parallel behind each other, transversally relative to the moving direction of the machine (1) and next to each other and in a V-shape or arcuate with the opening in the moving direction of the machine.

Abstract: A system and method for cleaning a substrate, such as a semiconductor wafer, utilizes a rotatable wafer supporting assembly with a cylindrical body to provide stability for the substrate being cleaned, even at high rotational speeds. The rotatable wafer supporting assembly may include wafer holding mechanisms with pivotable confining members that are configured to hold the substrate using centrifugal force when the wafer supporting assembly is rotated. In an embodiment, the cleaning system may include a positioning system operatively connected to an acoustic transducer to provide meaningful control of the acoustic energy applied to a surface of the substrate by selectively changing the distance between the acoustic transducer and the substrate surface so that the substrate can be cleaned more effectively.

Abstract: A method for cleaning a semiconductor substrate is provided. The method initiates with introducing a liquid onto the top surface of the semiconductor substrate. Then, a bottom surface of a resonator is coupled to a top surface of a semiconductor substrate through the liquid. Next, sonic energy is transmitted through the resonator to the liquid. Then, the liquid is heated through the bottom surface of the resonator. A method for applying localized heating to a cleaning chemistry during a cleaning operation of a semiconductor substrate is also provided. The method initiates with positioning a resonator to contact a surface of a cleaning chemistry applied to a semiconductor substrate. Then, heat energy is simultaneously applied with the sonic energy through the resonator to clean the semiconductor substrate. A device for cleaning a semiconductor substrate and system for cleaning a semiconductor substrate are also provided.

Abstract: This invention relates to a chaos washing machine for improving washing power and preventing the twist of clothes comprising a first washing tank having a plurality of induce holes for inducing the water current in which a detergent dissolved into the space where the laundry is contained, a second washing tank for enclosing the washing tank to be filled with water and a detergent, water current fans and fan motors occurring a turbulent flow to water in which a detergent is dissolved and pushing the turbulent flow from the second washing tank through the induce holes into the first washing tank and a washing tank motor for rotating the first washing tank.

Abstract: A method for precision cleaning of a workpiece with a cleaning fluid comprising liquid and/or supercritical fluid carbon dioxide and a primary solvent which is liquid at ambient temperatures and pressures comprises first placing the workpiece in a pressurizable vessel with a removable lid and within an inner tank open at the top; supplying the primary solvent to the inner tank; flushing the primary solvent through the pressure vessel; draining the inner tank to remove the primary solvent; and then supplying liquid and/or supercritical fluid carbon dioxide to the pressure vessel and flushing it through the vessel by withdrawing it from near the bottom of the inner tank.

Abstract: A method for cleaning a solid surface which is effective for a substance to be cleaned having a complicated structure and which uses no solvent such as CFC or the like which is harmful to the environment of the earth. A cleaning liquid is obtained by mixing insoluble particles in a liquid and brought into an eddy-flow state so that a surface to be cleaned can be uniformly cleaned.

Abstract: An apparatus for generally cleaning large and substantially flat objects such as serigraphic printing frames is disclosed. The apparatus comprises a substantially flat vat covered by a lid and adapted to receive a cleaning liquid up to a predetermined level, a number of motor driven paddles located in the vat and having horizontal paddle blades located approximately at the predetermined level and mounted on vertical shafts so as to be rotatable to splash liquid upwardly, and supporting means for the substantially flat objects which comprises an open carrier grate structure mounted horizontally at a level between the paddles and the lid. The paddle blades are specifically shaped to perform an improved splashing function.

Abstract: A new and improved apparatus for washing soiled tubular members in a cleaning fluid wherein the apparatus includes a cleaning fluid tank for containing the cleaning fluid therein, support members with the cleaning fluid tank for supporting the tubular member between positions in and out of the cleaning fluid tank, along with directing means for directing cleaning fluid against the soiled tubular member and collection members with the cleaning fluid tank for collecting sludge formed during the washing of the tubular member.

Abstract: An apparatus for continuously cleaning grossly soiled products of plastic material, such as sheets, bands, sacks or the like and for preparing the material for subsequent re-use, comprising an elongated container having at least one downwardly extended funnel-shaped portion closed by a valve, means for feeding soiled comminuted plastic material in the region of one end wall into the container in which a bath of washing solution is maintained, a partition adjacent the other end wall extending into the bath and dividing the interior of the container into a washing zone and a discharge zone, communicating with each other adjacent the bottom of the container, means for agitating the working solution and the comminuted plastic material in the washing zone, and a sieve conveyor for removing the comminuted and cleaned plastic material from the discharge zone.

Abstract: Strip is cleaned by passing it through a molten salt bath in a rectangular tank having U-shaped heating tubes arranged horizontally along each longitudinal side of the tank. Agitators positioned within L-shaped ducts at diagonally opposite corners of the tank cause movement of the bath past the heating tubes, thus heating the bath uniformly and keeping it in motion to prevent sludge from settling out. A second tank arranged along one side of the main tank has two spaced apart openings into the main tank and an agitator which causes movement of molten salt therethrough. The second tank also has a settling chamber therein through which molten salt passes slowly so as to cause sludge to settle out.

Abstract: A dishwasher having a washing chamber with upper and lower dishracks disposed therein and having associated therewith upper and lower spray devices supplied with washing liquid respectively by first and second pumping devices. The first and second pumping devices are commonly mounted in a sump of the washing chamber and driven by a single unidirectional motor. The pumping devices are positioned in axial relation to one another with the lower or first pumping device supplying washing liquid at a lesser pressure to the upper spray device and the upper or second pumping device supplying washing liquid at a higher pressure to the lower spray device.

Abstract: Equipment for cleaning metal or plastic parts by immersion in a tank-contained agitated liquid cleaning solution in which the parts are loaded into open side cages mounted on a powered carrier wheel immersed in the solution and having interrupted rotation to carry the parts from a loading station at one side of the carrier above the solution downwardly therethrough and upwardly to an unloading station at the opposite side of the carrier, the tops of the cages being slotted to accommodate mechanical displacement of the parts through the cages and the tank containing stationary barriers blocking movement of the parts through the open sides of the immersed cages.