Means For Deflecting Or Focusing Patents (Class 313/361.1)
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Patent number: 11905937Abstract: A magnetic pole structure for a Hall thruster is provided. The magnetic pole structure includes: multiple wide-envelope outer magnetic pole components, a magnetic bridge, a pagoda-shaped inner magnetic pole component, a top plate, and a bottom plate, where the multiple wide-envelope outer magnetic pole components are arranged on an outer edge of the Hall thruster, symmetrical about the pagoda-shaped inner magnetic pole component, and enclose a semi-open structure; the magnetic bridge is located between each of the wide-envelope outer magnetic pole components and the pagoda-shaped inner magnetic pole component; the bottom plate is attached to a bottom part of each of the wide-envelope outer magnetic pole components and a bottom part of the pagoda-shaped inner magnetic pole component; and the top plate is attached to an upper part of each of the wide-envelope outer magnetic pole components.Type: GrantFiled: November 15, 2021Date of Patent: February 20, 2024Assignee: SHANGHAI INSTITUTE OF SPACE PROPULSIONInventors: Zhen Zhao, Jiabing Cheng, Xiaolu Kang, Yanan Wang, Leichao Tian, Zhiyuan Zhang, Qingqing Jia, Caixia Qiao, Guanrong Hang
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Patent number: 11682538Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.Type: GrantFiled: November 22, 2021Date of Patent: June 20, 2023Assignee: ASML Netherlands B.V.Inventors: Jian Zhang, Zhiwen Kang, Yixiang Wang
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Patent number: 10723489Abstract: A low-power Hall thruster gains significantly improved efficiency by a combination of features, including a single piece, h-shaped magnetic screen which enables a more efficient internal volume utilization as well as optimal magnetic shielding; an internally mounted cathode with varying diameter further decreases the footprint of the thruster; an anode with multiple baffles connected by axially oriented holes generates a highly azimuthally uniform propellant flow.Type: GrantFiled: November 29, 2018Date of Patent: July 28, 2020Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Ryan W Conversano, Dan M Goebel, Ira Katz, Richard R Hofer
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Patent number: 10714307Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.Type: GrantFiled: September 25, 2018Date of Patent: July 14, 2020Assignee: KLA-Tencor CorporationInventors: Ilya Bezel, Eugene Shifrin, Gildardo Delgado, Rudy F. Garcia
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Patent number: 9887060Abstract: The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam.Type: GrantFiled: July 10, 2017Date of Patent: February 6, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Craig R. Chaney, Neil J. Bassom
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Patent number: 9856862Abstract: A propulsion system for spacecraft is based on an electric engine that expels propellant to achieve thrust. The propellant is first ionized to generate a plasma. Plasma particles are selectively accelerated via a pulsed laser that accelerates predominantly the electrons in the plasma. The electrons are expelled first, forming a space charge that acts as a virtual cathode to accelerate the positive ions. Interactions between the laser beam and plasma electrons are predominantly through the ponderomotive force.Type: GrantFiled: March 13, 2014Date of Patent: January 2, 2018Inventor: Wesley Gordon Faler
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Patent number: 9847740Abstract: A high-voltage electrostatic generator has an assembly of concentric electrically conductive half-shells separated by an equatorial gap, essentially with cylindrical symmetry about an axis. Adjacent to the equatorial gap, edge regions of at least a selected subset of the half-shells are shaped.Type: GrantFiled: September 28, 2012Date of Patent: December 19, 2017Assignee: Siemens AktiengesellschaftInventors: Peter Simon Aptaker, Paul Beasley, Oliver Heid
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Patent number: 9741522Abstract: The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam.Type: GrantFiled: January 29, 2016Date of Patent: August 22, 2017Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Craig R. Chaney, Neil J. Bassom
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Patent number: 9494142Abstract: A steerable-thrust Hall effect thruster in which a final stage of a magnetic circuit includes an inner pole and a facing outer pole, the inner pole being offset axially downstream relative to the outer pole, so that a magnetic field is inclined relative to a transverse plane of the thruster.Type: GrantFiled: November 19, 2012Date of Patent: November 15, 2016Assignee: SNECMAInventors: Frederic Raphael Jean Marchandise, Anthony Claude Bernard Lorand, Vanessa Marjorie Vial
