Abstract: The present invention relates to an apparatus and a method of fabricating a thin film transistor array substrate. The apparatus includes a dip strip part for stripping a photo-resist pattern and a thin film formed on a substrate by using a stripper; a removing part for removing residual photo-resist and thin film from the substrate; and a jet strip part for jetting the stripper to remove residual particles of photo-resist and thin film left on the substrate. The method of fabricating includes dipping a substrate in a stripper, wherein the substrate has a photo-resist pattern and a thin film, the thin film being formed on an entire surface of the substrate so as to cover the photo-resist pattern; removing residual photo-resist and thin film using the stripper; and removing particles of residual photo-resist and thin film left on the substrate.

Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a brush box is described. The brush box includes a tank having an interior volume and a pair of cylindrical rollers at least partially disposed in the interior volume, each of the cylindrical rollers being rotatable about a respective axis, an actuator assembly coupled to each of the cylindrical rollers to move the respective cylindrical roller between a first position where the cylindrical rollers are in proximity and a second position where the cylindrical rollers are spaced away from each other, and a conditioning device for each of the cylindrical rollers, each conditioning device including a conditioner disposed in the interior volume, the conditioner contacting an outer surface of each of the cylindrical rollers when the rollers are in the second position.

Abstract: An apparatus for cleaning contaminants from a construction mat is described including a washing chamber and an automated conveyor assembly translating the construction mat into and out of the washing chamber. The washing chamber includes a plurality of elongated tines adapted to scrape debris from the was mat and a spray system direction cleansing liquid under pressure at the mat, and a closed loop water reclamation system for filtering and recycling cleansing liquid for reusing the spray system.

Abstract: A cleaning device for cleaning a substrate is provided. In one aspect, the cleaning device includes a brush including a first end, a second end opposed to the first end, an outer surface, and a hollow bore defined in the brush about a central axis of the brush. The brush defines a first cross-sectional area near the first end and a second cross-sectional area near the second end. Both the first and second cross-sectional areas are generally perpendicular to the central axis and the second cross-sectional area is greater than the first cross-sectional area.

Abstract: An improved dry cleaning system for cleaning used layer pads comprising a pallet in-feed assembly, a dry cleaning assembly, and an out-feed station, said dry cleaning assembly having a vision inspection system mounted to a conveyor for taking image/information of upper and lower surfaces of the cleaned layer pad exiting a cleaning station and a programmable means for assessing the image/info against predetermined acceptable cleaning criteria, wherein when these criteria are satisfied the programmable means actuates a guide means to direct the layer pad to a designated receptable for collection and re-use.

Abstract: Silicon wafers and the like are cleaned using new scrubber-type apparatus in which measures are taken to compensate for differential cleaning of the central region of the wafer by: using rotary brushes having one or more non-contact portions arranged in the section thereof that faces the central region of the substrate, or toggling the relative position of the wafer and the rotary brushes, or directing cleaning fluid(s) preferentially towards the central region of the wafer. Another aspect of the invention provides scrubber-type cleaning apparatus in which the rotary brushes are replaced by rollers (110). A web of cleaning material (116) is interposed between each roller and the substrate. Various different webs of cleaning material may be used, e.g. a length of tissue, a continuous loop of cleaning material whose surface is reconditioned on each cleaning pass, adhesive material provided on a carrier tape, etc.

Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.

Abstract: The invention describes a system for cleaning sheet- or plate-like objects (10), in particular for cleaning electrodes and/or separators for constructing an electrochemical energy storage means or cleaning parts of such electrodes or separators, wherein the sheet- or plate-like objects (10) have a first object side (11) and a second object side (12), which is situated opposite the first object side, and at least one side surface which connects the first object side (11) and the second object side (12).

