While Contacting A Shaping Surface (e.g., In Mold Curing, Etc.) Patents (Class 264/496)
  • Patent number: 10353304
    Abstract: There is provided a method of performing a nanoimprint lithography process. The method includes providing an imprint template having field patterns and an alignment mark. The field patterns are defined by a concave and convex surface profile of each of field regions of the imprint template, and the alignment mark is embedded in a boundary region of the imprint template. A resist layer is formed on a substrate having a reference alignment mark. The field patterns are imprinted on the resist layer to embed the field patterns into the resist layer while the imprint template is aligned with the substrate using the alignment mark and the reference alignment mark. Related imprint template structures are also provided.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: July 16, 2019
    Assignee: SK hynix Inc.
    Inventor: Jung Bin Cho
  • Patent number: 10336009
    Abstract: The color of object data that indicates the shape and the color of an object is reproduced faithfully when modeling an object. A model is formed by discharging droplets having the same color from droplet discharging units onto a medium, based on the same reference signal. Colorimetry is performed on the model, and a first-portion and a second-portion having a color with a higher density are specified. The liquid amount of droplets per unit area to be discharged from droplets discharging units that formed the first-portion and the liquid amount of droplets per unit area to be discharged from droplets discharging units that formed the second-portion are adjusted such that a difference in density of colors to be reproduced decreases. The object is modeled by repeating processing for discharging droplets from the droplet discharging units based on the object data.
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: July 2, 2019
    Assignee: Seiko Epson Corporation
    Inventors: Shinichi Nakamura, Hiroshi Wada
  • Patent number: 10317793
    Abstract: A nanoimprint lithography method includes coating a surface of a nanoimprint lithography substrate with a pretreatment composition to yield a layer of the pretreatment composition on the surface of the substrate, disposing an imprint resist on the layer of the pretreatment composition to yield a composite layer on the surface of the substrate, contacting the composite layer with a nanoimprint lithography template, and forming a polymeric layer on the surface of the substrate by polymerizing the composite layer. The pretreatment composition includes a polymerizable component having a molecular mass between about 300 and about 750. The imprint resist is a polymerizable composition. The composite layer includes a mixture of the pretreatment composition and the imprint resist. An average spreading rate of the imprint resist to form the composite layer exceeds an average spreading rate of the imprint resist on the substrate under otherwise identical conditions.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: June 11, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Timothy Brian Stachowiak, Weijun Liu, Fen Wan
  • Patent number: 10308768
    Abstract: With a prepolymer composition containing at least one mono or oligomer component with at least one polymerizable C—C double bond as well as at least one multifunctional monomer component, the multifunctional monomer component a multifunctional monomer component is contained with at least two thiol groups selected from the group: 3-Mercaptopropionates, 3-Mercaptoacetates, thioglycolates, and alkylthiols, wherein the mono or oligomer component with at least one polymerizable double bond is selected from the group acrylates, methyl acrylates, vinyl ethers, allyl ethers, propenyl ethers, alkenes, dienes, unsaturated esters, allyl triazines, allyl isocyanates, and N-vinyl amides, and wherein at least one surface-active anti-adhesive additive selected from the group alkyl (meth)acrylates, polysiloxane (meth)acrylates, perfluoroalkyl (meth)acrylates, perfluoropolyether (meth)acrylates, alkyl vinyl ethers, polysiloxane vinyl ethers, perfluoroalkyl vinyl ethers, and perfluoropolyether vinyl ethers, as well as a photoi
    Type: Grant
    Filed: December 9, 2015
    Date of Patent: June 4, 2019
    Assignee: Joanneum Research Forschungsgesellschaft mbH
    Inventors: Dieter Nees, Markus Leitgeb, Barbara Stadlober, Stephan Ruttloff, Andre Lintschnig, Valentin Satzinger
  • Patent number: 10226882
    Abstract: The invention relates to a method for producing a gasket on a component using a shaping tool, wherein the material used for the gasket is a UV-curable sealing or gasket material, and wherein the shaping tool comprises an upper face and a lower face and at least one cavity which is open toward the lower face of the shaping tool and which is provided for filling with the gasket material, and wherein furthermore the shaping tool is made of a UV-transparent material at least in the region of the cavity, comprising the following steps in the order indicated: 1. introducing the gasket material into the cavity of the shaping tool; 2. placing the component onto the lower face of the tool provided with the gasket material; 3. pressing the component onto the tool; 4. curing the gasket material by way of UV irradiation; and 5. removing the tool from the component and the gasket joined thereto. The invention further relates to a shaping tool for use in such a method.
