Refractory Metal (i.e., Titanium(ti), Zirconium(zr), Hafnium(hf), Vanadium(v), Niobium(nb), Columbium(cb), Tantalum(ta), Chromium(cr), Molybdenum(mo), Tungsten(w)), Or Alloy Base Thereof Patents (Class 148/668)
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Patent number: 11951530Abstract: A high-strength stainless steel rotor and a method for preparing the same, are provided. The high-strength stainless steel rotor, including the following element components by mass percentage: C: 0.03-0.050%, Cr: 14.90-15.80%, Ni: 5.00-5.70%, Cu: 2.20-2.80%, (Nb+Ta): 0.35-0.44%, Mo: 0.45-0.54%, V: 0.06-0.10%, Si: 0.20-0.60%, Mn: 0.40-0.80%, P?0.010%, S?0.010%, O?0.003%, and the balance of iron and inevitable impurities.Type: GrantFiled: April 29, 2021Date of Patent: April 9, 2024Assignee: CENTRAL IRON AND STEEL RESEARCH INSTITUTEInventors: Zhenbao Liu, Jianxiong Liang, Xiaohui Wang, Yongqing Sun, Changjun Wang, Zhiyong Yang
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Patent number: 11839919Abstract: Methodologies, systems, and devices are provided for producing metal spheroidal powder products. Dehydrogenated and spheroidized particles are prepared using a process including introducing a metal hydride feed material into a plasma torch. The metal hydride feed material is melted within a plasma in order to dehydrogenate and spheroidize the materials, forming dehydrogenated and spheroidized particles. The dehydrogenated and spheroidized particles are then exposed to an inert gas and cooled in order to solidify the particles into dehydrogenated and spheroidized particles. The particles are cooled within a chamber having an inert gas.Type: GrantFiled: September 7, 2021Date of Patent: December 12, 2023Assignee: 6K Inc.Inventors: Kamal Hadidi, Gregory M. Wrobel, Makhlouf Redjdal
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Patent number: 11756703Abstract: A magnetic data cable includes a cable body and data connectors. The data connectors are respectively connected to two ends of the cable body. The cable body includes a cable core and a wrapping material layer wrapped around the cable core. At least one layer of the wrapping material layer is a magnetic material layer. When the magnetic data cable is wound into coils, each two adjacent coils arranged from top to bottom or each two adjacent coils arranged from left to right are magnetically attracted to each other by the magnetic material layer. Since the magnetic material layer is integrally distributed in the wrapping material layer, so the cable body 100 is magnetic and it is easy and simple to adjust a diameter of the coils by winding.Type: GrantFiled: April 18, 2023Date of Patent: September 12, 2023Inventor: Wenyong Yue
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Patent number: 10961613Abstract: A method for controlling the microstructure and texture of tantalum is described. The method includes a first forging step for performing upset forging and come-back forging on a tantalum billet multiple times in different directions, the upset forging performed to press two surfaces of the tantalum billet in order to make the two surfaces close to each other and the come-back forging performed to restore the tantalum billet to a rectangular prism shape; and a second forging step for performing wedge forging and come-back forging on the tantalum billet multiple times in different directions, the wedge forging performed to press two edges located in a diagonal direction of the tantalum billet and parallel to each other in order to make the two edges close to each other, and the come-back forging performed to restore the tantalum billet to the rectangular prism shape.Type: GrantFiled: April 23, 2015Date of Patent: March 30, 2021Assignee: AGENCY FOR DEFENSE DEVELOPMENTInventors: Seong Lee, Seongho Yang, Sungho Lee, Hyotae Jeong, Yuyeon Jo
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Patent number: 10808307Abstract: The present disclosure relates to a chromium-aluminum binary alloy with excellent corrosion resistance and a method of producing the same, and more particularly to a chromium-aluminum binary alloy with excellent corrosion resistance. The chromium-aluminum binary alloy may be easily produced and has ductility, thus being highly applicable as a coating material for a material requiring high-temperature corrosion resistance and wear resistance.Type: GrantFiled: May 31, 2017Date of Patent: October 20, 2020Assignee: Korea Atomic Energy Research InstituteInventors: Hyun Gil Kim, Il Hyun Kim, Yang-Il Jung, Dong Jun Park, Jung Hwan Park, Jeong-Yong Park, Yang-Hyun Koo
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Patent number: 10808273Abstract: The present disclosure relates to metal alloys for biosensors. An electrode is made from the metal alloy, which more specifically can be a nickel-based alloy. The alloy provides physical and electrical property advantages when compared with existing pure metal electrodes.Type: GrantFiled: December 20, 2016Date of Patent: October 20, 2020Assignee: Materion CorporationInventors: Kevin V. Goodwin, Robert R. Newton, Ian S. Tribick, Ethan Fontaine
