Plasma Patents (Class 313/231.31)
  • Patent number: 10529532
    Abstract: An ion source having an ion generation container configured to generate ions by reacting ionized gas introduced into the container via a tubular gas introduction pipe with an ion source material emitted in the container. The gas introduction pipe is configured to introduce the ionized gas into an inner space of the gas introduction pipe via a gas supply pipe. In the inner space of the gas introduction pipe, a detachable cooling trap member is disposed and includes a cooling trap portion configured to cool and trap a byproduct produced in the ion generation container. The cooling trap portion is disposed near a supply-side leading end of the gas supply pipe in the inner space of the gas introduction pipe and is not contact with an interior wall face of the gas introduction pipe.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: January 7, 2020
    Assignee: ULVAC, INC.
    Inventors: Takumi Yuze, Toshihiro Terasawa, Naruyasu Sasaki
  • Patent number: 10395895
    Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: August 27, 2019
    Assignee: MKS Instruments, Inc.
    Inventors: David J. Coumou, Ross Reinhardt, Yuriy Elner, Daniel M. Gill, Richard Pham
  • Patent number: 10368427
    Abstract: Plasma devices and methods for using such plasma devices in analytical measurements are disclosed. In certain examples, a low flow plasma may be operative using a total argon gas flow of less than about five liters per minute, and in some embodiments, a plasma argon gas flow of less than about four liter per minute. In other examples, a plasma produced using inductive and capacitive coupling is disclosed.
    Type: Grant
    Filed: January 19, 2014
    Date of Patent: July 30, 2019
    Assignee: PerkinElmer Health Sciences, Inc.
    Inventor: Peter J Morrisroe
  • Patent number: 10273944
    Abstract: A propellant distributor or anode includes a plenum chamber and a plurality of outlets. The at least one plenum chamber is configured to receive a flow of propellant from an inlet, and the plurality of outlets are configured to distribute the flow of propellant into an inner channel wall and an outer channel wall of a discharge channel.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: April 30, 2019
    Assignee: The United States of America as Represented by the Administrator of National Aeronautics and Space Administration
    Inventors: Wensheng Huang, John Yim
  • Patent number: 10237962
    Abstract: A plasma system is disclosed. The plasma system includes a plasma instrument having an elongated body defining a lumen therethrough and a first electrode and a second electrode; an ionizable media source in fluid communication with the lumen and configured to supply ionizable media thereto; and a variable frequency energy source adapted to be coupled to the first and second electrodes and configured to supply energy to the first and second electrodes sufficient to ignite ionizable media supplied by the ionizable media source to generate a plasma influent, wherein a frequency of the energy is adjustable to modify at least one property of the plasma effluent.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: March 19, 2019
    Assignee: COVIDIEN LP
    Inventors: James E. Thompson, Daniel A. Friedrichs
  • Patent number: 10224184
    Abstract: Systems and methods for adjusting the source impedance of a generator are disclosed. An exemplary method includes generating a first signal and applying the first signal to a first input of a combiner, generating a second signal and applying the second signal to a second input of said combiner, and combining the first and second signals with the combiner at an output of the combiner to produce power that is delivered to the plasma load. A controllable variable impedance is provided to an isolation port of the combiner, and the controllable variable impedance is adjusted to vary the source impedance of the generator.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: March 5, 2019
    Assignee: AES Global Holdings, PTE. LTD
    Inventor: Gideon Van Zyl
  • Patent number: 10213246
    Abstract: Tissue is treated using a radiofrequency power supply connected to an applicator having a chamber filled with an electrically non-conductive gas surrounded by a thin dielectric wall. A radiofrequency voltage is applied at a level sufficient to ionize the gas into a plasma and to capacitively couple the ionized plasma with the tissue to deliver radiofrequency current to ablate or otherwise treat the tissue.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: February 26, 2019
    Assignee: Hermes Innovations LLC
    Inventors: Akos Toth, Csaba Truckai
  • Patent number: 10219364
    Abstract: Embodiments of the present invention provide for movement of a fluid around a small form-factor device, such as a semiconductor device die or package, through use of a microplasma. Embodiments provide for a microplasma generated in an ambient fluid with a lower power than predicted by a Paschen Curve for that fluid. The ionized molecules of the plasma can be manipulated by further generation of an electric field that can be used, for example, to move the ions in a desired direction. The movement of the ionized fluid generates a fluid flow of neighboring, non-ionized fluid molecules in the desired direction.
