Metal Base Work, Acid Treating Patents (Class 134/41)
  • Patent number: 9607770
    Abstract: A capacitor having at least an anode body composed of a tungsten sintered compact and having less leakage current under high-voltage conditions and less variation in leakage current values, obtained by a production method including the steps of: compacting a tungsten powder to obtain a compression body; firing the compression body to obtain an anode body; applying voltage to the anode body, which is used as an positive electrode, in an alkaline fluid; chemically converting the surface layer of the anode body into a dielectric; optionally removing water from the anode body; and heat-treating the anode body, whose surface has been chemically converted into a dielectric, at a temperature of 100° C. or more and 260° C. or less.
    Type: Grant
    Filed: April 9, 2013
    Date of Patent: March 28, 2017
    Assignee: SHOW A DENKO K.K.
    Inventors: Kazumi Naito, Katsutoshi Tamura
  • Patent number: 9303761
    Abstract: A method for controlling a speed of a machine is disclosed. The machine may have a controller in communication with an operator interface and a hydraulic system configured to control tracks of the machine. The method may include the controller setting a current value for a speed limit on the machine according to a first predetermined value; the controller providing a display on the operator interface indicating the current value of the speed limit, the current value being the first predetermined value; the controller receiving input from the operator interface to change the speed limit to a second value; the controller setting the current value for the speed limit on the machine according to the second value; and the controller changing the display to indicate the current value of the speed limit being the second value.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: April 5, 2016
    Assignee: Caterpillar Forest Products Inc.
    Inventor: Joseph Robert Storey
  • Publication number: 20150148279
    Abstract: Embodiments of methods of removing polymeric soils from papermaking machine surfaces including developing a solvent blend that is a solubility match for the polymeric soils as defined by a Hansen Solubility factor less than 4 for all polymeric soils, producing an aqueous cleanser comprising the solvent blend, and applying the aqueous cleanser to papermaking surfaces such that the aqueous cleanser solubilizes and removes the polymeric soils from papermaking surfaces. The solvent blend comprises at least one aromatic alcohol, at least one dibasic ester, and at least one terpene solvent.
    Type: Application
    Filed: February 4, 2015
    Publication date: May 28, 2015
    Applicant: DUBOIS CHEMICALS, INC.
    Inventors: Harold Laser, Brandon E. Mahler, Robert E. Ebbeler
  • Publication number: 20150144162
    Abstract: A zwitterionic monomer and corresponding cyclopolymerized polyzwitterion (±) (PZ) containing, on each repeating unit, both phosphonate and sulfonate functionalities. Phosphonate ester hydrolysis in PZ gave a pH-responsive polyzwitterionic acid (±) (PZA). The PZA under pH-induced transformation was converted into polyzwitterion/anion (±?) (PZAN) and polyzwitterion/dianion (±=) (PZDAN).
    Type: Application
    Filed: November 27, 2013
    Publication date: May 28, 2015
    Applicants: King Abdulaziz City for Science and Technology, King Fahd University Petroleum and Minerals
    Inventors: Shaikh Asrof ALI, Shamsuddeen Abdullahi Haladu
  • Patent number: 9028620
    Abstract: Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: May 12, 2015
    Assignee: AWBSCQEMGK, Inc.
    Inventor: Melissa Archer
  • Patent number: 9029314
    Abstract: A warewashing detergent composition is provided for use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorous containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, high molecular weight polyacrylates (polyacrylic acid homopolymers) with a molecular weight of at least about 5000 are used as corrosion inhibitors and can be included for aluminum protection in a number of different detergent compositions.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: May 12, 2015
    Assignee: Ecolab USA Inc.