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Patent number: 9461218Abstract: In at least one embodiment, a surface light source includes one or a more optoelectronic semiconductor chips having a radiation main side for generating a primary radiation. A scattering body is disposed downstream of the radiation main side along a main emission direction of the semiconductor chips. The scatting body is designed for scattering the primary radiation. A main emission direction of the scattering body is oriented obliquely with respect to the main emission direction of the semiconductor chip.Type: GrantFiled: February 20, 2013Date of Patent: October 4, 2016Assignee: OSRAM Opto Semiconductors GmbHInventors: Stefan Illek, Matthias Sabathil, Alexander Linkov, Thomas Bleicher, Norwin von Malm, Wolfgang Mönch
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Patent number: 9335450Abstract: An optical element includes a lens and a light diffusion layer formed on the lens. The lens includes a light incident face and a light emerging face. The light emerging face includes a concave face opposite to the light incident face and a convex face surrounding the concave face. The convex face is covered by the light diffusion layer. The concave face is exposed outside the light diffusion layer. A method for manufacturing the optical element is also disclosed.Type: GrantFiled: November 21, 2013Date of Patent: May 10, 2016Assignee: HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Chau-Jin Hu, Jia-Ming Wang, Chun-Yu Lin
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Patent number: 9184037Abstract: A mass spectrometer including a sample attaching member of attaching a sample, an ionizing chamber including an introductory port of the sample attaching member and an ionization source of generating a sample ion, a vacuumed chamber having a mass analyzer of analyzing the sample ion, and an opening/closing mechanism provided between the ionizing chamber and the vacuumed chamber, in which the opening/closing mechanism is controlled from a closed state to an open state after introducing the sample attaching member into the ionizing chamber to thereby enable to perform ionization with inconsiderable fragmentation at a high sensitivity with a high throughput.Type: GrantFiled: June 20, 2012Date of Patent: November 10, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Shun Kumano, Masuyuki Sugiyama, Yuichiro Hashimoto, Hideki Hasegawa, Masuyoshi Yamada, Hidetoshi Morokuma, Shuhei Hashiba
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Publication number: 20150126797Abstract: A method for packetizing a beam-charged particle, in which the particles pass through an electric field in a device is provided. The device includes an annular shaped central electrode which, in the direction of the beam, is arranged between a first outer electrode and a second outer electrode. A time-dependent electric voltage signal is applied to the central electrode, the temporal course thereof being selected such that particles inside the device undergo a position-dependent speed modification. The course of the speed modification is approximately sawtooth-shaped in the direction of the beam. An associated device is also provided.Type: ApplicationFiled: May 31, 2012Publication date: May 7, 2015Inventors: Peter Simon Aptaker, Paul Beasley, Oliver Heid
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Patent number: 8994258Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.Type: GrantFiled: September 25, 2013Date of Patent: March 31, 2015Assignee: Kaufman & Robinson, Inc.Inventors: Harold R. Kaufman, James R. Kahn, Richard E. Nethery
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Publication number: 20150047079Abstract: There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with <210> orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.Type: ApplicationFiled: August 8, 2014Publication date: February 12, 2015Applicant: Hitachi High-Tech Science CorporationInventors: Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Anto Yasaka, Hiroshi Oba
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Patent number: 8766523Abstract: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.Type: GrantFiled: September 14, 2012Date of Patent: July 1, 2014Assignee: Hitachi Zosen CorporationInventors: Steven R. Walther, Gerald M. Friedman, Michael L. Bufano
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Patent number: 8736049Abstract: Micro-plasma is generated at the tip of a micro-spring by applying a positive voltage to the spring's anchor portion and a negative voltage to an electrode maintained a fixed gap distance from the spring's tip portion. By generating a sufficiently large voltage potential (i.e., as determined by Peek's Law), current crowding at the tip portion of the micro-spring creates an electrical field that sufficiently ionizes neutral molecules in a portion of the air-filled region surrounding the tip portion to generate a micro-plasma event. Ionic wind air currents are generated by producing multiple micro-plasma events using micro-springs disposed in a pattern to produce a pressure differential that causes air movement over the micro-springs. Ionic wind cooling is produced by generating such ionic wind air currents, for example, in the gap region between an IC die and a base substrate disposed in a flip-chip arrangement.Type: GrantFiled: March 13, 2013Date of Patent: May 27, 2014Assignee: Palo Alto Research Center IncorporatedInventors: Bowen Cheng, Dirk DeBruyker, Eugene M. Chow
