Abstract: A bionic flexible actuator with a real-time feedback function and a preparation method thereof. The method includes: preparing stimuli-response layer and bionic flexible strain-sensor film layer, arranging bionic V-shaped groove array structure on bionic flexible strain-sensor film layer, and sticking bionic flexible strain-sensor film layer onto stimuli-response layer through adhesive layer; stimuli-response layer is prepared by adopting following steps: mixing multi-walled carbon nanotubes and polyvinylidene fluoride after being dissolved in a solvent respectively and obtaining a mixed solution; performing a film formation process to mixed solution and embedding a first electrode to obtain stimuli-response layer.

Abstract: A method of manufacturing a support plate including: providing a layer of a first material; providing, using an applied voltage, a layer of a second material on a surface of the layer of the first material; and exposing a part of the surface by removing a part of the layer of the second material.

Abstract: Damascene templates have two-dimensionally patterned raised metal features disposed on an underlying conductive layer extending across a substrate. The templates are topographically flat overall, and the patterned conductive features establish micron-scale and nanometer-scale patterns for the assembly of nanoelements into nanoscale circuits and sensors. The templates are made using microfabrication techniques together with chemical mechanical polishing. These templates are compatible with various directed assembly techniques, including electrophoresis, and offer essentially 100% efficient assembly and transfer of nanoelements in a continuous operation cycle. The templates can be repeatedly used for transfer of patterned nanoelements thousands of times with minimal or no damage, and the transfer process involves no intermediate processes between cycles. The assembly and transfer processes employed are carried out at room temperature and pressure and are thus amenable to low cost, high-rate device production.

Abstract: A method for high rate assembly of nanoelements into two-dimensional void patterns on a non-conductive substrate surface utilizes an applied electric field to stabilize against forces resulting from pulling the substrate through the surface of a nanoelement suspension. The electric field contours emanating from a conductive layer in the substrate, covered by an insulating layer, are modified by a patterned photoresist layer, resulting in an increased driving force for nanoelements to migrate from a liquid suspension to voids on a patterned substrate having a non-conductive surface. The method can be used for the production of micro scale and nanoscale circuits, sensors, and other electronic devices.

Abstract: A non-aqueous secondary battery which has high charge-discharge capacity, can be charged and discharged at high speed, and has little deterioration in battery characteristics due to charge and discharge is provided. A negative electrode includes a current collector and an active material layer. The current collector includes a plurality of protrusion portions extending in a substantially perpendicular direction and a base portion connected to the plurality of protrusion portions. The protrusion portions and the base portion are formed using the same material containing titanium. Top surfaces and side surfaces of the protrusion portions and a top surface of the base portion are covered with the active material layer. The active material layer includes a plurality of whiskers. The active material layer may be covered with graphene.

Abstract: The invention provides, inter alia, capillary extraction devices, and methods of making and using the same.

Abstract: Disclosed are methods for passivating metal substrates, including ferrous substrates, such as cold rolled steel and electrogalvanized steel. The methods comprise the steps of depositing an electropositive metal onto at least a portion of the substrate, followed immediately by electrophoretically depositing on the substrate a curable, electrodepositable coating composition. The present invention also relates to coated substrates produced by the above methods.

Abstract: A deposition mask for depositing a thin film and a method for fabricating the same are disclosed. The deposition mask is configured to ensure a positioning accuracy and a pattern size accuracy and is suitable for use in manufacturing a high definition display device. The deposition mask includes at least one pattern mask having the same patterns as the patterns that are to be formed on a substrate and a frame mask which has at least one opening. The pattern mask is individually and non-detachably fixed to the frame mask at a region of the frame mask corresponding to the opening.

Abstract: Various embodiments are directed to the electrochemical fabrication of multilayer mesoscale or microscale structures which are formed using at least one conductive structural material, at least one conductive sacrificial material, and at least one dielectric material. In some embodiments the dielectric material is a UV-curable photopolymer. In other embodiments, electrochemically fabricated structures are formed on dielectric substrates.

