Gas Or Vapor Pressure Varies During Treatment Patents (Class 34/402)
  • Patent number: 9841147
    Abstract: In an embodiment, the gas storage device includes a cylinder with opposing ends. An endcap is present at each end. The cylinder and the endcaps form an enclosure. Each endcap includes a connector. A diaphragm is located in the enclosure. The diaphragm includes an annular sidewall. The device includes an inner chamber defined by an inner surface of the sidewall, and a storage space between an interior surface of the cylinder and an outer surface of the sidewall. A metal hydride composition is located in the storage space.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: December 12, 2017
    Assignee: TWISTED SUN INNOVATIONS, INC.
    Inventor: Nicolas Kernene
  • Patent number: 9702796
    Abstract: An isolator includes: a chamber including a working chamber in which a work is performed by a worker, and a storage chamber provided under the working chamber in communication with an opening formed in a bottom plate of the working chamber, the chamber being configured to isolate the working chamber and the storage chamber from an exterior while in a state where airtightness is maintained; and a lifting device configured to support, in the storage chamber, an experimental device to be used in the working chamber, the lifting device being capable of lifting and lowering the experimental device from the storage chamber to the working chamber and from the working chamber to the storage chamber.
    Type: Grant
    Filed: August 15, 2014
    Date of Patent: July 11, 2017
    Assignee: Panasonic Healthcare Holdings Co., Ltd.
    Inventors: Yasuhiko Yokoi, Koichi Kobayashi
  • Patent number: 9390948
    Abstract: A tape attaching apparatus includes: a chamber having an airtight space formed therein; a rubber sheet that partitions the airtight space into first and second airtight spaces and has an upper sheet on which a wafer is placed; a tape frame that holds a tape above the rubber sheet; and first and second supply/exhaust tubes that switch pressurization and depressurization of the first and second airtight spaces. In pressurizing the second airtight space and expanding the rubber sheet to lift the wafer to be attached to the tape, after bringing the first and second airtight spaces into a vacuum state, the wafer is attached to the tape while an amount of pressurization of the second airtight space is controlled to change an expansion rate of the rubber sheet from a low speed to a high speed stepwisely.
    Type: Grant
    Filed: November 27, 2015
    Date of Patent: July 12, 2016
    Assignee: NEC ENGINEERING, LTD.
    Inventors: Yoichiro Taga, Eiichiro Aoki
  • Patent number: 8950082
    Abstract: According to one embodiment, a supercritical drying method for a semiconductor substrate comprises introducing a semiconductor substrate, a surface of the semiconductor substrate being wet with a water-soluble organic solvent, to the inside of a chamber, hermetically sealing the chamber and increasing a temperature inside the chamber to not lower than a critical temperature of the water-soluble organic solvent, thereby bringing the water-soluble organic solvent into a supercritical state, decreasing a pressure inside the chamber and changing the water-soluble organic solvent in the supercritical state to a gas, thereby discharging the water-soluble organic solvent from the chamber, starting a supply of an inert gas into the chamber as the pressure inside the chamber decreases to atmospheric pressure, and cooling the semiconductor substrate in a state where the inert gas exists inside the chamber.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: February 10, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yohei Sato, Hisashi Okuchi, Hiroshi Tomita, Hidekazu Hayashi, Linan Ji
  • Patent number: 8832963
    Abstract: Disclosed is a process of stabilizing spent filter material that comprises mixing the filter media with a city media to produce a composition having a moisture content that is sufficiently low to retard microbial growth. The composition comprises spent filter media and a dry material, and preferably comprises diatomaceous earth. Soil is treated by adding the composition as a top dressing, soil amendment, or the like.
    Type: Grant
    Filed: May 17, 2013
    Date of Patent: September 16, 2014
    Assignee: Grain Processing Corporation
    Inventor: Sarjit Johal
  • Publication number: 20140225955
    Abstract: Examples are provided of controlling sheet media dryers. A controller operates a fan at plural duty cycles and correlates a resulting air pressure to each to define empirical data pairs. A parabolic curve fit to the empirical data is used to derive additional data pairs, and a lookup table is defined using the empirical and derived data pairs. The controller uses the lookup table to operate the fan during normal operations of a sheet media dryer.