    Type: Grant
    Filed: May 4, 2017
    Date of Patent: February 26, 2019
    Assignee: NXP USA, Inc.
    Inventor: Andrew Paul Dickens
  • Patent number: 10172228
    Abstract: An apparatus for generating high frequency electromagnetic radiation includes a whispering gallery mode resonator, coupled to an output waveguide through a coupling aperture. The resonator has a guiding surface, and supports a whispering gallery electromagnetic eigenmode. An electron source is configured to generate a velocity vector-modulated electron beam, where each electron in the velocity vector-modulated electron beam travels substantially perpendicular to the guiding surface, while interacting with the whispering gallery electromagnetic eigenmode in the whispering gallery mode resonator, generating high frequency electromagnetic radiation in the output waveguide.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: January 1, 2019
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Sami G. Tantawi, Filippos Toufexis, Michael V. Fazio, Valery A. Dolgashev
  • Patent number: 10143510
    Abstract: The invention relates to an assembly for treating wounds and to a hand held unit for treating wounds. The assembly and the hand held unit comprise a device for producing a plasma and/or an excited gas or gas mixture by means of a piezoelectric transformer, which is housed together with a circuit board in a housing of the device, and the assembly comprises an expansion element. A control circuit, to which the piezoelectric transformer is electrically connected, is realized on the circuit board. A second end of the expansion element surrounds a wound region to be treated. A first end of the expansion element is detachably connected to the housing of the device at the opening of the housing. The produced plasma and/or excited gas or gas mixture thus enters the expansion element from the opening of the housing.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: December 4, 2018
    Assignee: Relyon Plasma GmbH
    Inventors: Stefan Nettesheim, Dariusz Korzec, Dominik Burger
  • Patent number: 10128090
    Abstract: A method to detect a potential fault in a plasma system is described. The method includes accessing a model of one or more parts of the plasma system. The method further includes receiving data regarding a supply of RF power to a plasma chamber. The RF power is supplied using a configuration that includes one or more states. The method also includes using the data to produce model data at an output of the model. The method includes examining the model data. The examination is of one or more variables that characterize performance of a plasma process of the plasma system. The method includes identifying the fault for the one or more variables. The method further includes determining that the fault has occurred for a pre-determined period of time such that the fault is identified as an event. The method includes classifying the event.
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: November 13, 2018
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., James Hugh Rogers, Nicholas Edward Webb, Peter T. Muraoka
  • Patent number: 9989480
    Abstract: An inspection system having an expanded angular coverage, the inspection system may include a line camera; a first curved mirror; a second curved mirror; a first focusing lens that is positioned between the first mirror and an object; a second focusing lens that is positioned between the second mirror and the object; a first light source that is configured to direct a first part of a first light beam towards the first curved mirror and a second part of the first light beam towards the first focusing lens; a second light source that is configured to direct a first part of a second light beam towards the second curved mirror and a second part of the second light beam towards the second focusing lens.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: June 5, 2018
    Assignee: CAMTEK LTD.
    Inventors: Noam Gordon, Itay Cohen
  • Patent number: 9987611
    Abstract: A non-thermal plasma is generated to selectively convert a precursor to a product. More specifically, plasma forming material and a precursor material are provided to a reaction zone of a vessel. The reaction zone is exposed to microwave radiation, including exposing the plasma forming material and the precursor material to the microwave radiation. The exposure of the plasma forming material to the microwave radiation selectively converts the plasma forming material to a non-thermal plasma including formation of one or more streamers. The precursor material is mixed with the plasma forming material and the precursor material is exposed to the non-thermal plasma including exposing the precursor material to the one or more streamers. The exposure of the precursor material to the streamers and the microwave radiation selectively converts the precursor material to a product.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: June 5, 2018
    Assignee: H Quest Vanguard, Inc.