Abstract: A process for fabricating a metallic component is disclosed. The process includes performing multiple electroforming steps on an object to form metallic layers. The process includes performing between the electroforming steps masking and patterning steps using a non-conductive material. The resulting metallic component has either a single layer or multiple layers of cooling or heat transfer channels, which may be at right angles in adjacent layers. The non-conductive material can be removed during the process by a solvent or by melting. The object on which the metallic component is formed may be a flat or shaped mandrel from which the metallic component can be removed. The metallic component is particularly useful in forming optical components for use in extreme ultraviolet (EUV) systems and in cooling and heat transfer systems.

Abstract: A method of forming a phosphor layer on a shadow mask of a plasma display panel (PDP) is described. The shadow mask is bonded with a deposition mask such that predetermined apertures on the former are aligned with the openings on the latter and the other apertures blocked by the latter. The two masks are loaded into an electrophoretic cell, where a kind of phosphor is attracted by the shadow mask to pass through the openings on the deposition mask and deposit on the internal walls of the exposed apertures of the shadow mask. The phosphor layer is then dried to remove the solvent. By repeating the above steps with different kinds of phosphor, deposition masks and electrophoretic cells, phosphor layers of three different colors can be formed on the shadow mask for fabricating a full-color PDP.

Abstract: An exemplary method of manufacturing a metal cover (1) with blind holes (3) therein includes: step (60), preparing a metal substrate; step (62), covering the metal substrate with a protective film formed by electrophoretic deposition; step (64), forming holes in the protective film according to an intended pattern of the blind holes in the metal cover, thus exposing the metal surface through the holes; step (66), etching the metal substrate in the exposed areas to form the blind holes; and step (68), removing a remainder of the protective film from the metal substrate, thereby obtaining the finished metal cover. The method involving etching is relatively low-cost. Additionally, because electrophoretic deposition is used to cover the metal substrate with the protective film, the protective film can be formed on all surfaces of the metal substrate. Thus the method is especially advantageous for manufacturing a metal cover having a three-dimensional shape.

Abstract: A method of forming an electron emitter includes the steps of: (i) forming a nanostructure-containing material; (ii) forming a mixture of nanostructure-containing material and a matrix material; (iii) depositing a layer of the mixture onto at least a portion of at least one surface of a substrate by electrophoretic deposition; (iv) sintering or melting the layer thereby forming a composite; and (v) electrochemically etching the composite to remove matrix material from a surface thereof, thereby exposing nanostructure-containing material.

Abstract: A device for fabricating a high-density microarray for cDNA or protein having an arbitrary pattern comprises an electrospray part for electrostatically spraying solutions containing a plurality of kinds of biologically active samples one by one, a support part supporting sample chips on which samples in the solutions sprayed from the electrospray part are deposited, a mask part disposed between the electrospray part and the support part and having holes the number of which is the same as that of the sample chips so as to selectively deposit the samples simultaneously in the adequate positions corresponding to the sample chips, a moving part for fabricating microarrays at a time by relatively moving the sample chip support part and the mask part and depositing the samples on the sample chips. Therefore the device can fabricate a large number of inexpensive high-density microarrays.

Abstract: This invention relates to an electrophoretic display or a liquid crystal display and novel processes for its manufacture. The electrophoretic display (EPD) of the present invention comprises microcups of well-defined shape, size and aspect ratio and the microcups are filled with charged pigment particles dispersed in an optically contrasting dielectric solvent. The liquid crystal display (LCD) of this invention comprises well-defined microcups filled with at least a liquid crystal composition having its ordinary refractive index matched to that of the isotropic cup material. A novel roll-to-roll process and apparatus of the invention permits the display manufacture to be carried out continuously by a synchronized photo-lithographic process.

Abstract: A method of fabricating a field emission device cathode using electrophoretic deposition of carbon nanotubes in which a separate step of depositing a binder material onto a substrate, is performed prior to carbon nanotube particle deposition. First, a binder layer is deposited on a substrate from a solution containing a binder material. The substrate having the binder material deposited thereon is then transferred into a carbon nanotube suspension bath allowing for coating of the carbon nanotube particles onto the substrate. Thermal processing of the coating transforms the binder layer properties which provides for the adhesion of the carbon nanotube particles to the binder material.

