Field Ionization Type Patents (Class 250/423F)
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Patent number: 6104030Abstract: An optical probe comprises a waveguide having an optical opening for passing light therethrough, the waveguide terminating in a sharp tip at a distal end thereof. A metal film is coated on the distal end of the waveguide except for the optical opening. The metal film has a curved surface gradually retreating from the optical opening to an outer circumference of the waveguide.Type: GrantFiled: March 21, 1997Date of Patent: August 15, 2000Assignee: Seiko Instruments Inc.Inventors: Norio Chiba, Hiroshi Muramatsu, Kunio Nakajima
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Patent number: 6100523Abstract: A goniometer for performing scanning probe microscopy on a substrate surface is disclosed. The goniometer has a cantilever, having a cantilevered end and a supported end and a tip disposed at the cantilevered end of the cantilever. The goniometer also has a block disposed at the supported end of the cantilever. The block has at least one pair of piezoelectric layers, a pair of electrodes disposed about each individual piezoelectric layer such that varying a potential difference applied between the individual electrodes of a pair of electrodes causes the corresponding piezoelectric layer to deform, and a first insulating material disposed between the individual electrodes for insulating the individual electrodes from each other. The individual piezoelectric layers are deformed at different rates resulting in a deformity of the block and tilting of the cantilever and tip connected therewith.Type: GrantFiled: October 29, 1997Date of Patent: August 8, 2000Assignee: International Business Machines CorporationInventors: Arunava Gupta, Ravi Saraf
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Patent number: 6088320Abstract: A micromechanically fabricated read/write head for charge storage devices comprising a supporting base, a cantilever and a tip with a shaft and frontside end. The supporting base, cantilever and tip form one integral part made of electrically conducting material. The frontside end of the tip is so designed as to allow writing and reading of information in direct contact with the surface of a charge storage device. The shaft of the tip has a small diameter and is surrounded by a strengthening shell.Type: GrantFiled: February 19, 1997Date of Patent: July 11, 2000Assignee: International Business Machines CorporationInventors: Thomas Bayer, Johann Greschner, Helga Weiss
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Patent number: 5977716Abstract: An ion generator used for supplying an ionized air to an intake section of a combustion apparatus such as combustion engines and the like. In an air-flow passage within a casing, a high-voltage generator is disposed on the upstream side whereas an ionization electrode is disposed on the downstream side. A gap for the air-flow passage is defined between the high-voltage generator and the casing so as to allow for the air-cooling of the high-voltage generator. The ionization electrode has its outside electrode set to the negative pole and its inside electrode set to the positive pole so as to prevent the occurrence of plasma discharge in a space pace other than that between the both electrodes. This is effective to prevent the high-voltage generator from being overheated, thus contributing to an increased service life thereof.Type: GrantFiled: August 27, 1997Date of Patent: November 2, 1999Inventor: Kazuo Motouchi
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Patent number: 5977549Abstract: An apparatus and a method of producing a dual ion/electron source. The ion beam and the electron beam are produced by a charged particle optical system. Using an ion source metal to emit an ion beam or an electron beam. The direction of the ion beam and the electron beam is identical. Neither the particle source nor the sample need to be rotated or shifted.Type: GrantFiled: May 8, 1998Date of Patent: November 2, 1999Assignee: United Microelectronics CorpInventors: Yuh-Lin Wang, Lung-Wen Chen
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Patent number: 5969362Abstract: An electron-beam exposure system includes: (1) a stage for supporting a wafer, (2) a planar electron-beam source that emits multiple electron beamlets toward the stage, (3) an electric-field generator for forming an electric field to accelerate the electrons in the electron beamlets, (4) a magnetic-field generator for forming a magnetic flux in the space between the planar electron-beam source and the wafer stage. The magnetic filed generator is structured and arranged such that the magnetic flux formed thereby is (1) substantially evenly distributed within a plane perpendicular to the optical axis, and (2) of increasing flux density, ranging from a first density in the vicinity of the planar electron-beam source, to a second density (greater than the first density) in the vicinity of the wafer stage. The electrons in the electron beamlets follow the lines of magnetic flux such that the beamlet width is decreased at the stage compared to the beamlet width at the planar electron-beam source.Type: GrantFiled: February 5, 1998Date of Patent: October 19, 1999Assignee: Nikon CorporationInventors: Shintaro Kawata, Kazuya Okamoto
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Patent number: 5965885Abstract: A spring is connected to an edge section of a sample side of a spindle receiving a force in the Z-axial direction by a first poise coil motor, and a probe is attached to the tip of the spring. The spindle is supported by an internal tube with a spring. The movement of the spindle is enlarged by the spring to be conveyed to the probe, whereby displacement of the probe is amplified. For this reason, a resonance frequency f0 of a system comprising the movable element of the first poise coil motor, spindle, spring, spring and probe can be increased. If the spring is changed to springs in two stages, a resonance frequency f0 of the system can be increased with comparatively compact configuration.Type: GrantFiled: November 12, 1997Date of Patent: October 12, 1999Assignee: Seiko Instruments Inc.Inventor: Akira Inoue
