Abstract: The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.

Abstract: A system includes a patient support and an outer gantry on which an accelerator is mounted to enable the accelerator to move through a range of positions around a patient on the patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach a target in the patient. An inner gantry includes an aperture for directing the proton or ion beam towards the target.

Abstract: Process and system for processing a thin film sample, as well as at least one portion of the thin film structure are provided. Irradiation beam pulses can be shaped to define at least one line-type beam pulse, which includes a leading portion, a top portion and a trailing portion, in which at least one part has an intensity sufficient to at least partially melt a film sample. Irradiating a first portion of the film sample to at least partially melt the first portion, and allowing the first portion to resolidify and crystallize to form an approximately uniform area therein. After the irradiation of the first portion of the film sample, irradiating a second portion using a second one of the line-type beam pulses to at least partially melt the second portion, and allowing the second portion to resolidify and crystallize to form an approximately uniform area therein.

Abstract: A system includes a patient support and an outer gantry on which an accelerator is mounted to enable the accelerator to move through a range of positions around a patient on the patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach a target in the patient. An inner gantry includes a robotic arm capable of directing an aperture for directing the proton or ion beam towards the target.

Abstract: A radiation therapy device includes an irradiation field limiting apparatus. The irradiation field limiting apparatus includes a collimator for adjusting the irradiation field, and a verification apparatus for visually verifying the irradiation field. The verification apparatus is configured such that the irradiation field is optically displayed on a patient that is positioned at a distance from the isocenter of the radiation therapy device.

Abstract: The invention concerns a device and a process for adjusting the range of an ion beam, in particular for irradiation in tumor therapy. For this purpose, first the reference position of a target volume to be irradiated is determined. Subsequently, the range of an ion beam is configured such that said beam is adjusted to the reference position of the target volume, in such a manner that the Bragg peak, i.e. the maximal energy loss and thereby the maximal damage occurs in the region of the target volume which is to be destroyed. In the case that it has been determined that the reference position has been altered by a movement of the target volume, the ion beam is then deflected from the beam axis such that the ion beam is directed to various regions of a range modulator, in order that the ion beam experience a correspondingly adjusted energy loss in passing through the range modulator.

Abstract: A system for performing sample probing. The system including an topography microscope configured to receive three-dimensional coordinates for a sample based on at least three fiducial marks; receive the sample mounted in a holder; and navigate to at least a location on the sample based on the at least three fiducial marks and the three-dimensional coordinates.

Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head is capable of micro tilting a work piece and comprises a case, a shaft assembly, an electrostatic chuck, a first driving mechanism and a micro-tilt mechanism. The shaft assembly passes through a first side of the case and has a twist axis. The electrostatic chuck is fastened on a first end of the shaft assembly outside the case for holding the work piece. The first driving mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to rotate about the twist axis. The micro-tilt mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to tilt relative to the case.

Abstract: A method and a system for positioning an apparatus for monitoring a parameter of one or more parabolic reflectors of a solar thermal field, wherein the method comprises positioning the apparatus at a first field location responsive to the position of the respective parabolic reflector, acquiring information of an absorber tube of the respective parabolic reflector, and positioning the apparatus at the second field location responsive to the information of the absorber tube, the second field location being beyond the focus of the respective parabolic reflector is provided.

Abstract: A settling time acquisition method includes writing at least one reference pattern formed by at least one shot of a charged particle beam, writing an evaluation pattern, which has been formed by combination of the first and second shots of a charged particle beam shaped to first and second patterns of different sizes and whose width size is the same as that of the reference pattern, while changing, concerning beam shaping of the second shot, a settling time of a DAC amplifier, wherein writing is performed for each settling time, measuring the width size of the reference pattern, measuring the width size of the evaluation pattern for each settling time, calculating, for each settling time, a difference between the width sizes of the reference and evaluation patterns, and acquiring a settling time from each settling time of the DAC amplifier when the difference is not exceeding a threshold value.

Abstract: Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate.