Abstract: Methods of coating the surfaces of the microchannels of a microfluidic device are provided. These methods include silylating a first portion of the surfaces of the microchannels with a first silylating reagent to produce a first silylated surface, and silylating a second portion of the surfaces of the microchannels with a second silylating reagent to produce a second silylated surface.

Abstract: Methods for use in the production of a display include providing a substrate assembly of a face plate of the display including a conductive surface at a first side thereof. One or more projections extend from the first side of substrate assembly. A patternable material, e.g., electrophoretically depositable resist, is electrophoretically deposited on at least the conductive surface and adjacent the projections. The method may further include patterning the patternable material for use in deposition of light emitting elements on the conductive surface. Light emitting elements of one or more colors may be formed. In addition, the substrate assembly including the conductive surface may have one or more nonconductive regions formed on the conductive surface; the one or more nonconductive regions having a predetermined thickness. A layer of patternable material is formed by electrophoresis over the conductive surface and over the one or more nonconductive regions.

Abstract: A display overlay includes a contrast media layer and a photoconductive layer disposed between two electrodes. Light from an emissive display strikes the photoconductive layer and lowers the impedance of the photoconductive layer at the point at which the light is incident. Voltage applied to the electrodes creates an electric field that addresses the contrast media layer in locations of reduced impedance.

Abstract: A black matrix material for increasing resolution and contrast of field emission displays is disclosed. The black matrix material is preferably deposited by electrophoresis in the interstitial regions between phosphor pixels of the faceplate. By this technique, high resolution and/or small surface area field emission displays may be manufactured. The black matrix material does not brown when subjected to the conditions associated with the manufacture of field emission displays, is chemically inert and remains stable under vacuum conditions and electron bombardment. The black matrix material is selected from boron carbide, silicon carbide, tungsten carbide, vanadium carbide and mixtures thereof.

Abstract: High resolution color displays for field emission displays are formed by applying a grille to a screen layer, the grille having a set of holes formed therein exposing areas of the screen layer. A layer of photoresist is applied to the grille and the exposed areas of the screen layer, whereby a plurality of photoresist-covered screen layer areas are defined. One set of the plurality of photoresist-covered screen layer areas is fixed, whereby a fixed set and an unfixed set are defined. The photoresist is removed from the unfixed set and a light emitting substance is deposited on the exposed screen layer area. The fixed set of photoresist is plasma etched.

Abstract: An image forming method wherein an aqueous dispersion is prepared in a vessel of an apparatus. The aqueous dispersion contains an electrodeposition material including a fine particle coloring material, and a polymer which is chemically dissolved, or is deposited and precipitated, by a change in pH. The vessel can hold a liquid, and has therein an image supporting member. The image supporting member has at least an electrode, which can supply current or an electric field in accordance with an image pattern, and a surface which can support an image; and a counter electrode which forms a pair of electrodes together with the electrode. The electrodeposition material is deposited and precipitated to form an image by supplying current or an electric field in accordance with an image pattern to the image supporting member and the counter electrode and by changing the pH value of the aqueous dispersion in the vicinity of the image supporting surface of the image supporting member.

Abstract: Methods of forming face plate assemblies are described. In one implementation, a substrate is patterned with photoresist and a first phosphor-comprising material is formed over first surface areas of the substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. In a preferred aspect, processing the photoresist comprises using a heated aqueous developing solution comprising an acid, e.g. lactic acid, effective to dislodge and remove first phosphor-comprising material from beneath the developed photoresist.

Abstract: The present invention is to provide a method of forming a multilayer coating film by which the multilayer coating film comparable in shock resistance, in particular chipping resistance, to the conventional three-coat films can be formed in the three-wet one-bake coating system which is intended for coating process curtailment, cost reduction and environmental impact reduction.

Abstract: High resolution color displays for field emission displays are formed by applying a grille to a screen layer, the grille having a set of holes formed therein exposing areas of the screen layer. A layer of photoresist is applied to the grille and the exposed areas of the screen layer, whereby a plurality of photoresist-covered screen layer areas are defined. One set of the plurality of photoresist-covered screen layer areas is fixed, whereby a fixed set and an unfixed set are defined. The photoresist is removed from the unfixed set and a light emitting substance is deposited on the exposed screen layer area The fixed set of photoresist is plasma etched.