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Patent number: 5945683Abstract: An electron beam exposure device includes an alignment optical system; an electromagnetic lens system; a stage on which the sample is provided; and an electron gun. The electron gun is comprised of an electron generating source; an electron generating source heating element which generates heat for increasing the temperature of the electron generating source; a supporting member which supports the electron generating source and the electron generating source heating element; and a Wehnelt. The electron beam exposure device is provided with at least one auxiliary heating element located at respective portion thermally connected to the electron generating source heating element.Type: GrantFiled: August 5, 1997Date of Patent: August 31, 1999Assignees: Fujitsu Limited, Advantest CorporationInventors: Tatsuro Ohkawa, Yoshihisa Ooae, Hitoshi Tanaka, Hiroshi Yasuda
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Patent number: 5945678Abstract: A needle (22) adapted to advance and retract in z directions is accommodated in an ionization chamber (15), whereas an electrolytic solution (L) containing a sample is supplied into the ionization chamber (15) through a supply tube (18). The supply tube (18) is bored with a hole (20) communicating with the inside of the ionization chamber (15). While a predetermined voltage is applied between the supply tube (18) and the needle (22), the tip of the needle (22) is caused to come close to but not in contact with the electrolytic solution in the hole (20), so as to form a locally raised portion (Taylor cone) in the liquid surface of the electrolytic solution, thereby attaching a droplet containing ions in the electrolytic solution to the tip of the needle (22). After the needle (22) is moved to a predetermined position, N.sub.2 gas is jetted against the tip portion of the needle (22), thereby emitting the droplet containing ions attached to the tip of the needle (22) into the ionization chamber (15).Type: GrantFiled: May 20, 1997Date of Patent: August 31, 1999Assignee: Hamamatsu Photonics K.K.Inventor: Yutaro Yanagisawa
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Patent number: 5936251Abstract: A liquid metal ion source includes a cylindrical rod made of an electrically conductive refractory material, ending in a conical pointed end. The cylindrical rod passes through a reservoir of a liquid supply metal. The length of the rod inserted into the reservoir is in electrical contact with the liquid metal in the reservoir, and the reservoir is in contact with a conductive filament. The cylindrical rod, the reservoir and the conductive filament are electrically connected in series.Type: GrantFiled: April 18, 1997Date of Patent: August 10, 1999Assignee: Centre National de la Recherche ScientifiqueInventors: Jacques Gierak, Gerard Jacques Ben Assayag
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Patent number: 5892231Abstract: Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.Type: GrantFiled: February 5, 1997Date of Patent: April 6, 1999Assignee: Lockheed Martin Energy Research CorporationInventors: Larry R. Baylor, Clarence E. Thomas, Edgar Voelkl, James A. Moore, Michael L. Simpson, Michael J. Paulus
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Patent number: 5856674Abstract: A ribbon filament (86) is provided for a thermionic emission device. The filament comprises an elongated body having a configuration defined by a length, a width, and a thickness. The length comprises a central portion (96) and first and second end portions (98) on either side of the central portion. The width of the central portion is greater than that of the first and second end portions. In addition, the thickness of the filament is substantially less than the width along its entire length. The ribbon filament (86) may be configured as a single helical coil having its first and second end portions (98) mounted to first and second legs (85), respectively, at locations of slots therein. Preferably, the filament (86) is comprised of tungsten and the first and second legs (85) are also comprised of tungsten.Type: GrantFiled: September 16, 1997Date of Patent: January 5, 1999Assignee: Eaton CorporationInventor: Peter L. Kellerman
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Patent number: 5856672Abstract: A cantilever for use in an atomic force microscope system is formed of single-crystal silicon and has an integral tip. The tip is formed by the convergence of three planes, one of which is one of the two outer generally parallel planes which define the thickness of the cantilever. The tip lies between the cantilever's two thickness-defining planar surfaces and is thus an in-plane integral tip. The cantilever is supported in the AFM system so that it makes an acute angle with the surface of the sample to be scanned. The cantilever can be supported in the AFM system so that the cantilever outer surface that converges to the tip is oriented to either face the sample or face away from the sample.Type: GrantFiled: August 29, 1996Date of Patent: January 5, 1999Assignee: International Business Machines CorporationInventor: Robert Paul Ried
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Patent number: 5854490Abstract: An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower than the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode andType: GrantFiled: July 16, 1996Date of Patent: December 29, 1998Assignee: Fujitsu LimitedInventors: Yoshihisa Ooaeh, Akio Yamada, Hiroshi Yasuda
