Abstract: Provided is a mask assembly, including at least n evaporation masks, n being an integer greater than 2, wherein the at least n evaporation masks have a same width and the at least n evaporation masks respectively correspond to n types of display panels with different sizes, the width matching the n types of display panels with different sizes.

Abstract: A mask assembly and an organic light emitting display device manufactured using the mask assembly are capable of realizing an organic light emitting display device having a hole in a display area, the mask assembly including a frame defining a first opening area, a first mask on the frame and defining a plurality of second opening areas that overlap the first opening area, and a second mask fixed to the frame across the plurality of second opening areas, and including a body portion overlapping the first mask, a blocking portion at each respective one of the second opening areas, and a pattern portion between the body portion and the blocking portion, and defining a plurality of holes.

Abstract: A mask frame assembly includes: a mask frame; at least one mask sheet arranged on the mask frame; a plurality of first support sticks extending in a first direction; and a plurality of second support sticks extending in a second direction, wherein a mask frame transformation index is within a range from about ?1000 to about +1000 based on mask frame transformation index=? (tensile force of first support sticks/tensile rate of first support sticks)?? (tensile force of second support sticks/tensile rate of second support sticks), where tensile force of respective first or second support stick is given by thickness (T)×width (W)×elastic coefficient (E)×tensile rate (?/L0), ? is a transformed amount (Lf?L0) corresponding to tension, L0 is an initial length of respective first or second support stick, and Lf is a final length of respective first or second support stick.

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.

Abstract: An active matrix organic light emitting diode shadow mask assembly includes a shadow mask frame, longitudinal supporting bars, transverse spacer plates, shadow mask plates. The longitudinal supporting bars are disposed on the shadow mask frame at intervals. The transverse spacer plates are disposed on circular rod portions of the longitudinal supporting bars, are supported by the longitudinal supporting bars, are arranged at intervals. The shadow mask plates are disposed on the transverse spacer plates, are supported by the longitudinal supporting bars, parallel the transverse spacer plates. Each transverse spacer plate is located under a gap between adjacent shadow mask plates, contacts the shadow mask plates, covers the gap. The transverse spacer plates directly contacting the shadow mask plates effectively cover the gaps between the shadow mask plates, effectively prevent organic material in a later process from leaking through the shadow mask plates, dropping on to a lower glass substrate.

Abstract: A vapor deposition mask device includes a vapor deposition mask having an effective region in which a plurality of first through holes is disposed, and a frame attached to the vapor deposition mask. The vapor deposition mask device includes a plurality of joint portions that joins the vapor deposition mask and the frame to each other. The plurality of joint portions is arranged along the outer edge of the vapor deposition mask. A notch is formed at a position corresponding to between two adjacent joint portions in the outer edge of the vapor deposition mask.

Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.

Abstract: A screen stretcher device is provided and has a tensioning mechanism, a first fixture and a second fixture. The first fixture is securely disposed at one end of a metal mask plate, and the second fixture is securely disposed at the other end of the metal mask plate. A horizontal plate is disposed above the metal mask plate. A measuring mechanism is configured to acquire location information of a pattern on the metal mask plate. A magnetic mechanism is disposed above the horizontal plate, and is configured to attract the metal mask plate such that the metal mask plate is deformed.

Abstract: A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.

Abstract: A high-strength thin steel sheet having excellent drawability and bake hardenability, and a method of manufacturing the same are provided. The high-strength thin steel sheet includes 0.0005 to 0.003 wt % of carbon (C); 0.5 wt % or less (excluding 0 wt %) of silicon (Si); 1.2 wt % or less (excluding 0 wt %) of manganese (Mn); 0.005 to 0.12 wt % of phosphorous (P); 0.008 wt % or less of sulfur (S); 0.005 wt % or less of nitrogen (N); 0.1 wt % or less (excluding 0 wt %) of acid-soluable aluminum (Al); 0.01 to 0.04 wt % of titanium (Ti); iron (Fe) as a remainder thereof; and unavoidable impurities. The high-strength thin steel sheet has BH of 4 MPa or more and P of 80% or more in Equation 1: P (%)={Nin/(Nin+Ngb)}×100, Nin being the number of carbides having a size of 20 nm or less within a crystal grain, and Ngb being the number of carbides having a size of 20 nm or less at a grain boundary.

Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.

Abstract: A mask assembly, and an apparatus including the same are provided. The mask assembly includes a mask sheet. The mask sheet includes a pattern portion having openings, and a welding portion connected to the pattern portion. The welding portion has a grain size different from a grain size of the pattern portion.

Abstract: Provided are a high-strength steel sheet for containers and a method for producing the high-strength steel sheet. The high-strength steel sheet for containers has a composition containing, by mass, C: 0.0010% to 0.10%, Si: 0.04% or less, Mn: 0.10% to 0.80%, P: 0.007% to 0.100%, S: 0.10% or less, Al: 0.001% to 0.100%, N: 0.0010% to 0.0250%, and the balance being Fe and inevitable impurities. The difference between the dislocation density at the uppermost layer of the high-strength steel sheet in the thickness direction and the dislocation density at a depth of ¼ of the thickness of the high-strength steel sheet from the surface is 1.94×1014 m?2 or less. The high-strength steel sheet has a tensile strength of 400 MPa or more and a fracture elongation of 10% or more.

Abstract: A method of manufacturing a mask includes forming a first protection layer on a first surface of a mask member, the first protection layer comprising first through-holes exposing portions of the first surface; radiating, through the first through-holes, a laser beam onto the exposed portions of the first surface to form blind holes in the mask member; and providing an etchant to form second through-holes in the mask member, the second through-holes comprising the blind bores and extending from the first surface to a second surface of the mask member opposing the first surface.

Abstract: A black matrix structure and manufacturing method thereof, an array substrate, a color filter substrate and a display apparatus are provided. The black matrix structure comprises a first black matrix and a plurality of predefined opening regions arranged in an array and surrounded by lines of the first black matrix, wherein, each of the predefined opening regions is provided with an opening therein, and at least one of the predefined opening regions is provided with a second black matrix therein, edges of shading pattern of the second black matrix are adjacent to the opening or in contact with at least one line edge of the first black matrix, and length of a part of each line edge of the first black matrix being in contact with the edge of shading pattern of the second black matrix is less than length of this line edge of the first black matrix.

Abstract: A method for fabricating a pellicle for EUV lithography processes includes placing a hard mask in contact with a surface of a substrate. In some embodiments, the hard mask is configured to pattern the surface of the substrate to include a first region and a second region surrounding the first region. By way of example, while the mask in positioned in contact with the substrate, an etch process of the substrate is performed to etch the first and second regions into the substrate. Thereafter, an excess substrate region is removed so as to separate the etched first region from the excess substrate region. In various embodiments, the etched and separated first region serves as a pellicle for an extreme ultraviolet (EUV) lithography process.

Abstract: A method of manufacturing an evaporation mask, includes preparing a semi-finished body of an evaporation mask including a reinforcing bar and a film having an area larger than an area of the reinforcing bar, forming an opening pattern in a region, which is prevented from planarly overlapping with the reinforcing bar, of the film, and forming at least one projecting portion in a region, which is on a surface opposite to the reinforcing bar and which planarly overlaps with the reinforcing bar, of the film.

Abstract: The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than ?10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.

Abstract: The present invention relates to an electromagnetically-countered display system including at least one wave source and at least one counter unit, where such a wave source irradiates harmful electromagnetic waves and the counter unit emits counter electromagnetic waves for countering the harmful waves therewith. More particularly, the present invention relates to various counter units for the electromagnetically-countered display system and to various mechanisms to counter the harmful waves with the counter units, e.g., by matching configurations of the counter units with those of the wave sources, by matching wavefronts of the harmful waves with those the counter waves, and so on. The present invention also relates to various methods of countering the harmful waves with such counter waves by source and/or wave matchings, various methods of providing the counter units for emitting the counter waves defining desired wave characteristics, and the like.

Abstract: An embodiment of the invention provides a chip package which includes: a semiconductor substrate having a first surface and an opposite second surface; a device region disposed in the substrate; a dielectric layer located on the first surface of the semiconductor substrate; a plurality of conducting pads located in the dielectric layer and electrically connected to the device region; at least one alignment mark disposed in the semiconductor substrate and extending from the second surface towards the first surface.

