While Contacting A Shaping Surface (e.g., In Mold Curing, Etc.) Patents (Class 264/496)
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Patent number: 8968630Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.Type: GrantFiled: October 26, 2010Date of Patent: March 3, 2015Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Arie Jeffrey Den Boef, Andre Bernardus Jeunink
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Patent number: 8968627Abstract: The present invention relates to a process for the manufacturing of continuously shaped cured silicone articles, particularly extrusions articles and the use of silicone compositions containing a photoactivatable metal catalyst in said process, wherein the curing is initiated by visible or UV-light.Type: GrantFiled: July 4, 2008Date of Patent: March 3, 2015Assignee: Momentive Performance Materials GmbHInventors: Uwe Irmer, Dieter Wrobel, Yi-Feng Wang
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Publication number: 20150054205Abstract: The present invention provides for methods of manufacturing wood-based composite products, articles of manufacture employed in the manufacturing of wood-based products (e.g., PTFE sheet configured to be attached to platen and/or platen configured to attach to PTFE sheet), systems used in the manufacturing of wood-based products (e.g., platens having PTFE sheet attached thereto), methods of using such articles of manufacture, methods of using such systems, and wood-based products (e.g., OSB, PB, MDF and/or HDF) obtained from such methods.Type: ApplicationFiled: March 15, 2013Publication date: February 26, 2015Applicant: Ainsworth Limber Co., Ltd.Inventors: Jaime Antonio Costa, Bruce Warren Grunert
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Patent number: 8961851Abstract: A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate having liquid resin formed thereon is seated, a imprinting mold bonded with the liquid resin of the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, and a planarization layer formed between the stage and the substrate to planarize a surface of the stage.Type: GrantFiled: October 27, 2010Date of Patent: February 24, 2015Assignee: LG Display Co., Ltd.Inventors: Ju-Hyuk Kim, Tae-Joon Song, Seong-Pil Cho
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Publication number: 20150048554Abstract: The invention relates to a biodegradable material made of biological components, comprising 10 to 60 wt. % of a protein adhesive (1), which is made of at least one protein, and 2 to 50 wt. % of natural fibers (4). Furthermore, 2 to 15 wt. % of at least one hygroscopic mineral (7), 10 to 55 wt. % of water (2), and 0 to 50 wt. % of an additive component (5) are provided in the material (10).Type: ApplicationFiled: April 15, 2013Publication date: February 19, 2015Applicant: FLUID SOLIDS AGInventors: Beat Karrer, Daniel Schwendemann, Bettina Müller, Florian Gschwend
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Publication number: 20150048559Abstract: According to one embodiment, a mold manufacturing method includes obtaining a first distribution, obtaining a second distribution, generating a correction data, and forming a second mold. The first distribution is a distribution of level difference included in a first layer on a substrate. The obtaining the second distribution obtains the second distribution when a first mold having the concave-convex pattern is brought into contact with a photosensitive resin applied on the first layer and the resin is cured. The second distribution is a distribution of film thickness of the resin remaining between the substrate and a convex pattern feature of a concave-convex pattern. The correction data is a data for suppressing a difference between one of the first distribution and the second distribution, and a film thickness of a reference set beforehand. The second mold is different from the first mold using the correction data.Type: ApplicationFiled: February 14, 2014Publication date: February 19, 2015Applicant: Kabushiki Kaisha ToshibaInventors: Sachiko KOBAYASHI, Satoshi Tanaka, Kazuhiro Takahata
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Patent number: 8956143Abstract: A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.Type: GrantFiled: December 13, 2011Date of Patent: February 17, 2015Assignee: Canon Kabushiki KaishaInventors: Mitsuhiro Furumoto, Keiji Emoto
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Publication number: 20150045498Abstract: A method for producing a surface-functionalised object involves: (i) providing negative mould (2) with a surface topography complementary to that desired on the object; (ii) applying a functional entity (20) to the mould surface, in an exciting medium; (iii) forming the object (21) in or on the mould (2), the object being in direct contact, as it forms, with the functional entity (20); and (iv) releasing the object (21) from the mould, wherein during steps (iii) and/or (iv), at least some (22) of the functional entity (20) is transferred from the mould to the object, whilst a proportion remains on the mould (2) surface. The method can be used to functionalise the surface of an object as it is cast, and the mould can be re-used to form multiple replicate objects. The invention also provides an object produced using the method, and a surface-functionalised negative mould for use in the method.Type: ApplicationFiled: July 18, 2012Publication date: February 12, 2015Inventors: Jas Pal S. Badyal, Hayley G. Andrews
