Electromagnetic Output (i.e., Light) Patents (Class 313/231.61)
  • Patent number: 11112109
    Abstract: A plasma heating apparatus including a boiler vessel for holding water to be heated, a cathode housed in the vessel, the cathode defining a watertight cathode chamber isolated from the water in the vessel, and, an anode housed in the cathode chamber, the anode including an internal passage for receiving a gas from outside of the vessel when the passage is connected to a gas supply, and wherein the anode is connectable to a power source for receiving power for generating a plasma in the cathode chamber. In another aspect, the present disclosure relates to a heat or power generating system or plant including the plasma heating apparatus.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: September 7, 2021
    Assignee: Aureon Energy Ltd.
    Inventor: Montgomery William Childs
  • Patent number: 11050210
    Abstract: To cool a capacitor including a first electrode and a second electrode, a capacitor cooling structure includes: a conducting part electrically connected with the first electrode; an insulating part that has a first surface including a first position and a second surface including a second position, and is connected with the conducting part at the first position; a first fastening part configured to fasten the conducting part and the insulating part to each other; and a cooling part connected with the second position facing the first position, the conducting part and the cooling part being electrically insulated from each other by the insulating part.
    Type: Grant
    Filed: December 30, 2019
    Date of Patent: June 29, 2021
    Assignee: Gigaphoton Inc.
    Inventors: Hisakazu Katsuumi, Junichi Fujimoto, Satoshi Tanaka
  • Patent number: 9431233
    Abstract: A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb in which a dose for generation of light using the microwaves and at least one metallic material for generation of thermal electrons are received. The metallic material reduces an electric field intensity required for electric discharge by discharging thermal electrons. In this way, the plasma lighting system reduces the time it takes to turn the light back on after the light is turned off.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: August 30, 2016
    Assignee: LG ELECTRONICS INC.
    Inventors: Donghun Kim, Hyunjung Kim, Byeongju Park
  • Patent number: 9218951
    Abstract: A plasma lighting system includes a magnetron configured to generate microwaves, and a bulb filled with a main dose and an additive dose. The main dose and the additive dose generate light under the influence of microwaves and have the maximum intensities of respective intrinsic wavelengths at different wavelengths. A waveguide is configured to guide the microwaves generated by the magnetron to the bulb. A motor is configured to rotate the bulb. A sensor is configured to sense the intensity of light having a specific wavelength emitted from the bulb. A controller is connected to the motor. The controller adjusts the Revolutions Per Minute (RPM) of the bulb based on the intensity of light having the specific wavelength sensed by the sensor. With this arrangement, a Color Rendering Index (CRI) of the plasma lighting system may be adjusted during operation.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: December 22, 2015
    Assignee: LG Electronics Inc.
    Inventors: Donghun Kim, Junsung Kim, Byeongju Park
  • Patent number: 9144623
    Abstract: The refrigerator includes a thermally insulated box with a first board, a plasma device and a pipeline, all of which are embedded in the first board. The plasma device includes an atomizer with a water tank and a first fan, a plasma generator and a pipeline. The plasma generator is hermetically connected to the atomizer and has an electrode device. The electrode device includes a dielectric plate and a plurality of electrode rods embedded therein. The electrode rods are interlacedly electrically connected to an AC source. The pipeline is hermetically connected to the plasma generator and composed of an inlet section with an inlet, an outlet section with at least one outlet and a middle section communicating with the dielectric plate. The inlet is provided with a second fan.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: September 29, 2015
    Inventor: Chung-Ping Lai
  • Patent number: 8823264
    Abstract: A lamp has microwave resonant body (11) of transparent quartz. The body has a central bore (16), having a sealed plasma enclosing bulb (17) inserted in it. The bulb is of quartz also and has an external diameter which is a close fit in the bore. The bulb itself is of drawn quartz tube (18) and as such has a smooth internal bore (19). End caps (20) are fused to the tube and encapsulate a charge of a material excitable to form a light emitting plasma in the bulb when microwaves are fed into the body via an antenna (7) in a bore (21) in the body. The body is sized to establish resonance within the Faraday cage in the body (11), bulb (17) and fill containing void (22) within the bulb. There is negligible gap between the bulb and body, whereby they can be regarded as one for resonance purposes. The bulb is fixed in the body by welds (23).
