Means To Align Or Position An Object Relative To A Source Or Detector Patents (Class 250/491.1)
  • Patent number: 11281091
    Abstract: A photomask includes a patterned photomask plate and a supporting member. The patterned photomask plate has a pattern region and a peripheral region surrounding the pattern region. The patterned photomask plate includes a plurality of openings in the pattern region. The supporting member directly abuts the patterned photomask plate and is in a peripheral region of the patterned photomask plate. The supporting member is formed from a different material than the patterned photomask plate.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: March 22, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: You-Hua Chou, Kuo-Sheng Chuang
  • Patent number: 11239100
    Abstract: A method for calibration including determining a temperature induced offset in a pedestal of a process module under a temperature condition for a process. The method includes delivering a wafer to the pedestal of the process module by a robot, and detecting an entry offset. The method includes rotating the wafer over the pedestal by an angle. The method includes removing the wafer from the pedestal by the robot and measuring an exit offset. The method includes determining a magnitude and direction of the temperature induced offset using the entry offset and exit offset.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: February 1, 2022
    Assignee: Lam Research Corporation
    Inventors: Jacob L. Hiester, Richard Blank, Peter Thaulad, Paul Konkola
  • Patent number: 11228232
    Abstract: Displacement devices comprise a stator and a moveable stage. The stator comprises a plurality of coils shaped to provide pluralities of generally linearly elongated coil traces in one or more layers. Layers of coils may overlap in the Z-direction. The moveable stage comprises a plurality of magnet arrays. Each magnet array may comprise a plurality of magnetization segments generally linearly elongated in a corresponding direction. Each magnetization segment has a magnetization direction generally orthogonal to the direction in which it is elongated and at least two of the magnetization directions are different from one another. One or more amplifiers may be connected to selectively drive current in the coil traces and to thereby effect relative movement between the stator and the moveable stage.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: January 18, 2022
    Assignee: The University of British Columbia
    Inventors: Xiaodong Lu, Irfan-Ur-Rab Usman
  • Patent number: 11187989
    Abstract: The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: November 30, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Timo Laufer, Markus Hauf, Ulrich Mueller
  • Patent number: 11170971
    Abstract: A system is disclosed. The system includes a stage assembly configured to receive a specimen and maintain a height of the specimen at a first working distance height during a first characterization mode and an additional working distance height during an additional characterization mode. The system further includes an illumination source configured to generate an illumination beam. The system further includes an illumination arm including a set of optical elements configured to direct a portion of the illumination beam including illumination of a first wavelength to the specimen during the first characterization mode, and direct a portion of the illumination beam including illumination of an additional wavelength to the specimen during the additional characterization mode. The system further includes a detector assembly configured to receive illumination emanated from the specimen, and a controller configured to determine a specimen height value based on the illumination received by the detector assembly.
    Type: Grant
    Filed: July 15, 2019
    Date of Patent: November 9, 2021
    Assignee: KLA Corporation
    Inventor: Donald Pettibone
  • Patent number: 11152759
    Abstract: A heatable element is configured to apply sufficient energy density to contaminants in an internal ambient atmosphere with in a sealable housing to drive a reaction that inactivates the contaminants.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: October 19, 2021
    Assignee: IPG PHOTONICS CORPORATION
    Inventors: Damon A. Wheeler, Thomas R. Myers, Mark W. Byer, Jeffrey D. Kmetec, Brian R. Rankin, Cory Bowman
  • Patent number: 11116457
    Abstract: Laser sources are configured to project planar laser beams in a preselected geometric relationship. A laser detector is configured to detect, locate, and identify the planar laser beams.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: September 14, 2021
    Assignee: Carestream Health, Inc.
