Abstract: A method of forming a semiconductor device includes forming a molding layer and a supporter layer on a substrate including an etch stop layer, forming a mask layer on the supporter layer, forming a first edge blocking layer on the mask layer, forming a mask pattern by etching the mask layer, forming a hole, forming a lower electrode in the hole, forming a supporter mask layer on the supporter layer, forming a second edge blocking layer on the supporter mask layer, forming a supporter mask pattern by patterning the supporter mask layer, forming a supporter opening passing through the supporter layer, removing the molding layer, forming a capacitor dielectric layer and an upper electrode on the lower electrode, forming an interlayer insulating layer on the upper electrode, and planarizing the interlayer insulating layer. The hole passes through the supporter layer, the molding layer and the etch stop layer.

Abstract: A vehicle includes a traction battery having a plurality of battery cells positioned in an array with a non-conductive bus bar housing having a plurality of compartments insulated from one another and containing one or more bus bars each having an integrally formed voltage sense connector. Each compartment may accommodate terminals of a pair of adjacent battery cells to be coupled by the associated bus bar. The voltage sense connector may include fingers for crimping and securing a voltage sense wire or a welding pad for welding, soldering, or similar connection. The voltage sense wires connect to a battery control module.

Abstract: Apparatus, methods, and systems are provided for a memory layer layout for a three-dimensional memory. The memory layer includes a plurality of memory array blocks; a plurality of memory lines coupled thereto; and a plurality of zia contact areas for coupling the memory layer to other memory layers in a three-dimensional memory. The memory lines extend from the memory array blocks, are formed using a sidewall defined process, and have a half pitch dimension smaller than the nominal minimum feature size capability of a lithography tool used in forming the memory lines. The zia contact areas have a dimension that is approximately four times the half pitch dimension of the memory lines. The memory lines are arranged in a pattern that allows a single memory line to intersect a single zia contact area and to provide area between other memory lines for other zia contact areas. Other aspects are disclosed.

Abstract: An SRAM cell of a semiconductor device includes a load transistor, a driver transistor and an access transistor. First source/drains of the load, driver and access transistors are connected to a node. A power line, a ground line and a bit line are electrically connected to second source/drains of the load transistor, the driver transistor and the access transistor. The power line, the ground line and the bit line are disposed at substantially the same level to extend in a first direction. A word line is electrically connected to a gate of the access transistor to extend in a second direction perpendicular to the first direction. The word line is disposed at a different level from the level of the power line, the ground line and the bit line.

Abstract: The present invention provides apparatus, methods, and systems for a memory layer layout for a three-dimensional memory. The memory layer includes a plurality of memory array blocks; a plurality of memory lines coupled to the memory array blocks; and a plurality of zia contact areas for coupling the memory layer to other memory layers in a three-dimensional memory. The memory lines extend from the memory array blocks and are formed using a sidewall defined process. The memory lines have a half pitch dimension smaller than the nominal minimum feature size capability of a lithography tool used in forming the memory lines. The zia contact areas have a dimension that is approximately four times the half pitch dimension of the memory lines. The memory lines are arranged in a pattern adapted to allow a single memory line to intersect a single zia contact area and to provide area between other memory lines for other zia contact areas. Numerous additional aspects are disclosed.

Abstract: A mask read-only memory (ROM) includes parallel doping lines of a second conductivity type formed in a substrate of a first conductivity type, a first insulation film formed on the doping lines and the substrate, conductive pads fainted on the first insulation film, a second insulation film formed on the first insulation film and the conductive pads, parallel wires formed on the second insulation film extending perpendicular to the doping lines, contact plugs formed in the first insulation film that connect the doping lines to the conductive pads, and vias formed in the second insulation film that connect the conductive pads to the wires, wherein crossings of the doping lines and the wires define memory cells, contact plugs and vias are formed in memory cells of a first type, and at least one of the contact plug and via are missing from memory cells of a second type.

