Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.

Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.

Abstract: A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.

Abstract: A method for scrubbing and passivating an anode plate (100) of a field emission display (120) includes the steps of providing a scrubbing passivation material (127); imparting to scrubbing passivation material (127) an energy selected to cause removal of a contamination layer (123, 117) from anode plate (100); causing scrubbing passivation material (127) to be received by contamination layer (123, 117), thereby removing contamination layer (123, 117); and depositing at least a portion of scrubbing passivation material (127) on anode plate (100), thereby forming a passivation layer (129).

Abstract: The vacuum arc evaporation apparatus removes coarse particles from plasma containing cathode materials generated from a cathode 7 provided to a evaporation source 6 by a vacuum arc discharge, and is provided with a porous member 10 on the inside wall of a plasma duct equipped with means for forming deflection magnetic field having a magnetic coil 8 outside thereof so as to guide the plasma in the vicinity of a substrate 11 accommodated in the film forming chamber 1.

Abstract: An apparatus for applying permanent markings onto products using a Vacuum Arc Vapor Deposition (VAVD) marker by accelerating atoms or molecules from a vaporization source onto a substrate to form human and/or machine-readable part identification marking that can be detected optically or via a sensing device like x-ray, thermal imagining, ultrasound, magneto-optic, micro-power impulse radar, capacitance, or other similar sensing means. The apparatus includes a housing with a nozzle having a marking end. A chamber having an electrode, a vacuum port and a charge is located within the housing. The charge is activated by the electrode in a vacuum environment and deposited onto a substrate at the marking end of the nozzle. The apparatus may be a hand-held device or be disconnected from the handle and mounted to a robot or fixed station.

Abstract: A process and apparatus for depositing thin films and coatings using a vacuum arc plasma source having hot, non-consumable anode is described. Plasma and macroparticles of the cathode material are emitted from the cathode. Part of this material arrives at the hot refractory anode, where it is re-evaporated without macroparticle generation. Substrates exposed to the vapor flow from the anode, but shielded from a direct line of sight with the cathode, are coated with cathode material without macroparticle inclusions.

Abstract: An arc evaporator comprises: an anode; an evaporation source electrode as a cathode; and a current control unit for supplying an AC square wave arcing current across the anode and the evaporation source electrode.

Abstract: A method of smoothing a surface of a diamond coating of a diamond-coated body, by using an arc-type ion plating device in which at least one target is disposed. The method includes: (a) a step of causing arc discharge between an anode, and a cathode which is provided by each of the above-described at least one target, whereby positive ions are emitted from the above-described at least one target; and (b) a step of applying a negative bias voltage to the diamond-coated body which is disposed in the arc-type ion plating device, whereby the surface of the diamond coating is bombarded with the positive ions, so as to be smoothed by the bombardment of the positive ions against the surface of the diamond coating.

Abstract: A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.

Abstract: The invention relates to a vacuum arc evaporator with which a wide variety of substrates can be provided with various coatings or to which various systems of layers can be applied. The invention is intended to achieve an improvement in the quality of the layer, with increased material utilization and higher coating rate. A vacuum arc evaporator with a cathode of electrically conducting material and an anode for generating a plasma arranged in an evacuable housing is used for this purpose. The plasma is generated by an evaporation of the cathode material by means of arc discharge. The anode is enclosed by an insulator and is otherwise surrounded by cathode material on all sides.

Abstract: A cathode arc source apparatus for depositing a coating on a substrate is provided with a monitor for monitoring the cathode arc source. The monitor is useful for monitoring position of an arc spot on the target, plasma emission by the source, or current through or potential difference at a secondary anode. A controller can take actions such as shutting down the source, varying the power or restriking the arc in response to output from the monitor.

