Abstract: Disclosed herein is a multi-channel device for detecting plasma at an ultra-fast speed, including: a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the leakage current; a first current detection module detecting the first leakage current; a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information; and a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information.

Abstract: Methods and systems of detection of wafer de-chucking in a semiconductor processing chamber are disclosed. Methods and systems of interdiction are also disclosed to prevent hardware and wafer damage during semiconductor fabrication if and when de-chucking is detected. In one embodiment, a de-chucking detection method is based on measuring change in imaginary impedance of a plasma circuit, along with measuring one or both of reflected RF power and arc count. In another embodiment, a possibility of imminent de-chucking is detected even before complete de-chucking occurs by analyzing the signature change in imaginary impedance.

Abstract: Methods of determining a corrected analyte concentration in view of some error source are provided herein. The methods can be utilized for the determination of various analytes and/or various sources of error. In one example, the method can be configured to determine a corrected glucose concentration in view of an extreme level of hematocrit found within the sample. In other embodiments, methods are provided for identifying various system errors and/or defects. For example, such errors can include partial-fill or double-fill situations, high track resistance, and/or sample leakage. Systems are also provided for determining a corrected analyte concentration and/or detecting some system error.

Abstract: There is described a method and a system for evaluating damage of a plurality of cells in an electrolyser. The method comprises acquiring a voltage for each one of the cells; comparing the voltage to at least two threshold voltage levels; classifying the cells as one of: severely damaged cells, non-severely damaged cells and undamaged cells, based on the comparison of the voltage with the at least two threshold voltage levels; and deactivating the cells classified as severely damaged cells from the electrolyser.

Abstract: System for modifying the chemical composition of atmosphere within an enclosed space and incubator system including such a system. The concentration of oxygen within the enclosed space may be either increased or decreased using an electrochemical device. The concentration of carbon dioxide within the enclosed space may be increased using an electrochemical or chemical device. As necessary, purging of the system with ambient air can be a part of the process of controlling the chemical composition of the atmosphere. The present invention obviates the need to use pressurized gas cylinders to supply atmospheric gases to the enclosed space.

Abstract: A method for monitoring a substrate patterning process, wherein at least two electrodes (2, 3) are used to apply a voltage to the substrate (1) to cause a reaction in a portion of the substrate, comprises recording a current-driven by said voltage as a function of time and/or as a function of a position of the substrate (1) or a patterning mask. Also disclosed are a device and a computer program product for monitoring the substrate patterning process.

Abstract: The invention relates to a method of assessing the risk of whiskers appearing on the surface of a metallic deposit, a pure metal deposit or an alloy deposit on a substrate, using a measurement of the electrochemical impedance of the metallic deposit.

Abstract: The invention provides an electrochemical noise method, apparatus and system for estimating parameters of interest related to corrosion rates of an electrically conductive article, the method comprising: placing a working electrode, a reference electrode, and a counter electrode in an environment of interest; measuring potential at open circuit between the working electrode and the reference electrode over time; placing the working electrode under a potentiostatic control; measuring current between the working electrode and the counter electrode for a predetermined period of time, the period of time of measurements may be extended to include a transient event; and estimating the corrosion rate.

Abstract: According to one exemplary embodiment, a circuit configured to interface with an etch tool comprises an ESC input for receiving a first signal from the etch tool, where the first signal indicates a magnitude of a chuck current passing through a chuck holding a wafer in the etch tool. The circuit further comprises a VRF input for receiving a second signal from the etch tool, which indicates a magnitude of a voltage difference between a plasma and the chuck in the etch tool. The circuit further comprises an arc detect output indicating whether an arc event has occurred. The circuit can be configured to prevent the arc detect output from indicating an occurrence of a chucking spike and a de-chucking spike in the etch tool.

Abstract: The invention relates to the analysis of the performance and properties of electrochemical processes, and specifically, to electrolytic solutions and electrode processes. The invention discloses a device and a method for obtaining qualitative and quantitative information for the kinetics of the electrode reactions, the transport processes, the thermodynamic properties of the electrochemical processes taking place in the cell. When a deposition reaction takes place, the device provides also valuable information about the relationship between the current density and deposit properties including but not limited to the deposit color, luster, and other aspects of its appearance. The device disclosed herein typically is comprised of a multiplicity of cathodic or anodic regions where one or more electrochemical reactions take place simultaneously, but at a different rate.