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Patent number: 8945458Abstract: A method of producing a structure from curable material by molding includes arranging a molding tool above a surface, so that in a region between the molding tool and the surface, the curable material adjoins the surface and a molding face of the molding tool which faces the surface, and so that additional curable material may continue to flow into the region. The method further includes irradiating the curable material in the region in a locally varying manner, so that the curable material cures at different speeds in a laterally varying manner and that shrinkages occurring during curing of the curable material are compensated for by the additional curable material. The method further includes applying a constant pressure to the additional curable material. Moreover, a second method and an apparatus for producing a structure from curable material by molding and a molding tool for an optical component are described.Type: GrantFiled: December 8, 2011Date of Patent: February 3, 2015Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.Inventors: Frank Wippermann, Jacques Duparre, Peter Dannberg, Andreas Braeuer
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Patent number: 8940219Abstract: An ophthalmic device is formed by additive fabrication, the optical device having an optical surface with a surface roughness on the order of less than 10 microns. A method is provided for making an ophthalmic device including an optical surface having a surface roughness of less than 10 microns by depositing on a stage in a first relative position a first lamina of particulates having a size less than 10 microns and in select configurations less than two microns and certain configurations less than one micron, and, synergistically stimulating the first lamina of particulates to form a first solidified layer.Type: GrantFiled: December 22, 2008Date of Patent: January 27, 2015Inventors: Ronald Spoor, Sanjay M. Rastogi, Charles P. Henning
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Patent number: 8936898Abstract: A photosensitive resin composition and a method for forming an organic film on a substrate are provided. Because the photosensitive resin composition for imprinting includes an erythrotol-based monomer or oligomer, an organic film formed by the photosensitive resin composition for imprinting has improved restoring force. Therefore, the photosensitive resin composition is appropriate for imprinting processes.Type: GrantFiled: November 12, 2009Date of Patent: January 20, 2015Assignee: LG Display Co., Ltd.Inventors: Yeon Heui Nam, Jin Wuk Kim, Tae Joon Song, Seong Pil Cho, Byung Uk Kim, Seung Hyup Shin, Jun Yong Song, Myoung Soo Lee
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Publication number: 20150017047Abstract: The present invention recites a method of fabricating a stator for a downhole motor, the method comprising the steps of providing a stator tube having an interior surface and applying a bonding agent to the interior surface of the stator tube. Additionally, a mandrel is positioned within the stator tube, the mandrel having an outer geometry that is complimentary to a desired inner geometry for the stator. Furthermore, a reinforcing material is introduced into the stator tube to fill space between the mandrel and the interior surface of the stator tube and subsequently solidified to bond the reinforcing material to the interior surface of the stator tube. The mandrel is then removed from the bonded stator tube and reinforcing material such that a stator is fabricated.Type: ApplicationFiled: July 14, 2014Publication date: January 15, 2015Inventors: Hossein Akbari, Julien Ramier, Olivier Sindt
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Publication number: 20150014819Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.Type: ApplicationFiled: September 24, 2014Publication date: January 15, 2015Applicant: FUJIFILM CORPORATIONInventors: Akiko HATTORI, Hirotaka KITAGAWA, Yuichiro ENOMOTO, Tadashi OOMATSU
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Patent number: 8926888Abstract: An imprint lithography release agent having general formula (1): where R1 represents H or CH3, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.Type: GrantFiled: February 24, 2012Date of Patent: January 6, 2015Assignee: Board of Regents, The University of Texas SystemInventors: Carlton Grant Willson, Tsuyoshi Ogawa, Michael W. Lin, Daniel J. Hellebusch, B. Michael Jacobsson, William K. Bell