Abstract: A face plate assembles substrate is patterned with photoresist and a first phosphor-comprising material is formed over the substrates first surface areas substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. A second phosphor-comprising material is formed over the substrate and exposed second areas, with trace deposits being left over other substrate areas. The photoresist is subsequently stripped leaving some of the second phosphor-comprising material over substrate areas other than the first and second areas. Photoresist is again formed over the substrate and processed to expose third substrate areas which are different from the first and second areas. A third phosphor-comprising material is formed over the substrate and the exposed third areas.

Abstract: Methods for use in the production of a display include providing a substrate assembly of a face plate of the display including a conductive surface at a first side thereof. One or more projections extend from the first side of substrate assembly. A patternable material, e.g., electrophoretically depositable resist, is electrophoretically deposited on at least the conductive surface and adjacent the projections, e.g., spacers such as nonconductive spacers or spacers that have at least portions thereof that are slightly conductive. The method may further include patterning the patternable material for use in deposition of light emitting elements on the conductive surface. Light emitting elements of one or more colors may be formed. In addition, the substrate assembly including the conductive surface may have one or more nonconductive regions formed on the conductive surface; the one or more nonconductive regions having a predetermined thickness.

Abstract: Methods for use in the producing of a display include providing a substrate assembly of a face plate of the display including a conductive surface at a first side thereof. One or more projections extend from the first side of substrate assembly. A patternable material is electrophoretically deposited on at least the conductive surface and adjacent the projections. The method may further include patterning the patternable material for use in deposition of light emitting elements on the conductive surface. Light emitting elements of one or more colors may be formed. In addition, the substrate assembly including the conductive surface may have one or more nonconductive regions formed on the conductive surface; the one or more nonconductive regions having a predetermined thickness. A layer of patternable material is formed by electrophoresis over the conductive surface and over the one or more nonconductive regions.

Abstract: Methods of forming face plate assemblies are described. In one implementation, a substrate is patterned with photoresist and a first phosphor-comprising material is formed over first surface areas of the substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. In a preferred aspect, processing the photoresist comprises using a heated aqueous developing solution comprising an acid, e.g. lactic acid, effective to dislodge and remove first phosphor-comprising material from beneath the developed photoresist. A second phosphor-comprising material is formed over the substrate and the exposed second areas, with trace deposits being left over other substrate areas.

Abstract: Methods of forming face plate assemblies are described. In one implementation, a substrate is patterned with photoresist and a first phosphor-comprising material is formed over first surface areas of the substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. In a preferred aspect, processing the photoresist comprises using a heated aqueous developing solution comprising an acid, e.g. lactic acid, effective to dislodge and remove first phosphor-comprising material from beneath the developed photoresist. A second phosphor-comprising material is formed over the substrate and the exposed second areas, with trace deposits being left over other substrate areas.

Abstract: A hood latch mechanism having interengaging pivot elements and pins for pivotally carrying the elements, first and second parts of a frame which are placed on opposite side of the pivot elements, the parts being held together tightly by pins pivotally carrying the pivot elements on the frame parts, springs biasing the pivoting elements to predetermine positions away from the hasp catched position, the pivotal elements and pins having a coating thereon of non-conductive resin and lubricious solid film with the frame and springs having a cathodic electropainted coating thereon, the coatings permitting manual override of the springs to facilitate release of the catched position.

Abstract: An image forming method wherein an aqueous dispersion is prepared in a vessel of an apparatus. The aqueous dispersion contains an electrodeposition material including a fine particle coloring material, and a polymer which is chemically dissolved, or is deposited and precipitated, by a change in pH. The electrodeposition material is deposited and precipitated by changing the pH value of the aqueous dispersion in the vicinity of the image supporting surface of the image supporting member. The polymer in the electrodeposition material has both hydrophobic groups and hydrophilic groups, the proportion of number of the hydrophobic groups to the total number of hydrophilic groups and the hydrophobic groups in the polymer is in the range of from 40 to 80%, 50% or more of the hydrophilic groups can reversibly change from hydrophilic groups to hydrophobic groups due to a change in pH value.

