Pattern Or Design Applied By Transfer Patents (Class 216/54)
  • Patent number: 10649328
    Abstract: High etch contrast materials provide the basis for using pre-patterned template structure with a template hardmask having periodic holes and filler within the holes that provides the basis for rapidly obtaining high resolution patterns guided by the template and high etch contrast resist. Methods are described for performing the radiation lithography, e.g., EUV radiation lithography, using the pre-patterned templates. Also, methods are described for forming the templates. The materials for forming the templates are described.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: May 12, 2020
    Assignee: Inpria Corporation
    Inventors: Jason K. Stowers, Andrew Grenville
  • Patent number: 10615401
    Abstract: A cylindrical battery according to an aspect of the present invention includes an electrode assembly including a positive electrode plate and a negative electrode plate wound together via a separator, an electrolytic solution, a bottomed cylindrical housing can, and a sealing unit fixed by crimping of an open end of the housing can via a gasket. The sealing unit includes a valve member having a circular outline, a metal plate connected to a central portion of the valve member so as to be farther inside the battery than the valve member, and an annular insulating member disposed between an outer peripheral portion of the valve member and an outer peripheral portion of the metal plate. The valve member has a sloping region in which the thickness decreases or increases continuously along the radial direction.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: April 7, 2020
    Assignee: SANYO Electric Co., Ltd.
    Inventors: Naoto Kunoike, Kyosuke Miyata, Oose Okutani, Kazutoshi Kohira, Tomohiko Yokoyama, Shinya Geshi
  • Patent number: 10585350
    Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: March 10, 2020
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Kang Luo, Michael Nevin Miller, Shuqiang Yang, Frank Y. Xu
  • Patent number: 10501841
    Abstract: A deposition mask capable of performing high-definition patterning while suppressing position gap between a substrate for vapor deposition and an opening arrangement of the deposition mask during vapor deposition and a manufacturing method thereof are provided. A deposition mask (1) includes a resin film (2) having an opening (4) pattern for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition. The deposition mask (1) includes a low-emissivity layer (5) whose emissivity is lower than that of the resin film (2), which is formed at least partly on a surface of the resin film (2) facing a vapor deposition source, thereby suppressing temperature rise of the resin film (2) due to heat radiated from the vapor deposition source.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: December 10, 2019
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Patent number: 10446817
    Abstract: The present disclosure relates to energy storage devices having: a sealed container configured to house a plurality of energy storage devices and enable electrical communication via terminals of the sealed container and a vent located on a periphery of the sealed container. The vent generally comprises a vent panel; a countersink located adjacent the vent panel; at least one score located in the countersink; a buckling initiator at least partially located on the countersink, where the buckling initiator is configured to intersect with the at least one score; and a hinge portion attached to the vent panel, where the hinge portion is positioned opposite the buckling initiator.
    Type: Grant
    Filed: October 3, 2016
    Date of Patent: October 15, 2019
    Assignee: Arconic Inc.
    Inventors: Glenn W. Jarvis, Robert E. Dick, Hasso Weiland, Joseph M. Fridy, David J. McNeish, John W. Cobes, Rabindra K. Bhattacharyya, John M. Krish, David M. Ference, Brock Watters, Gregory Catrambone
  • Patent number: 10084133
    Abstract: A mask including patterned structures arranged sequentially along a predetermined direction and a peripheral area surrounding the patterned structures is provided. Each of the patterned structures includes an opening portion and a thinning portion surrounding the opening portion. The opening portion has through holes arranged in a matrix. An outline of the thinning portion has two side edges opposite to each other substantially parallel to the predetermined direction. The thinning portion is defined by an area demarked by the outline of the thinning portion and an outline of the opening portion. A thickness of the thinning portion is thinner than a thickness of the peripheral area.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: September 25, 2018
    Assignee: Au Optronics Corporation
    Inventors: Jui-Hsiang Chen, Hsin-Hung Chen, Po-Wen Teng, Chun-Chih Lai, Nan-Huei Jiang, Han-Chung Lai
  • Patent number: 9400427
    Abstract: The present invention is a method of manufacturing a fine structure body which manufactures the fine structure body by repeating a basic fine structure body forming step that forms a basic fine structure body by pressing a fine structure mold against a curable resin (photocurable resin film) on a surface of a base material and a release and moving step that releases the fine structure mold from the base material and moves the fine structure mold, wherein the fine structure mold includes at least a first mold depression pattern which is disposed at center area of it, and a second mold depression pattern which is disposed in at least one side part in circumference area of it, and a size of the second mold depression pattern is smaller than a size of the first mold depression pattern.