    Type: Grant
    Filed: October 18, 2010
    Date of Patent: September 2, 2014
    Inventor: Barry Preston
  • Patent number: 8810122
    Abstract: The present invention provides a multi-mode plasma arc torch that includes a cylindrical vessel having a first end and a second end, a first tangential inlet/outlet connected to or proximate to the first end, a second tangential inlet/outlet connected to or proximate to the second end, an electrode housing connected to the first end of the cylindrical vessel such that a first electrode is (a) aligned with a longitudinal axis of the cylindrical vessel, and (b) extends into the cylindrical vessel, and a hollow electrode nozzle connected to the second end of the cylindrical vessel such that the center line of the hollow electrode nozzle is aligned with the longitudinal axis of the cylindrical vessel. Adjusting a position of the electrode with respect to the hollow electrode causes the multi-mode plasma arc torch to operate in a dead short resistive mode, a submerged arc mode, an electrolysis mode, a glow discharge mode or a plasma arc mode.
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: August 19, 2014
    Assignee: Foret Plasma Labs, LLC
    Inventor: Todd Foret
  • Patent number: 8796652
    Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: August 5, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Anatoly Shchemelinin, Matthew Alan Panzer
  • Patent number: 8563924
    Abstract: An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: October 22, 2013
    Assignee: Agilent Technologies, Inc.
    Inventors: James Edward Cooley, Sameer Kothari
  • Patent number: 8497491
    Abstract: An air disinfection device aimed at improving the efficiency and quality of air disinfection or sterilization may be achieved through an air disinfection device comprising a body housing a power supply and control unit, which, in turn, comprises an energy storage capacitor, a high-voltage constant current source, an ignition pulse generator, a ferrite-core pulse transformer, and a program control unit. The air disinfection device may also comprise an ultra-violet radiation source in the form of a pulsed gas-discharge lamp mounted on the body and enclosed in a tubular quartz casing. Given that the energy storage capacitor and the pulsed gas-discharge lamp may form a discharge circuit connected to the ignition pulse generator through the ferrite-core pulse transformer, the pulsed gas-discharge lamp may be placed in a bactericidal radiation translucent casing, resulting in convection air-cooling due to a natural draft inside the casing that disinfects and sterilizes surrounding air.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: July 30, 2013
    Assignee: Yanex Intellectual Property Limited
    Inventors: Yakov Abrammerovich Goldshtein, Sergei Gennadevich Shashkovsky
  • Patent number: 8319439
    Abstract: An electrodeless plasma lamp and a method of controlling operation of a plasma lamp are provided. The plasma lamp may a power source to provide radio frequency (RF) power and a lamp body to receive the RF power from a feed. The lamp body may comprise a dielectric material having a dielectric constant greater than 2 and bulb is provided that contains a fill that forms a plasma that emits light when at least a portion of the RF power is coupled to the fill. A light guide directs light from the bulb to a photosensor that is shielded from light output from a front side of the lamp body. The lamp includes a drive circuit to control operation of the lamp based on a level of light detected by the photosensor.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: November 27, 2012
    Assignee: Luxim Corporation
    Inventors: Gregg Hollingsworth, Marc DeVincentis, Anthony D. McGettigan, Sandeep Mudunuri, Naresh Murthy, Dan O'Hare
  • Patent number: 8154216
    Abstract: Described is a plasma electrode-less lamp. The device comprises an electromagnetic resonator and an electromagnetic radiation source conductively connected with the electromagnetic resonator. The device further comprises a pair of field probes, the field probes conductively connected with the electromagnetic resonator. A gas-fill vessel is formed from a closed, transparent body, forming a cavity. The gas-fill vessel is not contiguous with (detached from) the electromagnetic resonator and is capacitively coupled with the field probes. The gas-fill vessel further contains a gas within the cavity, whereby the gas is induced to emit light when electromagnetic radiation from the electromagnetic radiation source resonates inside the electromagnetic resonator, the electromagnetic resonator capacitively coupling the electromagnetic radiation to the gas, which becomes a plasma and emits light.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: April 10, 2012
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick Matthew Espiau, Mehran Matloubian
  • Patent number: 8089203
    Abstract: A lamp comprises a light source in the form of a light emitting resonator 1, a magnetron 2 and a stub tuner 3. A reflector 4 is fitted at the junction of the light source and the stub tuner, for directing the light in a generally collimated beam 5. The light emitting resonator comprises an enclosure 11 formed of inner and outer envelopes 12,13 of quartz. These are circular cylindrical tubes 14,15, with respective end plates 16,17. A tungsten wire mesh 18, of a mesh size to exhibit a ground plane to microwaves within the resonator, is sandwiched between the tubes and the end plates respectively. Each envelope, comprised of its tube and end plates is hermetic. An earth connection 18? extends from the mesh to the outside of the envelope. The length axially of the enclosure between the wire mesh sandwiched between the end plates is ?/2 for the operating microwave frequency. At one end of the enclosure, a molybdenum drive connection 19 extends to a tungsten disc 20.