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Patent number: 5834781Abstract: An SE electron source in an apparatus utilizing an electron beam such as an electron microscope or electron beam lithography machine has an electron source structure particularly well suited for an electron gun in which the probe current is varied by the control voltage. The electron source includes a needle whose tip has a cone angle of less than 15 degrees and a radius of curvature of less than 0.5 .mu.m. In an electron gun using an SE electron source according to the invention, the range of variations in probe current caused by a given variation in control voltage is increased, permitting one extraction voltage setting to suffice and the value of the extraction voltage to decrease. Damage to the needle tip due to electric discharge is prevented adding to the stability of the electron gun.Type: GrantFiled: February 6, 1997Date of Patent: November 10, 1998Assignee: Hitachi, Ltd.Inventor: Satoru Fukuhara
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Patent number: 5811819Abstract: An electron beam source is provided with an electron forming means such as a doped layer of Si for forming conduction band electrons near the surface of the pointed tip of a needle-shaped structure while suppressing emission of electrons from a valence band. The surface of the pointed tip of the needle-shaped structure is formed with a single-crystal semiconductor or insulator. Preferably a surface passivation layer and/or a highly doped layer is formed on the surface of the needle-shaped structure. Also, means for exciting electrons in a valence band may be provided. An electron beam source apparatus and electron beam apparatus incorporating the electron beam source as defined above are also disclosed.Type: GrantFiled: December 5, 1995Date of Patent: September 22, 1998Assignee: Hitachi, Ltd.Inventors: Takashi Ohshima, Hiroyuki Shinada, Katsuhiro Kuroda
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Patent number: 5773834Abstract: A composite material is produced by irradiating a surface of a shaped body of a carbonaceous material with an ion beam to form a layer of carbon nanotubes on the surface. The composite material is useful as a cathode of an electron beam source element.Type: GrantFiled: February 12, 1997Date of Patent: June 30, 1998Assignee: Director-General of Agency of Industrial Science and TechnologyInventors: Kazuhiro Yamamoto, Yoshinori Koga, Shuzo Fujiwara
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Patent number: 5763893Abstract: Electron guns particularly suitable for electron-beam projection microlithography are disclosed. The electron guns produce an electron beam having a uniform intensity distribution over a wide field, and that permit electron-beam brightness to be varied over a wide range. The electron gun comprises a cathode including a planar circular emission surface. Arranged in sequence along an optical axis from the cathode are a Wehnelt (focusing electrode), an anode, and a ground electrode. The Wehnelt includes a conical upper surface exhibiting a half-angle .theta.1 relative to the axis of 67.5.degree.. The anode includes a conical surface axially facing the cathode, the conical surface being concave with respect to the cathode. The anode also includes a conical surface axially facing the ground electrode, the conical surface being concave with respect to the ground electrode. The anode can be energized with a variable electric potential 0.1-10 kV higher than the potential of the cathode.Type: GrantFiled: December 16, 1996Date of Patent: June 9, 1998Assignee: Nikon CorporationInventor: Mamoru Nakasuji
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Patent number: 5763880Abstract: A cathode (e.g., a Schottky emission cathode) having an electron emitter of a tungsten single-crystal with a sharp point, and a heater connected to the electron emitter to heat it. The work function of the crystal face of the point of the electron emitter is reduced by providing adsorbed thereon a nitride of Zr, Ti, Y, Nb, Sc, V or La, or an oxide of Y, Sc, V or La. The nitride or oxide can be formed as a reservoir on the heater (from where it thermally diffuses to the point), or chemically adsorbed on the point. For forming the nitride or oxide on the point, the metal forming the nitride or oxide can be provided on the point and reacted with nitrogen or oxygen thereat to form the nitride or oxide; to provide the metal on the point, the metal forming the nitride or oxide can either be evaporated onto the point, or can form a reservoir on the heater and thermally diffuse therefrom to the point.Type: GrantFiled: March 4, 1996Date of Patent: June 9, 1998Assignee: Hitachi, Ltd.Inventors: Hidetoshi Nisiyama, Masakuni Okamoto, Hiroyuki Shinada, Katsuhiro Kuroda
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Patent number: 5747815Abstract: A gas ionizer is provided for use in a solid state mass spectrograph for analyzing a sample of gas. The gas ionizer is located in a cavity provided in a semiconductor substrate which includes an inlet for introducing the gas to be analyzed. The gas ionizer ionizes the sample of gas drawn into the cavity through the inlet to generate an ionized sample gas. The gas ionizer generates energetic particles or photons which bombard the gas to be sampled to produce ionized gas. The energetic particles or photons can be generated by reverse-bias p-n junctions, radioactive isotopes, electron discharges, point emitters, and thermionic electron emitters. A layer of cesium chloride or cesium iodide having a low work function is formed on top of the reverse-bias p-n junction gas ionizer to increase current emitted per junction area and so that the gas ionizer can be exposed to atmospheric oxygen during storage and can operate in reduced atmosphere with no additional treatments.Type: GrantFiled: July 24, 1996Date of Patent: May 5, 1998Assignee: Northrop Grumman CorporationInventors: Robert M. Young, Carl B. Freidhoff, Timothy T. Braggins, Thomas V. Congedo
