Methods Including Separation Or Nonradiant Treatment Of Test Materials Patents (Class 250/304)
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Patent number: 7482626Abstract: A triplet light emitting device which has high efficiency and improved stability and which can be fabricated by a simpler process is provided by simplifying the device structure and avoiding use of an unstable material. In a multilayer device structure using no hole blocking layer conventionally used in a triplet light emitting device, that is, a device structure in which on a substrate, there are formed an anode, a hole transporting layer constituted by a hole transporting material, an electron transporting and light emitting layer constituted by an electron transporting material and a dopant capable of triplet light emission, and a cathode, which are laminated in the stated order, the combination of the hole transporting material and the electron transporting material and the combination of the electron transporting material and the dopant material are optimized.Type: GrantFiled: October 29, 2007Date of Patent: January 27, 2009Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Hiroko Yamazaki, Atsushi Tokuda, Tetsuo Tsutsui
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Patent number: 7482586Abstract: In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation in focus, are corrected, the deviations occurring when a processed cross section moves in the depth direction thereof; information on a height and a tilt of a surface of cross section processing area is calculated before the processing, the above information is used, the deviation in a field of view and the deviation in focus in SEM observation, which correspond to an amount of movement of the cross section at a time of the processing, are predicted, and the SEM is controlled based on the predicted values.Type: GrantFiled: July 7, 2006Date of Patent: January 27, 2009Assignee: Hitachi High-Technologies CorporationInventors: Tohru Ishitani, Uki Kabasawa, Tsuyoshi Ohnishi
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Patent number: 7473575Abstract: A triplet light emitting device which has high efficiency and improved stability and which can be fabricated by a simpler process is provided by simplifying the device structure and avoiding use of an unstable material. In a multilayer device structure using no hole blocking layer conventionally used in a triplet light emitting device, that is, a device structure in which on a substrate, there are formed an anode, a hole transporting layer constituted by a hole transporting material, an electron transporting and light emitting layer constituted by an electron transporting material and a dopant capable of triplet light emission, and a cathode, which are laminated in the stated order, the combination of the hole transporting material and the electron transporting material and the combination of the electron transporting material and the dopant material are optimized.Type: GrantFiled: December 16, 2003Date of Patent: January 6, 2009Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Hiroko Yamazaki, Atsushi Tokuda, Tetsuo Tsutsui
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Patent number: 7453073Abstract: Method and equipment permitting one to easily prepare a good thin-film specimen adapted for observation are offered. The equipment has an ion gun tilted left and right repeatedly to etch a specimen material by an electron beam tilted left and right by 1.5° about the z-axis. Then, the ion gun is tilted left and right plural times to ion etch the specimen material. Since a portion of the specimen material is especially heavily etched, a through-hole is formed in the specimen material. A thin film having a thickness of about 100 ? is formed around the through-hole. This thickness is adapted for TEM (transmission electron microscope) observation.Type: GrantFiled: September 28, 2005Date of Patent: November 18, 2008Assignee: Jeol Ltd.Inventor: Tadanori Yoshioka
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Patent number: 7442924Abstract: A method of sample extraction entails making multiple, overlapping cuts using a beam, such as a focused ion beam, to create a trench around a sample, and then undercutting the sample to free it. Because the sidewalls of the cut are not vertical, the overlapping cuts impinge on the sloping sidewalls formed by previous cuts. The high angle of incidence provides a greatly enhanced mill rate, so that making multiple overlapping cuts to produce a wide trench can requires less time than making a single, deep cut around the perimeter of a sample.Type: GrantFiled: February 9, 2006Date of Patent: October 28, 2008Assignee: FEI, CompanyInventors: Lucille A. Giannuzzi, Paul Anzalone, Richard Young, Daniel W. Phifer, Jr.