Abstract: A light-guiding cover structure includes a top cover unit and a light-guiding unit. The top cover unit has a plurality of receiving spaces formed therein. The light-guiding unit includes a plurality of light-guiding groups, wherein each light-guiding group includes a plurality of optical fiber cables received in the corresponding receiving space, and each optical fiber cable has two opposite ends exposed from the bottom surface of the top cover unit and respectively facing at least one light-emitting device and at least one light-sensing device that have been disposed under the top cover unit. Therefore, the optical fiber cables received in the corresponding receiving space, thus when the light-guiding cover structure is applied to the LED package chip classification system, the aspect of the LED package chip classification system can be enhanced.

Abstract: The movement-free bending method means the one of deformation methods for a one- or two-dimensional nanostructures using an ion beam capable of bending and deforming them and furthermore, changing a bending direction without requiring a motion such as a rotation of the nanostructures. The present invention affords a movement-free bending method for deforming the nanostructure 20 having the one-dimensional or two-dimensional shape by irradiating the ion beam 10, wherein a bending direction of the nanostructure 20 is controlled depending on energy of the ion beam 10 or a thickness of the nanostructure 20.

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.

Abstract: Ion implantation systems that separate the flow of ions from the flow of neutral particles are disclosed. The separation of neutral particles from ions can be achieved by manipulating the flow of ions in the system through variations in electrical or magnetic fields disposed within the implantation system. The path of neutral particles is less affected by electrical and magnetic fields than ions. The separation of these flows may also be accomplished by diverting the neutral particles from the ion beam, such as via an introduced gas flow or a flow blockage. Both separation techniques can be combined in some embodiments.

Abstract: A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support intervenes between the first electrode and the second electrode to electrically insulate the first and second electrodes from each other and to support the first and second electrodes in a predetermined positional relationship. A side surface of the support intervenes between the first electrode and the second electrode and includes a non-flat portion having at least one of a projected portion and a depressed portion, and includes a tapered portion. A taper angle formed by the tapered portion and the surface having the aperture of the second electrode is greater than zero degree and less than ninety degrees.

Abstract: There are provided an evaluation device and an evaluation method for a substrate mounting apparatus capable of simply evaluating a temperature control function of the substrate mounting apparatus depending on evaluation conditions or circumstances and an evaluation substrate used for the same. The substrate mounting apparatus holds a target substrate mounted on a mounting surface and controls a temperature of the target substrate. The evaluation device includes an evacuable airtight chamber in which the substrate mounting apparatus is provided; an evaluation substrate which is mounted on the mounting surface instead of the target substrate and includes a self-heating resistance heater; and a temperature measurement unit which measures a temperature of the evaluation substrate.

Abstract: Charged particle beam apparatus arrangements in which either a first noise absorber which provides noise absorbing performance specialized for a first frequency range including the natural frequency of the charged particle beam apparatus as reference, or a second noise absorber which provides noise absorbing performance specialized for a second frequency range including the frequency of acoustic standing waves generated within the cover as reference, or both of the first and second noise absorbers is/are disposed within a cover of the charged particle beam apparatus.

Abstract: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

Abstract: A method for acquiring a settling time according to an embodiment, includes writing a plurality of first patterns, arranged in positions apart from each other by a deflection movement amount, by using a DAC amplifier in which a settling time of the DAC amplifier is set to a first time to be a sufficient settling time; writing a plurality of second patterns, in a manner where corresponding first and second patterns are in a position adjacent, for each second time of different second times containing the sufficient settling time set as variable; measuring a width dimension of each of a plurality of combined patterns after adjacent first and second patterns are combined for the each second time set as variable; and acquiring the settling time of the DAC amplifier needed for deflection by the deflection movement amount, using the width dimensions.

Abstract: An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts, where the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region, the overlapping region of at least one of the first photomask and the overlapping region of the second photomask includes at least two subregions, and shapes or arrangements of the transmission parts in the at least two subregions are different from each other.

Abstract: The invention relates to a charged particle beam lithography system comprising: a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction, a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column, wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

Abstract: Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus.