    Type: Grant
    Filed: February 20, 2017
    Date of Patent: March 12, 2019
    Assignee: Henkel AG & Co. KGaA
    Inventors: Jürgen Becher, Michael Drexl
  • Patent number: 10220563
    Abstract: The present invention relates to a silicone rubber like material and a printing device including a stamp layer comprising such a material. The material is suitable for use in soft lithography as it enables stable features having dimensions in the nanometer range to be obtained on a substrate, and also allows for the accommodation onto rough and non-flat substrate surfaces. The invention also relates to methods for manufacturing the silicone rubber like material and stamp layer and use thereof in lithographic processes.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: March 5, 2019
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventor: Marcus Antonius Verschuuren
  • Patent number: 10139726
    Abstract: An imprint lithography method includes forming a first imprint pattern on a substrate in a first area and a third area, wherein the third area is spaced apart from the first area, forming a first resist pattern on the substrate on a second area, wherein the second area is adjacent the first and third areas, forming a first pattern in the first and third areas by etching an element under the first imprint pattern using the first imprint pattern and the first resist pattern as an etch barrier, forming a second imprint pattern on the substrate in a second area, forming a second resist pattern on the substrate on the first area and the third area, and forming a second pattern in the second area by etching an element under the second imprint pattern using the second imprint pattern and the second resist pattern as an etch barrier.
    Type: Grant
    Filed: May 14, 2017
    Date of Patent: November 27, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Seung-Won Park, Taewoo Kim, Lei Xie, Daehwan Jang, Dae-Young Lee, Gugrae Jo
  • Patent number: 10005883
    Abstract: Described are shape memory polymers and methods of making shape memory polymers and actuators from the shape memory polymers.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: June 26, 2018
    Assignee: The University of Rochester
    Inventors: Mitchell Anthamatten, Yuan Meng
  • Patent number: 9842667
    Abstract: In an exemplary method, a nano-architectured carbon structure is fabricated by forming a unit (e.g., a film) of a liquid carbon-containing starting material and at least one dopant. A surface of the unit is nano-molded using a durable mold that is pre-formed with a pattern of nano-concavities corresponding to a desired pattern of nano-features to be formed by the mold on the surface of the unit. After nano-molding the surface of the unit, the first unit is stabilized to render the unit and its formed nano-structures capable of surviving downstream steps. The mold is removed from the first surface to form a nano-molded surface of a carbonization precursor. The precursor is carbonized in an inert-gas atmosphere at a suitable high temperature to form a corresponding nano-architectured carbon structure. A principal use of the nano-architectured carbon structure is a carbon electrode used in, e.g., Li-ion batteries, supercapacitors, and battery-supercapacitor hybrid devices.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: December 12, 2017
    Assignee: The Arizona Board of Regents on Behalf of the University of Arizona
    Inventors: Jayan Thomas, Palash Gangopadhyay, Binh Au Thanh Duong
  • Patent number: 9822928
    Abstract: Pressure vessels formed from fiber composites are described. The fiber composites include fibers impregnated with a resin system containing surface-modified nanoparticles dispersed in a curable matrix resin.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: November 21, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Kristin L. Thunhorst, Emily S. Goenner
  • Patent number: 9713900
    Abstract: A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10?4 to 4.0×10?2.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: July 25, 2017
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Hiroko Yamada, Takahide Mizawa
  • Patent number: 9707717
    Abstract: Methods of preparing a three-dimensional structure are provided. One method includes the steps of extruding beads of thixotropic thermoset materials, and subjecting the beads to curing conditions such that the thixotropic thermoset materials at least partially cure to form cured polymer layers. In some cases, the curing conditions are not applied until multiple beads are extruded and in contact with one another. The steps of these methods can be performed repeatedly as desired to prepare a three-dimensional structure of nearly limitless shapes by additive manufacturing processes. Thixotropic thermoset materials are also provided, as are three-dimensional objects formed therefrom.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: July 18, 2017
    Assignee: Georgia-Pacific Chemicals LLC
    Inventor: Irving D. Sand
  • Patent number: 9604411
    Abstract: A layer of a first powder is dispensed in a layer over a build plate. Binder is then selectively applied to hold portions of the layer of first powder together. Unbound first powder is then removed. A second powder is then dispensed in a layer over the build plate and portions of the bound first powder above the build plate. Binder is then selectively applied to hold portions of the second powder together. Unbound second powder is then removed. A third or more different powders can be similarly dispensed and bound to complete a multi-material layer. The process is then be repeated on a next subsequent layer. A curing radiation source can accelerate binding of powder together. Voids can be formed in portions of the layers by dispensing a fugitive material in portions of each multi-material layer. Mechanisms for implementing the printing process are also disclosed.