Abstract: According to an aspect of the present invention, there is provided a semiconductor IC that includes a plurality of standard cells arranged in a first direction on a semiconductor substrate, and a first diffusion layer connected to a first power source and a second diffusion layer connected to a second power source in the each standard cell, wherein the first diffusion layers as well as the second diffusion layers of neighboring standard cells are integrally formed.

Abstract: A semiconductor device includes a plurality of source regions and drain regions disposed on a semiconductor substrate. The semiconductor device also includes a plurality of word lines disposed on the semiconductor substrate between the source regions and the drain regions. The semiconductor device also includes a conductive line disposed on the semiconductor substrate parallel to the word lines. The semiconductor device also includes a plurality of bit lines connected to the drain regions and crossing over the word lines. The semiconductor device also includes a plurality of source strapping lines crossing over the plurality of word lines, the plurality of source strapping lines being connected to at least one of the plurality of source regions and the conductive line. The semiconductor device also includes a ground line connected to the conductive line.

Abstract: An apparatus and method for the reduction of gate leakage in deep sub-micron metal oxide semiconductor (MOS) transistors, especially useful for those used in a cross coupled static random access memory (SRAM) cell, is disclosed. In accordance with the invention, the active element of the SRAM cell is used to reduce the voltage on the gate of its transistor without impacting the switching speed of the circuit. Because the load on the output of the inverter is fixed, a reduction in the gate current is optimized to minimize the impact on the switching waveform of the memory cell. An active element formed by two materials with different Fermi potentials is used as a rectifying junction or diode. The rectifying junction also has a large parallel leakage path, which allows a finite current flow when a signal of opposite polarity is applied across this device.

Abstract: A pressure sensor includes a base substrate silicon fusion bonded to a cap substrate with a chamber disposed between the base substrate and the cap substrate. Each of the base substrate and the cap substrate include silicon. The base substrate includes walls defining a cavity and a diaphragm portion positioned over the cavity, wherein the cavity is open to an environment to be sensed. The chamber is hermetically sealed from the environment.

Abstract: A method for providing a high power, low resistance, high efficient vertical DMOS device is disclosed. The method comprises providing a semiconductor substrate with a source body structure thereon. The method further comprises providing a plurality of slots in the source/body structure and providing a metal within the plurality of slots to form a plurality of structures. A slotted PowerFET array is disclosed. This slotted approach results in a dense PowerFET, a low Ron due to the slotted design, an oxide isolated process without any due extra steps other than the slots, lower capacitance, lower leakage, smaller die, improved heat transfer, improved electro-migration, lower ground resistance, less cross talk, drops the isolation diffusion and the sinker diffusion, mostly low temperature processing and provides double metal with single metal processing.

Abstract: An apparatus including a trolling motor having at least one operational subsystem and the trolling motor also having an integral electronic controller for controlling the operational subsystem wherein the improvement comprises an integral electronic diagnostic system which will receive diagnostic information from the operational subsystem and will transmit the diagnostic information for reception externally of the trolling motor.

Abstract: A semiconductor integrated circuit device has a plurality of CMOS-type base cells arranged on a semiconductor substrate and m wiring layers, and gate array type logic cells are composed of the base cells and the wiring layers. Wiring within and between the logic cells is constituted by using only upper n (n<m) wiring layers. It becomes possible to shorten a development period and reduce a development cost when a gate array type semiconductor integrated circuit device becomes large in scale.

Abstract: A standard cell is read from a library and automatic layout wiring is performed, thereby configuring a circuit. Next, each cell column in the configured circuit is searched for an empty region. In the empty region in the cell column searched for, a spacer cell or a filler cell is placed. At this time, using the spacer cell or filler cell, the well potential of the standard cells in the cell column is fixed.

Abstract: A memory capable of reducing the memory cell size is provided. In this memory, a first gate electrode of a first selection transistor and a second gate electrode of a second selection transistor are provided integrally with a word line, and arranged to obliquely extend with respect to the longitudinal direction of a first impurity region on a region formed with memory cells and to intersect with the first impurity region on regions formed with the first selection transistor and the second selection transistor in plan view.