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Patent number: 8927307Abstract: To improve light extraction efficiency of light emitting elements such as electroluminescent elements. A first electrode 101, a light emitting layer 102, and a second electrode 103 are formed over a substrate 100, which partially constitute a light emitting element. Light produced in the light emitting layer 102 is emitted out through the second electrode 103. A plurality of three-dimensional bodies 104 are provided in contact with a surface of the second electrode 103. With the provision of the bodies 104, light totally reflected between the second electrode 103 and the air enters the bodies 104 and can be emitted through faces of the bodies 104 that are not parallel to the interface between the bodies and the second electrode 103.Type: GrantFiled: June 11, 2013Date of Patent: January 6, 2015Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Masahiro Takahashi
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Patent number: 8920585Abstract: A method and apparatus for elimination of lamination defects on progressive addition lenses. The lamination method uses a flexible bladder designed to apply pressure evenly across the lens surface. A spacer is positioned between a Hard Multi-Coat carrier and the flexible bladder. The spacer is located in a region of the carrier which is designated to deliver a coating to a section of the lens which is farthest from the carrier. The spacer asymmetrically increases the pressure applied to the carrier to eliminate lamination defects.Type: GrantFiled: August 6, 2012Date of Patent: December 30, 2014Assignee: Essilor International (Compagnie Générale d'Optique)Inventors: Haifeng Shan, Peiqi Jiang, Steven Weber
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Patent number: 8916084Abstract: A method for fabricating a three-dimensional object including depositing a first amount of an ultraviolet curable phase change ink composition comprising an optional colorant and a phase change ink vehicle comprising a radiation curable monomer or prepolymer; a photoinitiator; a reactive wax; and a gellant upon a print region surface; successively depositing additional amounts of the ultraviolet curable phase change ink composition to create a three-dimensional object; and curing the ultraviolet curable phase change ink composition.Type: GrantFiled: September 4, 2008Date of Patent: December 23, 2014Assignee: Xerox CorporationInventors: Michelle N. Chrétien, Barkev Keoshkerian, Peter G. Odell, Jennifer L. Belelie, Christopher A. Wagner, Naveen Chopra
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Publication number: 20140361466Abstract: The method comprises placing a sample of rock on a mold surface (90), forming a solid plug (134) containing the rock sample embedded in a hardened resin matrix. The method further comprises pouring a UV polymerizable liquid resin on the sample of rock to embed the sample of rock in liquid resin and passing the rock sample embedded in the UV polymerizable liquid resin in a polymerization device (66) comprising a UV source (92) to harden the liquid resin and form the plug (134).Type: ApplicationFiled: December 14, 2012Publication date: December 11, 2014Inventors: Farouk Kimour, Karim Bondabou
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Publication number: 20140356619Abstract: To provide a method for manufacturing a double-sided adhesive material suitable for the size and shape of various articles using a simple process without reducing the yield of the adhesive material that is used, and to provide an article with a double-sided adhesive material that uses the double-sided adhesive material obtained by this manufacturing method. [Resolution means] Liquid photo curing adhesive 12 is applied by direct drawing onto a specific region corresponding to the size and shape of an article to be used, on the surface of a first plate 10, using a robot. A sheet shaped second plate 20 is placed on the first plate 10 where the adhesive 12 was applied, such that the adhesive 12 is interposed between both plates. Light for curing the adhesive is then irradiated from both sides of the adhesive 12 so that the light will pass through both the first plate 10 and the second plate 20 and reach the adhesive 12.Type: ApplicationFiled: November 30, 2012Publication date: December 4, 2014Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventor: Kotaro Shinozaki
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Publication number: 20140356563Abstract: A surface treatment method of an electronic device is provided. The surface treatment method includes processing a first pattern on a surface of a top mold and a second pattern on a surface of a bottom mold, coating a Ultra-Violet (UV) molding liquid on each of a front surface of a raw sheet material and the bottom mold facing a rear surface of the raw sheet material raw, positioning the raw sheet material between the top mold and the bottom mold, pressing the top mold and the bottom mold to each other, curing the UV molding liquid, and separating the raw sheet material from the top mold and the bottom mold and forming a print layer on the front surface and the rear surface of the raw sheet material.Type: ApplicationFiled: May 19, 2014Publication date: December 4, 2014Applicant: Samsung Electronics Co., Ltd.Inventors: Kyungmo YANG, Kiwoong KIM, Kwangsu SEO, Sungjae LEE, Yongwoo JEON, Wonhee CHOI, Byounguk YOON