    Type: Grant
    Filed: May 4, 2015
    Date of Patent: March 28, 2017
    Assignee: EoPlex Limited
    Inventor: Philip E. Rogren
  • Patent number: 9550322
    Abstract: A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: January 24, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Ko Yamada, Masakazu Yamagiwa, Reiko Yoshimura, Yasuyuki Hotta, Tsukasa Tada, Hiroyuki Kashiwagi, Ikuo Yoneda
  • Patent number: 9547234
    Abstract: An imprint lithography apparatus is disclosed. The apparatus includes an imprint template arrangement for use in imprinting a pattern into a substrate provided with an amount of imprintable medium, a substrate holder configured to hold the substrate, and a chamber having an inlet to allow gas to flow into the chamber and an outlet to allow gas to flow out of the chamber, wherein the imprint template arrangement and the substrate holder are located within the chamber, the chamber, in use, being arranged to contain a gaseous atmosphere. The chamber may be part of a gas circulation system, the inlet and outlet of the chamber being connected to further components of the gas circulation system, the further components of the gas circulation system including: a gas circulation driver configured to drive gas around the gas circulation system; and/or a gas purification unit configured to purify the gas as it circulates around the gas circulation system.
    Type: Grant
    Filed: July 23, 2010
    Date of Patent: January 17, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Roelof Koole, Sander Frederik Wuister
  • Patent number: 9494858
    Abstract: A template for imprinting in which a pattern is transferred onto a first substrate applied curable resin thereon, including a second substrate having a surface to be contacted with the curable resin, a concave portion provided on the surface and corresponding to a pattern to be transferred onto the first substrate, and at least one convex portion arranged in the concave portion to decrease volume of the concave portion.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: November 15, 2016
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yukiko Kikuchi, Shinichi Ito
  • Patent number: 9452563
    Abstract: A transfer system 1 comprising: a conveying/positioning device 3 configured to convey and position a flat sheet-shaped mold MA in a predetermined direction, on which a fine transfer pattern M1 is formed; a transfer device 5 configured to transfer the fine transfer pattern M1 to a molding target W, the transfer device 5 being provided on an upstream side in the conveying direction of the sheet-shaped mold MA; and a peeling device 7 configured to peel off the sheet-shaped mold MA and the molding target from those mutually clinging to each other, after the transfer by the transfer device 5 is performed and the conveyance by the conveying/positioning device 3 is performed, the peeling device 7 being provided on a downstream side in the conveying direction of the sheet-shaped mold MA.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: September 27, 2016
    Assignee: TOSHIBA KIKAI KABUSHIKI KAISHA
    Inventors: Shinya Itani, Hiromi Nishihara, Takato Baba, Takaharu Tashiro, Takafumi Ookawa, Hidetoshi Kitahara
  • Patent number: 9381680
    Abstract: Methods for fabricating and manufacturing solid solution perforators (SSPs) using sharp metal or glass needles and/or subsequent molding and use are described. The methods entail making microneedles by various precision machining techniques and micromold structures from curable materials. Various designs of patch, cartridge and applicator are described. Also described are methods for adjusting the microneedle mechanical strength using formulation and/or post-drying processes.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: July 5, 2016
    Assignee: TheraJect, Inc.