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Patent number: 7432501Abstract: An ionising particle analyser comprises a source of ionising particles, a charged particle detector, and an ionisable gas located between the source and the detector. The analyser further comprises a charged particle impeding device located between the source and the detector. The charged particle impeding device is arranged to be maintained in a first configuration at a potential to impede the passage of charged particles and pass uncharged particles.Type: GrantFiled: August 27, 2004Date of Patent: October 7, 2008Assignee: Council for the Central Laboratory of the Research CouncilsInventors: James Edmond Bateman, Gareth Derbyshire
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Patent number: 7427753Abstract: A method of milling a cross section of a wafer and a milling device. The method includes a coarse scanning of at least two milling frames and a fine scanning of at least one milling frame. The milling device is adapted to cross-section milling of a wafer, said milling includes a coarse scanning of at least two milling frames and a fine scanning of at least one milling frame.Type: GrantFiled: June 16, 2005Date of Patent: September 23, 2008Assignee: Applied Materials, Israel, Ltd.Inventor: Asher Pearl
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Patent number: 7423263Abstract: A method and apparatus is described for orienting samples for charged particle beam operations. A sample is attached to a probe with a major surface of the sample at a non-normal angle to the probe shaft, and the probe shaft is rotated to reorient the sample. The invention is particularly useful for preparing planar view TEM samples. The invention allows for a sample to be mounted to a TEM grid and thinning by an ion beam without removing the grid from the vacuum chamber for reorienting. In one embodiment, a probe oriented at an angle, such as 45 degrees, to the sample stage has a probe tip with a flat area oriented parallel at 45 degrees to the probe axis, that is, the flat area is parallel to the sample stage. The flat area of the probe tip is attached to the sample, and when the probe is rotated 180 degrees, the orientation of the sample changes by 90 degrees, from horizontal to vertical. The sample can then be attached to a vertically oriented TEM grid on a sample stage.Type: GrantFiled: June 23, 2006Date of Patent: September 9, 2008Assignee: FEI CompanyInventors: Liang Hong, Craig Henry, Jay Jordan, Young-Chung Wang
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Patent number: 7423261Abstract: An ion sampling apparatus for use in a mass spectrometry system. The ion sampling apparatus includes a target support for receiving a sample, an irradiation source for emitting energetic radiation or particles toward the target support, and a conduit having a curved end and a longitudinal axis, the curved end having an inlet with a central axis, the conduit being adjacent to the target support. The longitudinal axis of the conduit and the central axis of the inlet intersect to define an angle that is between about 20 degrees and about 210 degrees.Type: GrantFiled: April 5, 2006Date of Patent: September 9, 2008Assignee: Agilent Technologies, Inc.Inventors: Jean-Luc Truche, Paul C. Goodley, Steven M. Fischer, Jian Bal
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Patent number: 7394075Abstract: In one embodiment, a sample of an integrated circuit device is prepared for observation in a transmission electron microscope (TEM). The sample may be placed on a surface formed by vertical edges of several TEM grids. The sample may be affixed to a vertical edge of one of the TEM grids. The TEM grid supporting the sample may be separated from the other TEM grids, and then placed in the TEM so that the sample may be observed.Type: GrantFiled: February 9, 2006Date of Patent: July 1, 2008Assignee: Cypress Semiconductor CorporationInventor: Naiyi Wang
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Publication number: 20080054179Abstract: A method of fabricating sample lamella for transmission electron microscopy (TEM) analysis is provided. A waiting-examination sample having an analysis target on the top surface of that is offered, and at least a mark around the analysis target is defined. A covering layer is covered on the top surface of waiting-examination sample. A holder is attached on the covering layer. A backside polishing process is performed to remove a portion of the waiting-examination sample until the mark is visible under the optical microscopy from the bottom surface of waiting-examination sample. An in-situ lift-out step is performed to pick up a thin membrane containing the analysis target and serve as the sample for TEM analysis.Type: ApplicationFiled: November 3, 2006Publication date: March 6, 2008Applicant: INOTERA MEMORIES, INC.Inventors: Jian-Shing Luo, Lang-Yu Huang
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Publication number: 20070272854Abstract: Methods of extracting a TEM sample from a substrate include milling a hole on the sample and inserting a probe into the hole. The sample adheres to the probe, and can be processed on transferred while on the probe. In another embodiment, the sample is freed from a substrate and adheres to a probe by electrostatic attraction. The sample is placed onto a TEM sample holder in a vacuum chamber.Type: ApplicationFiled: May 25, 2006Publication date: November 29, 2007Inventors: Enrique Agorio, Michael Tanguay, Christophe Roudin, Liang Hong, Jay Jordan, Craig Henry, Mark Darus