    Inventors: James J. Strohm, George L. Skoptsov, Evan T. Musselman, Kurt W. Zeller
  • Patent number: 9934929
    Abstract: A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: April 3, 2018
    Assignee: Colorado State University Research Foundation
    Inventors: Rafael A. Martinez, John D. Williams, Joel A. Moritz, Jr., Casey C. Farnell
  • Patent number: 9924586
    Abstract: This disclosure relates to methods and devices for generating electron dense air plasmas at atmospheric pressures. In particular, this disclosure relate to self-contained toroidal air plasmas. Methods and apparatuses have been developed for generating atmospheric toroidal air plasmas. The air plasmas are self-confining, can be projected, and do not require additional support equipment once formed.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: March 20, 2018
    Assignee: The Curators of the University of Missouri
    Inventor: Randy D. Curry
  • Patent number: 9901385
    Abstract: The electrosurgical systems and methods of the present disclosure perform cable compensation using an electrosurgical generator that includes a plurality of sensors configured to sense voltage and current waveforms, a plurality of medium-band filters, a plurality of narrowband filters, and a signal processor. The plurality of medium-band filters and narrowband filters pass sensed voltage and current waveforms at a plurality of predetermined frequencies. The signal processor calculates medium-band RMS voltage and current values using the output from the plurality of medium-band filters, calculates narrowband phase and magnitude values using the output from the plurality of narrowband filters, calculates tissue impedance based on the medium-band RMS voltage and current values and the narrowband phase value, and generates a control signal to control the energy generated by the electrosurgical generator based on the calculated tissue impedance.
    Type: Grant
    Filed: November 6, 2014
    Date of Patent: February 27, 2018
    Assignee: COVIDIEN LP
    Inventors: Robert H. Wham, Andrey Y. Belous, Alexander M. Waskiewicz, Anthony D. Ricke
  • Patent number: 9814127
    Abstract: The present disclosure provides a liquid treatment device and a liquid treatment method each capable of efficiently generating plasma and treating a liquid in a short time period. A liquid treatment device according to the present disclosure includes a first electrode, a second electrode disposed in a liquid, an insulator disposed surrounding the first electrode through a space, the insulator having an opening portion at a position in contact with the liquid, and a power supply that applies an AC voltage or a pulse voltage between the first electrode and the second electrode.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: November 7, 2017
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Shin-ichi Imai, Hironori Kumagai, Mari Onodera
  • Patent number: 9741544
    Abstract: Systems and methods for adjusting the source impedance of a generator are disclosed. An exemplary method includes generating a first signal and applying the first signal to a first input of a combiner, generating a second signal and applying the second signal to a second input of said combiner, and combining the first and second signals with the combiner at an output of the combiner to produce power that is delivered to the plasma load. A controllable variable impedance is provided to an isolation port of the combiner, and the controllable variable impedance is adjusted to vary the source impedance of the generator.
    Type: Grant
    Filed: March 24, 2015
    Date of Patent: August 22, 2017
    Assignee: Advanced Energy Industries, Inc.
    Inventor: Gideon Van Zyl
  • Patent number: 9741541
    Abstract: A high frequency plasma apparatus includes a reaction chamber, a first electrode, a second electrode, and a plurality of feed points located at one of the two electrodes at least. The feed points are used to simultaneously generate a first standing wave and a second standing wave, with different temporal and spatial patterns. By adjusting amplitudes of the two standing waves and the temporal and spatial phase differences between the two standing waves appropriately, plasma uniformity of the high frequency plasma apparatus can be effectively improved.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: August 22, 2017
    Assignee: INSTITUTE OF NUCLEAR ENERGY RESEARCH, ATOMIC ENERGY COUNCIL, EXECUTIVE YUAN, R.O.C.