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Patent number: 10366811Abstract: A parallel pair cable includes a pair of insulated wires arranged to be in contact with each other, parallel to each other and not twisted, a first resin tape wrapped around the pair of insulated wires, and a shield tape longitudinally folded on the outside of the first resin tape and comprising a metal layer.Type: GrantFiled: September 14, 2017Date of Patent: July 30, 2019Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventor: Yuto Kobayashi
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Patent number: 9890452Abstract: Provided is a tantalum sputtering target, which is characterized that an average crystal grain size of the target is 50 ?m or more and 200 ?m or less, and variation of a crystal grain size in the target plane is 40% or higher and 60% or less. This invention aims to provide a tantalum sputtering target capable of improving the uniformity of the film thickness and reducing the variation of the resistance value (sheet resistance).Type: GrantFiled: March 19, 2013Date of Patent: February 13, 2018Assignee: JX Nippon Mining & Metals CorporationInventors: Kotaro Nagatsu, Shinichiro Senda
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Patent number: 9721693Abstract: A collimator for x-ray, gamma, or particle radiation has a plurality of collimator elements made of a tungsten-containing material to reduce scattered radiation. At least one collimator element consists of a tungsten alloy having a tungsten content of 72 to 98 wt.-%, which contains 1 to 14 wt.-% of at least one metal of the group Mo, Ta, Nb and 1 to 14 wt.-% of at least one metal of the group Fe, Ni, Co, Cu. The collimator also has very homogeneous absorption behavior at very thin wall thicknesses of the collimator elements.Type: GrantFiled: October 4, 2011Date of Patent: August 1, 2017Assignee: Plansee SEInventors: Dirk Handtrack, Heinrich Kestler, Gerhard Leichtfried
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Patent number: 9373804Abstract: Present invention relates to methods of preparing molybdenum oxide inks and molybdenum oxide films, and use of the molybdenum oxide films as hole-transporting layers in optoelectronic devices. The ink for forming a hybrid molybdenum (VI) oxide (MoO3) film on a substrate comprises an ammonium molybdate, at least one inorganic salt different from ammonium molybdate, and a solvent or a solvent mixture.Type: GrantFiled: February 10, 2015Date of Patent: June 21, 2016Assignee: Agency for Science, Technology and ResearchInventors: Hongjun Liu, Wei Peng Goh, Jie Zhang, Ziyu Jin, Sing Yang Chiam
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Patent number: 9133718Abstract: A turbine engine component (10) with a non-aluminide protective coating (14) containing silicon and chromium and a process for forming such non-aluminide protective coatings (14). The non-aluminide protective coating (14) is formed by applying a silicon-containing fluid composition to the turbine engine component (10) as a silicon-containing layer (20) and heating the silicon-containing layer (20) to a temperature effective to form the non-aluminide protective coating (14).Type: GrantFiled: December 12, 2005Date of Patent: September 15, 2015Assignees: MT COATINGS, LLC, SIEMENS AKTIENGESELLSCHAFTInventors: David C. Fairbourn, Paul Walker
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Patent number: 8989339Abstract: Disclosed is a zirconium alloy material having high corrosion resistance regardless of thermal history during its manufacturing process. The zirconium alloy material is obtained by providing a zirconium alloy containing on the mass basis: 0.001% to 1.9% of Sn, 0.01% to 0.3% of Fe, 0.01% to 0.3% of Cr, 0.001% to 0.3% of Ni, 0.001% to 3.0% of Nb, 0.027% or less of C, 0.025% or less of N, 4.5% or less of Hf and 0.16% or less of O with the remainder being inevitable impurities and zirconium, being formed of a bulk alloy and a surface layer, in which the surface layer has a plastic strain of 3 or more or a Vickers hardness of 260 HV or more and an arithmetic mean surface roughness Ra of 0.2 ?m or less.Type: GrantFiled: November 8, 2011Date of Patent: March 24, 2015Assignee: Hitachi, Ltd.Inventors: Ryo Ishibashi, Masahisa Inagaki, Hideo Soneda, Naoya Okizaki, Tomomi Nakamura, Yoshikazu Todaka, Hiroaki Azuma, Nozomu Adachi, Minoru Umemoto
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Patent number: 8974611Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.Type: GrantFiled: January 29, 2013Date of Patent: March 10, 2015Assignee: Global Advanced Metals, USA, Inc.Inventors: Craig M. Carpenter, James D. Maguire, Jr.