Abstract: Methods of forming face plate assemblies are described. In one implementation, a substrate is patterned with photoresist and a first phosphor-comprising material is formed over first surface areas of the substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. In a preferred aspect, processing the photoresist comprises using a heated aqueous developing solution comprising an acid, e.g. lactic acid, effective to dislodge and remove first phosphor-comprising material from beneath the developed photoresist. A second phosphor-comprising material is formed over the substrate and the exposed second areas, with trace deposits being left over other substrate areas.

Abstract: A black matrix material for increasing resolution and contrast of field emission displays is disclosed. The black matrix material is preferably deposited by electrophoresis in the interstitial regions between phosphor pixels of the faceplate. By this technique, high resolution and/or small surface area field emission displays may be manufactured. The black matrix material does not brown when subjected to the conditions associated with the manufacture of field emission displays, is chemically inert and remains stable under vacuum conditions and electron bombardment. The black matrix material is selected from boron carbide, silicon carbide, tungsten carbide, vanadium carbide and mixtures thereof.

Abstract: Methods for use in the production of a display include providing a substrate assembly of a face plate of the display including a conductive surface at a first side thereof. One or more projections extend from the first side of substrate assembly. A patternable material, e.g., electrophoretically depositable resist, is electrophoretically deposited on at least the conductive surface and adjacent the projections, e.g., spacers such as nonconductive spacers or spacers that have at least portions thereof that are slightly conductive. The method may further include patterning the patternable material for use in deposition of light emitting elements on the conductive surface. Light emitting elements of one or more colors may be formed. In addition, the substrate assembly including the conductive surface may have one or more nonconductive regions formed on the conductive surface; the one or more nonconductive regions having a predetermined thickness.

Abstract: A method and a device are described for the repair and/or touch-up of small surface flaws in large press plates or endless bands of sheet metal, especially steel sheet, having a structured metal coating and a hard-chrome plating for surface-embossing plastic-coated wooden or laminated panels. Each flaw is repaired by surrounding it with a mask, pickling, and galvanically metallizing it. For a simplified and cost-favorable repair or touch-up, a galvanic solution is applied to the masked and pickled flaw for microgalvanizing damaged areas smaller than 14 mm.sup.2 by dipping the tip of an electrode into the solution. The pickled flaw can first be provided with a thin, microgalvanically applied nickel layer, and it is then copper-plated. The copper build-up is restructured by hand, if necessary, and covered with a hardened cobalt layer.

Abstract: A black matrix material for increasing resolution and contrast of field emission displays is disclosed. The black matrix material is preferably deposited by electrophoresis in the interstitial regions between phosphor pixels of the faceplate. By this technique, high resolution and/or small surface area field emission displays may be manufactured. The black matrix material does not brown when subjected to the conditions associated with the manufacture of field emission displays, is chemically inert and remains stable under vacuum conditions and electron bombardment. The black matrix material is selected from boron carbide, silicon carbide, tungsten carbide, vanadium carbide and mixtures thereof.

Abstract: A method of manufacturing a color filter for a multicolor liquid crystal display unit comprises the steps of forming an organic high-polymer color filter layer over a surface of a substrate. A protective film is then formed on the color filter layer and on the surface of the substrate. Thereafter, a thin metal electroless plating film is formed on the protective film. The electroless plating film is then patterned to form a shading film.

Abstract: A method of fabricating a channel structure for a PALC display panel comprises providing a channel member having channels formed in its upper surface and two electrodes in each channel, masking one electrode in each channel while leaving the other electrode unmasked, depositing material on the unmasked electrode in each channel, and removing the mask from masked electrode in each channel.

Abstract: A process for preparing a phosphor layer of a cathode ray tube. To prepare a phosphor layer located on the display screen rear side of the cathode ray tube, the display screen rear side is first coated with an electrically conductive electrode layer consisting of electrically conductive polymers; a solution containing the phosphors or their precursors as well as a solution containing an electrolyte are deposited on the electrode layer; an electric field is applied between the electrode layer and the solution; and the phosphors are electrophoretically deposited on the electrode layer to form the phosphor layer. Since polymers with an evaporation temperature below the destruction temperature of the phosphors are selected, the electrode layer can subsequently be removed by evaporating the polymers.