Abstract: A foot/shoe sanitizing system includes a housing having at least one opening and at least one ultraviolet emitting device supported within the housing. The ultraviolet emitting devices direct ultraviolet light around and/or through the set of foot/shoe support bars towards the foot or shoe placed on the foot/shoe support bars. The ultraviolet emitting devices are controllably powered to emit ultraviolet light and/or ozone onto the foot/shoe. In a preferred embodiment, the ultraviolet emitting device emits light that includes short wavelength ultraviolet light, causing the formation of ozone in the area of the shoe, thereby killing pathogens that are not easily killed with ultraviolet light alone. The system includes a sheet of activated carbon for catalyzing the ozone into harmless concentrations of carbon monoxide and carbon dioxide.

Abstract: A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.

Abstract: A system for recording computed tomography image data of an object in an object area comprises an X-ray source and an X-ray detector arranged at either side of the object area, the X-ray source having a flying focal spot from which X-rays is emitted and the X-ray detector comprising pixels arranged in at least one row for recording images of the object. A device is provided for rotating the X-ray source and the X-ray detector with respect to the object around an axis of rotation, while the at least one row of pixels record images of the object.

Abstract: A charged particle beam drawing apparatus includes: a charged particle optical system; a substrate stage; an interferometer configured to measure a position of the stage in the direction of the optical axis of the charged particle optical system; a measuring device configured to measure a characteristic of the charged particle beam; and a controller configured to correct the measurement, obtained by the interferometer, using correction information. The controller is configured to cause first measurement as measurement by the interferometer and second measurement as measurement by the measuring device to be performed in parallel, and to obtain the correction information based on the first measurement and the second measurement obtained with respect to each of the plurality of positions.

Abstract: A drawing apparatus include: a charged particle optical system configured to generate M×N charged particle beams; a limiting device configured to limit number of charged particle beams that the charged particle optical system emits toward a substrate; and a controller configured, if an abnormal beam that does not satisfy a use condition is present among the M×N charged particle beams, to control the limiting device such that only m rows, each of the m rows including n charged particle beams that are successive without intervention of the abnormal beam.

Abstract: A charged particle beam drawing apparatus of an embodiment includes: a drawing unit to perform drawing on a workpiece on a stage by using a charged particle beam; multiple marks located on the stage and having different heights; an irradiation position detector to, when any of the marks is irradiated with the charged particle beam, detect an irradiation position of the charged particle beam on a mark surface of the mark; a drift-amount calculation unit to calculate a drift amount of the charged particle beam on the mark surface by using the irradiation position; a drift-amount processing unit to obtain a drift amount on a workpiece surface by using the drift amounts on at least two of the mark surfaces; and a drawing controller to correct an is irradiation position of the charged particle beam by using the drift amount on the workpiece surface.

Abstract: A system for electron pattern imaging includes: a device for converting electron patterns into visible light provided to receive an electron backscatter diffraction (EBSD) pattern from a sample and convert the EBSD pattern to a corresponding light pattern; a first optical system positioned downstream from the device for converting electron patterns into visible light for focusing the light pattern produced by the device for converting electron patterns into visible light; a camera positioned downstream from the first optical system for obtaining an image of the light pattern; an image intensifier positioned between the device for converting electron patterns into visible light and the camera for amplifying the light pattern produced by the device for converting electron patterns into visible light; and a device positioned within the system for protecting the image intensifier from harmful light.

Abstract: A luminance sensing system and method and a computer program product thereof are provided. The system includes: a first luminance sensing unit, arranged at a first position, and used for sensing a light ray luminance at the first position to generate a first illumination value; a second luminance sensing unit, arranged at a second position, having a displacement unit, and used for sensing a light ray luminance at the second position to generate a second illumination value; and a computing unit, electrically connected to the first luminance sensing unit, the displacement unit, and the second luminance sensing unit, and used for acquiring the first illumination value and the second illumination value, acquiring luminance range information by using the first illumination value. When the second illumination value does not conform to the luminance range information, the computing unit controls the displacement unit to move the second luminance sensing unit.

