Including Titration Patents (Class 205/788.5)
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Patent number: 8858769Abstract: In the invention, a back titration and titer determination can be made using a back coulometric titration. When the iodine exists in a solution put in the titration flask with electrolytic electrodes, a back coulometric titration is performed to produce iodine ions from the iodine at the anode of the electrolytic electrodes. Where the solution is a dehydrated solvent including a Karl Fischer reagent for a volumetric titration, the titer can be determined by the back coulometric titration. Where the solution is anolyte in which the iodine remains after the coulometric titration in the coulometric titration method, the water content in the sample is found from the quantity of electricity consumed by the coulometric titration and the quantity of electricity consumed by the back coulometric titration.Type: GrantFiled: February 14, 2012Date of Patent: October 14, 2014Assignee: Kyoto Electronics Manufacturing Co., Ltd.Inventors: Ikumi Kurose, Masaaki Ishikura
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Patent number: 8691074Abstract: A method for operating a measuring device comprising the following steps: providing a first sample of the liquid; ascertaining an updated calibration function by means of a standard addition method, wherein the first sample is supplemented at least once with a standard solution, which has a known concentration of the measured ion; determining a measured value of concentration of the measured ion in the first sample; providing a second sample of the liquid; ascertaining a measured value of concentration of the measured ion in the second sample as a reference measured ion concentration (cref) by means of a reference method; and determining a difference (cdisturb) between the apparent measured ion concentration (capparent) and the reference measured ion concentration (cref) and deriving a correction value (ckorr) therefrom for future measured values of concentration of the measured ion in the liquid, as ascertained with the measuring device.Type: GrantFiled: September 28, 2011Date of Patent: April 8, 2014Assignee: Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KGInventors: Stefan Wilke, Anja Harbig, Daniel Iten, Gunter Jahl
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Patent number: 8668821Abstract: According to the present invention, phenols may be detected using an electrochemical sensor comprising a first compound, a working electrode and an electrolyte in contact with the working electrode, wherein the first compound operatively undergoes a redox reaction at the working electrode to form a second compound which operatively reacts in situ with the phenol, wherein said redox reaction has a detectable redox couple and wherein the sensor is adapted to determine the electrochemical response of the working electrode to the consumption of said second compound on reaction with the phenol. The phenol may be, for example, a cannabinoid or a catechin compound.Type: GrantFiled: December 17, 2012Date of Patent: March 11, 2014Assignee: Isis Innovation LimitedInventors: Richard Guy Compton, Craig Edward Banks
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Publication number: 20120073989Abstract: A method for operating a measuring device comprising the following steps: providing a first sample of the liquid; ascertaining an updated calibration function by means of a standard addition method, wherein the first sample is supplemented at least once with a standard solution, which has a known concentration of the measured ion; determining a measured value of concentration of the measured ion in the first sample; providing a second sample of the liquid; ascertaining a measured value of concentration of the measured ion in the second sample as a reference measured ion concentration (cref) by means of a reference method; and determining a difference (cdisturb) between the apparent measured ion concentration (capparent) and the reference measured ion concentration (cref) and deriving a correction value (ckorr) therefrom for future measured values of concentration of the measured ion in the liquid, as ascertained with the measuring device.Type: ApplicationFiled: September 28, 2011Publication date: March 29, 2012Applicant: Endress + Hauser Conducta Gesellschaft fur Mess- und Regeltechnik mbH + Co. KGInventors: Stefan Wilke, Anja Harbig, Daniel Iten, Günter Jahl
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Patent number: 8118988Abstract: A simple titration method involving a single copper ion titrant detected by a copper ion specific electrode provides the concentrations of both copper ions and bath complexing agent (ethylene diamine, for example) in alkaline copper electroplating baths of the type used to deposit or thicken copper seed layers on silicon wafers. Standard addition of an excess of a strong complexing agent (EDTA, for example) and back-titration with the copper ion titrant yields the bath copper ion concentration, and continued titration to a second endpoint, preferably after addition of hydroxide to adjust the pH of the analysis solution, yields the total concentration of bath complexing agent. Based on these analyzes, the concentration of free bath complexing agent may be calculated. The method also provides direct determination of the free bath complexing agent concentration via standard addition of excess bath complexing agent to a sample of the plating bath and titration with the copper ion titrant.Type: GrantFiled: January 31, 2008Date of Patent: February 21, 2012Assignee: ECI Technology, Inc.Inventors: Eugene Shalyt, Victor Ososkov, Michael Pavlov, Peter Bratin