    Inventors: Michael D. Heath, Xiaohui Wang
  • Patent number: 11112704
    Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity—to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: September 7, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Ido Adam, Vladimir Levinski, Amnon Manassen, Yuval Lubashevsky
  • Patent number: 11082128
    Abstract: Embodiments relate to a bidirectional free space optical (FSO) communications system. Specifically, data-encoded FSO beams are transmitted and received between two terminals. A transmit (Tx) direction of a beam transmitted from the first terminal is dithered by a beam steering unit (BSU). As the dithered beam is received by the second terminal, the power levels of the beam are measured. The power levels are then encoded in a data-encoded FSO beam transmitted to the first terminal. This allows the first terminal to decode the received FSO beam and determine the power levels. The power levels allow the first terminal to determine Tx direction misalignments and adjust the Tx direction for the Tx beam sent to the second terminal. This process may be repeated to reduce Tx misalignments and may be performed by both terminals such that each terminal sends power level information to the opposite terminal.
    Type: Grant
    Filed: April 23, 2020
    Date of Patent: August 3, 2021
    Assignee: SA Photonics, Inc.
    Inventor: William C. Dickson
  • Patent number: 11061340
    Abstract: A mount includes: A. a mount body including a holding unit that detachably holds a target generation device configured to output a target substance for extreme ultraviolet light generation as a droplet into a chamber; and B. a target position adjustment unit that is provided to the holding unit and configured to adjust a position of the target generation device relative to the chamber; and C. a movement mechanism that moves the mount body at least in a horizontal direction. The target position adjustment unit is a stage configured to move the target generation device in two directions orthogonal to a droplet emission axis.
    Type: Grant
    Filed: August 4, 2020
    Date of Patent: July 13, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Toshihiro Nishisaka
  • Patent number: 11014196
    Abstract: A procedure for calibration of at least one scanning system of a laser sinter or laser melt facility can be carried out in a short time, can take place automatically, and thereby can be carried out before each individual construction process. The procedure may include generation of at least one line pattern through at least one scanning system on a surface at the level of a construction field.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: May 25, 2021
    Assignee: CONCEPT LASER GMBH
    Inventors: Frank Herzog, Florian Bechmann, Fabian Zeulner
  • Patent number: 11007384
    Abstract: Disclosed herein are systems and methods for monitoring calibration of positron emission tomography (PET) systems. In some variations, the systems include an imaging assembly having a gantry comprising a plurality of positron emission detectors. A housing may be coupled to the gantry, and the housing may include a bore and a radiation source holder spaced away from a patient scan region within the bore. A processor may be configured to receive positron emission data from the positron emission detectors and to distinguish the positron emission data from the radiation source holder and from the patient scan region. A fault signal may be generated when the positron emission data from the radiation source holder exceeds one or more threshold parameters or criteria.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: May 18, 2021
    Assignee: Reflexion Medical, Inc.
    Inventors: Peter Demetri Olcott, Matthew Francis Bieniosek
  • Patent number: 11011060
    Abstract: A system is provided for alerting of potential vehicle damage when moving into or out of a confined space, the confined space having a side structure which can damage the vehicle when moving into the confined space if the vehicle is too close to the side structure. The system comprises a beam transmitter for transmitting a beam, and a beam receiver for receiving the beam. The beam travels along a path at an angle relative to a ground surface of from about 40 degrees to 60 degrees. An alert generator generates an alert such as light, sound, or both, when a vehicle intersects the beam.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: May 18, 2021
    Assignee: DRDesigns, LLC
    Inventor: Darryl R. Dworkin
  • Patent number: 10999222
    Abstract: A method for selecting a transmission of a network device is disclosed. In particular, a method for selecting a transmission of a network device comprising a plurality of queues for storing data frames is disclosed. Here, each of the plurality of queues corresponds to a different traffic class, the method comprising: a step of obtaining information about a transmission selection algorithm for the plurality of queues; and a step of selecting data frames for transmission from a corresponding queue on the basis of transmission selection algorithm information. Here, the transmission selection algorithm may correspond to a strict priority algorithm, a credit-based shaper algorithm, or a burst transmission algorithm.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: May 4, 2021
    Assignee: LG ELECTRONICS INC.