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Patent number: 7297944Abstract: An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle ? to the normal L with respect to the cross section (4).Type: GrantFiled: July 9, 2003Date of Patent: November 20, 2007Assignee: SII NanoTechnology Inc.Inventors: Toshio Kodama, Masakatsu Hasuda, Toshiaki Fuji, Kouji Iwasaki, Yasuhiko Sugiyama, Yasuyuki Takagi
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Patent number: 7291837Abstract: The invention provides a method and apparatus for preparing samples of carbon dioxide with a 14C content for analysis in liquid scintillation counting equipment, the sample being of a known mass and being introduced into and substantially wholly absorbed into an absorption “cocktail”, absorption being completed at a stage before saturation of the absorbent occurs. The absorbent is contained in a vial which, when absorption has been completed, is transferred into the scintillation counting equipment without intermediate transfer of the contents.Type: GrantFiled: August 23, 2004Date of Patent: November 6, 2007Inventor: Balthazar T. Verhagen
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Patent number: 7196338Abstract: In accordance with the invention, there is a method of fabricating a material for transmission electron microscopy comprising removing a first portion from a material having a thickness of (d1) to form a thinned material having a thickness of (d2), contacting the thinned material to a sacrificial layer having a thickness of (s1), and removing a second portion from the thinned material so the thinned material has a thickness of (d3), wherein (d3)<(d2).Type: GrantFiled: March 31, 2005Date of Patent: March 27, 2007Assignee: Texas Instruments IncorporatedInventor: Nathan V. Holloway
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Patent number: 7189968Abstract: A sample measurement method is a sample measurement method by an electron microscope and includes the film formation step of forming a sample on a projection on the major surface of a substrate, the electron beam irradiation step of irradiating the sample with an electron beam from a side of the projection, and the measurement step of detecting an electron beam which is generated or reflected from or has passed through the sample irradiated with the electron beam. Since the sample is formed on the projection on the major surface of the substrate, the sample on the projection can be formed as a thin film. For this reason, sample measurement can be executed only by irradiating the sample from a side of the projection.Type: GrantFiled: August 27, 2004Date of Patent: March 13, 2007Assignee: TDK CorporationInventors: Yoshitomo Tanaka, Masaki Takahashi, Tomoyuki Oike
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Patent number: 7180061Abstract: A method for preparing a specimen for application of microanalysis thereto includes forming an initial conductive layer over a defined area of interest on a semiconductor substrate, the initial conductive layer formed through an electron beam deposition process. A volume of substrate material surrounding the area of interest is removed, thereby forming the specimen, including said area of interest and said initial conductive layer over the area of interest. The specimen is then removed from the bulk substrate material.Type: GrantFiled: September 29, 2004Date of Patent: February 20, 2007Assignee: International Business Machines CorporationInventor: Wei Lu
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Patent number: 7112790Abstract: A method for preparing a transmission electron microscopy (TEM) sample is provided which includes removing a portion of a substrate using a focused ion beam tool and securing the removed portion to a support structure to form a grafted structure. The method further includes forming an opening within the support structure to expose an underside of the removed portion and thinning the exposed underside using an ion beam miller tool. In some cases, the step of securing the removed portion to the support structure may include placing the substrate specimen upon a film attached to a mesh grid, positioning the mesh grid upon a framework comprising the support structure such that the substrate specimen is above the support structure, and pushing the substrate specimen through the film onto the support structure. A TEM sample resulting from such methods is also provided.Type: GrantFiled: July 23, 2004Date of Patent: September 26, 2006Assignee: Cypress Semiconductor Corp.Inventor: Naiyi Wang
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Patent number: 7038218Abstract: A method of manufacturing a transmission electron microscope inspection sample. The sample is mounted into a recess in the mount and the sample is grinded to a preset target thickness. A recess for mounting the sample and a groove for separating the sample from the recess are formed on a top surface of the mount. The sample is fixed into the recess using mounting wax. The protruding portion of the sample protrudes above the mount and is grinded by the grinder. The depth of the recess is based on the target thickness of the sample. The protruding portion of the sample is grinded to the top surface of the mount.Type: GrantFiled: October 28, 2004Date of Patent: May 2, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Myoung-Rack Lee, Sun-Young Lee