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Patent number: 7988876Abstract: To reduce and homogenize the thickness of a semiconductor layer which lies on the surface of an electrically insulating material, the surface of the semiconductor layer is exposed to the action of an etchant whose redox potential is adjusted as a function of the material and the desired final thickness of the semiconductor layer, so that the material erosion per unit time on the surface of the semiconductor layer due to the etchant becomes less as the thickness of the semiconductor layer decreases, and is only from 0 to 10% of the thickness per second when the desired thickness is reached. The method is carried out without the action of light or the application of an external electrical voltage.Type: GrantFiled: January 31, 2008Date of Patent: August 2, 2011Assignee: Siltronic AGInventors: Diego Feijoo, Oliver Riemenschneider, Reinhold Wahlich
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Patent number: 7968053Abstract: A chlorine analyzing apparatus includes a reaction tube of a double tube structure with an inner tube for receiving a sample and an outer tube for recovering hydrogen chloride. An electric furnace has a reaction tube insertion hole into which the reaction tube is inserted. The electric furnace is equipped with a heater disposed around the reaction tube insertion hole. A titration cell receives acetic acid as an electrolyte and subjects hydrogen chloride withdrawn from the reaction tube to coulometric titration. A deodorization tube is disposed on a rear stage side of the titration cell for thermally decomposing a vapor of acetic acid discharged from the titration cell. The deodorization tube is fitted into the electric furnace.Type: GrantFiled: March 1, 2007Date of Patent: June 28, 2011Assignee: Mitsubishi Chemical Analytech Co., Ltd.Inventors: Norio Hayashi, Takayuki Okafuji, Tamaki Tomoyose, Shuichi Akasaka
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Patent number: 7631535Abstract: A method of confirming reception of a drop of water has the steps of applying a powder on a surface of a gas sensing element, placing the element in a gas passage so as to expose the surface of the element to the gas passage, causing a measured gas to flow through the gas passage, receiving drops of water included in the measured gas on limited areas of the surface of the element such that the drops of water take out the powder applied on the limited areas from the element, and confirming the reception of the drops of water on the surface of the element. The powder has a melting point or a sublimation temperature equal to or higher than 1000° C.Type: GrantFiled: January 23, 2007Date of Patent: December 15, 2009Assignee: Denso CorporationInventors: Motoaki Satoh, Kouhei Yamada
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Publication number: 20090194430Abstract: A simple titration method involving a single copper ion titrant detected by a copper ion specific electrode provides the concentrations of both copper ions and bath complexing agent (ethylene diamine, for example) in alkaline copper electroplating baths of the type used to deposit or thicken copper seed layers on silicon wafers. Standard addition of an excess of a strong complexing agent (EDTA, for example) and back-titration with the copper ion titrant yields the bath copper ion concentration, and continued titration to a second endpoint, preferably after addition of hydroxide to adjust the pH of the analysis solution, yields the total concentration of bath complexing agent. Based on these analyzes, the concentration of free bath complexing agent may be calculated. The method also provides direct determination of the free bath complexing agent concentration via standard addition of excess bath complexing agent to a sample of the plating bath and titration with the copper ion titrant.Type: ApplicationFiled: January 31, 2008Publication date: August 6, 2009Inventors: Eugene Shalyt, Victor Ososkov, Michael Pavlov, Peter Bratin
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Publication number: 20090145777Abstract: A titration apparatus comprising a titration reservoir for a non-flowing sample solution to be titrated; an ion source reservoir comprising an ion source solution of selected ions; an ion exchange membrane barrier capable of passing ions from the ion source solution to the titration reservoir, but of blocking bulk liquid flow; a first electrode in electrical communication with the ion source reservoir; and a second electrode in electrical communication with the titration reservoir. Also, an electrolytic titrant generator for use in the titration apparatus.Type: ApplicationFiled: December 6, 2007Publication date: June 11, 2009Applicant: Dionex CorporationInventor: Kannan Srinivasan
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Publication number: 20080251394Abstract: The method according to the invention consists of generating an electrochemical signature of the analyzed substance(s), obtained by carrying out a numerical pseudo-titration and to express the result of the measurements in antioxidant power units. It involves the processing of a current-potential response of the oxidation of the analyzed substance(s) by a predefined mathematical dimensionless function representing a virtual and ideal oxidizing agent. The method is useful for the identification and/or detection and/or titration of antioxidant substances in the tested material, including directly on wet biological tissues.Type: ApplicationFiled: March 11, 2005Publication date: October 16, 2008Applicant: Edel Therapeutics S.A.Inventors: Gregoire Lagger, Philippe Tacchini, Hubert H. Girault