Abstract: Transferring plural semiconductor substrates under a state being held with predetermined intervals; holding the plural semiconductor substrates with roll brushes provided in plural pieces by each front side and back side of the plural semiconductor substrates, longitudinal directions of the roll brushes being oriented in parallel relative to the front side and the back side; and cleaning the plural semiconductor substrates by rotating the plural roll brushes.

Abstract: A substrate cleaning apparatus is provided. The substrate cleaning apparatus includes a plurality of transfer rollers for transferring a substrate; a liquid chemical feeder supplying a liquid chemical to a first surface of the substrate; wherein the liquid chemical feeder comprises a first housing and a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate.

Abstract: A core for a cleaning sponge roller and a cleaning sponge roller set include a core and a cleaning sponge roller mounted on the core. The core for the cleaning sponge roller is in a substantially cylindrical shape including a bore extending in an axial direction and a plurality of small holes communicating between the bore and a circumferential outer surface of the core. The diameter of the bore is 10 mm or more. The diameter of the small holes is 2.5 mm or more. A total of cross-sectional areas of openings of all the small holes is larger than a cross-sectional area of the bore.

Abstract: A solar panel includes a cleaning assembly, the solar panel being mounted for rotation about a horizontal axis along a semi-circular path and the cleaning assembly comprising an oblong brush held across the front face of the solar panel and slidable back and forth along the front face of the solar panel.

Abstract: The invention pertains to a self-contained modular system for cleaning porous mats. The cleaning comprises: a housing having a top and bottom orientation and having a front face defining at least an inlet; at least one conveyor in the housing having an upstream and downstream orientation and having an upstream end disposed at the inlet; a solvent application mechanism downstream of the upstream end for applying solvent to the mat; and a basin under at least a portion of the conveyor for collecting solvent and debris falling from the mat. The conveyor is configured to draw the mat into the housing edge-wise, and the downstream end is positioned in relation to an outlet such that the mat is channeled though the outlet as it exits the downstream end.

Abstract: A container date center includes a container and an automatic dustproof device. The container defines an air inlet. A dustproof mesh covers the air inlet. The automatic dustproof device includes a brush slidably abutting against the dustproof mesh, a drive apparatus driving the bush to move relative to the dustproof mesh, a wind speed sensor installed in the container and aligning with the air inlet, a controller controlling the drive apparatus, and a computer electronically connected to the wind speed sensor and the controller. A measured value of the wind speed sensor is compared with a predetermined value stored in the computer. The controller controls the drive apparatus to operate in response to the measured value being less than the predetermined value.

Abstract: A method of web cleaning, particularly relatively soft polymeric webs, without using dipping baths or ultrasonic energy. The method includes conveying the web against a backup roller and spraying the web with a high pressure liquid while the web is supported by the backup roller. Thereafter, residual fluid from the high pressure stream is stripped from the web by a gas curtain while the web is supported by the backup roller. In many convenient embodiments, the web is contacted with a cleaning roller while the web is in contact with the backup roller.

Abstract: A method for cleaning plated polished disks used in hard drive media is provided. The method includes positioning plated polished disks in a first batch scrubber having multiple first brushes, wherein each of the plated polished disks is positioned between two of the first brushes, and scrubbing the plated polished disks with the first brushes. The method further includes positioning the plated polished disks scrubbed in the first batch scrubber in a second batch scrubber having multiple second brushes, wherein each of the plated polished disks is positioned between two of the second brushes, and scrubbing the plated polished disks with the second brushes.

Abstract: A vehicle for cleaning collector mirrors in solar thermal energy installations, includes an operating cab (2), a body (3) for housing and holding the different items, a rolling system for moving the vehicle, a clean water tank, an assembly for discharging the clean water, at least one structure for spraying clean water (100)) onto the surfaces of the mirrors (22) and a tray (46) for collecting the water used in cleaning the mirrors; a set of lifting columns (5, 6); and supports (53, 63) for the cleaning and/or drying assemblies able to slide along the lifting columns, and in which the cleaning assembly includes a structure fitted with a rigid bar (91), which assumes the profile of the mirror to be cleaned, the bar being provided with an external rotation assembly for a brush.