    Inventors: Sea-Jin Oh, Sung-Yun Kwon
  • Patent number: 9354512
    Abstract: Provided is a resin mold for imprinting which is free from transfer defects, has excellent releasability from a resin subjected to imprinting, and does not cause any defect by imprinting. The resin mold for imprinting includes a resin layer having a recessed and projected pattern surface, an inorganic material layer formed with a uniform thickness on at least the recessed and projected pattern surface of the resin layer, and a release agent layer formed with a uniform thickness on at least the recessed and projected pattern surface of the inorganic material layer.
    Type: Grant
    Filed: August 6, 2010
    Date of Patent: May 31, 2016
    Assignee: Soken Chemical & Engineering Co., Ltd.
    Inventors: Takahide Mizawa, Satoshi Uehara
  • Patent number: 9272568
    Abstract: An apparatus and method for preparing a flexible substrate with uniformly spaced images and corresponding physical or virtual registration marks at regular intervals, applying an energy curable coating to the flexible substrate either uniformly or in selected spots, and providing a master web carrying uniformly spaced impressing images and corresponding registration marks at regular intervals, where accurate alignment of the registration marks of the flexible substrate and the master web is achieved by stretching the master web to align the registration marks.
    Type: Grant
    Filed: January 14, 2009
    Date of Patent: March 1, 2016
    Inventors: Ryan McDonnell, Clarence Miller, Richard Lavosky
  • Patent number: 9211672
    Abstract: An apparatus for molding a thermoplastic resin product includes a heating apparatus which conducts heating by radiation of infrared rays by using a light source; a stamper which is radiation heated by infrared rays radiated from the light source; a cooling member which cools the stamper by contacting the stamper which is radiation heated; a first mold which holds the stamper and/or the cooling member in a movable manner, thereby enabling the stamper and the cooling member to be in contact with or remote from with each other; and a second mold which holds a thermoplastic resin to which a structure of a shape-forming surface of the stamper is transferred. The stamper is radiation heated at least in the state where it is remote from the cooling member.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: December 15, 2015
    Assignee: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Masaki Aoya, Satoo Kimura, Tsutomu Iwasaki
  • Patent number: 9193118
    Abstract: Methods of manufacturing contact lenses using ophthalmic lens molds having a molding surface comprising a thermoplastic polymer, the molding surface having a percent polarity from 3% to 20% and a surface energy from about 25 mN/m to about 40 mN/m to cast mold a polymerizable composition having a surface tension from about 20 mN/m to about 25 mN/m, wherein a surface energy differential of the surface tension of the polymerizable composition less the surface energy of the molding surface less than or equal to zero (0); and silicone hydrogel contact lens bodies so manufactured are described.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: November 24, 2015
    Assignee: CooperVision International Holding Company, LP
    Inventors: A. K. M. Shahab Siddiqui, David Robert Morsley, Sarah L. Almond, Richard C. Rogers, Ian Bruce, Lee Darren Norris, Edyta S. Bialek, Benjamin S. Sheader
  • Patent number: 9193097
    Abstract: A method of manufacturing a component comprising a hollow axisymmetric body formed of a cured composite material is provided. The method includes the step of positioning the constituents of the composite material in a mold corresponding to at least a portion of the hollow axisymmetric body. The composite material is cured into a composite part, and residual stresses are generated in the composite material during the curing by controlling the temperature of the constituents in the mold. When the composite part is released from the mold, relaxation of the residual stresses causes one or more regions of the composite part to deflect in the radial direction of the hollow axisymmetric body, the position of greatest radial deflection of each region having a radial deflection which is at least 0.1% of the greatest diameter of the hollow axisymmetric body.