    Type: Grant
    Filed: April 26, 2012
    Date of Patent: July 26, 2016
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Yuji Yamamoto, Toshihiko Wada, Yoshifumi Takasu, Akihisa Yamada
  • Patent number: 9138774
    Abstract: The invention relates to a method for processing a structured surface of an embossing tool, in which the entire surface is provided with a first metallic coating (6) and said surface having, in selected regions (7, 8, 9, 10, 11), at least one additional metallic coating that has a differing degree of lustre. To improve the optical properties of the material boards produced using the embossing tools, particularly if reproducing a wood texture, the invention suggests that additional differing degrees of lustre should be produced in multiple selected regions (7, 8, 9, 10, 11) on the first coating (6), and be produced by a combination of metallic coatings and mechanical or chemical after-treatments. Therefore, for example, a wood pore with a defined structure can be substantially better reproduced, and the optical and haptic properties of the wood composite board produced using the press plates can thus be improved.
    Type: Grant
    Filed: March 8, 2012
    Date of Patent: September 22, 2015
    Assignee: Hueck Rheinische GmbH
    Inventors: Martin Marxen, Wolfgang Stoffel
  • Patent number: 9115022
    Abstract: A high resolution stencil is produced by a thermal printer for the purposes of permanently etching glass for parts identification, tracking and labeling. An improved process to attach the stencil to the glass substrate is defined. An amended aqueous adhesive is used to bind the stencil so that it is in direct contact with the glass at all times and across the entire plane of the stencil and the adhesion is aided by use of a straight-edged tool to help evacuate any potential elements which may hinder the prescribed glass etching compound(s) from completing a clear and precise permanent mark.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: August 25, 2015
    Inventor: Matthew R. Holloway
  • Patent number: 9048372
    Abstract: A method for patterning an article, the article comprising a first layer of a first material, the method comprising providing a thread carrying a first species, e.g. a solvent in which the first material is soluble, and contacting the thread with the first layer to remove at least part of the first layer.
    Type: Grant
    Filed: July 4, 2011
    Date of Patent: June 2, 2015
    Assignees: Cambridge Enterprise Limited, Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
    Inventors: Hans-Frieder Schleiermacher, Birger Zimmermann, Michael Niggemann
  • Patent number: 9034197
    Abstract: The disclosure relates generally to a method for fabricating a patterned medium. The method includes providing a substrate with an exterior layer under a lithographically patterned surface layer, the lithographically patterned surface layer comprising a first pattern in a first region and a second pattern in a second region, applying a first masking material over the first region, transferring the second pattern into the exterior layer in the second region, forming self-assembled block copolymer structures over the lithographically patterned surface layer, the self-assembled block copolymer structures aligning with the first pattern in the first region, applying a second masking material over the second region, transferring the polymer block pattern into the exterior layer in the first region, and etching the substrate according to the second pattern transferred to the exterior layer in the second region and the polymer block pattern transferred to the exterior layer in the first region.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: May 19, 2015
    Assignee: HGST NETHERLANDS B.V.