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Patent number: 8729491Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.Type: GrantFiled: March 7, 2013Date of Patent: May 20, 2014Assignee: Hitachi High-Technologies CorporationInventors: Hideto Dohi, Akira Ikegami, Hideyuki Kazumi
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Patent number: 8664619Abstract: A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.Type: GrantFiled: March 13, 2013Date of Patent: March 4, 2014Assignee: Varian Semiconductor Equipment Associates, Inc.Inventor: Shengwu Chang
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Patent number: 8664594Abstract: The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.Type: GrantFiled: April 27, 2011Date of Patent: March 4, 2014Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Liqun Han, Mohammed Tahmassebpur, Salam Harb, John D. Greene
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Patent number: 8581484Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.Type: GrantFiled: May 14, 2010Date of Patent: November 12, 2013Assignee: Hitachi High-Technologies CorporationInventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
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Publication number: 20130181599Abstract: A DC voltage-operated particle accelerator for accelerating a charged particle from a source to a target includes a first electrode arrangement and a separate second electrode arrangement. The first electrode arrangement and the second electrode arrangement are disposed in such a way that the particle successively runs through the first electrode arrangement and the second electrode arrangement. Each of the electrode arrangements is designed as a high-voltage cascade.Type: ApplicationFiled: May 20, 2011Publication date: July 18, 2013Inventor: Oliver Heid
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Patent number: 8471453Abstract: The disclosure relates to a Hall-effect ion ejection device that comprises a longitudinal axis substantially parallel to the ion ejection direction, and comprises at least: a main ionization and acceleration annular channel, the annular channel being open at its end; an anode extending inside the channel; a cathode extending outside the channel at the outlet thereof; a magnetic circuit for generating a magnetic field in a portion of the annular channel, said circuit including at least an annular inner wall, an annular outer wall and a bottom connecting the inner and outer annular walls and defining the downstream portion of the magnetic circuit; characterized in that the magnetic circuit is arranged so as to create at the outlet of the annular channel a magnetic field independent from the azimuth.Type: GrantFiled: August 4, 2008Date of Patent: June 25, 2013Assignees: Centre National de la Recherche Scientifique (CNRS), Universite de Versailles St Quentin en Yvelines, Centre National d'Etudes SpatialesInventors: Marcel Guyot, Patrice Renaudin, Vladimir Cagan, Claude Boniface
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Patent number: 8471452Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.Type: GrantFiled: June 29, 2007Date of Patent: June 25, 2013Assignee: Nordiko Technical Services LimitedInventors: Mervyn Howard Davis, Andrew James Timothy Holmes
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Publication number: 20130088150Abstract: An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.Type: ApplicationFiled: October 10, 2011Publication date: April 11, 2013Applicant: Guardian Industries Corp.Inventor: Maximo FRATI
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Patent number: 8405044Abstract: Embodiments of the invention provide systems and methods for achromatically bending beam of charged particles by about 90° during radiation treatment. A system may include first, second, third, and fourth bending magnets serially arranged along the particle beam path. The first and fourth bending magnets are configured to generate a positive field gradient that defocuses the particle beam in the bend plane. The second and third bending magnets are configured to generate a negative field gradient that focuses the particle beam in the bend plane. The first, second, third, and fourth bending magnets collectively bend the particle beam by about 90°, e.g., by about 22.5° each.Type: GrantFiled: July 15, 2011Date of Patent: March 26, 2013Assignee: Accuray IncorporatedInventors: Barry A. MacKinnon, Roger H. Miller
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Patent number: 8399852Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.Type: GrantFiled: November 23, 2011Date of Patent: March 19, 2013Inventors: Alexander Klein, Matthew Wittman, Scott Rackey