Abstract: A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.

Abstract: An x-ray generator includes a voltage source and a voltage divider network coupled thereto, a housing, and an insulator carried within the housing. An emitter cathode is carried within the housing and emits electrons and undesirable conductive particles. In addition, there is a shielding electrode carried within the housing downstream of the emitter cathode and coupled to the voltage divider network. A target is carried within the housing downstream of the at least one shielding electrode. The voltage divider is configured so that the emitter cathode and the shielding electrode have a voltage difference therebetween such that an electric field generated in the housing accelerates electrons emitted by the emitter cathode to toward the target. The shielding electrode is shaped to capture the undesirable conductive particles emitted by the emitter cathode that would otherwise strike the insulator.

Abstract: An x-ray generator includes a voltage source and a voltage divider network coupled thereto, a housing, and an insulator carried within the housing. An emitter cathode is carried within the housing and emits electrons and undesirable conductive particles. In addition, there is a shielding electrode carried within the housing downstream of the emitter cathode and coupled to the voltage divider network. A target is carried within the housing downstream of the at least one shielding electrode. The voltage divider is configured so that the emitter cathode and the shielding electrode have a voltage difference therebetween such that an electric field generated in the housing accelerates electrons emitted by the emitter cathode to toward the target. The shielding electrode is shaped to capture the undesirable conductive particles emitted by the emitter cathode that would otherwise strike the insulator.

Abstract: Disclosed is a shadow mask having a fine slit that can improve precision and resolution of a pattern by reducing side etching during an etching process of a mask substrate, and a manufacturing method thereof. The shadow mask includes a mask substrate, a slit region formed by penetrating through the mask substrate, the slit region having a plurality of undercut portions at respective sides thereof, each undercut portion having a unit thickness, and a shadow region provided in the mask substrate, the shadow region corresponding to a region other than the slit region.

Abstract: Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.

Abstract: An organic EL display device and a method for fabricating the same are disclosed, wherein an organic luminescence layer is formed at a crossing region of first and second electrodes using a shadow mask on which a plurality of holes are connected by bridges.

Abstract: The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials, particularly for pixel segregation in OLED-based displays. In some embodiments, a duo-mold approach is employed in the fabrication of these structures. In such methods, surface treatments are employed to impart differential surface energies to different molds and/or different parts of the mold(s). Such surface treatments permit the formation of three-dimensional (3-D) structures through imprinting and the transfer of such structures to a substrate. In some or other embodiments, such surface treatments and variation in glass transition temperature of the polymers used can facilitate separation of the 3-D structures from the molds to form free-standing micro- and/or nano-structures individually and/or in a film.

Abstract: An electron beam display, in which light extracting efficiency from phosphor and a bright-portion contrast are improved is provided, has: an electron-emitting device, a metal back, and a phosphor dot which is disposed in opposition to the electron-emitting device through the metal back and emits light responsive to an irradiation with an electron beam emitted from the electron-emitting device; and further has a face plate having a black member which is disposed in opposition to the electron source through the phosphor dot and has an aperture in a region in which the phosphor dot is formed. A region irradiated with the electron beam emitted from the electron-emitting device is not larger than the phosphor dot, a part of the black member is disposed in the region irradiated with the electron beam, and at least a part of the aperture is disposed outside of the region irradiated with the electron beam.

Abstract: A cathode ray tube is disclosed, in which a shadow mask satisfies the following condition: Rx<1200 mm or Ry<1200 mm, and further satisfies the following condition: 0<Rd<3000 mm or Rd <?1500. The structural strength of the shadow mask is increased, thereby greatly improving thermal distortion and vibration problems of the shadow mask as well as greatly improving the qualities such as the drop characteristic, doming characteristic and inner pin distortion problem.

Abstract: A shadow mask for a cathode ray tube is formed with a curved surface such that a radius of curvature corresponding to a perpendicular axis which passes through the center of the shadow mask decreases monotonely along the perpendicular axis from the center of the shadow mask and a radius of curvature corresponding to a parallel axis which passes through the center of the shadow mask decreases monotonely along the parallel axis from the center of the shadow mask. The curved surface satisfies the following condition, [0.1RVmin+0.9RVmax, 0.9RVmin+0.1RVmax]?[RHmin, RHmax]. RVmin and RVmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the perpendicular axis, and RHmin and RHmax respectively represent the minimum and the maximum value of the minimum radius of curvature corresponding to the parallel axis.