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Patent number: 5723867Abstract: In a field emission cathode, periphery portions of opening portions of a gate electrode are recessed on a side of a substrate, and a focusing electrode having opening portions which are identical in number with the opening portions of the gate electrode are disposed on the gate electrode. Further, a shield electrode having opening portions which are identical in number with opening portions of the gate electrode are disposed between the gate electrode and the focusing electrode. According to the above-mentioned construction, a focusing aberration can be reduced, and a focused electron flow can be obtained by a low electric potential of the gate electrode.Type: GrantFiled: February 27, 1996Date of Patent: March 3, 1998Assignee: NEC CorporationInventor: Hironori Imura
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Patent number: 5698855Abstract: The present invention provides an electron gun assembly including at least one field emission type cold cathode acting as an electron beam source, a support for supporting the cold cathode thereon, a control electrode spaced away from the cold cathode, the control electrode cooperating with the support to enclose the cold cathode therein, a thermal shield member provided both around the control electrode and below the support to prevent heat conduction to the cold cathode. The thermal shield member does not allow heat conduction to the cold cathode when the electron gun assembly is to be enclosed in a glass valve by softening a neck portion of the glass valve with an oxygen burner and then attaching the softened neck portion to the electron gun assembly, resulting in that an emitter of the cold cathode is not increased in temperature and that a summit of an emitter is not oxidized.Type: GrantFiled: July 16, 1996Date of Patent: December 16, 1997Assignee: NEC CorporationInventor: Toshio Kaihara
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Patent number: 5665253Abstract: A tunneling tip sensor and a method of photolithographically fabricating a unitary structure sensor on a semiconductor substrate are disclosed. A cantilever electrode is formed on the substrate with one end suspended above the substrate at a distance from a tunneling electrode so that a tunneling current flows through the cantilever and tunneling electrodes in response to an applied bias voltage. The cantilever and tunneling electrodes form a circuit that produces an output signal. A force applied to the sensor urges the cantilever electrode to deflect relative to the tunneling electrode to modulate the output signal. In the preferred embodiment, the output signal is a control voltage that is applied between the cantilever electrode and a control electrode to maintain a constant tunneling current. In an alternative embodiment, a lateral control electrode is fabricated to produce a lateral motion of the cantilever electrode such that the sensor detects a rotation.Type: GrantFiled: May 31, 1995Date of Patent: September 9, 1997Assignee: Hughes ElectronicsInventors: Randall L. Kubena, Gary M. Atkinson
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Patent number: 5654548Abstract: A source for intense coherent electron pulses of an energy below 1 keV comprises an ultrasharp electron-emitting tip and an anode both arranged in mutual alignment inside a vacuum envelope A pulsed potential with an amplitude in the range between 100 V and 500 V and with a variable pulse rate is applied between said tip and said anode. The tip is maintained negative with respect to said anode, the tip having a sharpness such that the electric field at its surface exceeds 10.sup.7 V/cm at said pulsed potential.Type: GrantFiled: April 19, 1996Date of Patent: August 5, 1997Assignee: International Business Machines CorporationInventors: Hans-Werner Fink, Heinz Schmid
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Patent number: 5644129Abstract: The present invention is a method to distinguish and measure normal paraffins, isoparaffins, and naphthenes in a saturated hydrocarbon mixture. The method includes the step of field-ionizing hydrocarbon mixture; separating the normal paraffins, isoparaffins and naphthenes as a separate saturates class; and detecting the normal paraffins as molecular ions, naphthenes as molecular ions, and isoparaffins as fragment ions.Type: GrantFiled: February 2, 1996Date of Patent: July 1, 1997Assignee: Exxon Research & Engineering CompanyInventors: Chang S. Hsu, Saul C. Blum, Zhenmin Liang, Peter B. Grosshans, Winston K. Robbins
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Patent number: 5633507Abstract: An electron beam system for direct writing applications employs an electron gun having a large emitting surface compared to the prior art and a brightness approximately two orders of magnitude less than prior art systems to illuminate an initial aperture uniformly with a slightly diverging beam that passes efficiently through the aperture, a first set of controllable deflectors to scan the beam over the reticle parallel to the system axis, impressing the pattern of a subfield of the reticle in each exposure, in which a first variable axis lens focuses an image of the initial aperture on the reticle, a second variable axis lens collimates the patterned beam, a second set of controllable deflectors to bring the beam back to an appropriate position above the wafer, and a third variable axis lens to focus an image of the reticle subfield on the wafer, together with correction elements to apply aberration corrections that may vary with each subfield, thereby providing high throughput from the use of parallel proceType: GrantFiled: September 19, 1995Date of Patent: May 27, 1997Assignee: International Business Machines CorporationInventors: Hans C. Pfeiffer, Werner Stickel