    Type: Application
    Filed: February 14, 2013
    Publication date: August 14, 2014
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Francisco Javier Perez Gellida, Roger Bastardas Puigoriol, Mikel Zuza Irurueta
  • Publication number: 20140223762
    Abstract: Methods and systems are disclosed for drying a material or, more generally, flash evaporating a target substance having a vapor pressure threshold. The methods and systems include a conveyor conduit that receives-material and within which a pressure is established that is greater than the vapor pressure threshold of the target substance. The material moves through the conveyor and is expelled into a pressure drop zone created by one or more venturi nozzles. The pressure in the pressure drop zone is far less than the vapor pressure threshold of the target substance. As the material encounters the pressure drop zone, the targeted substance in the material experiences a rapid and extreme pressure drop and simultaneously a rapid temperature increase. This causes the target substance in the material to flash evaporate virtually immediately. The resulting vapor is separated from the remaining material and the now dry material is collected for further processing or use.
    Type: Application
    Filed: April 18, 2014
    Publication date: August 14, 2014
    Inventor: John Hogan
  • Patent number: 8739577
    Abstract: A washing machine is disclosed. A washing machine includes a cabinet configured to define an exterior appearance thereof; a tub installed in the cabinet to hold wash water therein; a drum rotatably installed in the tub to accommodate laundry therein; at least one venting portion provided in an upper portion of the tub to communicate with an outside of the tub; and a ventilation part (300) provided in a lower portion of the tub to communicate with an inside of the tub. The above configuration enables convection current of internal air of the tub generated via the venting portion and the ventilation part (300).
    Type: Grant
    Filed: July 30, 2010
    Date of Patent: June 3, 2014
    Assignee: LG Electronics Inc.
    Inventors: Dae Wook Kwak, Jong Min Kim, Cheol Kang Heo, Han Ki Cho, Gyung Hun Nho, Soon Jo Lee, Kyu Chul Lee
  • Patent number: 8695230
    Abstract: A control method of a dryer is disclosed. A control method of a dryer including a heat pump having a inverter compressor includes determining a driving condition of the dryer; and adjusting at least one of an electric power supplied to the inverter compressor and a driving velocity of the compressor based on the driving condition.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: April 15, 2014
    Assignee: LG Electronics Inc.
    Inventors: Hyun Woo Noh, Yong Ju Lee, Sang Ik Lee
  • Patent number: 8516715
    Abstract: An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×102 Pa (5 Torr).
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: August 27, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Jun Yamawaku, Tsuyoshi Moriya, Hideaki Yakushiji, Kazumasa Abe
  • Patent number: 8479409
    Abstract: Disclosed is a process of stabilizing spent filter material that comprises mixing the filter media with a dry media to produce a composition having a moisture content that is sufficiently low to retard microbial growth. The composition comprises spent filter media and a dry material, and preferably comprises diatomaceous earth. Soil is treated by adding the composition as a top dressing, soil amendment, or the like.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: July 9, 2013
    Assignee: Grain Processing Corporation
    Inventor: Sarjit Johal
  • Patent number: 8434241
    Abstract: A method for drying a wet material, which comprises a liquid Fd to be distilled, uses a gas-tight container system resistant to excess and/or negative pressure and a drying container, a condenser and a vapor chamber connecting the drying container and condenser. The temperature adjustable drying container contains the wet material. The liquid Fd is turned to vapor in the temperature adjustable vapor chamber. The condenser condenses the vapor to give the condensation product. The pressure in the vapor chamber is monitored and controlled so that drying and distillation are always carried out in a range close to the saturation vapor pressure of the liquid Fd to be distilled. The pressure and the temperature in the vapor chamber are continuously determined. If the pressure goes above the upper limit of the range, the pressure is reduced in such a manner that especially foreign gas is removed.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: May 7, 2013
    Assignee: Markus Lehmann
    Inventors: Markus Lehmann, Markus Braendli
  • Publication number: 20130061492
    Abstract: According to one embodiment, a supercritical drying apparatus comprises a chamber being hermetically sealable and configured to store a semiconductor substrate, a heater configured to heat an inner side of the chamber, a supply unit configured to supply carbon dioxide to the chamber, a discharge unit configured to discharge carbon dioxide from the chamber, and a rotation unit configured to rotate the chamber by an angle equal to or greater than 90 degrees and equal to or smaller than 180 degrees with respect to the horizontal direction.