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Patent number: 7034299Abstract: It is possible to reliably and efficiently determine whether a specimen contains viruses, bacteria, etc. and, if it does, identify their types, regardless of the observer. Furthermore, even a newly-discovered bacterium can be quickly identified by utilizing a database at a remote location. A transmission microscope system has a microscope for observing a specimen and a database which stores, for each microscopic thing (such as a virus), a name, a specimen pretreatment method and an imaging condition used when the microscopic thing is observed, captured image data, etc. An image of the specimen is captured according to a specimen pretreatment method and an imaging condition retrieved from the database using the name of a target microscopic thing as a key, and the captured image is compared with images stored in the database to identify microscopic things present in the specimen.Type: GrantFiled: August 16, 2004Date of Patent: April 25, 2006Assignee: Hitachi High-Technologies CorporationInventors: Ryo Nakagaki, Yuji Takagi, Hirohito Okuda, Hiroshi Kakibayashi
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Patent number: 7005636Abstract: In the semiconductor industry, microscopic samples are cut out of substrates for purposes of analysis. In the case of a known method, a sample to be cut loose out of a substrate is attached to a sample carrier connected to a manipulator and the sample is cut loose from the substrate. Subsequently, the sample is fixed to a TEM grid and completely separated from the sample carrier. According to the invention, the sample carrier 3 is left in connection with the sample 1 and the sample carrier 3 is separated from the manipulator 4. By making the sample carrier 3 connected to the sample 1 much bigger than the (microscopic) sample 1, and by manipulating the sample carrier 3, manipulation—with the aid of a (macroscopic) manipulator—of the microscopic sample 1 attached thereto becomes easier than manipulating the sample 1 without the sample carrier 3 attached thereto. In addition, a mechanical coupling between manipulator 4 and sample carrier 3 is shown, which enables a great degree of automation.Type: GrantFiled: June 8, 2004Date of Patent: February 28, 2006Assignee: FEI CompanyInventor: Hendrik Gezinus Tappel
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Patent number: 6924481Abstract: Automatic pattern matching and shape measurement are enabled by adjusting a brightness level of a microscope image based on information of a local region of the image so that a magnified image of the local region takes on an appropriate brightness and is not affected by brighter peripheral portions of the image, thereby enabling feature extraction of a desired pattern. By using the inventive method in an energized beam apparatus having a sample stage capable of linear and tilting movement, a series of operations including cross section forming, sample tilting, cross section observation, and pattern recognition, may be performed on an automated basis.Type: GrantFiled: May 30, 2002Date of Patent: August 2, 2005Assignee: SII NanoTechnology Inc.Inventors: Yutaka Ikku, Tetsuji Nishimura
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Patent number: 6867413Abstract: A high-flow rate, low-noise, gas sampling apparatus for collecting particulate such as biological, chemical, and radioactive material from a gas on a collector such as an impaction collector includes a housing having an inlet and an outlet and a fan disposed within the housing for drawing the gas into the inlet, past the collector for sampling, and exhausting the gas through the outlet. The fan is operable to produce a flow of gas through the housing of greater than about 50 liters per minute with a noise level emitted from the apparatus being less than about 60 decibels. The apparatus may be configured as a compact, unobtrusive, portable, lightweight apparatus for use in various indoor or outdoor locations. The apparatus may also include a sensor for the detection of radioactive material collected on the collector, a processor for monitoring the sampling, and the apparatus may be linked to a communications network such as the Internet. Methods for collecting particulate from a gas are also enclosed.Type: GrantFiled: June 21, 2002Date of Patent: March 15, 2005Inventors: Lauren R. Basch, William E. Rogers, Harvey Patashnick
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Patent number: 6847033Abstract: The invention describes a method and a device for the continual and, in particular, for a fast detection of changes of the concentration of radon gas dissolved in water by means of a transfer into a measuring gas (Rn-222), which can be adopted for a variety of monitoring, control and regulation assignments. The invention is based on the fact that a membrane, which is permeable for the radioactive noble gas radon but extensively non-permeable for water, is circum-flushed on the one side of radon-containing water and on the other side of the carrier gas with, in each case, optimised flow velocities either in parallel or in counter-flow When stable peripheral conditions are ensured, the concentration of radon in the measuring gas is directly proportional to the concentration of radon in the water.Type: GrantFiled: March 7, 2001Date of Patent: January 25, 2005Assignee: UFZ Umweltforschungszentrum Leipzing-Halle GmbHInventors: Klaus Freyer, Hanns-Christian Treutler, Günther Just