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Patent number: 5616926Abstract: A Schottky emission cathode has a filament, a needle-shaped piece of single crystal refractory metal which is attached to the filament and has a flat crystal surface at a tip thereof, and an adsorbed layer including at least one kind of a metal other than the single crystal refractory metal on the flat crystal surface. The piece of single crystal refractory metal is heated by passing a current through the filament and electrons are extracted by an electric field applied on a tip of the needle-shaped piece of single crystal refractory metal. The tip of the needle-shaped piece of single crystal refractory metal as a radius of curvature of a value to produce an energy width among electrons extracted from the tip not exceeding a predetermined value when the electric field is sufficient to prevent the flat crystal surface from collapsing during operation of the cathode.Type: GrantFiled: July 31, 1995Date of Patent: April 1, 1997Assignee: Hitachi, Ltd.Inventors: Hiroyuki Shinada, Shingo Kimura, Katsuhiro Kuroda, Satoru Fukuhara, Takashi Ohshima
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Patent number: 5611942Abstract: The present invention is a method for forming a three point atomic force microscope tip. The method includes forming a substantially longitudinally extending solid tip having a peripheral surface and a forward end surface. Three masks are formed by deposition of carbon upon the solid tip, with a first and second of the masks formed along the peripheral surface, and a third of the masks formed on the forward end surface. The mask covered tip is then etched for a predetermined period of time to remove material from both the tip and the mask. After the predetermined period of time has elapsed, the masks are completely removed, and the removal of material from the tip results in the formation of three spikes which are pointed to the location from which the masks were removed.Type: GrantFiled: March 2, 1995Date of Patent: March 18, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Tadashi Mitsui, Katsuya Okumura
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Patent number: 5587586Abstract: The source can be readily aligned and the energy spread of the emitted bean can be controlled to an arbitrarily small value by variation of the voltage. Since no high voltage is present within the emissive part of the electron source, a very compact electron source can be realized.Type: GrantFiled: October 3, 1995Date of Patent: December 24, 1996Assignee: U.S. Philips CorporationInventor: Pieter Kruit
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Patent number: 5581156Abstract: A negative ion source with an automatic control system wherein a low power igh frequency discharge is used to sustain a high power low voltage dc discharge in a chamber that magnetically confines the plasma produced. The low power high frequency discharge and the high power low voltage direct current discharge are two discharges along with the gas flow rate which are independently adjusted, automatically, so that the conditions for optimum production of vibationally excited hydrogen molecules consistent with the production of maximum H.sup.- output current is obtained and maintained. This chamber is separated by a magnetic filter field from a second chamber which maintains the low temperature plasma in the second chamber necessary for the optimum production of H.sup.- ions by the process of dissociative attachment, utilizing the vibrationally excited molecules produced by the first chamber.Type: GrantFiled: July 31, 1995Date of Patent: December 3, 1996Assignee: The United States of America as represented by the Secretary of the ArmyInventors: Thomas G. Roberts, Brian R. Strickland
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Patent number: 5548117Abstract: Disclosed is a probe for use in a scanning tunneling microscope which can measure a macromolecule, i.e., a protein molecule. The probe is manufactured by covering a metal wire having a sharp end with a thin organic film, removing an end of the metal wire by an electric field evaporation process, electrodepositing metal ions on the metal wire and removing a portion of the organic film. A monomolecular film is formed on the surface of a metal wire by chemically adsorbing a chlorosilane based chemical adsorbent. Only a tip of the chemically adsorbed film is removed by the electric field evaporation procedure, and the metal ions are electrodeposited on the tip of the metal wire. As a result, a sharp metal tip is formed. After that, the chemically adsorbed film is removed by alkyl treatment.Type: GrantFiled: September 20, 1994Date of Patent: August 20, 1996Assignee: Matsushita Electric Industrial Co., Ltd.Inventor: Tohru Nakagawa
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Patent number: 5541408Abstract: A micromachined mass spectrometer includes an ionizer, a separation region and a detector. The ionizer is formed from an upper electrode, a center electrode and a lower electrode. Ionization of a sample gas takes place around an edge of the center electrode. Accelerating electrodes extract ionized particles from the ionizer. Ionized particles are accelerated through the separation region. A magnetic field is applied in a direction perpendicular to travel of the ionized particles through the separation region causing the trajectory of the ionized particles to bend. The mass spectrometer is formed using micromachined techniques and is carried on a single substrate.Type: GrantFiled: February 17, 1995Date of Patent: July 30, 1996Assignee: Rosemount Analytical Inc.Inventor: Fred C. Sittler