Abstract: A 2-bit cell is made up of first and second diffusion regions provided on a substrate surface, first and second storage nodes adjacent to the first and second diffusion region, first and second gate electrodes provided on first and second storage nodes, a third storage node provided on the substrate and a third gate electrode provided on the third storage node. The first and second gate electrodes are connected common to form word line electrodes. A control gate electrode at right angles to the word line electrodes and a third diffusion region in the substrate surface disposed at a longitudinal end of the control gate electrode are provided. A storage node, Node 1, of interest, with the control gate channel as a drain, is read without the intermediary of the second node, which is not of interest, such that reading of Node 1 unaffected by the second node.

Abstract: Within a method for fabricating a microelectronic fabrication there is first provided a substrate. There is then formed over the substrate a spirally patterned conductor layer which terminates in a microelectronic structure within the center of the spirally patterned conductor layer. The spirally patterned conductor layer forms a planar spiral inductor, and the microelectronic structure formed within the center of the spirally patterned conductor layer further comprises a series of electrically interconnected sub-patterns. The method contemplates a microelectronic fabrication fabricated in accord with the method. The microelectronic fabrication is fabricated with optimal performance while occupying minimal microelectronic substrate area.

Abstract: In a memory cell, the substrate contact region of an NMOS transistor and the well contact region of a PMOS transistor are arranged perpendicularly to a floating gate. In a cell array, the memory cell and another memory cell arranged axisymmetrically with respect to the memory cell are alternately arranged in the column direction to constitute a sub array, and the sub arrays arranged in the column direction are arranged in parallel or axisymmetically in the row direction. With this arrangement, the substrate contact region, the well contact region, and the diffusion region of the PMOS transistor can be shared between the adjacent memory cells, thereby reducing the area of the cell array.

Abstract: A semiconductor memory device, adapted for storing plural bits per cell to be able to accomplish high storage density by a simplified structure, includes a plurality of first gate electrodes extending parallel to one another along one direction and a plurality of second gate electrodes extending in a direction of intersecting the first gate electrodes, in which a diffusion region is provided on each of a plurality of divisions demarcated in a matrix-like pattern by first and second electrodes on a substrate surface. One of the divisions, the four sides of which are defined by two neighboring first gate electrodes and two neighboring second gate electrodes, has four independently accessible bits, and is connected by a contact (CT) with a diffusion region in the division. There are provided a plurality of interconnections connected via contacts to the diffusion regions of other divisions in the plural matrix-like divisions lying on the line of extension of the aforementioned diagonal line.

Abstract: In a nonvolatile memory array in which each cell (110) has two floating gates (160), for any two consecutive memory cells, one source/drain region (174) of one of the cells and one source/drain region of the other one of the cells are provided by a contiguous region of the appropriate conductivity type (e.g. N type) formed in a semiconductor substrate (120). Each such contiguous region provides source/drain regions to only two of the memory cells in that column. The bitlines (180) overlie the semiconductor substrate in which the source/drain regions are formed. The bitlines are connected to the source/drain regions.

Abstract: A placing and wiring method for a master slice type semiconductor integrated circuit is provided. The method is conducted by an automatic placing and routing apparatus with respect to a master slice 100 having a plurality of basic cells 110 formed in a matrix, in which first and second power source wirings 170 and 171 that traverse the plurality of basic cells 110 are connected to a plurality of signal wirings that are formed along a vertical direction to provide connections within each of the plurality of basic cells 110 and/or between the plurality of basic cells 110. The method includes: a first step of registering in the automatic pacing and routing apparatus definitions of effective pin positions A1-A14, B2-B13 and C1-C14; a second step of registering a net list in the automatic placing and routing apparatus; and a third step of determining the placement of pin positions and wiring routes, based on data for the definitions of the effective pin positions and the net list.