    Type: Grant
    Filed: November 14, 2008
    Date of Patent: January 3, 2012
    Inventor: Andrew Simon Neate
  • Patent number: 8040030
    Abstract: The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma (8) emitting EUV radiation or soft X-rays is generated in a gaseous medium formed by an evaporated liquid material in a discharge space, said liquid material being provided on a surface in the discharge space and being at least partially evaporated by an energy beam (9). The invention also refers to a corresponding apparatus for producing EUV radiation and/or soft X-rays. In the method, a gas (11) composed of chemical elements having a lower mass number than chemical elements of the liquid material is supplied through at least one nozzle (10) in a directed manner to the discharge space and/or to the liquid material on a supply path to the discharge space in order to reduce the density of the evaporated liquid material in the discharge space. With the present method and corresponding apparatus the conversion efficiency of the lamp is increased.
    Type: Grant
    Filed: May 8, 2007
    Date of Patent: October 18, 2011
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange
  • Patent number: 7696493
    Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: April 13, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Derk Jan Wilfred Klunder
  • Patent number: 7692169
    Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: April 6, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen
  • Patent number: 7580110
    Abstract: An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting source generates pulsed light by producing plasma from an intermittently supplied target material. A reticle stage holds a reticle that is irradiated by the pulsed light. A photosensitive substrate stage holds a photosensitive substrate irradiated by the pulsed light patterned by the reticle. A control means controls the photosensitive substrate stage so that, before exposing the photosensitive substrate begins, the timing between an exposure starting point or an exposure ending point and the light emission timing are matched based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.
    Type: Grant
    Filed: January 7, 2008
    Date of Patent: August 25, 2009
    Assignee: Nikon Corporation
    Inventors: Hiroyuki Kondo, Takashi Miyachi
  • Patent number: 7566889
    Abstract: A combination of radio frequency energy responsive and infrared energy responsive reflection based plasma radiant energy steering apparatus usable in directing radiant energy originating in for example an antenna array or an infrared source in order to direct the energy to a point of use under conditions of low inertia electrical directing control. Plasma gas films of electrode element determined properties achieve reflection control of the radiant energy both with and without use of a discrete reflector element. Theoretical support and identification of prior art supporting documents are included in the disclosure.
    Type: Grant
    Filed: September 11, 2006
    Date of Patent: July 28, 2009
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Timothy R. Klein, Stanley Rogers
  • Patent number: 7541604
    Abstract: The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings.
    Type: Grant
    Filed: November 15, 2006
    Date of Patent: June 2, 2009
    Assignee: XTREME techonolgies GmbH
    Inventors: Sven Goetze, Harald Ebel, Juergen Kleinschmidt, Imtiaz Ahmad
  • Publication number: 20090040491
    Abstract: A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
    Type: Application
    Filed: August 6, 2007
    Publication date: February 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Publication number: 20090026911
    Abstract: A lamp and methods of forming are shown. In one example, a dielectric layer is formed over a gap between conductors in a plasma lamp. Electric arcing is reduced or eliminated, thus allowing tighter gaps and/or higher voltages. In one example a glass frit method is used to apply the dielectric layer. A lamp is shown with a barrier layer that prevents tarnish such as tarnish from sulfur exposure. The barrier layer reduces or prevents degradation of the lamp due to conversion of a conductor material to non-conductive tarnish material.