    Inventors: Erik C. Olson, Devon Beau Hammel
  • Patent number: 9011609
    Abstract: An ironing apparatus includes an ironing die and an ironing punch, an injection port for injecting gas or liquid to the metal plate at a high pressure to remove substance adhered to the metal plate therefrom, a suction port for sucking the adhered substance removed from the metal plate, and a protrusion mount portion with a protrusion for preventing dispersion of the gas or the liquid. An ironing method for ironing the metal plate having the single surface or both surfaces coated with the organic resin film includes the steps of injecting the gas or the liquid from the injection port to the metal plate at the high pressure to remove the adhered substance from the metal plate, and sucking and collecting the adhered substance removed from the metal plate from the suction port. The adhered substance such as the hair may be removed by the aforementioned invention.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: April 21, 2015
    Assignee: JFE Steel Corporation
    Inventors: Yusuke Nakagawa, Masaki Tada, Katsumi Kojima, Yasuhide Oshima, Hiroki Iwasa
  • Publication number: 20150075570
    Abstract: A semi-aqueous removal composition and process for selectively removing spin-on glass relative to a metal gate and/or ILD material from a microelectronic device having said material thereon. The semi-aqueous removal composition can be a fluoride-containing composition or an alkaline composition.
    Type: Application
    Filed: March 12, 2013
    Publication date: March 19, 2015
    Applicant: ENTEGRIS, INC.
    Inventors: Hsing-chen Wu, Sheng-hung Tu
  • Patent number: 8945314
    Abstract: A solid composition includes a polysaccharide hybrid polymer composition and a hydratable salt. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from approximately 5% to 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from approximately 10% to 75% by weight of the polysaccharide hybrid polymer composition.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: February 3, 2015
    Assignee: Ecolab USA Inc.
    Inventors: Kerrie E. Walters, Carter Silvernail
  • Patent number: 8940106
    Abstract: A composition including HCl, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone is provided in a method for solubilizing calcium carbonate in an aqueous suspension or dispersion of calcium carbonate.
    Type: Grant
    Filed: December 30, 2013
    Date of Patent: January 27, 2015
    Assignee: Green Products & Technologies, LLC
    Inventor: John T. MacDonald
  • Publication number: 20150021086
    Abstract: Various dulling processes for dulling metallic surfaces are disclosed to produce or render galvanized metallic surfaces less shiny. Particular embodiments of dulling galvanized metallic surfaces, such as galvanized steel, iron, and aluminum surfaces, and processes are disclosed to treat galvanized objects for color variation or enhancement while still maintaining protection provided by the galvanized layer. The present disclosure is also directed to apparatus, product and system having dulled surfaces formed by the disclosed dulling processes.
    Type: Application
    Filed: July 21, 2014
    Publication date: January 22, 2015
    Applicant: San Diego Gas & Electric Company
    Inventor: Denis Scott Sanford
  • Patent number: 8894774
    Abstract: A composition of matter and method to remove excess material during the manufacturing of semiconductor devices includes providing a substrate; applying a metal chelator mixture to the substrate, where the metal chelator mixture comprising a metal chelator and a solvent, where the metal chelator binds to the platinum residue, to render the platinum residue soluble; and rinsing the metal chelator mixture from the substrate to remove the platinum residue from the silicide.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: November 25, 2014
    Assignee: Intermolecular, Inc.
    Inventor: Anh Duong
  • Publication number: 20140326633
    Abstract: Compositions useful for the selective removal of silicon nitride materials relative to poly-silicon, silicon oxide materials and/or silicide materials from a microelectronic device having same thereon. The removal compositions include fluorosilicic acid, silicic acid, and at least one organic solvent. Typical process temperatures are less than about 100° C. and typical selectivity for nitride versus oxide etch is about 200:1 to about 2000:1. Under typical process conditions, nickel-based silicides as well as titanium and tantalum nitrides are largely unaffected, and polysilicon etch rates are less than about 1 ? min?.