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Patent number: 8901012Abstract: According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.Type: GrantFiled: August 30, 2012Date of Patent: December 2, 2014Assignee: Kabushiki Kaisha ToshibaInventors: Masayuki Hatano, Hiroshi Tokue
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Patent number: 8901197Abstract: A modified fluorocarbon resin composition and a modified molded product of fluorocarbon resin composition having an excellent abrasion resistivity and low friction property under high pressure, are provided. The modified fluorocarbon resin composition comprises a blend of fluorocarbon resin and aromatic engineering plastic, which is modified by irradiation of ionizing radiation.Type: GrantFiled: June 17, 2010Date of Patent: December 2, 2014Assignee: Hitachi Metals, Ltd.Inventors: Yasuaki Yamamoto, Etsuo Fukuchi, Hiroo Kusano
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Publication number: 20140346713Abstract: A method for forming fine patterns, including: holding, by a holding member, a sheet-like deformable thin-plate mold with fine patterns having been predeterminedly formed, above a UV-light-transparent substrate such that a UV hardening resin has been applied beforehand on a surface thereof, in such a manner that the mold is at a predetermined angle inclined with tension being applied; and letting a surface of the thin-plate mold serially get in contact with the UV hardening resin by allowing, after a first pressing roll installed above the thin-plate, mold is allowed to descend from above the thin-plate mold, the first pressing roll to relatively move concerning the substrate in a lateral direction while pressing, by the first pressing roll, the thin-plate mold against the UV hardening resin with a predetermined pressure.Type: ApplicationFiled: May 20, 2014Publication date: November 27, 2014Applicant: Panasonic CorporationInventor: Tosihiko WADA
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Patent number: 8894406Abstract: Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.Type: GrantFiled: September 9, 2011Date of Patent: November 25, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Eui Sun Choi, Eun Soo Hwang, Young Tae Cho, Dong Min Kim, Jeong Gil Kim, Jong Woo Lee, Eun Ah Park
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Publication number: 20140339742Abstract: A system for fabricating a composite article includes a pre-impregnation station for forming a prepreg comprising a reinforcement impregnated with a resin. The prepreg is provided to a blanking station where a blank is cut from the partially cured prepreg and arranged onto a preforming mold. The blank is then transferred to a forming station, and is formed into the composite article using a compression mold. The pre-impregnation station, the blanking station and the forming station are co-located. During forming of the blank into the composite article using the compression mold, additional prepreg is formed in the pre-impregnation station and passes to the blanking station so as to form a next blank for being formed into a next composite article during a subsequent molding cycle. Optionally, the prepreg is partially cured prior to being cut in the blanking station.Type: ApplicationFiled: January 10, 2013Publication date: November 20, 2014Inventors: Maximilian Amtmann, Boris Shulkin, Aldo Van Gelder, Todd Deaville
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Patent number: 8889055Abstract: An imprint lithography method is disclosed that includes bringing an imprint template into contact with imprintable medium provided on a substrate, and directing actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template.Type: GrantFiled: September 20, 2010Date of Patent: November 18, 2014Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Arie Jeffrey Den Boef
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Patent number: 8883065Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.Type: GrantFiled: December 2, 2009Date of Patent: November 11, 2014Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa
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Patent number: 8877103Abstract: Disclosed in this specification is a process for manufacturing a thermochromic contact lens. The process includes (1) selecting a photoinitiator that absorbs at a first wavelength and at least one thermochromic dye that displays substantial absorption at the first wavelength when the dye is at a first temperature and exhibits at least an 80% reduction in absorbance at the first wavelength at a second temperature, (2) maintaining the reaction mixture at the second temperature and (3) providing cure light that includes the first wavelength.Type: GrantFiled: April 8, 2011Date of Patent: November 4, 2014Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Nayiby Alvarez-Carrigan, Donnie J. Duis, Holly L. Grammer, Ture Kindt-Larsen, Frank F. Molock, Jr., Jaqunda Patton, Kim Sander Pedersen, Eric R. George