Abstract: A cleaning apparatus for cleaning a semiconductor wafer includes a rotary brush to be positioned to clean the semiconductor wafer, and an optical sensing device associated with the rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer. An actuator is coupled to the optical sensing device to position the rotary brush based upon the sensed separation distance.

Abstract: A front surface of the wafer is contacted with a straight-shaped front surface cleaning brush, and a pressure is applied on the front surface cleaning brush from both ends to enlarge the diameters in both end portions of the front surface cleaning brush. The front surface cleaning brush rotates with a shaft being an axis. An inner surface of the front surface cleaning brush is directly in contact with a surface of the shaft. The front surface cleaning brush is composed of a single structure made of synthetic resin.

Abstract: An apparatus for cleaning rubberized, plastic, or foam exercise mats is disclosed. The apparatus includes a machine having a frame structure, at least two sets of rollers, a mechanism coupled to the rollers to push and/or pull the mat through the machine, a cleaning solution application system, a scrubbing system, a cleaning solution removal system, and a housing to enclose the machine.

Abstract: A post-CMP wafer cleaning apparatus includes a chamber; a plurality of rollers adapted to hold and rotate a wafer within the chamber; at least one brush adapted to scrub a surface of the wafer to be cleaned; and a liquid spraying device adapted to spray a liquid on the wafer, the liquid spraying device comprising two spray bars jointed together via a joint member.

Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a brush box is described. The brush box includes a tank having an interior volume and a pair of cylindrical rollers at least partially disposed in the interior volume, each of the cylindrical rollers being rotatable about a respective axis, an actuator assembly coupled to each of the cylindrical rollers to move the respective cylindrical roller between a first position where the cylindrical rollers are in proximity and a second position where the cylindrical rollers are spaced away from each other, and a conditioning device for each of the cylindrical rollers, each conditioning device including a conditioner disposed in the interior volume, the conditioner contacting an outer surface of each of the cylindrical rollers when the rollers are in the second position.

Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.

Abstract: Embodiments of the invention generally relate to a method and apparatus for cleaning a substrate. Particularly, embodiments of the invention relate to an apparatus and method for cleaning a substrate using a scrub brush. One embodiment provides a brush box assembly for cleaning a substrate. The assembly comprises a chamber body having a cleaning chamber disposed therein, a rotatable chuck disposed in the cleaning chamber, and an edge cleaner module positioned adjacent the chuck.

Abstract: A solar panel 100 comprising a cleaning assembly 102, the solar panel 100 being mounted for rotation about a horizontal axis along a semi-circular path and the cleaning assembly 102 comprises an oblong brush 120 held across the front face 116 of the solar panel 100 and slidable back and forth along the front face 116 of the solar panel 100 (FIG. 2).

Abstract: An erasing device of one embodiment includes a conveyance unit that conveys a sheet; a pair of rotating brushes is provided corresponding to both side portions in a width direction perpendicular to a sheet conveyance direction of the sheet conveyed by the conveyance unit, the rotating brushes being provided to oppose to each other, nipping the conveyed sheet, the rotating brushes rotating in the same direction as the sheet conveyance direction such that a circumferential speed of the brush tip has a higher speed than a conveyance speed of the sheet, the rotating brushes rolling and correcting a corner fold portion which occurs on the sheet conveyed by the brush tip portion while rotating; and an erasing unit is provided downstream in the sheet conveyance direction than the rotating brush, the erasing unit erasing an image which is formed on the sheet.

Abstract: Transferring plural semiconductor substrates under a state being held with predetermined intervals; holding the plural semiconductor substrates with roll brushes provided in plural pieces by each front side and back side of the plural semiconductor substrates, longitudinal directions of the roll brushes being oriented in parallel relative to the front side and the back side; and cleaning the plural semiconductor substrates by rotating the plural roll brushes.