    Type: Application
    Filed: March 19, 2012
    Publication date: March 14, 2013
    Inventors: Hisashi OKUCHI, Hidekazu HAYASHI, Linan JI, Yohei SATO, Hiroshi TOMITA
  • Patent number: 8176654
    Abstract: By a method and a device for preventing corrosion on and in the region of a gas inlet nozzle during nitric acid condensation, contact of the condensing gas with the nozzle and with the surroundings of the nozzle are supposed to be minimized. This is achieved in that the gas inlet nozzle has a sleeve on the inside in the transition region to the interior of the condenser, by which sleeve a gas inlet orifice in the form of an annular gap is formed, whereby the annular space is provided with at least one feed opening for secondary air, so that an enveloping flow of secondary air is produced around the entering NO gas.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: May 15, 2012
    Assignee: ThyssenKrupp Uhde GmbH
    Inventor: Rainer Maurer
  • Patent number: 8020315
    Abstract: A substrate processing method which can reduce the number of particles to be left on each substrate is provided. In the substrate processing method, substrates W to be processed are dried, by using a fluid heated by a heating apparatus having one or more heating mechanisms. The substrate processing method comprises a first step of supplying a mixed fluid containing a gas and a processing liquid and heated by the heating apparatus, into a processing chamber in which the substrates to be processed are placed, and a second step of supplying the heated gas into the processing chamber. The output of at least one of the heating mechanisms is kept at a preset constant value for a period of time during which a predetermined time passes after the start of the first step. In the second step, the output of the heating mechanism is determined under a feed back control.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: September 20, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hideki Nishimura, Mikio Nakashima
  • Patent number: 7971369
    Abstract: A method and apparatus for drying floors and carpets using a fan for generating a pressurized air stream within a vertical cylindrical shroud that is spaced two to five inches away from the floor on a set of legs such that an opening is formed between the shroud and the floor. The air stream is directed along the cylindrical shroud vertically toward the floor. At least a peripheral portion of the air stream is exhausted from the shroud in a substantially laminar flow at an angle that is inclined from the vertical and is exhausted radially into ambient air as a substantially laminar air stream.
    Type: Grant
    Filed: February 28, 2006
    Date of Patent: July 5, 2011
    Inventor: Roy Studebaker
  • Patent number: 7892302
    Abstract: A process and system is provided for briquetting particulate matter such as moisture-containing bituminous and sub-bituminous coal. This process includes partially drying the particulate matter and feeding, the partially dried particulate matter to a briquetting apparatus under conditions such that water vapor is released from the particulate matter during feeding. The particulate matter is passed through briquette forming rollers to form briquettes. The released water vapor substantially displaces or prevents the ingress of a large proportion of other gaseous components from the atmosphere surrounding and/or intermixed with the particulate matter. The particulate matter that is fed to the briquetting apparatus is surrounded by and intermixed with a gaseous component containing 70 to 100% by volume of water vapor at the point where it enters the briquette-forming part of the briquetting apparatus.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: February 22, 2011
    Assignees: Commonwealth Scientific and Industrial Research Organisation, Tra-Det Inc., K. R. Komarek Inc., The Griffin Coal Mining Company Pty Limited
    Inventors: Keith Norman Clark, George William Kalb, Richard Komarek, Ross Lawrence Meakins, Arthur Clive Pearson
  • Patent number: 7858393
    Abstract: An apparatus for drying microtitration filter tray cavities and filters configured therein using a flow of gas, the cavities each comprising an upper and a lower aperture and the microtitration filter tray being mounted on a chamber designed for the vacuum filtration of microtitration filter trays in a manner that a vacuum can be applied to the lower apertures of the cavities receiving the filters, and includes a heat exchanger which can be mounted on and later removed from the microtitration filter tray and can be heated and comprises at least one inlet aperture and at least one outlet aperture between which a flow of gas may move through the heat exchanger, the heat exchanger being designed to heat the gas flow and to guide it onto the upper cavity apertures, the gas flow being generated by a vacuum pump communicating with the vacuum chamber.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: December 28, 2010
    Assignee: Eppendorf AG
    Inventors: Kurt Harnack, Peter Scheffler
  • Publication number: 20090199426
    Abstract: A method for the treatment of wood or wood products, in which method moist wood or wood products (1) are first dried by pressing and further by heating so that a desired degree of dryness is reached. In the first stage, the wood or wood products (1) arranged between treating elements (2) are pressed between the treating elements (2) so that liquid is removed from the wood being treated. In the method, as a result of the combined effect of the pressure, the liquid and/or gaseous substance released into the chamber space from the wood material being treated and possibly also air circulation arranged in the treatment chamber, a change of temperature in the treatment chamber from a lower temperature (T1) to a higher temperature (T2) is achieved without supplying additional heat into the chamber.