    Inventors: Jeffrey S. Lille, Kurt A. Rubin, Ricardo Ruiz, Lei Wan
  • Patent number: 9005460
    Abstract: The present invention provides methods of selectively removing one or more graphene layers from a graphene material by: (1) applying a metal to a surface of the graphene material; and (2) applying a hydrogen containing solution to the surface of the graphene material that is associated with the metal. The hydrogen containing solution dissolves the metal along with one or more layers of graphene associated with the metal, thereby removing the layer(s) of graphene from the graphene material. In some embodiments, the hydrogen containing solution is an acidic solution, such as hydrochloric acid. In some embodiments, the metal is zinc. In some embodiments, the methods of the present invention are utilized to selectively remove one or more layers of graphene from one or more targeted sites on the surface of a graphene material.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: April 14, 2015
    Assignee: William Marsh Rice University
    Inventors: James M. Tour, Ayrat M. Dimiev, Dmitry V. Kosynkin
  • Patent number: 8948562
    Abstract: The present invention provides templating methods for replicating patterned metal films from a template substrate such as for use in plasmonic devices and metamaterials. Advantageously, the template substrate is reusable and can provide plural copies of the structure of the template substrate. Because high-quality substrates that are inherently smooth and flat are available, patterned metal films in accordance with the present invention can advantageously provide surfaces that replicate the surface characteristics of the template substrate both in the patterned regions and in the unpatterned regions.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: February 3, 2015
    Assignee: Regents of the University of Minnesota
    Inventors: David J. Norris, Sang Eon Han, Aditya Bhan, Prashant Nagpal, Nathan Charles Lindquist, Sang-Hyun Oh
  • Patent number: 8920663
    Abstract: A method for producing a security element having microdepressions for security papers, with the microdepressions being colored with a certain color, involves the steps of (a) coating an upper side of a carrier with an embossable layer; (b1) forming microdepressions in the embossable layer to configure an embossed layer; (c) applying the certain color on the upper side, so that the color remains in the microdepressions; (b2) applying a structured protective layer on the coated upper side, wherein the structured protective layer does not cover the microdepressions that are to be colored with the certain color, after step (b1) and before step (c); and removing the structured protective layer and thereby a color toning after step (c).
    Type: Grant
    Filed: November 4, 2010
    Date of Patent: December 30, 2014
    Assignee: Giesecke & Devrient GmbH
    Inventor: Mario Keller
  • Patent number: 8916053
    Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: December 23, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Kawamonzen, Yasuaki Ootera, Akiko Yuzawa, Naoko Kihara, Yoshiyuki Kamata, Hiroyuki Hieda, Norikatsu Sasao, Ryosuke Yamamoto, Takeshi Okino, Tomoyuki Maeda, Takuya Shimada
  • Patent number: 8907456
    Abstract: A method of fabricating integrated circuits is described. A multi-material hard mask is formed on an underlying layer to be patterned. In a first patterning process, portions of the first material of the hard mask are etched, the first patterning process being selective to etch the first material over the second material. In a second patterning process, portions of the second material of the hard mask are etched, the second patterning process being selective to etch the second material over the first material. The first and second patterning processes forming a desired pattern in the hard mask which is then transferred to the underlying layer.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: December 9, 2014
    Assignee: Olambda, Inc.
    Inventor: Haiqing Wei
  • Patent number: 8883645
    Abstract: Methods for fabrication of nanopillar field effect transistors are described. These transistors can have high height-to-width aspect ratios and be CMOS compatible. Silicon nitride may be used as a masking material. These transistors have a variety of applications, for example they can be used for molecular sensing if the nanopillar has a functionalized layer contacted to the gate electrode. The functional layer can bind molecules, causing an electrical signal in the transistor.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: November 11, 2014
    Assignee: California Institute of Technology
    Inventors: Chieh-Feng Chang, Aditya Rajagopal, Axel Scherer
  • Patent number: 8877077
    Abstract: A method of printing comprises the steps of: providing a solid state material having an exposed surface; applying an auxiliary layer to the exposed surface to form a composite structure, the auxiliary layer having a stress pattern; subjecting the composite structure to conditions facilitating fracture of the solid state material along a plane at a depth therein; and removing the auxiliary layer and, therewith, a layer of the solid state material terminating at the fracture depth, wherein an exposed surface of the removed layer of solid state material has a surface topology corresponding to the stress pattern.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: November 4, 2014
    Assignee: Siltectra GmbH
    Inventor: Lukas Lichtensteiger
  • Patent number: 8871106
    Abstract: This present invention provides a masking method for locally treating surface of a workpiece by masking the workpiece. The workpiece has a targeting treatment area and a non-targeting treatment area. The masking method includes: covering a fixture on the non-targeting treatment area of the workpiece to expose the targeting treatment area of the workpiece; by using an adsorbing force existing between the fixture and the workpiece, getting the fixture to closely contact with the non-targeting treatment area of the workpiece and to make an end edge of the fixture correspond to the edge of the targeting treatment area of the workpiece, wherein the adsorbing force is a vacuum adsorbing force or a static electric adsorbing force. Thereby the surface treatment only effects in an area within the range of the targeting treatment area of the workpiece so as to reduce the treatment defect.