Abstract: A nonvolatile semiconductor memory device includes comprises: an element isolation region being in contact with a first element region, an insulating film covering a memory cell, a peripheral transistor and the element isolation region, an inter-level insulating film provided on the surface of the insulating film, and a contact hole provided in the inter-level insulating film and the insulating film. The inter-level insulating film contains an insulator different from the insulating film. The contact hole reaches at least one of source and drain diffusion layers of the memory cell and overlaps the element isolation region. The insulating film contains an insulator different from the element isolation region and the insulating film is harder for an oxidizing agent to pass therethrough than a silicon oxide film. A surface of the insulating film is oxidized.

Abstract: A unit cell is disclosed that facilitates the creation of a layout of at least a portion of a microelectromechanical system. The unit cell includes a plurality of electrical traces. Some of these electrical traces pass through the unit cell. Other electrical traces extend only part way through the unit cell. At least certain boundary conditions exist for the unit cell that allow the same to be tiled in a row and in a manner that results in adjacently disposed unit cells in the row being electrically interconnected in the desired manner.

Abstract: A very efficient gate array core cell in which the base core cell consists of a group of 6 PMOS transistors and a group of 6 NMOS transistors. It also includes pre-wiring of 2 of the 6 PMOS transistors, with 2 of the 6 NMOS transistors at polysilicon level or at local interconnect level while leaving the remaining PMOS and NMOS transistors as individual transistors to be interconnected during the functional ASIC metallization process. The core cell also has 2 polysilicon or local interconnect wires embedded in it, which can be used to interconnect transistors for logic function implementation. The core cell defined in this invention is highly flexible and has been analyzed to interconnect all types of logic and memory functions needed for ASIC designs. The layout of the transistors, pre-wiring of the strategic transistors at polysilicon level or at local interconnect level, and embedded polysilicon or local interconnect wires reduce the core cell size significantly.

Abstract: A circuit having a plurality of circuit blocks formed on a semiconductor substrate is disclosed. The circuit blocks are stitched together by appropriately connecting input and output lines of the plurality of circuit blocks. The circuit also includes connecting circuits coupled to the plurality of circuit blocks. The connecting circuits provide low voltage drop across boundaries where the plurality of circuit blocks are stitched together.

Abstract: A plurality of bypass capacitors are associated with a plurality of circuit blocks involved in a microcomputer. Each bypass capacitor is disposed between a power input terminal of a corresponding circuit block and a ground line. The circuit blocks are arrayed with respect to a power supply terminal in order of the noise level at the power input terminals of respective circuit blocks, so that a circuit block having a lower noise level is located near the power supply terminal while a circuit block having a higher noise level is located far from the power supply terminal.

Abstract: In the semiconductor device according to the present invention having a plurality of function macro formation regions on the principal face of a semiconductor substrate, the plurality of the function macro formation regions include at least a first function macro formation region where a first function macro is formed and a second function macro formation region where a second function macro different from the first function macro is formed, each function macro formation region has an element formation region where an element is formed, a plurality of dummy semiconductor regions where no element is formed and isolation trenches filled with a predetermined insulating material mutually isolating between the plurality of dummy semiconductor regions, and the dummy semiconductor region in one function macro formation region has mutually identical plane shape and identical area and the area of the first dummy semiconductor region included in the first function macro formation region and the area of the second dummy

Abstract: A plurality of memory macros are laid out in a semiconductor chip. Macro ID generation circuits generate macro IDs for identifying the memory macros, and have different layouts. These macro ID generation circuits are arranged outside the memory macros in the semiconductor chip, so that test control blocks in the memory macros can use the same layouts between all the memory macros to reduce the design load.