    Inventors: Hsin-Liang Chen, Cheng-Chang Hsieh, Deng-Lain Lin, Ching-Pei Tseng, Ming-Chung Yang
  • Patent number: 9728376
    Abstract: Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: August 8, 2017
    Assignee: STARFIRE INDUSTRIES, LLC
    Inventors: Robert A. Stubbers, Daniel P. Menet, Michael J. Williams, Brian E. Jurczyk
  • Patent number: 9708707
    Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, comprising introducing a first plurality of precursors to deposit a thin layer with the deposition process not self limiting, followed by introducing a second plurality of precursors for plasma treating the thin deposited layer. The plasma can be isotropic, anisotropic, or a combination of isotropic and anisotropic to optimize the effectiveness of the treatment of the thin deposited layers.
    Type: Grant
    Filed: May 19, 2010
    Date of Patent: July 18, 2017
    Assignee: ASM INTERNATIONAL N.V.
    Inventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
  • Patent number: 9691591
    Abstract: The microwave plasma processing apparatus includes a power feeding rod that applies high frequency wave for RF bias, the upper end of which is connected to a susceptor, and the lower end of which is connected to a high frequency output terminal of a matcher in a matching unit; a cylindrical external conductor that encloses around the power feeding rod serving as an internal conductor; and a coaxial line. The coaxial line is installed with a choke mechanism configured to block undesired microwave that enters the line from a plasma producing space in a chamber, and leakage of the microwave to an RF feeding line is prevented in the middle of the line, thereby suppressing the microwave leakage.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: June 27, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Masahide Iwasaki
  • Patent number: 9583316
    Abstract: A method for processing substrate in a processing chamber, which has at least one plasma generating source and a gas source for providing process gas into the chamber, is provided. The method includes exciting the plasma generating source with an RF signal having RF frequency. The method further includes pulsing the gas source, using at least a first gas pulsing frequency, such that a first process gas is flowed into the chamber during a first portion of a gas pulsing period and a second process gas is flowed into the chamber during a second portion of the gas pulsing period, which is associated with the first gas pulsing frequency. The second process gas has a lower reactant-gas-to-inert-gas ratio relative to a reactant-gas-to-inert-gas ratio of the first process gas. The second process gas is formed by removing at least a portion of a reactant gas flow from the first process gas.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: February 28, 2017
    Assignee: Lam Research Corporation
    Inventor: Keren Jacobs Kanarik
  • Patent number: 9515162
    Abstract: A substrate having a buffer layer and a barrier layer is formed. The buffer and barrier layers have different bandgaps such that an electrically conductive channel comprising a two-dimensional charge carrier gas arises at an interface between the buffer and barrier layers due to piezoelectric effects. The substrate is placed in a fluorine containing gas mixture that includes free radical state fluorine particles and is substantially devoid of ionic state fluorine particles. A first lateral surface section of the substrate is exposed to the gas mixture such that the free radical state fluorine particles contact the first lateral surface section without penetrating the substrate. A semiconductor device that incorporates first lateral surface section in the structure of the device is formed in the substrate.
    Type: Grant
    Filed: March 4, 2015
    Date of Patent: December 6, 2016
    Assignee: Infineon Technologies Austria AG
    Inventors: Maria Reiner, Clemens Ostermaier, Peter Lagger, Gerhard Prechtl, Oliver Haeberlen, Josef Schellander, Guenter Denifl, Michael Stadtmueller
  • Patent number: 9460898
    Abstract: A faceplate or a selectivity modulation device (SMD) for a plasma generation chamber has a plasma resistant ceramic coating on a surface of the faceplate or SMD, wherein the plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: October 4, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Sung Je Kim, Soonam Park, Dmitry Lubomirsky
  • Patent number: 9408664
    Abstract: A medical device system and method provide an RF electrosurgical generator coupled to an electrosurgical electrode via a patient box disposed in close proximity to the patient. An RF signal is delivered from the generator to the patient box where signal power is increased and the RF signal delivered to the electrosurgical electrode. The patient box is coupled to the electrosurgical electrode by a short cable capable of carrying an HV, high frequency 5 MHz signal without leakage. An electrical characteristic associated with the electrosurgical electrode is monitored and a desired RF power output and duty cycle maintained by adjusting DC input voltage applied to an RF amplifier, responsive to the monitoring. The system determines when the electrosurgical cutting electrode has started cutting and switches from a start mode to a run mode having a different RF duty cycle and a reduced RF power output controlled by a servo system.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: August 9, 2016
    Assignee: SENORX, INC.