    Inventors: Seoyoung Back, Woosuk Ko
  • Patent number: 10988841
    Abstract: In order to suppress a film from being formed in a gap between a mask and a substrate, a technology of improving adhesion between the mask and the substrate is provided. A film-forming method includes the step of suspending a mask MK by a suspension portion HU in a state in which the suspension portion HU is supported by a supporting portion SU and the step of bringing the mask MK suspended by the suspension portion HU into contact with a glass substrate GS in the state in which the suspension portion HU is supported by the supporting portion SU.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: April 27, 2021
    Assignee: THE JAPAN STEEL WORKS, LTD.
    Inventors: Keisuke Washio, Masaki Chiba, Masao Nakata
  • Patent number: 10985041
    Abstract: A method and apparatus for use in a wafer processing are disclosed. In an embodiment a includes providing the wafer on a receptacle, wherein the receptacle comprises a light port, and wherein the light port includes a source of light, shining a light from the source of light at an edge of the wafer thereby passing light by the edge of the wafer and processing the wafer on the receptacle based on the light passing by the edge of the wafer and received by a light sensitive element.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: April 20, 2021
    Assignee: Infineon Technologies AG
    Inventors: Thomas Fischer, Gerald Lackner, Walter Horst Leitgeb, Michael Lecher
  • Patent number: 10955759
    Abstract: An electromagnetic actuator is described the actuator comprising: a magnet assembly comprising: an array of permanent magnets arranged in a first direction and configured to generate, outside the magnet assembly, a spatially varying magnetic field distribution in the first direction; a ferromagnetic member onto which the array of permanent magnets is mounted; a coil assembly, at least partly arranged in the spatially varying magnetic field distribution, configured to co-operate with the magnet assembly to generate an electromagnetic force; wherein a thickness of the array of permanent magnets in a second direction perpendicular to the first direction varies along the first direction and wherein a thickness of the ferromagnetic member in the second direction varies along the first direction such that a combined thickness of the array of permanent magnets and the ferromagnetic member in the second direction is substantially constant along the first direction.
    Type: Grant
    Filed: May 5, 2017
    Date of Patent: March 23, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Olof Martinus Josephus Fischer, Hendrikus Herman Marie Cox
  • Patent number: 10930469
    Abstract: In one embodiment, a charged particle beam writing apparatus includes a writer writing a pattern on a substrate placed on a stage by irradiating the substrate with a charged particle beam, a height detector detecting a surface height of a mark on the stage, an irradiation position detector detecting an irradiation position of the charged particle beam on the mark surface by irradiation with the charged particle beam focused at the surface height of the mark, a drift correction unit calculating an amount of drift of the charged particle beam on the mark surface from the irradiation position detected by the irradiation position detector, and generating correction information for correcting a shift in irradiation position caused by a drift on the substrate surface based on the amount of drift, and a writing control unit correcting the irradiation position of the charged particle beam by using the correction information.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: February 23, 2021
    Assignee: NuFlare Technology, Inc.