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Patent number: 8821658Abstract: A method of thermal forming of refractory alloy suture needles is disclosed. Needle blanks made from refractory alloys are used to form surgical needles, which are heated to a temperature above the ductile to brittle transition temperature but below the recrystallization temperature of the refractory alloy. The heated needle blanks are then mechanically formed into a surgical needle.Type: GrantFiled: April 4, 2012Date of Patent: September 2, 2014Assignee: Ethicon, Inc.Inventors: Frank R. Cichocki, Thomas Nering, David Demarest
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Publication number: 20140242401Abstract: Provided is a tantalum sputtering target having a (200)-plane orientation ratio of 70% or less and a (222)-plane orientation ratio of 10% or more at the sputtering surface of the tantalum sputtering target. The sputter rate can be increased by controlling the crystalline orientation of the target, and thereby a film having an intended thickness can be formed in a short time to improve the throughput.Type: ApplicationFiled: November 15, 2012Publication date: August 28, 2014Inventors: Shinichiro Senda, Kotaro Nagatsu
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Patent number: 8778102Abstract: A method of stress relieving drilled surgical needles is disclosed. At least the metal about a drilled bore hole is heat treated to relieve stress without annealing.Type: GrantFiled: June 16, 2008Date of Patent: July 15, 2014Assignee: Ethicon, Inc.Inventor: Robert E. Maurer
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Patent number: 8771439Abstract: The invention is directed to a method for producing a titanium aluminide intermetallic alloy composition having an improved wear resistance, the method comprising heating a titanium aluminide intermetallic alloy material in an oxygen-containing environment at a temperature and for a time sufficient to produce a top oxide layer and underlying oxygen-diffused layer, followed by removal of the top oxide layer such that the oxygen-diffused layer is exposed. The invention is also directed to the resulting oxygen-diffused titanium aluminide intermetallic alloy, as well as mechanical components or devices containing the improved alloy composition.Type: GrantFiled: April 1, 2009Date of Patent: July 8, 2014Assignee: UT-Battelle, LLCInventors: Jun Qu, Hua-Tay Lin, Peter J. Blau, Vinod K. Sikka
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Patent number: 8747633Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.Type: GrantFiled: May 14, 2012Date of Patent: June 10, 2014Assignees: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.Inventors: Nobuaki Nakashima, Yoshiki Orimoto
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Patent number: 8702877Abstract: A cathodic member for electrochemical cells used in hypochlorite production comprises a zirconium plate coated with a zirconium oxide layer, which is particularly suitable for minimising the decomposition of the hypochlorite product while ensuring a prolonged lifetime. The coated zirconium plate can be used as the cathodic plate in a monopolar cell, or can be welded to a titanium plate for use in a bipolar configuration.Type: GrantFiled: March 28, 2011Date of Patent: April 22, 2014Assignee: Industrie de Nora S.p.A.Inventors: Carl W. Brown, Jr., Richard C. Carlson, Kenneth L. Hardee
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Patent number: 8673820Abstract: A method of qualifying Niobium and/or other super conducting materials for the reliable fabrication of SCRF cavities, which will invariably deliver high accelerating fields including: identification of the best superconducting lower critical field (HC1) based on subjecting a sample of the superconducting material selectively to mechanical stress, annealing at various temperatures, various chemical treatments, post-chemical treatment baking/annealing; and identification of the best possible thermal conductivity of the material at said best superconducting lower critical field (HC1) to thereby qualify the superconducting material for the reliable fabrication of SCRF cavities adapted to deliver high accelerating fields.Type: GrantFiled: October 26, 2007Date of Patent: March 18, 2014Assignee: Department of Atomic EnergyInventors: Sindhunil Barman Roy, Vinod Chandra Sahni
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Patent number: 8597442Abstract: A method of forming an article from an ??? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ??? titanium alloy.Type: GrantFiled: September 12, 2011Date of Patent: December 3, 2013Assignee: ATI Properties, Inc.Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
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Patent number: 8597443Abstract: A method of forming an article from an ?-? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ?-? titanium alloy.Type: GrantFiled: September 12, 2011Date of Patent: December 3, 2013Assignee: ATI Properties, Inc.Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