Abstract: A method for producing by electrophoretic deposition multi-layer, polyfunctional, catalyst members for use in catalytic converters having a plurality of suitably porous and adherent catalyst support coatings of substantially uniform thickness, a plurality of non-identical catalytic agents imbued therein/on, and a flexible metal substrate, are disclosed. Such process involves maintaining electrical interaction between a metal substrate previously coated with catalyst-catalyst support material, the power source, and the electrodes disposed in the electrophoretic deposition ("EPD") cell containing a slurry of a second catalyst support material and a second catalyst composition non-identical to that found in the first catalytically-active layer.

Abstract: High resolution color displays for field emission displays are formed by applying a grille to a screen layer, the grille having a set of holes formed therein exposing areas of the screen layer. A layer of photoresist is applied to the grille and the exposed areas of the screen layer, whereby a plurality of photoresist-covered screen layer areas are defined. One set of the plurality of photoresist-covered screen layer areas is fixed, whereby a fixed set and an unfixed set are defined. The photoresist is removed from the unfixed set and a light emitting substance is deposited on the exposed screen layer area. The fixed set of photoresist is plasma etched.

Abstract: The invention relates to a method and an apparatus for selectively electroplating apertured products. The products are masked in accordance with the intended plating and subsequently exposed to an electrolyte in order to electroplate the products. For masking purposes a fully closed photoresist layer is electrophoretically applied to the products, and after drying of the photoresist layer, the products are covered with a photomask in accordance with the locations to be plated, after which exposure takes place. Then the photoresist layer is partially removed, while the remaining part of the photoresist layer remains behind on the products, to serve as a mask for the metal products upon electroplating.

Abstract: A method for use in the construction of a color display screen using deposition of a plurality of electroluminescent materials onto a substrate bearing said screen. The method comprises the forming operations a), b), and c) in any sequence: a) forming on the substrate a first pattern of deposition sites covered with a first material selectively strippable by a first agent; b) forming on the substrate a second pattern of deposition sites covered with a second material strippable by a second agent but not significantly attacked by said first agent; and c) forming on the substrate a matrix surrounding the first and second patterns of deposition sites. The method includes thereafter performing a first stripping of the first material with the first agent to reveal first deposition sites within the matrix and performing a first depositing of a first electroluminescent material within the first revealed deposition sites.

Abstract: A method for electrophoretically depositing a layer of photoresist on a non-planar silicon structure and a method for forming a non-planar silicon structure using electrophoretic deposition are provided. The method comprises forming a silicon substrate with a non-planar topography and forming a conductive layer on the substrate. The substrate is then submerged in an electrolytic bath containing a photoresist solution comprising a polymer and a charged carrier group. At the same time the conductive layer is connected to a voltage source and to a non-sacrificial electrode and electrically biased. The biased conductive layer attracts the carrier group and causes a layer of photoresist to uniformly deposit on the conductive layer. The layer of photoresist can then be exposed and developed to form a photomask for etching the conductive layer. In an illustrative embodiment the silicon structure is an interconnect for testing unpackaged semiconductor dice.

Abstract: Phosphor color screens with triad pitches of 150 .mu.m and less are fabricated by a combination of modified microelectronic processing techniques and electrophoretic coating of the phosphors and black screen. Indeed, triad pitches based on 15 .mu.m color line width and 5 .mu.m black matrix between colors are achievable.

Abstract: After forming a cavity in a laminated body of a plurality of piezoelectric ceramic films and internal electrodes, an insulator is formed on the end faces of the internal electrodes exposed on the wall surface of the cavity by electrophoretic process. According to this method, an insulator can be formed more inexpensively, in larger quantity, and with higher reliability than by the conventional method using a low pressure CVD method.

Abstract: A method of manufacturing a semiconductor device according to the present invention includes a process of introducing impurities into a semiconductor layer with a gate electrode and a resist film as a mask after a resist film is formed on the top and the side of the gate electrode by soaking the gate electrode on a semiconductor layer in an electrolyte containing resist and applying voltage to the gate electrode.