    Inventor: Takahito Nakayama
  • Patent number: 10918201
    Abstract: A dryer, sanitizer, and disinfecting device for make-up brushes includes an outer housing having an upper surface defining a plurality of openings therein with the plurality of openings arranged in a linear array; an inner housing including a retainer having a plurality of recesses corresponding to the plurality of openings defined in the outer housing; and a sterilizing component supported within at least one of the outer housing or the inner housing, wherein the sterilizing component effects the cleaning chamber, and wherein the sterilizing component includes a UV light bulb.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: February 16, 2021
    Inventor: Lisa Cosolito
  • Patent number: 10915689
    Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: February 9, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Ten Berge, Everhardus Cornelis Mos, Richard Johannes Franciscus Van Haren, Peter Hanzen Wardenier, Erik Jensen, Bernardo Kastrup, Michael Kubis, Johannes Catharinus Hubertus Mulkens, David Frans Simon Deckers, Wolfgang Helmut Henke, Joungchel Lee
  • Patent number: 10890744
    Abstract: An observation apparatus includes: alight source that emits pulsed light; and an objective that includes a first optical element serving as a light guide part and irradiates a sample with the pulsed light. The first optical element consists of a medium that satisfies the following conditional expression for ?1 and ?2: 0.75<?2/?1<1.33 where ?1=(n2?n1)/(?2??1) and ?2=(n3?n2)/(?3??2) are satisfied (?1 indicates a light wavelength of 706.52 nm; ?2 indicates a light wavelength of 1529.6 nm; ?3 indicates a light wavelength of 2325.4 nm; and n1, n2, and n3 respectively indicate refractive indexes that the medium has for ?1, ?2, and ?3).
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: January 12, 2021
    Assignee: OLYMPUS CORPORATION
    Inventor: Shingo Tamano
  • Patent number: 10799953
    Abstract: The present disclosure generally relates to additive manufacturing systems and methods on a large-scale format. One aspect involves a build unit that can be moved around in three dimensions by a positioning system, building separate portions of a large object. The build unit has an energy directing device that directs, e.g., laser or e-beam irradiation onto a powder layer. In the case of laser irradiation, the build volume may have a gasflow device that provides laminar gas flow to a laminar flow zone above the layer of powder. This allows for efficient removal of the smoke, condensates, and other impurities produced by irradiating the powder (the “gas plume”) without excessively disturbing the powder layer. The build unit may also have a recoater that allows it to selectively deposit particular quantities of powder in specific locations over a work surface to build large, high quality, high precision objects.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: October 13, 2020
    Assignee: General Electric Company
    Inventors: MacKenzie Ryan Redding, Justin Mamrak, Zachary David Fieldman
  • Patent number: 10714524
    Abstract: The present disclosure relates to a circuit board, a semiconductor device, an imaging device, a solid-state image sensor, a method for manufacturing a solid-state image sensor, and an electronic apparatus that suppress a decrease in characteristics and a yield. A step portion formed on a substrate surface is configured in a divided state. With this configuration, a photoresist liquid dropped in a lithography process flows through a gap between the divided step portions so that the photoresist liquid uniformly flows on an imaging surface, whereby a decrease in characteristics and a yield due to application unevenness can be suppressed. The present disclosure can be applied to a solid-state image sensor.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: July 14, 2020
    Assignee: SONY CORPORATION
    Inventor: Kenji Takeo
  • Patent number: 10667975
    Abstract: A surgical table for supporting a patient over a floor and including a base assembly, a support column assembly and a patient support structure. The base assembly supported on the floor and including a first end, a second end opposite the first end, and a member extending along a base longitudinal axis between the first and second ends. The support column assembly moveably coupled with the base assembly and configured to translate between the first and second ends of the base assembly along the member extending therebetween, the support column assembly being the only support column assembly coupled with the base assembly. The patient support structure including a first end, a second end opposite the first end, and a longitudinal axis extending between the first and second ends, the second end of the patient support structure supported off of the support column assembly in a cantilevered fashion.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: June 2, 2020
    Assignee: Warsaw Orthopedic, Inc.