    Type: Application
    Filed: July 15, 2014
    Publication date: November 6, 2014
    Inventors: Emanuel I. COOPER, Eileen Sparks, William R. Bowers, Mark A. Biscotto, Kevin P. Yanders, Michael B. Korzenski, Prema Sonthalia, Nicole E. Thomas
  • Patent number: 8876978
    Abstract: An object is to reduce changes in mechanical properties of a gas turbine blade base material during repair or regeneration of a gas turbine blade. For this purpose, a gas turbine blade after being operated is washed by being immersed into a strong alkaline washing solution, and the gas turbine blade after being washed with the strong alkaline washing solution is washed with water. The gas turbine blade after being washed with water is then washed by being immersed into a weak acid washing solution, and the gas turbine blade after being washed with the weak acid washing solution is subjected to heat treatment. The gas turbine blade after the heat treatment is then immersed into a strong acid washing solution, whereby the coating formed on the surface of the gas turbine blade is removed.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: November 4, 2014
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Tetsuji Kawakami, Ikumasa Koshiro, Rumi Haruna, Yoshitaka Uemura
  • Patent number: 8853144
    Abstract: A composition includes a polysaccharide graft polymer composition. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide graft polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide graft polymer composition.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: October 7, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Carter Silvernail, Erik C. Olson, Klin Rodrigues
  • Patent number: 8841246
    Abstract: A composition includes a polysaccharide hybrid polymer composition. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from about 5% to about 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from about 10% to about 75% by weight of the polysaccharide hybrid polymer composition.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: September 23, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Carter Silvernail, Erik C. Olson, Klin Rodrigues
  • Publication number: 20140243249
    Abstract: The present invention provides a metal stripping additive, composition containing the same, and method for stripping metal by using the composition. The metal stripping additive comprises a phosphate, a carbonate, and a component selected from at least one of citric acid or a derivative thereof, oxalate or a derivative thereof, malate or a derivative thereof. The metal stripping additive is used with nitric acid as the metal stripping composition of the present invention. The present method has advantages of being capable of stripping various metals, low corrosion, low toxicity, and being applicable under ambient temperature.
    Type: Application
    Filed: August 2, 2013
    Publication date: August 28, 2014
    Applicant: Uwin Nanotech. Co., Ltd.
    Inventor: CHING-HSIANG HSU
  • Patent number: 8808465
    Abstract: This disclosure dramatically extends by a factor of 5 to 7, the effective service-life of steel shaving blades by chelating mineral molecules in common tap water, thus preventing them from accumulating and attaching to the blade surfaces.
    Type: Grant
    Filed: June 6, 2013
    Date of Patent: August 19, 2014
    Inventor: James Ronald Darnall
  • Patent number: 8801867
    Abstract: A method for cleaning process apparatus used for production of liquids, especially for cleaning filters, for example membrane filters. The apparatus is contacted with a solution of periodate. It is especially preferred that the cleaning process is carried out at a temperature between 15 and 95° C.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: August 12, 2014
    Assignee: X-Flow B.V.
    Inventors: Arie Cornelis Besemer, Elmar Van Mastrigt, André Mepschen
  • Patent number: 8758521
    Abstract: A semiconductor substrate cleaning method includes cleaning a semiconductor substrate formed with a line-and-space pattern, rinsing the substrate, supplying the rinse water to rinse the substrate, and drying the substrate. The rinsing includes supplying deionized water and hydrochloric acid into a mixing section to mix the deionized water and the hydrochloric acid into a mixture, heating the mixture in the mixing section by a heater, detecting a pH value and a temperature of the mixture by a pH sensor and a temperature sensor respectively, adjusting an amount of hydrochloric acid supplied into the mixing section so that the rinse water has a predetermined pH value indicative of acidity, and energizing or de-energizing the heater so that the temperature of the mixture detected by the temperature sensor reaches a predetermined temperature, thereby producing the rinse water which has a temperature of not less than 70° C. and is acidic.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: June 24, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiro Ogawa, Hajime Onoda, Hiroshi Kawamoto
  • Patent number: 8753450
    Abstract: One exemplary embodiment can be a process for treating an interior of equipment for an isomerization unit. Generally, the isomerization unit includes at least one of a drying zone, an isomerization reaction zone, and a stabilizer zone, for receiving a feed stream. Usually, the feed stream includes one or more C4-C8 hydrocarbons. The process can include combining an anhydrous hydrogen stream and anhydrous organic chloride stream to form a hydrogen chloride feedstock, and passing the hydrogen chloride feedstock to a reaction zone containing a catalyst including at least one of nickel, palladium, and platinum on an alumina support to form a hydrogen chloride stream, and passing the hydrogen chloride stream upstream of the isomerization reaction zone.