    Inventors: Derek Daw, James Huntington Dabney
  • Patent number: 9305764
    Abstract: A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: April 5, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-kyu Park, Wook-rae Kim, Kwang-soo Kim, Tae-joong Kim, Byeong-hwan Jeon
  • Patent number: 9305733
    Abstract: The use of the electride form of 12CaO-7Al2O3, or C12A7, as a low work function electron emitter in a hollow cathode discharge apparatus is described. No heater is required to initiate operation of the present cathode, as is necessary for traditional hollow cathode devices. Because C12A7 has a fully oxidized lattice structure, exposure to oxygen does not degrade the electride. The electride was surrounded by a graphite liner since it was found that the C12A7 electride converts to it's eutectic (CA+C3A) form when heated (through natural hollow cathode operation) in a metal tube.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: April 5, 2016
    Assignee: Colorado State University Research Foundation
    Inventors: Lauren P. Rand, John D. Williams, Rafael A. Martinez
  • Patent number: 9259798
    Abstract: Certain embodiments described herein are directed to a torch that includes a suitable amount of a refractory material. In some embodiments, the torch can include one or more non-refractory materials in combination with a refractory material. In some embodiments, the torch can comprise a refractory material and an optically transparent window. In other embodiments, the torch can comprise a material comprising a melting point higher than the melting point of quartz.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: February 16, 2016
    Assignee: PerkinElmer Health Sciences, Inc.
    Inventor: Peter Morrisroe
  • Patent number: 9214320
    Abstract: A method for processing substrate in a processing chamber, which has at least one plasma generating source and a gas source for providing process gas into the chamber, is provided. The method includes exciting the plasma generating source with an RF signal having RF frequency. The method further includes pulsing the gas source, using at least a first gas pulsing frequency, such that a first process gas is flowed into the chamber during a first portion of a gas pulsing period and a second process gas is flowed into the chamber during a second portion of the gas pulsing period, which is associated with the first gas pulsing frequency. The second process gas has a lower reactant-gas-to-inert-gas ratio relative to a reactant-gas-to-inert-gas ratio of the first process gas. The second process gas is formed by removing at least a portion of a reactant gas flow from the first process gas.
    Type: Grant
    Filed: July 9, 2014
    Date of Patent: December 15, 2015
    Assignee: Lam Research Corporation
    Inventor: Keren Jacobs Kanarik
  • Patent number: 9024256
    Abstract: An electron microscope is provided. In another aspect, an electron microscope employs a radio frequency which acts upon electrons used to assist in imaging a specimen. Furthermore, another aspect provides an electron beam microscope with a time resolution of less than 1 picosecond with more than 105 electrons in a single shot or image group. Yet another aspect employs a super-cooled component in an electron microscope.
    Type: Grant
    Filed: August 6, 2014
    Date of Patent: May 5, 2015
    Assignee: Board of Trustees of Michigan State University
    Inventors: Chong-Yu Ruan, Martin Berz, Zhensheng Tao
  • Publication number: 20150104896
    Abstract: A hollow cathode system, a device and a method for the plasma-assisted treatment of substrates includes at least one hollow cathode, which can be connected to a power supply. The hollow cathode includes an electrically conducting main body with an opening which is bounded by ribs, follows a spiral or meandering path and allows a gas to pass through in a direction perpendicular to a surface of the main body. Connecting bridge elements are provided on the ribs. The bridge elements serve ensure mechanical stability of the hollow cathode and optimize potential distribution of the hollow cathode. With the hollow cathode system, high treatment rates are achieved for homogeneous treatment of substrates of a large surface area with high plasma stability.