    Type: Grant
    Filed: October 19, 2011
    Date of Patent: November 24, 2015
    Assignee: ROLLS-ROYCE plc
    Inventor: Alison J. McMillan
  • Patent number: 9168679
    Abstract: A method of forming a nanoscale pattern on a substrate is provided, wherein the method increases or decreases the spacing of patterns on the substrate relative to a master, while keeping the pattern feature size constant. The method can alternatively reduce the pattern feature size of the substrate relative to a master, while keeping the spacing patterns constant.
    Type: Grant
    Filed: July 18, 2011
    Date of Patent: October 27, 2015
    Assignee: Northwestern University
    Inventors: Teri W. Odom, Min Hyung Lee, Mark D. Huntington, Wei Zhou
  • Patent number: 9164377
    Abstract: According to one embodiment, provided is a method for cleaning an imprinting mask including a template having an uneven pattern, a base layer disposed on the template, and a sacrificial film disposed on the base layer. In the method for cleaning the imprinting mask, the sacrificial film is removed, and a contaminant adhered on the sacrificial film is removed from the template pattern.
    Type: Grant
    Filed: July 10, 2013
    Date of Patent: October 20, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Tomita, Hidekazu Hayashi
  • Patent number: 9149956
    Abstract: A conveying/positioning device includes: a unused-mold placing device 9 that places a rolled mold MB of a sheet-shaped mold M thereon; a mold rolling-up device 11 that rolls up the flat sheet-shaped mold MA supplied from the unused-mold placing device 9; and a tension maintaining device that constantly maintains a tension of the flat sheet-shaped mold even if a form of the flat sheet-shaped mold is changed when the peeling is performed.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: October 6, 2015
    Assignee: Toshiba Kikai Kabushiki Kaisha
    Inventors: Shinya Itani, Hiromi Nishihara, Takato Baba, Takaharu Tashiro, Takafumi Ookawa, Hidetoshi Kitahara
  • Patent number: 9136224
    Abstract: According to one embodiment, an alignment mark provided on an underlayer includes a plurality of first guide pattern features, and a first self-assembled film. The first guide pattern features extend in a first direction and are aligned in a second direction crossing the first direction. The first self-assembled film is provided between adjacent ones of the first guide pattern features and includes a plurality of first line pattern features and a second line pattern feature. The first line pattern features extends in the first direction, is aligned in the second direction, and has a pitch in the second direction narrower than a pitch in the second direction of the first guide pattern features. The second line pattern feature is provided between adjacent ones of the first line pattern features and extends in the first direction.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: September 15, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshinori Hagio
  • Publication number: 20150144913
    Abstract: An adhesive film that includes a first region having a first hardness, and second regions disposed on opposing sides of the first region and having a second hardness that is greater than the first hardness.
    Type: Application
    Filed: November 18, 2014
    Publication date: May 28, 2015
    Inventor: JIN BO SHIM
  • Publication number: 20150137429
    Abstract: The present invention provides a fabrication method of a three dimensional micro-structure on polymers. The fabrication method of the present invention comprises the following steps of: preparing a sacrifice material; micro-processing the sacrifice material to form a pattern with micro-features; putting the sacrificed material with the micro-features into a mold and injecting a liquid state polymer into the mold; and solidifying the polymer by using a predetermined process and removing the sacrificed material through a guiding channel to create a three dimensional micro-structure on polymers.
    Type: Application
    Filed: April 28, 2014
    Publication date: May 21, 2015
    Applicant: National Taiwan University of Science and Technology
    Inventor: Chun-Hui Chung
  • Publication number: 20150108694
    Abstract: Provided herein is a curable silicone composition that has high optical transparency after being cured and that is in a putty form to be hand-mixable. A curable silicone composition contains: a specific organopolysiloxane as a component (1); a specific organohydrogenpolysiloxane as a component (2); a filler as a component (3); and a catalyst as a component (4). The difference between the refractive index of one of the components (1) to (3) that has the highest refractive index and the refractive index of one of the components (1) to (3) that has the lowest refractive index is 0.1000 or less. The complex viscosity of any of constituent compositions of the curable silicon composition before the curable silicone composition is cured is 10 Pa·s to 100000 Pa·s, as measured under predetermined measurement condition.