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Publication number: 20040256555Abstract: Disclosed are a method and system for separating and preparing a sample for analysis from a wafer without contaminating the wafer with an element such as Ga which would raise a problem in the process.Type: ApplicationFiled: June 3, 2004Publication date: December 23, 2004Inventors: Hiroyasu Shichi, Kaoru Umemura, Muneyuki Fukuda
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Publication number: 20040251412Abstract: In the semiconductor industry, microscopic samples are cut out of substrates for purposes of analysis. In the case of a known method, a sample to be cut loose out of a substrate is attached to a sample carrier connected to a manipulator and the sample is cut loose from the substrate. Subsequently, the sample is fixed to a TEM grid and completely separated from the sample carrier.Type: ApplicationFiled: June 8, 2004Publication date: December 16, 2004Applicant: FEI CompanyInventor: Hendrik Gezinus Tappel
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Publication number: 20040251413Abstract: A focused ion beam system comprises a specimen chamber, a FIB column, a SEM stage, a side entry stage, a TEM specimen holder, a micro-sampling manipulator, and a SEM holder exchanger chamber. The SEM stage comprises an x-table, a y-table, a z-table, a rotation table, and a tilt table for moving a specimen. The side entry stage comprises an x-micromotion driver and a yzt-micromotion driver which are disposed in the specimen chamber to oppose each other. The x-micromotion driver is disposed in a hollow area defined in a tilt shaft provided for the tilt table.Type: ApplicationFiled: June 9, 2004Publication date: December 16, 2004Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wataru Suzuki, Eiichi Hazaki
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Patent number: 6826971Abstract: The semiconductor substrate is removed from a wafer or a chip wherein a defect has occurred and, thereby, the surface, which faces the substrate, that contacts the semiconductor substrate in an element formation portion is exposed. A cross section of the element formation portion is exposed through the irradiation of a focused ion beam. Furthermore, a microprober is adhered to the sample and, then, the sample including a foreign substance that is considered to be a cause of defects is detached from the element formation portion. The extracted sample is moved onto a supporting base for analysis and the sample is secured to the supporting base for analysis by forming a tungsten film. Thereby, detailed information can be gained concerning a defective portion that is located, in particular, in the vicinity of the surface of the semiconductor substrate from among defective portions that have occurred in the semiconductor device.Type: GrantFiled: June 24, 2002Date of Patent: December 7, 2004Assignee: Renesas Technology Corp.Inventor: Yukinori Hirose
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Publication number: 20040227082Abstract: The problem of the present invention is to provide a TEM sample equipped with an identifying function for easily specifying a detailed TEM sample and to provide a system for handling the management of information relating to the TEM sample using the TEM when making observations that is constructed with the FIB device manufacturing the sample. The TEM sample of the present invention is written with a mark encoding information specifying the sample at a specified location of a peripheral part. Information relating to the sample filed taking sample specifying information as an index is supplied to a TEM as associated matter. The sample working FIB device and observation TEM device of the present invention are provided with a function enabling writing of information relating to the sample and images to the file during operation which is then read out and utilized on a display.Type: ApplicationFiled: April 20, 2004Publication date: November 18, 2004Inventors: Tatsuya Adachi, Toshiaki Fujii, Masashi Iwatsuki, Mikio Naruse, Mike Hassel Shearer
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Publication number: 20040217286Abstract: An ion beam milling system and method for electron microscopy specimen preparation is provided and is useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys, ceramics, and other inorganic materials. In one embodiment, a system and process are provided for the preparation of specimens for analysis by transmission electron microscopy including a specimen processing chamber, at least two ion beam generators, and a specimen support or holder. An ion beam masking member is secured to a surface of the specimen and the specimen is milled. Preferably, the system also includes the ability to view the progress of the milling operation and may include an imaging device such as a light microscope which permits monitoring of the area of interest on a specimen as the specimen is milled.Type: ApplicationFiled: June 3, 2004Publication date: November 4, 2004Inventor: Reza Alani
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Patent number: 6784427Abstract: TEM samples are cut from a solid state material with length (l) and width (b) and with a front-side sample surface (7) onto which a curable adhesive of the flowable type is applied for fixing a fiber (2) with a diameter (d) aligned on the sample surface (7) in the longitudinal direction of the sample substantially centrally with respect to the width (b), with the adhesive (3) applied substantially over the entire area on the sample surface (7) and the fiber (2) aligning itself upon being placed onto the adhesive (3) and being wetted essentially along its entire length with the adhesive and the latter subsequently being cured. A simple and economical preparation of TEM samples with high quality is thereby made possible.Type: GrantFiled: October 6, 2003Date of Patent: August 31, 2004Assignee: Bal-Tec AGInventors: Wolfgang Grunewald, Alex Vogt