    Type: Application
    Filed: October 15, 2014
    Publication date: April 16, 2015
    Applicant: VON ARDENNE GMBH
    Inventors: Konrad DYBEK, Frank STAHR, Klaus SCHADE
  • Publication number: 20150099069
    Abstract: An apparatus for vacuum plasma processing materials in a vacuum chamber composed primarily of carbonaceous polymer. The various components of the vacuum chamber can be formed by traditional polymer assembly techniques. The polymers may be electrically non-conductive to allow external placement of electrodes for either capacitive coupling, inductive coupling, or both.
    Type: Application
    Filed: October 7, 2014
    Publication date: April 9, 2015
    Inventors: Rupert Anthony Taylor, Daniel John Verdell Pulsipher
  • Patent number: 8994258
    Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: March 31, 2015
    Assignee: Kaufman & Robinson, Inc.
    Inventors: Harold R. Kaufman, James R. Kahn, Richard E. Nethery
  • Patent number: 8969838
    Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: March 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Georgiy O. Vaschenko, Krishna Ramadurai, Richard Charles Taddiken
  • Patent number: 8968668
    Abstract: A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: March 3, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
  • Patent number: 8957572
    Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
    Type: Grant
    Filed: June 25, 2012
    Date of Patent: February 17, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Jeffrey H. Ma
  • Publication number: 20150040829
    Abstract: Embodiments of the present invention relate to hollow cathode plasma sources with improved uniformity. One embodiment of the present invention provides a hollow cathode assembly having a conductive rod disposed in an inner volume along a central axis of a hollow cathode. The conductive rod being closest to the ground electrode and having the sharpest features of the hollow cathode becomes the point of plasma ignition. Since the conductive rod is positioned along the central axis, the plasma is ignited at symmetrically about the central axis thus improving plasma uniformity and reducing skews.
    Type: Application
    Filed: September 13, 2013
    Publication date: February 12, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Kartik RAMASWAMY, Andrew NGUYEN, Sergey G. BELOSTOTSKIY
  • Publication number: 20150028222
    Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.
    Type: Application
    Filed: July 25, 2013
    Publication date: January 29, 2015
    Applicant: Agilent Technologies, Inc.
    Inventors: Mark Denning, Guthrie Partridge
  • Patent number: 8941291
    Abstract: A plasma actuator (1) includes four electrodes (11) and three dielectrics (10) and is disposed on the side of an object surface (B). When a high voltage is applied to the electrodes (11), a plasma (15) is generated at an end (10a) of each dielectric (10) exposed so as to be accessible to a gas. In the plasma actuator (1), the electrodes (11) and dielectrics (10) are alternately stacked one on another. The plasma actuator (1) includes a stepped exposed portion (X). The plasma actuator (1) in which the electrodes (11) and dielectrics (10) are arranged such that the ends (10a) of the dielectrics (10) are exposed in the normal line direction of the object surface (B) in the stacked order in the stepped exposed portion (X) can suppress the flow of the generated plasma even when the plasma actuator is exposed to a high-speed airflow under high pressure. This stabilizes the plasma.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: January 27, 2015
    Assignee: Daihatsu Motor Co., Ltd.