Abstract: A first plurality of memory cells (32, 33) connected in series lies within a first well (47) that is separated and electrically isolated (42) from a second plurality of memory cells (36 et al.) connected in series lying within a second well (46). In one embodiment, the first and second wells (46, 47) are doped p-type and are contained within an n-well (48) and a substrate (49). Applying a negative voltage to its corresponding bit line and a positive voltage to its corresponding word line programs a predetermined memory cell within the first plurality. A lesser positive voltage than that applied to the predetermined memory cell's word line is applied to all other bit lines and word lines of non-selected memory cells. By utilizing a negative voltage while programming a memory cell, the magnitude of programming voltages is reduced, thereby, removing the need for an elaborate charge pump to generate a much higher programming voltage.

Abstract: An integrated semiconductor chip has at least two metal interconnects of two different metallization planes, which are disposed parallel to one another. The metal interconnects are connected to one another via at least one electrically conductive contact point. The metal interconnects, for each direction, run orthogonally with respect to one another in a first region. For each direction, they run parallel to one another and at an oblique angle to the directions of the metal interconnects of the first region in a second region (20), in which they are contact-connected to one another. This configuration makes it possible, with little influence of electromigration, to have a comparatively small space requirement needed for the contact connection of mutually orthogonal interconnects.

Abstract: An integrated circuit including a DRAM is disclosed, wherein the DRAM includes a memory array including a plurality of pass gate transistors and a plurality of memory elements. The pass gate transistors include a gate material selected to provide a substantially near mid-gap work function or greater. The DRAM also includes a peripheral area including a plurality of logic transistors. In a preferred embodiment the pass gate transistors are silicon-on-insulator transistors.

Abstract: A placing and wiring method for a master slice type semiconductor integrated circuit is provided. The method is conducted by an automatic placing and routing apparatus with respect to a master slice 100 having a plurality of basic cells 110 formed in a matrix, in which first and second power source wirings 170 and 171 that traverse the plurality of basic cells 110 are connected to a plurality of signal wirings that are formed along a vertical direction to provide connections within each of the plurality of basic cells 110 and/or between the plurality of basic cells 110. The method includes: a first step of registering in the automatic pacing and routing apparatus definitions of effective pin positions A1-A14, B2-B13 and C1-C14; a second step of registering a net list in the automatic placing and routing apparatus; and a third step of determining the placement of pin positions and wiring routes, based on data for the definitions of the effective pin positions and the net list.

Abstract: A cells array of mask read only memory, at least includes numerous essentially parallel cells chains and numerous isolation dielectric layers which are located between any two adjacent cells chains. Each cells chain at least includes: numerous gates that located on a substrate, numerous doped regions, numerous polysilicon layers, numerous cover dielectric layers, a conductor layer and numerous isolation dielectric layers.

Abstract: A semiconductor integrated circuit according to the present invention comprises a memory array, an input circuit for writing data in the memory array and reading data from the memory array, an output circuit and a package, including 100 pins, storing the memory array, the input circuit and the output circuit. A fourth pin, an eleventh pin, a twentieth pin, a twenty-seventh pin, a fifty-fourth pin, a sixty-first pin, a seventieth pin and a seventy-seventh pin are supplied with the same voltage. The input circuit and the output circuit receive a power supply voltage from different ones of these pins. Thus, a semiconductor integrated circuit resistant against noise and capable of responding to a high operating frequency is provided.

Abstract: A full CMOS SRAM cell is provided. The SRAM cell includes first and second active regions formed on a semiconductor substrate, arranged parallel to each other. A third active region is formed on the semiconductor substrate between the first active region and the second active region parallel to the first active region, and a fourth active region is formed on the semiconductor substrate between the third active region and the second active region parallel to the second active region. A word line intersects the first and second active regions. A first common conductive electrode intersects the first active region and the third active region, and a second common conductive electrode intersects the second active region and the fourth active region.