Abstract: To provide a substrate cleaning apparatus capable of effectively removing deposits adhering to at least an end surface of a substrate by means of a sponge-like brush. A substrate cleaning apparatus includes: a spin chuck configured to rotatably hold a substrate W; a motor configured to rotate the substrate W held by the spin chuck; a cleaning-liquid supply mechanism configured to supply a cleaning liquid to the substrate W held by the spin chuck. The cleaning mechanism includes: a brush made of a sponge-like resin, which is brought into contact with at least an end surface of the wafer W during the cleaning; and a brush compressing mechanism configured to compress the brush. The brush is compressed by the compressing mechanism, and cleans at least the end surface of the substrate W.

Abstract: A barbeque grill cleaning device including a soaking container, in which the grill may be submerged in a cleaning liquid, and a rotary scrubbing head for scrubbing the grill while positioned in the soaking container. The barbeque grill cleaning device includes: a container defining a cavity shaped and sized for receiving a barbeque grill therein; and a scrubbing head for scrubbing the barbeque grill, the scrubbing head is rotatable relative to the container; such that the cleaning of the barbeque grill is aided by a scrubbing action as a result of contact between the barbeque grill and the rotating scrubbing head.

Abstract: Solutions for limiting the undesirable spread of pathogens by indirect contact are provided. The solutions involve event-controlled self-sterilization of contact surfaces on articles or fixtures. A self-sterilizing contact surface structure allows chemical sterilizing agents to controllably flow in response to a contact event, from within the article to exude upon a portion of the contact surface.

Abstract: A system and method for processing a wafer includes a charge neutralization system. The wafer processing system includes a wafer measuring device that can measure characteristics of a surface of the semiconductor wafer. One or more wafer processing stations perform a chemical mechanical polish (CMP) process on the wafer surface. A desica cleaning station can clean and dry the semiconductor wafer. The wafer processing system further includes a charge neutralizing device that can alter a surface charge of the wafer surface.

Abstract: A substrate processing apparatus includes: a brush for cleaning a substrate; a seesaw member which is swingable with a support member serving as a fulcrum and which has a force point section at one side with respect to the fulcrum and an actuating point section at the other side with respect to the fulcrum; a pushing actuator arranged to give a driving force to the force point section of the seesaw member, thereby to swing the seesaw member around the fulcrum, thus giving, to the seesaw member, a pushing force for pushing the brush to the substrate; and a transmission member which has an affected point section for receiving, from the actuating point section of the seesaw member, a driving force given to the force point section, and which transmits, to the brush, a pushing force for pushing the same to the substrate.

Abstract: A dusting equipment (1) for dusting a substantially parallelepiped-shaped or prism-shaped item (9), in particular a book. The equipment comprises a dusting station (6), a carriage (4) and motive means (44, 51, 55) adapted to move the carriage (4) with a reciprocating motion along a moving path between a first position for receiving the item (9) and a second end-of-stroke position. The carriage (4) is adapted to move the item (9) through the dusting station (6) during a motion between the first receiving position and the second end-of-stroke position, and vice versa.

Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and used cleaning fluid from traveling between the brush stations.

Abstract: A dedusting device and method is disclosed for the dry or moist dedusting (i.e., cleaning, dusting, or removal of dirt, dust, or other debris) from components, e.g., of motor vehicles. An exemplary method may generally include positioning a dusting tool driven by a drive motor in a predetermined dusting position such that the tool contacts or touches the component, and determining a first operating variable of the drive motor of the dusting tool when positioning the dusting tool in the predetermined dusting position. The first operating variable may reflect a mechanical load of the drive motor due to the contact with the component to be dusted. The method may further include calculating a corrected dusting position as a function of the predetermined dusting position and the first operating variable of the drive motor, and positioning the dusting tool in the corrected dusting position.