    Inventors: Roger P. Jackson, Lawrence E. Guerra, Trevor A. Waggoner
  • Patent number: 10664939
    Abstract: A position control system 1 acquires image data obtained by imaging a workpiece, detects a position of the workpiece on the basis of the image data by first detection processing, outputs a control command for controlling the position of the workpiece in a case in which the position of the workpiece has been detected, detects the position of the workpiece on the basis of the image data in accordance with second detection processing that is more robust than first detection processing in a case in which the position of the workpiece has not been detected, and outputs a control command for controlling the position of the workpiece on the basis of a result of the detection in the second detection processing.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: May 26, 2020
    Assignee: OMRON Corporation
    Inventor: Hiroyuki Hazeyama
  • Patent number: 10656604
    Abstract: A system for determining an orientation of a first device relative to a user includes a first device including a first orientation measuring unit configured to measure an orientation of the first device relative to the earth, a second device configured to be worn by the user on a body part. The second device includes a second orientation measuring unit configured to measure an orientation of the second device relative to the earth. The system also has a processor configured to calculate an orientation of the first device relative to the second device by comparing the measured orientation of the first device relative to the earth with the measured orientation of the second device relative to the earth.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: May 19, 2020
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventor: Robert Godlieb
  • Patent number: 10634897
    Abstract: A microscope system comprises a microscope body, an image sensor mounted on the microscope body, and a stage that moves in an X-axis direction and a Y-axis direction, and places a slide as an observation object. The stage includes a mark used to indicate a stage reference position. The microscope system obtains positions of the stage in the X-axis direction and the Y-axis direction, and detects the stage reference position indicated by a mark provided on the stage and a slide reference position indicated by a mark provided on a slide placed on the stage. The microscope system manages the position of the stage by coordinates based on the slide reference position if the slide reference position is detected, and manages the position of the stage by coordinates based on the stage reference position if the slide reference position is not detected.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: April 28, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Michiie Sakamoto, Akinori Hashiguchi, Shinobu Masuda, Tsuguhide Sakata, Masahide Hasegawa, Masahiro Ando, Osamu Nagatsuka, Koichiro Nishikawa
  • Patent number: 10603515
    Abstract: Disclosed herein are systems and methods for monitoring calibration of positron emission tomography (PET) systems. In some variations, the systems include an imaging assembly having a gantry comprising a plurality of positron emission detectors. A housing may be coupled to the gantry, and the housing may include a bore and a radiation source holder spaced away from a patient scan region within the bore. A processor may be configured to receive positron emission data from the positron emission detectors and to distinguish the positron emission data from the radiation source holder and from the patient scan region. A fault signal may be generated when the positron emission data from the radiation source holder exceeds one or more threshold parameters or criteria.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: March 31, 2020
    Assignee: RefleXion Medical, Inc.
    Inventors: Peter Demetri Olcott, Matthew Francis Bieniosek
  • Patent number: 10534259
    Abstract: Methods, systems, and apparatus for applying an imprinting force to an imprint lithography template, including providing, by a controller using a first control loop, a first control signal to a first actuator associated with the first control loop; providing, by the controller using a second control loop, a second control signal to a second actuator associated with the second control loop, wherein the second control loop and the first control loop are different; and applying, to the imprint lithography template, at least one of: a first force by the first actuator in response to the first control signal, and a second force by the second actuator in response to the second control signal.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: January 14, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Byung-Jin Choi, Mario Johannes Meissl
  • Patent number: 10531571
    Abstract: A method for positioning at least one electronic component (3) on a circuit board (1) provided for installation in a vehicle headlamp, wherein the circuit board (1) comprises at least one position mark and the at least one electronic component (3) is positioned relative to the at least one position mark on the circuit board (1), wherein the at least one position mark is detected optically and is used for positioning, wherein the at least one position mark used is at least one alignment mark (5, 6, 7, 8, 8?, 8?) of the circuit board (1) which, in the vehicle headlamp, when the circuit board (1) is installed, interacts mechanically with a positioning means (9, 15) of the vehicle headlamp that is complementary to the alignment mark (5, 6, 7, 8,8?, 8?).