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Patent number: 8861080Abstract: Wire grid polarizers, methods of fabricating a wire grid polarizer and display panels including a wire grid polarizer are provided, the methods include preparing a mold having a lower surface in which a plurality of parallel fine grooves are formed, and arranging the mold on a transparent substrate. The plurality of parallel fine grooves are filled with a conductive liquid ink. A plurality of parallel conductive nano wires are formed on the transparent substrate by curing the conductive liquid ink. The mold is removed.Type: GrantFiled: January 16, 2012Date of Patent: October 14, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Chang-seung Lee, Jun-seong Kim, Ki-deok Bae
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Patent number: 8852494Abstract: A method and apparatus for performing nanoimprint lithography. When an electric field is applied between the mold and the substrate, various forces can be generated among molds, substrates, and resists. The electrostatic force between the mold and the substrate can serve as an imprinting pressure to press the structured mold into the conformable resist. In addition, the electric field induces additional wetting forces (electrowetting or dielectrophoresis) in a liquid resist, which can assist the flow and filling of the liquid resist into fine structures.Type: GrantFiled: October 31, 2007Date of Patent: October 7, 2014Assignee: Princeton UniversityInventors: Stephen Y. Chou, Xiaogan Liang
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Publication number: 20140295539Abstract: A container for culturing cells having nanostructures according to the present invention comprises a cell culture surface onto which adult stem cells are adhered so as to be proliferated and differentiated, wherein the cell culture surface comprises nanostructures placed thereon at regular intervals, the nanostructures comprise nano-pillars protruded from the cell culture surface, the width of the nano-pillars is 40-500 nm, and the height of the nano-pillars is 10 nm-1 ?m.Type: ApplicationFiled: March 28, 2012Publication date: October 2, 2014Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATIONInventors: Dong Sung Kim, Soo Hong Lee, Kyoung Je Cha, Kwang Sook Park
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Patent number: 8845320Abstract: An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.Type: GrantFiled: May 17, 2010Date of Patent: September 30, 2014Assignee: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen
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Patent number: 8845318Abstract: An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.Type: GrantFiled: July 27, 2009Date of Patent: September 30, 2014Assignee: Canon Kabushiki KaishaInventors: Nobuhito Suehira, Junichi Seki, Hideki Ina
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Patent number: 8840830Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies. A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.Type: GrantFiled: November 13, 2009Date of Patent: September 23, 2014Assignee: AJI Co., Ltd.Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, Katsumi Murofushi, Kunio Yoshida
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Publication number: 20140276474Abstract: A microprojection array comprising an approximately planar base and a plurality of microprojections, wherein the array comprises a therapeutic macromolecule and a stabilizing excipient. Described herein are microstructures having a proximal and distal layer, wherein the distal layer which contains the therapeutic molecule does not rely on the presence of a structure-forming polymer to impart the mechanical strength necessary to penetrate the skin. Methods of forming the array, and methods of using the array are contemplated.Type: ApplicationFiled: March 10, 2014Publication date: September 18, 2014Applicant: Corium International, Inc.Inventors: Zhongli Ding, Guohua Chen, Parminder Singh
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Patent number: 8834144Abstract: An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.Type: GrantFiled: February 23, 2010Date of Patent: September 16, 2014Assignee: Canon Kabushiki KaishaInventors: Takashi Nakamura, Hirohisa Ota, Eigo Kawakami, Kazuyuki Kasumi, Toshinobu Tokita