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Patent number: 8580053Abstract: A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is “a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.Type: GrantFiled: July 13, 2011Date of Patent: November 12, 2013Assignee: Ulvac, Inc.Inventors: Motonori Sato, Poong Kim, Manabu Ito, Tadashi Masuda
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Patent number: 8557015Abstract: In a Cr—Cu alloy that is formed by powder metallurgy and contains a Cu matrix and flattened Cr phases, the Cr content in the Cr—Cu alloy is more than 30% to 80% or less by mass, and the average aspect ratio of the flattened Cr phases is more than 1.0 and less than 100. The Cr—Cu alloy has a small thermal expansion coefficient in in-plane directions, a high thermal conductivity, and excellent processibility. A method for producing the Cr—Cu alloy is also provided. A heat-release plate for semiconductors and a heat-release component for semiconductors, each utilizing the Cr—Cu alloy, are also provided.Type: GrantFiled: February 14, 2007Date of Patent: October 15, 2013Assignees: JFE Precision Corporation, JFE Steel CorporationInventors: Hoshiaki Terao, Hiroki Ota, Hideaki Kobiki, Aya Uenosono
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Patent number: 8500928Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.Type: GrantFiled: July 18, 2012Date of Patent: August 6, 2013Assignee: Global Advanced Metals, USA, Inc.Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
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Patent number: 8444775Abstract: Shape Memory Alloy tube is protected from damage during drawing, caused by galling-type interaction between the tube and high-carbon dies, by forming an oxide surface layer. This invention protects the tube internal diameter from oxidation while allowing the tube outside diameter to be oxidized, by using an oxygen getter located within the tube during the oxidation step. The method yields a higher quality internal diameter and improves productivity.Type: GrantFiled: September 26, 2008Date of Patent: May 21, 2013Assignee: Johnson Matthey Public Limited CompanyInventors: Edwin Alfred Crombie, III, William Andrew Hochella
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Publication number: 20130096667Abstract: The present disclosure is directed to tantalum-alloy products, implantable medical devices that incorporate tantalum-alloy products such as stents or other implantable medical devices, methods of making and/or processing the tantalum-alloy products and implantable medical devices, and methods of using the implantable medical devices. In an embodiment, a stent includes a stent body having a plurality of struts. At least a portion of the stent body is made from a tantalum alloy. The tantalum alloy includes a tantalum content of about 77 weight % (“wt %”) to about 92 wt %, a niobium content of about 7 wt % to about 13 wt %, and a tungsten content of about 1 wt % to about 10 wt %. The tantalum alloy exhibits at least one mechanical property modified by heat treatment thereof, such as yield strength, ultimate tensile strength, or ductility.Type: ApplicationFiled: October 12, 2011Publication date: April 18, 2013Applicant: ABBOTT CARDIOVASCULAR SYSTEMS, INC.Inventors: Rainer Bregulla, Randolf von Oepen, Pamela A. Kramer-Brown, Austin M. Leach
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Publication number: 20130092299Abstract: Embodiments of methods for vacuum heat treating refractory metal articles (e.g., implantable medical devices), and heat treating apparatuses for use in such methods are disclosed. Heat treating refractory metal articles under high vacuum (e.g., 10?6 Torr) may improve strength and ductility and remove material contaminants (e.g., oxygen or hydrogen) that may be absorbed during manufacturing processes. Heat treating methods include disposing a refractory metal article in a heat treating apparatus, drawing a vacuum therein, and moving the article to a heated zone in the furnace using a drive system that permits movement of the article while the vacuum is maintained in the apparatus. A heat treating apparatus may include an elongate furnace tube that may be sealed and placed under vacuum, a heating element disposed around at least a portion of the tube, and a drive system configured for moving articles disposed inside the furnace tube while under vacuum.Type: ApplicationFiled: October 12, 2011Publication date: April 18, 2013Applicant: ABBOTT CARDIOVASCULAR SYSTEMS, INC.Inventors: Rainer Bregulla, Randolf Von Oepen
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Patent number: 8382920Abstract: A method of making metal articles as well as sputtering targets is described, which involves deforming an ingot to preferred dimensions. In addition, products made by the process of the present invention are further described.Type: GrantFiled: March 7, 2007Date of Patent: February 26, 2013Assignee: Global Advanced Metals, USA, Inc.Inventors: Craig M. Carpenter, James D. Maguire, Jr.