    Type: Application
    Filed: June 14, 2006
    Publication date: August 13, 2009
    Applicant: TEKNOCOMP OY
    Inventors: Ari Hottinen, Pekka Hottinen
  • Publication number: 20080301972
    Abstract: An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×102 Pa (5 Torr).
    Type: Application
    Filed: June 6, 2008
    Publication date: December 11, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Jun Yamawaku, Tsuyoshi Moriya, Hideaki Yakushiji, Kazumasa Abe
  • Patent number: 7370436
    Abstract: An apparatus capable of performing consecutively, independently and/or simultaneously the processes of quick freezing and/or freeze drying of produce. The apparatus is characterized by a central vacuum system operating over one or more independent vacuum chambers (10,11,12,13,14); said vacuum system being composed of at least two vacuum subsystems (40,50), connected to the chambers by means of independent manifolds (400,500). One vacuum subsystem (40) evacuates air from any of the chambers from atmospheric pressure to a pressure slightly above that of the triple point of water, and the other vacuum subsystem (50) further quickly evacuates any of the chambers from said pressure slightly above the triple point of water to the pressure corresponding to the thermodynamic equilibrium of ice and water vapor at a desired freezing temperature, in a desired freezing time.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: May 13, 2008
    Inventors: Ricardo Francisco Auer, Julian Diego Roberts, Michael Louis McGee, Mitsuru Masuda
  • Publication number: 20080022548
    Abstract: A method of conditioning an organic substrate is described The method involves heating the substrate using RF energy under desired pressure conditions in a constrained environment At a desired time point, the pressure is rapidly reduced causing any water present in the substrate to rapidly boil and convert to steam.
    Type: Application
    Filed: November 19, 2004
    Publication date: January 31, 2008
    Inventors: Nigel Paul Maynard, Anthony John Bergervoet
  • Patent number: 7306680
    Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: December 11, 2007
    Assignee: ASML Netherlands B.V.
    Inventor: Gert-Jan Heerens
  • Patent number: 6857201
    Abstract: Object for the invention is a method for treatment and drying of wood, in which at the first phase wood is warmed up over to the temperature close of the boiling point of water, and wood is compressed with a variable pressure between moisture permeable pressing elements, the temperature of the wood is increased so quickly, that the moisture existing in the wood does not have time to evaporate essentially before the temperature of the wood has increased around the boiling point of water. According to the invention when the surface layers of the timber have reached the temperature close the boiling point of the water the pressure is increased, and at the pressing phase the temperature of wood is kept at the temperature range close the boiling point of the water under that higher pressure.
    Type: Grant
    Filed: August 8, 2003
    Date of Patent: February 22, 2005
    Assignee: Oy Arboreo Technologies Ltd.
    Inventors: Ari Hottinen, Pekka Hottinen
  • Publication number: 20040187341
    Abstract: A multichamber timber drying kiln in which different conditions are maintained in each chamber and methods of drying timber using such a kiln. In one aspect timber is rapidly heated within a first chamber (2; 202; 207) and then transferred to a further chamber (3; 203; 208) for further drying. Timber may be transferred from the first chamber (2; 202; 207) when the moisture content of the timber approaches the fibre saturation point A preheating chamber (1; 201; 206) may be provided to preheat the timber before passing to the first chamber (2; 202; 207). A conditioning chamber (4; 204; 209) may be provided after the further chamber (3; 203; 208) to condition the timber. Energy transfer means (49-53; 54-58) may be provided to transfer energy between chambers.
    Type: Application
    Filed: February 26, 2004
    Publication date: September 30, 2004
    Inventors: William Paul Studd, Vaughn Raymon Furniss, Peter Gibbs
  • Patent number: 6797071
    Abstract: Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving contact therewith. Drying of the substrate is carried out, using a water solution of carbon dioxide in a pressurizable vessel. By releasing the pressure in the vessel, a layer of foam is established on the surface of the solution. The solution is discharged from the vessel, causing the foam layer to pass over the substrate in moving contact therewith. The carbon dioxide reduces the surface tension of the water, thereby enabling the foam layer to be produced and also assisting in the elimination of water from the surface of the substrate. In both cases, the use of foam reduces materials requirements and also reduces the quantity of particles deposited onto the substrate in the treatment process.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: September 28, 2004
    Inventor: Paul A. Kittle
  • Patent number: 6790291
    Abstract: In a substrate processing apparatus for use in performing a reduced-pressure pull up drying method, a liquid drainage pipe (46) for draining a drainage liquid containing an organic solvent from a processing chamber (26) including therein a processing bath (10) for rinsing a substrate (W) with water is provided with a buffer tank (50) inserted therein for separation between the drainage liquid and an organic solvent vapor. A vapor discharge pipe (62) is connected in communication with an interior space of the buffer tank, and is provided with pressure regulating valves (64a, 64b) inserted therein for regulating pressure in the processing chamber at a fixed pressure higher than atmospheric pressure.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: September 14, 2004
    Assignee: Dainippon Screen Mfg. Co. Ltd.