Abstract: A cathode ray tube including a shadow mask. The shadow mask includes an aperture portion including a plurality of beam guide holes, a non-aperture portion surrounding the aperture portion, and a skirt portion that is bent from an edge of the non-aperture portion toward an electron gun. The non-aperture portion includes a pair of longer sides, a pair of shorter sides, and four corner portions, and a first width of the non-aperture portion measured at the longer side and a second width of the non-aperture portion measured at the shorter side are formed to be less than a third width of the non-aperture portion measured at the corner portions. The shadow mask satisfies the following conditions: 2 mm?w1<w3, and 2 mm?w2<w3, where w1 denotes the first width of the non-aperture portion, w2 denotes the second width of the non-aperture portion, and w3 denotes the third width of the non-aperture portion.

Abstract: A mask assembly for a Cathode Ray Tube (CRT) includes a shadow mask with a plurality of beam passage holes, and a frame including a supporting portion with a pair of long sides and a pair of short sides which fix the shadow mask and a strength maintenance portion bent from the supporting portion. The frame includes a plurality of reinforcement indentations formed on a portion of the boundary between the supporting portion and the strength maintenance portion. At least one of the reinforcement indentations satisfies the following condition: S 1 3 ? S 2 ? 2 3 ? S 1 wherein S1 represents an area of a triangle defined by a width of the supporting portion including the reinforcement indentation, a width of the strength maintenance portion including the reinforcement indentation and an imaginary line connecting an end of the supporting portion and an end of the strength maintenance portion, and wherein S2 represents a sectional area of the reinforcement indentation.

Abstract: A shadow mask for a cathode ray tube has an effective screen portion having a plurality of beam passage holes arranged in a predetermined pattern, and an inactive portion with no beam passage holes. The length of a beam passage hole at a column adjacent to a division between the effective screen portion and the inactive portion (hereinafter “the beam passage hole length”) in the long-sided direction is set to be smaller than the length of a beam passage hole placed at the short-sided center of the column. The beam passage hole length “a” at columns which are even-numbered from the long-sided center of the effective screen portion is set to satisfy the condition of 1>a/A?0.45, compared to the length A of the beam passage hole placed at the short-sided center of relevant columns. The beam passage hole length “b” at columns which are odd-numbered is set to satisfy the condition of 1>b/B?0.35, compared to the length B of the beam passage hole placed at the short-sided center of relevant columns.

Abstract: A shadow mask for a Cathode Ray Tube (CRT) which achieves a high brightness and white uniformity by minimizing light emission of incorrect colors, includes: an effective screen portion with a plurality of beam passage holes arranged in a predetermined pattern and a non-holed portion surrounding the effective screen portion with no beam passage holes. The beam passage holes have a large-sized hole portion on a side facing a panel of the CRT and a small-sized hole portion that is smaller than the large-sized hole portion on a side facing an electron gun are selected such.

Abstract: A shadow mask for uniformly forming an organic luminescent layer of an organic electroluminescent device is disclosed. The shadow mask includes a plurality of striped slots aligned in one direction, the striped slots having a plurality of inclined surfaces formed on each side thereof. Due to a step difference, the inclined surfaces prevent shadows from occurring, thereby uniformly forming the organic luminescent layer.

Abstract: A mask structure having raised supporting bodies is provided between an anode plate and a cathode plate to form a gate electrode layer. The mask is provided thereon with a plurality of apertures that are arranged at intervals. The plate surface of the mask is provided with a plurality of raised supporting bodies that are arranged on the plate surface of the mask at intervals and are adhered to the cathode plate to form a support and separation between the mask and the cathode plate. Finally, the surface of the raised supporting body is provided with an electrode layer that is electrically connected with the cathode plate, thereby providing the necessary power supply for the mask serving as the gate electrode layer. In this way, the mask structure formed in single construction can be packaged directly with the cathode plate and the anode plate.