    Type: Grant
    Filed: October 23, 2012
    Date of Patent: October 28, 2014
    Assignee: Apone Technology Ltd.
    Inventor: Wei-Lin Liu
  • Patent number: 8846537
    Abstract: A mold having an open interior volume is used to define patterns. The mold has a ceiling, floor and sidewalls that define the interior volume and inhibit deposition. One end of the mold is open and an opposite end has a sidewall that acts as a seed sidewall. A first material is deposited on the seed sidewall. A second material is deposited on the deposited first material. The deposition of the first and second materials is alternated, thereby forming alternating rows of the first and second materials in the interior volume. The mold and seed layer are subsequently selectively removed. In addition, one of the first or second materials is selectively removed, thereby forming a pattern including free-standing rows of the remaining material. The free-standing rows can be utilized as structures in a final product, e.g., an integrated circuit, or can be used as hard mask structures to pattern an underlying substrate. The mold and rows of material can be formed on multiple levels.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: September 30, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Gurtej S. Sandhu
  • Patent number: 8806751
    Abstract: A method of manufacturing a printhead includes providing a substrate and a filter membrane structure. A first portion of the substrate defines a plurality of nozzles and a second portion of the substrate defines a plurality of liquid chambers. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a respective one of the plurality of nozzles. The filter membrane structure is adhered, for example, laminated, to the second portion of the substrate. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a distinct portion of the filter membrane structure. Pores are formed in the filter membrane structure using a photo-lithography process.
    Type: Grant
    Filed: April 27, 2010
    Date of Patent: August 19, 2014
    Assignee: Eastman Kodak Company
    Inventors: Yonglin Xie, John A. Lebens, Charles F. Faisst
  • Patent number: 8778196
    Abstract: Capsules and similar objects are made from materials having diamond (sp3) lattice structures, including diamond materials in synthetic crystalline, polycrystalline (ordered or disordered), nanocrystalline and amorphous forms. The capsules generally include a hollow shell made of a diamond material that defines an interior region that may be empty or that may contain a fluid or solid material. Some of the capsules include access ports that can be used to fill the capsule with a fluid. Capsules and similar structures can be manufactured by growing diamond on suitably shaped substrates. In some of these methods, diamond shell sections are grown on substrates, then joined together. In other methods, a nearly complete diamond shell is grown around a form substrate, and the substrate can be removed through a relatively small opening in the shell.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: July 15, 2014
    Assignee: Sunshell LLC
    Inventor: Victor B. Kley
  • Patent number: 8771529
    Abstract: A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: July 8, 2014
    Assignee: Seagate Technology LLC
    Inventors: Kim Yang Lee, Bing Yen, David Kuo, Koichi Wago, Shih-Fu Lee, Dieter Weller
  • Patent number: 8764996
    Abstract: A method of patterning a first material on a polymeric substrate is described. The method includes providing a polymeric film substrate having a major surface with a relief pattern including a recessed region and an adjacent raised region, depositing a first material onto the major surface of the polymeric film substrate to form a coated polymeric film substrate, forming a layer of a functionalizing material selectively on the raised region of the coated polymeric film substrate to form a functionalized raised region and an unfunctionalized recessed region, and etching the first material from the polymeric substrate selectively from the unfunctionalized recessed region.