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Patent number: 8366845Abstract: An apparatus for thermally treating a plurality of curved suture needles. The apparatus includes a conveyer for transferring the plurality of curved suture needles from a source of curved suture needles to a receiver, a housing positioned adjacent the conveyer, the housing having a first end, a second end, and an opening running from the first end to the second end, the opening aligned with the conveyer to enable the plurality of curved suture needles to pass therethrough, and a heat source located within the housing for heating the plurality of curved suture needles as the plurality of curved suture needles are transferred by the conveyer from the first end of the housing to the second end of the housing. Also provided is a process for thermally treating a plurality of curved suture needles to enhance the stiffness and yield moment of the curved suture needles. The curved suture needles so treated have a desirable combination of stiffness, strength and ductility.Type: GrantFiled: August 12, 2011Date of Patent: February 5, 2013Assignee: Ethicon, Inc.Inventors: Frank Richard Cichocki, Jr., David DeMarest, Gregory Hollin, Eugene D. Reynolds
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Patent number: 8359732Abstract: A method of manufacturing an optimized sheet metal (1) of a zirconium based alloy is described, which optimized sheet metal (1) defines a sheet plane (BA). The method comprises the steps of providing a sheet metal (2) of a zirconium based. alloy, subjecting the sheet metal (2) to at least a preparing cold rolling and a final cold rolling, wherein the preparing cold rolling and the final cold rolling are both performed in a common rolling direction, and heat treating the sheet metal (1) between the preparing cold rolling and the final cold rolling so that the zirconium based alloy is partially re-crystallized. A method of manufacturing a spacer grid using an optimized sheet metal (1) according to the invention is also described.Type: GrantFiled: January 15, 2008Date of Patent: January 29, 2013Assignee: Westinghouse Electric Sweden ABInventors: Lars Hallstadius, Mats Dahlbäck, John Bates, James Dougherty, Steven J. King, Robert J. Comstock
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Patent number: 8349248Abstract: A metallic material is made from at least one refractory metal or an alloy based on at least one refractory metal. The metallic material has an oxygen content of about 1,000 to about 30,000 ?g/g and the oxygen is interstitial.Type: GrantFiled: April 13, 2006Date of Patent: January 8, 2013Assignee: Heraeus Precious Metals GmbH & Co. KGInventors: Jens Trotzschel, Bernd Spaniol
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Publication number: 20120267236Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.Type: ApplicationFiled: May 14, 2012Publication date: October 25, 2012Inventors: Nobuaki NAKASHIMA, Yoshiki ORIMOTO
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Patent number: 8262813Abstract: A process for providing a niobium wire and its use for connection to niobium or niobium oxide capacitors. The wire is enriched with oxygen and preferably has oxygen concentrations of about 3,000 to 30,000 ?g/g.Type: GrantFiled: September 27, 2006Date of Patent: September 11, 2012Assignee: Heraeus Materials Technology GmbH & Co. KGInventor: Bernd Spaniol
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Patent number: 8252126Abstract: A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.Type: GrantFiled: May 4, 2005Date of Patent: August 28, 2012Assignee: Global Advanced Metals, USA, Inc.Inventors: John P. Matera, Robert B. Ford, Charles E. Wickersham, Jr.