Abstract: The invention relates to a device, in particular for a laser-induced vacuum are discharge evaporator for depositing of multiple layers with a high level of purity and high deposition rates on large-area components. According to the invention, the material source for the coating material is in a source chamber which can be evacuated and can be separated in a vacuum-tight manner from the actual coating chamber in which the substrate to be coated is located. The evaporator can, in particular, be used for deposition of amorphous carbon layers which are hydrogen-free and superhard and/or which contain hydrogen, in conjunction with high-purity metal layers or for the reactive plasma-enhanced deposition of, for example, oxidic, carbide, nitride hard material layers of ceramic layers or a combination thereof. The corresponding plasma sources can be flange-mounted on any suitable coating chambers and, consequently, also combined with conventional coating processes, for example magnetron sputtering.

Abstract: A coating of positive ions is applied to a substrate by generating an arc at a cathode, directing a beam of ions emitted from the cathode to the substrate via a filter path to remove macroparticles, igniting the arc by moving an arc ignition from a retracted position to an ignition position in which cathode contact is made, and storing the position in which arc ignition occurred.

Abstract: An arc vapor deposition source has a target plate to be vaporized. A central surface area of the plate, on a vaporization-surface-side thereof, consists of a material which, in comparison to a remaining portion material of the target plate, has a low secondary electron emission rate and a low surface energy. The central surface area is formed by a detachable cover. The target plate has a continuous recess in a central area thereof and an insert therein forms the surface area. The material of the central surface area consists of at least one of boron nitride, hexagonal boron nitride and/or TiN. The target plate is surrounded by a frame having a surface that consists of a material which compared to the material of the target plate, has a lower secondary electron emission rate and a low surface energy. The material of the frame being the same as that of the surface area and/or the frame surface consisting of at least one of boron nitride, hexagonal boron nitride and TiN.

Abstract: Apparatuses and methods for use in vacuum vapor deposition coating provide for simpler, economical and continuous operation. A system and method for continuously melting and evaporating a solid material for forming a coating vapor includes the use of a separate melting crucible and evaporating crucible. A system and method for energizing the evaporative solids to form a plasma which includes first and second electrodes and a device for selectively switching polarity between the first and second electrodes to avoid coating vapor deposition on the electrodes. Another a system and method for energizing the evaporative solids to form a plasma which includes an electric arc discharge apparatus with a cathodic and an anodic part. A continuously fed electrode is disclosed for continuous vaporization of electrode members in an electric arc discharge. An apparatus and method provides for measurement of the rate of evaporation from an evaporator and the degree of ionization in a vapor deposition coating system.

Abstract: There is proposed a tool with a tool body and a wear resistant layer system, which layer system comprises at least one layer of MeX. Me comprises titanium and aluminum and X is nitrogen or carbon. The tool is a solid carbide end mill, a solid carbide ball nose mill or a cemented carbide gear cutting tool. Thereby, in the MeX layer the quotient QI as defined by the ratio of the diffraction intensity I(200) to I(111) assigned respectively to the (200) and (111) plains in the X ray diffraction of the material using the &thgr;-2&thgr; method is selected to be ≦2. Further, the I(111) is at least twenty times larger than the intensity average noise value, both measured with a well-defined equipment and setting thereof.

Abstract: A PVD process for manufacturing a coating (16, 18, 20, 22, 23) on articles (12), in particular on articles which have a relatively low temperature resistance such as articles made of brass, zinc and plastic, including such with an electroplated coating, wherein a plurality of layers (16, 18, 20, 22) are built up by arc discharge vaporization to manufacture a colored coating insensitive to fingerprints and are selected in order to achieve a color by this kind of coating alone which corresponds as far as possible to the desired end color; and wherein a hard material cover layer (23) is applied to the layer structure by means of cathode or magnetron sputtering or by the simultaneous use of arc discharge vaporization and cathode or magnetron sputtering, said cover layer generating the final color and being limited to the smallest possible layer thickness, preferably to under 500 nm.

Abstract: Apparatus for feeding a target into a chamber of a cathode arc source comprises support structure (22, 23, 24) attached to or integral with the cathode arc source (10), a cathode station (16, 17, 18) for receiving a target (18) in electrical connection with an arc power supply, wherein the cathode station is mounted for movement (21, 37) on the support structure relative to the chamber so as to feed the target into the chamber. The apparatus can also have a target cutter in the chamber for removing an upper portion of the target. A graphite target for feeding into the source is a composite of at least inner and outer sections, the inner section comprising graphite powder and having a density in the range 1.7-2.0 g/cm3 and the outer section comprising graphite powder and having a density that is at least 0.1 g/cm3 less than that of the inner section.