    Type: Application
    Filed: September 26, 2014
    Publication date: April 23, 2015
    Inventors: Shun Shimosoyama, Toshio Kitamura
  • Patent number: 9005512
    Abstract: A resist layer constituted by a resist composition (which may include unavoidable impurities) including a polymerizable compound that includes polyfunctional monomers that become polymers having three dimensional structures by cross linking when polymerized and a polymerization initiating agent which is activated by one of light and an electron beam is formed on a substrate. A surface of a mold having a predetermined pattern of protrusions and recesses is pressed against the resist layer. Light is irradiated onto the resist layer to cure the resist layer. The mold is separated from the resist layer under conditions that the temperature of the resist layer is 40° C. or greater.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: April 14, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Omatsu, Satoshi Wakamatsu
  • Patent number: 8999221
    Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.
    Type: Grant
    Filed: December 24, 2013
    Date of Patent: April 7, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa
  • Patent number: 8999220
    Abstract: The present invention provides a technique capable of manufacturing a resin stamper at a low cost. A method of manufacturing a plate-shaped resin stamper includes: pressing a resin composite base material against a mother stamper having a pattern formed on the surface thereof by compression molding to transfer the pattern of the mother stamper to the composite base material; and punching the composite base material. In the manufacturing method, the resin composite base material includes at least one curing resin. In addition, during the compression molding, a portion of the composite base material is cured by active energy beams or heat, the pattern is transferred to the composite base material, and the composite base material is punched, thereby manufacturing the resin stamper.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: April 7, 2015
    Assignee: Showa Denko K.K.
    Inventors: Hiroshi Uchida, Masato Fukushima, Yuko Sakata
  • Publication number: 20150093544
    Abstract: The present invention relates to a method for printing a three-dimensional structure with a smooth surface comprising the following steps of depositing multiple droplets of printing material at least partially side by side and one above the other and curing the deposited droplets by light irradiation to build up a three-dimensional pre-structure in a first step, and smoothing at least one surface of the three-dimensional pre-structure by targeted placement of compensation droplets in boundary areas of adjacent deposited droplets and/or in edges of the surface to be smoothed in a second step to build up the three-dimensional structure with a smooth surface.
    Type: Application
    Filed: May 6, 2013
    Publication date: April 2, 2015
    Inventors: Richard Van De Vrie, Joris Biskop
  • Patent number: 8992206
    Abstract: An imprint apparatus which brings a resin on a substrate into contact with a pattern surface of a mold and cures the resin, includes a substrate holder which holds the substrate, a mold holder which holds the mold with a mold holding surface, a driving mechanism which moves the substrate holder relative to the mold holder, and a controller which controls the driving mechanism such that the substrate holder moves relative to the mold holder while the substrate holder holds a cleaning member instead of the substrate, and the cleaning member is in contact with the mold holding surface, thereby cleaning the mold holding surface.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: March 31, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kohei Wakabayashi
  • Patent number: 8992818
    Abstract: Described herein is a method of forming a seamless transfer member suitable for use with an image forming system. The method includes spray coating a UV curable polymer and conductive particles onto an inner surface of a rotating cylindrical mandrel. The UV curable polymer is cured with ultra violet energy. The cured UV polymer is removed from the cylindrical rotatable mandrel.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: March 31, 2015
    Assignee: Xerox Corporation
    Inventors: Satchidanand Mishra, Edward A. Domm, Jin Wu, Geoffrey M. T. Foley, Edward F. Grabowski
  • Patent number: 8986595
    Abstract: Provided is a method of producing a resin molded article which hardly involves the occurrence of optical distortion and of sink marks. The method of producing a resin molded article includes: a first step including pouring a polyfunctional (meth)acrylic monomer into a molding die and irradiating the polyfunctional (meth)acrylic monomer with radiant energy rays until a polymerization conversion degree reaches 1 to 10% to polymerize a part of the polyfunctional (meth)acrylic monomer; and a second step including heating the polymerized polyfunctional (meth)acrylic monomer after the first step in a state where the polymerized polyfunctional (meth)acrylic monomer is held in the molding die to further polymerize a remaining part of the polyfunctional (meth)acrylic monomer until the polymerization conversion degree reaches 60% or more.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: March 24, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Ryo Ogawa
  • Patent number: 8986596
    Abstract: A method of preparing particles comprises forming by optical lithography a topographic template layer disposed on a surface of a substrate, which is suitable for spin casting. The template layer comprises a non-crosslinked template polymer having a pattern of independent wells therein for molding independent particles. Spin casting a particle-forming composition onto the template layer forms a composite layer comprising the template polymer and the particles disposed in the wells. The composite layer is removed from the substrate using a stripping agent that dissolves the template polymer without dissolving the particles. The particles are then isolated.