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: January 7, 2020
    Assignee: ZKW GROUP GMBH
    Inventors: Dietmar Kieslinger, Peter Wurm, Arianit Idrizaj
  • Patent number: 10504683
    Abstract: Disclosed herein is charged particle beam device and a a method of operating a charged particle beam device, comprising forming a plurality of focused charged particle beamlets. Charged particles are directed from a charged particle source to a multi-aperture plate. A plurality of beamlets are passed through a plurality of apertures of the multi-aperture plate. The beamlets include an inner beamlet of charged particles and a plurality of outer beamlets of charged particles. The outer beamlets are focused to form a plurality of outer focal points on a virtual ring having a center along an optical axis, the outer beamlets subjected to a field curvature aberration, such that the virtual ring is axially displaced relative to a virtual focal point of an uncompensated inner beamlet. A compensated inner beamlet is focused to a compensated focal point. The inner beamlet is compensated to form the compensated inner beamlet; and the compensated focal point is coplanar with the virtual ring.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: December 10, 2019
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Jürgen Frosien
  • Patent number: 10495981
    Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Bob Streefkerk
  • Patent number: 10495982
    Abstract: Disclosed is a lithography system. The lithography system includes a radiation source to provide radiation energy for lithography exposure; a substrate stage configured to secure a substrate; an imaging lens module configured to direct the radiation energy onto the substrate; at least one sensor configured to detect a radiation signal directed from the substrate; and a pattern extraction module coupled with the at least one sensor and designed to extract a pattern of the substrate based on the radiation signal.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: December 3, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Ming Chang, Wen-Chuan Wang
  • Patent number: 10446434
    Abstract: According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate. The vertical stage may include multiple piezoelectric motors. Each piezoelectric motor may be configured to perform nanometric scale elevation and lowering movements. The multiple piezoelectric motors may be configured to independently move the multiple chuck segments.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: October 15, 2019
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Doron Korngut, Yuri Belenky, Yoram Uziel, Ron Naftali, Ron Bar-or, Yuval Gronau
  • Patent number: 10437154
    Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: October 8, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Erik Roelof Loopstra, Wouter Joep Engelen, Johannes Antonius Gerardus Akkermans
  • Patent number: 10427716
    Abstract: A hitch assist system and method are provided herein. A device is configured to detect a hitch coupler of a trailer and a controller is in communication with the device. The controller is configured to generate a boundary area projecting from the hitch coupler, define a vehicle backup path toward the trailer if a tow hitch of the vehicle is located inside the boundary area, and determine a steering angle for steering the vehicle along the vehicle backup path.
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: October 1, 2019
    Assignee: Ford Global Technologies, LLC
    Inventors: Li Xu, Kyle Simmons, Chen Zhang, Eric Hongtei Tseng
  • Patent number: 10429628
    Abstract: Methods and apparatus for deep microscopic super resolution imaging use two independent and variable focal planes. Movements of fiducial markers imaged using one focal plane are monitored and used to provide real-time or near real-time correction for sample drift. A second focal plane may be used to collect light for super-resolution imaging of a sample. A prototype embodiment has produced low drift when imaging many microns deeper than the fiducial markers.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: October 1, 2019
    Assignee: The University of British Columbia
    Inventors: Keng C. Chou, Reza Tafteh
  • Patent number: 10391336
    Abstract: An apparatus comprises a radiotherapy delivery apparatus having a radiation source for emitting a beam of radiation and wherein the source is rotatable around an axis intersecting the beam through a range of at least x degrees, an imaging device, and a control unit controlling the source and imaging device. The apparatus further comprises a treatment planning computer receiving a first image of a patient, and parameters defining the operations of the radiotherapy delivery apparatus. Parameters include an available range of rotation for the source, x-e, where e>0. The treatment planning computer generates a treatment plan for the patient based on the received image and parameters. The control unit determines a patient position using the imaging device, determines a rotation r of the patient around the axis relative to the first image, and compensates for the rotation by offsetting the source by a rotation, r, when r<e.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: August 27, 2019
    Assignee: ELEKTA AB (PUBL)
    Inventor: Per Carlsson
  • Patent number: 10381196