Abstract: A semiconductor memory device including a plurality of cell arrays (121 to 128) and a plurality of sense amplifier sections is disclosed. Adjacent cell arrays may have a sense amplifier section disposed between. Sense amplifiers (131 to 163) within a sense amplifier section may be connected to a bit line that is connected to a plurality of memory cells in more than one of the cell arrays (121 to 128). When a cell array (123) is activated, sense amplifier sections that may be distributed around edges of a plurality of cell arrays (122 to 124) may be activated to sense data from the activated cell array (123). In this way, current may be distributed and noise may be reduced. An activated bit line (227) may be adjacent to a precharged bit line (250) in a non-activated cell array (124). In this way, cross-talk between activated bit lines may be reduced.

Abstract: A design layout for a memory cell structure is provided that achieves maximized channel length on the active areas, while not constricting the contact area of the capacitor contacts is provided.

Abstract: A regenerative tie-high, tie-low cell (circuit) that provides unconditionally stable logic (1 and 0) output states used to tie off logic inputs. The circuit of this invention eliminates any current flow through p-channel/n-channel transistor pairs found in many conventional circuits and adds a regenerative transistor 42 to assure rapid response in achieving the proper logic output states. In one preferred embodiment, the circuit consists of only three CMOS transistors 40-42 that reduce the silicon area required, lowers the cost, and improves the overall reliability.

Abstract: A semiconductor memory array for improving packaging reliability and device speed is disclosed in the present invention. The semiconductor memory array includes a peripheral device region in a center portion of the array, a plurality of memory mat regions enclosing the peripheral device region, a pad region formed in the peripheral device region, a plurality of array control regions between the memory mat regions, each array control region horizontally adjacent to a memory mat region, and a plurality of main amplifier regions disposed between the memory mat regions and the peripheral device region.

Abstract: Mask ROM cell and method of fabricating the same, is disclosed, including a semiconductor substrate of a first conductivity type, a plurality of impurity diffusion regions of a second conductivity type, formed in the semiconductor substrate in one direction, having a predetermined distance therebetween, an insulating layer formed on a portion of the semiconductor substrate, corresponding to each impurity diffusion region, a gate insulating layer formed on the semiconductor substrate, and a plurality of conductive lines formed on the gate insulating layer and insulating layer in a predetermined interval, being perpendicular to the impurity diffusion regions.

Abstract: A semiconductor memory device improves driving capability of bit select transistors without increasing a memory cell array in size, wherein first and second sub-bit lines are elongated along the direction of a bit line and in the reverse direction and are connected to a main bit line through first and second bit select transistors each being independently controllable and the first and second bit select transistors are disposed in a deviated manner without being adjacent to each other with respect to the direction of the bit line.

Abstract: In a structure and a designing method of a memory integrated with a logic, a memory macro comprises L memory array blocks 1-1, 1-2, . . . 1-L each including memory cell arrays each with a storage capacity of K bits and sense amplifiers. Memory array power source driver blocks 4-1, 4-2, . . . 4-L each including a circuit for generating a driver power source which drives a sense amplifier are arranged in a corresponding manner to memory array blocks 1-1, 1-2, . . . 1-L. The memory array blocks 1-1, 1-2, . . . 1-L are arranged along a column direction in an adjacent manner to one another and DQ line pairs extending along a column direction are arranged on the memory array blocks 1-1, 1-2, . . . 1-L. Source line blocks 6a-L, 6b-L, 7a, 7b, 8a, 8b are arranged at an end of the memory array blocks in a row direction. According to such a design, short design turnaround for design and shrinkage of occupying area of a memory macro can be realized.

Abstract: In a memory cell section of a memory cell array in a semiconductor memory, N+ diffused layers and gate electrode conductors are located with the same line width and with an equal spacing. In a selector section, the N+ diffused layers and the gate electrode conductors are not located with an equal spacing. However, a dummy N+ diffused layer is added to an end of the N+ diffused layer in the selector section. In addition, a dummy N+ diffused layer is additionally located in a region which had existed as an empty region corresponding to the N+ diffused layer in the memory cell section. Thus, a resist pattern for the N+ diffused layers is formed as a designed pattern, and the characteristics of memory cell transistors or selector transistors is homogenized.

