Abstract: A rack for supporting work pieces during electroplating including a frame having respective first and second side portions and top and bottom portions, the first and second sides attached to each other through top and bottom portions; one or more support arms extending between the frame first and second sides, the one or more support arms affixed to the frame to allow rotational movement of the one or more support arms; one or more clips affixed to the support arms, the one or more clips configured to hold a work piece; and a buoyant device affixed to the one or more support arms.

Abstract: A method and apparatus for plating parts like lug nuts or other metal parts that have both an easily plated outside surface as well as a recessed cavity. The invention works in combination with a standard multi-station plating process. The present invention drains and plates a part containing a cavity by moving the part from a position where the cavity is facing around 45 degrees down to a position where the cavity is facing around 45 degrees up and then back down at various times during the process. The moving is generally initiated when the rack moving along a track above the fluid tanks encounters a roller.

Abstract: The present invention relates to a device for contacting a wafer during submersion in a liquid. The device comprises a main body fixed to a transportation device; an electrical contact for contacting the wafer and a pressure element for pressing the electrical contact towards the wafer.