Condition Responsive Patents (Class 219/121.32)
  • Patent number: 9336987
    Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.
    Type: Grant
    Filed: October 28, 2014
    Date of Patent: May 10, 2016
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Shota Torikawa, Tatsuya Asahata, Makoto Sato, Atsushi Uemoto