Abstract: A shadow mask, a method of manufacturing the shadow mask, and a method of forming a thin film using the shadow mask are provided. The shadow mask includes an upper layer and a lower layer. The upper layer includes a first opening. The lower layer is formed on a lower surface of the upper layer around the first opening and includes an opening having the same size as the first opening. When the thin film is formed using the shadow mask, the lower layer of the shadow mask is close to the edge of a cavity of a substrate, and a position on which the thin film may be formed as defined by the lower layer of the shadow mask. Therefore, the thickness of the thin film can be uniform.

Abstract: Disclosed herein is a shadow mask for cathode ray tubes. When the width of a smaller hole part of each of slots formed at the shadow mask is defined as Sw, the horizontal distance between the end of a taper-shaped larger hole part facing the panel side of each of the slots, which is adjacent to the edge part of the shadow mask, and the end of the smaller hole part, which is adjacent to the edge part of the shadow mask, is defined as Ta, and the incident angle at which the electron beam passes through each of the slots is defined as ?, the shadow mask has at least one slot through which the electron beam passes at an incident angle ? of above 47 degrees, and the at least one slot through which the electron beam passes at an incident angle ? of above 47 degrees is configured such that the following inequality is satisfied: 1<Ta/Sw<2.

Abstract: An apparatus for demagnetizing a shadow mask includes a shadow mask stocker, a cassette in the shadow mask stocker, wherein at least one shadow mask is disposed in the cassette, and a demagnetizing means that generates a magnetic field by an alternating current (AC), thereby removing magnetism of the at least one shadow mask.

Abstract: In a shadow mask 1 of pressing type, a large number of slots are made in a mask body in the horizontal direction and in the vertical direction. Each slot has a roughly rectangular backside opening, a roughly rectangular front-side opening, and a through-hole that connects these two openings. Between each slot of the multiple slots made in the mask body that is situated at least on either of the two diagonal axes of the mask body but in such a position that the angle at which electron beams enter the slot is 20 degrees or more and another slot that is arranged adjacently to the above slot in the vertical direction, a connecting part connecting the peripheral-side vertical outer edges of the front-side openings of these slots is provided so that it runs through a horizontal bridge part formed between the front-side openings of the slots.

Abstract: A shadow mask and an evaporation system incorporating the same. The shadow mask comprises at least one opening. The length and the width of the opening range from about 100 ?m to about 200 ?m and from about 25 ?m to about 75 ?m, respectively.

Abstract: The radius of curvature of an outer surface of a panel useful portion is 10,000 mm or more. Assuming that a length of a perforated region of a shadow mask in an X-axis (major axis) direction is 2L, s is a variable satisfying 0<s<1, a sagging amount difference of the perforated region at a point of X=sL with respect to a point of X=0 on the X axis and a sagging amount difference of the perforated region at a point of X=L with respect to the point of X=sL on the X axis are ?Z01(s) and ?Z02(s), respectively, a sagging amount difference of the perforated region at the point of X=sL with respect to the point of X=0 on the long side and a sagging amount difference of the perforated region at the point of X=L with respect to the point of X=sL on the long side are ?Z11(s) and ?Z12(s), respectively, when ?(s) represented by ?(s)=(?Z01(s)/?Z11(s))/(?Z02(s)/?Z12(s)) is defined, d?(s)/ds?0.4 is satisfied in at least a portion in a range of 0.2?s?0.8.

Abstract: A frame for a cathode ray tube including a substantially rectangular frame body having longer and shorter sides, and one or more beads formed on each of the longer frame sides, and one or more beads formed on each of the shorter frame sides, wherein at least one of the beads formed on each of the longer frame sides has a shape different from the shape of the beads formed on each of the shorter frame sides, to increase the rigidity of the longer frame side. The number of the beads formed on each of the longer frame sides may be different from the number of the beads formed on each of the shorter frame sides, to increase the rigidity of the longer frame side.

Abstract: Provided is a mask which is used to form on the surface of a substrate a plurality of linear film members disposed in parallel to each other by fixing one surface of the mask to the substrate and supplying a film material through the other surface of the mask by the use of a vapor process. The mask includes: a mask body having a plurality of openings corresponding to patterns of the linear film members; and reinforcement ribs which are disposed to cross the openings and which have a function of preventing deformation of the mask body due to the weight thereof. Here, the reinforcement ribs are disposed close to the other surface of the mask in the thickness direction of the openings.