Abstract: The device includes a screen cleaning brush with multiple fibers or cleaning fingers made from a flexible material with a hook and barb shape. The hook is designed to trap the screen strand as it passes and rotates on a flexible arm to clean the adjacent and opposite side of the strand and then flexes to release the strand. The instant invention has a unique propulsion system and navigation system that enables automatic navigation of the cleaning apparatus on the screen of the aquaculture cage. Alternative the screen cleaning can be performed with a frame having fins to assist in the directional placement of the cleaning fingers against a submersed screen.

Abstract: A rug cleaning system for efficiently cleaning a rug without the need for bending over to reach the rug or being subjected to loose dust and debris. The rug cleaning system generally includes a housing having an entrance opening and an exit opening, with a passageway connecting the openings. A first roller is positioned on one side of the passageway at its upper portion with a second roller is positioned on the other side opposite the first roller. A cleaning brush is positioned beneath the second roller. As a rug is inserted into the entrance opening, it is sandwiched between the rollers and forced down through the passageway past the cleaning brush. The cleaning brush removes any debris from the rug and transfers the debris to a debris storage member through use of transfer members and a vacuum. The cleaned rug then exits the exit opening.

Abstract: A cleaning processing unit includes a spin chuck for horizontally holding a substrate and rotating the substrate around the vertical axis passing through the center of the substrate. A bevel cleaner is disposed outside the spin chuck. The bevel cleaner includes a cleaning brush. The cleaning brush has a shape that is symmetric about its vertical axis, and has an upper bevel cleaning surface, an end surface cleaning surface, and a lower bevel cleaning surface. The end surface cleaning surface is a cylindrical surface having its axis in the vertical direction. The upper bevel cleaning surface extends out from and is inclined upward from the upper end of the end surface cleaning surface, and the lower bevel cleaning surface extends out from and is inclined downward from the lower end of the end surface cleaning surface.

Abstract: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.

Abstract: Disclosed is a method for cleaning solar panels by means of a washing apparatus (1) which can be displaced on the solar panel (2) and applies rinsing water to the surface of the solar panel (2) and washes the surface with the help of washing nozzles and/or brushes. The washing apparatus (1) embraces the solar panel (2) in the edge region in such a way that the washing apparatus (1) is guided in a longitudinally movable way directly on the solar panel (2).

Abstract: Scrubbing apparatus is configured by methods so that discs are quickly cleaned and conveyed by selecting a total number of spiral brush segments, rates of brush rotation, and a pitch length of a helical junction that receives discs for cleaning and transport. A time period for cleaning and transporting discs depends on the pitch length, rotational speed and configurations of the segments. An increase of the cleaning time period may result from use of an increased number of brush segments. A group of discs is cleaned by the same spiral brush, by one-by-one insertion of the discs into the junctions, and transporting the discs through the same segments.

Abstract: A tire dressing applicator comprises a support and one or more foam plastic elements mounted on the support so as to contact a tire sidewall and transfer dressing onto the tire sidewall. A distribution system drips or drizzles dressing onto the element(s) after which it is spread over and into the element(s) surface. The elements can be toroidal or rectangular and have anti-distortion pins embedded therein.

Abstract: A dusting equipment (1) for dusting a substantially parallelepiped-shaped or prism-shaped item (9), in particular a book. The equipment comprises a dusting station (6), a carriage (4) and motive means (44, 51, 55) adapted to move the carriage (4) with a reciprocating motion along a moving path between a first position for receiving the item (9) and a second end-of-stroke position. The carriage (4) is adapted to move the item (9) through the dusting station (6) during a motion between the first receiving position and the second end-of-stroke position, and vice versa.

