Abstract: Disclosed is a multifunctional water spray mop, which comprises a mop rod, a water spray mechanism arranged on the mop rod, and a mop head arranged at the tail end of the mop rod. The water spray mechanism comprises a water tank, a pump body in communication with the water tank, and a nozzle in communication with the pump body. The water spray mechanism is detachably arranged on the mop rod. The water spray mechanism is further provided with a connecting component used for connecting other cleaning components, and a press mechanism used for manually operating the pump body to spray a liquid in the pump body out of the nozzle.

Abstract: A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are adapted to clean a single deposition pin with a single tube per wash cycle.

Abstract: A washing/drying machine according to the present invention is capable of efficiently performing a drying operation to reduce a drying period. The washing/drying machine includes a tank (11) for storing used water, and the water is circulated from the tank (11) for dehumidification of air circulated through a drying air duct (20). Since the water is circulated from the tank (11), a great amount of water can be supplied as dehumidification water for higher dehumidification efficiency. The amount of the circulated water (the amount of cooling water (dehumidification water)) is reduced in a first half of a drying process, and increased in a second half of the drying process. As a result, the drying efficiency is improved during the drying operation, thereby reducing the drying period.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: A portable manual vehicle wash assembly including a base removably attachable to a top exterior surface of a vehicle. A hollow pipe is attached to the base and includes an inlet formed at a first end thereof, and an outlet at a second end thereof. The inlet is adapted to receive an end of a first hose in fluid communication with a water source. The outlet is generally directed away from the exterior surface of the vehicle, and has a swivel member attached thereto. The swivel member is connected to a water emitter, typically in the form of a second hose or a spray nozzle.

Abstract: A rotating and telescoping cleaning system improves high pressure water cleaning of the inner surfaces of vessels or tanks. Vessels can be vertically divided with dividing plates with centered through-holes. Synchronized and controlled transverse and rotary movements of water jets result in a controlled spiral or helical cleaning track along the vessel walls. The water jets are directed at a pre-adjusted distance from the vessel wall and the travel speed of the water nozzle jets is exactly controlled allowing the removal of very hard deposits. One pass with the tool carrier with operating water jets along the length axis of the vessel results in a thoroughly cleaned vessel wall. The tool unfolds and folds inside of the vessel powered by the flow of the high pressure cleaning water.

Abstract: A moisture control system generally comprising a collector element is configured to be incorporated into a structure to control moisture condensation on the interior and exterior of the structure. The collector element encourages condensation on its surface. The control system includes a channel in fluid communication with the collector element to direct the condensed liquid away from the control element.

Abstract: A cleaning apparatus includes a cleaning tank (2) which stores a process liquid used for cleaning a target object (W), a target object holding mechanism (4) which holds the target object (W) in the cleaning tank (2), and a process liquid supply mechanism (3) which supplies the process liquid to the cleaning tank (2). The target object (W) is immersed in the process liquid in the cleaning tank (2), and is cleaned while letting the process liquid overflow from the cleaning tank (2), thereby cleaning the target object (W). The cleaning apparatus further includes a cover (10) which covers a liquid surface in the cleaning tank (2), a support member (15a, 15b) which supports the cover (10), and a follow-up mechanism (14a, 14b) which moves the cover (10) such that the cover (10) follows the liquid surface while the cover (10) is supported by the support member (15a, 15b).

Abstract: Disclosed herein is a cleaning apparatus using ultrasonic waves. The cleaning apparatus to separate contaminations from a wafer includes a housing receiving an oscillator therein, and a rod coupled to a surface of the oscillator to transmit ultrasonic waves produced from the oscillator to a cleaning solution applied onto an upper surface of the wafer. The oscillator includes a piezo-electric device bonded to a diffusive layer consisting of a near-field region and a far-field region. The rod has a diameter-reduced portion to amplify the ultrasonic waves produced from the oscillator, thereby enabling the efficient removal of the contaminations on the wafer to be cleaned.

Abstract: A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the center of the wafer, a rear portion connected to a piezoelectric transducer, and a protrusion located between the rear portion and the front portion, located on an edge portion of the wafer, and having a larger cross section width than the front portion.