Abstract: A shadow mask structure is held on a panel via a support member in which a base member and a spring member are connected to each other in a substantially V-shape. The spring member includes a connecting portion connected to the base member, an engagement portion having an engagement hole in which a stud pin is fitted, and an elastic portion between the connecting portion and the engagement portion, tilted with respect to the base member and mainly having a spring function. Assuming that a width of an end of the elastic portion on the connecting portion side is A, a width of an end of the elastic portion on the engagement portion side is B, a width of a narrowest part of the elastic portion in a region including both the ends is C, and a minimum value of an effective width of the elastic portion in the region including both the ends is C?, relationships: A>C and B>C, and 0.40<C?/A<0.55 are satisfied.

Abstract: A phosphor screen is formed on an inner surface of a face portion whose outer surface is substantially flat. A shadow mask faces the phosphor screen. The shadow mask includes a perforated portion having a plurality of apertures, a non-perforated portion formed on a periphery of the perforated portion and a skirt portion formed on a periphery of the non-perforated portion. The non-perforated portion includes a pair of longer side portions each having an outer bead and an inner bead that are adjacent to each other and a pair of shorter side portions each having the outer bead and an inner bead that are adjacent to each other. In each of the pair of longer side portions, the spacing between the outer bead and the inner bead is at least 2 mm. This makes it possible to suppress wavy wrinkles generated in the perforated portion, so that the image quality of a color picture tube can be improved.

Abstract: A shadow mask stretched in such a manner that tension is applied in a vertical direction includes a plurality of arrays of apertures in which a first aperture, a second aperture, a third aperture, and bridges between these apertures are aligned in a vertical direction. Assuming that a horizontal line passing through a center in the vertical direction of each bridge is a horizontal center line, and vertical spacings between the horizontal center lines of pairs of bridges that respectively sandwich the first aperture, the second aperture, and the third aperture in the vertical direction are PBa, PBb, and PBc in this order, the relationships: PBb=N1×PBa and PBc=N2×PBa (N1, N2 are natural numbers, 1<N1<N2) are satisfied. Vertical spacings between the horizontal center lines with respect to all the bridges included in two arrays of apertures adjacent in the horizontal direction are substantially constant.

Abstract: A cathode ray tube includes a tension mask attached to a rectangular mask frame assembly that has two long sides paralleling a central major axis thereof and two short sides paralleling a central minor axis thereof. The two long sides are disposed at generally a right angle with respect to the two short sides with each of the sides connected to form a continuous generally planar support frame having an inner and outer peripheral surface. The support frame is formed of a material having a first coefficient of thermal expansion and includes a detensioning member formed of a second coefficient of thermal expansion on the peripheral surface of at least one side of the frame to facilitate detensioning of the mask.

Abstract: A steel sheet for an inner magnetic shield has a ratio of the anhysteretic magnetic permeability in the rolling direction to the anhysteretic magnetic permeability in the transversal direction, which is not higher than 0.7 or not lower than 1.4, preferably not higher than 0.5 or not lower than 2.0. A higher value of the two anhysteretic magnetic permeability values in the rolling direction and in the transversal direction is not lower than 18000. The inner magnetic shield formed of the particular steel sheet has a substantially truncated pyramid body which has a pair of short side members of a screen and a pair of long side members of a screen. The short side members are joined to the long side members at edge portions of the truncated pyramidal inner magnetic shield. The direction, in which the anhysteretic magnetic permeability of the steel sheet is the higher value, corresponds to the horizontal plane direction of the short side member.

Abstract: A color picture tube is provided with a glass bulb in which the external surface of the effective display area of the face plate is formed substantially flat and a color selection mask, having the curvature projected toward the face plate, provided opposed to the internal surface of the face plate within the glass bulb. Therefore, the external surface is flat, the mechanical shock resistance characteristic is high, a tension can surely be applied to the color selection mask and moreover vibration of the color selection mask can be prevented even if external vibration is applied thereto.