    Inventors: Yoonho Kim, Takeshi Serizawa, Akira Nakajima
  • Patent number: 8890413
    Abstract: In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: November 18, 2014
    Assignee: TRUMPF Huettinger GmbH + Co. KG
    Inventors: Ulrich Richter, Gerhard Zaehringer, Peter Wiedemuth
  • Patent number: 8853655
    Abstract: A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with a thickness that is varied to compensate for optical aberrations in the system.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: October 7, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Anatoly Shchemelinin, Alex Salnik, Anant Chimmalgi
  • Patent number: 8810121
    Abstract: A device and method to produce a hot, dense, long-lived plasma. In one embodiment, a large electric current is passed through an outer tube enclosing in part a piston, a notched conducting rod and central electrode. Electromagnetic forces accelerate the piston to a point high enough to mechanically separate the conducting rod at the location of the notch before the conducting rod is melted. On separation, a plasma is generated by the passage of electric current though a gas produced by vaporization of the conducting rod and nearby materials. An insulator enclosed within the tube prevents the plasma from shorting to the outer tube until the current flow has produced a sufficient magnetic field to contain the plasma. The piston is then accelerated by a combination of electromagnetic forces and mechanical pressure from the hot gas through which the electric current is passing.
    Type: Grant
    Filed: October 19, 2012
    Date of Patent: August 19, 2014
    Assignee: United States of America as represented by the Secretary of the Navy
    Inventors: William Bryan Maier, II, Eugene Ellis Nolting, Donald D. Snyder
  • Publication number: 20140225495
    Abstract: A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.
    Type: Application
    Filed: January 15, 2014
    Publication date: August 14, 2014
    Applicant: Colorado State University Research Foundation
    Inventors: IL-GYO KOO, MYEONG YEOL CHOI, DOREENE HYATT, AMBER ZAGRODZKI, DEAN A. HENDRICKSON, GEORGE J. COLLINS
  • Publication number: 20140225498
    Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.
    Type: Application
    Filed: January 16, 2014
    Publication date: August 14, 2014
    Applicant: Colorado State University Research Foundation
    Inventors: IL-GYO KOO, JIN HOON CHO, MYEONG YEOL CHOI, CAMERON A. MOORE, GEORGE J. COLLINS
  • Publication number: 20140217881
    Abstract: A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.
    Type: Application
    Filed: August 10, 2012
    Publication date: August 7, 2014
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Kee-Seok Nam, Jung-Dae Kwon, Yong Soo Jeong, Gun Hwan Lee, Jung Heum Yoon, Sung Hun Lee, Dong Ho Kim, Jae Wook Kang, Sung Gyu Park, Chang Su Kim
  • Patent number: 8796652
    Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: August 5, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Anatoly Shchemelinin, Matthew Alan Panzer
  • Publication number: 20140203702
    Abstract: Disclosed is a plasma processing apparatus including a mounting table within a processing container. The mounting table includes a lower electrode. A shower head constituting an upper electrode is provided above the mounting table. A gas inlet tube is provided above the shower head. The shower head includes a plurality of downwardly opened gas ejection holes, and first and second separate gas diffusion chambers on the gas ejection holes. The first gas diffusion chamber extends along a central axis that passes through a center of the mounting table. The second gas diffusion chamber extends circumferentially around the first gas diffusion chamber. The gas inlet tube includes a cylindrical first tube wall and a cylindrical second tube wall provided outside the first tube wall, and defines a first gas inlet path inside the first tube wall, and a second gas inlet path between the first and second tube walls.
    Type: Application
    Filed: January 23, 2014
    Publication date: July 24, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Risako MIYOSHI
  • Patent number: 8786192
    Abstract: A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.
    Type: Grant
    Filed: April 29, 2009
    Date of Patent: July 22, 2014
    Assignee: Astrium GmbH
    Inventors: Werner Kadrnoschka, Rainer Killinger, Ralf Kukies, Hans Leiter, Johann Mueller, Georg Schulte
  • Patent number: 8759788
    Abstract: In one embodiment an ion source includes an arc chamber and an emitter having a surface disposed in the arc chamber, where the emitter is configured to generate a plasma in the arc chamber. The ion source further includes a repeller having a repeller surface positioned opposite the emitter surface, and a hollow cathode coupled to the repeller and configured to provide a feed material into the arc chamber.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: June 24, 2014
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Neil Bassom