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Patent number: 8252130Abstract: Surface processing of titanium alloy members for aerospace equipment imparts high wear resistance, lubricity and high fatigue strength. The method includes an oxygen diffusion step for causing oxygen to diffuse and penetrate in solid solution form into a surface of a titanium alloy member under an oxygen-containing gas atmosphere and a particle bombardment step for bombarding the surface of the titanium alloy member with an airflow containing particles. The aerospace equipment can include a flap rail member and slat rail member for aircraft.Type: GrantFiled: February 16, 2005Date of Patent: August 28, 2012Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Kazuyuki Oguri, Takashi Kimura, Takahiro Sekigawa, Takayuki Takahashi
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Patent number: 8241441Abstract: An apparatus for thermally treating and coloring a plurality of curved suture needles. The apparatus includes a conveyer for transferring the plurality of curved suture needles from a source of curved suture needles to a receiver, a housing positioned adjacent the conveyer, the housing having a first end, a second end, and an opening running from the first end to the second end, the opening aligned with the conveyer to enable the plurality of curved suture needles to pass therethrough, a heat source located within the housing for heating the plurality of curved suture needles as the plurality of curved suture needles are transferred by the conveyer from the first end of the housing to the second end of the housing and a system for providing a gas mixture containing a fractional concentration of oxygen to oxidize and colorize the surfaces of the plurality of curved suture needles as the plurality of suture needles pass through the housing.Type: GrantFiled: January 13, 2011Date of Patent: August 14, 2012Assignee: Ethicon, Inc.Inventors: Frank Richard Cichocki, Jr., David Demarest, Gregory Hollin, Eugene D. Reynolds
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Patent number: 8231745Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.Type: GrantFiled: June 27, 2011Date of Patent: July 31, 2012Assignee: Global Advanced Metals, USA, Inc.Inventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
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Patent number: 8172960Abstract: Provided is a tantalum sputtering target manufactured by working a molten and cast tantalum ingot or billet through forging, annealing and rolling, wherein the structure of the tantalum target comprises a non-recrystallized structure. The tantalum sputtering target having a high deposition speed and excellent uniformity of film, producing less arcings and particles and having excellent film forming properties, and the method capable of stably manufacturing the target can be provided by improving and devising plastic working steps such as forging and rolling, and the heat treatment step.Type: GrantFiled: February 19, 2004Date of Patent: May 8, 2012Assignee: JX Nippon Mining & Metals CorporationInventors: Kunihiro Oda, Atsushi Hukushima
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Patent number: 8128765Abstract: Niobium cavities are fabricated by the drawing and ironing of as cast niobium ingot slices rather than from cold rolled niobium sheet. This method results in the production of niobium cavities having a minimum of grain boundaries at a significantly reduced cost as compared to the production of such structures from cold rolled sheet.Type: GrantFiled: April 5, 2005Date of Patent: March 6, 2012Assignee: Jefferson Science Associates, LLCInventors: Ganapati Rao Myneni, Peter Kneisel, Tadeu Cameiro
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Patent number: 8062440Abstract: A hafnium alloy target containing either or both of Zr and Ti in a gross amount of 100 wtppm-10 wt % in Hf, wherein the average crystal grain size is 1-100 ?m, the impurities of Fe, Cr and Ni are respectively 1 wtppm or less, and the habit plane ratio of the plane {002} and three planes {103}, {014} and {015} lying within 35° from {002} is 55% or greater, and the variation in the total sum of the intensity ratios of these four planes depending on locations is 20% or less. As a result, obtained is a hafnium alloy target having favorable deposition property and deposition speed, which generates few particles, and which is suitable for forming a high dielectric gate insulation film such as HfO or HfON film, and the manufacturing method thereof.Type: GrantFiled: September 4, 2008Date of Patent: November 22, 2011Assignee: JX Nippon Mining & Metals CorporationInventors: Takeo Okabe, Shuichi Irumata, Yasuhiro Yamakoshi, Hirohito Miyashita, Ryo Suzuki
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Publication number: 20110265921Abstract: A method for producing a Ta sputtering target including the following steps: (a) a step of forging a Ta ingot, comprising subjecting the Ta ingot to a forging pattern over at least 3 times, wherein each forging pattern is “a cold forging step comprising stamp-forging and upset-forging operations alternatively repeated over at least 3 times; (b) an in-process vacuum heat-treating step carried out between every successive two forging patterns to thus prepare a Ta billet; (c) a step of rolling the Ta billet to obtain a rolled plate; and (d) a step of vacuum heat-treating the rolled plate to obtain a Ta sputtering target. A sputtering target produced by the above method.Type: ApplicationFiled: July 13, 2011Publication date: November 3, 2011Applicant: ULVAC, INC.Inventors: Motonori SATO, Poong Kim, Manabu Ito, Tadashi Masuda