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Patent number: 8382337Abstract: A lighting device, a light spreading plate for the lighting device and a method for manufacturing the same are provided. The lighting device comprises a light source plate and the light spreading plate. The light source plate comprises a plurality of light sources. The light spreading plate comprises a light travelling layer formed with a plurality of light spreading units. Each of the light spreading units is formed with a main body being defined with a top surface, a bottom surface and a peripheral. The main body has a thickness being tapered towards the peripheral. The main body comprises a top surface having a cone-shaped recess and a bottom surface having a bowl-shaped recess. The cone-shaped recess and the bowl-shaped recess of each of the spreading units are opposite to each other, and one of the cone-shaped recess and bowl-shaped recess is fitted for one of the light sources.Type: GrantFiled: September 10, 2010Date of Patent: February 26, 2013Assignee: Luxingtek, Ltd.Inventors: Wen-Chiun Ing, Wei-Hsin Hou, Zhi-Wei Koh, Chi-Jen Kao
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Patent number: 8339024Abstract: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.Type: GrantFiled: July 16, 2010Date of Patent: December 25, 2012Assignee: Hitachi Zosen CorporationInventors: Steven R. Walther, Gerald M. Friedman, Michael L. Bufano
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Publication number: 20120187843Abstract: A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole and second pole. A first magnetic path is provided between one magnetic pole of the single magnetic source and the end of the first pole. A second magnetic path is provided between the other magnetic pole of the single magnetic source and the end of the second pole. The first and second magnetic paths are selectively constructed to produce a symmetrical magnetic field in the gap.Type: ApplicationFiled: August 3, 2010Publication date: July 26, 2012Inventor: John E. Madocks
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Publication number: 20120139407Abstract: A device for lighting a room is described. The device has an envelope with a transparent face, the face having an interior surface coated with a cathodoluminescent screen and a thin, reflective, conductive, anode layer. There is a broad-beam electron gun mounted directly to feedthroughs in a base of the envelope with a heated, button-on-hairpin, cathode for emitting electrons in a broad beam towards the anode, and a power supply mounted on the feedthroughs at the base of the envelope that drives the cathode to a multi-kilovolt negative voltage. A two-prong snubber serves as an anode contact to permit the power supply to drive the anode to a voltage near ground. A method of manufacture of the anode uses a single step deposition and lacquering process followed by a metallization using a conical-spiral tungsten filament coated with aluminum by a thermal spray coating process.Type: ApplicationFiled: March 30, 2010Publication date: June 7, 2012Applicant: VU1 CORPORATIONInventors: Richard Herring, Charles E. Hunt, Bernard K. Vanch, Tomas Hasilik, Viktor Jelinek
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Patent number: 8193511Abstract: A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus correction voltage VF necessary to cancel out the focus deviation is determined. A beam position deviation fi per unit focus correction voltage is found. The deflection voltage is corrected so as to cancel out the product fi·VF. The deflection voltage is corrected so as to cancel out the sum of the product fi·VF and the measured deflection field distortion while correcting the focus based on the voltage VF.Type: GrantFiled: January 9, 2009Date of Patent: June 5, 2012Assignee: JEOL Ltd.Inventor: Kazuya Goto
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Publication number: 20120126684Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.Type: ApplicationFiled: May 14, 2010Publication date: May 24, 2012Inventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
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Patent number: 8164066Abstract: The invention provides a magnetic lens for generating a magnetic imaging field to focus charged particles emitted from a sample, the lens comprising a central pole piece and an outer pole piece disposed about the central pole piece, wherein the lens comprises a magnetic moveable element for movement relative to at least one of the pole pieces, whereby a focal length of the lens is variable by said movement of the magnetic moveable element, thereby enabling a zoom facility for changing the magnification of an image. The movement of the moveable element preferably changes the magnetic circuit between the pole pieces. Also provided is a method of focusing charged particles emitted from a sample and a charged particle energy analyzer, such as an imaging photoelectron spectroscopy system.Type: GrantFiled: July 16, 2010Date of Patent: April 24, 2012Assignee: VG Systems LimitedInventors: Bryan Barnard, Christopher Glenister