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Patent number: 8828283Abstract: An optical component and a method of producing the same, which optical component is obtained by photopolymerizing a photopolymerizable composition so as to comprise a matrix and numerous columnar structure bodies oriented in one direction within the matrix, wherein the columnar structure bodies differ in refractive index from the matrix and are arrayed in a lattice in the plane perpendicular to said orientation direction to have a highly arrayed structure whose refractive index periodically changes on the order of 80 nm to 1,000 micrometer. The optical component according to the invention is imparted with a structure whose refractive index periodically changes with high regularity on the order of about 80 nm to 1,000 micrometer and, owing to this property, is usable in optical sheet, optical film and other ordinary optical applications.Type: GrantFiled: November 2, 2010Date of Patent: September 9, 2014Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Toshiaki Hattori, Yoshihiro Uozu
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Patent number: 8828307Abstract: An imprint method includes contacting an imprint pattern of a mold and a resin material on a substrate. The resin material is cured by irradiating the resin material with light in a state in which the imprint pattern is in contact with the resin material. The mold is parted from the cured resin material, and gaseous molecules are irradiated, in an atmosphere in which the mold is placed, with an electromagnetic wave having a wavelength that is shorter than a wavelength of the light irradiating the resin material. The electromagnetic wave is emitted from an electrification removing light source that is provided in a lateral side of the mold. In the irradiating step, the gaseous molecules are ionized by the irradiation of the electromagnetic wave from the electrification removing light source. The ionized gaseous molecules are supplied into an atmosphere between the substrate and the mold to remove electrification of at least a portion of the mold.Type: GrantFiled: March 17, 2008Date of Patent: September 9, 2014Assignee: Canon Kabushiki KaishaInventors: Shingo Okushima, Junichi Seki, Atsunori Terasaki
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Patent number: 8815129Abstract: In order to realize a device and a method each capable of forming a lens with high accuracy and low costs, a lens forming device of the present invention includes a metal mold, an insulating substrate, a stage, a power source, a switch, and a UV radiating device. Dielectric resin is supplied onto the insulating substrate and a transfer surface of the metal mold is pressed to the dielectric resin so as to transfer a lens shape to the dielectric resin. At that time, the power source applies a voltage on the metal mold to generate an electric field between the metal mold and the insulating substrate so that an electrostatic attraction causes the dielectric resin to be attracted toward the transfer surface of the metal mold while the top of the dielectric resin has a sharp cuspate shape. Consequently, bubbles are less likely to be invade between the transfer surface and the dielectric resin, allowing transferring a highly accurate lens shape to the dielectric resin.Type: GrantFiled: September 29, 2010Date of Patent: August 26, 2014Assignee: Sharp Kabushiki KaishaInventors: Takahiro Nakahashi, Hiroyuki Hanato, Kenji Hirano, Norimichi Shigemitsu
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Publication number: 20140227476Abstract: The effectiveness of biomimetic dry adhesives at different ambient pressures is investigated. Biomimetic dry adhesives have great potential for space applications but there have been few studies on how these adhesives perform in low-pressure environments. Various geometrical configurations for cap and fiber structures of dry adhesive materials are disclosed. Various methods for manufacturing dry adhesive materials including a silicone rubber negative mold are disclosed. Various methods of manufacturing directly molded anisotropic dry adhesive structures with anisotropic peel strengths are also provided.Type: ApplicationFiled: February 24, 2014Publication date: August 14, 2014Applicant: SIMON FRASER UNIVERSITYInventors: Carlo MENON, Daniel Elliot SAMEOTO
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Publication number: 20140212536Abstract: Aspects of the present disclosure include a cylindrical master mold assembly having a cylindrical patterned component with a first diameter and a sacrificial casting component with a second diameter. The component with the smaller radius may be co-axially inserted into the interior of the component with the larger radius. Patterned features may be formed on the interior surface of the cylindrical patterned component that faces the sacrificial casting component. The sacrificial casting component may be removed once a cast polymer has been cured to allow the polymer to be released. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.Type: ApplicationFiled: January 31, 2013Publication date: July 31, 2014Applicant: Rolith, Inc.Inventors: Boris Kobrin, Ian McMackin
