Abstract: A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a cleaning water line for causing the cleaning water to flow, cleaning machines to which the cleaning water is supplied from the cleaning water line, a solute removal unit into which excess cleaning water is introduced from the cleaning water line, and a collecting line for returning collected water from which the solute is removed to a tank and the like.

Abstract: According to one embodiment, an apparatus for measuring hydroxyl radicals that measures hydroxyl radicals produced by irradiating a liquid to be treated flowing through a channel in which an ultraviolet lamp is arranged with ultraviolet rays, the apparatus includes a diverting unit, a reagent adding unit, and a measuring unit. The diverting unit has a diverting channel that diverts the liquid to be treated before being irradiated with the ultraviolet rays from the channel and part of which is arranged at a position enabling the liquid to be treated within the channel to be irradiated with the ultraviolet rays. The reagent adding unit adds a hydroxyl radical measuring reagent to the diverted liquid to be treated. The measuring unit irradiates the diverted liquid to be treated with the ultraviolet rays and measures the amount of hydroxyl radicals produced based on a change in the hydroxyl radical measuring reagent between before and after the irradiation with the ultraviolet rays.

Abstract: The present invention provides a photocatalytic reactor and a method for treating gaseous pollutants using the same, which can decompose and remove gaseous pollutants such as volatile organic compounds (VOCs), odors, etc. as well as liquid pollutants using an environmentally friendly photocatalytic reaction. To this end, the present invention provides a photocatalytic reactor including: a solution tank to which a fluid containing gaseous pollutants to be treated is supplied through an inlet; a solution injector installed at the top of the inlet and injecting a gaseous pollutant solution into the fluid to be treated such that the gaseous pollutants of the fluid are dissolved; and a liquid photocatalytic treatment device receiving the gaseous pollutant solution, in which the gaseous pollutants of the fluid are dissolved and liquefied, from the solution tank and decomposing the liquefied gaseous pollutants of the fluid.

Abstract: A method for treating a substance using an apparatus having: (a) a volute or cyclone head, (b) a throat connected to the volute or cyclone head, (c) a parabolic reflector connected to the throat, (d) a first wave energy source comprising a first electrode within the volute or cyclone head that extends through the outlet into the first opening of the throat along the central axis of the throat, and a second electrode extending into the parabolic reflector proximate to the focus wherein the second electrode is spaced apart and axially aligned with first electrode, and (e) a second wave energy source disposed inside the throat, embedded within the throat or disposed around the throat. The substance is supplied to the inlet of the volute or cyclone head and is irradiated with one or more wave energies produced by the first and second wave energy sources.

Abstract: In production of ultrapure water by purifying primary pure water with a secondary pure water manufacturing apparatus and a tertiary pure water manufacturing apparatus, high-purity ultrapure water is produced, wherein generation of hydrogen peroxide is minimized and the concentrations of TOC, DO, and hydrogen peroxide are reduced to the limit. In an ultrapure water manufacturing system, each of the secondary pure water manufacturing apparatus and the tertiary pure water manufacturing apparatus includes an ultraviolet oxidation device and a deionization device, downstream therefrom, by using an ion exchange resin. UV light control is performed in such a way that the hydrogen peroxide concentration results in 1 to 30 ?g/L and the TOC concentration results in 1 to 10 ?g/L at the outlet of the ultraviolet oxidation apparatus of the secondary pure water manufacturing apparatus and, in addition, the TOC concentration results in 0.

Abstract: Method and apparatus for destroying organic contaminants in a fluid. At least one oxidant is added to a contaminated fluid, which is then irradiated with ultraviolet radiation. The oxidant is preferably chlorine-based and generated on-site. The intensity of the radiation is higher than typical AOP processes. Various process parameters, such as the pH and/or flow rate of the contaminated fluid, and/or the relative intensities of various UV wavelength sources, are varied in response to measuring quality indicators.

Abstract: A system and method (60) for a purifying a fluid (such as air or water) containing contaminants includes removing the contaminants from the fluid (70) using a capturing device, such as an adsorbent and/or a particle filter. The contaminants may include volatile organic compounds (VOCs) and microorganisms. The method (60) further includes generating ozone molecules using an ozone generating device (62). An ozone decomposition device is used to decompose at least a portion of the ozone molecules into oxygen and oxygen radicals (68). The captured contaminants (VOCs and microorganisms) react with the oxygen radicals and the ozone molecules to denature the contaminants (72), rendering them less harmful than the original contaminants in the fluid. In some cases, the contaminants may be reduced to carbon dioxide and water.

Abstract: A device for on-line radiating gas-containing liquid with light that can mix ozone and water, and radiate the same on-line as well as remove accretions on protective sheaths (preferably quartz tubes) of the device to reduce energy loss. Ozone and water is mixed in a gas-liquid mixer of the device and the ozone-water mixture is guided by a conduct of a gas-liquid separator of the device and spayed out to be radiated by multiple UV lamps protected by the protective sheaths. The accretions on the protective sheaths are removed by scraper mechanisms of a washing assembly of the device.