Abstract: The invention relates to an apparatus for scarifying the interior surface of a sewer pipe. The apparatus consists of a chassis, with an outer frame coupled to the chassis and an inner frame slidably coupled to the outer frame. Two extendible arms are attached to opposite sides of the inner frame. Each arm has a nozzle assembly mounted on the end, each nozzle assembly having a plurality of fluid jets for spray water onto the interior surface of the pipeline. The nozzle assembly may be pivotally mounted to allow for greater control of the fluid jets. The apparatus further includes a propulsion system for movement of the apparatus along the pipeline.

Abstract: A substrate is cleaned by supplying an ultrasonically-agitated cleaning liquid onto the substrate from a nozzle provided above the substrate while spinning the substrate. The substrate being cleaned is spun at a rotational speed of 2600 rpm or more and 3500 rpm or less, or at a rotational speed of 260×V/D (rpm) or more and 350×V/D (rpm) or less, where D (mm) is a diameter of the nozzle and V (mm/sec) is a moving velocity of the nozzle.

Abstract: A supercritical fluid cleaning system and method comprising mainly a pressure chamber, a closable lid, a substrate support for holding at least one substrate, a rotable shaft extending outward from within the chamber, an external rotary power source coupled magnetically or otherwise to the shaft, and a rotable component or impeller attached to the chamber end of the shaft in close proximity to the substrate holding position, and baffles located close to the rotable component. The rotable component is con|figured for rotation within the supercritical phase fluid in the chamber close to the surface of the wafer for causing agitation and turbulent fluid flow against the surface of the substrate, and increased intra-chamber fluid circulation.

Abstract: An apparatus for cleaning an enrober head and a method for using the apparatus, in which the apparatus has a cleaning medium supply vessel having an outlet and an open top, an enrober head mount registered with the open top of the vessel, and a pump, arranged to pump cleaning medium from the vessel to an applicator for application to enrober head elements requiring cleaning. The mount is adapted to attach an enrober head to the vessel, such that, when an enrober head is removed from an enrober and mounted on the apparatus, cleaning medium applied to elements of the enrober head can pass through those elements, through the mount and open top, and back into the vessel, cleaning the enrober head elements, and allowing the cleaning medium to be reapplied.

Abstract: Embodiments of the invention include a megasonic energy cleaning apparatus that has the ability to rotate the wafer to be cleaned, as well as rotate the cleaning probe during the cleaning process. Rotating the cleaning probe while the wafer is being cleaned is effective to increase the cleaning action of the apparatus while also minimizing damage to the wafer. Curved grooves, such as a spiral groove, can be etched into the cleaning probe to minimize forming harmful waves that could potentially cause damage to the wafer surface or to structures already made on the surface. Using a cleaning probe having a curved groove while also rotating the cleaning probe effectively cleans particles from a wafer while also limiting damage to the surface of the wafer.

Abstract: A method and device for cleaning the inside of a liquid dispensing tube that is contaminated with a previously dispensed liquid. The contaminated liquid dispensing tube is filled with a cleaning fluid. The liquid dispensing tube is then impacted with an impacting device. The impacting of the liquid dispensing tube creates pressure waves in the cleaning fluid. The pressure waves dislodge the liquid contaminate from the inside of the liquid dispensing tube while a flowing cleaning fluid flushes the liquid contaminate out of the liquid dispensing tube.

Abstract: Apparatus for cleaning removable oral appliances, such as tooth repositioning aligners, comprise a base having a tray for holding the appliance in a bath of cleaning solution. A low-frequency driver is provided in the base for reciprocating the tray about a horizontal or vertical axis to wash the cleaning solution over the appliance. Usually, the apparatus will further comprise a cradle which is mounted to reciprocate about a horizontal axis within the base. The cradle defines a receptacle which removably receives the cleaning tray. The cleaning tray is preferably reciprocated at frequency in the range from 1 Hz to 10 Hz, usually in the range from 2 Hz to 5 Hz.