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Publication number: 20080149501Abstract: A set (1) comprising at least two ion-selective solid-contact electrodes comprises at least two ion-selective measuring points (6). Each measuring point (6) comprises a metal conductor (3) and/or an inner layer (7) of a conductive polymer and an outer, ion-selective membrane (8). At least two measuring points (6) are selective in each case with respect to a different ion of an analysis solution. One of the solid-contact electrodes can be used as a reference electrode.Type: ApplicationFiled: December 21, 2007Publication date: June 26, 2008Applicant: METROGLAS AGInventors: Martin Heule, Erno Pretsch, Tamas Vigassy
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Patent number: 7022215Abstract: The present invention relates to methods for removing the matrix effects caused by variance in copper concentration and acidity during measurement of the organic additive concentration in a sample copper plating solution.Type: GrantFiled: December 19, 2002Date of Patent: April 4, 2006Assignee: Advanced Technology Materials, Inc.Inventor: Cory Schomburg
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Patent number: 6913686Abstract: The present invention relates to methods and apparatus for determining concentrations of various inorganic or organic components in solder plating solutions, which include titration or parallel titration methods, direct potentiometry methods, calibration methods, and/or UV-Vis absorption analysis.Type: GrantFiled: December 10, 2002Date of Patent: July 5, 2005Assignee: Advanced Technology Materials, Inc.Inventor: Monica K. Hilgarth
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Patent number: 6749739Abstract: Relative concentrations of active suppressor additive species and suppressor breakdown contaminants in an acid copper electroplating bath are determined by cyclic voltammetric stripping (CVS) dilution titration analysis using two negative electrode potential limits. The analysis results for the more negative potential limit provide a measure of the suppressor additive concentration alone since the suppressor breakdowvn contaminants are not effective at suppressing the copper deposition rate at the more negative potentials. The analysis results for the less negative potential limit provide a measure of the combined concentrations of the suppressor additive and the suppressor breakdown contaminants. Comparison of the results for the two analyses yields a measure of the concentration of the suppressor breakdown contaminants relative to the suppressor additive concentration.Type: GrantFiled: October 7, 2002Date of Patent: June 15, 2004Assignee: ECI Technology, Inc.Inventors: Gene Chalyt, Peter Bratin, Michael Pavlov, Alex Kogan, Michael James Perpich
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Publication number: 20030127341Abstract: The present invention relates to methods for removing the matrix effects caused by variance in copper concentration and acidity during measurement of the organic additive concentration in a sample copper plating solution.Type: ApplicationFiled: December 19, 2002Publication date: July 10, 2003Inventors: Mackenzie E. King, Richard Bhella, Cory Schomburg, Peter Robertson
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Publication number: 20030121799Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.Type: ApplicationFiled: October 4, 2002Publication date: July 3, 2003Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph W. Evans
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Patent number: 6361670Abstract: A device for the coulometric determination of water by a Karl Fischer reaction comprising a membrane-free measuring cell that contains a liquid reagent, an iodine indicating means, an anode, a cathode and a casing around the cathode to define a cathode space. The casing has an opening through which the cathode space communicates with the liquid reagent. A maneuverable drainage device including a plunger is provided to drain-off liquid reagent in the cathode space through the opening.Type: GrantFiled: August 27, 1999Date of Patent: March 26, 2002Assignee: AB Stockholms PatentyraInventor: Anders Cedergren
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Patent number: 6315888Abstract: A constant-current polarization voltage detecting method includes step of feeding to a detecting electrode a predetermined minute current in a pulse form, and detecting sequentially a polarization voltage at each time of feeding the pulsating current, in an electrochemical analysis in solution. The polarization voltage is detected after a lapse of a predetermined time from the initiation of feeding the pulsating current at each time. A Karl Fischer's moisture content analyzing apparatus can utilize such a method.Type: GrantFiled: April 18, 2000Date of Patent: November 13, 2001Assignees: Mitsubishi Chemical Corporation, Dia Instruments Co., Ltd.Inventors: Hiromasa Kato, Masafumi Nakatani
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Patent number: 6254760Abstract: The present invention generally provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs rules and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a front-end loading station, a mainframe including one or more processing cells, and an electrolyte replenishing system fluidly connected to the one or more electrical processing cells. The electrolyte replenishing system comprises a main electrolyte supply tank and an analyzer module and dosing module coupled thereto. The analyzer module includes one or more chemical analyzers to monitor the concentrations of various chemicals in the main electrolyte supply tank. Information provided by the analyzer module is transmitted via a central control system to the dosing module.Type: GrantFiled: March 5, 1999Date of Patent: July 3, 2001Assignee: Applied Materials, Inc.Inventors: Ben Shen, Yezdi Dordi, George Birkmaier