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Publication number: 20140191445Abstract: The invention relates to an irradiation and molding unit which can be cooled for curing light-curable polymer compositions, a method for preparing cured polymer moldings or articles coated with cured polymers by using the irradiation and molding unit which can be cooled, as well as the use of such irradiation unit for preparing polymer moldings or polymer coated articles.Type: ApplicationFiled: August 17, 2012Publication date: July 10, 2014Applicant: Momentive Performance Materials GmbHInventors: Stefan Rist, Clemens Trumm, Holger Albrecht
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Patent number: 8770965Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.Type: GrantFiled: February 10, 2012Date of Patent: July 8, 2014Assignee: Hitachi High-Technologies CorporationInventors: Ryuta Washiya, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
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Patent number: 8765034Abstract: According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value.Type: GrantFiled: February 14, 2013Date of Patent: July 1, 2014Assignee: Kabushiki Kaisha ToshibaInventor: Manabu Takakuwa
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Patent number: 8765048Abstract: The present invention generally relates to a mold assembly (32, 34) and a method of using the mold for the manufacture of composite parts which, more particularly, are generated from a strengthener in a generally solid phase and a matrix in a generally liquid phase. Various types of molds and processes may be used in order to impregnate a strengthener with a matrix such that a composite part may be manufactured, but the efficiency rate and the duration of the manufacturing process significantly varies depending on the chosen type of mold and process. The present invention relates to a mold assembly and to the manufacture of composites by using the mold assembly which includes the injection of the matrix in the mold assembly containing the strengthener and a deformable member (36) which favors the impregnation of the matrix toward the strengthener.Type: GrantFiled: May 9, 2012Date of Patent: July 1, 2014Assignee: Nike, Inc.Inventors: Eduardo Ruiz, Francios Trochu
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Patent number: 8758005Abstract: According to one embodiment, an imprint mask includes a quartz plate. The quartz plate has a plurality of concave sections formed in part of an upper surface on the quartz plate, and impurities are contained in a portion between the concave sections in the quartz plate.Type: GrantFiled: May 25, 2011Date of Patent: June 24, 2014Assignee: Kabushiki Kaisha ToshibaInventors: Masamitsu Itoh, Shingo Kanamitsu
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Patent number: 8758542Abstract: The present invention relates to a membrane filter comprising a plurality of pores of substantially the same size. The membrane filter may be supported by at least one support (e.g. in the form of a support grid) and is able to handle a large flux and pressure in use. The invention also relates to a method of fabrication of such a filter membrane using a solvable mold.Type: GrantFiled: November 9, 2009Date of Patent: June 24, 2014Assignee: Nanyang Technological UniversityInventors: Haiqing Gong, Longqing Chen
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Publication number: 20140167333Abstract: Methods of forming a curable pre-impregnated composite precursor material with radiation (e.g., actinic or electron-beam) curable resin composition systems are provided, as are the curable pre-impregnated composite precursor materials themselves. The resin systems have reversible temperature-viscosity control, which are advantageously used to form curable pre-impregnated composite precursor materials (pre-preg) that can be cured to form a composite article. The uncured resin composition comprises: (a) an acrylate or a methacrylate monomer; (b) an oligomer species selected from the group consisting of: polyethers, polyesters, epoxies, and combinations thereof; and (c) a photoinitiator. The uncured resin has a first viscosity at 21° C. (70° F.) of ?about 200,000 centipoise (cP) and a second viscosity of ?about 5,000 cP at 65° C. (149° F.) or above.Type: ApplicationFiled: December 18, 2012Publication date: June 19, 2014Applicant: Autoliv ASP, Inc.Inventors: Michael P. Jordan, Bradley W. Smith, Geoffrey A. Russell
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Publication number: 20140166615Abstract: Mold structures for imprint lithography are provided. Mold chip patterns including patterns for nano structures are disposed on a mold substrate. A trench region is provided between the mold chip patterns. Protrusion portions protrude from a bottom surface of the trench region. The protrusion portions extend along the trench region in a plan view.Type: ApplicationFiled: July 11, 2013Publication date: June 19, 2014Inventors: Zin Sig KIM, Hokyun Ahn
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Patent number: 8747092Abstract: The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere.Type: GrantFiled: January 21, 2011Date of Patent: June 10, 2014Assignee: Nanonex CorporationInventors: Wei Zhang, Hua Tan, Lin Hu, Stephen Y. Chou