    Type: Grant
    Filed: November 18, 2012
    Date of Patent: March 24, 2015
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Daniel J. Coady, Matthew E. Colburn, Blake W. Davis, James L. Hedrick, Steven J. Holmes, Hareem T. Maune, Alshakim Nelson
  • Publication number: 20150064909
    Abstract: Provided are: a resin mold material and a resin replica mold material composition for imprinting having a superior mold releasability; a resin mold and a resin replica mold resulting from containing the material composition; and a method for producing them. The resin mold material or resin replica mold material composition for imprinting contains 100 parts by weight of a mold resin or replica mold resin for imprinting and 0.1 to 10 parts by weight of a curable fluoropolymer (A). Preferably, the fluoropolymer (A) has a weight-average molecular weight of 3,000 to 20,000 and results from including as repeating units (a1) an ?-position substituted acrylate having a fluoroalkyl group having 4 to 6 carbon atoms and (a2) and 5 to 120 parts by weight of a high-softening-point monomer exhibiting a glass transition point or softening point of at least 50° C. in the homopolymer state.
    Type: Application
    Filed: April 9, 2013
    Publication date: March 5, 2015
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Masamichi Morita, Yoshiko Kuwajima
  • Patent number: 8968630
    Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: March 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Arie Jeffrey Den Boef, Andre Bernardus Jeunink
  • Patent number: 8968627
    Abstract: The present invention relates to a process for the manufacturing of continuously shaped cured silicone articles, particularly extrusions articles and the use of silicone compositions containing a photoactivatable metal catalyst in said process, wherein the curing is initiated by visible or UV-light.
    Type: Grant
    Filed: July 4, 2008
    Date of Patent: March 3, 2015
    Assignee: Momentive Performance Materials GmbH
    Inventors: Uwe Irmer, Dieter Wrobel, Yi-Feng Wang
  • Publication number: 20150054205
    Abstract: The present invention provides for methods of manufacturing wood-based composite products, articles of manufacture employed in the manufacturing of wood-based products (e.g., PTFE sheet configured to be attached to platen and/or platen configured to attach to PTFE sheet), systems used in the manufacturing of wood-based products (e.g., platens having PTFE sheet attached thereto), methods of using such articles of manufacture, methods of using such systems, and wood-based products (e.g., OSB, PB, MDF and/or HDF) obtained from such methods.
    Type: Application
    Filed: March 15, 2013
    Publication date: February 26, 2015
    Applicant: Ainsworth Limber Co., Ltd.
    Inventors: Jaime Antonio Costa, Bruce Warren Grunert
  • Patent number: 8961851
    Abstract: A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate having liquid resin formed thereon is seated, a imprinting mold bonded with the liquid resin of the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, and a planarization layer formed between the stage and the substrate to planarize a surface of the stage.
    Type: Grant
    Filed: October 27, 2010
    Date of Patent: February 24, 2015
    Assignee: LG Display Co., Ltd.
    Inventors: Ju-Hyuk Kim, Tae-Joon Song, Seong-Pil Cho
  • Publication number: 20150048554
    Abstract: The invention relates to a biodegradable material made of biological components, comprising 10 to 60 wt. % of a protein adhesive (1), which is made of at least one protein, and 2 to 50 wt. % of natural fibers (4). Furthermore, 2 to 15 wt. % of at least one hygroscopic mineral (7), 10 to 55 wt. % of water (2), and 0 to 50 wt. % of an additive component (5) are provided in the material (10).