    Inventor: Masahiro Kimura
  • Publication number: 20040168341
    Abstract: The invention relates to a method for performing a function or an operation involving a material and/or a device, in particular a non-gaseous material such as a biological material or an electronic material subjected to an operation as a scientific investigation, a medical test or a handling during production, under a gaseous atmosphere in an inner chamber. The invention provides a new principle for avoiding contamination by gaseous materials, airborne particles and other contamination to an inner space, such as a workbench or working chamber, from an adjacent surrounding space such as the ambient atmosphere, or emigration of materials such as hazardous medical material, toxic substances or other pollution to the adjacent surrounding space from the inner space. A workbench is obtained fulfilling all the strictest requirements to a clean working chamber.
    Type: Application
    Filed: March 18, 2004
    Publication date: September 2, 2004
    Inventors: Peter Mosborg Petersen, Jan Alexander Villadsen
  • Publication number: 20040159005
    Abstract: A delivery system and method for vaporizing and delivery of vaporized solid and liquid precursor materials at sub-atmospheric pressures between a heatable vaporization vessel and a processing tool. The system includes a pressure regulator internally positioned within the vaporization vessel and in fluid communication with a downstream mass flow controller to maintain a consistent flow of vaporized source material. The system further comprises introducing a carrier/diluent gas for diluting the vaporized source material before entry into the processing tool. A venturi is positioned directly upstream of the processing tool and provides for mixing of the carrier gas with the vaporized source material while providing the negative pressure required to open the gas pressure regulator within the vaporization vessel.
    Type: Application
    Filed: February 19, 2003
    Publication date: August 19, 2004
    Inventor: W. Karl Olander
  • Patent number: 6772537
    Abstract: An object of the present invention is to provide a pressure-heat drying method which allows a catalytic substance and the like to be deposited uniformly onto a workpiece to be dried in a dramatically short time as compared to a prior art method, and also an apparatus therefor.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: August 10, 2004
    Assignee: Koy Engineering Corporation
    Inventor: Masaru Kawahara
  • Patent number: 6742282
    Abstract: A method and an apparatus are disclosed for detecting an occurrence of a liquid dry condition in a container containing a liquefied compressed gas while the gaseous phase of the liquefied compressed gas is being removed from the container over time. The apparatus includes a first sensor, a second sensor, and a computer, preferably a programmed logic controller (PLC). The first sensor senses temperature (T) inside the container and provides a signal indicative thereof. The second sensor senses pressure (P) inside the container and provides a signal indicative thereof. The computer receives signals from the first and second sensors, and determines the rates of change in the pressure (dP/dt) and the temperature (dT/dt) inside the container over time.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: June 1, 2004
    Assignee: Air-Products and Chemicals, Inc.
    Inventors: Naser Mahmud Chowdhury, Sukla Chandra, Warren Matthew Janigian
  • Patent number: 6739073
    Abstract: A method for performing multiple cleaning and vacuum drying operations in enclosed vessels uses cleaning and vacuum drying apparatus, low-dissolved-air cleaning solution, and drain-to-vacuum process to produce vacuum in a cleaning vessel, so that influence of air pressure on the operations is minimized. The method utilizes physical features that boiling points of general liquids lower with reduced pressure, that liquid saturated vapor pressure reduces with lowered temperature, and that two vacuum vessels of different working temperatures would have a pressure differential between their saturated vapor pressures, and uses heat control units and heat egress units to regulate temperature and pressure in the vacuumized cleaning vessel, so that wet clean, dry clean, vacuum heat drying, and vacuum freeze drying can be performed on the same apparatus, and low-pressure gas used in the dry clean and cleaning solution and waste solution can be recovered to achieve environment protection and energy saving.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: May 25, 2004
    Inventor: Cheng-Ming Chou
  • Patent number: 6736927
    Abstract: A system is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The system includes apparatus for loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: May 18, 2004
    Assignee: Matrix Integrated Systems, Inc.