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Patent number: 5536944Abstract: A thermal field emission electron gun has a thermal field emission cathode and a suppressor electrode wherein the thermal field emission cathode comprises a single crystal tungsten needle of an axis direction of <100> and a coating layer composed of zirconium and oxygen, and the suppressor electrode is composed of either titanium or an alloy including titanium as the major component, of which hydrogen content is 60 ppm or less. Electron beams can be stably obtained with good reproducibility in a short time.Type: GrantFiled: April 19, 1995Date of Patent: July 16, 1996Assignee: Denki Kagaku Kogyo Kabushiki KaishaInventors: Katsuyoshi Tsunoda, Yoshinori Terui
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Patent number: 5500572Abstract: Image source, for converting image data in the form of serial charges into a high-resolution imagewise light pattern, includes a CCD emitter having a semiconductor charge-coupled device (CCD) structure for receiving and transferring the charges, a charge amplification means including a charge-modulated control field effect transistor structure (C-FET), and plural small-scale field emission cells (FEC). The CCD emitter is operable to convert the charges to an imagewise pattern of electron emissions that are directed to a luminescent phosphor layer susceptible to light output according to the impact of the incident electrons. The light output may be directed onto a photosensitive image recording medium to provide means for image recording, or in alternative embodiments, the light output may be viewed directly.Type: GrantFiled: March 11, 1993Date of Patent: March 19, 1996Assignee: Eastman Kodak CompanyInventors: Constantine N. Anagnostopoulos, Jon K. Edwards
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Patent number: 5477046Abstract: An ion trap which operates in the regime between research ion traps which can detect ions with a mass resolution of better than 1:10.sup.9 and commercial mass spectrometers requiring 10.sup.4 ions with resolutions of a few hundred. The power consumption is kept to a minimum by the use of permanent magnets and a novel electron gun design. By Fourier analyzing the ion cyclotron resonance signals induced in the trap electrodes, a complete mass spectra in a single combined structure can be detected. An attribute of the ion trap mass spectrometer is that overall system size is drastically reduced due to combining a unique electron source and mass analyzer/detector in a single device. This enables portable low power mass spectrometers for the detection of environmental pollutants or illicit substances, as well as sensors for on board diagnostics to monitor engine performance or for active feedback in any process involving exhausting waste products.Type: GrantFiled: April 24, 1995Date of Patent: December 19, 1995Assignee: Regents of the University of CaliforniaInventors: Daniel D. Dietrich, Robert F. Keville
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Patent number: 5468959Abstract: A microscope comprises a cantilever having a distal end equipped with an electrically conductive probe allowing current to flow and having a fine tip whose voltage is controllable, a position control mechanism for controlling position of a sample with respect to a base end of the cantilever, a small displacement measuring mechanism for measuring a deflection amount of the cantilever, and a deflection control mechanism for controlling deflection of the cantilever so as to adjust a distance between the fine tip of the probe and the sample.Type: GrantFiled: March 18, 1994Date of Patent: November 21, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Takao Tohda, Hiroyuki Kado, Shinichi Yamamoto
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Patent number: 5466941Abstract: A negative ion beam source includes a heated refractory metal ribbon which is positioned adjacent a beam forming electrode that is, biased to repel positive ions emitted from the metal ribbon. An extraction electrode is juxtaposed to the beam forming electrode and includes an aperture for passing a beam of positive ions generated by the metal ribbon. The extraction electrode includes a cesium chamber with openings that are directed towards the refractory metal ribbon. A heater heats the cesium chamber and causes it to expel cesium neutrals towards a surface of the refractory metal ribbon where the cesium neutrals are ionized to positively charged cesium ions. A target is displaced to one side of a perpendicular from the surface of the refractory metal ribbon and is positioned adjacent a negative ion beam forming electrode that is biased to attract the cesium ion beam and to repel negative ions produced by cesium ion bombardment of the target.Type: GrantFiled: July 27, 1994Date of Patent: November 14, 1995Inventor: Seong I. Kim
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Patent number: 5455419Abstract: A method for producing micromechanical sensors for the AFM/STM/MFM profilometry is described in which a multiple step mask of cantilever beam and tip is transferred step by step into the wafer substrate by reactive ion etching. A particular highly anisotropic etching step is used for etching and shaping of the tip. This process step uses an Ar/Cl2 ambient at a pressure of about 100 .sup.6 bar and a self bias voltage of about 300 V DC. The ratio of pressure to self bias voltage determines the concave shape of the tip side- walls. This etching step is followed by a thermal oxidation step. The oxidation is carried out for a time until the oxidation fronts at the thinnest point of the tip shaft touch each other. A stripping process with buffered hydrofluoric acid gently removes the thermally grown oxide. The oxidation process allows--via oxidation time--a modification of tip height and angle in an extremely controllable manner.Type: GrantFiled: January 31, 1994Date of Patent: October 3, 1995Assignee: International Business Machines CorporationInventors: Thomas Bayer, Johann Greschner
