Abstract: A method of calculating node potentials in a network including current flow nodes on wirings with high precision at high speed is provided. Provided are a drive method of making voltages applied to electron-emitting devices uniform using the calculating method and an apparatus for manufacturing an image display apparatus including the electron-emitting devices. Assume that n nodes are located between one end of a wiring in which a potential DL is set and the other end of the wiring in which a potential DR is set. At a j-th node counted from the one end, when a current value flowing therefrom is Ij, a node potential is Vj, resistance elements between a terminal and a node and between adjacent nodes are R0 to Rn+1, and a resistance between both end of the wiring is Rall, the node potential Vj is calculated by the following expression.

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract: The invention is directed to an arrangement for generating extreme ultraviolet (EUV) radiation based on a plasma that is generated by electric discharge. It is the object of the invention to provide a novel possibility for radiation sources based on an electric discharge by which a long lifetime of the electrodes that are employed and the largest possible solid angle for bundling the radiation emitted from the plasma are achieved. According to the invention, this object is met by providing coated electrodes in the form of two endless strip electrodes which circulate over guide rollers and which have at a short distance between them an area in which the electric discharge takes place.

Abstract: An EUV radiation source device with a chamber that is divided into a discharge space and a collector mirror space provided with EUV collector optics. Between them, an aperture component with an opening which is cooled is provided. First and second discharge electrodes are rotated. Sn or Li is irradiated with a laser. Pulsed power is applied between the first and second discharge electrodes to form a high density and high temperature plasma between the two electrodes so that EUV radiation with a wavelength of 13.5 nm is emitted, is focused by the EUV collector optics and is guided into the irradiation optical system of an exposure tool. There are a first pumping device and a second pumping device for pumping the discharge space and the collector mirror space. The discharge space is kept at a few Pa, and the collector mirror space is kept at a few 100 Pa.

Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

Abstract: An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.

Abstract: A ballastless high pressure discharge lamp includes an arc tube, electrodes disposed in the arc tube, a column of mercury disposed in the arc tube and having a volume less than the volume of the arc tube, and cushion material disposed in the arc tube adjacent at least one of the electrodes. The cushion material comprises an inert gas impinging upon at least one end of the column of mercury. At least one of the electrodes extends into the column of mercury. The discharge lamp also includes a heating member disposed adjacent the arc tube to separate the column of mercury into two sub-columns by the vaporization of a portion of the mercury column to thereby form a space between the two sub-columns and compress the cushion material and allow one of the mercury sub-columns to engage one of the electrodes whereby to form an arc in the space between the two sub-columns of mercury.

Abstract: Electrode arrangement with liquid-metal electrode of controllable surface, comprising a liquid-metal reservoir, a capillary connected thereto through a controllable valve and contact means being in electric contact with the liquid-metal in the capillary. According to the invention at least one section of the capillary is formed within a metal body not reacting chemically with the liquid-metal, said metal body constituting the contact means. Preferably, the metal body is formed so that an elastic closing element of the valve fits to a surface of the metal body surrounding an opening of the capillary section formed therein.

Abstract: A large-area liquid ion source comprises means for generating, over a large area of the surface of a liquid, an electric field of a strength sufficient to induce emission of ions from a large area of said liquid. Large areas in this context are those distinct from emitting areas in unidimensional emitters.