    Type: Application
    Filed: July 23, 2008
    Publication date: January 29, 2009
    Applicant: Luxim Corporation
    Inventors: Abdeslam Hafidi, Sandeep Mudunuri
  • Publication number: 20080152943
    Abstract: The invention is directed to a process for the creation of a photonic lattice on the surface of an emissive substrate comprising first depositing a thin film metal layer on at least one surface of the substrate, the thin film metal comprising a metal having a melting point lower than the melting point of the substrate, then annealing the thin film metal layer and the substrate to create nano-particles on the substrate surface, and anodizing or plasma etching the annealed thin film metal and substrate to create pores in the nano-particles and the substrate such that upon exposure to high temperature the emissivity of the substrate is refocused to generate emissions in the visible and lower infrared region and to substantially eliminate higher infrared emission, and to the substrate thus created.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventor: Deeder M. Aurongzeb
  • Patent number: 7329884
    Abstract: An exposure apparatus and exposure method that produces plasma from a target material, generates pulsed light, and carries out exposure with the pulsed light. In particular, a light emitting source generates pulsed light by producing plasma from an intermittently supplied target material. A reticle stage holds a reticle that is irradiated by the pulsed light. A photosensitive substrate stage holds a photosensitive substrate irradiated by the pulsed light patterned by the reticle. A control means controls the photosensitive substrate stage so that, before exposing the photosensitive substrate begins, the timing between an exposure starting point or an exposure ending point and the light emission timing are matched based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light.
    Type: Grant
    Filed: November 2, 2005
    Date of Patent: February 12, 2008
    Assignee: Nikon Corporation
    Inventors: Hiroyuki Kondo, Takashi Miyachi
  • Patent number: 7291985
    Abstract: Described is a plasma electrode-less lamp. The device comprises an electromagnetic resonator and an electromagnetic radiation source conductively connected with the electromagnetic resonator. The device further comprises a pair of field probes, the field probes conductively connected with the electromagnetic resonator. A gas-fill vessel is formed from a closed, transparent body, forming a cavity. The gas-fill vessel is not contiguous with (detached from) the electromagnetic resonator and is capacitively coupled with the field probes. The gas-fill vessel further contains a gas within the cavity, whereby the gas is induced to emit light when electromagnetic radiation from the electromagnetic radiation source resonates inside the electromagnetic resonator, the electromagnetic resonator capacitively coupling the electromagnetic radiation to the gas, which becomes a plasma and emits light.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: November 6, 2007
    Assignee: Topanga Technologies, Inc.
    Inventors: Frederick M. Espiau, Mehran Matloubian
  • Patent number: 7233100
    Abstract: A lighting apparatus using microwave comprises: a waveguide for transmitting microwave generated in a magnetron; a mesh screen installed on an outlet portion of the waveguide for blocking a leakage of the microwave and passing light; a bulb located in the mesh screen for emitting light by the microwave; a dielectric mirror installed on the outlet portion of the waveguide for reflecting the light emitted in the bulb forward parallelly; and a reflector installed around the mesh screen for reflecting the light emitted in the bulb forward, and the reflector and the dielectric mirror are constructed so that the light generated in the bulb can be radiated as parallel ray, whereby loss of light can be minimized and lighting efficiency can be improved.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: June 19, 2007
    Assignee: LG Electronics Inc.
    Inventor: Hyoun-Soo Hea
  • Patent number: 6998785
    Abstract: Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: February 14, 2006
    Assignee: University of Central Florida Research Foundation, Inc.
    Inventors: William T. Silfvast, Martin C. Richardson
  • Patent number: 6982421
    Abstract: To both increase the efficiency of conversion into EUV radiation energy and also increase the amount of emerging EUV radiation in an EUV source a discharge tube is connected to a gas supply space for supply of the discharge gas which in located radially with respect to an optical axis. The discharge gas is supplied to the discharge space through the gas supply space, passes through the center opening of the anode, emerges from the discharge part and is afterwards evacuated from an evacuation opening. The anode and the cathode are connected to a pulse current source. Discharge plasma is produced and EUV radiation is formed by a heavy current pulse from the pulse current source within the discharge space of the discharge tube. The EUV radiation which has formed passes through a through-opening of the anode and is emitted to the outside.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: January 3, 2006
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Hiroto Sato, Kazunori Bessho, Yusuke Teramoto, Daiki Yamatani
  • Patent number: 6914370
    Abstract: Disclosed are an upper substrate structure for a plasma display panel including a dielectric layer reinforcing color properties and a fabricating method thereof. The upper substrate structure comprises a sustain electrode formed on an upper glass substrate, a bus electrode formed on the sustain electrode, and an upper substrate dielectric layer formed over a lower part of the surface created by two electrodes and the glass substrate. There is also included a colorant having color properties of red, blue, and green colors, and a protection layer formed on the dielectric layer. The dielectric layer may include one or more colorants so that important properties of PDP such as selective brightness of desired color, color temperature, and color purity improvement can be controlled.