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Patent number: 8159118Abstract: An electron gun includes the following: a primary thermionic electron source, a secondary thermionic electron source and a focusing electrode disposed within a first housing that includes one or more reference members adjustably attached to a housing support connected to a first platform; an anode and one or more focusing coils disposed within a second housing comprising one or more insulating members adjustably connected to the first platform; and one or more deflection coils disposed within a third housing connected to the second housing and located opposite said first housing.Type: GrantFiled: November 2, 2005Date of Patent: April 17, 2012Assignee: United Technologies CorporationInventors: Viktor A. Tymashov, Oleg L. Zhdanov, Sergiy I. Ryabenko, Andriy A. Tsepkalov, Steven M. Burns
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Patent number: 8154001Abstract: An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.Type: GrantFiled: June 10, 2010Date of Patent: April 10, 2012Assignee: Wisconsin Alumni Research FoundationInventors: Ryan Thomas Flynn, Thomas R. Mackie
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Patent number: 8138678Abstract: A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.Type: GrantFiled: March 18, 2008Date of Patent: March 20, 2012Assignees: IHI Corporation, The University of TokyoInventors: Daisuke Ishida, Hiroyuki Nose, Namio Kaneko, Yasuo Sakai, Masashi Yamamoto, Mitsuru Uesaka, Katsuhiro Dobashi, Fumito Sakamoto
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Patent number: 8134287Abstract: An ion source includes a pair of pole elements, at least one shunt element, and at least one magnetic field producing element that produces a magnetic field. A gap is defined between the pole elements of the pair of pole elements. The at least one magnetic field producing element and the at least one shunt element cooperate to define at least a part of a magnetic field conducting circuit that conducts the magnetic field between the pole elements of the pair of pole elements. The pair of pole elements and the at least one shunt element are formed from a material that consists essentially of ferrous metal having an overall carbon content of less than 0.08 percent.Type: GrantFiled: August 5, 2010Date of Patent: March 13, 2012Assignee: Mirrage, Ltd.Inventor: Ray Price
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Patent number: 7888653Abstract: Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.Type: GrantFiled: January 2, 2009Date of Patent: February 15, 2011Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Peter L. Kellerman, Svetlana Radovanov, Frank Sinclair, Victor M. Benveniste
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Patent number: 7827779Abstract: A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.Type: GrantFiled: September 10, 2007Date of Patent: November 9, 2010Assignee: Alameda Applied Sciences Corp.Inventors: Mahadevan Krishnan, Kristi Wilson, Kelan Champagne, Jason D. Wright, Andrew N. Gerhan
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Publication number: 20100276592Abstract: A slider bearing for use with an apparatus comprising a vacuum chamber (11).Type: ApplicationFiled: April 26, 2007Publication date: November 4, 2010Applicant: FEI COMPANYInventors: Johannes Antonius Hendricus Wilhelmus Gerardus Persoon, Andreas Theodorus Engelen, Siegfried Lichtenegger, Petrus Henricus Joannes Van Dooren
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Patent number: 7821187Abstract: An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.Type: GrantFiled: September 5, 2008Date of Patent: October 26, 2010Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Marian Mankos, Liqun Han
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Patent number: 7807986Abstract: An ion implanter and method for adjusting the shape of an ion beam are disclosed. After an ion beam is outputted from an analyzer magnet unit, at least one set of bar magnets is used to adjust the shape of the ion beam when the ion beam passes through a space enclosed by the bar magnets. The set of bar magnets can apply a multi-stage magnetic field on the ion beam. Hence, different portions of the ion beam will have different deformations or alterations, because the multi-stage magnetic field will apply a non-uniform force to change the trajectory of ions. Moreover, each bar magnet of the set is powered by one and only one power source, such that the set of bar magnets essentially only can adjust the magnitude of the multi-stage magnetic field. Particular structures and techniques for achieving the multi-stage magnetic field are not limited.Type: GrantFiled: May 27, 2009Date of Patent: October 5, 2010Assignee: Advanced Ion Beam Technology, Inc.Inventors: Ko-Chuan Jen, York Yang, Zhimin Wan