    Type: Grant
    Filed: June 20, 2013
    Date of Patent: June 17, 2014
    Assignee: UOP LLC
    Inventors: Ralph Charles Norton, Dana K. Sullivan, Jocelyn C. Daguio
  • Patent number: 8747564
    Abstract: A residue-removing solution for removing residues after a dry process, which includes an amine salt of a monocarboxylic acid and/or a salt of a polycarboxylic acid that forms a 7- or more-membered ring chelate with copper, and water, the residue-removing solution containing aqueous solution (A) or (B) as described herein. Also disclosed is a method for removing residues present on a semiconductor substrate after dry etching and/or ashing. Further, a method for manufacturing semiconductor devices is further disclosed, which includes subjecting a semiconductor substrate having Cu as an interconnect material, and a low dielectric constant film as an interlayer dielectric material, to dry etching and/or ashing; and bringing the processed semiconductor substrate into contact with the above residue-removing solution.
    Type: Grant
    Filed: August 4, 2009
    Date of Patent: June 10, 2014
    Assignee: Daikin Industries, Ltd.
    Inventor: Shingo Nakamura
  • Patent number: 8747567
    Abstract: A hard floor surface care process comprising a process of identifying, cleaning, polishing, and protecting manmade and natural stone hard floor surfaces having a single surface or multi-surface quality. The hard floor surface care process comprising an acid reactive or nonreactive hard floor surface identifying process; an emulsifying solution, agitating, and toweling cleaning process; a polishing process utilizing a lubricating solution with a polishing chemistry or pad, and a protecting process utilizing a protecting chemistry selected as a function of the identifying process.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: June 10, 2014
    Inventor: Steven D. Azevedo
  • Patent number: 8709169
    Abstract: The present invention relates to the use of an alkyl di(lower alkyl)mono(polyoxyethylene) quaternary ammonium compound as a hydrotrope in 5 aqueous solutions for a nonionic surfactant, preferably a C8-C18-alcohol alkoxylate containing 1-20 ethyleneoxy units and 0-5 propyleneoxy units. It also relates to a composition comprising said quaternary ammonium compound and said nonionic surfactant. The cationic surfactant has the formula 10 R2+R(1)N(CH2CH2O)n H X R1 wherein R?C6-C22 alkyl; R1 and R2 are independently a C1-C4 alkyl group; n=8-25; and X? is an anion. The compositions may be used for the cleaning of hard surfaces, for example for vehicle cleaning or machine dishwashing.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: April 29, 2014
    Assignee: Akzo Nobel N.V.
    Inventors: Mahnaz Company, Kornelis Overkempe, Adrianus Marinus Groenewegen
  • Patent number: 8702868
    Abstract: A method for decontaminating nuclear plant surfaces, which have been contaminated with alpha emitters, is carried out subsequently to a decontamination process which is aimed at the removal of oxide layers. The surfaces are treated with an aqueous solution which contains a cationic or zwitterionic surfactant and oxalic acid. At least a part of the solution, after having acted on a surface, is conducted across an ion exchanger.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: April 22, 2014
    Assignee: Areva GmbH
    Inventors: Rainer Gassen, Christoph Stiepani, Horst-Otto Bertholdt, Bertram Zeiler
  • Patent number: 8701256
    Abstract: Methods and apparatus for removing condensed metal from the surfaces of metal processing chambers, such as, vacuum induction melting (VIM) furnaces having, for example, condensed Mg or Ti, are disclosed. The methods and apparatus provide a robotic arm end positioned in the furnace having a nozzle operatively connected to a source of dry ice. The robotic arm end directs a stream of dry ice particles against the surface of the furnace to displace condensed metal. The displaced metal is collected for reuse or disposal. Aspects of the invention provide a safe and automated process for cleaning process chambers and recovering metal that can typically be dangerous when performed by conventional methods.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: April 22, 2014
    Assignee: Mars Metals, Inc.