Abstract: Provided is a sample device for a charged particle beam, which facilitates the delivery of a sample between an FIB and an SEM in an isolated atmosphere. An atmosphere isolation unit 10 for putting a lid 9 on an atmosphere isolation sample holder 7 isolated from the air and taking the lid 9 off the sample holder, is provided in a sample exchanger 5 that communicates with a sample chamber 4 of the FIB 1 or the SEM through a gate; and the lid 9 is taken off only by pushing a sample exchange bar 11, and thereby only the sample holder 7 is set in the sample chamber 4.

Abstract: The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

Abstract: A chucking member for holding a target is removably mounted on a chucking stage with a plurality of vacuum holes. the chucking member has a substrate removably mounted on the chucking stage. The substrate has a vacuum region in which the target being to be arranged, the vacuum region allowing gas to be vacuumed through a part of the plurality of the vacuum holes, and a vacuum inhibition region provided around the vacuum region, the vacuum inhibition region covering the other of the vacuum holes to inhibit the gas from being vacuumed through the other of the vacuum holes.

Abstract: An in situ optical specimen holder is disclosed which allows imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid and the source of such radiation may be located within the body of the holder itself. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 ?m. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

Abstract: A foot/shoe sanitizing system includes a housing having at least one opening and at least one ultraviolet emitting device supported within the housing. The ultraviolet emitting devices direct ultraviolet light around and/or through the set of foot/shoe support bars towards the foot or shoe placed on the foot/shoe support bars. The ultraviolet emitting devices are controllably powered to emit ultraviolet light and/or ozone onto the foot/shoe. In a preferred embodiment, the ultraviolet emitting device emits light that includes short wavelength ultraviolet light, causing the formation of ozone in the area of the shoe, thereby killing pathogens that are not easily killed with ultraviolet light alone. The system detects the identity of a user and records/transmits usage of the system by the user for sanitizing enforcement and recording.

Abstract: A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

Abstract: A device, system and method for identifying an object. The device comprises an identification badge comprising a surface at least partially reflective to infrared light and having an insignia thereon, and a source of infrared light co-located with the badge and comprising at least one infrared light emitting LED. The source and the badge are both secured to the object and the source is positioned relative to the badge such that the light emitted from the at least one infrared LED falls on the reflective surface.

Abstract: It is a task to provide a mobile electronic device with high operability and high safety. The mobile electronic device includes an image projector that projects an image, a cabinet, an input unit that is disposed on the cabinet and detects an operation input by an operator, and a control unit that controls the operation of the image projector and the state of the input unit. The task is solved in such a manner that when a predetermined operation is detected by the input unit, the control unit stops emission of light from the image projector or reduces an amount of light emitted from the image projector.

Abstract: A patient platform for making the position and posture of a diseased site coincide with those established by a treatment plan. Translation units translate a top board in the X, Y and Z directions respectively, in a fixed coordinate system. Rotation units rotate the top board in the ?, ?, and ? directions respectively. A controller controls the translation units and rotation units, based on desired rotation center point and desired rotation angle. The controller has a rotation drive signal generation unit that generates a signal for moving the top board in a rotating manner from the reference state “a” of the translation units and the rotation units to a desired rotation angle; and a translation drive signal generation unit that generates a signal for translating the translation units so the amount of translation movement, of the desired rotation center point, caused by the rotation movement is a predetermined value.

Abstract: A method for supplying gas over a substrate in a reaction chamber wherein a substrate is placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber to a second side of the reaction chamber opposite to the first side; and adding a second gas to the first gas from sides of the reaction chamber other than the first side of the reaction chamber so that the second gas travels from sides of the substrate other than the first side in a downstream direction.