Abstract: An apparatus for scratching and disposing a scratch-off coating that conceals information on a paper is provided. The apparatus includes a panel, one or more scratch tools, a brush and a debris unit. The panel includes a base and a plurality of walls. The plurality of walls is configured along a periphery of the base to form an enclosed area therebetween for accommodating the paper. The paper is accommodated within the enclosed area, and the scratch-off coating is scratched using the one or more scratch tools. The one or more scratch tools are capable of being contained within the panel. Scratching the scratch-off coating forms debris. The debris formed is swept using a brush. The brush is capable of being contained within the panel. The swept debris is received and contained in the debris unit that is coupled to a first wall of the plurality of walls.

Abstract: The invention relates to a service device for maintenance of a solar panel arrangement, comprising a service unit for maintenance of at least one surface of the solar panel arrangement, a guiding unit for guiding the service unit with respect to the solar panel arrangement, and a driving unit for moving the service unit with respect to the solar panel arrangement, wherein the service unit comprises a first engagement section and a second engagement section, wherein the guiding unit is attachable to the first engagement section, the guiding unit being configured for direct engagement with an edge of the solar panel arrangement, wherein the driving unit is attachable to the second engagement section, and wherein the second engagement section is displaceable with respect to the first engagement section by the driving unit.

Abstract: A method and apparatus for providing uniform pressure, friction and/or contact between a substrate and a cylindrical roller in a brush-type cleaning system is described. The apparatus includes an alignment member adapted to allow pivotal movement of the cylindrical roller based on the topography of a substrate and/or the outer surface of the cylindrical roller. The method includes positioning a substrate between two cylindrical rollers, moving each of the two cylindrical rollers to a position where at least a portion of an outer surface of each of the cylindrical rollers are in contact with the major surfaces of the substrate, and rotating one or both of the substrate and the two cylindrical rollers relative to each other while allowing a longitudinal axis of one or both of the two cylindrical rollers to pivot relative to a plane defined by one of the major surfaces of the substrate.

Abstract: The present invention is a buffer device that is designed and configured to successfully and adequately buff and polish any desired surface without causing fatigue for the user, as well as without creating any swirl marks. In order to provide for such a product, the present invention comprises a frame having a cylindrical body secured thereto. A motor is coupled to the cylindrical body to provide for the body to rotate about a normally horizontal axis that is parallel to the desired surface to be buffed, polished, and cleaned or the like. Secured to the cylindrical body is a buffing/cleaning pad fabricated from a conventional material.

Abstract: An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front surface of the substrate rotated by the substrate rotation unit, and a peripheral rinse liquid ejection unit which ejects a rinse liquid toward a predetermined rinse liquid applying position on the peripheral edge portion of the front surface of the substrate from a position located radially inward of the predetermined rinse liquid applying position with respect to a rotation radius of the substrate, the predetermined rinse liquid applying position being spaced downstream in a substrate rotation direction from a brush contact area of the peripheral edge portion kept in contact with the brush.

Abstract: Embodiments of the present invention provide an apparatus and methods for processing solar cell devices. In one embodiment, a method removing particles from edge regions of the solar cell device by a cleaning module with a constant loading applied onto a back surface of the solar cell device, wherein the cleaning modules has two or more roller-type brushes disposed at opposed sides of a rotation table located before and/or after a quality assurance stage configured to measure and correct defects in the solar cell device, and transferring the solar cell device into an edge deletion station in which an electromagnetic radiation energy is used to remove materials from a top surface of the solar cell device. The roller-type brushes include non-abrasive bristles configured to remove unwanted material from the periphery region of the solar cell device prior to transferring into the edge delete station.

Abstract: Mat washing device, method of using the mat washing device, and method of washing mats. The mat washing device includes a system that may be transported on a flat bed trailer from one location to another. The mat washing device includes conveying systems, brush systems, rails systems and control mechanisms. The mat washing device may be used by placing mat, on edge, on a conveying system and conveying the mat to a first brushing system and a second brushing system. In one aspect the first brushing system includes a cable brush having a bolt secured at the end of a cable in order to beat or brush material from the mat when the cable brush is spun.