    Abstract: A charged particle beam writing apparatus includes an enlarged pattern forming circuitry to form an enlarged pattern by enlarging a figure pattern to be written, depending on a shift number which is defined by the number of writing positions shifted in the x or y direction in plural writing positions where multiple writing is performed while shifting the position, a reduced pattern forming circuitry to form a reduced pattern by reducing the figure pattern, depending on the shift number, and an irradiation coefficient calculation circuitry to calculate an irradiation coefficient for modulating a dose of a charged particle beam irradiating each of small regions, using the enlarged and reduced patterns.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: August 13, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Hironobu Matsumoto
  • Patent number: 10377613
    Abstract: A forklift truck includes a two-dimensional rangefinder, a mover device, a calculator, and a determiner. The two-dimensional rangefinder emits a measurement wave in a downwardly inclined direction from above and toward a first load and measures a distance to a measurement point located on a surface of the first load. The mover device moves the two-dimensional rangefinder. The calculator calculates a longitudinal distance between the emitting source and the measurement point. The determiner determines that the first load is in a condition in which there is a level difference between a front part and a rear part of an upper surface of the first load, and the front part is higher than the rear part, when a variation in the longitudinal distance that is generated in response to a displacement of the two-dimensional rangefinder moved by the mover device exceeds an upper limit of a specified threshold range.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: August 13, 2019
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventor: Shinya Goto
  • Patent number: 10308006
    Abstract: A method for calibrating light is adapted to a 3D object generating apparatus including a housing, an optical-transparent component, and a laser light generator. The housing has an accommodating space and an opening communicating with the accommodating space. The optical transparent component is arranged on the opening, and the laser light generator is arranged within the accommodating space. The method includes the following steps: providing a first photodetector and a controller, the controller is electrically connected to the first photodetector and the laser light generator; using the controller to drive the laser light generator to generate the light and perform a scanning procedure; and stopping the scanning procedure when the first photodetector detects the light generated by the laser light generator, and then performing a 3D object generating procedure in the working region by moving the laser light generator with a preset distance.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: June 4, 2019
    Assignees: XYZPRINTING, INC., KINPO ELECTRONICS, INC.
    Inventors: Ching-Yuan Chou, Min-Hsiung Ding
  • Patent number: 10237984
    Abstract: A method produces a multilayer element with a substrate and at least one conductor structure connected in an areal manner to the substrate, which has first regions of electrically conductive material, which is present in accordance with a prescribed pattern, while electrically non-conductive second regions lie between the first regions.
    Type: Grant
    Filed: May 27, 2013
    Date of Patent: March 19, 2019
    Assignee: 3D-Micromac AG
    Inventors: Tino Petsch, Maurice Clair, Alexander Böhm, Martin Sachse
  • Patent number: 10234280
    Abstract: A method for target measurement is provided which comprises designing a reflection-symmetric target and measuring overlays of the target along at least one reflection symmetry direction of the target. Also, a tool calibration method comprising calibrating a scatterometry measurement tool with respect to a reflection symmetry of a reflection symmetric target. Further provided are methods of measuring scatterometry overlay using first order and zeroth order scatterometry measurements of a reflection-symmetric scatterometry targets. Also, a scatterometry target comprising a reflection-symmetric target having two cells in each of at least two measurement directions, wherein respective cells have different offsets along one measurement direction and similar offsets along other measurement directions. Further, a scatterometry measurement system comprising a reflection symmetric illumination and calibrated to measure reflection symmetric targets.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: March 19, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Daniel Kandel
  • Patent number: 10184218
    Abstract: A marker light is a device that provides referential pivoting and precision boundary marking required for parking or docking articulate vehicles during poor visibility conditions. The marker consists of 12 primary features, an upper shell housing, a sealed circular window for white light passage, a sealed slotted window for laser light passage, internal reinforcement, a white up light, a laser beam transform lens, a laser beam source, a rechargeable battery pack, a recharging port, a wiring harness, a lower base plate, and an on/off switch. The up light pinpoints substantially the optimum pivot location during the parking or docking process. The developed laser plane—resulting from the laser beam passing through the transform lens—enables two marking orientations for the driver from one continuous laser impingement curve. From a top view perspective, orientation 1 marks parallel on the ground for aligning the trailer while orientation 2 marks perpendicular to the vertical dock wall.