    Type: Grant
    Filed: October 25, 2002
    Date of Patent: July 5, 2005
    Assignee: LG Electronics Inc.
    Inventor: Yoon-Kwan Lee
  • Patent number: 6856093
    Abstract: It is desirable to be able to provide evenly illuminated, long lasting, relatively high power ultraviolet radiation for manufacturing processes such as sterilization and ink or adhesive curing. A generally rigid waveguide (2) having a slot (8) formed in one of its short sides (4) (or optionally one of its long sides (6)) may have an ultraviolet energizable elongate lamp (10) inserted therein. When the waveguide is coupled to a source of microwave energy, the slot radiates and the radiated energy is coupled almost exclusively into the lamp (10). With suitable choices of slot widths this provides even illumination with minimal microwave leakage.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: February 15, 2005
    Assignee: JenAct Limited
    Inventors: Richard Little, David Briggs
  • Patent number: 6744221
    Abstract: An electrodeless lighting system, including a waveguide having an outlet which is installed being protruded from the inside of a casing to the outside of the casing, for transmitting a microwave generated in the magnetron, a resonator fixed at the outer side of the outlet of the waveguide, for forming a resonant region in which the microwave is resonated, a bulb for generating light as plasma is generated by an electric field which is formed inside the resonator and a lighting promoting means positioned inside the bulb, for concentrating the electric field so that light is rapidly emitted when the microwave is applied, can achieve convenience of a user and increase reliability of lighting as the bulb rapidly emits light.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: June 1, 2004
    Assignee: LG Electronics Inc.
    Inventors: Joon-Sik Choi, Yong-Seog Jeon, Hyo-Sik Jeon, Hyun-Jung Kim, Ji-Young Lee, Byeong-Ju Park
  • Patent number: 6452315
    Abstract: An improved apparatus is provided for in-situ cleaning of electron microscopes and other vacuum chambers. A special RF plasma electrode is housed in a compact cylinder constructed of standard vacuum components and a electrical feedthrough. The device allows oxygen radicals to be generated from air by a low powered RF plasma. The oxygen radical flow by convection into the electron microscope or vacuum chamber to be cleaned and react with hydrocarbons to form CO and H2O vapor which is pumped away.
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: September 17, 2002
    Inventor: Ronald A. Vane
  • Publication number: 20020021068
    Abstract: A device for generating electromagnetic radiation including a cathode and an anode. The output port that is integral with the cathode is an electron emitting sheet of material having a low work function for emitting electrons and for a given thickness has a large transmissivity for transmitting radiation. The anode has a target configuration capable of emitting electromagnetic radiation when irradiated by an electron beam. The cathode sheet is supported by a support layer that is selected to be transmissive to the electromagnetic radiation when the cathode sheet must be thin enough to transmit the radiation but is not thick enough to be self supporting. When the support layer is an insulator, electrical connection is made directly to the cathode sheet or to a conducting layer interposed between the cathode sheet and support layer.
    Type: Application
    Filed: July 22, 1998
    Publication date: February 21, 2002
    Inventor: ROBERT ESPINOSA
  • Patent number: 6323601
    Abstract: A reflector for use in an ultraviolet or other type of lamp system having a plasma bulb. The reflector includes one or more longitudinally extending reflector panels having a characteristic shape that advantageously reflects ultraviolet radiation emanating from the bulb to provide a uniform irradiance over a relatively large surface area of a substrate. A substantial portion of each reflector panel has a characteristic shape described by the equation (x/a)(2+n)+(y/b)(2+m)=1, where a and b are constants and n and m are exponents that range between 0 and 2.
    Type: Grant
    Filed: September 11, 2000
    Date of Patent: November 27, 2001
    Assignee: Nordson Corporation
    Inventors: Richard G. Klein, James W. Schmitkons