    Inventor: Aaron P. Mars
  • Patent number: 8691019
    Abstract: A process for cleaning a compound semiconductor wafer; the compound semiconductor wafer comprises, taking gallium arsenide (GaAs) as a representative, a group III-V compound semiconductor wafer. The process comprises the following steps: 1) treating the wafer with a mixture of dilute ammonia, hydrogen peroxide and water at a temperature not higher than 20° C.; 2) washing the wafer with deionized water; 3) treating the wafer with an oxidant; 4) washing the wafer with deionized water; 5) treating the wafer with a dilute acid solution or a dilute alkali solution; 6) washing the wafer with deionized water; and 7) drying the resulting wafer. The process can improve the cleanliness, micro-roughness and uniformity of the wafer surface.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: April 8, 2014
    Assignee: Beijing Tongmei Xtal Technology Co., Ltd.
    Inventors: Diansheng Ren, Qinghui Liu
  • Patent number: 8691018
    Abstract: A warewashing detergent composition is provided for use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorous containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, high molecular weight polyacrylates (polyacrylic acid homopolymers) with a molecular weight of at least about 5000 are used as corrosion inhibitors and can be included for aluminum protection in a number of different detergent compositions.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: April 8, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Erik Christian Olson, Devon Beau Hammel
  • Patent number: 8679366
    Abstract: A composition includes a polysaccharide graft polymer composition and 2-phosphonobutane-1,2,4-tricarboxylic acid. In one embodiment, the polysaccharide graft polymer composition includes a polysaccharide residue present in an amount from approximately 5% to approximately 90% by weight of the polysaccharide graft polymer composition and a residue of acrylic acid, methacrylic acid or a combination thereof present in an amount from approximately 10% to approximately 75% by weight of the polysaccharide graft polymer composition.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: March 25, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Carter Silvernail, Erik C. Olson
  • Patent number: 8668779
    Abstract: A method of simultaneously cleaning and disinfecting an industrial water system is described and claimed. The method involves the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. This cleaning and disinfecting method works in a variety of industrial water systems including cooling water systems.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: March 11, 2014
    Assignee: Nalco Company
    Inventors: Andrew J. Cooper, Jasbir S. Gill, Amit Gupta, Robert F. Kelly, Douglas G. Kelley, Eric R. Myers
  • Patent number: 8652266
    Abstract: A system and method for removing polymer residue from around a metal gate structure formed on a surface of a substrate during a post-etch cleaning operation includes determining a plurality of process parameters associated with the metal gate structure and the polymer residue to be removed. A plurality of fabrication layers define the metal gate structure and the process parameters define characteristics of the fabrication layers and the polymer residue. A first cleaning chemistry and second cleaning chemistry are identified and a plurality of application parameters associated with the first and second cleaning chemistries are defined based on the process parameters. The first and second application chemistries are applied sequentially in a controlled manner using the application parameters to substantial remove the polymer residue while preserving the structural integrity of the gate structure.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: February 18, 2014
    Assignee: Lam Research Corporation
    Inventors: Katrina Mikhaylichenko, Yizhak Sabba, Dragan Podlesnik
  • Patent number: 8647445
    Abstract: Cleaning processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an antioxidant to form an insoluble adduct followed by solubilizing the adduct with a basic aqueous cleaning solution.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: February 11, 2014
    Assignee: International Business Machines Corporation
    Inventors: Vishal Chhabra, John A. Fitzsimmons, Mahmoud Khojasteh, Jennifer Muncy
  • Patent number: 8636918
    Abstract: A composition includes an anionic polysaccharide hybrid polymer composition and 2-phosphonobutane-1,2,4-tricarboxylic acid. In one embodiment, the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from approximately 5% to approximately 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer present in an amount from approximately 10% to approximately 75% by weight of the polysaccharide hybrid polymer composition.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: January 28, 2014
    Assignee: Ecolab USA Inc.