Abstract: An in-substrate selective electrochemical treatment system for finding and repairing pinholes of an active substrate including holding an insulating substrate having a conductive pattern, supplying a predetermined amount of a specified chemical solution to a specified region on the insulating substrate and confining it in the specified region, locating the reversed polarity electrode plate close to the insulating substrate such that the reversed polarity electrode plate comes in contact with the chemical solution on the upper surface of the insulating substrate, bringing the electrode into contact with the conductive pattern in the periphery of the insulating substrate, applying a specified direct current between the electrode and the reversed polarity electrode plate, and measuring a value of current flowing between the electrode and the reversed polarity electrode plate.

Abstract: Provided is an inspection method for a multilayer gas sensing device, capable of certainly and easily detecting a defective product originating from faults such as gaps or cracks. For the inspection of the gas sensing device including a sensor cell in which a measured gas side electrode is coated with a porous diffusion resistance layer in a stacked condition and the diffusion resistance layer is further coated with a dense protective layer in a stacked condition, in a state where the gas sensing device is immersed in a conductive inspection solution and a reference electrode of the sensor cell is placed into a non-contact with the solution, a voltage is applied between the solution and the reference electrode to measure a current flowing therebetween. On the basis of the measured current value, a decision is made as to whether or not the insulation is kept between the solution and the reference electrode.

Abstract: A method of detecting arcing in a semiconductor substrate processing system. In one embodiment, the method includes monitoring a signal, identifying an indicia of arcing in the signal, and performing an action in response to the indicia of arcing when the indicia of arcing is identified.

Abstract: A measuring method is provided for monitoring of aluminum electrolysis cells, together with a corresponding measurement arrangement that includes an immersion sensor. In order to obtain reproducible measurements, the bath electrode of the immersion sensor is arranged on a carrier.

Abstract: A measuring arrangement for measuring product parameters of a component in the epitaxial layer (28) of a wafer comprises measuring probe (3) on whose contact side (23) a recess (24) is installed, into which an electrolyte can be poured. The electrolyte produces an electrical connection between a contact body (11), which is charged with a signal from a pulsed-current source, and the surface (22) of the wafer (2). A detector (16) serves for detecting the light which is emitted by the component.

Abstract: A high throughput electrochemical test method for determining the resistance to corrosion of a metal article coated with a resinous coating which comprises: (a) making, as the working electrode in an electrochemical cell which also comprises a reference electrode, a counter-electrode and an electrolytic solution, one or more metal articles comprising a plurality of coated areas thereon, with the proviso that a portion of the coating does not exist on the metal thereby allowing for the ultimate passage of electrical current to the metal without the coating being a barrier to such passage; (b) impressing a series of direct current electrical potentials upon each of the respective coated areas in sequence and upon the respective associated working electrode to enable current to flow between the metal article in the electrochemical cell and the counter-electrode; and (c) measuring the current flow as the direct current potential is varied relative to the reference electrode to generate a potentiodynamic scan o

Abstract: A portable and nondestructive adhesive tape corrosion sensor which is utilized under actual field or laboratory conditions in detecting coating and substrate degradation using Electrochemical Impedance Spectroscopy (EIS) of coated or uncoated metal structures has been developed. The invention allows for broad applicability, flexibility in utilizing the sensor in various environments without structural compromise and the ability to inspect and evaluate corrosion of the actual structure, regardless of the size, shape, composition, or orientation of the structure. The electrodes may be removed once a measurement is made or remain in the original fixed position so that subsequent measurements may be made with the same electrode. The nondestructive sensor apparatus is comprised of a pressure-sensitive adhesive tape that consists of a conductive film or foil and conductive adhesive overlapping another pressure-sensitive adhesive tape that consists of a conductive film or foil and non-conductive adhesive.

Abstract: A method and device for testing the quality of a sheet-like element comprising a membrane are presented. The quality test is limited to a part-area of the sheet-like element. A useful material is fed to one side of the sheet-like element via an outlet orifice corresponding to the part are to be tested. The method can be used in the production of large-area membranes or membrane/electrode units (MEU) provided for use in fuel cells. The quality test can take place in a simple way even during production of these sheet-like elements. Faults during production can be detected at an early stage and the production parameters changed accordingly. In the case of testing an MEU for a fuel cell, fuel gas can be applied to one side of the MEU in a punctiform manner. Oxygen of the ambient atmosphere located on the other side can serve as an oxidation gas.