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Patent number: 5440124Abstract: An atom probe provides rapidly pulsed field evaporation/desorption of ions from a tip utilizing a local extraction electrode positioned closely adjacent to the tip. A bias potential is applied between the tip and the local extraction electrode which provides an electric field at the tip which is less than but near the field intensity required for field evaporation of ions. Additional potential is applied between the tip and the extraction electrode in relatively low over-voltage pulses to obtain field evaporation of ions without substantially accelerating the ions. The ions extracted from the tip by the sharply defined pulses pass through an aperture in the extraction electrode and are accelerated by a large potential difference between the tip and a detector spaced from the tip and the local extraction electrode.Type: GrantFiled: July 8, 1994Date of Patent: August 8, 1995Assignee: Wisconsin Alumni Research FoundationInventors: Thomas F. Kelly, Patrick P. Camus, David J. Larson, Louis M. Holzman, Sateeshchandra S. Bajikar
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Patent number: 5431055Abstract: A scanning tunneling microscope, in which the gap between a tip having a keenly sharpened end and a sample is narrowed to let flow a tunneling current between them and thereby allow observation of the surface of the sample, a strain wave detecting device is disposed on the sample or in the vicinity of the sample to detect strain waves generated within the sample. By modulating the value of the above described tunneling current, strain waves are generated within the sample. The strain waves are detected by the above described strain wave detecting device. On the basis of the amplitude information and phase information of detected strain waves, physical information regarding the inside of the sample is obtained.Type: GrantFiled: May 10, 1993Date of Patent: July 11, 1995Assignee: Hitachi, Ltd.Inventors: Keiji Takata, Hiromichi Shimizu, Shigeyuki Hosoki, Sumio Hosaka
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Patent number: 5430300Abstract: A low voltage vacuum field emission device and method for manufacturing is provided. The devices are fabricated by anodizing a heavily doped silicon wafer substrate (12) in concentrated HF solution, forming extremely sharp silicon tips (18) at the silicon to porous silicon interface. The resulting porous silicon layer is then oxidized, and a metal film (22) is deposited by evaporation on the porous silicon. Silicon substrate (12) is the cathode, and metal film dots (22) are the anodes. The I-V characteristics for the field emission devices follow Fowler-Nordheim curves over three decades of current. The I-V characteristics are also utterly independent of temperature up to 250.degree. C. When the oxidized porous silicon layer (OPSL) is about 5000 .ANG., substantial current is obtained with less than 10 volts. Recent experiments leave no doubt that the charge transport is in the vacuum of the pores.Type: GrantFiled: April 12, 1994Date of Patent: July 4, 1995Assignee: The Texas A&M University SystemInventors: Wing K. Yue, Donald L. Parker, Mark H. Weichold
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Patent number: 5401963Abstract: A micromachined mass spectrometer includes an ionizer, a separation region and a detector. The ionizer is formed from an upper electrode, a center electrode and a lower electrode. Ionization of a sample gas takes place around an edge of the center electrode. Accelerating electrodes extract ionized particles from the ionizer. Ionized particles are accelerated through the separation region. A magnetic field is applied in a direction perpendicular to travel of the ionized particles through the separation region causing the trajectory of the ionized particles to bend. The mass spectrometer is formed using micromachined techniques and is carried on a single substrate.Type: GrantFiled: November 1, 1993Date of Patent: March 28, 1995Assignee: Rosemount Analytical Inc.Inventor: Fred C. Sittler
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Patent number: 5399865Abstract: A liquid metal ion source (LMIS) has a reservoir for containing an ion material and an emitter disposed in relation to the reservoir such that molten ion material heated in the reservoir wets the surface of the emitter and flows to the emitter apex. Prior to charging the reservoir with the ion material, the reservoir and emitter are cleaned by a high temperature cleaning operation. For cleaning, the LMIS is placed in a vacuum chamber. A current is applied through the electric feed through terminals to heat the reservoir until it becomes red hot. Then, the emitter is heated by electron bombardment by keeping the emitter voltage at ground potential while applying a high negative voltage to the reservoir. After cleaning, the emitter and reservoir are immersed in a liquid ion material contained in the vacuum chamber and maintained in the molten state by a separate melting unit having a heater.Type: GrantFiled: June 15, 1993Date of Patent: March 21, 1995Assignee: Hitachi, Ltd.Inventors: Kaoru Umemura, Tohru Ishitani
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Patent number: 5397901Abstract: A method of charging a fluid beam comprising passing a fluid from an area of first pressure to an area of second pressure, the second pressure being lower than the first pressure, and charging said fluid so that molecules of the fluid may be accelerated in the area of second pressure, so as to form a charged beam, wherein the charging imparts sufficient charge to the fluid as to achieve a charge density greater than 10.sup.14 charge per cm.sup.3 within the fluid.Type: GrantFiled: January 4, 1994Date of Patent: March 14, 1995Assignee: American Technologies, Inc.Inventor: Shui-Yin Lo