    Type: Grant
    Filed: October 18, 2006
    Date of Patent: July 1, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Matthew H. Frey, Khanh P. Nguyen
  • Patent number: 8753526
    Abstract: The present application relates to a porous thin film having holes, wherein the holes are formed in the top part and/or the bottom part of the thin film and the holes are linked to the pores of the thin film; and the present invention also relates to a production method for a porous thin film having holes, comprising the use of a particle alignment layer as a mold.
    Type: Grant
    Filed: August 9, 2011
    Date of Patent: June 17, 2014
    Assignee: Industry-University Cooperation Foundation Sogang University
    Inventors: Kyung Byung Yoon, Hyun Sung Kim, Myunpyo Hong, Na Pi Ha
  • Patent number: 8728584
    Abstract: The invention provides a method for patterning a polymer surface. A polymer layer is formed on a substrate. A conductive grid with a mesh pattern is placed on the polymer layer. The mesh pattern is transferred to the polymer layer by a plasma treatment. The conductive grid is then removed.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: May 20, 2014
    Assignee: National Sun Yat-Sen University
    Inventor: Shu-Chen Hsieh
  • Patent number: 8704106
    Abstract: A method of manufacturing an electronic component includes forming a resin layer over an underlying layer, pressing a conductor plate including a pattern formed on one major surface thereof against the resin layer, and embedding the pattern in the resin layer, and performing polishing, Chemical Mechanical Polishing, or cutting by the use of a diamond bit on another major surface of the conductor plate until the resin layer appears, and leaving the pattern in the resin layer as a conductor pattern.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: April 22, 2014
    Assignee: Fujitsu Limited
    Inventors: Masataka Mizukoshi, Yoshikatsu Ishizuki
  • Patent number: 8696919
    Abstract: A method for manufacturing a nozzle and an associated funnel in a single plate comprises providing the single plate, the plate being etchable; providing an etch resistant mask on the plate, the mask having a pattern, wherein the pattern comprises a first pattern part for etching the nozzle and a second pattern part for etching the funnel; covering one of the first pattern part and the second pattern part using a first cover; etching one of the nozzle and funnel corresponding to the pattern part not covered in step (c); removing the first cover; etching the other one of the nozzle and funnel; and removing the etch resistant mask.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: April 15, 2014
    Assignee: Oce-Technologies B.V.
    Inventors: René J. Van Der Meer, Hubertus M. J. M. Boesten, Maarten J. Bakker, David D. L. Wijngaards
  • Patent number: 8685862
    Abstract: A micropattern is joined to a substrate (W1) by: a first group of covering step and micropattern forming step by etching in a transfer step; and a second group of covering step and micropattern forming step by etching in the transfer step.
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: April 1, 2014
    Assignee: Toshiba Kikai Kabushiki Kaisha
    Inventors: Hiroshi Goto, Hiroshi Okuyama, Mitsunori Kokubo, Kentaro Ishibashi
  • Patent number: 8663895
    Abstract: According to one embodiment, a method for manufacturing a template for imprinting includes preparing a first template having a device pattern and a plurality of identification patterns, and forming a second template by transferring the device pattern and at lest desired one of the identification patterns to a template substrate.
    Type: Grant
    Filed: September 16, 2010
    Date of Patent: March 4, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshihito Kobayashi
  • Publication number: 20140034607
    Abstract: An implanted parylene tube shunt relieves intra-ocular pressure. The device is implanted with an open end in the anterior chamber of the eye, allowing excess fluid to be drained through the tube out of the eye. In one embodiment, only a first end of the tube implanted into the anterior chamber of the eye is open. Intra-ocular pressure (IOP) is then monitored, for example utilizing an implanted sensor. When IOP exceeds a critical valve, a practitioner intervenes, puncturing with a laser a thinned region of the tube lying outside the eye, thereby initiating drainage of fluid and relieving pressure. In accordance with alternative embodiments, the both ends of the tube are open, and the tube includes a one-way valve configured to permit drainage where IOP exceeds the critical value. The tube may include projecting barbs to anchor the tube in the eye without the need for sutures.