    Inventors: Albert Wang, Scott Baron, Prasad Padmanabhan, Gerald M. Cox
  • Publication number: 20040078993
    Abstract: A container which is to be autoclaved has a shiftable plunger that defines a compartment filled with a fluid. The container is confined in a pressurizable chamber and heated so as to change a pressure in the compartment of the container. The pressure in the compartment of the container is monitored and an output corresponding thereto is generated. Pressure in the chamber around the container is continuously varied so as to be generally equal to the instantaneous monitored pressure in the compartment of the container. In this manner the plunger is not moved by thermal expansion or contraction of the fluid.
    Type: Application
    Filed: July 18, 2003
    Publication date: April 29, 2004
    Applicant: Arzneimittel GmbH Apotheker Vetter & Co. Ravensburg
    Inventors: Udo J. Vetter, Friedrich Treuer, Klaus Steigenberger
  • Patent number: 6694640
    Abstract: A calender, a system, and a method of regulating the humidity in a calender. The calender includes a housing having at least two side pieces and a roll stack located at least partially between the side pieces, wherein a space is formed by the roll stack and the web between the side pieces, and a fan positioned to blow dry air into the space. The system is for regulating the humidity in a calender, the calender being used to treat a moisture-containing material web and including a housing having at least two side walls and a roll stack, the calender defining a space bounded at least by the roll stack, the web, and the at least two side walls, and includes a device for reducing the humidity of the space, wherein the humidity level in the space is reduced to a level which is below a saturation point. The method includes reducing the humidity of the space, wherein the humidity level in the space is reduced to a level which is below a saturation point.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: February 24, 2004
    Assignee: Voith Sulzer Papiertechnik Patent GmbH
    Inventor: Franz Kayser
  • Patent number: 6692579
    Abstract: A method for cleaning a semiconductor structure using vapor phase condensation with a thermally vaporized cleaning agent, a hydrocarbon vaporized by pressure variation, or a combination of the two. In the thermally vaporized cleaning agent process, a semiconductor structure is lowered into a vapor blanket in a thermal gradient cleaning chamber at atmospheric pressure formed by heating a liquid cleaning agent below the vapor blanket and cooling the liquid cleaning agent above the vapor blanket causing it to condense and return to the bottom of the thermal gradient cleaning chamber. The semiconductor structure is then raised above the vapor blanket and the cleaning agent condenses on all of the surfaces of the semiconductor structure removing contaminants and is returned to the bottom of the chamber by gravity.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: February 17, 2004
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Sudipto Ranendra Roy, Yi Xu, Simon Chooi, Yakub Aliyu, Mei Sheng Zhou, John Leonard Sudijono, Paul Kwok Keung Ho, Subhash Gupta
  • Patent number: 6684524
    Abstract: The invention relates to a lyophilization method which comprises the following steps: reducing the pressure in the drying chamber until the onset of a visible crystallization of the solvent at a temperature in the drying chamber which is above the solidification point of the preparation; reducing the temperature in the drying chamber to a temperature which is below the solidification point of the preparation or is identical to it, until completion of the crystallization of the solvent, resulting in a frozen solvent; and sublimation of the frozen solvent by means of reduced pressure.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: February 3, 2004
    Assignee: Bayer Aktiengesellschaft
    Inventors: Bernd Sennhenn, Martin Kramer
  • Patent number: 6658762
    Abstract: A method and an apparatus for transporting substrates in all organic light emitting diode (OLED) process is disclosed, which has a transferring chamber provided for transporting substrates between processing modules and the atmosphere condition therein is able to be adjusted to be the same as the processing module by an atmosphere conditioner unit. According to the present invention, the substrates are not contaminated by moisture and the process operation and the factory layout are more flexible. Moreover, the OLED yield is improved.