    Type: Application
    Filed: April 15, 2013
    Publication date: February 19, 2015
    Applicant: FLUID SOLIDS AG
    Inventors: Beat Karrer, Daniel Schwendemann, Bettina Müller, Florian Gschwend
  • Publication number: 20150048559
    Abstract: According to one embodiment, a mold manufacturing method includes obtaining a first distribution, obtaining a second distribution, generating a correction data, and forming a second mold. The first distribution is a distribution of level difference included in a first layer on a substrate. The obtaining the second distribution obtains the second distribution when a first mold having the concave-convex pattern is brought into contact with a photosensitive resin applied on the first layer and the resin is cured. The second distribution is a distribution of film thickness of the resin remaining between the substrate and a convex pattern feature of a concave-convex pattern. The correction data is a data for suppressing a difference between one of the first distribution and the second distribution, and a film thickness of a reference set beforehand. The second mold is different from the first mold using the correction data.
    Type: Application
    Filed: February 14, 2014
    Publication date: February 19, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Sachiko KOBAYASHI, Satoshi Tanaka, Kazuhiro Takahata
  • Patent number: 8956143
    Abstract: A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: February 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mitsuhiro Furumoto, Keiji Emoto
  • Publication number: 20150045498
    Abstract: A method for producing a surface-functionalised object involves: (i) providing negative mould (2) with a surface topography complementary to that desired on the object; (ii) applying a functional entity (20) to the mould surface, in an exciting medium; (iii) forming the object (21) in or on the mould (2), the object being in direct contact, as it forms, with the functional entity (20); and (iv) releasing the object (21) from the mould, wherein during steps (iii) and/or (iv), at least some (22) of the functional entity (20) is transferred from the mould to the object, whilst a proportion remains on the mould (2) surface. The method can be used to functionalise the surface of an object as it is cast, and the mould can be re-used to form multiple replicate objects. The invention also provides an object produced using the method, and a surface-functionalised negative mould for use in the method.
    Type: Application
    Filed: July 18, 2012
    Publication date: February 12, 2015
    Inventors: Jas Pal S. Badyal, Hayley G. Andrews
  • Patent number: 8945458
    Abstract: A method of producing a structure from curable material by molding includes arranging a molding tool above a surface, so that in a region between the molding tool and the surface, the curable material adjoins the surface and a molding face of the molding tool which faces the surface, and so that additional curable material may continue to flow into the region. The method further includes irradiating the curable material in the region in a locally varying manner, so that the curable material cures at different speeds in a laterally varying manner and that shrinkages occurring during curing of the curable material are compensated for by the additional curable material. The method further includes applying a constant pressure to the additional curable material. Moreover, a second method and an apparatus for producing a structure from curable material by molding and a molding tool for an optical component are described.
    Type: Grant
    Filed: December 8, 2011
    Date of Patent: February 3, 2015
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
    Inventors: Frank Wippermann, Jacques Duparre, Peter Dannberg, Andreas Braeuer
  • Patent number: 8940219
    Abstract: An ophthalmic device is formed by additive fabrication, the optical device having an optical surface with a surface roughness on the order of less than 10 microns. A method is provided for making an ophthalmic device including an optical surface having a surface roughness of less than 10 microns by depositing on a stage in a first relative position a first lamina of particulates having a size less than 10 microns and in select configurations less than two microns and certain configurations less than one micron, and, synergistically stimulating the first lamina of particulates to form a first solidified layer.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: January 27, 2015
    Inventors: Ronald Spoor, Sanjay M. Rastogi, Charles P. Henning
  • Patent number: 8936898
    Abstract: A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: January 20, 2015
    Assignee: LG Display Co., Ltd.
    Inventors: Yeon Heui Nam, Jin Wuk Kim, Tae Joon Song, Seong Pil Cho, Byung Uk Kim, Seung Hyup Shin, Jun Yong Song, Myoung Soo Lee