    Type: Application
    Filed: June 19, 2013
    Publication date: February 6, 2014
    Inventors: Ellis Fan-chuin Meng, Po-Jui Chen, Damien C. Rodger, Yu-Chong Tai, Mark S. Humayun
  • Patent number: 8608972
    Abstract: The present invention is directed to methods for patterning surfaces using contact printing and pastes, and products formed therefrom.
    Type: Grant
    Filed: June 11, 2009
    Date of Patent: December 17, 2013
    Assignees: Nano Terra Inc., Merck Patent GmbH
    Inventors: Brian T. Mayers, Jeffrey Carbeck, Wajeeh Saadi, George M. Whitesides, Ralf Kügler, Monika Kursawe, Johannes Canisius
  • Patent number: 8612044
    Abstract: A program analyzing unit that extracts electrode numbers included in a plurality of processing programs, determines duplication of the electrode numbers among the processing programs to display a result of determination, and that stores correspondence between a revision electrode number that is specified by a user and an in-use electrode number that is used in the processing program for each of the processing programs and a program executing unit that executes each of the processing programs by reading the revision electrode number instead of the in-use electrode number used in each of the processing programs based on the stored correspondence at the time of execution of the processing programs are included, and duplication of the electrode numbers used among the programs is easily and certainly resolved.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: December 17, 2013
    Assignee: Mitsubishi Electric Corporation
    Inventors: Yasuhiro Kawai, Shingo Chida
  • Publication number: 20130319973
    Abstract: The present invention provides methods of selectively removing one or more graphene layers from a graphene material by: (1) applying a metal to a surface of the graphene material; and (2) applying a hydrogen containing solution to the surface of the graphene material that is associated with the metal. The hydrogen containing solution dissolves the metal along with one or more layers of graphene associated with the metal, thereby removing the layer(s) of graphene from the graphene material. In some embodiments, the hydrogen containing solution is an acidic solution, such as hydrochloric acid. In some embodiments, the metal is zinc. In some embodiments, the methods of the present invention are utilized to selectively remove one or more layers of graphene from one or more targeted sites on the surface of a graphene material.
    Type: Application
    Filed: October 11, 2011
    Publication date: December 5, 2013
    Applicant: William Marsh Rice University
    Inventors: James M. Tour, Ayrat M. Dimiev, Dmitry V. Kosynkin
  • Patent number: 8585912
    Abstract: A batch vapor deposition process for applying adhesion promoter during manufacturing of nanoimprinted discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media are disclosed. The adhesion promoter is simultaneously coated on both sides of numerous disk substrates, and minimal solution is wasted. In another step, the lubricant is applied at a uniform thickness that is on the order of a single molecular layer. The lubricant is also applied on the entire disk surfaces while processing multiple disks at a time. Batch processing increases throughput, and vapor lubricant reduces costs compared to conventional techniques. Limited air exposure controls bonding and monolayer adsorption guarantees uniformity.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: November 19, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Xing-Cai Guo, Robert Waltman, Tsai-Wei Wu
  • Publication number: 20130273337
    Abstract: A method of micropatterning a substrate is provided. The method comprises providing a template substrate having a patterned surface inked with a composition of interest; contacting the patterned surface with an intermediate substrate, thereby transferring the composition to the surface of the intermediate substrate; contacting the surface of the intermediate substrate comprising the composition with the substrate; and removing the intermediate substrate by dissolution using a solvent. A patterned substrate formed using the method, as well as a biosensor comprising the patterned substrate is also provided.