    Type: Grant
    Filed: June 10, 2014
    Date of Patent: January 22, 2019
    Inventors: Mark Belloni, James Robert Hartley
  • Patent number: 10184916
    Abstract: Systems, methods, and devices are disclosed for inspecting a manufacturing component. Devices include a centering device configured to modify a position of an ultrasonic probe assembly relative to a manufacturing component to bisect an angle associated with the manufacturing component. Devices may also include a surface sensing device configured to sense a curvature associated with the manufacturing component. Devices may further include a plurality of sensors configured to measure a first displacement value associated with the centering device and a second displacement value associated with the surface sensing device. The devices may include a control circuit configured to determine a position adjustment value based on at least one of the first displacement value and the second displacement value. The devices may also include an actuator configured to modify a position of an ultrasonic transducer based, at least in part, on the position adjustment value.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: January 22, 2019
    Assignee: The Boeing Company
    Inventors: Dennis Sarr, Hien Bui, Christopher Brown
  • Patent number: 10186398
    Abstract: A sample positioning method that can easily and quickly position a target observation area of a sample, which is disposed on a sample stage in a sample chamber of a charged particle beam apparatus, into a field of view of a first charged particle beam.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: January 22, 2019
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Masahiro Kiyohara, Kengo Takeno, Atsushi Uemoto, Kaoru Umemura
  • Patent number: 10186438
    Abstract: A method and an apparatus for use in processing a wafer are disclosed. In an embodiment the method includes providing a wafer on a receptacle, shining a light at an edge of the wafer and based on light that passed the edge of the wafer, processing the wafer on the receptacle.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: January 22, 2019
    Assignee: Infineon Technologies AG
    Inventors: Thomas Fischer, Gerald Lackner, Walter Horst Leitgeb, Michael Lecher
  • Patent number: 10150505
    Abstract: A hitch assist system for a vehicle comprises a camera mounted to view a reverse path of a vehicle, an input device connected for the hitch assist system, and a controller. The controller includes instructions for detecting a trailer proximate to a vehicle with the camera, determining a vehicle hitch ball location, determining a trailer hitch location, and calculating a vehicle path from an initial position to a final position. The vehicle hitch ball is laterally aligned with the trailer hitch in the final position. The controller also includes instructions for calculating the steering and braking maneuvers necessary to move the vehicle along the path to the final position and sending instructions to a vehicle steering system and a vehicle brake system to perform the calculated maneuvers.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: December 11, 2018
    Assignee: CONTINENTAL AUTOMOTIVE SYSTEMS, INC.
    Inventors: Brandon Herzog, Hao Sun, Joyce Chen, Ibro Muharemovic
  • Patent number: 10144711
    Abstract: The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: December 4, 2018
    Assignee: PELOTON THERAPEUTICS, INC.
    Inventors: Darryl David Dixon, Jonas Grina, John A. Josey, James P. Rizzi, Stephen T. Schlachter, Eli M. Wallace, Bin Wang, Paul Wehn, Rui Xu, Hanbiao Yang
  • Patent number: 10121660
    Abstract: A method of fabricating a semiconductor device includes forming a metal film including Cu on a substrate, forming a protective film on the metal film, forming a hard mask including TaOx, where x is 2.0 to 2.5, on the protective film, forming a hard mask pattern by patterning the hard mask, and forming a metal wiring by patterning the metal film, using the hard mask pattern as an etching mask.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: November 6, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: So Young Lee, Hyun Su Kim, Jong Won Hong