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Publication number: 20040129878Abstract: A micro-sample prepared by processing with an ion beam is extracted by a probe and, in this state, a voltage is applied across the probe and a micro-sample holder by a circuit for sending electric current to probe. Thereafter, a probe driver is moved by a probe position controller to cause a portion of the probe distanced from the tip thereof by about 5 &mgr;m toward the root side thereof to approach an end surface of an ear portion of the micro-sample holder, so that the probe and the micro-sample holder are fixed together at a bonding point by current welding. Then, by cutting a root-side portion, relative to the bonding point, of the probe using an ion beam, fixation of the micro-sample to the micro-sample holder via the tip of the probe is completed.Type: ApplicationFiled: July 16, 2003Publication date: July 8, 2004Inventors: Satoshi Tomimatsu, Muneyuki Fukuda, Hiroyasu Shichi
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Publication number: 20040113072Abstract: A method for applying a sample film to a sample carrier for subsequent spectroscopic analysis is described, comprising providing a quantity of sample in liquid state, providing a sample carrier having at least one sample position, applying the quantity of sample in liquid state on the at least one sample position in a plurality of partial quantities of the quantity of sample in such a manner that the partial quantities on the at least one sample position are not in contact with one another before being dried, drying the quantity of sample to form the sample film.Type: ApplicationFiled: September 30, 2003Publication date: June 17, 2004Applicant: Bruker Optik GmbHInventor: Matthias Boese
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Patent number: 6700121Abstract: Methods of sampling specimens for microanalysis, particularly microanalysis by atom probe microscopy, include steps of forming a study specimen in a first study object (as by use of focused ion beam milling); removing the study specimen from the study object; situating the study specimen on a second study object; and microanalyzing the study specimen. Where the first study object is of particular interest for study, the study specimen may be taken from a functional portion of the first study object so that microanalysis will provide information regarding this functional portion. Where the second study object is of particular interest for study, the second study object may be subjected to manufacturing processes (e.g., deposition of layers of materials) after the study specimen is situated thereon so that the study specimen will provide information regarding the results of the manufacturing process.Type: GrantFiled: May 1, 2003Date of Patent: March 2, 2004Assignee: Imago Scientific InstrumentsInventors: Thomas F. Kelly, Richard L. Martens, Steven L. Goodman
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Publication number: 20040016880Abstract: The method relates to the preparation of a TEM lamella from a structured sample, in particular of a microelectronic device, which has a location to be examined, situated at an unknown position. Firstly, the structural element within which the region to be examined is situated is prelocalized. Afterwards, the TEM lamella is sectioned by means of an ion beam of an FIB apparatus with a thickness such that the entire structural element is contained in the TEM lamella. This method considerably increases the probability that the location to be examined will actually be situated in the TEM lamella, without the sample or lamella having to be transported too often.Type: ApplicationFiled: April 15, 2003Publication date: January 29, 2004Applicant: EMPA Eidg. Materialprufungs- und ForschungsanstaltInventors: Joachim Reiner, Philippe Gasser
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Patent number: 6674072Abstract: A method of preparing a lead sample to determine an amount of alpha particle emission. First, a thin slice is obtained from the lead source, such as by cutting the lead source using a microtome. The thin slice may be rolled to flatten any wrinkles caused by the cutting. The flattened slice is then heated to near the melting point of lead to drive the polonium atoms to the surface of the slice. The slice may be cooled down to ambient temperature in Nitrogen gas. Once so prepared, the thin slice can be tested for an amount of alpha particle emission.Type: GrantFiled: November 15, 2001Date of Patent: January 6, 2004Assignee: University of North DakotaInventors: Glenn I. Lykken, Berislav Momcilovic
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Publication number: 20030183776Abstract: A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.Type: ApplicationFiled: March 25, 2003Publication date: October 2, 2003Inventors: Satoshi Tomimatsu, Kaoru Umemura, Yuichi Madokoro, Yoshimi Kawanami, Yasunori Doi