    Type: Grant
    Filed: April 18, 2002
    Date of Patent: December 9, 2003
    Assignee: RiTdisplay Corporation
    Inventors: Yih Chang, Jung-Lung Liu, Chih-Jen Yang, Chih-Ming Kuo, Jih-Yi Wang, Tien-Rong Lu
  • Patent number: 6643951
    Abstract: A method and an apparatus are disclosed for detecting an occurrence of a liquid dry condition in a container containing a liquefied compressed gas while the gaseous phase of the liquefied compressed gas is being removed from the container over time. The apparatus includes a first sensor, a second sensor, and a computer, preferably a programmed logic controller (PLC). The first sensor senses temperature (T) inside the container and provides a signal indicative thereof. The second sensor senses pressure (P) inside the container and provides a signal indicative thereof. The computer receives signals from the first and second sensors, and determines the rates of change in the pressure (dP/dt) and the temperature (dT/dt) inside the container over time.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: November 11, 2003
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Naser Mahmud Chowdhury, Sukla Chandra, Warren Matthew Janigian
  • Patent number: 6640462
    Abstract: Disclosed is a method of drying timbers loaded in a drying chamber, which comprises the steps of heating the drying chamber by a heating system up to a temperature of 80 to 100° C., subjecting the timbers to vacuum blowing by connecting the inside of the drying chamber with a vacuum chamber (receiver) evacuated by a rotary pump until the inside pressure of the drying chamber drops to 1 to 10 mmHg, disconnecting the inside of the drying chamber from the vacuum chamber, connecting the drying chamber with the atmosphere. When the inside of the drying chamber is connected with the vacuum chamber, the moisture content of the timbers is sharply reduced, so that their temperature sharply drops. Thereafter, when it is disconnected from the vacuum chamber, and connected with the atmosphere, the inside temperature of the drying chamber is again increased. Meanwhile, the heating system is worked during the whole process.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: November 4, 2003
    Inventors: Sun Tae Choi, Vladimir Petrovich Golitsyn, Natalya Vladimirovna Golitsyna, Nam Joo Huh, Kun Pyo Kim
  • Patent number: 6588229
    Abstract: Disclosed is a method for controlling a heat treatment in the process of fabricating a high purity silica glass via a sol-gel process using a low temperature heater having an inhalation line and an exhaust line. Accordingly, the method includes the steps of (a) identifying whether or not the diameter of the exhaust line is varied; (b) controlling the mass flow of the process gas according to the changed diameter of the exhaust line in step (a); (c) measuring an exhaust gas velocity discharged through the exhaust line; (d) comparing the exhaust gas velocity measured in the step (c) with the exhaust gas velocity after the scale of the exhaust line is varied; and, (e) repeating steps (b)-(d) if the comparison result in step (d) is different.
    Type: Grant
    Filed: December 27, 2000
    Date of Patent: July 8, 2003
    Assignee: Samsung Electronics Co, Ltd.
    Inventors: Won-Il Jeong, Young-Min Baik
  • Publication number: 20030101614
    Abstract: Device and process for dewatering a fibrous material web by expelling water via gas pressure. The dewatering device includes at least four rolls arranged to radially limit at least one pressure chamber and sealing units arranged to axially limit the at least one pressure chamber. Adjustment devices are arranged to at least partially individually axially adjust positions of the at least four rolls and the sealing units. A pressure gas is introducible into and the fibrous material web is guidable through the at least one pressure chamber.
    Type: Application
    Filed: October 7, 2002
    Publication date: June 5, 2003
    Applicant: Voith Paper Patent GmbH
    Inventor: Klaus Dolle
  • Patent number: 6508014
    Abstract: A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated with water vapor. The water vapor is removed from the surface of the silicon wafer by a stream of water-saturated gas. Upon removal of liquid water from the surface of the silicon wafer the water vapor in the water vapor saturated atmosphere is removed by evaporation.
    Type: Grant
    Filed: February 16, 2001
    Date of Patent: January 21, 2003
    Assignee: International Business Machines Corporation
    Inventors: Russell H. Arndt, Glenn Walton Gale, James Willard Hannah, Kenneth T. Settlemyer, Jr.
  • Patent number: 6497054
    Abstract: Solid material, e.g., coal, is upgraded, e.g., the water content reduced and the BTU value increased, by a method comprising the steps of: (a) supplying the solid material to a reactor; (b) heating the solid material in the reactor under water saturation pressure conditions and removing water from the solid material; and (c) cooling the solid material by depressurising the solid material under water saturation conditions.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: December 24, 2002
    Assignee: Technological Resources Pty. Ltd.
    Inventors: Mark Howard Davies, Jonathan James Davis, Jared Michael Osborne
  • Patent number: 6457259
    Abstract: A transportable skid for drying and testing generator stator windings includes a platform supporting a compressor adapted to supply compressed air to the stator winding; a dryer arranged to receive and dry compressed air from the compressor; a buffer tank arranged to receive a relatively small portion of compressed air from the compressor after passing through the dryer; and a receiving tank arranged to receive compressed air from the buffer tank and the compressor after passing through the dryer.