Abstract: A method for cleaning a semiconductor substrate is provided. The method initiates with introducing a liquid onto the top surface of the semiconductor substrate. Then, a bottom surface of a resonator is coupled to a top surface of a semiconductor substrate through the liquid. Next, sonic energy is transmitted through the resonator to the liquid. Then, the liquid is heated through the bottom surface of the resonator. A method for applying localized heating to a cleaning chemistry during a cleaning operation of a semiconductor substrate is also provided. The method initiates with positioning a resonator to contact a surface of a cleaning chemistry applied to a semiconductor substrate. Then, heat energy is simultaneously applied with the sonic energy through the resonator to clean the semiconductor substrate. A device for cleaning a semiconductor substrate and system for cleaning a semiconductor substrate are also provided.

Abstract: An advanced cleaning system having a handle portion with a proximal end and a distal end, a cleaning head portion, the cleaning head portion adapted for use with a removable cleaning pad, and a cleaning fluid reservoir fluidically coupled to the cleaning head portion such that cleaning fluid is controllably allowed to flow via gravity onto the surface to be cleaned adjacent the cleaning head portion.

Abstract: The present invention relates to a method of removing a layer of material from a synthetic resin or an organic acid ester of cellulose comprising: washing the layer from the substrate with an aqueous alkali solution with a temperature of at least 105° C., and then washing the alkali solution from the substrate. Furthermore, the present invention relates to a pressure vessel used for the above method, comprising a longitudinal cylindrical body having a circular cross-section, an end plate connected to the top of the cylindrical body and an inverted end plate connected to the lower part of the cylindrical body in a manner such that its convex part faces upwards wherein the pressure vessel has a strainer plate and a stirring blade inside the cylindrical body.

Abstract: A method for cleaning a solid surface which is effective for a substance to be cleaned having a complicated structure and which uses no solvent such as CFC or the like which is harmful to the environment of the earth. A cleaning liquid is obtained by mixing insoluble particles in a liquid and brought into an eddy-flow state so that a surface to be cleaned can be uniformly cleaned.

Abstract: The invention concerns a washing device for treatment of rods attached to a plate with a solution. According to the invention the rods (6) are placed in ducts (4) through which the solution is passed. The invention can be used in particular in peptide syntheses and in immunological assay methods.

Abstract: A cleaning apparatus for removing synthetic residues from rotating parts of plastics processing machines includes a heatable tubular container which contains a dry powder or granular filling and is provided with an upper axial opening through which the part to be cleaned is introduced into the container. The part is clamped at its one end by a chuck which cooperates with a double-acting piston/cylinder unit so as to be movable upwardly and downwardly for introducing the part to be cleaned in the container and removing it therefrom after the cleaning cycle.

Abstract: An apparatus for cleaning those parts of processing machines of synthetic materials on which synthetic residues adhere includes a container which receives the parts and is airtightly closable. This container is associated to a heating unit which heats a liquid carrier medium to a temperature above the melting point of the synthetic residues adhering to the parts to be cleaned therefrom. The container is tiltable around a horizontal axis between a horizontal charging position and a vertical operating position. Connected to the container is a tank which is located below the container when the apparatus is in the horizontal position, and which accommodates the heat carrier medium. Upon movement of the container and the tank from the horizontal position into the vertical position, the heat carrier medium flows into the container and upon reverse movement flows back into the tank. An overflow determines the maximum filling level of the heat carrier medium in the container.

Abstract: A system including an apparatus for disinfecting articles placed within the apparatus for use with a conventional supply of fluid. The apparatus includes an outer vessel, an inner vessel so disposed within the outer vessel that an outer chamber is defined therebetween, means for covering the inner vessel, means of introducing fluid into the inner vessel, and means for selectively draining the inner and outer vessels. There may also be means for agitating the fluid in the inner vessel. The system includes the apparatus, means for selectively injecting disinfectant into the fluid prior to introduction of the fluid into the inner vessel, means for selectively sterilizing the fluid prior to introduction into the inner vessel and means for selectively recycling the disinfectant containing fluid for reintroduction into the inner vessel.

Abstract: A washing apparatus includes a cuplike casing receiving an annular receptacle containing the articles to be washed. A rotatable fluid distributor radially discharges fluid beneath the receptacle into the cup. The fluid is removed by a central overflow weir.

Abstract: An apparatus for washing cereals to wash them in a cereal washing tank by a jet water rotor. The invention includes collecting the water-cereal mix and removal of the heavier cereals from the mix which overflows a receiver to remove lighter weight wastes.