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Patent number: 6576900Abstract: Methods of sampling specimens for microanalysis, particularly microanalysis by atom probe microscopy, include steps of forming a study specimen in a first study object (as by use of focused ion beam milling); removing the study specimen from the study object; situating the study specimen on a second study object; and microanalyzing the study specimen. Where the first study object is of particular interest for study, the study specimen may be taken from a functional portion of the first study object so that microanalysis will provide information regarding this functional portion. Where the second study object is of particular interest for study, the second study object may be subjected to manufacturing processes (e.g., deposition of layers of materials) after the study specimen is situated thereon so that the study specimen will provide information regarding the results of the manufacturing process.Type: GrantFiled: May 18, 2001Date of Patent: June 10, 2003Assignee: Imago Scientific InstrumentsInventors: Thomas F. Kelly, Richard L. Martens, Steven L. Goodman
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Publication number: 20030094571Abstract: A method of preparing a lead sample to determine an amount of alpha particle emission. First, a thin slice is obtained from the lead source, such as by cutting the lead source using a microtome. The thin slice may be rolled to flatten any wrinkles caused by the cutting. The flattened slice is then heated to near the melting point of lead to drive the polonium atoms to the surface of the slice. The slice may be cooled down to ambient temperature in Nitrogen gas. Once so prepared, the thin slice can be tested for an amount of alpha particle emission.Type: ApplicationFiled: November 15, 2001Publication date: May 22, 2003Applicant: University of North DakotaInventors: Glenn I. Lykken, Berislav Momcilovic
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Patent number: 6495835Abstract: A device for determining, by detection and calculation, nuclide contents of radioactive inert gases. The device includes a measuring chamber (1) which contains the inert gases, a detector (3) which detects gamma radiation emitted from the radioactive inert gases, calculating members (5) which, based on the detected gamma radiation, calculate the content of the different nuclides.Type: GrantFiled: March 14, 2000Date of Patent: December 17, 2002Assignee: ABB Atom ABInventors: Björn Bjurman, Lembit Sihver
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Patent number: 6433335Abstract: A Geiger-Mueller triode directional sensor is provided to detect the direction of incident ionizing gamma radiation, comprising a housing divided into two subchambers, or GM counters, separated by a partition composed of a high Z layer of tungsten, the tungsten partition having an aperture for gas to freely communicate between the subchambers and maintain an identical gas mixture in both subchambers, radiation windows, external layers of a second material in the sidewall and a sensor. Incident gamma rays generate electrons within the tungsten partition, housing and the sidewall based on the photoelectric, Compton and pair effects. The electrons penetrate the radiation windows and are accelerated by an applied electric field in the housing, causing the electrons to ionize the gas within the housing and produce electrical discharges.Type: GrantFiled: October 3, 2000Date of Patent: August 13, 2002Assignee: The United States of America as represented by the Secretary of the ArmyInventors: Stanley Kronenberg, George J. Brucker
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Patent number: 6362474Abstract: Described here is a method of forming a thin-film portion for allowing electrons produced from a transmission electron microscope to pass therethrough at a portion to be observed of a semiconductor and effecting a predetermined etching process on the thin-film portion thereby to create a semiconductor sample for the transmission electron microscope. Prior to the execution of the etching process, grooves for reducing a stress introduced into the thin-film portion by the etching process are defined in the thin-film portion.Type: GrantFiled: August 31, 1999Date of Patent: March 26, 2002Assignee: Oki Electric Industry Co., Ltd.Inventor: Masao Okihara
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Patent number: 6326213Abstract: A fluorescent fiber-optic biosensor system using ultrasonic concentration of particles and cells for the detection of Salmonella typhimurium. A biosensor test chamber serves as an ultrasonic standing-wave cell that allows microspheres or cells to be concentrated in parallel layers or in a column along the axis of the cell. A fiber probe along the axis delivers laser excitation to fluorescent-labeled antibodies of Salmonella and collects the fluorescent signal. The Salmonella-antibody complexes are moved acoustically to the axis of the cell, increasing the fluorescent signal. Alternatively, the Salmonella-labelled antibody complexes attach to unlabeled antibodies that have been immobilized on the surface of polystyrene microspheres. This entire structure can be manipulated acoustically and the increase in the fluorescent signal, which can be an order of magnitude, indicates the presence of Salmonella.Type: GrantFiled: February 9, 1998Date of Patent: December 4, 2001Assignee: The Boards of Govenors for Higher Education, State of Rhode Island and Providence PlantationsInventors: Stephen V. Letcher, A. Garth Rand, Chonghua Zhou