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Patent number: 5367165Abstract: A cantilever chip has a holding substrate, and a cantilever having the shape of a hollow triangle extends from the holding substrate. A probe is arranged at the distal end portion of the cantilever. An axis of the probe is inclined at a predetermined angle with respect to a normal extending from the surface of the cantilever. This angle is set such that the axis of the probe is perpendicular to a sample surface when the cantilever chip is mounted on an atomic force microscope.Type: GrantFiled: January 12, 1993Date of Patent: November 22, 1994Assignee: Olympus Optical Co., Ltd.Inventors: Akitoshi Toda, Katsuhiro Matsuyama
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Patent number: 5360978Abstract: The multiple STM-tip unit comprises a plurality of individually connectable, electrically separated tunnel tips (52 . . . 54) arranged in a common sandwiched block (5), in the form of a plurality of electrically conducting layers (41, 46, 50) each associated with at least one of said tunnel tips (52 . . . 54) with insulating layers (44, 48) intercalated between said conducting layers (41, 46, 50), the latter each having a contact pad (36, 42, 43) for connection to appertaining electronics. The thickness, area, and material characteristics of said insulating layers (44, 48) are chosen such that the tunnel current through any one of the intercalated insulating layers (44, 48) is negligible with respect to the tunnel current flowing across the gap between the involved tunnel tips (52 . . . 54) and the surface with which said tips cooperate.Type: GrantFiled: September 8, 1992Date of Patent: November 1, 1994Assignee: International Business Machines CorporationInventor: Pierre L. Gueret
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Patent number: 5306412Abstract: The subject invention teaches the use of mechanical vibration to enhance the electrostatic dispersion of sample solutions into the small, highly charged droplets that can produce ions of solute species for mass spectrometric analysis. Such vibration turns out to be surprisingly effective at ultrasonic frequencies for solutions with flow rates, conductivities and surface tensions too high for stable dispersion by electrostatic forces alone as in conventional electrospray ionization. Several embodiments of the invention are described for purposes of illustration. Other possible embodiments will become apparent to those skilled in the art.Type: GrantFiled: April 8, 1993Date of Patent: April 26, 1994Assignee: Analytica of Branford, Inc.Inventors: Craig M. Whitehouse, John B. Fenn, Shida Shen, Cawthon Smith
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Patent number: 5289004Abstract: A scanning probe microscope comprises a cantilever having a conductive probe positioned near a sample, an actuator for moving the sample to and away from the probe, a circuit for applying a bias voltage between the probe and sample to produce a tunnel current therebetween, a circuit for detecting the produced tunnel current, a circuit for detecting the amount of displacement of the probe resultant from interatomic forces acting between atomics of the probe and sample, thereby producing signals, a circuit for providing the actuator for feedback in response to the output signals from the circuit to retain constant the distance between the probe and sample, thereby causing the actuator to move the sample, a circuit for forming an STS image data from the detected tunnel current, a circuit for forming an STM image data from the detected tunnel current, and a circuit for forming an AFM image data. Thus, the STS, STP and AFM images are separately obtained simultaneously.Type: GrantFiled: April 10, 1992Date of Patent: February 22, 1994Assignee: Olympus Optical Co., Ltd.Inventors: Takao Okada, Akira Yagi, Yasuhiro Sugawara, Seizo Morita, Tsugiko Takase
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Patent number: RE34575Abstract: A high current (0.2 to at least 2 milliamperes), low-energy (2.2 to 4 MV) ion beam is generated and is utilized to produce clinically significant quantities of medical isotopes useful in applications such as positron emission tomography. For a preferred embodiment, a tandem accelerator is utilized. Negative ions generated by a high current negative-ion source are accelerated by an electrostatic accelerator in which the necessary high voltage is produced by a solid state power supply. The accelerated ions then enter a stripping cell which removes electrons from the ions, converting them into positive ions. The positive ions are then accelerated to a target which is preferably at ground potential.Type: GrantFiled: January 18, 1991Date of Patent: April 5, 1994Assignee: Science Reseach CorporationInventors: Robert E. Klinkowstein, Ruth Shefer
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Patent number: RE34708Abstract: A scanning ion conductance microscope, SICM, which can image the topography of soft non-conducting surfaces covered with electrolytes by maintaining a micropipette probe at a constant conductance distance from the surface. It can also sample and image the local ion currents above the surfaces by scanning the micropipette probe in a plane located at a constant distance above the surface. Multiple micropipettes mounted in a multi-barrel head and containing various ion specific electrodes allow simultaneous scanning for different ion currents.Type: GrantFiled: April 29, 1992Date of Patent: August 30, 1994Assignee: The Regents of the University of CaliforniaInventors: Paul K. Hansma, Barney Drake