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Patent number: 8048240Abstract: A method of forming an article from an ??? titanium including, in weight percentages, from about 2.9 to about 5.0 aluminum, from about 2.0 to about 3.0 vanadium, from about 0.4 to about 2.0 iron, from about 0.2 to about 0.3 oxygen, from about 0.005 to about 0.3 carbon, from about 0.001 to about 0.02 nitrogen, and less than about 0.5 of other elements. The method comprises cold working the ??? titanium alloy.Type: GrantFiled: May 7, 2007Date of Patent: November 1, 2011Assignee: ATI Properties, Inc.Inventors: John J. Hebda, Randall W. Hickman, Ronald A. Graham
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Patent number: 7998287Abstract: A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.Type: GrantFiled: February 10, 2005Date of Patent: August 16, 2011Assignee: Cabot CorporationInventors: Charles E. Wickersham, Jr., Vladimir Levit, P. Todd Alexander
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Patent number: 7959830Abstract: This invention discloses novel nanocomposite material structures which are strong, highly conductive, and fatigue-resistant. It also discloses novel fabrication techniques to obtain such structures. The new nanocomposite materials comprise a high-conductivity base metal, such as copper, incorporating high-conductivity dispersoid particles that simultaneously minimize field enhancements, maintain good thermal conductivity, and enhance mechanical strength. The use of metal nanoparticles with electrical conductivity comparable to that of the base automatically removes the regions of higher RF field and enhanced current density. Additionally, conductive nanoparticles will reduce the surface's sensitivity to arc or sputtering damage. If the surface is sputtered away to uncover the nanoparticles, their properties will not be dramatically different from the base surface.Type: GrantFiled: December 23, 2004Date of Patent: June 14, 2011Assignee: The Regents of the University of CaliforniaInventor: Sungho Jin
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Patent number: 7927435Abstract: Methods for producing zirconium strips that demonstrate improved formability are disclosed. The zirconium strips of the present disclosure have a purity and crystalline microstructure suitable for improved formability, for example, in the manufacture of certain articles such as panels for plate heat exchangers and high performance tower packing components. Other embodiments disclosed herein relate to formed substantially pure zirconium strip, articles of manufacture produced from the substantially pure zirconium strip, and methods for making the articles of manufacture.Type: GrantFiled: September 30, 2009Date of Patent: April 19, 2011Assignee: ATI Properties, Inc.Inventor: Craig M. Eucken
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Patent number: 7794554Abstract: Refractory metal products, such as tantalum, can be rejuvenated after metal consumption in selected zones by filling the zones with powder and simultaneously applying focused radiant energy to the powder.Type: GrantFiled: January 19, 2005Date of Patent: September 14, 2010Assignee: H.C. Starck Inc.Inventors: Paul R. Aimone, Prabhat Kumar, Peter R. Jepson, Henning Uhlenhut, Howard V. Goldberg, Steven A. Miller
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Patent number: 7740717Abstract: Provided is a tantalum sputtering target having a crystal structure in which the (222) orientation is preferential from a position 10% of the target thickness toward the center face of the target, and a manufacturing method of a tantalum sputtering target, including the steps of forging and recrystallization annealing, and thereafter rolling, a tantalum ingot or billet having been subject to melting and casting, and forming a crystal structure in which the (222) orientation is preferential from a position of 10% of the target thickness toward the center face of the target. As a result, evenness (uniformity) of the film is enhanced, and quality of the sputter deposition is improved.Type: GrantFiled: September 19, 2006Date of Patent: June 22, 2010Assignee: Nippon Mining & Metals Co., Ltd.Inventor: Kunihiro Oda
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Patent number: 7731810Abstract: A nanocomposite comprising a plurality of nanoparticles dispersed in a molybdenum-based matrix, and an x-ray tube component formed from such a nanocomposite. The nanocomposite contains volume fraction of nanoparticle dispersoids in a range from about 2 volume percent to about 20 volume percent. A method of making such molybdenum-based nanocomposites is also disclosed.Type: GrantFiled: June 28, 2007Date of Patent: June 8, 2010Assignee: General Electric CompanyInventors: Pazhayannur Ramanathan Subramanian, Judson Sloan Marte, Paul Leonard Dupree
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Patent number: 7699948Abstract: A manufacturing method of a Ta sputtering target in which a Ta ingot or billet formed by melting and casting is subject to forging, annealing, rolling processing and the like to prepare a sputtering target, wherein the ingot or billet is forged and thereafter subject to recrystallization annealing at a temperature of 1373K to 1673K. As a result of improving and devising the forging process and heat treatment process, the crystal grain diameter can be made fine and uniform, and a method of stably manufacturing a Ta sputtering target superior in characteristics can be obtained thereby.Type: GrantFiled: July 29, 2003Date of Patent: April 20, 2010Assignee: Nippon Mining & Metals Co., Ltd.Inventor: Kunihiro Oda