    Type: Application
    Filed: October 25, 2011
    Publication date: October 17, 2013
    Applicant: NANYANG TECHNOLOGICAL UNIVERSITY
    Inventors: Haiyang Yu, Lay Poh Tan
  • Patent number: 8557130
    Abstract: In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: October 15, 2013
    Assignee: Samsumg Electronics Co., Ltd.
    Inventors: Young Tae Cho, Suk Won Lee, Sin Kwon, Jung Woo Seo, Jeong Gil Kim
  • Patent number: 8551353
    Abstract: Provided are a shape of a hierarchical structure, an engineering effect of the hierarchical structure according to the shape, an increasing method of the engineering effect, an application method of the hierarchical structure for novel material or parts, and a mass-manufacturing method of the hierarchical structure. The present invention relates to a hierarchical structure and a manufacturing method thereof, and includes a hierarchical structure in which at least one nano-object that has a characteristic length of a nanoscale region in an internal matrix is arranged in a predetermined pattern. According to the exemplary embodiments of the present invention, an excellent characteristic that is generated in a nanoscale region may be used in a structure of a macroscopic scale region, and structures that have different scales may be simply interconnected or interfaced regardless of the different scales.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: October 8, 2013
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Jae-Hyun Kim, Hak-Joo Lee, Seung-Min Hyun, Hyun-Ju Choi, Byung-Ik Choi, Ki-Don Kim, Dae-Guen Choi
  • Patent number: 8545709
    Abstract: Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: October 1, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Cynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael N. Miller, Sidlgata V. Sreenivasan, David James Lentz, Frank Y. Xu
  • Patent number: 8540889
    Abstract: The present invention relates to methods of generating liquidphobic surfaces, and surfaces prepared by these methods. The methods include generating sub-micron-structured surfaces and coating these surfaces with a liquidphobic coating, such as a hydrophobic coating.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: September 24, 2013
    Assignee: Nanosys, Inc.
    Inventors: Jason Hartlove, Ronald Barr, Robert S. Dubrow
  • Patent number: 8529778
    Abstract: Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: September 10, 2013
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Dwayne L. LaBrake
  • Patent number: 8465655
    Abstract: A fabrication method for forming polymer nanopillars using an anodic aluminum oxide (AAO) membrane and an imprint process. A substrate is cleaned and a water soluble tape is applied to the substrate to define a coating area. The substrate is spin-coated with a polymer solution and an AAO membrane is placed on top of the coated area on the substrate and turned over whereby a silicon wafer is attached onto the AAO membrane forming an AAO membrane assembly, which is pressed in an imprintor. Then, the AAO membrane assembly is removed from the imprintor, it is disassembled, and the AAO membrane is dissolved in a NaOH solution forming a polymer substrate with nanopillars.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: June 18, 2013
    Assignee: University of Massachusetts
    Inventors: Hongwei Sun, Sai Liu
  • Publication number: 20130089874
    Abstract: The present invention provides a variety of microfluidic devices and methods for conducting assays and syntheses. The devices include a solid substrate layer having a surface that is capable of attaching ligand and or anti-ligand, and an elastomeric layer attached to said surface. Preferred embodiments have deflectable membrane valves and pumps, for example, rotary pumps associated therewith.