    Type: Grant
    Filed: October 22, 2001
    Date of Patent: October 1, 2002
    Assignee: General Electric Company
    Inventors: Marc Bilofsky, Steve Czvizler, Tom McGonagle
  • Patent number: 6401359
    Abstract: A semiconductor wafer (W) is mounted on top of a mounting stand (3) within a vacuum vessel of a vacuum processing apparatus such as a vacuum film-formation apparatus or an etching apparatus for semiconductor wafers. A heat-transfer gas such as helium is supplied to a gap between the wafer and the mounting stand, and film-formation or etching is performed while the wafer is held at a predetermined temperature. To ensure a simple and reliable detection of any leakage of the helium from between the wafer and the mounting stand during this process because of an abnormal state, the surface of a dielectric material such as aluminum nitride that configures the mounting stand (3) is given a mirror finish and the wafer (W) is attracted to the surface of the mounting stand (3) by an attractive force of at least 1 kg/cm2, whereby the helium from the gas supply path (5) is sealed in on the rear surface side of the wafer (W).
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: June 11, 2002
    Assignee: Tokyo Electron Limited
    Inventor: Hideaki Amano
  • Patent number: 6393716
    Abstract: A method and an apparatus for transporting substrates in an organic light emitting diode (OLED) process is disclosed, which has a transferring chamber provided for transporting substrates between processing modules and the atmosphere condition therein is able to be adjusted to be the same as the processing module by an atmosphere conditioner unit. According to the present invention, the substrates are not contaminated by moisture and the process operation and the factory layout are more flexible. Moreover, the OLED yield is improved.
    Type: Grant
    Filed: May 4, 2000
    Date of Patent: May 28, 2002
    Assignee: Ritek Display Technology Co.
    Inventors: Yih Chang, Jung-Lung Liu, Chih-Jen Yang, Chih-Ming Kuo, Jih-Yi Wang, Tien-Rong Lu
  • Patent number: 6249990
    Abstract: In one embodiment, a cart (5) having a first vessel (10) which fits within a second vessel (90) is used to transport and store an integrated circuit substrate. The integrated circuit substrate is placed within the first vessel (10) and the door (18) of the first vessel (10) is closed and sealed against a door seal (24). The first vessel (10) is then purged with nitrogen to expel moisture and reactive gases from the interior of the first vessel (10). After purging, the first vessel (10) is then placed within the second vessel (90). The door (102) of the second vessel (90) is then closed and sealed against a door seal (104). The second vessel (90) is then purged with nitrogen to expel moisture and reactive gases from the interior of the second vessel (90). The cart (5) containing the integrated circuit substrate is then transported to the next manufacturing area. Integrated circuits and other articles may be manufacturing using the cart system of the present invention.
    Type: Grant
    Filed: March 23, 1999
    Date of Patent: June 26, 2001
    Assignee: AlliedSignal, Inc.
    Inventors: Adel George Tannous, Jeffrey Miller, Khalid Makhamreh
  • Patent number: 6230419
    Abstract: An apparatus and method for drying small lots of product, for example ear corn. The method includes simultaneously directing air flow through the product while weighing the product from time to time to derive moisture content to the product. Air temperature and flow can be adjusted to desired levels for controlling the drying process. The apparatus includes an air permeable product bin and a docking station for receiving the bin. A scale is associated with the docking station to obtain weight measurements during the drying process. An air plenum supplies controlled air flow to the docking station. The structure allows monitoring of moisture content during drying and control of air flow. The temperature can also be controlled through control of an air gate from a main hot and cold air plenum.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: May 15, 2001
    Assignee: Pioneer Hi-Bred International, Inc.
    Inventors: James L. Hinter, Charles G. McBee
  • Patent number: 6146884
    Abstract: An apparatus for the preparation of multiple pollen samples for cryogenic preservation comprising a plurality of chambers for the storage of pollen samples. A vacuum pump reduces the pressure within the interior of the chambers through a vacuum manifold that operatively connects with the pollen samples in the interior of the chambers. An air source vents the interior of the chambers to atmospheric pressure through an air manifold operatively connected with the pollen samples in the interior of the chambers. A vacuum controller controls the pressure within the interior of the chambers through operative connections to the vacuum manifold, the air manifold, the air source, and the vacuum pump. The vacuum controller pulses the pressure with the interior of the chambers between a first and a second reduced pressure level. A sensor operatively connected to the chambers senses the moisture content of the pollen samples within the interior of the chambers at the reduced pressure levels.
    Type: Grant
    Filed: August 16, 1999
    Date of Patent: November 14, 2000
    Assignee: Garst Seed Company
    Inventors: Daren K. Coonrod, Norman P. Cloud, John A. Greaves, Raymond R. Russotti