Abstract: An SRAM of the present invention has a first load resistor connected between a first power source terminal and a first node, a second load resistor connected between the first power source terminal and a second node, a first drive transistor having a source-drain path connected between the first node and a second power source terminal, and a gate connected to the second node, a second drive transistor having a source-drain path connected between the second node and the second power source terminal, and a gate connected to the first node, a first switching transistor having a source-drain path connected between the first node and a first bit line, and a gate connected to a word line, and a second switching transistor having a source-drain path connected between the first node and a second bit line, and a gate connected to the word line.

Abstract: A semiconductor device capable of solving a problem of a conventional semiconductor device in that a high density integration cannot be expected because each cell, which includes a pair of N and P wells disposed adjacently, requires a countermeasure against latchup individually. The high density integration prevents an effective countermeasure against latchup. The present semiconductor device arranges two cells, which are adjacent in the direction of an alignment of the N wells and P wells, in opposite directions so that two P wells (or two N wells) of the two adjacent cells are disposed successively, and includes an isolation layer extending across the two adjacent cells to enclose the two successively disposed P wells, thereby isolating the two P wells collectively from the substrate.

Abstract: An LSI chip has a main surface occupied by a logic section, a data input/output section and a memory macro section. The memory macro section is a rectangular section arranged on the main surface of the LSI chip. A test control circuit is arranged along one side of the memory macro section. A data input/output circuit is arranged along another side of the memory macro section. The test control circuit may be arranged along one side of the LSI chip. Test data is supplied from the test control circuit to the data input/output circuit through a data bus. As a result, a load of designing a memory logic LSI can be lightened.

Abstract: A CMOS cell architecture and routing technique is optimized for three or more interconnect layer cell based integrated circuits such as gate arrays. First and second layer interconnect lines are disposed in parallel and are used as both global interconnect lines and interconnect lines internal to the cells. Third layer interconnect lines extend transverse to the first two layer interconnects and can freely cross over the cells. Non-rectangular diffusion regions, shared gate electrodes, judicious placement of substrate contact regions, and the provision for an additional small transistor for specific applications are among numerous novel layout techniques that yield various embodiments for a highly compact and flexible cell architecture. The overall result is significant reduction in the size of the basic cell, lower power dissipation, reduced wire trace impedances, and reduced noise.

Abstract: An active matrix LCD employs a two-terminal or three-terminal switch structure employing an electrically conductive wire. The wire has an insulating layer thereon forming a wire structure. The wire structure is placed in a groove in a transparent substrate and an electrode layer is deposited on the insulating layer at spaced intervals to form an array of diodes connected in parallel. By applying a suitable voltage to the wire, all of the diodes in parallel are turned on to charge the electrodes to desired electrical potentials on one side of the liquid crystal material. An array of electrodes matching the position of the diodes on the other side of the liquid crystal material are charged to the desired potentials in order to control the color and brightness of the display by controlling the light transmittance of the liquid crystal cells between the two sets of electrodes.

Abstract: The invention concerns integrated circuits in which a MACRO is embedded in a standard cell array. One level of metal is devoted exclusively to non-local interconnect, and a layer of polysilicon is devoted to local interconnect, thereby saving significant space.

Abstract: Integrated circuit SRAM cells include a semiconductor substrate having a field region and first, second, third and fourth active regions therein. The first and second active regions each include a horizontal leg and a vertical leg and are mirror images of each other about a vertical axis. The third and fourth active regions each also include a horizontal leg and a vertical leg and are mirror images of each other about a vertical axis. The integrated circuit SRAM cells also include first and second vertically extending gate conductive layers on the semiconductor substrate. The first vertically extending conductive layer extends vertically over the first active region horizontal leg and extends vertically over the third active region horizontal leg. The second vertically extending conductive layer extends vertically over the second active region horizontal leg and extends vertically over the fourth active region horizontal leg.