    Inventors: Carter Silvernail, Erik C. Olson
  • Patent number: 8591663
    Abstract: A method for removing corrosion products from a system, the method including: adjusting the system temperature to between 115° F. to 212° F.; injecting a cleaning dissolution solvent into the system; injecting a gas into the system after the system is filled with the cleaning dissolution solvent; the gas mixing with the solvent in the system; draining the solvent from the system after a predetermined period of time of dissolution; injecting a passivation composition into the system; injecting a gas into the system, the gas mixing the passivation composition; draining the system of the composition after a predetermined period of time of passivation; rinsing the system with a low volume solution; and rinsing the system at with a full volume solution.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: November 26, 2013
    Assignee: Areva NP Inc
    Inventors: John Remark, Sidney Jones, Ray Beatty, Sarah Evans
  • Patent number: 8591661
    Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: November 26, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: David Cheung, Ted Li, Anirban Guha, Kirk Ostrowski
  • Patent number: 8580724
    Abstract: In one embodiment, a metal loss inhibitor concentrate is provided which contains water, (A) a component of dissolved organic compounds and polymers that contain at least two hydroxy moieties per molecule and an average of at least 0.4 hydroxy moieties per carbon atom; (B) a thiourea component; and (C) a dissolved component containing aryl and quaternary ammonium moieties; and, optionally: (D) a wetting agent, such as a component of an ethoxylate of an alcohol. Such solutions form useful inhibitor concentrates when combined with aqueous chelating cleaning solutions, wherein such solutions, when contacted with a metal surface, are effective in removing scale, smut and other deposits from the metal surface but exhibit a reduced tendency to attack or unduly etch the metal itself, or to inhibit the subsequent desired oxidation and dissolution of metallic copper deposits.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: November 12, 2013
    Assignee: Henkel AG & Co. KGaA
    Inventors: David R. McCormick, Ronald F. Dubs
  • Patent number: 8574370
    Abstract: The present invention relates to the use of at least one alkane sulphonic acid, with formula R—SO3H, where R represents a saturated, linear or branched hydrocarbon chain, comprising 1 to 4 atoms of carbon for removing rust from all types of surface, in particular from metal surfaces, specifically iron, steel and others. The invention also relates to a method for cleaning rust from all types of surfaces using at least one alkane sulphonic acid.
    Type: Grant
    Filed: November 27, 2009
    Date of Patent: November 5, 2013
    Assignee: Arkema France
    Inventors: Jean-Alex Laffitte, Bernard Monguillon
  • Patent number: 8545635
    Abstract: A hard floor surface care process comprising a process of identifying, cleaning, polishing, and protecting manmade and natural stone hard floor surfaces having a single surface or multi-surface quality. The hard floor surface care process comprising an acid reactive or nonreactive hard floor surface identifying process; an emulsifying solution, agitating, and toweling cleaning process; a polishing process utilizing a lubricating solution with a polishing chemistry or pad, and a protecting process utilizing a protecting chemistry selected as a function of the identifying process.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: October 1, 2013
    Inventor: Steven D. Azevedo
  • Patent number: 8529707
    Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: September 10, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Hiromitsu Namba
  • Patent number: 8524006
    Abstract: A system and method are provided for reclaiming an enriched radioisotope starting material from a target body. The system and method enable reclaiming the starting material in a relatively short time (e.g., several hours) after the target body's bombardment with energetic particles, greatly simplifying the target body's chemical processing, as well as reducing the cost of such processing (e.g., reducing the need for costly long-term storage). Specifically, a chemical protective layer is disposed between a radioisotope starting material and a base material of the target body. After the target body is irradiated with a suitable source (e.g., particle accelerator), then the irradiated radioisotope starting material can be removed without removing the base material due to the protection provided by the chemical protective layer. The system and method also enable the operator to obtain three different radioisotopes in a single bombardment of the target body, further reducing cost of radioisotope production.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: September 3, 2013
    Assignee: Mallinckrodt LLC
    Inventor: William Claude Uhland
  • Patent number: 8506722
    Abstract: A method for cleaning a filtering membrane, contaminated by contaminants including inorganic and organic materials during a fluid-filtering process, is disclosed, the method comprises cleaning the filtering membrane by using a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane; and cleaning the filtering membrane by using a second acid cleaning solution so as to remove the inorganic material from the filtering membrane, wherein the cleaning method of the present invention uses the first cleaning solution having pH 6˜9 instead of a strong-alkaline cleaning solution so as to prevent the filtering membrane from being damaged, and also uses the cleaning solution maintained at a relatively low temperature instead of hot water so as to improve economical efficiency by reduction of energy consumption.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: August 13, 2013
    Assignee: Kolon Industries Inc.