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Publication number: 20100244657Abstract: The disclosure relates to a Hall-effect ion ejection device that comprises a longitudinal axis substantially parallel to the ion ejection direction, and comprises at least: a main ionization and acceleration annular channel, the annular channel being open at its end; an anode extending inside the channel; a cathode extending outside the channel at the outlet thereof; a magnetic circuit for generating a magnetic field in a portion of the annular channel, said circuit including at least an annular inner wall, an annular outer wall and a bottom connecting the inner and outer annular walls and defining the downstream portion of the magnetic circuit; characterised in that the magnetic circuit is arranged so as to create at the outlet of the annular channel a magnetic field independent from the azimuth.Type: ApplicationFiled: August 4, 2008Publication date: September 30, 2010Applicants: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS, UNIVERSITE DE VERSAILLES ST QUENTIN EN YVELINES, CENTRE NATIONAL D'ETUDES SPATIALESInventors: Marcel Guyot, Patrice Renaudin, Vladimir Cagan, Claude Boniface
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Publication number: 20100207551Abstract: A two-beam accelerator device including a drive beam source and an accelerated beam source for providing a drive beam and accelerated beam, a detuned resonant cavity disposed in the path of the drive beam and the accelerated beam, and a two-beam focusing device and method of use thereof. The detuned resonant cavity may be rectangular, square, axisymmetrical, and/or cylindrical. The focusing device may include a modified quadrupole magnet having four magnets, a central opening, a channel in the central opening, an opening in one of the four magnets, the opening having a non-magnetic channel lined with a magnetic material.Type: ApplicationFiled: January 22, 2010Publication date: August 19, 2010Applicant: OMEGA P-INC.Inventors: S. Y. KAZAKOV, S. V. Kuzikov, Jay L. Hirshfield, Vyachesav Yakovlev, Yong Jiang
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Patent number: 7763873Abstract: An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.Type: GrantFiled: February 27, 2008Date of Patent: July 27, 2010Assignee: Wisconsin Alumni Research FoundationInventors: Ryan Thomas Flynn, Thomas R. Mackie
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Patent number: 7759658Abstract: An ion implanting apparatus is provided. The ion implanting apparatus includes a beam scanner, a beam collimator and a unipotential lens which is disposed between said beam scanner and said beam collimator, and which includes first, second, third, and fourth electrodes arranged in an ion beam traveling direction while forming first, second, and third gaps, said first and fourth electrodes being electrically grounded, wherein positions of centers of curvature of said first and third gaps of said unipotential lens coincide with a position of a scan center of said beam scanner, and wherein a position of a center of curvature of said second gap of said unipotential lens is shifted from the position of the scan center of said beam scanner toward a downstream or upstream side in the ion beam traveling direction.Type: GrantFiled: April 6, 2009Date of Patent: July 20, 2010Assignee: Nissin Ion Equipment Co., Ltd.Inventor: Yoshiki Nakashima
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Patent number: 7705321Abstract: A charged particle beam writing apparatus includes a stage on which a target object is placed and which moves in a predetermined direction, a first column configured to irradiate a first charged particle beam on a writing region of the target object, a second column which is located at the back of the first column in the predetermined direction and configured to irradiate a second charged particle beam on the writing region of the target object, and a sensor configured to measure a height level of the target object at any one of a position in front of a position where the first column irradiates the first charged particle beam in the predetermined direction and a position almost immediately under the position where the first charged particle beam is irradiated.Type: GrantFiled: May 29, 2008Date of Patent: April 27, 2010Assignee: NuFlare Technology, Inc.Inventor: Takayuki Abe
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Patent number: 7622721Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.Type: GrantFiled: February 9, 2007Date of Patent: November 24, 2009Inventors: Michael Gutkin, Alexander Bizyukov, Vladimir Sleptsov, Ivan Bizyukov, Konstantin Sereda
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Publication number: 20090273284Abstract: A closed drift Hall Current accelerator with a split solenoid Hall field, a radial injection collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes, for injection of ions into the solenoid field. The Hall Effect field in this case is in the gap of the return field of the split solenoid magnetic field.Type: ApplicationFiled: May 1, 2008Publication date: November 5, 2009Inventor: Mark Edward Morehouse