Abstract: Methods and apparatus are provided for planning and delivering radiation treatments by modalities which involve moving a radiation source along a trajectory relative to a subject while delivering radiation to the subject. In some embodiments the radiation source is moved continuously along the trajectory while in some embodiments the radiation source is moved intermittently. Some embodiments involve the optimization of the radiation delivery plan to meet various optimization goals while meeting a number of constraints. For each of a number of control points along a trajectory, a radiation delivery plan may comprise: a set of motion axes parameters, a set of beam shape parameters and a beam intensity.

Abstract: An electron beam lithography apparatus includes a beam current detector which detects, during drawing of the drawing data, fluctuation of an irradiation position of the electron beam at non-irradiation on the substrate; a beam position error detector which detects a beam position error of the electron beam based on the fluctuation of the irradiation position; a drive position error detector which detects a drive position error of the stage due to rotation and translation drive during drawing of the drawing data; and a corrector which corrects the irradiation position of the electron beam during the drawing based on the beam position error and the drive position error.

Abstract: A robotic treatment delivery system including a linear accelerator (LINAC), and a robotic arm coupled to the LINAC. The robotic arm is configured to move the LINAC along at least four rotational degrees of freedom and one substantially linear degree of freedom.

Abstract: An inspection device carries out beam scanning on a stable scanning cycle by enabling flexible change of various scanning sequences according to inspection conditions thereof, and at the same time, eliminates as much unevenness as possible in scanning cycle which hinders stabilization of charging. A beam scanning scheduler schedules beam scanning based on an inputted scanning condition, and a programmable sequencer carries out beam scanning control according to a beam scanning schedule generated by the beam scanning scheduler. The scanning scheduler calculates scanning line reference coordinates on a scanning-line-by-scanning-line basis, based on the scanning condition, and issues a scanning cycle trigger. The programmable sequencer controls supply timing of the scanning line reference coordinates and a scanning position on an in-line pixel-by-pixel basis, based on line scanning procedure information and the scanning cycle trigger provided from the beam scanning scheduler.

Abstract: A radiotherapy device having a gantry rotatably mounted to the radiotherapy device with a bearing and a counterweight attached to the gantry. The counterweight has a spatial position relative to the gantry. The spatial position of the counterweight is movable. The device is configured to generate a compensating torque on the bearing, the compensating torque based on a movement of the spatial position of the counterweight, to balance the gantry.

Abstract: Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.

Abstract: A method for adjusting or aligning one or more optical elements in a Transmission Electron Microscope (TEM) is disclosed. The TEM is equipped with an objective lens for guiding a beam of electrons to a sample, a diffraction plane in which at least a beam of unscattered electrons is focused and a structure to enhance the Contrast Transfer Function (CTF) which is situated in the diffraction plane or an image thereof.

Abstract: A radiation therapy apparatus includes a gantry having a central aperture that defines a cavity, in which a patient is positionable. The apparatus also includes a positioning device, with which the patient is positionable in the central aperture of the gantry, and a radiation head for generating therapeutic radiation. The apparatus includes an extension mechanism for the radiation head. The extension mechanism may be operated, such that in a first operating mode, the radiation head is disposable inside the gantry, such that the gantry has, on a side facing the positioning device, a front surface that constitutes a front limit of the radiation therapy apparatus toward the positioning device. In the first operating mode, the radiation head is behind the front surface viewed from the positioning device. In a second operating mode, the radiation head, viewed from the positioning device, may be moved out in front of the front surface.

Abstract: The present invention is disclosed an array-type-transducer-based high-power ultrasound delivery system which includes a support bracket, an array-type ultrasound transducer, and a plurality of containers. The support bracket includes a plurality of grooves, and the array-type ultrasound transducer includes a clamp and N ultrasound transducers. The clamp includes a plurality of wedges configured for engaging in the grooves of the support bracket and thereby connecting the array-type ultrasound transducer to the support bracket. The containers are arranged in a two-dimensional matrix so that the ultrasound transducers of the array-type ultrasound transducer can dip into and leave the ultrasound-conducting medium in the containers vertically. The disclosed system features high operation speed and low labor requirement. Moreover, the depth by which and the time for which the ultrasound transducers dip into the ultrasound-conducting medium in the containers can be controlled and quantified.