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Patent number: 6124103Abstract: An arrangement for the investigation of hydrophilic macromolecules (1) in an aqueous solution having a solid carrier surface (5) onto which a lipid film (24) is disposed, wherein the molecules (1) to be investigated are bound, by means of a molecular coupling system (20), to the lipid film (24) and thus are immobilized, is characterized in that the molecular coupling system (20) comprises at least two, preferably three molecular or nuclear components (21, 22, 23), which can be coupled to each other, of which a first component (21) is bound to the lipid film (24) and a second component (22) is bound to a hydrophilic macromolecule (1) to be investigated. In this way, it is rendered possible to immobilize and investigate any hydrophilic macromolecules, wherein the coating of the solid carrier surface should be able to be carried out in an as easy as possible and reversible manner.Type: GrantFiled: February 16, 1999Date of Patent: September 26, 2000Assignee: Bruker Analytik GmbHInventor: Matthias Bose
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Patent number: 5990478Abstract: The present invention discloses a method for preparing thin specimens suitable for physical analysis of a semiconductor microstructure by an instrument such as a transmission electron microscope. The method can be practiced by first forming support structures in a low density material medium for shielding a higher density material to be analyzed such that materials having different densities may be removed in a subsequent ion milling process at approximately the same milling rate with the lower density material supporting the higher density material during the ion milling process.Type: GrantFiled: July 10, 1997Date of Patent: November 23, 1999Assignee: Taiwan Semiconductor Manufacturing Co. Ltd.Inventor: Chin-Kai Liu
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Patent number: 5952655Abstract: A method and apparatus are provided to concentrate and detect very low levels of radioactive noble gases from the atmosphere. More specifically the invention provides a method and apparatus to concentrate xenon, krypton and radon in an organic fluid and to detect these gases by the radioactive emissions.Type: GrantFiled: August 1, 1997Date of Patent: September 14, 1999Assignees: The United States of America as represented by the United States Department of Energy, University of CincinnatiInventors: Kenneth C. Gross, John D. Valentine, Francis Markum, Mary Zawadzki, Charles Dickerman
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Patent number: 5932818Abstract: A vapor sample detection method where the vapor sample contains vapor and ambient air and surrounding natural background particles. The vapor sample detection method includes the steps of generating a supply of aerosol that have a particular effective median particle size, mixing the aerosol with the vapor sample forming aerosol and adsorbed vapor suspended in an air stream, impacting the suspended aerosol and adsorbed vapor upon a reflecting element, alternatively directing infrared light to the impacted aerosol and adsorbed vapor, detecting and analyzing the alternatively directed infrared light in essentially real time using a spectrometer and a microcomputer and identifying the vapor sample.Type: GrantFiled: September 30, 1997Date of Patent: August 3, 1999Assignee: The United States of America as represented by the United States Department of EnergyInventors: Vincent J. Novick, Stanley A. Johnson
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Patent number: 5780852Abstract: A feature (24) of a semiconductor device (10) is formed in a photoresist (14). To accurately measure a dimension (26) of the feature (24), portions of the photoresist (14) are removed to provide a reduced thickness (34) of the photoresist (14). The ratio between the reduced thickness (34) and the dimension (26) allows for more accurate dimension measurement of the feature (24) of the semiconductor device (10).Type: GrantFiled: March 26, 1997Date of Patent: July 14, 1998Assignee: Texas Instruments IncorporatedInventor: Jing-Shing Shu
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Patent number: 5619038Abstract: A method and apparatus for determining and adjusting the polymer content of a cellulose/polymer blend prior to use in a paper-making machine. The method for evaluating a desired polymer contained in a cellulose/polymer mixture comprising the steps of acquiring a sample for evaluation from a cellulose/polymer mixture, dewatering the sample, shredding the dewatered sample, evaluating the shredded sample over the range of absorptances which correspond to the absorption characteristics of the desired polymer, determining a specific wavelength within the range which corresponds to a location of maximum absorbence and of low sensitivity with respect to spectral shifts, comparing the specific wavelength determined with standardized wavelengths representative of known polymer percentages, and determining the polymer content by selecting the standardized wavelength which best corresponds to the specific wavelength determined.Type: GrantFiled: February 21, 1995Date of Patent: April 8, 1997Assignee: Temple-Inland Forest Products CorporationInventors: John S. Parigi, Fred D. Patterson, III
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Patent number: 5614724Abstract: Disclosed is an apparatus for automatically consolidating a filter or, more specifically, an apparatus for drawing a volume of gas through a plurality of sections of a filter, whereafter the sections are subsequently combined for the purpose of simultaneously interrogating the sections to detect the presence of a contaminant.Type: GrantFiled: December 11, 1995Date of Patent: March 25, 1997Inventors: Harry S. Miley, Robert C. Thompson, Charles W. Hubbard, Richard W. Perkins