    Type: Application
    Filed: March 29, 2012
    Publication date: April 11, 2013
    Applicant: Fluidigm Corporation
    Inventors: Ian David Manger, Joseph W. Barco, Hany Ramez Nassef
  • Patent number: 8415000
    Abstract: Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
    Type: Grant
    Filed: October 28, 2011
    Date of Patent: April 9, 2013
    Assignee: Inpria Corporation
    Inventors: Jason K. Stowers, Alan J. Telecky, Douglas A. Keszler, Andrew Grenville
  • Patent number: 8409450
    Abstract: An embodiment of a method of suspending a graphene membrane across a gap in a support structure includes attaching graphene to a substrate. A pre-fabricated support structure having the gap is attached to the graphene. The graphene and the pre-fabricated support structure are then separated from the substrate which leaves the graphene membrane suspended across the gap in the pre-fabricated support structure. An embodiment of a method of depositing material includes placing a support structure having a graphene membrane suspended across a gap under vacuum. A precursor is adsorbed to a surface of the graphene membrane. A portion of the graphene membrane is exposed to a focused electron beam which deposits a material from the precursor onto the graphene membrane. An embodiment of a graphene-based structure includes a support structure having a gap, a graphene membrane suspended across the gap, and a material deposited in a pattern on the graphene membrane.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: April 2, 2013
    Assignee: The Regents of the University of California
    Inventors: Alexander K. Zettl, Jannik Christian Meyer
  • Publication number: 20130075361
    Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
    Type: Application
    Filed: June 20, 2012
    Publication date: March 28, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshiaki KAWAMONZEN, Yasuaki OOTERA, Akiko YUZAWA, Naoko KIHARA, Yoshiyuki KAMATA, Hiroyuki HIEDA, Norikatsu SASAO, Ryosuke YAMAMOTO, Takeshi OKINO, Tomoyuki MAEDA, Takuya SHIMADA
  • Publication number: 20130075365
    Abstract: A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support.
    Type: Application
    Filed: May 19, 2011
    Publication date: March 28, 2013
    Applicant: Commissariat a l'energie atomique et aux energies alternatives
    Inventors: Frank Fournel, Laurent Bally, Marc Zussy, Dominique Jourde
  • Patent number: 8404600
    Abstract: A mold having an open interior volume is used to define patterns. The mold has a ceiling, floor and sidewalls that define the interior volume and inhibit deposition. One end of the mold is open and an opposite end has a sidewall that acts as a seed sidewall. A first material is deposited on the seed sidewall. A second material is deposited on the deposited first material. The deposition of the first and second materials is alternated, thereby forming alternating rows of the first and second materials in the interior volume. The mold and seed layer are subsequently selectively removed. In addition, one of the first or second materials is selectively removed, thereby forming a pattern including free-standing rows of the remaining material. The free-standing rows can be utilized as structures in a final product, e.g., an integrated circuit, or can be used as hard mask structures to pattern an underlying substrate. The mold and rows of material can be formed on multiple levels.
    Type: Grant
    Filed: June 17, 2008
    Date of Patent: March 26, 2013
    Assignee: Micron Technology, Inc.
    Inventor: Gurtej Sandhu
  • Patent number: 8382998
    Abstract: A process of manufacturing a three-dimensional relief on a metal surface includes steps of preparing a water transfer label, transferring, roasting, electro-plating and removing. An anti-corrosion pattern ink layer of the water transfer label is first transferred onto a metal surface and then roasted and dried with high temperature for covering a part of the metal, which will not be etched by electro-plating, but the other part of the metal not covered by the pattern ink layer will be etched and colored. Thus, after the pattern ink layer is removed, the part of the metal covered by the pattern ink layer will present a bulgy state and possess original color that is different from the color of the other part of the metal not covered by the pattern ink layer, attaining a three-dimensional visual esthetic sense.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: February 26, 2013
    Inventor: Kuo-Tasi Wang
  • Patent number: 8323520
    Abstract: According to a first aspect of the invention, a method for manufacturing a concave-convex pattern includes the steps of heating a sheet-like member, compressively bonding the sheet-like member, removing the sheet-like member after the compressively bonding, and transferring a pattern shape of a reverse concave-convex pattern layer to a surface of the substrate. The sheet-like member has a concave-convex pattern block on at least one of surfaces thereof, and is given flowability thereto by heating. The reverse concave-convex pattern layer is formed on the one of the surfaces, and continues over two or more concaves of the concave-convex pattern block so that the reverse concave-convex pattern layer meshes at least partially with the concave-convex pattern block. At least the reverse concave-convex pattern layer is left on the substrate. Here, the one of the surfaces has the concave-convex pattern block.
    Type: Grant
    Filed: February 24, 2010
    Date of Patent: December 4, 2012
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Toshiro Hiraoka