    Inventor: Kwang-Jin Lee
  • Patent number: 8486201
    Abstract: Disclosed is a method for drying a plate-like article; the method including rinsing with an aqueous rinsing liquid with subsequent rinsing with an organic solvent, wherein the organic solvent has a water content of below 20 mass-% wherein the organic solvent is supplied at a solvent temperature, which is at least 30° C. and not higher than 60° C.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: July 16, 2013
    Assignee: Lam Research AG
    Inventor: Aurelia Plihon
  • Patent number: 8480808
    Abstract: A warewashing detergent composition is provided for use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorous containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, a synergistic combination of polyacrylic and polymaleic polymers is used as corrosion inhibitors in traditional alkaline detergent compositions.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: July 9, 2013
    Assignee: Ecolab USA Inc.
    Inventors: Erik Christian Olson, Devon Beau Hammel
  • Patent number: 8480812
    Abstract: A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: July 9, 2013
    Assignee: Refined Technologies, Inc.
    Inventors: Cody Nath, Barry Baker, Sean Sears
  • Patent number: 8450257
    Abstract: Compositions comprising an alkanesulfonic acid and an organic nitrogenous base, and related methods of use.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: May 28, 2013
    Assignee: Vitech International, Inc.
    Inventor: Rod Thomson
  • Patent number: 8398779
    Abstract: Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/?2% HF or buffered HF acid, 3.8%+/?0.5% NH4F pH buffer, 59.7%+/?5% ethylene glycol, and the balance H2O.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: March 19, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Liyuan Bao, Anbei Jiang, Sio On Lo, Yukari Nishimura, Joseph F. Sommers, Samantha S. H. Tan
  • Patent number: 8377216
    Abstract: A vacuum processing apparatus includes a vacuum chamber for performing a plasma process and a cleaning process unit for performing a cleaning process to apply a plasma process to a wafer on which a single layer or a laminated film containing a metallic film is formed by using a corrosive gas, and a control unit having a sequence to abort the plasma process when an abnormality occurs in the vacuum chamber and transfer the wafer subjecting to the aborting of the plasma process to the cleaning process unit, after elapsing a predetermined time, to perform the cleaning process.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: February 19, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masakazu Okai, Kenji Tamai, Toru Ueno
  • Patent number: 8337634
    Abstract: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: December 25, 2012
    Assignee: Kobe Steel, Ltd.
    Inventors: Katsuyuki Iijima, Tetsuo Suzuki
  • Publication number: 20120312331
    Abstract: This invention relates to a method of preprocessing a magnesium alloy for electroplating, including pickling the magnesium alloy with an ethyleneglycol-nitric acid solution.
    Type: Application
    Filed: December 6, 2011
    Publication date: December 13, 2012
    Applicants: Pusan National University Industry-University Cooperation Foundation, HYUNDAI MOTOR COMPANY
    Inventors: Hyung Sop Yoon, Won Sub Chung, Jung Hoon Lee
  • Publication number: 20120308727
    Abstract: The present invention discloses an improved cleaning composition for cleaning metal surfaces such as aluminum and aluminum-containing alloys. The cleaning composition of the present invention comprises water and an ethoxylate of an alcohol having Formula R1—OH wherein R1 is a saturated or unsaturated, straight-chain or branched aliphatic having from 12 to 80 carbon atoms; an inorganic pH adjusting component; and at least one surfactant that is different than the ethoxylate set forth above. The cleaning composition of the present invention also has an average water-break-free percent reduction of less than 50% after 7 days aging of a working composition prepared from the cleaning composition. The present invention also provides a method of cleaning a metal surface with the cleaning composition of the invention.
    Type: Application
    Filed: July 9, 2012
    Publication date: December 6, 2012
    Applicant: Henkel AG & Co. KGaA
    Inventors: Andrew M. Hatch, Gary Rochfort, Richard D. Banaszak