Abstract: A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat conduction in the creation of the particles and strongly increasing the electron emission cooling effects.

Abstract: A method of forming a diamond-like carbon coating in vacuum, comprising the steps of: pretreatment of the surface of the pad; placing the part into a vacuum chamber; treating the surface of the part with accelerated ions; applying a sublayer of a material onto the treated surface of the part; electric are vacuum sputtering a graphite cathode from a cathode spot and producing a carbon plasma accelerating an ion component of the carbon plasma; depositing the produced carbon plasma on the surface of the part and producing the diamond-like carbon coating. A pulsed electric are discharge is used, by which a plurality of cathode spots are excited at the end surface of the graphite cathode, cathode spots moving along the end surface of the cathode at a speed of from 10 to 30 m/s and generating a carbon plasma having an ion energy of 40 to 100 eV and an ion concentration in the plasma of 1012 to 1014 cm−3, with electrically insulating the part in the vacuum chamber.

Abstract: Apparatuses and methods for use in vacuum vapor deposition coating provide for simpler, economical and continuous operation. A system and method for continuously melting and evaporating a solid material for forming a coating vapor includes the use of a separate melting crucible and evaporating crucible. A system and method for energizing the evaporative solids to form a plasma which includes first and second electrodes and a device for selectively switching polarity between the first and second electrodes to avoid coating vapor deposition on the electrodes. Another a system and method for energizing the evaporative solids to form a plasma which includes an electric arc discharge apparatus with a cathodic and an anodic part. A continuously fed electrode is disclosed for continuous vaporization of electrode members in an electric arc discharge. An apparatus and method provides for measurement of the rate of evaporation from an evaporator and the degree of ionization in a vapor deposition coating system.

Abstract: In the generalized method of the present invention a heat curable coating is first applied to an article of manufacture. Thereafter, an outer coating is applied to the article in a physical vapor deposition process, and the heat from the PVD process cures the first layer while the PVD coating is being deposited upon the article. In the preferred embodiments, the heat curable coating is a powder coating and the cathodic arc of the PVD process provides the heat that cures the powder coating. An infrared heat source within the PVD chamber may be utilized to preheat the powder coating which is typically composed of an epoxy-polymer compound. Articles of manufacture having the coating of the present invention formed thereon are manufactured with less energy and labor costs.

Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.

Abstract: An apparatus for applying material by cathodic arc vapor deposition to a substrate is provided which includes a vessel, a disk-shaped cathode, a platter for supporting the substrate, apparatus for maintaining a vacuum in the vessel, and apparatus for selectively sustaining an arc of electrical energy between the cathode and an anode. The disk-shaped cathode has a first end surface, a second end surface, and an evaporative surface extending between the first and second end surfaces, and the cathode is mounted on a pedestal positioned inside the vessel. The platter has a slot for receiving the pedestal, thereby enabling the platter to be movable into and out of the vessel.

Abstract: The invention concerns an apparatus for the plasma assisted physical vapor deposition of coatings onto workpieces and a cathode spot arc evaporator and the form of integration of the evaporator in the coating apparatus.

Abstract: A golf club component is coated with a corrosion-resistant, wear-resistant, impact-resistant material, such as zirconium nitride, titanium nitride, di-titanium nitride, titanium aluminum nitride, titanium carbonitride, titanium zirconium nitride, or titanium aluminum carbonitride. Deposition is preferably accomplished by a cathodic arc process using linear deposition sources with simultaneous heating and rotation of the golf club component substrate relative to the deposition sources.

Abstract: An elongate emitter is used as a cathode to coat material onto a cylindrical workpiece by magnetron sputterinig. Where the inside surface of the workpiece is coated, the workpiece itself is used as the vacuum sputtering chamber. The overlap between the plasma field and the magnetic field creates a coating zone which is moved along the length of the workpiece to evenly coat the workpicce.